CN110105369A - A kind of preparation method and application of two pyrazines fused ring compound - Google Patents
A kind of preparation method and application of two pyrazines fused ring compound Download PDFInfo
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- CN110105369A CN110105369A CN201910418837.0A CN201910418837A CN110105369A CN 110105369 A CN110105369 A CN 110105369A CN 201910418837 A CN201910418837 A CN 201910418837A CN 110105369 A CN110105369 A CN 110105369A
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 33
- 238000002360 preparation method Methods 0.000 title description 11
- 150000003216 pyrazines Chemical class 0.000 title description 7
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 125000001424 substituent group Chemical group 0.000 claims abstract description 8
- 239000010409 thin film Substances 0.000 claims abstract description 7
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 claims abstract description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000004327 boric acid Substances 0.000 claims abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- SKOWZLGOFVSKLB-UHFFFAOYSA-N hypodiboric acid Chemical compound OB(O)B(O)O SKOWZLGOFVSKLB-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 4
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 4
- 150000002367 halogens Chemical class 0.000 claims abstract description 4
- 125000004442 acylamino group Chemical group 0.000 claims abstract description 3
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 3
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims abstract description 3
- 150000002148 esters Chemical class 0.000 claims abstract description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims abstract description 3
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 3
- 125000003638 stannyl group Chemical group [H][Sn]([H])([H])* 0.000 claims abstract description 3
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 3
- 125000001118 alkylidene group Chemical group 0.000 claims abstract 2
- 230000017260 vegetative to reproductive phase transition of meristem Effects 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- 150000004996 alkyl benzenes Chemical class 0.000 claims 1
- 238000007641 inkjet printing Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- -1 flowering structure Chemical class 0.000 abstract description 8
- 238000010189 synthetic method Methods 0.000 abstract description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 18
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- 229930192474 thiophene Natural products 0.000 description 14
- 229940125782 compound 2 Drugs 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 8
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 8
- 229910017604 nitric acid Inorganic materials 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- DYHSDKLCOJIUFX-UHFFFAOYSA-N tert-butoxycarbonyl anhydride Chemical compound CC(C)(C)OC(=O)OC(=O)OC(C)(C)C DYHSDKLCOJIUFX-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
- 239000005864 Sulphur Substances 0.000 description 6
- OIGLJQJSZJIDSO-UHFFFAOYSA-N 2,5-dinitrothiophene Chemical compound [O-][N+](=O)C1=CC=C([N+]([O-])=O)S1 OIGLJQJSZJIDSO-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000008187 granular material Substances 0.000 description 4
- 229910052738 indium Inorganic materials 0.000 description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 4
- 239000013067 intermediate product Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 150000002240 furans Chemical class 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- JIZRGGUCOQKGQD-UHFFFAOYSA-N 2-nitrothiophene Chemical compound [O-][N+](=O)C1=CC=CS1 JIZRGGUCOQKGQD-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- XAQHXGSHRMHVMU-UHFFFAOYSA-N [S].[S] Chemical compound [S].[S] XAQHXGSHRMHVMU-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000007385 chemical modification Methods 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 125000005594 diketone group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 125000002541 furyl group Chemical group 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 238000004128 high performance liquid chromatography Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 239000012779 reinforcing material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000003577 thiophenes Chemical class 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 1
- JJQBWCOFORHRQI-UHFFFAOYSA-N 2-hexan-3-ylthiophene Chemical compound CCCC(CC)C1=CC=CS1 JJQBWCOFORHRQI-UHFFFAOYSA-N 0.000 description 1
- FTBBGQKRYUTLMP-UHFFFAOYSA-N 2-nitro-1h-pyrrole Chemical compound [O-][N+](=O)C1=CC=CN1 FTBBGQKRYUTLMP-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940126214 compound 3 Drugs 0.000 description 1
- 239000002322 conducting polymer Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000011263 electroactive material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000009878 intermolecular interaction Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- IAIWVQXQOWNYOU-FPYGCLRLSA-N nitrofural Chemical compound NC(=O)N\N=C\C1=CC=C([N+]([O-])=O)O1 IAIWVQXQOWNYOU-FPYGCLRLSA-N 0.000 description 1
- 229960001907 nitrofurazone Drugs 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/12—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains three hetero rings
- C07D487/14—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/12—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains three hetero rings
- C07D495/14—Ortho-condensed systems
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/653—Aromatic compounds comprising a hetero atom comprising only oxygen as heteroatom
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1003—Carbocyclic compounds
- C09K2211/1007—Non-condensed systems
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- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1044—Heterocyclic compounds characterised by ligands containing two nitrogen atoms as heteroatoms
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- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
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- C09K2211/1088—Heterocyclic compounds characterised by ligands containing oxygen as the only heteroatom
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- C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
- C09K2211/10—Non-macromolecular compounds
- C09K2211/1018—Heterocyclic compounds
- C09K2211/1025—Heterocyclic compounds characterised by ligands
- C09K2211/1092—Heterocyclic compounds characterised by ligands containing sulfur as the only heteroatom
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- Chemical & Material Sciences (AREA)
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- Spectroscopy & Molecular Physics (AREA)
- Thin Film Transistor (AREA)
Abstract
The present invention provides the synthetic methods and application of a kind of two pyrazine fused ring compounds and its derivative, i.e. general formula is the compound of Fig. 1, which includes the semiconducting compound such as flowering structure, wherein R1And R2It can be the same or different, and it is selected from substituent R, which is the straight chain optionally replaced (i) with 1 to 20 carbon atom, branching or cyclic alkyl chain, alkoxy, amino, acylamino-, silicyl or alkenyl, or (ii) polymerizable or reactive group, the group are selected from ester, alkylidene and the stannyl of halogen, boric acid, hypoboric acid and boric acid and hypoboric acid.Z independently is S, O, Se, NR`, and wherein R` is H or substituent group.The organic semiconductor compound is used as active layer in organic semiconductor device such as thin film transistor (TFT).
Description
Technical field
The present invention relates to a kind of preparation method and applications of two pyrazine fused ring compounds.
Background technique
In recent years, molecule base conjugated material arouses widespread concern, such as some containing sulphur, nitrogen, the thienyl of oxygen,
The heterocycles such as pyridyl group, pyrrole radicals and furyl small organic molecule and its macromolecule, these materials are in organic semiconducting materials and electricity
There is good application in terms of sub- device, novel pi-conjugated organic semi-conductor design and synthesis have attracted more and more researchs
The concern of person, because they have potential application value in various photoelectric devices.It is especially linearly condensed and
Ring class molecule can be applied to organic field effect tube (OFETs), light emitting diode (LEDs) and photovoltaic cell (Anthony,
J. E. Chem. Rev. 2006,106,5028.).
Research interest in recent years focuses primarily upon pentacene and its derivative.Existing research shows (referring to Lin, Y.-
Y.; Gundlach, D. J.; Nelson, S. F.; Jackson, T. N. IEEE Electron Device Lett.
1997,18,606.) its SiO in chemical modification2OFET device made of/Si substrate deposition shows that outstanding charge carries
Stream transport factor is 1.5 cm2/(V·s).But there is many defects when pentacene is applied to device, such as poor solubility,
Limited stability and the accumulation unfavorable in solid-state in air, overcoming a strategy of these defects is in condensed ring system
Introducing hetero-atoms construct more stable trapezoidal condensed molecule.Sulphur shows various points as the introducing of thiophene-structure
Interaction between son, such as Van der Waals force, pi-pi accumulation and sulphur-sulphur interaction, these all play one to high mobility is obtained
Fixed effect.In addition, the introducing of nitrogen-atoms can be good at the stability of reinforcing material.
Using organic semiconductor compared to used to date in organic field thin film transistor (OTFT)
Inorganic semiconductor have the advantages that it is some they can be processed in the form of any from fiber to film, there is high mechanical flexibility, energy
It is produced with low cost and light-weight.For example, being at first polythiophene in addition, poly- (3- hexyl) thiophene to the report of polyheterocycle base OTFT
And a, a- dialkyl group Uniformpoly thiophene are the high mobility polymer occurred at first and small molecule respectively.To these chemical combination between the several years
The chemical modification (variation including ring ring connectivity and substitution form) of object has obtained quite a lot of electroactive material.
But there is many defects when being applied to device, for example, poor solubility, in air limited stability and
It is that introducing hetero-atoms are more stable to construct in condensed ring system that the unfavorable accumulation of solid-state, which overcomes a strategy of these defects,
Trapezoidal condensed molecule.Sulphur shows various intermolecular interactions, such as Van der Waals as the introducing of thiophene-structure
Power, π pi accumulation and the interaction of sulphur sulphur, these all play a role to high mobility is obtained.In addition, nitrogen-atoms
Introduce the stability that can be good at reinforcing material.
Since conducting polymer is found, organic semiconductor is because of scene effect transistor, light emitting diode and light
Volt field of batteries has huge application prospect and attracts attention.Compared to inorganic material, not only structure can be cut organic material, property
The advantages that energy is adjustable, while being also equipped with low cost, reduction process temperature, solution processable, flexible.But unlike that inorganic semiconductor
Continuous band structure, organic semi-conductor energy level be it is discrete, charge transmission dependent on carrier from a molecular transport to
The ability of another molecule, and this and packing of molecules, energy level and band gap are closely bound up, (Wang chengliang etc.
Chem.Soc.Rev., 2018,47,422--500).
Summary of the invention
It is an object of that present invention to provide the preparation method and applications of a kind of nitrogenous, oxygen, the fused ring compound of sulphur.For existing
The deficiency of technology, the present invention is intended to provide a kind of preparation method of two pyrazine fused ring compounds of nitrogenous, oxygen, sulphur, by its preparation
Condensed conjugated material have excellent solubility property and carrier transmission performance, be dissolved in organic solvent, then apply
On the substrates such as ito glass, silicon wafer or ceramics, it is capable of forming after heating anneal appropriate processing soft, high-sequential
Transparent membrane;Pi-conjugated structure big simultaneously is conducive to carrier transport, therefore the present invention also provides a kind of nitrogenous, sulphur condensed ring
Application of the compound in Organic Thin Film Transistors field.It is realized by two pyrazine fused ring compound (Fig. 1) of general formula.
Wherein R1And R2, can be the same or different, and be selected from substituent R, which is (i) to have 1 to 20
The straight chain of carbon atom optionally replaced, branching or cyclic alkyl chain, alkoxy, amino, acylamino-, silicyl or alkenyl,
Or (ii) polymerizable or reactive group, the group are selected from ester, the Asia of halogen, boric acid, hypoboric acid and boric acid and hypoboric acid
Alkyl and stannyl.Z independently is S, O, Se, NR`, and wherein R` is H or substituent group.
Detailed description of the invention
Fig. 1 is a kind of structure chart of two pyrazine fused ring compounds;
Fig. 2 is reaction synthetic route general formula figure;
Fig. 3 is the synthetic route chart of compound 1;
Fig. 4 is the synthetic route chart of compound 2;
Fig. 5 is the synthetic route chart of compound 3;
Fig. 6 is the synthetic route chart of compound 4.
Specific embodiment
Its reaction process is as shown in Figure 2.
Starting material is commercially available, known compound or easily prepared intermediate be by using this field skill in the literature
Standard synthetic methods known to art personnel and program preparation.The standard for preparing organic molecule and functional group conversion and transformation is closed
It can easily be obtained by this field related science document or standard textbook at methods and procedures.It should be understood that when to the source of an allusion
When type or preferred process conditions (i.e. reaction temperature, time, reactant molar ratio, solvent, pressure etc.), unless otherwise stated,
Also other process conditions can be used.Optimum reaction condition can change with specific reactants used or solvent, but such
Part can be determined by those skilled in the art by routine optimisation procedures.Organic synthesis field technical staff will be recognized in order to excellent
Change the formation of compound described herein, thus it is possible to vary the property and sequence of provided synthesis step, the method for the invention can
With any appropriate method monitoring known according to this field.Such as spectrum means such as nuclear magnetic resonance spectrometry (MR, example can be passed through
Such as H or C), infra-red sepectrometry (IR), spectrophotometry (such as UV- is visible), mass spectrography (MS) or pass through chromatography such as high pressure liquid
Chromatography (HPLC), gas chromatography (GC), the shape of gel permeation chromatography (GPC) or thin-layered chromatography (TLC) monitoring product
At reaction described herein or method can carry out in the suitable solvent that can be readily selected by organic synthesis field technical staff.
Suitable solvent usually at a temperature of reacting carried out, i.e., can be solvent freezing point to solvent boiling point at a temperature of to anti-
Answering object, intermediate and/or product substantially does not have reactivity.Given reaction can be in a kind of solvent or in the mixed of more than one solvent
It closes and is carried out in object.Depending on specific reaction step, the solvent for being suitble to specific reaction step can choose, two Pyrazines are preferable
It is prepared using shown in following reaction scheme Fig. 2:
Step (a) (b) (c) (d) (e) is described in
(a) (b) and (d) is described in Zou Yingping, Adv. Funct. Mater. 2008,18,2724-2732;
(c) Yamamoto etc., Tetrahedron, 2018,74,5309-5318 are described in;
(e) it is described in the Tetrahedron such as Ahra Go 71 (2015) 1215-1226.
Embodiment 1:
The specific preparation method of compound is as follows, and synthesis equation is Fig. 3:
(1) at 50 DEG C, by thiophene (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 mol/L), nitric acid (4.00-
5.00 mol/Ls) it is mixed in chloroform, reaction obtains compound 2,5- dinitro thiophene in 1-2 days;
(2) 80-110 DEG C by compound 2,5- dinitro thiophene (0.60-0.65 mol/L) and zinc granule (120-200 grams/
Rise) it is added in hydrochloric acid, compound intermediate product 2, bis- amido thiophene of 5- are obtained after carrying out reduction;
(3) at 15-30 DEG C, under the atmosphere of argon gas protection, by compound 2, bis- amido thiophene of 5- (0.75-0.85 moles/
Rise) it is dissolved in ethanol solution, di-tert-butyl dicarbonate (1.50-1.70 mol/L) is added dropwise and reacts 10-30 minutes, obtains chemical combination
Object 2,5- di tert butyl carbonate amido thiophene;
(4) at 50 DEG C, by 2,5- di tert butyl carbonate amido thiophene (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 moles/
Rise), nitric acid (4.00-5.00 mol/L) be mixed in chloroform, reaction obtains compound 2, bis- amido -3,4- bis- of 5- in 1-2 days
Nitrothiophene;
(5) under nitrogen atmosphere, by compound 2, bis- amido -3,4- dinitro thiophene of 5- (1.00-1.20 mol/L), phenyl
Diketone (2.00-4.40 mol/L), indium (1.00-1.20 mol/L), indium trichloride (1.00-1.20 mol/L) are dissolved in
In methanol solution, it is stirred at reflux 10-20h.Obtain solid chemical combination phenyl substituted thiophene and two pyrazine compounds 1.
Embodiment 2:
The specific preparation method of compound is as follows, and synthesis equation is Fig. 4:
(1) at 50 DEG C, by thiophene (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 mol/L), nitric acid (4.00-
5.00 mol/Ls) it is mixed in chloroform, reaction obtains compound 2,5- dinitro thiophene in 1-2 days;
(2) 80-110 DEG C by compound 2,5- dinitro thiophene (0.60-0.65 mol/L) and zinc granule (120-200 grams/
Rise) it is added in hydrochloric acid, compound intermediate product 2, bis- amido thiophene of 5- are obtained after carrying out reduction;
(3) at 15-30 DEG C, under the atmosphere of argon gas protection, by compound 2, bis- amido thiophene of 5- (0.75-0.85 moles/
Rise) it is dissolved in ethanol solution, di-tert-butyl dicarbonate (1.50-1.70 mol/L) is added dropwise and reacts 10-30 minutes, obtains chemical combination
Object 2,5- di tert butyl carbonate amido thiophene;
(4) at 50 DEG C, by 2,5- di tert butyl carbonate amido thiophene (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 moles/
Rise), nitric acid (4.00-5.00 mol/L) be mixed in chloroform, reaction obtains compound 2, bis- amido -3,4- bis- of 5- in 1-2 days
Nitrothiophene;
(5) under nitrogen atmosphere, by compound 2, bis- amido -3,4- dinitro thiophene of 5- (1.00-1.20 mol/L), phenanthrenequione
(2.00-4.40 mol/L), indium (1.00-1.20 mol/L), indium trichloride (1.00-1.20 mol/L) are dissolved in methanol
In solution, it is stirred at reflux 10-20h.Obtain solid chemical combination phenanthryl fused thiophene and two pyrazine compounds 2.
Embodiment 3:
The specific preparation method of compound is as follows, and synthesis equation is Fig. 5:
(1) at 50 DEG C, by furans (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 mol/L), nitric acid (4.00-
5.00 mol/Ls) it is mixed in chloroform, reaction obtains compound 2,5- dinitro furans in 1-2 days;
(2) 80-110 DEG C by compound 2,5- dinitro furans (0.60-0.65 mol/L) and zinc granule (120-200 grams/
Rise) it is added in hydrochloric acid, compound intermediate product 2, bis- amido furans of 5- are obtained after carrying out reduction;
(3) at 15-30 DEG C, under the atmosphere of argon gas protection, by compound 2, bis- amido furans of 5- (0.75-0.85 moles/
Rise) it is dissolved in ethanol solution, di-tert-butyl dicarbonate (1.50-1.70 mol/L) is added dropwise and reacts 10-30 minutes, obtains chemical combination
Object 2,5- di tert butyl carbonate amido furans;
(4) at 50 DEG C, by 2,5- di tert butyl carbonate amido furans (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 moles/
Rise), nitric acid (4.00-5.00 mol/L) be mixed in chloroform, reaction obtains compound 2, bis- amido -3,4- bis- of 5- in 1-2 days
Nitrofuran;
(5) under nitrogen atmosphere, by compound 2, bis- amido -3,4- dinitro furans (1.00-1.20 mol/L) of 5-, hexamethylene
Base diketone (2.00-4.40 mol/L), indium (1.00-1.20 mol/L), indium trichloride (1.00-1.20 mol/L) are molten
In methanol solution, it is stirred at reflux 10-20h.Obtain solidification cyclization hexyl substituted furan and two pyrazine compounds 3.
Embodiment 4:
The specific preparation method of compound is as follows, and synthesis equation is Fig. 6:
(1) at 50 DEG C, by pyrroles's (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 mol/L), nitric acid (4.00-
5.00 mol/Ls) it is mixed in chloroform, reaction obtains compound 2,5- dinitro pyrroles in 1-2 days;
(2) 80-110 DEG C by compound 2,5- dinitro thiophene (0.60-0.65 mol/L) and zinc granule (120-200 grams/
Rise) it is added in hydrochloric acid, compound intermediate product 2, bis- amido pyrroles of 5- are obtained after carrying out reduction;
(3) at 15-30 DEG C, under the atmosphere of argon gas protection, by compound 2, bis- amido pyrroles of 5- (0.75-0.85 moles/
Rise) it is dissolved in ethanol solution, di-tert-butyl dicarbonate (1.50-1.70 mol/L) is added dropwise and reacts 10-30 minutes, obtains chemical combination
Object 2,5- di tert butyl carbonate amido pyrroles;
(4) at 50 DEG C, by 2,5- di tert butyl carbonate amido pyrroles (1.00-1.20 mol/L), sulfuric acid (4.00-5.00 moles/
Rise), nitric acid (4.00-5.00 mol/L) be mixed in chloroform, reaction obtains compound 2, bis- amido -3,4- bis- of 5- in 1-2 days
Nitro-pyrrole;
(5) under nitrogen atmosphere, by compound 2, bis- amido -3,4- dinitro pyrroles of 5- (1.00-1.20 mol/L), furans
Base diketone (2.00-4.40 mol/L), indium (1.00-1.20 mol/L), indium trichloride (1.00-1.20 mol/L) are molten
In methanol solution, it is stirred at reflux 10-20h.Obtain solid chemical combination furyl substituted thiophene and two pyrazine compounds 4.
Device preparation
Using top electrode structure, the Si/SiO of OTS modification2In substrate, high vacuum (2 × 10-4Pa Deposit organic semiconductor under)
Layer.SiO with 500 nm thickness2Layer and 7.5 nF cm-2The n-type silicon wafer of capacitor is as grid.Source-drain electrode utilizes mask plate
Gold electrode (50 nm) is deposited on organic semiconductor layer, ditch road widthW =8.8 mm, it is longL= 80 μm.Organic semiconductor film
Deposition rate is gradually accelerated from 0.1/s to 0.4 ~ 0.6/s, and film thickness is detected by quartz crystal monitoring device, most
Whole deposition thickness is 50 nm.The mobility [mu] of material can be obtained by the calculation formula of the mobility of saturation regionFET: the electricity of saturation region
Stream-voltage relationship are as follows:I DS = (μ FET WC i /2L)(V G- V T)2, formula (1-1), the electrical property of device is in Keithley
It is measured on 4200 SCS semiconductor analysis instrument.All measurements are at room temperature, carry out in atmosphere.
Claims (10)
1. Fig. 1 is two pyrazine fused ring compounds;Such compound is a kind of organic semiconductor device, the organic semiconductor device packet
Semiconducting compound containing such as flowering structure, wherein R1And R2, can be the same or different, and be selected from substituent R, the substituent R
It is the straight chain optionally replaced (i) with 1 to 20 carbon atom, branching or cyclic alkyl chain, alkoxy, amino, acylamino-,
Silicyl or alkenyl, or (ii) polymerizable or reactive group, the group are selected from halogen, boric acid, hypoboric acid and boric acid
With the ester, alkylidene and stannyl of hypoboric acid;Z is S, O, Se, NR`, and wherein R` is H or substituent group.
2. device according to claim 1, wherein the compound is oligomer.
3. thin film transistor (TFT), it includes the devices according to any one of the above claim.
4. optical device, it includes right thin film transistor (TFT)s according to claim 3.
5. electroluminescent device, it includes thin film transistor (TFT)s according to claim 4.
6. being used to form the solution of thin film transistor (TFT), which includes solute, which includes as described in claim 1 organic
Semiconducting compound.
7. solution according to claim 6, it includes solvent, solvent is selected from the benzene replaced.
8. solution according to claim 7, wherein the solvent is replaced by one or more substituent groups selected from halogen and alkyl
Benzene.
9. the method for being used to form transistor, this method includes that will be applied to according to the solution of claim 6 or claim 7
On substrate.
10. method according to claim 9, wherein the solution is applied by ink jet printing.
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