CN110265460A - Oled display substrate and preparation method thereof, display device - Google Patents
Oled display substrate and preparation method thereof, display device Download PDFInfo
- Publication number
- CN110265460A CN110265460A CN201910568649.6A CN201910568649A CN110265460A CN 110265460 A CN110265460 A CN 110265460A CN 201910568649 A CN201910568649 A CN 201910568649A CN 110265460 A CN110265460 A CN 110265460A
- Authority
- CN
- China
- Prior art keywords
- groove
- dielectric base
- oled display
- signal wire
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P80/00—Climate change mitigation technologies for sector-wide applications
- Y02P80/30—Reducing waste in manufacturing processes; Calculations of released waste quantities
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention discloses a kind of oled display substrates and preparation method thereof, display panel, are related to field of display devices.The oled display substrate includes dielectric base and signal wire, and a surface of dielectric base has groove, and middle part of the groove from the edge of dielectric base to dielectric base extends；Signal wire is located at the surface, and at least one section of signal wire is located in groove, and the edge of dielectric base is extended to along groove.In setting signal line, at least one section of signal wire is set to be located in groove, and this section extends to the edge of dielectric base along groove, when forming planarization layer in the subsequent process in this way, since signal wire has been sunk in groove, the height of the protuberance formed on planarization layer can be reduced or eliminate protuberance, the residual in the two sides forming material of protuberance can be reduced or avoided when forming pixel confining layer, so as to slow down water oxygen to the erosion inside oled display substrate, extend the service life of display panel.
Description
Technical field
The present invention relates to field of display devices, in particular to a kind of oled display substrate and preparation method thereof, display device.
Background technique
Display device common at present has passive luminous display unit (such as liquid crystal display device) and active luminescence display dress
(such as OLED (Organic Light Emitting Diode, Organic Light Emitting Diode) display device) is set, since active shines
Display device does not need setting backlight, has thickness small compared to passive luminous display unit, low in energy consumption, fast response time etc. is excellent
Gesture, therefore active luminous display unit has the bigger market competitiveness.
OLED display panel includes the oled display substrate and cover board to box, and oled display substrate includes substrate, is located at base
Circuit layer, planarization layer, pixel confining layer and multiple OLED light emitting units on plate, OLED light emitting unit array distribution is in substrate
Display area (i.e. for showing the region of picture) in, circuit layer is for driving OLED light emitting unit to shine.Since OLED is sent out
Light unit is easy to be led to service life reduction by the erosion of water, oxygen, in order to make OLED light emitting unit from the erosion of water, oxygen, in base
Encapsulated layer is also covered on plate.
It is flat by the thickness effect of power supply line due to including two power supply lines for extending to substrate edges in circuit layer
The region being located above power supply line for changing layer will form the higher protuberance for extending to substrate edges together.It is limited forming pixel
When layer, the two sides of protuberance can generate the residual of certain material, and remaining material extends to the edge of substrate, exists in this way
After covering encapsulated layer, water, oxygen can be along remaining materials to the internal corrosion of oled display substrate, so as to cause display panel
Service life reduction.
Summary of the invention
The embodiment of the invention provides a kind of oled display substrates and preparation method thereof, display device, can slow down water, oxygen
Erosion, extend the service life of display panel.The technical solution is as follows:
In a first aspect, the embodiment of the invention provides a kind of oled display substrates, comprising:
Dielectric base, a surface of the dielectric base have a groove, the groove from the edge of the dielectric base to
The middle part of the dielectric base extends；
Signal wire is located at the surface, and at least one section of the signal wire is located in the groove, and prolongs along the groove
Extend to the edge of the dielectric base.
Optionally, the groove has opposite the first side wall and second sidewall, is connected to the first side wall and described second
Bottom surface between side wall and connect respectively with the first side wall, the second sidewall, the bottom surface and the surface
Three side walls, the third side wall are located at positive throwing of the bottom surface in the dielectric base in the orthographic projection in the dielectric base
Outside shadow.
Optionally, the third side wall is plane or curved surface.
Optionally, the orthographic projection of the first side wall and the second sidewall in the dielectric base is respectively positioned on the bottom
Face is outside the orthographic projection in the dielectric base.
Optionally, at least one of the first side wall and the second sidewall are plane or curved surface.
Optionally, there is the barricade around the display area of the oled display substrate in the dielectric base, it is described recessed
Slot extends to the barricade from the edge of the dielectric base.
Optionally, the oled display substrate includes at least two signal wires, is disposed with one in the same groove
At least two signal wires are disposed in signal wire described in root or the same groove.
Optionally, the signal wire includes power signal line.
Optionally, in the groove, along being parallel to the dielectric base and perpendicular on the direction of the signal wire, institute
The maximum spacing for stating the side wall of signal wire and the groove is 3 μm~4 μm.
Optionally, in the direction perpendicular to the dielectric base, the depth of the groove is the thickness of the signal wire
40%~60%.
It optionally, further include planarization layer, the planarization layer is located in the dielectric base, perpendicular to the insulation
On the direction of substrate, 1.8~2.2 times of the thickness with a thickness of the signal wire of the planarization layer.
Optionally, the dielectric base includes substrate, and the groove is located on the substrate；Alternatively, the dielectric base
There is the groove including substrate and on the insulating layer of the substrate side, the insulating layer.
Second aspect, the embodiment of the invention also provides a kind of production methods of oled display substrate, which comprises
Groove is formed on a surface of dielectric base, the groove is from the edge of the dielectric base to the dielectric base
Middle part extend；
Signal wire is formed on the surface, at least one section of the signal wire is located in the groove, and along the groove
Extend to the edge of the dielectric base.
Optionally, the one side formation groove in the dielectric base includes:
One substrate is provided；
Insulating layer is formed in the one side of the substrate；
The insulating layer is handled by patterning processes, to be formed on the insulating layer the groove.
The third aspect, the embodiment of the invention also provides a kind of OLED display panel, the OLED display panel includes such as
Oled display substrate described in first aspect.
It is recessed that technical solution provided in an embodiment of the present invention has the benefit that the surface due to dielectric base has
Slot, and groove extends to the edge of dielectric base, in setting signal line, is located at least one section of signal wire in groove,
And this section extends to the edge of dielectric base along groove, when forming planarization layer in the subsequent process in this way, due under signal wire
It has sunk in groove, the height of the protuberance formed on planarization layer can be reduced or has eliminated protuberance, formed pixel confining layer
When residual in the two sides forming material of protuberance can be reduced or avoided, so as to slow down water oxygen into oled display substrate
The erosion in portion extends the service life of display panel.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is a kind of partial structural diagram of oled display substrate；
Fig. 2 is the A-A sectional view in Fig. 1；
Fig. 3 is a kind of partial structural diagram of oled display substrate provided in an embodiment of the present invention；
Fig. 4 is the B-B sectional view in Fig. 3；
Fig. 5 is the C-C sectional view in Fig. 3；
Fig. 6 is a kind of partial structural diagram of oled display substrate provided in an embodiment of the present invention；
Fig. 7 is the partial structural diagram of another oled display substrate provided in an embodiment of the present invention；
Fig. 8 is a kind of production method flow chart of oled display substrate provided in an embodiment of the present invention；
Fig. 9 is the production method flow chart of another oled display substrate provided in an embodiment of the present invention.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to embodiment party of the present invention
Formula is described in further detail.
Fig. 1 is a kind of partial structural diagram of oled display substrate.As shown in Figure 1, oled display substrate includes insulation
Substrate 10 and signal wire 20.One end of signal wire 20 extends to the edge of dielectric base 10, i.e. one end of signal wire 20 and insulation
The edge of substrate 10 is concordant, this be for the ease of being connect with other electrical structures, such as with FPC (Flexible Printed
Circuit Board, flexible circuit board) connection.Fig. 2 is the A-A sectional view in Fig. 1.As shown in Fig. 2, the oled display substrate
It further include PLN (Planarization layer, planarization layer) 11, pixel confining layer (not shown) and encapsulated layer 13.By signal
The influence of line 20, subsequent layer structure can form protuberance 111, here by taking PLN11 as an example, the performance of PLN11 at signal wire 20
After forming protuberance 111, when being subsequently formed pixel confining layer, some formation pixel confining layers of residual are easy in the two sides of protuberance 111
Material, when being subsequently formed encapsulated layer, these retained materials 120 can be clipped between PLN11 and encapsulated layer 13.Since these are residual
It stays material 120 to extend to the edge of dielectric base 10 with protuberance 111, allows extraneous water, oxygen residual along these
Material 120 is stayed to erode to the inside of oled display substrate, to make the service life reduction of OLED display panel.
Fig. 3 is a kind of partial structural diagram of oled display substrate provided in an embodiment of the present invention.As shown in figure 3, should
Oled display substrate includes dielectric base 10 and signal wire 20.One surface 10b of dielectric base 10 has groove 10a, groove 10a
Extend from the edge of dielectric base 10 to the middle part of dielectric base 10.Signal wire 20 is located at surface 10b.One section of signal wire 20
In in groove 10a, and extend to along groove 10a the edge of dielectric base 10.
Since the one side of dielectric base has groove, and groove extends to the edge of dielectric base, in setting signal line
When, it is located at least one section of signal wire in groove, and this section extends to the edge of dielectric base along groove, in this way in subsequent work
When forming planarization layer in skill, since signal wire has been sunk in groove, the height of the protuberance formed on planarization layer can be reduced
Degree or elimination protuberance, the residual in the two sides forming material of protuberance can be reduced or avoided when forming pixel confining layer,
So as to slow down water oxygen to the erosion inside oled display substrate, extend the service life of display panel.
Fig. 4 is the B-B sectional view in Fig. 3.Comparison diagram 4 and Fig. 2 are eliminated PLN11 and are being believed due to the presence of groove 10a
When the protuberance 111 at number line 20, in this way formation pixel confining layer 12, so that it may reduce or eliminate retained material.
Illustratively, dielectric base 10 may include substrate 101 and the insulating layer 102 positioned at 101 1 surface of substrate, groove
10a is located on insulating layer 102.It is formed before signal wire 20 on the substrate 101, is usually all formed at least one insulating layer 102.
For example, Fig. 5 is the C-C sectional view in Fig. 3.Multiple TFT (Thin Film is generally included in the driving circuit of oled display substrate
Transistor, thin film transistor (TFT)), TFT generally includes active layer 31, gate electrode 32, source electrode 33 and drain electrode 34.In substrate
It is with active layer 31, the first insulating layer 103, gate electrode layer, second insulating layer 104 and source-drain electrode layer, gate electrode layer on 101
Layer where layer where the gate electrode 32 of multiple TFT, source-drain electrode layer, that is, multiple TFT source electrode 33 and drain electrode 34.Letter
Number line 20 can refer to the same side being located on the same floor with the same layer arrangement of source-drain electrode floor, same layer arrangement here, or by same
One time patterning processes are formed, or are contacted with same layer close to the surface of substrate 101.Here signal wire 20 can use metal
Material is formed.First insulating layer 103 and second insulating layer 104 can be formed using insulating materials such as silicon nitride, silica.It is aforementioned
Insulating layer 102 may include second insulating layer 104, groove 10a is made only in second insulating layer 104 at this time, it is above-mentioned absolutely
Edge layer 102 also may include the first insulating layer 103 and second insulating layer 104, and groove 10a can be made only in the second insulation at this time
On layer 104 (as shown in Figure 5), it can also be formed in the first insulating layer 103 and second insulating layer 104, i.e. the depth of groove 10a
The thickness of the first insulating layer 103 can be greater than, but less than the sum of the first insulating layer 103 and thickness of second insulating layer 104.
In other implementations, dielectric base 10 can also only include substrate 101, and groove 10a is located on substrate 101.
Referring to Fig. 3, oled display substrate has the display area DD and non-display area EE around display area DD, here
Display area DD refer to the region for showing picture.The usual array distribution of multiple TFT above-mentioned is in the DD of display area.Figure
5 show the section C-C of Fig. 3, also have as shown in figure 5, in the oled display substrate, in second insulating layer 104 PLN11,
Pixel confining layer 12 and encapsulated layer 13.Pixel confining layer 12 includes first part 121 and second part 122, pixel confining layer 12
Second part 122 surround pixel confining layer 12 first part 121.The first part 121 of pixel confining layer 12 is located at display
In the DD of region, it can have multiple openings, OLED light emitting unit is located in the opening.The second part 122 of pixel confining layer 12
It is at regular intervals with the edge of substrate 101.Encapsulated layer 13 is covered on display area DD and non-display area EE, pixel confining layer 12
Second part 122, the encapsulated layer 13 that is covered on the second part 122 of pixel confining layer 12 collectively form barricade (Dam) 40,
There is a certain distance at edge of the barricade 40 apart from substrate 101, and barricade 40 surrounds display area DD, can be to avoid water, oxygen etc. to aobvious
Show that region DD causes to corrode.
As shown in figure 4, in the direction perpendicular to dielectric base 10, the thickness d of PLN111It can be the thickness of signal wire 20
Spend d21.8~2.2 times.For example, the thickness d of signal wire 202For 600nm, the thickness d of PLN111It can be 1200nm.PLN11
Thickness d1The excessively thin surface that will lead to PLN11 is not smooth enough, thickness d1The blocked up thickness that will increase oled display substrate.
Optionally, on the direction perpendicular to dielectric base, the depth d of groove 10a3It can be the thickness d of signal wire 202
40%~60%.For example, the thickness d of signal wire 202It can be 600nm, the depth d of groove 10a3It can be 300nm.
The depth d of groove 10a3It is excessive, the part of signal wire 20 being located in groove 10a and the portion outside groove 10a
/ meeting is easily broken off, the depth d of groove 10a3It is too small then unobvious for the elimination effect of protuberance.The thickness d of PLN111、
The thickness d of signal wire 202, groove 10a depth d3It will affect the elimination effect to protuberance, by the thickness for adjusting PLN11
d1, signal wire 20 thickness d2, groove 10a depth d3Protuberance 111 can be made to completely eliminate as shown in Figure 4, in other embodiments
In, it can also be only the height for reducing protuberance 111, by the height for reducing protuberance 111, it is possible to reduce the amount of retained material 120,
It still is able to play the role of slowing down water oxygen to the erosion inside oled display substrate, to extend the service life of display panel.
As shown in figure 4, in groove 10a, along being parallel to dielectric base 10 and perpendicular on the direction of signal wire 20, signal
The maximum spacing d of the side wall of line 20 and groove 10a4It can be 3 μm~4 μm.Maximum spacing d4The too small system that can increase signal wire 20
Make difficulty, maximum spacing d4It is excessive, it needs to remove more materials from insulating layer 102 in etching, cost is higher, and
Biggish recess can be generated in the film layer being subsequently formed.
Optionally, there is the barricade 40 of the display area DD around oled display substrate, groove 10a can in dielectric base 10
To extend to barricade 40 from the edge of dielectric base 10.In not set groove 10a, the protuberance 111 on PLN11 can be from barricade 40
The edge of dielectric base 10 is extended to, therefore setting groove 10a can reduce the height of whole section of protuberance 111 in this way, even
Whole section of protuberance 111 is all eliminated, to be reduced as far as the residual of material.
In addition, groove 10a can also extend from the edge of dielectric base 10 to barricade 40, but it is not extend to barricade 40.By
It is inwardly to be eroded from the edge of dielectric base 10, therefore groove 10a is set in this way in extraneous water, oxygen, even if still there is material
The residual of material, water, oxygen also can not with remaining material, can also block water, internal corrosion from oxygen to oled display substrate.
Fig. 6 is a kind of partial structural diagram of oled display substrate provided in an embodiment of the present invention.As shown in fig. 6, recessed
Slot 10a have opposite the first side wall 102a and second sidewall 102b, be connected to the first side wall 102a and second sidewall 102b it
Between bottom surface 102d and the third that is connect respectively with the first side wall 102a, second sidewall 102b, bottom surface 102d and surface 10b
Side wall 102c.Third side wall 102c the orthographic projection in dielectric base 10 can be located at bottom surface 102d in dielectric base 10 just
Projection is outer.Since third side wall 102c is located at positive throwing of the bottom surface 102d in dielectric base 10 in the orthographic projection in dielectric base 10
Outside shadow, the part of such signal wire 20 being located in groove 10a can preferably be connected with the part outside groove 10a, keep away
Exempt from the fracture of signal wire 20.
Optionally, third side wall 102c can be plane or curved surface.No matter third side wall 102c be plane or curved surface,
So that the part of signal wire 20 being located in groove 10a and the part preferably transition outside groove 10a, mean camber can be with
Keep 20 transition of signal wire more smooth, the fracture of signal wire 20 can be further avoided.
As shown in fig. 6, the orthographic projection of the first side wall 102a and second sidewall 102b in dielectric base 10 can be located at
Bottom surface 102a is outside the orthographic projection in dielectric base 10.Subsequent film layer, such as PLN11 can be so conducive to, be covered on recessed
On the first side wall 102a and second sidewall 102b of slot 10a, so that the surface of PLN11 is more smooth, it is more conducive to avoid being formed
It is remained when pixel confining layer 12 in the surface forming material of PLN11.
At least one of the first side wall 102a and second sidewall 102b can be plane or curved surface.Such as the first side wall
102a and second sidewall 102b is plane or is curved surface or one be one, plane is curved surface.Either plane or song
Face can be such that PLN11 is covered on the first side wall 102a and second sidewall 102b, and mean camber can make the surface of PLN11
It is more smooth.
Fig. 7 is the partial structural diagram of another oled display substrate provided in an embodiment of the present invention.As shown in fig. 7,
Oled display substrate may include two signal wires 20, and two signal wires 20 are disposed in same groove 10a.Oled display substrate
More signal wires 20 are generally comprised, for close closer two signal line 20, two signal lines 20 are arranged in a groove
In 10a, it is possible to reduce the production of groove 10a.More signal wires 20, such as three signal wires 20 can certainly be arranged in
In the same groove 10a.
For example, signal wire 20 may include power signal line.The power signal line of OLED display panel generally includes two,
First signal wire VddWith second signal line Vss, the first signal wire VddWith second signal line VssAll extend to the side of dielectric base 10
Edge is to connect the structure of power supply.First signal wire VddWith second signal line VssIt can be arranged in 10a in the same groove, to subtract
The quantity of few groove 10a.
Certainly, in other possible implementations of the invention, can also correspond to every signal line 20 be respectively arranged it is recessed
A signal wire 20 is arranged in slot 10a, same groove 10a, to facilitate respective cabling.
The embodiment of the invention also provides a kind of OLED display panel, which includes as shown in figure 3 to figure 7
Any oled display substrate.
Illustratively, which can be mobile phone, tablet computer, television set, laptop, digital phase
The display panel of the product having a display function such as frame, navigator.
Fig. 8 is a kind of production method flow chart of oled display substrate provided in an embodiment of the present invention.This method is for making
Make oled display substrate as shown in figure 3 to figure 7.As shown in figure 8, this method comprises:
S11: groove is formed on a surface of dielectric base.
Wherein, middle part of the groove from the edge of dielectric base to dielectric base extends.
S12: signal wire is formed on the surface of dielectric base.
Wherein, at least one section of signal wire is located in groove, and the edge of dielectric base is extended to along groove.
Since a surface of dielectric base has groove, and groove extends to the edge of dielectric base, in setting signal
When line, it is located at least one section of signal wire in groove, and this section extends to the edge of dielectric base along groove, in this way subsequent
When forming planarization layer in technique, since signal wire has been sunk in groove, the protuberance formed on planarization layer can be reduced
Height or eliminate protuberance, can be reduced or avoided when forming pixel confining layer protuberance two sides forming material it is residual
It stays, so as to slow down water oxygen to the erosion inside oled display substrate, extends the service life of display panel.
Fig. 9 is the production method flow chart of another oled display substrate provided in an embodiment of the present invention.This method is used for
Make oled display substrate as shown in Figure 5.As shown in figure 9, this method comprises:
S21: a substrate is provided.
S22: insulating layer is formed in the one side of substrate.
Illustratively, insulating layer can be formed by way of vapor deposition.Insulating layer can use silicon nitride, silica
Equal insulating materials production.
Referring to Fig. 5, generally include multiple TFT in the driving circuit of oled display substrate, TFT generally include active layer 31,
Gate electrode 32, source electrode 33 and drain electrode 34.Oled display substrate include active layer 31, the first insulating layer 103, gate electrode layer,
Second insulating layer 104 and source-drain electrode layer.Insulating layer formed in step S22 can be equivalent to shown in Fig. 5 second absolutely
Edge layer 104.Active layer 31, the first insulating layer 103 and gate electrode layer can be formed before step S22, and forming method can be with
It is identical in the related technology.
S23: insulating layer is handled by patterning processes, groove is formed on the insulating layer.
S24: signal wire is formed on a surface of dielectric base.
Referring to Fig. 3, at least one section of signal wire 20 is located in groove 10a, and extends to dielectric base 10 along groove 10a
Edge.
Illustratively, can be initially formed conductive material layer on the insulating layer, then by patterning processes to conductive material layer into
Row processing, obtains signal wire 20.Conductive material layer can be metal layer.Conductive material layer can be formed using modes such as sputterings.
After forming signal wire, production other structures, such as PLN11, pixel confining layer 12, OLED hair can also continue to
Light unit, encapsulated layer 13 etc..PLN11, pixel confining layer 12, OLED light emitting unit, the generation type of encapsulated layer 13 can be with
In the related technology identical.
The foregoing is merely presently preferred embodiments of the present invention, is not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (15)
1. a kind of oled display substrate characterized by comprising
Dielectric base, a surface of the dielectric base have a groove, and the groove is from the edge of the dielectric base to described
The middle part of dielectric base extends；
Signal wire is located at the surface, and at least one section of the signal wire is located in the groove, and extends to along the groove
The edge of the dielectric base.
2. oled display substrate according to claim 1, which is characterized in that the groove have opposite the first side wall and
Second sidewall, the bottom surface being connected between the first side wall and the second sidewall and respectively with the first side wall, institute
State second sidewall, the third side wall that the bottom surface is connected with the surface, the third side wall in the dielectric base just
Projection is located at the bottom surface outside the orthographic projection in the dielectric base.
3. oled display substrate according to claim 2, which is characterized in that the third side wall is plane or curved surface.
4. oled display substrate according to claim 2, which is characterized in that the first side wall and the second sidewall exist
Orthographic projection in the dielectric base is respectively positioned on the bottom surface outside the orthographic projection in the dielectric base.
5. oled display substrate according to claim 4, which is characterized in that in the first side wall and the second sidewall
At least one be plane or curved surface.
6. described in any item oled display substrates according to claim 1~5, which is characterized in that have in the dielectric base
Barricade around the display area of the oled display substrate, the groove extend to the gear from the edge of the dielectric base
Wall.
7. described in any item oled display substrates according to claim 1~5, which is characterized in that the oled display substrate packet
At least two signal wires are included, cloth in the signal wire or the same groove is disposed in the same groove
It is equipped at least two signal wires.
8. described in any item oled display substrates according to claim 1~5, which is characterized in that the signal wire includes power supply
Signal wire.
9. described in any item oled display substrates according to claim 1~5, which is characterized in that in the groove, along parallel
In the dielectric base and perpendicular on the direction of the signal wire, the maximum spacing of the side wall of the signal wire and the groove
It is 3 μm~4 μm.
10. described in any item oled display substrates according to claim 1~5, which is characterized in that perpendicular to the insulation base
On the direction at bottom, the depth of the groove is the 40%~60% of the thickness of the signal wire.
11. described in any item oled display substrates according to claim 1~5, which is characterized in that it further include planarization layer, institute
Planarization layer is stated to be located in the dielectric base, in the direction perpendicular to the dielectric base, the thickness of the planarization layer
It is 1.8~2.2 times of the thickness of the signal wire.
12. described in any item oled display substrates according to claim 1~5, which is characterized in that the dielectric base includes base
Plate, the groove are located on the substrate；Alternatively, the dielectric base includes substrate and the insulation positioned at the substrate side
Layer, there is the groove on the insulating layer.
13. a kind of production method of oled display substrate, which is characterized in that the described method includes:
Groove is formed on a surface of dielectric base, the groove is from the edge of the dielectric base into the dielectric base
Portion extends；
Signal wire is formed on the surface, at least one section of the signal wire is located in the groove, and extends along the groove
To the edge of the dielectric base.
14. production method according to claim 13, which is characterized in that the one side in the dielectric base forms recessed
Slot includes:
One substrate is provided；
Insulating layer is formed in the one side of the substrate；
The insulating layer is handled by patterning processes, to be formed on the insulating layer the groove.
15. a kind of OLED display panel, which is characterized in that show base including the described in any item OLED of such as claim 1~12
Plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910568649.6A CN110265460A (en) | 2019-06-27 | 2019-06-27 | Oled display substrate and preparation method thereof, display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910568649.6A CN110265460A (en) | 2019-06-27 | 2019-06-27 | Oled display substrate and preparation method thereof, display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110265460A true CN110265460A (en) | 2019-09-20 |
Family
ID=67922473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910568649.6A Pending CN110265460A (en) | 2019-06-27 | 2019-06-27 | Oled display substrate and preparation method thereof, display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110265460A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110718572A (en) * | 2019-10-17 | 2020-01-21 | 京东方科技集团股份有限公司 | Organic electroluminescent display substrate, preparation method thereof and display device |
| CN112436036A (en) * | 2020-11-20 | 2021-03-02 | 合肥维信诺科技有限公司 | Display substrate, display panel and display device |
| WO2021174604A1 (en) * | 2020-03-06 | 2021-09-10 | 武汉华星光电半导体显示技术有限公司 | Display panel and display device |
| WO2023025240A1 (en) * | 2021-08-27 | 2023-03-02 | 昇印光电（昆山）股份有限公司 | Light-emitting module and display device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107342375A (en) * | 2017-08-21 | 2017-11-10 | 深圳市华星光电半导体显示技术有限公司 | The preparation method and flexible display panels of flexible display panels |
| CN108549180A (en) * | 2018-03-30 | 2018-09-18 | 厦门天马微电子有限公司 | A kind of display panel and display device |
| US20180331169A1 (en) * | 2015-12-29 | 2018-11-15 | Lg Display Co., Ltd. | Organic light-emitting display device and method of fabricating the same |
-
2019
- 2019-06-27 CN CN201910568649.6A patent/CN110265460A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20180331169A1 (en) * | 2015-12-29 | 2018-11-15 | Lg Display Co., Ltd. | Organic light-emitting display device and method of fabricating the same |
| CN107342375A (en) * | 2017-08-21 | 2017-11-10 | 深圳市华星光电半导体显示技术有限公司 | The preparation method and flexible display panels of flexible display panels |
| CN108549180A (en) * | 2018-03-30 | 2018-09-18 | 厦门天马微电子有限公司 | A kind of display panel and display device |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110718572A (en) * | 2019-10-17 | 2020-01-21 | 京东方科技集团股份有限公司 | Organic electroluminescent display substrate, preparation method thereof and display device |
| WO2021174604A1 (en) * | 2020-03-06 | 2021-09-10 | 武汉华星光电半导体显示技术有限公司 | Display panel and display device |
| US11557639B2 (en) | 2020-03-06 | 2023-01-17 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Display panel and display device with light-emitting portions having centers at distance of 5μm or less |
| CN112436036A (en) * | 2020-11-20 | 2021-03-02 | 合肥维信诺科技有限公司 | Display substrate, display panel and display device |
| CN112436036B (en) * | 2020-11-20 | 2023-06-30 | 合肥维信诺科技有限公司 | Display substrate, display panel and display device |
| WO2023025240A1 (en) * | 2021-08-27 | 2023-03-02 | 昇印光电（昆山）股份有限公司 | Light-emitting module and display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN110265460A (en) | Oled display substrate and preparation method thereof, display device | |
| US10636997B2 (en) | Display panel and display device | |
| CN111128010B (en) | Display panel, manufacturing method thereof and display device | |
| US10629668B1 (en) | Display panel and display device thereof | |
| WO2020063128A1 (en) | Array substrate, display panel and display apparatus | |
| CN108922983B (en) | Display panel and display device | |
| WO2020042235A1 (en) | Flexible oled display panel | |
| US11917889B2 (en) | Flexible display panel with hollow structure | |
| TWI606771B (en) | Display panel | |
| US11818912B2 (en) | Organic light-emitting diode display panels with moisture blocking structures | |
| WO2020062719A1 (en) | Flexible display panel and flexible display device | |
| US10312266B2 (en) | Display substrate and manufacturing method thereof, and display device | |
| WO2021103204A1 (en) | Display panel and manufacturing method therefor, and display device | |
| CN111430417B (en) | Display panel and preparation method thereof | |
| US20220320240A1 (en) | Display Panel and Display Device | |
| WO2021217840A1 (en) | Display panel and manufacturing method therefor | |
| EP3018704A1 (en) | Array substrate, display device, and method for manufacturing array substrate | |
| CN111463243A (en) | Array substrate and preparation method thereof | |
| WO2022011911A1 (en) | Display panel and display device | |
| WO2020118920A1 (en) | Organic light-emitting diode array substrate and manufacturing method therefor | |
| CN110718572B (en) | Organic electroluminescent display substrate, preparation method thereof and display device | |
| JP7460251B2 (en) | Displays and electronic devices | |
| WO2021169608A1 (en) | Display panel and manufacturing method therefor, and display device | |
| CN101872780B (en) | Display panel and image display system using same | |
| TW201533892A (en) | Active substrate and display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190920 |
|
| RJ01 | Rejection of invention patent application after publication |