CN110111265B - Method and apparatus for correcting overlay pattern - Google Patents
Method and apparatus for correcting overlay pattern Download PDFInfo
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- CN110111265B CN110111265B CN201910271683.7A CN201910271683A CN110111265B CN 110111265 B CN110111265 B CN 110111265B CN 201910271683 A CN201910271683 A CN 201910271683A CN 110111265 B CN110111265 B CN 110111265B
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- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000004088 simulation Methods 0.000 claims description 50
- 238000005259 measurement Methods 0.000 claims description 25
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 230000004075 alteration Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 206010063385 Intellectualisation Diseases 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
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- G06—COMPUTING; CALCULATING OR COUNTING
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- G06T5/90—Dynamic range modification of images or parts thereof
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Abstract
The present disclosure provides a method and an apparatus for correcting an overlay pattern. The correction method of the superposed graphs comprises the steps of simulating a plurality of superposed simulated graphs through a measuring system, transmitting the superposed simulated graphs to an active pattern correction system through the measuring system, and correcting the superposed simulated graphs through the active pattern correction system to generate superposed corrected graphs, so that the superposed graphs can be optimized in real time.
Description
[ technical field ] A method for producing a semiconductor device
The present disclosure relates to the field of display technologies, and in particular, to a method and an apparatus for correcting an overlay pattern.
[ background of the invention ]
In the existing correction method of the overlay graphics, the overlay graphics can be corrected only by importing the overlay graphics data of off-line (offline) and manual measurement into a control computer, and the real-time performance of the control computer for correcting the overlay graphics is poor due to the overlong time interval for waiting for the off-line and manual measurement of the overlay graphics.
Therefore, it is desirable to provide a method and an apparatus for correcting an overlay pattern to solve the problems of the prior art.
[ summary of the invention ]
In order to solve the above-mentioned technical problem, an object of the present disclosure is to provide a method and an apparatus for correcting an overlay pattern, which can optimize the overlay pattern in real time.
To achieve the above objective, the present disclosure provides a method for correcting overlay patterns. The correction method of the overlay graphics comprises simulating a plurality of overlay simulation graphics through a measurement system, transmitting the overlay simulation graphics to an active pattern correction system through the measurement system, and correcting the overlay simulation graphics through the active pattern correction system to generate overlay correction graphics.
In an embodiment of the present disclosure, the method for calibrating overlay patterns further includes providing alignment data to the measurement system through an alignment tool.
In an embodiment of the present disclosure, the method for calibrating overlay patterns further includes simulating the overlay simulation patterns according to the alignment data by the metrology system.
In one embodiment of the present disclosure, the method for correcting the overlay pattern further includes adjusting a plane mirror unit by the active pattern correction system to correct the overlay simulation pattern and generate the overlay correction pattern.
In one embodiment of the present disclosure, the method for calibrating overlay patterns further includes transmitting the overlay calibration patterns to the metrology system via the active pattern calibration system, and simulating the overlay simulation patterns according to the overlay calibration patterns via the metrology system.
The present disclosure also provides a device for correcting the overlay pattern. The correction device of the overlay graph comprises a measurement system and an active pattern correction system. The metrology system is configured to simulate a plurality of superimposed simulation patterns. The active pattern correction system is connected with the measurement system. The metrology system is configured to transmit the overlay simulation graphic to the active pattern correction system, which is configured to correct the overlay simulation graphic to produce an overlay corrected graphic.
In one embodiment of the present disclosure, the overlay pattern calibration apparatus further includes an alignment tool connected to the measurement system and configured to provide alignment data to the measurement system.
In one embodiment of the present disclosure, the measurement system simulates the overlay simulation pattern according to the alignment data.
In one embodiment of the present disclosure, the overlay pattern correction apparatus further includes a plane mirror unit, and the active pattern correction system is connected to the plane mirror unit and configured to adjust the plane mirror unit to correct the overlay simulation pattern and generate the overlay correction pattern.
In one embodiment of the present disclosure, the active pattern correction system is configured to transmit the overlay correction pattern to the metrology system, and the metrology system is configured to simulate the overlay simulation pattern based on the overlay correction pattern.
According to the correction method and the correction device for the overlay graphics, disclosed by the embodiment of the disclosure, a plurality of overlay simulation graphics are simulated by the measurement system, the overlay simulation graphics are transmitted to the active pattern correction system by the measurement system, and the overlay simulation graphics are corrected by the active pattern correction system to generate the overlay correction graphics, so that the overlay graphics can be optimized in real time.
In order to make the aforementioned and other aspects of the present disclosure more comprehensible, preferred embodiments accompanied with figures are described in detail below:
[ description of the drawings ]
FIG. 1 is a flowchart illustrating a method for correcting overlay patterns according to an embodiment of the present disclosure; and
FIG. 2 is a block diagram of an apparatus for correcting overlay patterns according to an embodiment of the present disclosure.
[ detailed description ] embodiments
In order to make the aforementioned and other objects, features and advantages of the present disclosure comprehensible, preferred embodiments accompanied with figures are described in detail below. Furthermore, directional phrases used in this disclosure, such as, for example, upper, lower, top, bottom, front, rear, left, right, inner, outer, lateral, peripheral, central, horizontal, lateral, vertical, longitudinal, axial, radial, uppermost or lowermost, etc., refer only to the orientation of the attached drawings. Accordingly, the directional terms used are used for the purpose of illustration and understanding of the present disclosure, and are not used to limit the present disclosure.
In the drawings, elements having similar structures are denoted by the same reference numerals.
Referring to fig. 1-2, an embodiment of the present disclosure provides a method 100 for overlay pattern correction. The overlay graphic correction method 100 includes: block 110, simulating a plurality of overlay simulation patterns by the metrology system 210, block 120, transmitting the overlay simulation patterns to the active pattern correction system 220 by the metrology system 210, and block 130, correcting the overlay simulation patterns by the active pattern correction system 220 to generate overlay correction patterns.
In the embodiment of the disclosure, a plurality of overlay simulation graphs are simulated by the measurement system 210, the overlay simulation graphs are transmitted to the active pattern correction system 220 by the measurement system 210 in real time, and the overlay simulation graphs are corrected by the active pattern correction system 220 in real time to generate overlay correction graphs, so that the overlay simulation graphs can be optimized in real time, and the problem that in the prior art, the poor real-time performance of correcting the overlay graphs by the control computer due to the fact that the overlay graph data needing to be offline (offline) and manually measured is imported into the control computer is solved.
In one embodiment of the present disclosure, the overlay pattern calibration method 100 further includes providing alignment data to the metrology system 210 via an alignment tool 230. The method 100 further includes simulating the overlay simulation pattern by the metrology system 210 according to the alignment data. The overlay pattern correction method 100 further includes adjusting a mirror unit 240 by the active pattern correction system 220 to correct the overlay simulation pattern and generate the overlay correction pattern.
In one embodiment of the present disclosure, the method 100 further includes transmitting the overlay calibration pattern to the metrology system 210 via the active pattern calibration system 220, and simulating the overlay simulation pattern according to the overlay calibration pattern via the metrology system 210.
Referring to fig. 2, an embodiment of the present disclosure provides a correction apparatus 200 for overlay patterns. The overlay pattern correction apparatus 200 includes a metrology system 210 and an active pattern correction system 220. The metrology system 210 is configured to simulate a plurality of superimposed simulation profiles. The active pattern correction system 220 is coupled to the metrology system 210. The metrology system 210 is configured to transmit the overlay simulation to the active pattern correction system 220, and the active pattern correction system 220 is configured to correct the overlay simulation to produce an overlay correction pattern.
In the embodiment of the disclosure, a plurality of overlay simulation graphs are simulated by the measurement system 210, the overlay simulation graphs are transmitted to the active pattern correction system 220 by the measurement system 210 in real time, and the overlay simulation graphs are corrected by the active pattern correction system 220 in real time to generate overlay correction graphs, so that the overlay simulation graphs can be optimized in real time, and the problem that in the prior art, the poor real-time performance of correcting the overlay graphs by the control computer due to the fact that the overlay graph data needing to be offline (offline) and manually measured is imported into the control computer is solved.
In one embodiment of the present disclosure, the calibration apparatus 200 for overlay simulation graphics further comprises an alignment tool 230, wherein the alignment tool 230 is connected to the measurement system 210 and configured to provide alignment data to the measurement system 210. The measurement system 210 simulates the overlay simulation pattern according to the alignment data.
In one embodiment of the present disclosure, the device 200 for correcting the overlay simulation pattern further comprises a mirror unit 240, and the active pattern correction system 220 is connected to the mirror unit 240 and configured to adjust the mirror unit 240 to correct the overlay simulation pattern and generate the overlay correction pattern.
In one embodiment of the present disclosure, the active pattern correction system 220 is configured to transmit the overlay correction pattern to the metrology system 210, and the metrology system 210 is configured to simulate the overlay simulation pattern based on the overlay correction pattern.
According to the correction method and the correction device for the overlay graphics in the embodiment of the disclosure, a plurality of overlay simulation graphics are simulated by the measurement system, the overlay simulation graphics are transmitted to the active pattern correction system by the measurement system, and the overlay simulation graphics are corrected by the active pattern correction system to generate the overlay correction graphics, so that the overlay simulation graphics can be optimized in real time. The embodiment of the disclosure can save the productivity of an off-line measuring machine and the manpower for manually importing data, and can also correct the superimposed simulation graph in real time through the active pattern correction system, thereby realizing factory intellectualization, for example, improving the integration of a color filter in a flat panel display technology into an array substrate (COA) process.
Although the disclosure has been shown and described with respect to one or more implementations, equivalent alterations and modifications will occur to others skilled in the art based upon a reading and understanding of this specification and the annexed drawings. The present disclosure includes all such modifications and alterations, and is limited only by the scope of the appended claims. In particular regard to the various functions performed by the above described components, the terms used to describe such components are intended to correspond, unless otherwise indicated, to any component which performs the specified function of the described component (e.g., that is functionally equivalent), even though not structurally equivalent to the disclosed structure which performs the function in the herein illustrated exemplary implementations of the specification. In addition, while a particular feature of the specification may have been disclosed with respect to only one of several implementations, such feature may be combined with one or more other features of the other implementations as may be desired and advantageous for a given or particular application. Furthermore, to the extent that the terms "includes," has, "" contains, "or variants thereof are used in either the detailed description or the claims, such terms are intended to be inclusive in a manner similar to the term" comprising.
The foregoing is merely a preferred embodiment of the present disclosure, and it should be noted that modifications and refinements may be made by those skilled in the art without departing from the principle of the present disclosure, and these modifications and refinements should also be construed as the protection scope of the present disclosure.
Claims (2)
1. A method for correcting an overlay pattern, comprising:
simulating a plurality of superposed simulation graphs by a measuring system;
transmitting the overlay simulation pattern to an active pattern correction system via the metrology system;
correcting the overlay simulation graph by the active pattern correction system to generate an overlay correction graph, transmitting the overlay correction graph to the measurement system by the active pattern correction system, and simulating the overlay simulation graph by the measurement system according to the overlay correction graph;
providing alignment data to the measurement system through an alignment machine;
simulating the superposition simulation graph by the measurement system according to the alignment data; and
and adjusting the plane mirror unit through the active pattern correction system to correct the superposed simulation pattern and generate the superposed correction pattern.
2. An apparatus for correcting an overlay pattern, comprising:
a metrology system configured to simulate a plurality of superimposed simulation figures;
an active pattern correction system connected to the metrology system;
an alignment tool coupled to the metrology system and configured to provide alignment data to the metrology system; and
a mirror unit, wherein the active pattern correction system is connected to the mirror unit and configured to adjust the mirror unit to correct the overlay simulation pattern and generate an overlay correction pattern;
wherein the metrology system is configured to transmit the overlay simulated graphics to the active pattern correction system, the active pattern correction system is configured to correct the overlay simulated graphics to produce overlay corrected graphics, the active pattern correction system is configured to transmit the overlay corrected graphics to the metrology system, the metrology system is configured to simulate the overlay simulated graphics based on the overlay corrected graphics, the metrology system simulates the overlay simulated graphics based on the alignment data.
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| CN103905719A (en) * | 2012-12-27 | 2014-07-02 | 财团法人金属工业研究发展中心 | Correcting sheet for correcting multiple image capturing devices and correcting method thereof |
| CN105100792A (en) * | 2015-09-21 | 2015-11-25 | 上海碧虎网络科技有限公司 | Geometric figure projection imaging automatic correction device and correction method thereof |
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Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007306106A (en) * | 2006-05-09 | 2007-11-22 | Sony Corp | Imaging apparatus, imaging method, and program |
| TWD190227S (en) * | 2015-12-30 | 2018-05-01 | 雷諾簡化股份有限公司 | Stop light for vehicles |
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| CN103905719A (en) * | 2012-12-27 | 2014-07-02 | 财团法人金属工业研究发展中心 | Correcting sheet for correcting multiple image capturing devices and correcting method thereof |
| CN105100792A (en) * | 2015-09-21 | 2015-11-25 | 上海碧虎网络科技有限公司 | Geometric figure projection imaging automatic correction device and correction method thereof |
| WO2018124267A1 (en) * | 2016-12-28 | 2018-07-05 | Ricoh Company, Ltd. | Image processing apparatus, image capturing system, image processing method, and recording medium |
| CN108093251A (en) * | 2017-12-25 | 2018-05-29 | 青岛海信电器股份有限公司 | A kind of method, apparatus and display of correction display parameter |
| CN108061968A (en) * | 2018-01-05 | 2018-05-22 | 京东方科技集团股份有限公司 | A kind of head-up display device and display image correcting method |
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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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