CN110206172A - A kind of passive cooling system based on micro-nano structure - Google Patents
A kind of passive cooling system based on micro-nano structure Download PDFInfo
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- CN110206172A CN110206172A CN201910498394.0A CN201910498394A CN110206172A CN 110206172 A CN110206172 A CN 110206172A CN 201910498394 A CN201910498394 A CN 201910498394A CN 110206172 A CN110206172 A CN 110206172A
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- film layer
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- passive cooling
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- 238000001816 cooling Methods 0.000 title claims abstract description 36
- 239000002086 nanomaterial Substances 0.000 title claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 230000000737 periodic effect Effects 0.000 claims abstract description 7
- 230000005855 radiation Effects 0.000 claims description 57
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 230000003595 spectral effect Effects 0.000 claims description 2
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 54
- 239000000463 material Substances 0.000 description 23
- 230000000694 effects Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- ZJRXSAYFZMGQFP-UHFFFAOYSA-N barium peroxide Chemical compound [Ba+2].[O-][O-] ZJRXSAYFZMGQFP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
- E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
- E04B1/62—Insulation or other protection; Elements or use of specified material therefor
- E04B1/74—Heat, sound or noise insulation, absorption, or reflection; Other building methods affording favourable thermal or acoustical conditions, e.g. accumulating of heat within walls
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04F—FINISHING WORK ON BUILDINGS, e.g. STAIRS, FLOORS
- E04F13/00—Coverings or linings, e.g. for walls or ceilings
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04F—FINISHING WORK ON BUILDINGS, e.g. STAIRS, FLOORS
- E04F13/00—Coverings or linings, e.g. for walls or ceilings
- E04F13/02—Coverings or linings, e.g. for walls or ceilings of plastic materials hardening after applying, e.g. plaster
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04B—GENERAL BUILDING CONSTRUCTIONS; WALLS, e.g. PARTITIONS; ROOFS; FLOORS; CEILINGS; INSULATION OR OTHER PROTECTION OF BUILDINGS
- E04B1/00—Constructions in general; Structures which are not restricted either to walls, e.g. partitions, or floors or ceilings or roofs
- E04B1/62—Insulation or other protection; Elements or use of specified material therefor
- E04B1/74—Heat, sound or noise insulation, absorption, or reflection; Other building methods affording favourable thermal or acoustical conditions, e.g. accumulating of heat within walls
- E04B2001/742—Use of special materials; Materials having special structures or shape
Abstract
The passive cooling system based on micro-nano structure that the invention discloses a kind of, including the substrate layer, high reflection layer and radiating layer set gradually, the substrate layer and high reflection layer are smooth film layer, and the radiating layer is the inverted T-type structure of periodic arrangement.It can be realized passive cooling, and structure is small, economical and practical, be suitble to large-scale production.
Description
Technical field
The present invention relates to micronano optical technical fields, and in particular to a kind of passive cooling system based on micro-nano structure.
Background technique
With the development of society, the especially industrial revolution several times is gradually deeply in progress, greenhouse effects have given the whole world
Production practices and daily life all bring adverse effect.The raising of global temperatures is so that people must utilize more multipotency
Partial cooling purpose is realized in source, and the use of these energy further exacerbates greenhouse effects.In order to reduce the drop such as electric power
The use of the warm energy, between past many decades, many scientists cool down without external energy consumption seeking one kind
Method, for actively consume the energy realization cool down and be distinguished, this cool-down method is referred to as passive cooling.
A kind of a kind of material with selective absorbing has been proposed in an article of Raman in 2014.Using too
Sunlight wave band high reflection and the high emission characteristic of atmospheric window are achieved the radiation cooling on daytime.But due to its knot
The multilayer film of different-thickness is utilized in structure, and parameter is more, and material is not common and raw material, this to processing mass production and
Cost problem brings very big disadvantage.Present existing patent 108104289A is based on aluminium alloy plate and thermal insulation layer
Radiation heat-dissipation film, such cooling material consumptive material is more, and structure is complex, and practical occasion is relatively simple, so that operational
More complicated use scope is limited.Patent 108219172A is one kind based on aluminium film and silica, barium dioxide particle
The thickness of multilayered structure, this structure particles uniformity and coating receives very big challenge, and production industry is quite cumbersome,
Be not suitable for production practices.In this ACS paper Passive radiative cooling below ambient air of Raman
A kind of passive cooling material of multilayer film is described in temperature under direct sunlight, thin film parameter is too
More and material prepares cumbersome, is unfavorable for actual processing.Generally speaking, existing cooling material structure volume is larger, very consumptive material；Make
Cooling material is not common, expensive；Material structure is excessively complicated, and mode is numerous, and is unfavorable for processing；Without fine
Selective absorbing performance, cooling effect is unobvious.
Summary of the invention
The passive cooling system based on micro-nano structure that the technical problem to be solved in the present invention is to provide a kind of, can be realized
Passive cooling, structure is small, economical and practical, is suitble to large-scale production.
The passive cooling system based on micro-nano structure that in order to solve the above-mentioned technical problems, the present invention provides a kind of, including
Substrate layer, high reflection layer and the radiating layer set gradually, the substrate layer and high reflection layer are smooth film layer, the radiating layer
For the inverted T-type structure of periodic arrangement.
Preferably, the radiating layer includes the first radiation film layer and the second radiation film layer, the first radiation film layer
It is all the inverted T-type structure of periodic arrangement with the second radiation film layer, the first radiation film layer is close to high reflection layer setting, described
Second radiation film layer is located at first radiation side of the film layer far from the high reflection layer.
Preferably, the refractive index of the second radiation film layer is less than the refractive index of the first radiation film layer, it is described
The ratio between the refractive index of first radiation film layer and the second radiation film layer is 1.5-2.
Preferably, the first radiation film layer and the second radiation film layer are all inhaled in the spectrum of 300nm-2500nm wave band
Yield is lower than 5%.
Preferably, the first radiation film layer is silica coating；The second radiation film layer is silicon nitride film
Layer.
Preferably, the silica coating with a thickness of 0.5um, the silicon nitride film layer with a thickness of 0.5nm,
The period of the radiating layer is 2um.
Preferably, the height of projection of the inverted T-shaped of the radiating layer is 2um.
Preferably, the high reflection layer is high reflecting metal film.
Beneficial effects of the present invention:
1, the present invention includes substrate layer, high reflection layer and the radiating layer set gradually, and the substrate layer and high reflection layer are
Smooth film layer, the radiating layer are the inverted T-type structure of periodic arrangement, and structure is simple, easy to process, good cooling effect.
2, the present invention can be realized passive cooling, and structure is small, economical and practical, be suitble to large-scale production.
Detailed description of the invention
Fig. 1 is the structural diagram of the present invention；
Fig. 2 is the schematic illustration of passive cooling；
Fig. 3 is the cool principle schematic diagram of traditional plane film layer；
Fig. 4 is the principle of the present invention schematic diagram；
Fig. 5 is abosrption spectrogram of the present invention.
Figure label explanation: 10, substrate layer；20, high reflection layer；30, the first radiation film layer；31, the second radiation film layer.
Specific embodiment
The present invention will be further explained below with reference to the attached drawings and specific examples, so that those skilled in the art can be with
It more fully understands the present invention and can be practiced, but illustrated embodiment is not as a limitation of the invention.
Shown in referring to Fig.1, the passive cooling system based on micro-nano structure that the invention discloses a kind of, including what is set gradually
Substrate layer 10, high reflection layer 20 and radiating layer, substrate layer 10 and high reflection layer 20 are smooth film layer, and radiating layer is periodically to arrange
The inverted T-type structure of column.Radiating layer includes the first radiation film layer 30 and the second radiation film layer 31, and first radiates film layer 30 and the second spoke
The inverted T-type structure that film layer 31 is all periodic arrangement is penetrated, the first radiation film layer 30 is close to high reflection layer 20 and is arranged, the second radiation film
Layer 31 is located at the first radiation side of the film layer far from high reflection layer.The refractive index of second radiation film layer is less than the first radiation film layer
The ratio between the refractive index of refractive index, the first radiation film layer and the second radiation film layer is 1.5-2.First radiation film layer and the second radiation film
Layer is all lower than 5% in the spectral absorption of 300nm-2500nm wave band.ZnS, SiO, SiC etc. can be used in second radiation film layer.
Preferably, the first radiation film layer 30 is silica coating；Second radiation film layer 31 is silicon nitride film layer.
Silica coating with a thickness of 0.5um, silicon nitride film layer with a thickness of 0.5nm, the period of radiating layer is 2um.Radiating layer
The height of projection of inverted T-shaped is 2um.
Reflecting layer is high reflecting metal film.High reflecting metal film can choose Ag or Al.
As shown in Fig. 2, being the schematic illustration of passive cooling.
Passive cooling is mainly the mechanism for utilizing a heat radiation, so that the net down power of material is greater than 0.On daytime
It is aerial, and radiant power is influenced by solar radiation and atmosphere.The net cooling power P of radiant coolerscoolIt obtains by following formula
It provides:
Pcool(T)=Prad(T)-Patm(Tamb)-Psun-Pcond+conv。
In upper formula, PradIt (T) is the heat radiation power of material, calculation formula are as follows:
Wherein λ is optical wavelength, and θ is the angle of incident light.
Patm(Tamb) it is with atmosphere to material surface radiant power size, calculation formula is as follows:
Wherein Space Angle size, A are rings
Border and material surface contact area, A take 1 to be considered as unit area.
PsunIt is the sun heat radiation power that material absorbs.Its calculation formula is as follows:
Wherein IAM1.5For the irradiation power spectrum of the sun under the atmosphere of AM1.5.λ is
Sunlight wavelength.
Pcond+convIt is as follows for the heat transmitting and counter-flow relation, power calculation of material and environment:
Pcond+conv(T,Tamb)=Ahc(Tamb- T), T is the temperature of material, TambFor environment temperature, hcFor planck constant.
Having above-mentioned formula, we can find out its net refrigeration work consumption.Wherein Patm(Tamb) and Pcond+convIt is that we can not
Control.It is main to consider to increase Prad(T)-PsunSize.In order to reach this purpose, it is required that the structural material is in visible light
The reflectivity that wave band has had to avoid the visible light with high-energy is absorbed, and has very high radiation efficiency in atmospheric window, this
In introduce Kirchhoff's law, i.e. absorber good in a certain wavelength band radiator that must be, it is therefore desirable to big
Transom window mouth wave band finds a material and structure with high-absorbility.
Fig. 3 is the cool principle schematic diagram of traditional plane film layer；Fig. 4 is the principle of the present invention schematic diagram.Due to this Shen
Please in inverted T-shaped radiating layer have for light with regulating and controlling effect, be effectively increased electromagnetic wave propagation light path.3 He of comparison diagram
The index path of Fig. 4, compared to flat film layer structure, the present invention realizes more light paths using less material, and thus electromagnetic wave exists
Light path in structure will increase, therefore the absorptivity of cooling material can be improved, and it is higher that this also indicates that this structure can have
Emission effciency.The amount of radiation size of material itself can thus be increased, to radiate more heats.
Fig. 5 is absorption spectrum map of the invention, wherein high reflection layer is argentum reflecting layer, and the first radiation film layer 30 is two
Membranous layer of silicon oxide；Second radiation film layer 31 is silicon nitride film layer.Silica coating with a thickness of 0.5um, silicon nitride film layer
With a thickness of 0.5nm, the period of radiating layer is 2um.The height of projection of the inverted T-shaped of radiating layer is 2um.It is seen that this hair
It is bright considerably less in solar spectrum wave band (300nm-2500nm) absorption, and it is then with higher in atmospheric window wave (8-14um) section
It absorbs, ensures that this structure can have good radiation cooling characteristic on daytime in this way.The configuration of the present invention is simple, and energy
Enough realize good cooling effect, simply several layers of structure to process very convenient, while performance is also very excellent.Through surveying
Examination, above structure are 315K in environment temperature, and atmospheric environment can be realized down power greater than 100W/ under conditions of being AM1.5
m2.It so, it is possible the temperature that material itself is effectively reduced, to realize autonomous cooling effect.
Embodiment described above is only to absolutely prove preferred embodiment that is of the invention and being lifted, protection model of the invention
It encloses without being limited thereto.Those skilled in the art's made equivalent substitute or transformation on the basis of the present invention, in the present invention
Protection scope within.Protection scope of the present invention is subject to claims.
Claims (8)
1. a kind of passive cooling system based on micro-nano structure, which is characterized in that including substrate layer, the high reflection layer set gradually
And radiating layer, the substrate layer and high reflection layer are smooth film layer, and the radiating layer is the inverted T-type structure of periodic arrangement.
2. the passive cooling system based on micro-nano structure as described in claim 1, which is characterized in that the radiating layer includes the
One radiation film layer and the second radiation film layer, the first radiation film layer and the second radiation film layer are all the inverted T shaped of periodic arrangement
Structure, the first radiation film layer are close to high reflection layer setting, and it is remote that the second radiation film layer is located at the first radiation film layer
Side from the high reflection layer.
3. the passive cooling system based on micro-nano structure as claimed in claim 2, which is characterized in that the second radiation film layer
Refractive index be less than it is described first radiation film layer refractive index, it is described first radiation film layer with second radiation film layer refractive index it
Than for 1.5-2.
4. the passive cooling system based on micro-nano structure as claimed in claim 2, which is characterized in that the first radiation film layer
All it is lower than 5% in the spectral absorption of 300nm-2500nm wave band with the second radiation film layer.
5. the passive cooling system based on micro-nano structure as claimed in claim 2, which is characterized in that the first radiation film layer
For silica coating；The second radiation film layer is silicon nitride film layer.
6. the passive cooling system based on micro-nano structure as claimed in claim 5, which is characterized in that the silica coating
With a thickness of 0.5um, the silicon nitride film layer with a thickness of 0.5nm, the period of the radiating layer is 2um.
7. the passive cooling system based on micro-nano structure as claimed in claim 6, which is characterized in that the T of the radiating layer
The height of projection of shape is 2um.
8. the passive cooling system based on micro-nano structure as described in claim 1, which is characterized in that the high reflection layer is height
Reflecting metallic film.
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| CN109341137A (en) * | 2018-10-24 | 2019-02-15 | 苏州融睿纳米复材科技有限公司 | Passive refrigeration structure based on photonic crystal |
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2019
- 2019-06-10 CN CN201910498394.0A patent/CN110206172A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1180660A2 (en) * | 2000-08-16 | 2002-02-20 | Eastman Chemical Company | Determination of layer thickness or non-uniformity of layer thickness based on fluorophore additives |
| US8637759B2 (en) * | 2005-12-16 | 2014-01-28 | The Boeing Company | Notch filter for triple junction solar cells |
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Application publication date: 20190906 |