CN110105879A - High-flatness dumb light finish polishing wax and preparation method thereof - Google Patents
High-flatness dumb light finish polishing wax and preparation method thereof Download PDFInfo
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- CN110105879A CN110105879A CN201910473998.XA CN201910473998A CN110105879A CN 110105879 A CN110105879 A CN 110105879A CN 201910473998 A CN201910473998 A CN 201910473998A CN 110105879 A CN110105879 A CN 110105879A
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- polishing powder
- flatness
- polishing
- mullite
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
- C09G1/08—Other polishing compositions based on wax
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The present invention provides a kind of high-flatness dumb light finish polishing waxes and preparation method thereof, including water, the aluminum oxide polishing powder for the mat surface that can dish out, the high-flatness surface that can dish out mullite polishing powder, surface can be made to generate the phosphoric acid and other additives that corrode on a small quantity, with the total weight of buffing wax, the aluminum oxide polishing powder content is 8wt%-30wt%, mullite polishing powder content is 4wt%-15wt%, and the phosphorus acid content is 0.01wt%-0.1wt%.Aluminum oxide polishing powder therein can generate shear action to lacquer painting, so that surface is generated the effect of dumb light, phosphoric acid can also generate some corrosion to lacquer painting, increase the effect of dumb light, and mullite polishing powder can make lacquer painting generate high flatness.According to the requirement of the matte degree of specific lacquer painting and flatness requirement, can be realized by adjusting aluminum oxide polishing powder, phosphoric acid and polishing the proportion of mullite polishing powder.Additionally provide a kind of preparation method for high-flatness dumb light finish polishing wax, operability with higher.
Description
Technical field
The present invention relates to finish polishing technical field, especially a kind of high-flatness dumb light finish polishing wax and its preparation side
Method.
Background technique
Relative to the surface treatment mode of spraying, it can make workpiece surface that there is better flatness and outer by polishing technology
Appearance quality.Existing polishing technology mainly has mechanical polishing, chemical polishing, electrobrightening, ultrasonic polishing and fluid polishing,
And for lacquer painting material, the most commonly used is mechanical polishinges and fluid polishing technology.Mechanical polishing is by shear action by workpiece table
The convex portion in face, which removes, obtains the polishing method of smooth surface, generally using cotton piece buff, wool wheel, grinding wheel etc., collocation polishing
The auxiliary tools such as polishing machine can be used for the part of special shape by manual operations or by machine operations in wax.Fluid is thrown
Light is the abrasive grain of the liquid and its carrying by adjustment flowing, washes away repeatedly in workpiece surface and reaches polishing purpose, common method
Have: abrasive jet machining, liquid injection processing, fluid-dynamic abrasive etc..Fluid therein mainly uses to flow at low pressures
It moves the preferable liquid of property and mixes abrasive material and be made.Above it is finish polishing method generally used now, but is all unable to reach Gao Ping
It is whole to have the effect of dumb light again while spend.
Summary of the invention
In view of the above shortcomings of the prior art, can make workpiece surface i.e. the object of the present invention is to provide one kind has high put down
There are also the high-flatness dumb light finish polishing waxes of matte effect simultaneously for whole degree.
The present invention is realized in that above-mentioned purpose:
High-flatness dumb light finish polishing wax of the present invention, including water, the mat surface that can dish out aluminum oxide polishing powder, can dish out height
The mullite polishing powder on flatness surface can make surface generate the phosphoric acid and other additives corroded on a small quantity, with the total of buffing wax
Poidometer, the aluminum oxide polishing powder content is 8wt%-30wt%, mullite polishing powder content is 4wt%-15wt%, described
Phosphorus acid content is 0.01wt%-0.1wt%.
Further, the aluminum oxide polishing powder is partial size < 0.5 μm α-nano aluminium oxide polishing powder, and the mullite is thrown
Partial size < 0.5 μm of light powder.
Further, other additives include the single stearic acid glycerine lipoprotein and tristearin that slurry can be made to generate smooth sense
Acid, the mono- 4- octyl phenyl ether of surfactant polyoxyethylene and the polyether silicone that film strength can be increased.
Further, with the total weight of buffing wax, the water content is 50wt%-61.9wt%, the aluminium oxide polishing
Powder content is 10wt%-30 wt%, and the mullite polishing powder content is 5wt%-15wt%, the single stearic acid glycerine lipoprotein content
For 1wt%-2wt%, the stearic acid content is 1wt%-10wt%, and the mono- 4- octyl phenyl ether content of polyoxyethylene is
0.1wt%-0.5wt%, the phosphorus acid content are 0.01wt%-0.1wt%, and the polyether silicone content is 0.1wt%-0.5wt%.
Further, with the total weight of buffing wax, the water content is 58.05wt%, the aluminum oxide polishing powder content
For 25wt%, the mullite polishing powder content is 10wt%, and the single stearic acid glycerine lipoprotein content is 1.5%, and the stearic acid contains
Amount is 5wt%, and the mono- 4- octyl phenyl ether content of polyoxyethylene is 0.2wt%, and the phosphorus acid content is 0.05wt%, described poly-
Ether content of siloxane is 0.2wt%.
Further, with the total weight of buffing wax, the water content is 60.65wt%, the aluminum oxide polishing powder content
For 30wt%, the mullite polishing powder content is 5wt%, and the single stearic acid glycerine lipoprotein content is 2%, the stearic acid content
For 2wt%, the mono- 4- octyl phenyl ether content of polyoxyethylene is 0.1wt%, and the phosphorus acid content is 0.05wt%, the polyethers
Content of siloxane is 0.2wt%.
A kind of preparation method for high-flatness dumb light finish polishing wax, includes the following steps:
1) 70 degree are heated water to；
2) single stearic acid glycerine lipoprotein and stearic acid is added；
3) aluminum oxide polishing powder is added；
4) mullite polishing powder is added；
5) the mono- 4- octyl phenyl ether of polyoxyethylene is added；
6) above-mentioned slurry is sufficiently stirred and is cooled to 60 degree at room temperature after forty minutes；
7) phosphoric acid and polyether silicone is added and stirs evenly；
It 8), can discharging wait be cooled to 50 degree.
Beneficial effects of the present invention: the present invention provides a kind of high-flatness dumb light finish polishing wax, aluminium oxide therein
Polishing powder has irregular crystal shape, can generate shear action to lacquer painting, surface is made to generate very tiny scratch,
Light is allowed to generate the effect of dumb light in surface diffusion, there are also wherein a small amount of phosphoric acid can also generate some corrosion to lacquer painting, increases
The effect of dumb light, and mullite polishing powder is more soft and tiny than aluminium oxide, and lacquer painting can be made to generate high flatness.According to specific
The matte degree of lacquer painting requires and flatness requirement, can be by adjusting aluminum oxide polishing powder, phosphoric acid and polishing mullite polishing powder
Proportion realize.
Additionally provide a kind of preparation method for high-flatness dumb light finish polishing wax, operability with higher.
Specific embodiment
High-flatness dumb light finish polishing wax, including water, the mat surface that can dish out aluminum oxide polishing powder, can dish out Gao Ping
The mullite polishing powder on whole degree surface can make surface generate the phosphoric acid and other additives corroded on a small quantity, with the gross weight of buffing wax
Meter, the aluminum oxide polishing powder content is 8wt%-30wt%, mullite polishing powder content is 4wt%-15wt%, the phosphorus
Acid content is 0.01wt%-0.1wt%.
In general, to have the most direct mode of matte effect is exactly to spray, the dumb light paint being exactly commonly called as, and is used mostly
On color alteration of automobile, principle is that light is allowed to generate scattering on the surface, will have the cloudy surface of texture, such as be produced with polishing mode
The flatness that raw dumb light has had simultaneously again is very difficult, because high-flatness works as table with regard to that can generate high gloss relatively
It will be low-luster and low flatness when face is dumb light.Aluminum oxide polishing powder has irregular crystal in the present invention
Shape can generate shear action to lacquer painting, so that surface is generated very tiny scratch, light be allowed to generate dumb light in surface diffusion
Effect.Phosphoric acid belongs to middle strong acid, and acidity is lower than hydrochloric acid and sulfuric acid, and addition in the slurry, makes some acid ions of rubbing paste band,
Corrode surface slightly, reduces surface brightness, relative increase matte effect.And mullite polishing powder is more soft than aluminium oxide and thin
It is small, lacquer painting can be made to generate high flatness.According to the requirement of the matte degree of specific lacquer painting and flatness requirement, it can pass through and adjust oxidation
It aluminium polishing powder, phosphoric acid and polishes the proportion of mullite polishing powder and realizes.
The aluminum oxide polishing powder is partial size < 0.5 μm α-nano aluminium oxide polishing powder, the grain of the mullite polishing powder
Diameter < 0.5 μm.
Wherein nano aluminium oxide have irregular crystal shape, this special crystalline form be specially six side's closest packings and cube
The form of closest packing is conducive to that surface is made to generate very tiny scratch, allows light in surface diffusion, generate the effect of dumb light
Fruit.Mullite polishing powder is also nanoscale, and can dish out high-flatness.
Other additives include the single stearic acid glycerine lipoprotein and stearic acid, surface-active that slurry can be made to generate smooth sense
The mono- 4- octyl phenyl ether of agent polyoxyethylene and the polyether silicone that film strength can be increased.
Single stearic acid glycerine lipoprotein has the fat group of Long carbon chain, and since its structure has the long alkane of an oleophylic
Base and two hydrophilic hydroxyls, thus there is good surface-active, emulsification can be played and slurry is allowed to generate smooth sense.Surface is living
The dispersion effect of powder can be improved in the property mono- 4- octyl phenyl ether of agent polyoxyethylene, and powder will not be reunited in slurry, be agglomerated
And precipitating, it also allows jeting effect more preferable, prevents spraying system from damaging, polyether silicone is the main ingredient of silicone oil, and silicone oil has
High lubricity, therefore film strength can be improved, can allow polishing when, less easily allow and lose lubricity, avoid generating dry throwing
The case where.
In order to make buffing wax have more preferably polishing effect, with the total weight of buffing wax, the water content is 50wt%-
61.9wt%, the aluminum oxide polishing powder content are 10wt%-30 wt%, and the mullite polishing powder content is 5wt%-15wt%,
The single stearic acid glycerine lipoprotein content is 1wt%-2wt%, and the stearic acid content is 1wt%-10wt%, and the polyoxyethylene is mono-
4- octyl phenyl ether content is 0.1wt%-0.5wt%, and the phosphorus acid content is 0.01wt%-0.1wt%, and the polyether silicone contains
Amount is 0.1wt%-0.5wt%.
The present invention also provides a kind of preparation methods for high-flatness dumb light finish polishing wax, in conjunction with this preparation side
Method is described further the present invention by specific embodiment.
Embodiment 1
1) water of 58.05kg is heated to 70 degree；
2) 1.5kg single stearic acid glycerine lipoprotein and 5kg stearic acid is added；
3) 25kg aluminum oxide polishing powder is added；
4) 10kg mullite polishing powder is added；
5) the mono- 4- octyl phenyl ether of 0.2kg polyoxyethylene is added；
Above step 1) -5) addition sequence can according to need adjustment.
6) above-mentioned mixed slurry is sufficiently stirred and is cooled to 60 degree at room temperature after forty minutes；
7) 0.05kg phosphoric acid and 0.2kg polyether silicone and again that slurry agitation is uniform is added；
It 8), can discharging wait be cooled to 50 degree.
Embodiment 2
1) water of 60.65kg is heated to 70 degree；
2) 2kg single stearic acid glycerine lipoprotein and 2kg stearic acid is added；
3) 30kg aluminum oxide polishing powder is added；
4) 5kg mullite polishing powder is added；
5) the mono- 4- octyl phenyl ether of 0.1kg polyoxyethylene is added；
Above step 1) -5) addition sequence can according to need adjustment.
6) above-mentioned mixed slurry is sufficiently stirred and is cooled to 60 degree at room temperature after forty minutes；
7) 0.05kg phosphoric acid and 0.2kg polyether silicone and again that slurry agitation is uniform is added；
It 8), can discharging wait be cooled to 50 degree.
In above embodiments, in comparison mullite polishing powder content is more in embodiment 1, and when polishing can be such that surface throws
It is comparatively smooth, and brightness is relatively high.Implement just that aluminum oxide polishing powder content is more in 2, when polishing can be such that surface draws
Trace is relatively more, so diffusion is stronger, and matte effect is relatively preferable.
Claims (7)
1. a kind of high-flatness dumb light finish polishing wax, it is characterised in that: the aluminium oxide polishing including water, the mat surface that can dish out
Powder, the high-flatness surface that can dish out mullite polishing powder, surface can be made to generate the phosphoric acid and other additives that corrode on a small quantity, with
The total weight of buffing wax, the aluminum oxide polishing powder content is 8wt%-30wt%, mullite polishing powder content is 4wt%-
15wt%, the phosphorus acid content are 0.01wt%-0.1wt%.
2. high-flatness dumb light finish polishing wax according to claim 1, it is characterised in that: the aluminum oxide polishing powder is grain
Diameter < 0.5 μm α-nano aluminium oxide polishing powder, partial size < 0.5 μm of the mullite polishing powder.
3. high-flatness dumb light finish polishing wax according to claim 1, it is characterised in that: other additives include energy
Make slurry generate single stearic acid glycerine lipoprotein and the mono- 4- octyl phenyl ether of stearic acid, surfactant polyoxyethylene of smooth sense with
And the polyether silicone of film strength can be increased.
4. the according to claim 1 or 2 or 3 high-flatness dumb light finish polishing waxes, it is characterised in that: with the gross weight of buffing wax
Meter, the water content are 50wt%-61.9wt%, and the aluminum oxide polishing powder content is 10wt%-30 wt%, the mullite
Polishing powder content is 5wt%-15wt%, and the single stearic acid glycerine lipoprotein content is 1wt%-2wt%, and the stearic acid content is
1wt%-10wt%, the mono- 4- octyl phenyl ether content of polyoxyethylene are 0.1wt%-0.5wt%, and the phosphorus acid content is
0.01wt%-0.1wt%, the polyether silicone content are 0.1wt%-0.5wt%.
5. the according to claim 1 or 2 or 3 high-flatness dumb light finish polishing waxes, it is characterised in that: with the gross weight of buffing wax
Meter, the water content are 58.05wt%, and the aluminum oxide polishing powder content is 25wt%, and the mullite polishing powder content is
10wt%, the single stearic acid glycerine lipoprotein content are 1.5%, and the stearic acid content is 5wt%, the mono- 4- octyl of polyoxyethylene
Phenyl ether content is 0.2wt%, and the phosphorus acid content is 0.05wt%, and the polyether silicone content is 0.2wt%.
6. the according to claim 1 or 2 or 3 high-flatness dumb light finish polishing waxes, it is characterised in that: with the gross weight of buffing wax
Meter, the water content are 60.65wt%, and the aluminum oxide polishing powder content is 30wt%, and the mullite polishing powder content is
5wt%, the single stearic acid glycerine lipoprotein content are 2%, and the stearic acid content is 2wt%, the mono- 4- octyl benzene of polyoxyethylene
Base ether content is 0.1wt%, and the phosphorus acid content is 0.05wt%, and the polyether silicone content is 0.2wt%.
7. a kind of preparation method for high-flatness dumb light finish polishing wax, it is characterised in that: include the following steps:
1) 70 degree are heated water to；
2) single stearic acid glycerine lipoprotein and stearic acid is added；
3) aluminum oxide polishing powder is added；
4) mullite polishing powder is added；
5) the mono- 4- octyl phenyl ether of polyoxyethylene is added；
6) above-mentioned slurry is sufficiently stirred and is cooled to 60 degree at room temperature after forty minutes；
7) phosphoric acid and polyether silicone is added and stirs evenly；
It 8), can discharging wait be cooled to 50 degree.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910473998.XA CN110105879A (en) | 2019-06-02 | 2019-06-02 | High-flatness dumb light finish polishing wax and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910473998.XA CN110105879A (en) | 2019-06-02 | 2019-06-02 | High-flatness dumb light finish polishing wax and preparation method thereof |
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| CN110105879A true CN110105879A (en) | 2019-08-09 |
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| CN201910473998.XA Pending CN110105879A (en) | 2019-06-02 | 2019-06-02 | High-flatness dumb light finish polishing wax and preparation method thereof |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0387988A1 (en) * | 1989-02-15 | 1990-09-19 | Minnesota Mining And Manufacturing Company | Buffing composition |
| CN1926211A (en) * | 2003-12-03 | 2007-03-07 | 卡尔－韦斯特特殊涂料公司 | Silica-free surface abrasion compositions and their uses |
| CN101591510A (en) * | 2008-05-26 | 2009-12-02 | 3M创新有限公司 | Lacquer painting treatment compositions, lacquer painting processing method and lacquer painting method for repairing and mending |
| CN105272380A (en) * | 2015-10-29 | 2016-01-27 | 姚燕春 | Preparation method of matt tiles and equipment |
-
2019
- 2019-06-02 CN CN201910473998.XA patent/CN110105879A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0387988A1 (en) * | 1989-02-15 | 1990-09-19 | Minnesota Mining And Manufacturing Company | Buffing composition |
| CN1926211A (en) * | 2003-12-03 | 2007-03-07 | 卡尔－韦斯特特殊涂料公司 | Silica-free surface abrasion compositions and their uses |
| CN101591510A (en) * | 2008-05-26 | 2009-12-02 | 3M创新有限公司 | Lacquer painting treatment compositions, lacquer painting processing method and lacquer painting method for repairing and mending |
| CN105272380A (en) * | 2015-10-29 | 2016-01-27 | 姚燕春 | Preparation method of matt tiles and equipment |
Non-Patent Citations (1)
| Title |
|---|
| 马兴元等: "《合成革化学与工艺学》", 30 November 2015, 中国轻工业出版社 * |
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Application publication date: 20190809 |
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