CN110133765A - Optical module and its preparation method and application with resistance to pollution layer - Google Patents
Optical module and its preparation method and application with resistance to pollution layer Download PDFInfo
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- CN110133765A CN110133765A CN201810128316.7A CN201810128316A CN110133765A CN 110133765 A CN110133765 A CN 110133765A CN 201810128316 A CN201810128316 A CN 201810128316A CN 110133765 A CN110133765 A CN 110133765A
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- 230000003287 optical effect Effects 0.000 title claims abstract description 61
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 229910052809 inorganic oxide Inorganic materials 0.000 claims abstract description 66
- 239000002245 particle Substances 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 32
- 239000011159 matrix material Substances 0.000 claims abstract description 25
- 239000010410 layer Substances 0.000 claims description 127
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 61
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 38
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 20
- 239000008187 granular material Substances 0.000 claims description 14
- 239000000725 suspension Substances 0.000 claims description 14
- 239000011521 glass Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 238000004528 spin coating Methods 0.000 claims description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000011324 bead Substances 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 239000011247 coating layer Substances 0.000 claims description 3
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- 238000011065 in-situ storage Methods 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- 239000011260 aqueous acid Substances 0.000 claims 1
- 150000003839 salts Chemical class 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 238000012360 testing method Methods 0.000 description 21
- 238000002834 transmittance Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 8
- 230000002688 persistence Effects 0.000 description 7
- 239000004576 sand Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 230000003667 anti-reflective effect Effects 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000007766 curtain coating Methods 0.000 description 3
- 238000007761 roller coating Methods 0.000 description 3
- 238000005496 tempering Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 230000002045 lasting effect Effects 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Sustainable Energy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention relates to the optical modules and its preparation method and application for having resistance to pollution layer.Optical module of the invention includes: substrate；Square antireflection layer on the substrate；With the resistance to pollution layer above the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide matrix, at least part volume extension of at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.Optical module of the invention has anti-pollution characteristic, and can keep anti-pollution characteristic for a long time.By the permanent power output for improving photovoltaic module when optical module of the present invention is in for photovoltaic module.
Description
Technical field
This patent disclosure relates generally to the optical module with resistance to pollution layer and use its photovoltaic module.Specifically, of the invention
It is related to optical module, containing substrate, antireflection layer and resistance to pollution layer, wherein the resistant layer contains inorganic oxide particles and nothing
At least part volume extension of machine matrix of oxide, at least part inorganic oxide particles protrudes from inorganic oxide matrix
Surface.Resistance to pollution layer of the invention has excellent persistence.The invention further relates to the preparation method of the optical module and its
Application in photovoltaic module.
Background technique
In conventional configurations, photovoltaic module includes photovoltaic cell, the encapsulant on photovoltaic cell two sides and difference position
Two panels in the opposite front side and rear side of encapsulant.This stromatolithic structure provides the mechanical support to photovoltaic cell, and
Protect them against damage caused by due to environmental factor.Described two panels are commonly referred to as front side layer layer and back side layer (or back
Plate).At least front side layer layer is transparent to solar radiation, commonly uses glass material.The glass of common photovoltaic module is can
Light transmittance in light-exposed range is greater than about 92%, it means that about 8% light loses because of reflection.If it is possible to take
Measure reduces reflection loss, increases light transmittance, can necessarily improve the power output of photovoltaic module to a certain extent.Application subtracts
Reflecting layer is a kind of common solution.Antireflection layer can be improved the output power of photovoltaic module about by reducing reflection
2.5%.However, the surface of these antireflection layers is easy absorption water and dust.Therefore, over time, on the surface of antireflection layer
The dirt of accumulation can reduce the anti-reflective effect of coating.Thus (glass) front side layer layer for applying antireflection layer is caused to use one section
Light transmittance declines after time, so that the output power of photovoltaic module be made to decline.To solve such problems, it has been proposed that
Apply one layer of coating, such as low surface energy coat on antireflection layer, to assign anti-pollution characteristic.But such low-surface-energy applies
Risk of the layer in the presence of the anti-reflective effect that can reduce antireflection layer.
The pending patent application CN103048706A of applicant discloses a kind of antireflective and anti-pollution characteristic of being provided simultaneously with
Optical module, wherein the array of particles that is made of multiple bulky grains in deposited on substrates and be partially filled with multiple bulky grain it
Between gap nano particle.Since the partial size difference of bulky grain and nano particle forms " isomery " grain structure, to assign resistance to
Dirty performance simultaneously avoids possible antireflective deterioration problem.The patent application is hereby incorporated by reference herein.
On this basis, if it is possible to so that the anti-pollution characteristic of optical module is persistently kept, it is clear that be advantageous.In this way
Optical module when for photovoltaic module can to avoid due to the failure of resistance to pollution layer to the shadow of photovoltaic module power output stability
It rings.
Therefore, the invention is intended to provide a kind of optical module, by applying antireflection layer and resistance to pollution layer on substrate,
Described in resistance to pollution layer contain inorganic oxide particles and inorganic oxide matrix, at least part inorganic oxide particles are at least
A part of volume extension protrudes from inorganic oxide matrix surface, to provide lasting resistance to soiling, Jin Erman for optical module
Foot the demand.The present invention also provides the method for preparing the optical module and its applications in photovoltaic module.
Summary of the invention
One embodiment of the invention is a kind of optical module, it includes:
Substrate；
Square antireflection layer on the substrate；With
Resistance to pollution layer above the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide base
At least part volume extension of matter, at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.
Another embodiment of the invention is a kind of method for preparing above-mentioned optical module comprising following steps:
Antireflection layer is applied on substrate；With
Resistance to pollution layer is applied on the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide
At least part volume extension of matrix, at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.
Yet another embodiment of the present invention is a kind of photovoltaic module, and it includes above-mentioned optical modules.
It was found by the inventors of the present invention that optical module of the invention has anti-pollution characteristic, and resistant can be kept for a long time
Performance.By the permanent power output for improving photovoltaic module when optical module of the present invention is in for photovoltaic module.
Detailed description of the invention
Attached drawing constitutes part of specification to assist a further understanding of the present invention, and following specific
Embodiment is used to illustrate together the present invention, but is not construed as limiting the invention.In the accompanying drawings:
Fig. 1 is the schematic side elevation according to the optical module of one embodiment of the invention；
Fig. 2 is resistance to soiling test data；
Fig. 3 is the photo obtained in the test of resistant persistence；
Fig. 4 is resistance to soiling field test data.
It should be understood that attached drawing is not to be drawn to scale.
Specific embodiment
Terms used herein " top " refers to " directly above " and " above indirectly ", i.e., intermediate to be optionally present other objects
Body.
Terms used herein " at least part inorganic oxide particles " refers to such as 30- in inorganic oxide particles
100 weight %, 40-100 weight %, 50-100 weight %, 60-100 weight %, 70-100 weight %, 80-100 weight %, 90-100 weights
Measure % or 100 weight %.
Terms used herein " at least part volume " refers to accounting for such as 10-60 body of inorganic oxide particles total volume
Product %, 10-50 volume %, 10-40 volume %, 10-30 volume %, 10-20 volume %, 20-60 volume %, 20-50 volume %, 20-40 body
Product %, 20-30 volume %, 30-60 volume %, 30-50 volume %, 30-40 volume %, 40-60 volume %, 40-50 volume % or 50-60
Volume %.
According to an aspect of the present invention, it is related to a kind of optical module, it includes:
Substrate；
Square antireflection layer on the substrate；With
Resistance to pollution layer above the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide base
At least part volume extension of matter, at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.
It is as shown in Figure 1 according to a kind of embodiment of the optical module of present disclosure.In Fig. 1, optical module 100 is wrapped
Include substrate 101；Square antireflection layer 104 on the substrate；With the resistance to pollution layer 107 above the antireflection layer 104, wherein
The resistance to pollution layer 107 contains inorganic oxide particles 106 and inorganic oxide matrix 105, at least part inorganic oxide
At least part volume of grain 106 extends the surface for protruding from inorganic oxide matrix 105.Antireflection layer 104 includes porous layer
103 and between the substrate 101 and porous layer 103 in lower layer 102.
Substrate 101 can be the front side layer layer and back side layer of photovoltaic module.When being used as the front side layer layer of photovoltaic module, preferred base
Material 101 is transparent or semitransparent.In improving at one, preferred substrates 101 are selected from glass, polymer and semiconductor, more preferably
For glass.
Antireflection layer 104 can be prepared according to the routine techniques in this field.For example, in an arrangement, antireflection layer
104 include porous layer 103.In another scheme, antireflection layer 104 includes porous layer 103 and is located at the substrate 101 and more
Between aperture layer 103 in lower layer 102.It is non-porous in lower layer 102.It is about in the solid content of lower layer 102 in being improved at one
2-5 weight %, with a thickness of about 20-110nm.The solid content of porous layer 103 is about 2-10 weight %, and porosity is about 40-70 body
Product %, with a thickness of about 100-500nm, preferably from about 100-400nm, more preferably from about 100-250nm.
Resistance to pollution layer 107 contains inorganic oxide particles 106.In improving at one, resistance to pollution layer 107 contains about 0.1-10 weight
%, preferably from about 0.5-8 weight %, the more preferably from about inorganic oxide particles of 1-5 weight % are measured, based on the total amount of resistance to pollution layer 107.
The partial size of inorganic oxide particles is about 50-300nm, preferably from about 80-250nm, more preferably from about 100-200nm.Inorganic oxide
Particle is selected from silica, titanium dioxide, aluminium oxide, zirconium oxide and combinations thereof.Inorganic oxide particles have rule or do not advise
Then shape.For example, inorganic oxide particles can be sphere, spheroid, regular dodecahedron, triacontahedron, irregular polyhedrons
Or other any suitable shapes.
Resistance to pollution layer 107 contains inorganic oxide matrix 105.Inorganic oxide matrix 105 includes silica dioxide gel.One
In a improvement, is reacted by tetraethyl orthosilicate (TEOS) with hydrochloric acid and silica dioxide gel is formed in situ.By adjusting resistance to pollution layer
The amount of inorganic oxide particles 106 and inorganic oxide matrix 105 in 107, so that at least part inorganic oxide
At least part volume of grain 106 extends the surface for protruding from inorganic oxide matrix 105.In being improved at one, relative to institute
The total amount of inorganic oxide particles 106 is stated, the amount of inorganic oxide matrix is about 1-5 weight %, preferably from about 2-4 weight %.
According to an aspect of the present invention, it is related to a kind of method for preparing above-mentioned optical module comprising following steps:
Antireflection layer is applied on substrate；With
Resistance to pollution layer is applied on the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide
At least part volume extension of matrix, at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.
The step of applying antireflection layer includes: optionally to be applied to lower layer and application porous layer.In some embodiments, such as
Under be applied to lower layer: mixing tetraethyl orthosilicate (TEOS) and hydrochloric acid form silica dioxide gel solution, by silica dioxide gel
Solution is applied on substrate, and dry.In some embodiments, apply porous layer as follows: mixing TEOS is formed with hydrochloric acid
Silica dioxide gel solution is added polymeric beads into silica dioxide gel solution and partial size is about 50-300nm, preferably from about 80-
Obtained suspension is applied to substrate or if there is under by 250nm, the more preferably from about silica dioxide granule of 100-200nm
Layer is then applied in lower layer.
In a variant, be applied to lower layer as follows: mixed weight ratio is about 1:0.1-10, preferably from about 1:0.5-5, more excellent
About 1:1-2 is selected, for example, about TEOS of 1:1.5 and aqueous hydrochloric acid solution form silica dioxide gel solution, and wherein the pH of hydrochloric acid is 2.
Silica dioxide gel solution is applied on substrate.It can be carried out by modes such as blade coating, curtain coating, spin coating, roller coating.It is preferred that passing through
Spin coating carries out, and wherein spin speed is about 500-2000rpm.At about 50-150 DEG C, dry about 1-20 points at preferably from about 100 DEG C
Clock, preferably from about 5-10 minute are formed described in lower layer.
In a variant, apply porous layer as follows: mixed weight ratio is about 1:0.1-10, preferably from about 1:0.5-5, more excellent
1:1-2 is selected, for example, about TEOS of 1:1.5 and aqueous hydrochloric acid solution form silica dioxide gel solution, and wherein the pH of hydrochloric acid is 2.To
About 1-10 weight %, the preferably polymeric beads of 2-5 weight % are added in silica dioxide gel solution, be partial size is about 20-100nm
Polymethyl methacrylate (PMMA).Silica dioxide granule is added into silica dioxide gel solution again, wherein silica
The additional amount of particle is about 0.1-5 weight % and partial size is about 50-300nm, preferably from about 80-250nm, more preferably from about 100-
200nm.Obtained suspension is applied on substrate or is then applied in lower layer if there is in lower layer.It can be by scraping
The modes such as painting, curtain coating, spin coating, roller coating carry out.It is preferred that being carried out by spin coating, wherein spin speed is 500-2000rpm.Then into
Row tempering.In one embodiment, tempering includes being heated to 600-750 DEG C and holding about 120-180 seconds, then
It is quenched to room temperature.Tempering burns up the polymeric beads in porous layer, and the gap left forms the hole of porous layer.
The step of applying resistance to pollution layer includes: that mixing tetraethyl orthosilicate (TEOS) and hydrochloric acid formation silica dioxide gel are molten
Liquid mixes silica dioxide gel solution and inorganic oxide particles, obtained suspension is applied on antireflection layer, and is done
It is dry.In a variant, apply resistance to pollution layer as follows: mixed weight ratio is about 1:0.1-10, preferably from about 1:0.5-5, more preferably from about
1:1-2, for example, about TEOS of 1:1.5 and aqueous hydrochloric acid solution form silica dioxide gel solution, and wherein the pH of hydrochloric acid is 2.Mixing
Silica dioxide granule and deionized water obtain silica-particle suspension, and wherein the amount of silica dioxide granule is about 0.1-10 weight
%, preferably from about 0.5-8 weight %, more preferably from about 1-5 weight % are measured, and partial size is about 50-300nm, preferably from about 80-250nm, more
Preferably from about 100-200nm.Silica dioxide gel solution and silica-particle suspension are mixed, wherein silica dioxide gel solution
Dosage make the total amount relative to silica dioxide granule, the amount of silica dioxide gel is about 1-5 weight %, preferably from about 2-4 weight
Measure %.Gained mixing suspension is applied on antireflection layer.It can be carried out by modes such as blade coating, curtain coating, spin coating, roller coating.It is excellent
Spin coating progress was gated, wherein spin speed is about 500-2000rpm, and coating layer thickness is about the single monolayer thick of silica dioxide granule
Degree.It is about 1-20 minutes dry at preferably from about 100 DEG C at about 50-150 DEG C, preferably from about 5-10 minutes, form resistance to pollution layer.
Surprisingly it has been found that optical module of the invention has anti-pollution characteristic, and anti-pollution characteristic can be kept for a long time.
Improve the power output of photovoltaic module when optical module of the present invention is in for photovoltaic module for a long time.
Embodiment
Keep bright the features and advantages of the invention apparent by following embodiment.Embodiment is intended to describe rather than with any
Mode limits the present invention.
Reagent list:
TEOS: tetraethyl orthosilicate, Commercial reagents
Hydrochloric acid: Commercial reagents, concentration are 36 weight %
PMMA pearl: commercially available polymethyl methacrylate bead, partial size 50nm
Silica dioxide granule: commercially available, partial size 100nm.
Embodiment 1:
Coat antireflection layer
The aqueous hydrochloric acid solution that weight ratio mixing TEOS and pH with 1:1.5 is 2 prepares silica dioxide gel solution 500g.Further
The aqueous hydrochloric acid solution that pH is 2 is added and is diluted to 2000g.By acquired solution spin coater with the deposition rate of 1000rpm in glass
On substrate.Dry coating 10 minutes at 100 DEG C, it is formed in lower layer, coating layer thickness 50nm.
The aqueous hydrochloric acid solution that weight ratio mixing TEOS and pH with 1:1.5 is 2 prepares silica dioxide gel solution 500g.Into
One step is added the aqueous hydrochloric acid solution that pH is 2 and is diluted to 1850g.100g partial size is added into solution as the PMMA pearl of 50nm, then plus
Enter the silica dioxide granule that 50g partial size is 100nm.By gained suspension spin coater with the deposition rate of 1000rpm under
On layer.The glass baseplate of coating is heated to 700 DEG C and is kept for 120 seconds, then quenching cools to room temperature, forms porous layer, applies
Layer is with a thickness of 120nm.
Coat resistance to pollution layer
The aqueous hydrochloric acid solution that weight ratio mixing TEOS and pH with 1:1.5 is 2 prepares silica dioxide gel solution 100g.By 100g
Partial size is that the silica dioxide granule of 100nm is mixed with 1900g deionized water.17g is added into gained suspension in preceding preparation
Silica dioxide gel solution, by gained mixing suspension spin coater with the deposition rate of 1000rpm on antireflection layer, coating
With a thickness of 100nm.Dry coating 10 minutes at 100 DEG C, resistance to pollution layer is formed.
Comparative example 1
Preparation embodiment 1 is repeated, silica dioxide gel solution is added without when the difference is that coating resistance to pollution layer.
Performance test
Using the glass baseplate for not carrying out any processing as reference, the optical module of embodiment 1 and the preparation of comparative example 1 is divided
It Zuo Wei not optical module of the present invention and comparison optical module, progress resistance to soiling and the test of resistant persistence.
Resistance to soiling test is following to be carried out: sand material (no particular requirement) being dispersed on optical module to be tested, shakes 1 point
Clock makes the dispersion of sand material on the test specimen.The saturating of the sample for being dispersed with sand material thereon is obtained with spectrophotometer Lambda 950
Light rate, calculate the light transmittance and test before the sample initial light transmission between difference (light transmittance decline), it is resistance to characterize
Dirty performance.
Resistance to soiling test result is shown in Fig. 2.Fig. 2 is shown, is deposited as dirt on the glass baseplate of reference (sand material)
Seriously, caused light transmittance falls to 1.4%；The dirt deposition of comparison optical module is alleviated, and corresponding light transmittance is fallen to
1.2%；Optical module of the present invention further reduces dirt deposition, and corresponding light transmittance falls to 1.1%.The above results show,
Optical module of the present invention provides the anti-pollution characteristic better than comparison optical module.
The test of resistant persistence is as follows: in resistance to soiling test, sand material (no particular requirement) being dispersed in light to be tested
It learns on component, vibration sand material 10 minutes to implement scraping effect to sample.Obtain sweeping for the coating surface of the sample of test front and back
Retouch electron micrograph.By the electron scanning micrograph before and after contrast test, the coating surface structure of sample is determined
The reserving degree of integrality, to characterize the persistence of anti-pollution characteristic.
Resistant persistence test result is shown in Fig. 3.Fig. 3 is shown, after a test, compares the titanium dioxide on optical module
Silicon particle almost falls off, to mean that resistance to soiling is severely damaged.In contrast to this, on optical module of the present invention
Silica dioxide granule largely retain, thus mean optical module of the present invention have lasting resistance to soiling.
The field test of resistance to soiling: during on September 8, to September 18th 2017, optical module to be tested is placed in
On the outdoor roof in the laboratory in Shanghai.Its light transmittance of daily 12:00 on-the-spot test, records itself and initial light transmission
Difference is denoted as light transmittance decline, is mapped with this.
The field test of resistance to soiling is as the result is shown in Fig. 4.Fig. 4 is shown, undergoes 4 day rainy day (9 during field test
Months 9-11 day with September 14 days).Because dirt deposits, light transmittance decline occurs for tested optical module.After continuous rainfall, thoroughly
The decline of light rate is alleviated, it may be possible to which rain drop erosion is walked caused by dirt.For the glass baseplate as reference, final light transmittance
Fall to 1.7%；For comparing optical module, final light transmittance falls to 0.9%；For optical module of the present invention, final
Light transmittance falls to 0.7%.It is such the results show that optical module of the present invention provide better than comparison optical module resistance to soiling
Energy.Fig. 4 also shows that before testing the phase, the anti-pollution characteristic of optical module of the present invention is equal to comparison optical module, and enters test
After mid-term, the anti-pollution characteristic of optical module of the present invention starts better than comparison optical module, and over time, this superiority into
One step increases.The field test result of resistance to soiling further displays, and optical module of the present invention has excellent resistance to soiling and excellent
Resistant persistence.
It will be understood by those skilled in the art that can be changed to the embodiment above without departing from its inventive concept.
It is to be understood, therefore, that the present invention is not limited to disclosed specific embodiments, and it is intended to cover the sheet that appended claims determine
Modification in spirit and range.
Reference signs list:
100 optical modules
101 substrates
102 in lower layer
103 porous layers
104 antireflection layers
105 inorganic oxide matrix
106 inorganic oxide particles
107 resistance to pollution layers
Claims (16)
1. a kind of optical module, it includes:
Substrate；
Square antireflection layer on the substrate；With
Resistance to pollution layer above the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide base
At least part volume extension of matter, at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.
2. optical module as described in claim 1, wherein the substrate is selected from glass, polymer and semiconductor.
3. optical module as described in claim 1, wherein the substrate is transparent or semitransparent.
4. optical module as described in claim 1, wherein the partial size of the inorganic oxide particles is 50-300nm, preferably
80-250nm, more preferable 100-200nm.
5. optical module as described in claim 1, wherein the inorganic oxide particles be selected from silica, titanium dioxide,
Aluminium oxide, zirconium oxide and combinations thereof.
6. optical module as described in claim 1, wherein the inorganic oxide matrix includes silica dioxide gel, it is preferably logical
It crosses tetraethyl orthosilicate and reacts the silica dioxide gel being formed in situ with hydrochloric acid.
7. optical module as described in claim 1, wherein the total amount based on the resistance to pollution layer, the resistance to pollution layer contains 0.1-10
Weight %, preferably 0.5-8 weight %, the inorganic oxide particles of more preferable 1-5 weight %.
8. optical module as described in claim 1, wherein the total amount based on the inorganic oxide particles, the inorganic oxide
The amount of object matrix is 1-5 weight %, preferably 2-4 weight %.
9. optical module as described in claim 1, wherein antireflection layer includes porous layer, and optionally includes being located at the substrate
Between porous layer in lower layer.
10. a kind of method for preparing optical module as described in claim 1 comprising following steps:
Antireflection layer is applied on substrate；With
Resistance to pollution layer is applied on the antireflection layer, wherein the resistant layer contains inorganic oxide particles and inorganic oxide
At least part volume extension of matrix, at least part inorganic oxide particles protrudes from inorganic oxide matrix surface.
11. method as claimed in claim 10, wherein the step of applying antireflection layer includes: optionally to be applied to lower layer and application
Porous layer.
12. method as claimed in claim 11, wherein be applied to lower layer comprising steps of
It mixes tetraethyl orthosilicate and hydrochloric acid forms silica dioxide gel solution,
Silica dioxide gel solution is applied on substrate, and
It is dry.
13. method as claimed in claim 11, wherein apply porous layer comprising steps of
It mixes tetraethyl orthosilicate and hydrochloric acid forms silica dioxide gel solution,
Polymeric beads are added into silica dioxide gel solution and partial size is 50-300nm, preferably 80-250nm, more preferable 100-
The silica dioxide granule of 200nm, and
Obtained suspension is coated in substrate or is then coated in lower layer if there is in lower layer.
14. method as claimed in claim 11, wherein the step of applying resistance to pollution layer includes:
It mixes tetraethyl orthosilicate and hydrochloric acid forms silica dioxide gel solution,
Silica dioxide gel solution and inorganic oxide particles are mixed,
Obtained suspension is applied on antireflection layer, and
It is dry.
15. method as claimed in claim 11, wherein the step of applying resistance to pollution layer includes:
Mixed weight ratio is the tetraethyl orthosilicate and salt of 1:0.1-10, preferably 1:0.5-5, more preferable 1:1-2, such as 1:1.5
Aqueous acid forms silica dioxide gel solution, and wherein the pH of hydrochloric acid is 2；
Mixing silica dioxide granule and deionized water obtain silica-particle suspension, and wherein the amount of silica dioxide granule is
0.1-10 weight %, preferably 0.5-8 weight %, more preferable 1-5 weight %, and partial size be 50-300nm, preferably 80-250nm, more
It is preferred that 100-200nm；
Silica dioxide gel solution and silica-particle suspension are mixed, wherein the dosage of silica dioxide gel solution makes phase
For the total amount of silica dioxide granule, the amount of silica dioxide gel is 1-5 weight %, preferably 2-4 weight %；
Gained mixing suspension spin coating is applied on porous layer, wherein spin speed is 500-2000rpm, coating layer thickness two
The thickness in monolayer of silicon oxide particle；With
It is 1-20 minutes, preferably 5-10 minutes dry at preferably 100 DEG C at 50-150 DEG C.
16. a kind of photovoltaic module, it includes optical modules as described in claim 1, and wherein substrate is glass.
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| US7005188B2 (en) * | 1999-05-20 | 2006-02-28 | Saint-Gobain | Transparent substrate with an antireflection, low-emissivity or solar-protection coating |
| CN102050456A (en) * | 2010-11-26 | 2011-05-11 | 国营红阳机械厂 | Method for forming silicon dioxide aerogel heat-insulating composite material |
| CN103534208A (en) * | 2011-05-13 | 2014-01-22 | 默克专利有限公司 | Process for producing inorganic particulate material |
| CN104238007A (en) * | 2014-09-19 | 2014-12-24 | 中航光电科技股份有限公司 | Optical signal transmitting device |
| CN105612222A (en) * | 2013-10-22 | 2016-05-25 | 陶氏环球技术有限责任公司 | Aqueous coating composition and process of making the same |
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|---|---|---|---|---|
| US7005188B2 (en) * | 1999-05-20 | 2006-02-28 | Saint-Gobain | Transparent substrate with an antireflection, low-emissivity or solar-protection coating |
| CN102050456A (en) * | 2010-11-26 | 2011-05-11 | 国营红阳机械厂 | Method for forming silicon dioxide aerogel heat-insulating composite material |
| CN103534208A (en) * | 2011-05-13 | 2014-01-22 | 默克专利有限公司 | Process for producing inorganic particulate material |
| CN105612222A (en) * | 2013-10-22 | 2016-05-25 | 陶氏环球技术有限责任公司 | Aqueous coating composition and process of making the same |
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Application publication date: 20190816 |