CN110076128A - The cleaning device of single-layer capacitor process - Google Patents

The cleaning device of single-layer capacitor process Download PDF

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Publication number
CN110076128A
CN110076128A CN201910481287.7A CN201910481287A CN110076128A CN 110076128 A CN110076128 A CN 110076128A CN 201910481287 A CN201910481287 A CN 201910481287A CN 110076128 A CN110076128 A CN 110076128A
Authority
CN
China
Prior art keywords
npp
groove body
fast
hollow
inlet pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910481287.7A
Other languages
Chinese (zh)
Inventor
刘云志
吴继伟
杨国兴
王迪
郝泳鑫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DALIAN DALI KAIPU TECHNOLOGY Co Ltd
Original Assignee
DALIAN DALI KAIPU TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DALIAN DALI KAIPU TECHNOLOGY Co Ltd filed Critical DALIAN DALI KAIPU TECHNOLOGY Co Ltd
Priority to CN201910481287.7A priority Critical patent/CN110076128A/en
Publication of CN110076128A publication Critical patent/CN110076128A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00Accessories or details of general applicability for machines or apparatus for cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

The invention discloses a kind of cleaning devices of single-layer capacitor process, the spray equipment that is connected including NPP groove body and respectively with controller, bubbling device, fast arranging device and impregnate water inlet pipe.The spray equipment that the present invention uses, spraying effect are good;The bubbling device of use, improves air bubble intensity uniformity, and cleaning effect is good;The fast arranging device used is effectively taken away medical fluid foreign matter for being attached to product surface etc. by the quick drain washed;The present invention realizes immersion, overflow, spray, bubbling, the fast combined type cleaning for arranging basic function.

Description

The cleaning device of single-layer capacitor process
Technical field
The present invention relates to single-layer capacitor manufacturing technology field more particularly to a kind of cleanings of single-layer capacitor process Device.
Background technique
Single layer capacitor belongs to semicon industry, and the cleaning of product surface is particularly important, and common cleaning way at all can not The cleannes requirement for reaching the industry seriously affects product quality to will appear Abnormal Insulation, the problems such as capacitance is abnormal.
Common cleaning device is generally immersion, overflow or spray, sputter, plating, develop in capacitor process, It removes photoresist, etch etc. and being required to clean product surface after processing steps, because single layer capacitor packages are light and short, common is clear It washes mode easily to generate fragment and secretly split, seriously affects product qualification rate and product quality.How cleaning effect and product guaranteed Quality is that the problem of facing is needed in each single-layer products technical process.
Summary of the invention
The present invention is to solve the above problems, provide a kind of cleaning device of single-layer capacitor process.
In order to solve the above technical problems, the technical scheme is that the cleaning device of single-layer capacitor process, packet Include NPP groove body and the spray equipment being connected respectively with controller, bubbling device, fast arranging device and immersion water inlet pipe;
NPP groove body is open-topped cavity cuboid structure;
Spray equipment includes the spray tube for being mounted on two sides at the top of NPP groove body, and the outer wall of spray tube is arranged at intervals with several A nozzle, one end of spray tube are connected with spray wig-wag, and the other end of spray tube is connected with spray water inlet pipe;
Bubbling device includes the bubbling wig-wag being mounted at the top of connecting bracket, and the bottom of connecting bracket is equipped with hollow drum Plate is steeped, there are gaps between the hollow surrounding for being bubbled plate and the inner wall of NPP groove body, and hollow bubbling plate divides the interior of NPP groove body Chamber is epicoele and cavity of resorption, and the hollow upper surface for being bubbled plate offers several bubble holes, each bubble holes with hollow bubbling plate Hollow cavity be connected, the hollow quadrangle for being bubbled plate is connected with nitrogen inlet duct, and nitrogen inlet duct and the hollow plate that is bubbled Hollow cavity is connected;
Fast arranging device includes the fast exclusive shell for being mounted on NPP groove body bottom, is connected in turn from the bottom to top in fast exclusive shell Operated pneumatic valve arranges pallet fastly, arranges sealing ring fastly, and the bottom surface of the NPP groove body above fast row's sealing ring offers fast row's mouth;
It impregnates water inlet pipe and is mounted on the bottom of NPP groove body, and impregnate water inlet pipe and be connected with the cavity of resorption of NPP groove body.
Further, overflow port is offered at the top of NPP groove body.
Further, operated pneumatic valve and fast row's pallet telescopic connection.
Further, the operated pneumatic valve air inlet pipe of operated pneumatic valve bottom is pierced by the bottom surface of fast exclusive shell.
Further, it is U-shaped for impregnating water inlet pipe, and the both ends for impregnating water inlet pipe are distributed in the diagonal of NPP groove body bottom On line.
The spray equipment that the present invention uses, spraying effect are good;The bubbling device of use improves air bubble intensity uniformity, clearly It is good to wash effect;The fast arranging device used will effectively be attached to medical fluid foreign matter of product surface etc. and pass through the quick drain of washing And it takes away;The present invention realizes immersion, overflow, spray, bubbling, the fast combined type cleaning for arranging basic function.
Detailed description of the invention
Fig. 1 is schematic structural view of the invention one;
Fig. 2 is schematic structural view of the invention two;
Fig. 3 is schematic structural view of the invention three.
Wherein: 1-NPP groove body, 2- spray equipment, 3- bubbling device, the fast arranging device of 4-, 5- overflow port, 6- impregnate water inlet Pipe, 201- nozzle, 202- spray wig-wag, 203- spray tube, and 204- sprays water inlet pipe, and 301- is bubbled wig-wag, 302- connection Bracket, 303- nitrogen inlet duct, the hollow bubbling plate of 304-, exclusive shell, 402- operated pneumatic valve, 403- arrange pallet to 401- fastly fastly, 404- arranges sealing ring, 405- operated pneumatic valve air inlet pipe fastly.
Specific embodiment
Specific embodiments of the present invention will be further explained by 1-3 with reference to the accompanying drawing.
The cleaning device of single-layer capacitor process, the spray dress being connected including NPP groove body 1 and respectively with controller It sets 2, bubbling device 3, fast arranging device 4 and impregnates water inlet pipe 6;
NPP groove body 1 is open-topped cavity cuboid structure;
Spray equipment 2 includes the spray tube 203 for being mounted on 1 top two sides of NPP groove body, and the outer wall interval of spray tube 203 is set Several nozzles 201 are equipped with, one end of spray tube 203 is connected with spray wig-wag 202, and the other end of spray tube 203 is connected with Spray water inlet pipe 204;
Bubbling device 3 includes the bubbling wig-wag 301 for being mounted on 302 top of connecting bracket, the bottom peace of connecting bracket 302 Equipped with hollow bubbling plate 304, there are gap between the hollow surrounding for being bubbled plate 304 and the inner wall of NPP groove body 1, and hollow drum Bubble plate 304 divides the inner cavity of NPP groove body 1 to be epicoele and cavity of resorption, and the hollow upper surface for being bubbled plate 304 offers several bubble holes, Each bubble holes are connected with the hollow hollow cavity for being bubbled plate 304, and the hollow quadrangle for being bubbled plate 304 is connected with nitrogen inlet duct 303, and nitrogen inlet duct 303 is connected with the hollow hollow cavity for being bubbled plate 304;
Fast arranging device 4 includes the fast exclusive shell 401 for being mounted on 1 bottom of NPP groove body, in fast exclusive shell 401 from the bottom to top according to It is secondary to be connected with operated pneumatic valve 402, fast row's pallet 403, fast row's sealing ring 404, the NPP groove body 1 above fast row's sealing ring 404 Bottom surface offer fast row's mouth;
It impregnates water inlet pipe 6 and is mounted on the bottom of NPP groove body 1, and impregnate water inlet pipe 6 and be connected with the cavity of resorption of NPP groove body 1 It is logical.
The top of NPP groove body 1 offers overflow port 5.
Operated pneumatic valve 402 and fast row's 403 telescopic connection of pallet.
The operated pneumatic valve air inlet pipe 405 of 402 bottom of operated pneumatic valve is pierced by the bottom surface of fast exclusive shell 401.
It is U-shaped for impregnating water inlet pipe 6, and the both ends for impregnating water inlet pipe 6 are distributed on the diagonal line of 1 bottom of NPP groove body.
Spray equipment 2, using a pair of of spray tube 203, and every spray tube 203 can individually carry out spray angles adjustment, spray Leaching angle can fix or the cycle rotation within the scope of certain angle, two spray tubes 203 can synchronize or be staggered, The cleaning that this design can all be sprayed the different height of product can also avoid two spray tubes 203 by setting Spraying effect caused by spray weakens problem, maximumlly plays spraying effect.
Bubbling device 3, this device is hollow design, bubble holes, quadrangle air inlet are opened in surface, improves air bubble intensity uniformity. Mainly play a role in soaking process, nitrogen allowed to float in ejected wash water agitation, allow cleaning effect more preferably, and bubbling device 3 are swung left and right in the case where being bubbled wig-wag 301 and driving, and make agitation distribution more uniform, reach better cleaning effect, use nitrogen The reason of be that product surface is avoided to generate problem of oxidation, nitrogen gas purity is high, and the inside not oil-containing, aqueous vapor etc. avoid pollution.
Fast arranging device 4, after operated pneumatic valve 402 is connected to controller instruction, valve is pulled open in movement rapidly, and ejected wash water is in 3-5 It is all emptied in second, this function will can effectively be attached to medical fluid foreign matter of product surface etc. and pass through the quick drain of washing It takes away, realizes that cleaning effect, operated pneumatic valve 402 can also be used as drain valve when individually spray cleaning when normally opened.
Overflow port 5 plays a role in soaking and water washing, when impregnating new water from the injection of the immersion water inlet pipe 6 of bottom, cleaning Water is overflowed from overflow port 5 afterwards, achievees the effect that take away pollutant.
The specific structure and program of controller are what those skilled in the art can voluntarily implement.
A cleaning step for realizing this cleaning device is illustrated, after program is arranged in controller end, cleaning device will It is run by following procedure, the settable different cleaning procedures of different product are all to combine attainable function by this apparatus function It is accordingly to be regarded as protection scope of the present invention.
Step It sprays/waves Water filling Fast row It is bubbled/waves
1 30S/30S OFF ON OFF
2 OFF 40S OFF 40S/40S
3 OFF OFF ON OFF
4 20S/20S 20S OFF 20S/20S
5 OFF 20S OFF 20S/20S
6 OFF OFF ON OFF
7 10S/10S OFF ON OFF
8 OFF 20S OFF 20S/20S
9 OFF OFF ON OFF
10 10S/10S OFF ON OFF
More than, it is merely preferred embodiments of the present invention, but scope of protection of the present invention is not limited thereto, it is any Those familiar with the art within the technical scope of the present disclosure, according to the technique and scheme of the present invention and its invents Design is subject to equivalent substitution or change, should be covered by the protection scope of the present invention.

Claims (5)

1. the cleaning device of single-layer capacitor process, which is characterized in that including NPP groove body (1) and respectively with controller Connected spray equipment (2), bubbling device (3), fast arranging device (4) and immersion water inlet pipe (6);
NPP groove body (1) is open-topped cavity cuboid structure;
Spray equipment (2) includes the spray tube (203) for being mounted on two sides at the top of NPP groove body (1), between the outer wall of spray tube (203) Every being provided with several nozzles (201), one end of spray tube (203) is connected with spray wig-wag (202), spray tube (203) The other end is connected with spray water inlet pipe (204);
Bubbling device (3) includes the bubbling wig-wag (301) being mounted at the top of connecting bracket (302), the bottom of connecting bracket (302) Portion is equipped with hollow bubbling plate (304), there are gap between the hollow surrounding for being bubbled plate (304) and the inner wall of NPP groove body (1), And hollow be bubbled plate (304) divide the inner cavity of NPP groove body (1) to be epicoele and cavity of resorption, and the hollow upper surface for being bubbled plate (304) opens up There are several bubble holes, each bubble holes are connected with the hollow hollow cavity for being bubbled plate (304), hollow bubbling plate (304) Quadrangle is connected with nitrogen inlet duct (303), and nitrogen inlet duct (303) is connected with the hollow hollow cavity for being bubbled plate (304);
Fast arranging device (4) includes the fast exclusive shell (401) for being mounted on NPP groove body (1) bottom, in fast exclusive shell (401) by down toward On be connected with operated pneumatic valve (402) in turn, arrange pallet (403) fastly, arrange sealing ring (404) fastly, be located on fast row sealing ring (404) The bottom surface of the NPP groove body (1) of side offers fast row's mouth;
It impregnates water inlet pipe (6) and is mounted on the bottom of NPP groove body (1), and impregnate the cavity of resorption phase of water inlet pipe (6) with NPP groove body (1) Connection.
2. the cleaning device of single-layer capacitor process as described in claim 1, which is characterized in that the NPP groove body (1) Top offer overflow port (5).
3. the cleaning device of single-layer capacitor process as described in claim 1, which is characterized in that the operated pneumatic valve (402) pallet (403) telescopic connection is arranged with fast.
4. the cleaning device of single-layer capacitor process as described in claim 1, which is characterized in that the operated pneumatic valve (402) the operated pneumatic valve air inlet pipe (405) of bottom is pierced by the bottom surface of fast exclusive shell (401).
5. the cleaning device of single-layer capacitor process as described in claim 1, which is characterized in that the immersion water inlet It is U-shaped for managing (6), and the both ends for impregnating water inlet pipe (6) are distributed on the diagonal line of NPP groove body (1) bottom.
CN201910481287.7A 2019-06-04 2019-06-04 The cleaning device of single-layer capacitor process Pending CN110076128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910481287.7A CN110076128A (en) 2019-06-04 2019-06-04 The cleaning device of single-layer capacitor process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910481287.7A CN110076128A (en) 2019-06-04 2019-06-04 The cleaning device of single-layer capacitor process

Publications (1)

Publication Number Publication Date
CN110076128A true CN110076128A (en) 2019-08-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910481287.7A Pending CN110076128A (en) 2019-06-04 2019-06-04 The cleaning device of single-layer capacitor process

Country Status (1)

Country Link
CN (1) CN110076128A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112599449A (en) * 2020-12-16 2021-04-02 国镓芯科(深圳)半导体科技有限公司 Etching device for gallium nitride wafer
CN112845293A (en) * 2020-12-31 2021-05-28 上海至纯洁净***科技股份有限公司 Automatic change wafer tong and spray abluent washing tank equipment
CN113600534A (en) * 2021-07-26 2021-11-05 张家港市晨艺电子有限公司 Coating pretreatment device and pretreatment method for aviation aluminum parts

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080020031A (en) * 2006-08-30 2008-03-05 세메스 주식회사 Semiconductor cleaning equipment and method for controlling quick drain thereof
CN101972747A (en) * 2010-06-30 2011-02-16 张家港市超声电气有限公司 Swinging spray device
CN103224332A (en) * 2013-04-24 2013-07-31 浙江金指科技有限公司 Groove structure for etching glass
CN206143064U (en) * 2016-09-29 2017-05-03 九江维信诺科技有限公司 Sculpture tympanic bulla system
CN208098758U (en) * 2017-07-18 2018-11-16 东莞东聚电子电讯制品有限公司 Three-dimensional ultrasonic cleaning equipment
CN108878321A (en) * 2018-06-25 2018-11-23 扬州思普尔科技有限公司 A kind of semiconductor crystal wafer cleaning fast row's flushing tank of energy conservation
CN209998006U (en) * 2019-06-04 2020-01-31 大连达利凯普科技有限公司 Cleaning device for single-layer capacitor machining process

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080020031A (en) * 2006-08-30 2008-03-05 세메스 주식회사 Semiconductor cleaning equipment and method for controlling quick drain thereof
CN101972747A (en) * 2010-06-30 2011-02-16 张家港市超声电气有限公司 Swinging spray device
CN103224332A (en) * 2013-04-24 2013-07-31 浙江金指科技有限公司 Groove structure for etching glass
CN206143064U (en) * 2016-09-29 2017-05-03 九江维信诺科技有限公司 Sculpture tympanic bulla system
CN208098758U (en) * 2017-07-18 2018-11-16 东莞东聚电子电讯制品有限公司 Three-dimensional ultrasonic cleaning equipment
CN108878321A (en) * 2018-06-25 2018-11-23 扬州思普尔科技有限公司 A kind of semiconductor crystal wafer cleaning fast row's flushing tank of energy conservation
CN209998006U (en) * 2019-06-04 2020-01-31 大连达利凯普科技有限公司 Cleaning device for single-layer capacitor machining process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112599449A (en) * 2020-12-16 2021-04-02 国镓芯科(深圳)半导体科技有限公司 Etching device for gallium nitride wafer
CN112845293A (en) * 2020-12-31 2021-05-28 上海至纯洁净***科技股份有限公司 Automatic change wafer tong and spray abluent washing tank equipment
CN113600534A (en) * 2021-07-26 2021-11-05 张家港市晨艺电子有限公司 Coating pretreatment device and pretreatment method for aviation aluminum parts

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Application publication date: 20190802