CN110098052A - 一种晶界层电容器的制作方法 - Google Patents
一种晶界层电容器的制作方法 Download PDFInfo
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- CN110098052A CN110098052A CN201910311066.5A CN201910311066A CN110098052A CN 110098052 A CN110098052 A CN 110098052A CN 201910311066 A CN201910311066 A CN 201910311066A CN 110098052 A CN110098052 A CN 110098052A
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- 239000003990 capacitor Substances 0.000 title claims abstract description 91
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 239000007800 oxidant agent Substances 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 24
- 230000001590 oxidative effect Effects 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 12
- 238000012360 testing method Methods 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- 238000009413 insulation Methods 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 claims description 7
- 230000005611 electricity Effects 0.000 claims description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 239000004615 ingredient Substances 0.000 claims description 6
- 238000003475 lamination Methods 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 239000002002 slurry Substances 0.000 claims description 6
- 238000010345 tape casting Methods 0.000 claims description 6
- 229910011255 B2O3 Inorganic materials 0.000 claims description 5
- 238000000137 annealing Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000004321 preservation Methods 0.000 claims description 5
- 229910000108 silver(I,III) oxide Inorganic materials 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 229910052681 coesite Inorganic materials 0.000 claims description 4
- 229910052906 cristobalite Inorganic materials 0.000 claims description 4
- 239000002270 dispersing agent Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 229910052682 stishovite Inorganic materials 0.000 claims description 4
- 229910052905 tridymite Inorganic materials 0.000 claims description 4
- 239000002518 antifoaming agent Substances 0.000 claims description 3
- 238000000498 ball milling Methods 0.000 claims description 3
- 238000005266 casting Methods 0.000 claims description 3
- 238000007766 curtain coating Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims description 3
- 238000007731 hot pressing Methods 0.000 claims description 3
- 125000001967 indiganyl group Chemical group [H][In]([H])[*] 0.000 claims description 3
- 238000011068 loading method Methods 0.000 claims description 3
- VASIZKWUTCETSD-UHFFFAOYSA-N manganese(II) oxide Inorganic materials [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052755 nonmetal Inorganic materials 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- 229910000018 strontium carbonate Inorganic materials 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims description 2
- 239000013078 crystal Substances 0.000 abstract description 12
- 238000005516 engineering process Methods 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 238000007669 thermal treatment Methods 0.000 abstract description 4
- 229910002370 SrTiO3 Inorganic materials 0.000 abstract description 3
- 238000013459 approach Methods 0.000 abstract description 3
- 238000004891 communication Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 238000003825 pressing Methods 0.000 abstract description 2
- 230000009466 transformation Effects 0.000 abstract 2
- 239000000919 ceramic Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 59
- 150000002500 ions Chemical class 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/1272—Semiconductive ceramic capacitors
- H01G4/1281—Semiconductive ceramic capacitors with grain boundary layer
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
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CN201910311066.5A CN110098052B (zh) | 2019-04-18 | 2019-04-18 | 一种晶界层电容器的制作方法 |
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CN201910311066.5A CN110098052B (zh) | 2019-04-18 | 2019-04-18 | 一种晶界层电容器的制作方法 |
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CN110098052A true CN110098052A (zh) | 2019-08-06 |
CN110098052B CN110098052B (zh) | 2021-07-02 |
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CN201910311066.5A Expired - Fee Related CN110098052B (zh) | 2019-04-18 | 2019-04-18 | 一种晶界层电容器的制作方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111908914A (zh) * | 2020-07-16 | 2020-11-10 | 广州天极电子科技有限公司 | 一种晶界层陶瓷材料、晶界层陶瓷基片的制备方法及其应用 |
CN113135750A (zh) * | 2020-01-16 | 2021-07-20 | 太原科技大学 | 一种提高晶界层电容器电阻的绝缘化剂及其使用方法 |
CN113674994A (zh) * | 2021-09-23 | 2021-11-19 | 广州天极电子科技股份有限公司 | 一种钛酸锶单晶基晶界层电容器材料及其制备方法和应用 |
CN113979745A (zh) * | 2021-11-12 | 2022-01-28 | 合肥工业大学 | 一种介电陶瓷材料及其制备方法 |
EP3965142A1 (en) * | 2020-09-02 | 2022-03-09 | Samsung Electronics Co., Ltd. | Electrical device and semiconductor apparatus including the same |
Citations (5)
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CN1402271A (zh) * | 2001-08-22 | 2003-03-12 | 株式会社村田制作所 | 处理陶瓷电容器的方法 |
CN1629990A (zh) * | 2003-12-15 | 2005-06-22 | 电子科技大学 | 一种新型管式陶瓷电容器的制备方法 |
CN103601488A (zh) * | 2013-12-03 | 2014-02-26 | 广州天极电子科技有限公司 | 一种调控陶瓷电介质微观结构及介电性能的方法 |
CN105916829A (zh) * | 2014-01-21 | 2016-08-31 | 爱普科斯公司 | 介电组合物、介电元件、电子部件和层叠电子部件 |
CN109503129A (zh) * | 2018-11-26 | 2019-03-22 | 华中科技大学 | 一种电场辅助高价反离子控释固化制备梯度陶瓷的方法 |
-
2019
- 2019-04-18 CN CN201910311066.5A patent/CN110098052B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1402271A (zh) * | 2001-08-22 | 2003-03-12 | 株式会社村田制作所 | 处理陶瓷电容器的方法 |
CN1629990A (zh) * | 2003-12-15 | 2005-06-22 | 电子科技大学 | 一种新型管式陶瓷电容器的制备方法 |
CN103601488A (zh) * | 2013-12-03 | 2014-02-26 | 广州天极电子科技有限公司 | 一种调控陶瓷电介质微观结构及介电性能的方法 |
CN105916829A (zh) * | 2014-01-21 | 2016-08-31 | 爱普科斯公司 | 介电组合物、介电元件、电子部件和层叠电子部件 |
CN109503129A (zh) * | 2018-11-26 | 2019-03-22 | 华中科技大学 | 一种电场辅助高价反离子控释固化制备梯度陶瓷的方法 |
Non-Patent Citations (1)
Title |
---|
李慧娟等: "SrTiO3 晶界层电容陶瓷的介电性能与晶粒大小的关系", 《湖北大学学报(自然科学版)》 * |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113135750A (zh) * | 2020-01-16 | 2021-07-20 | 太原科技大学 | 一种提高晶界层电容器电阻的绝缘化剂及其使用方法 |
CN113135750B (zh) * | 2020-01-16 | 2023-05-09 | 太原科技大学 | 一种提高晶界层电容器电阻的绝缘化剂及其使用方法 |
CN111908914A (zh) * | 2020-07-16 | 2020-11-10 | 广州天极电子科技有限公司 | 一种晶界层陶瓷材料、晶界层陶瓷基片的制备方法及其应用 |
CN111908914B (zh) * | 2020-07-16 | 2021-06-18 | 广州天极电子科技股份有限公司 | 一种晶界层陶瓷材料、晶界层陶瓷基片的制备方法及其应用 |
EP3965142A1 (en) * | 2020-09-02 | 2022-03-09 | Samsung Electronics Co., Ltd. | Electrical device and semiconductor apparatus including the same |
US11869926B2 (en) | 2020-09-02 | 2024-01-09 | Samsung Electronics Co., Ltd. | High-k capacitor dielectric having a metal oxide area comprising boron, electrical device, and semiconductor apparatus including the same |
CN113674994A (zh) * | 2021-09-23 | 2021-11-19 | 广州天极电子科技股份有限公司 | 一种钛酸锶单晶基晶界层电容器材料及其制备方法和应用 |
CN113674994B (zh) * | 2021-09-23 | 2022-06-10 | 广州天极电子科技股份有限公司 | 一种钛酸锶单晶基晶界层电容器材料及其制备方法和应用 |
CN113979745A (zh) * | 2021-11-12 | 2022-01-28 | 合肥工业大学 | 一种介电陶瓷材料及其制备方法 |
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Effective date of registration: 20201203 Address after: 030024 Taiyuan City, Shanxi Province Wan Road, No. 66, No. Applicant after: TAIYUAN University OF SCIENCE AND TECHNOLOGY Applicant after: Hubei University Applicant after: NANJING YIFANG JUREN NEW ENERGY TECHNOLOGY Co.,Ltd. Address before: 430062 Wuhan, Hubei Friendship Road, No. 368, Wuchang Applicant before: Hubei University Applicant before: NANJING YIFANG JUREN NEW ENERGY TECHNOLOGY Co.,Ltd. |
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