CN109951945A - A kind of platypelloid type large-area high-density DC arc discharge plasma source - Google Patents

A kind of platypelloid type large-area high-density DC arc discharge plasma source Download PDF

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Publication number
CN109951945A
CN109951945A CN201910192042.2A CN201910192042A CN109951945A CN 109951945 A CN109951945 A CN 109951945A CN 201910192042 A CN201910192042 A CN 201910192042A CN 109951945 A CN109951945 A CN 109951945A
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China
Prior art keywords
anode
piece
density
plasma source
arc discharge
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CN201910192042.2A
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Chinese (zh)
Inventor
周海山
袁小刚
罗广南
李波
李建刚
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Hefei Institutes of Physical Science of CAS
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Hefei Institutes of Physical Science of CAS
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Priority to CN201910192042.2A priority Critical patent/CN109951945A/en
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Abstract

The invention discloses a kind of platypelloid type large-area high-density DC arc discharge plasma sources, including cathode, anode, cathode is installed in arc chamber, anode is installed on outside arc chamber, using multiple parallel arrangement of cascade piece connections between anode and cathode, connected by insulated connecting piece between cascade piece and the arc chamber, between Adjacent Concatenation piece;The cascade piece, insulated connecting piece center be provided with through-hole as plasma channel, anode is attached to least significant end and cascades on the through-hole wall of piece, and the center of anode is also provided with through-hole as plasma channel.The present invention solves the problems, such as that existing cascade vacuum arc plasma source irradiated area is small, and point source has been expanded into large area face source.Large area sample can be irradiated in one experiment, or is irradiated multiple small samples simultaneously and compared experiment.Meanwhile scheme proposed by the present invention can be also used for irradiation of the fusion reactor towards the entire module of plasma source components, breach the limitation of the type plasma source irradiated area.

Description

A kind of platypelloid type large-area high-density DC arc discharge plasma source
Technical field
The present invention relates to plasma physics and applied science research field, particular content is that a kind of platypelloid type large area is high Density DC arc discharge plasma source.
Background technique
Due to sharply increasing for global energy requirements, magnetic confinement nuclear fusion is considered as most potential clean energy resource. In magnetic confinement fusion heap, the beam current density of boundary plasma (especially divertor plasma) may be up to ~ 1024m-2s-1, Huge challenge is formd to facing plasma material and component.The material of divertor and the first wall needs to carry out a large amount of etc. Gas ions irradiation effect experimental study, due to the runing time and maintenance cost problem of fusion facility, current a large amount of plasma Body and material interaction (PMI) experiment are carried out using straight line plasma source in the lab.
Currently, be applied to straight line PMI plasma apparatus plasma source include microwave source, hot cathode source, radio frequency source with And cascade arcs source.Wherein, microwave plasma source due to structure simple application it is wider, with the electron cyclotron plasma of 2.45GHz Body source is representative, but restriction of its plasma parameter by discharge principle, and plasma beam current density generally up to arrives 1021m-2s-1Magnitude.Hot cathode is using lanthanum hexaboride source as representative, and ionic flux is generally 1022m-2s-1Magnitude, it is extremely difficult to enter 1023m-2s-1;And rf wave density parameter with higher in electric discharge, flux can achieve 10 in principle23m-2s-1Even more Height, but its matching is more difficult, and the strong interaction of plasma and antenna system is difficult to handle when power is higher.Cascade arcs etc. from Source structure is relatively easy, can produce high-density plasma, and line reaches ~ 1024m-2s-1, it is suitable with the following fusion reactor environment, It is research plasma and the comparatively ideal means of material interaction.
Existing cascade vacuum arc plasma source generallys use needle-like electrode and adds round cascade sheet form (such as patent Shown in CN201510185627), discharge channel is generally less than 10mm, therefore obtained plasma area size receive it is bright The PMI behavior of aobvious limitation, large-size components, material cannot be studied effectively.
Summary of the invention
For the above the deficiencies in the prior art, the present invention provide a kind of platypelloid type large-area high-density direct current arc discharge etc. from Daughter source.
The technical solution adopted by the present invention is that:
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: described including cathode, anode Cathode is installed in arc chamber, and anode is installed on outside arc chamber, and multiple parallel arrangement of cascade pieces are used between anode and cathode Connection is connected by insulated connecting piece between cascade piece and the arc chamber, between Adjacent Concatenation piece;The cascade piece, absolutely The center of edge connector is provided with through-hole as plasma channel, and the anode is attached to the through-hole wall of least significant end cascade piece On, the center of anode is also provided with through-hole as plasma channel.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the cathode It is made of lanthanum hexaboride or tungsten.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the cathode For flat or array.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the cathode Size are as follows: length 10-150mm, width 3-20mm.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the cascade The material of piece is copper or steel, and the plasma channel shape at cascade piece center is rectangle, having a size of length 5-120mm, width 3- 12mm。
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the cascade Piece internal notches are as water cooling runner.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the insulation The material of connector is insulating ceramics or Teflon, and the shape of the plasma channel at insulated connecting piece center is rectangle, size For length 5-120mm, width 3-12mm.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the anode Material be copper or steel;At the anode export and the strong contact position material of plasma is tungsten, molybdenum or its alloy.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the anode The plasma channel shape at center is rectangle, having a size of length 5-120mm, width 3-12mm;Anode export can be as needed Amendment shape is track type (four rounding of angle angles of rectangle), or needs to be fabricated to Laval nozzle structure according to plasma parameter Type.
A kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: the electric discharge The material of room is that copper perhaps does interlayer water cooling or coil pipe water cooling inside steel arc chamber.
Beneficial effects of the present invention are as follows:
The present invention solves the problems, such as that existing cascade vacuum arc plasma source irradiated area is small, and point source has been expanded into face source.It can be with Large area sample is irradiated in one experiment, or is irradiated multiple small samples simultaneously and compared experiment.Meanwhile the present invention proposes Scheme can be also used for irradiation of the fusion reactor towards the entire module of plasma source components, breach the type plasma source spoke It shows up long-pending limitation.
Detailed description of the invention
Fig. 1 is a kind of platypelloid type large-area high-density DC arc discharge plasma source provided in an embodiment of the present invention.
Each label successively indicates in figure: 1- cathode, 2- insulated connecting piece, 3- cascade piece, 4- water cooling runner, 5- plasma Body, 6- anode, 7- arc chamber.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to embodiment party of the present invention Formula is described in further detail.
Embodiment
A kind of platypelloid type large-area high-density DC arc discharge plasma source, including cathode 1, anode 6, the cathode 1 It is installed in arc chamber 7, anode 6 is installed on outside arc chamber 7, and multiple parallel arrangement of cascade pieces are used between anode 6 and cathode 1 3 connections are connected by insulated connecting piece 2 between the cascade piece 3 and arc chamber 7, between Adjacent Concatenation piece 3;The cascade Piece 3, insulated connecting piece 2 center be provided with through-hole as plasma channel, the anode 6 is attached to least significant end cascade piece 3 On through-hole wall, the center of anode 6 is also provided with through-hole as plasma channel.
Cathode 1 uses tungsten needle array, cathode size are as follows: 120mm × 12mm.
Insulated connecting piece 2 uses Teflon material, the shape of the plasma channel at 2 center of insulated connecting piece be rectangle, Having a size of 80mm × 10mm.
Cascade piece 3 and use oxygen-free copper material, with a thickness of 8mm, cascade 3 center of piece plasma channel shape be rectangle, Having a size of 80mm × 10mm;3 internal notches of piece are cascaded as water cooling runner 4, having a size of the mm of 4 mm × 6.
Anode 6 uses oxygen-free copper material, with a thickness of 10mm;6 exit of anode is with the strong contact position material of plasma Molybdenum, the plasma channel shape at 6 center of anode are track type (i.e. doing round corner treatment in four angles of rectangle).Final outlet etc. from 5 sectional dimension of daughter is greater than 80mm × 10mm.
The material of arc chamber 7 is oxygen-free copper, does interlayer water cooling or coil pipe water cooling inside arc chamber 7.
The foregoing is merely presently preferred embodiments of the present invention, is not intended to limit the invention, it is all in spirit of the invention and Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.

Claims (10)

1. a kind of platypelloid type large-area high-density DC arc discharge plasma source, it is characterised in that: including cathode, anode, institute It states cathode to be installed in arc chamber, anode is installed on outside arc chamber, and multiple parallel arrangement of cascades are used between anode and cathode Piece connection is connected by insulated connecting piece between cascade piece and the arc chamber, between Adjacent Concatenation piece;The cascade piece, The center of insulated connecting piece is provided with through-hole as plasma channel, and the anode is attached to the through-hole wall of least significant end cascade piece On, the center of anode is also provided with through-hole as plasma channel.
2. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist In: the cathode is made of lanthanum hexaboride or tungsten.
3. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist In: the cathode is flat or array.
4. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 3, feature exist In: the cathode size are as follows: length 10-150mm, width 3-20mm.
5. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist In: the material of the cascade piece is copper or steel, and the plasma channel shape at cascade piece center is rectangle, having a size of length 5- 120mm, width 3-12mm.
6. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist In: the cascade piece internal notches are as water cooling runner.
7. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist In: the material of the insulated connecting piece is insulating ceramics or Teflon, the shape of the plasma channel at insulated connecting piece center For rectangle, having a size of length 5-120mm, width 3-12mm.
8. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist In: the material of the anode is copper or steel;At the anode export with the strong contact position material of plasma be tungsten, molybdenum or its Alloy.
9. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 8, feature exist In: the plasma channel shape of the anodes centre is rectangle, having a size of length 5-120mm, width 3-12mm;Anode export It is track type that shape can be corrected as needed, or needs to be fabricated to Laval nozzle configuration according to plasma parameter.
10. a kind of platypelloid type large-area high-density DC arc discharge plasma source according to claim 1, feature exist It is that copper perhaps does interlayer water cooling or coil pipe water cooling inside steel arc chamber in: the material of the arc chamber.
CN201910192042.2A 2019-03-14 2019-03-14 A kind of platypelloid type large-area high-density DC arc discharge plasma source Pending CN109951945A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113015310A (en) * 2021-02-25 2021-06-22 北京大学 Plasma sealing device and sealing method
CN113382525A (en) * 2021-06-23 2021-09-10 大连理工大学 Multi-channel large-area high-density direct current arc plasma source
CN113727507A (en) * 2021-08-17 2021-11-30 哈尔滨工业大学 Multi-channel arc plasma source cascade copper sheet water cooling device and optimization method thereof

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030049468A1 (en) * 2001-08-16 2003-03-13 Ing-Feng Hu Cascade arc plasma and abrasion resistant coatings made therefrom
CN101346030A (en) * 2008-08-25 2009-01-14 哈尔滨工业大学 Controllable multi-component cathode arc plasma forming apparatus and method
CN201690672U (en) * 2010-05-13 2010-12-29 贵州翔明科技有限公司 Atmospheric pressure direct current arc electric discharge plasma generating device
US20110000895A1 (en) * 2004-11-24 2011-01-06 Vladimir Belashchenko Multi-electrode plasma system and method for thermal spraying
CN202095169U (en) * 2011-04-27 2011-12-28 成都科尚科技有限公司 Single cathode multistage direct current arc discharge plasma generating device
CN103260330A (en) * 2012-02-21 2013-08-21 成都真火科技有限公司 Multiple-cathode central-axis anode arc plasma generator
CN103327722A (en) * 2013-07-05 2013-09-25 四川大学 Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator
CN203407057U (en) * 2013-07-05 2014-01-22 四川大学 Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator
CN203504870U (en) * 2013-10-17 2014-03-26 中国科学院西安光学精密机械研究所 Atmospheric-pressure magnetic-field enhancement-type low temperature plasma brush generator
CN104244556A (en) * 2014-10-15 2014-12-24 周开根 Combined type nozzle anode
CN104284504A (en) * 2014-10-31 2015-01-14 四川大学 Rotating anode plasma generator
CN104772305A (en) * 2015-04-20 2015-07-15 大连理工大学 Device for cleaning first mirror for tokamak device by direct-current cascade arc plasma torch
CN205142646U (en) * 2015-08-12 2016-04-06 上海冈松等离子体科技开发有限公司 High -power plasma torch of rotatory non - transfer long arc that admits air of multi -compartment festival distributing type
CN105517312A (en) * 2015-12-25 2016-04-20 中国航天空气动力技术研究院 Super-high-enthalpy arc heater anode
CN107124814A (en) * 2017-06-20 2017-09-01 四川大学 A kind of many negative electrode laminar flow plasma powder spheroidization devices
CN207820298U (en) * 2017-12-27 2018-09-04 中国科学技术大学 A kind of arc plasma source of efficient stable
CN208143569U (en) * 2018-05-21 2018-11-23 福州以恒电子技术有限公司 A kind of novel plasma generator
CN109041396A (en) * 2018-10-30 2018-12-18 广东省新材料研究所 A kind of twin cathode axial direction feeding plasma gun

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030049468A1 (en) * 2001-08-16 2003-03-13 Ing-Feng Hu Cascade arc plasma and abrasion resistant coatings made therefrom
US20110000895A1 (en) * 2004-11-24 2011-01-06 Vladimir Belashchenko Multi-electrode plasma system and method for thermal spraying
CN101346030A (en) * 2008-08-25 2009-01-14 哈尔滨工业大学 Controllable multi-component cathode arc plasma forming apparatus and method
CN201690672U (en) * 2010-05-13 2010-12-29 贵州翔明科技有限公司 Atmospheric pressure direct current arc electric discharge plasma generating device
CN202095169U (en) * 2011-04-27 2011-12-28 成都科尚科技有限公司 Single cathode multistage direct current arc discharge plasma generating device
CN103260330A (en) * 2012-02-21 2013-08-21 成都真火科技有限公司 Multiple-cathode central-axis anode arc plasma generator
CN103327722A (en) * 2013-07-05 2013-09-25 四川大学 Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator
CN203407057U (en) * 2013-07-05 2014-01-22 四川大学 Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator
CN203504870U (en) * 2013-10-17 2014-03-26 中国科学院西安光学精密机械研究所 Atmospheric-pressure magnetic-field enhancement-type low temperature plasma brush generator
CN104244556A (en) * 2014-10-15 2014-12-24 周开根 Combined type nozzle anode
CN104284504A (en) * 2014-10-31 2015-01-14 四川大学 Rotating anode plasma generator
CN104772305A (en) * 2015-04-20 2015-07-15 大连理工大学 Device for cleaning first mirror for tokamak device by direct-current cascade arc plasma torch
CN205142646U (en) * 2015-08-12 2016-04-06 上海冈松等离子体科技开发有限公司 High -power plasma torch of rotatory non - transfer long arc that admits air of multi -compartment festival distributing type
CN105517312A (en) * 2015-12-25 2016-04-20 中国航天空气动力技术研究院 Super-high-enthalpy arc heater anode
CN107124814A (en) * 2017-06-20 2017-09-01 四川大学 A kind of many negative electrode laminar flow plasma powder spheroidization devices
CN207820298U (en) * 2017-12-27 2018-09-04 中国科学技术大学 A kind of arc plasma source of efficient stable
CN208143569U (en) * 2018-05-21 2018-11-23 福州以恒电子技术有限公司 A kind of novel plasma generator
CN109041396A (en) * 2018-10-30 2018-12-18 广东省新材料研究所 A kind of twin cathode axial direction feeding plasma gun

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
OU WEI ET AL.: "Characteristics of Single Cathode Cascaded Bias Voltage Arc Plasma", 《PLASMA SCIENCE AND TECHNOLOGY》 *
W.A.J. VIJVERS ET AL.: "Multiple discharge channels in a cascaded arc to produce large diameter plasma beams", 《FUSION ENGINEERING AND DESIGN》 *
X. CAO ET AL.: "A new facility for studying plasma interacting with flowing liquidlithium surface", 《FUSION ENGINEERING AND DESIGN》 *
Y. ASANO ET AL.: "Generation of a Large Diameter He Cascade Arc Plasma for a Plasma Window Application", 《IEEE TRANSACTIONS ON PLASMA SCIENCE》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113015310A (en) * 2021-02-25 2021-06-22 北京大学 Plasma sealing device and sealing method
CN113382525A (en) * 2021-06-23 2021-09-10 大连理工大学 Multi-channel large-area high-density direct current arc plasma source
CN113727507A (en) * 2021-08-17 2021-11-30 哈尔滨工业大学 Multi-channel arc plasma source cascade copper sheet water cooling device and optimization method thereof

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