CN109913919A - A kind of processing method and device preparing micro-nano two-dimensional structure in workpiece surface - Google Patents
A kind of processing method and device preparing micro-nano two-dimensional structure in workpiece surface Download PDFInfo
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Abstract
The invention discloses a kind of processing methods and device that micro-nano two-dimensional structure is prepared in workpiece surface, belong to special process field.The method that this method uses laser ablation and electrochemical deposition to be coupled in process, laser beam focus are controlled the region and path of laser ablation by digital control system, process micron scale construction on workpiece substrate surface on workpiece substrate surface；While laser ablation, tool anode keeps face ablated area, deposits nanostructure on the workpiece substrate region micrometer structure.In order to which anode electric field to be constrained in electrode tip region to greatest extent, tool anode is penetrated in insulating glass pipe and realizes lateral wall insulation.In addition, heat-stress effect of laser increases irradiation zone solution temperature, while strong stirring action is generated, that accelerates deposition liquid circulates update, promotes the rapidly and efficiently growth of nanostructure.The present invention is suitable for the highly-efficient processing and manufacture of the micro-nano two-dimensional structure of component surface.
Description
Technical field
It is processed the present invention relates to surface manufacture field in special processing technology more particularly to a kind of laser electrochemical copolymerization
Method and apparatus, processing and manufacture suitable for functional surface micro-structure.
Background technique
In recent years, the method that can significantly improve interface performance as one kind, Surface Texture have become domestic outer boundary section
One research hotspot in field, the progress of micrometer-nanometer processing technology, so that by the shape and scale that accurately control texture, optimization
Its interface performance is possibly realized.Wetability is one of important feature of the surface of solids, directly affect surfactant fluid flowing and
The characteristics such as phase transformation either still all play great function in nature in human lives, on the other hand, as a kind of allusion quotation
The interfacial phenomenon of type, surface wettability is in surface chemistry, physics, materialogy, interfacial structure design and other cross disciplines
Basic research in also have particularly important researching value.The microstructure of material surface is to determine the master of Wettability of Solid Surface
One of factor is wanted, thus is concerned by the research of surface micro-moulding controlled material surface wettability at this stage.
It is generally believed that the material surface of water contact angle θ < 5 ° is defined as ultra-hydrophilic surface, the material surface parent of 5 ° of θ < 90 ° <
The material surface of water, 90 °<θ<150 ° is hydrophobic, and the material surface of θ>150 ° is defined as super hydrophobic surface.Studies have shown that material
Super thin/the water-wet behavior on surface depends primarily on surface free energy and roughness, passes through surface chemistry composition and surface microscopic knot
Structure synergistic effect, it can be achieved that super thin/water-wetted surface effective preparation.
At this stage, have benefited from " lotus leaf effect " relevant special wettable surfaces' research, the building of surface micro-nano structure is
A kind of common approach of super-hydrophobic and ultra-hydrophilic surface is obtained through becoming.It is found by being retrieved to existing technology, publication No. is
A kind of in-situ construction method of micro-nano hierarchical structure super hydrophobic surface is proposed in the patent of CN107321583A, it is sharp first
Micron order coarse structure is constructed on metallic matrix using solution as electrolyte with the method for electrochemical etching, then uses water
Thermal method, using certain density six trichloride hydrates aluminium and triethanolamine solution as etching liquid, existing micron scale construction surface after
It is continuous to etch the nanoscale structures with ' needle ball ' shape structure, low energy processing is carried out followed by 17 silicon fluorides, is finally obtained
There must be the super hydrophobic surface of micro-nano hierarchical structure；A kind of titanium plantation is proposed in the patent that publication No. is CN108478858A
The preparation method of body nanoscale ultra-hydrophilic surface, this method use sand grains to carry out sandblasting polishing treatment to titanium implant first, so
Carry out acid polishing processing afterwards, then be put into electrolyte and carry out anodized, be finally putting into annealing device into
Row heat treatment, obtains the titanium implant with urn Topography surface.
Traditional is general as the method for preparing biomimetic features surface of core using preparation method of nano material and photoetching technique
Can only obtain nanometer perhaps a kind of structure of micron be difficult to prepare by a kind of method or a process while have micron and
The bionic micro-nano structure surface of nanostructure.Though two-step method can construct micron and nanometer composite structure, longer add is usually required
The work period, and preparation process is complicated, processing cost is expensive, still has room for improvement；In application aspect, super thin/parent of preparation
Water surface has some limitations, and the adhesive force of surface micro-structure and matrix is lower, is easy to cause super thin/parent of matrix surface
Water micro-structure falls off, and then influences the stability and its application potential of super thin/hydrophilicity.
Summary of the invention
The purpose of the present invention is being directed to the deficiency of existing processing technology, a kind of simple and easy to do, low in cost, mechanicalness is proposed
Energy is good, controllability is strong, and the laser assisted electrochemical copolymerization suitable for quickly preparing micro-nano two-dimensional structure surface in workpiece surface is micro-
The processing method and device of thin electro-deposition.
The present invention is achieved by following technical solution:
A kind of processing method preparing micro-nano two-dimensional structure in workpiece surface, it is same using laser beam ablation and electrochemical deposition
When workpiece surface generate micron-nanometer two-dimensional structure, obtain super thin/hydrophile function of component surface；What laser issued
Focusing of the laser beam Jing Guo optic path system and convex lens irradiates on workpiece substrate surface, goes out in workpiece substrate ablated surface
Micron scale construction；Meanwhile DC power anode, cathode distinguish bonding tool anode and workpiece substrate, power on, and keep tool sun
Pole face laser ablated region deposits nanoscale structures using the method for electrochemistry on micrometer structure.
Further, include the following steps:
Motion path model is drawn, and is input in computer；
Surface preparation is carried out to workpiece substrate；
Workpiece substrate is fixed in work nest, tool anode connects direct current pulse power source anode, and is clamped by working arm
It is placed in above workpiece substrate, workpiece substrate is connected with direct current pulse power source cathode, and deposition liquid is added, makes workpiece substrate and tool
Anode lower end is immersed in deposition liquid, and when energization, workpiece substrate and workpiece anode constitute electrochemical circuit in deposition liquid；
On the moving platform by work nest installation, the height of x-y-z triaxial movement platform is adjusted, laser is made to focus on workpiece
Substrate surface；
It opens micropump and carries out circulating picture-changing liquid, guarantee the even concentration of solution in work nest；
Direct current pulse power source is opened, the charged metal ion deposited in liquid is anti-in workpiece substrate surface generation electrochemical reduction
It answers, while unbalanced pulse laser, laser beam irradiation synchronous with electro-deposition pulse current realizes that laser and electricity are heavy in deposition site
It is processed while product；
According to set motion path, x-y-z triaxial movement platform is controlled by motion controller, to workpiece substrate into
The lasting processing of row, realizes the simultaneously and rapidly processing of micron-nanometer two-dimensional structure.
A kind of workpiece surface prepares the processing unit (plant) of micro-nano two-dimensional structure, including laser irradiation system, system of processing and control
System processed；
The laser irradiation system includes pulse laser, reflecting mirror, condenser lens；Laser is issued by pulse laser,
Change transmission direction through reflecting mirror, then focused by condenser lens, the laser beam after focusing irradiates on workpiece substrate；
The system of processing includes that direct current pulse power source, work nest, workpiece substrate, tool anode, x-y-z three-axis moving are flat
Platform；The work nest is set on x-y-z triaxial movement platform；The anode of the direct current pulse power source is connected with tool anode,
Cathode is connected with workpiece substrate；Workpiece substrate and tool anode lower end are immersed in deposition liquid, and workpiece substrate and workpiece anode exist
It deposits and constitutes electrochemical circuit in liquid；The tool anode is clamped by the working arm of x-y-z triaxial movement platform；
The control system includes computer and motion controller, and the computer controls pulse laser, DC pulse
Power supply and motion controller；The motion controller controls x-y-z triaxial movement platform.
Further, it insulate to the tool anode side walls, tool anode is insoluble petal silk.
Further, lateral wall insulation is carried out to the tool anode by insulating glass pipe.
Further, tool anode is set to 0.5~1.5mm above workpiece substrate.
Further, processing unit (plant) further includes working solution circulating system, and the working solution circulating system includes reservoir, micro-
Type pump, filter and throttle valve；The micropump, filter, throttle valve are connected in the loop, reservoir and micropump input terminal
It is connected, work nest is connected with filter；Described throttle valve one end is connected with work nest, and the other end is connected with reservoir.
It further, further include oscillograph in the system of processing；The direct current pulse power source is connected with oscillograph.
Further, the pulse laser is nanosecoud pulse laser or picosecond pulse laser.
Further, deposition liquid liquid level is higher than 2~10mm of workpiece substrate, and deposition liquid temperature is 30~50 DEG C；DC pulse
Supply voltage can be adjusted to 0~20V, and frequency is consistent with laser parameter, and duty ratio is 0~80%.
The present invention has the beneficial effect that:
1. micro nano structure simultaneous processing generates, operating process is simple, high in machining efficiency；
2. in electrodeposition process, the angle of laser light incident can be changed by adjusting the angle between laser beam and workpiece substrate
Degree controls the direction of micrometer structure and the distribution of nanostructure, and then the parent/hydrophobic performance direction for changing workpiece surface takes
To, come induction regulating controlling drop directed movement and from convey.
3. heat-stress effect of laser can generate strong stirring action in the electrolytic solution, significantly increase electrochemical reaction from
The convective mass transfer of son, that accelerates deposition liquid circulates update, promotes the rapidly and efficiently growth of nanostructure, effectively improves processing
Efficiency.
4. be used as tool anode using passive metal silk of the diameter less than 500 μm, by wire insertion it is interior through size therewith
The insulating glass pipe to match is consolidated end by the way of heat treatment and carries out lateral wall insulation, only stays front end conductive, by anode electricity
Field is limited in electrode tip region, reduces the electric field action range on workpiece substrate, only retains electrode centers region and carries out electricity
Deposition, enhances processing locality.
5. in electrodeposition process, hydrogen can be precipitated on lithosomic body, laser thermodynamic activity forms temperature at Cathode/Solution Interface
Gradient and pulsatile impact are spent, the effect of localization strong stirring is generated, hydrogen gas bubbles are easier to be discharged, and improve deposition layer surface matter
Amount.
6. laser is irradiated from side in the region that electro-deposition occurs, avoids laser and irradiated downwards above tool anode
When because of the coverage of electrode influence the problem of processing fine degree.
7. laser ablation, which textures workpiece surface, has the advantages such as precision is high, heat affecting is small, controllability is good, pollution is small, should
Method is simple, efficient, cost is relatively low.
Detailed description of the invention
Fig. 1 is the system of processing schematic diagram that laser assisted electrochemical deposition quickly prepares super thin/water-wetted surface；
Fig. 2 is the schematic diagram of the directionality micro nano structure obtained after laser bias；
Fig. 3 is the partial enlargement diagram of Fig. 2.
Appended drawing reference is as follows:
1. computer；2. direct current pulse power source；3. oscillograph；4. motion controller；5.x-y-z triaxial movement platform；6.
Reservoir；7. filter；8. micropump；9. throttle valve；10.C axis；11. tool anode；12. insulating glass pipe；13. workpiece base
Plate；14. reflecting mirror；15. condenser lens；16. work nest；17.B axis；18. pulse laser；19. laser beam；20. electric field line；
21. nanostructure；22. micrometer structure.
Specific embodiment
Present invention will be further explained with reference to the attached drawings and specific examples, but protection scope of the present invention is simultaneously
It is without being limited thereto.
A kind of processing method preparing micro-nano two-dimensional structure in workpiece surface, it is same using laser beam ablation and electrochemical deposition
When workpiece surface generate micron-nanometer two-dimensional structure, obtain super thin/hydrophile function of component surface；What laser issued
Focusing of the laser beam Jing Guo optic path system and convex lens, irradiation are burnt on 13 surface of workpiece substrate on 13 surface of workpiece substrate
Lose micron scale construction out；Meanwhile DC power anode, cathode distinguish bonding tool anode 11 and workpiece substrate 13, power on, and protect
11 face laser ablated region of tool anode is held, nanoscale structures are deposited on micrometer structure using the method for electrochemistry.
A kind of processing unit (plant) preparing micro-nano two-dimensional structure in workpiece surface, including laser irradiation system, system of processing and
Control system；The laser irradiation system includes pulse laser 18, reflecting mirror 14, condenser lens 15；Laser is by pulse laser
Device 18 issues, and changes transmission direction through reflecting mirror 14, then focus by condenser lens 15, the laser beam 19 after focusing is irradiated in work
On part substrate 13；The system of processing includes direct current pulse power source 2, work nest 16, workpiece substrate 13, tool anode 11, x-y-z
Triaxial movement platform 5；The work nest 16 is set on x-y-z triaxial movement platform 5；The anode of the direct current pulse power source 2
It is connected with tool anode 11, cathode is connected with workpiece substrate 13；Workpiece substrate 13 and 11 lower end of tool anode are immersed in deposition liquid
In, workpiece substrate 13 and workpiece anode 11 constitute electrochemical circuit in deposition liquid；The tool anode 11 is transported by tri- axis of x-y-z
The working arm of moving platform 5 clamps；
The control system includes computer 1 and motion controller 4, and the computer 1 controls pulse laser 18, direct current
The pulse power 2 and motion controller 4；The motion controller 4 controls x-y-z triaxial movement platform 5.
As shown in Figure 1, computer 1 is connected with pulse laser 18, direct current pulse power source 2 and motion controller 4 respectively.Meter
Calculation machine 1 can control the laser parameter of pulse laser 18 and the power parameter of direct current pulse power source 2, and simultaneous computer 1 can be transported
Walking along the street diameter executes code, and the movement and C axis 10 and B axle 17 of x-y-z triaxial movement platform 5 are controlled by motion controller 4
Rotary motion.Work nest 16 is mounted on x-y-z triaxial movement platform 5, and workpiece substrate 13 is fixed on 16 bottom of work nest, tool
Anode 11 is placed in 13 top of workpiece substrate, and the positive bonding tool anode 11 of direct current pulse power source 2, cathode connects workpiece substrate 13, shows
Wave device 3 is connected with direct current pulse power source 2, real-time monitoring current parameters.2 anodes of direct current pulse power source → tool anode 11 → deposition
Liquid → 13 → direct current pulse power source of workpiece substrate, 2 cathode constitutes circuit, so that electrochemical reaction is able to carry out.Laser beam is by pulse
Laser 18 issue, by reflecting mirror 14 change transmission direction, using condenser lens 15 and penetrate deposition liquid focus on workpiece
13 surface of substrate, motion controller 4 control the motion path of x-y-z triaxial movement platform 5 to realize the deposition of different graphic.It is heavy
Hydrops is stored in reservoir 6, will be deposited liquid through filter 7 by the offer power of micropump 8 and is transported to work nest 16 from reservoir 6
In, deposition liquid passes through throttle valve 9 again and flows back into realization circulation in reservoir 6.It, can be by adjusting laser beam in electrodeposition process
Angle between 19 and workpiece substrate 13 changes the angle of laser light incident, controls the direction of micrometer structure and point of nanostructure
Cloth, and then change parent/hydrophobic performance direction orientation of workpiece surface, carry out the directed movement of induction regulating controlling drop and convey certainly.
As shown in Fig. 2, laser is radiated in the film micro area that electro-deposition occurs from side, texture is carried out on workpiece substrate 13
Change, process micro-scale surface structure, keeps 11 face laser ablated region of tool anode, electrochemical source of current and laser synchronization,
Nanostructure 21 is deposited on the region micron scale construction 22 of workpiece substrate 13, prepares micron and nanometer composite structure.In conjunction with attached
Fig. 3, it can be seen that the electric field line 20 between tool anode 11 and workpiece substrate 13, insoluble tool anode 11 penetrate insulation glass
Lateral wall insulation is realized in glass pipe 12, only top is conductive, and anode electric field is constrained in electrode tip region to greatest extent, enhances
The locality of deposition；Heat-stress effect of laser can generate strong stirring action in the electrolytic solution, and it is anti-to significantly increase electrochemistry
The convective mass transfer for answering ion promotes the efficient Fast Growth of nanostructure, realizes the highly-efficient processing and system of the micro- texture of micro-nano two dimension
It makes.
The specific embodiment of the invention, as tool anode, wire is inserted using passive metal silk of the diameter less than 500 μm
Enter the interior insulating glass pipe matched through size, end is consolidated by the way of heat treatment and carries out lateral wall insulation, before only staying
End is conductive, and anode electric field is limited in electrode tip region, the electric field action range on workpiece substrate is reduced, only retains electrode
Central area carries out electro-deposition, enhances processing locality.
Workpiece substrate 13 is conductive material, and tool anode 11 can be vertically arranged with workpiece substrate 13, and tool anode 11
Face laser focal zone, so that micrometer structure 22 and nanostructure 21 generate simultaneously, and the size and density of micrometer structure 22
Determined by ablation path and laser parameter, the size and density of nanostructure 21 by electrochemical parameter, laser beam energy density and
13 movement velocity of workpiece substrate determines；The tool anode 11 is insoluble petal silk, external application with it is interior match through size it is exhausted
Edge glass tube 12 carries out lateral wall insulation, only stays end conductive, and carry out sanding and polishing to wire end face, is placed in workpiece substrate 13
At 0.5~1.5mm of top, the electric field of anode region is constrained in into electrode tip.The tool anode 11 is by x-y-z three-axis moving
The working arm of platform 5 clamps, and can realize three-dimensional space motion and rotary motion by motion controller 4.
The laser beam 19 that pulse laser 18 issues forms an angle with workpiece substrate 13, irradiates from side in workpiece substrate
13 surfaces influence to process, between the laser beam 19 and workpiece substrate 13 when avoiding laser irradiation because of the coverage of electrode
Adjustable angle, the tilt angle by adjusting x-y-z triaxial movement platform adjust the angle between laser beam and workpiece substrate.Institute
Stating laser light incident direction influences the direction of micrometer structure 22 and the distribution of nanostructure 21, so that surface parent/hydrophobic performance has
Certain direction orientation can be used for realizing the directed movement of drop and convey certainly.The deposition liquid liquid level is higher than workpiece substrate 132
~10mm, deposition liquid temperature are maintained at 30~50 DEG C.2 voltage of direct current pulse power source is that 0~20V is adjustable, frequency and laser parameter
Unanimously, duty ratio is 0~80%.8 operating pressure of micropump is less than 2bar, and flow velocity is less than 0.5L/min, solution flowing pair
It is minimum in deposition liquid liquid liquid surface fluctuation.
Specific implementation method of the present invention is as follows:
S1: utilizing software programming control routine, to guarantee to obtain desired figure, should be noted that use is smaller when writing code
Acceleration of motion, prevent solution wobble effects processing effect；
S2: corresponding deposition liquid is prepared, deposits the ingredient of liquid, concentration should rationally be selected according to required sedimentary material
Select, a small amount of additive, which is added, improves coating performance and deposition velocity, and can improve on a small quantity sedimentary surface quality brightener,
Leveling agent etc.；
S3: carrying out surface preparation for workpiece substrate 13, be then attached in work nest 16, negative with direct current pulse power source 2
Extremely it is connected.Tool anode 11 is connect into 2 anode of direct current pulse power source, is fixed at 13 0.5~1.5mm of top of workpiece substrate, due to
11 lateral wall insulation of tool anode, only front end are conductive, reduce the electric field action region of workpiece substrate 13, reduce or eliminate spuious
Depositional phenomenon is beneficial to improve the locality of deposition；
S4: deposition liquid is added, liquid level is made to be higher than 13 2~10mm of surface of workpiece substrate, if solution layer is too thin, laser
Irradiation generate plasma can splash spray, if solution layer is too thick, laser pass through solution when energy loss it is serious, efficiency compared with
It is low；
S5: work nest 16 is placed on x-y-z triaxial movement platform 5, adjusts x-y-z triaxial movement platform 5, keeps laser poly-
Coke 0.2~1.5mm above workpiece substrate 13 forms pulsatile impact using laser thermodynamic activity, generates the flow field stirring of strength
Effect drives the metal ion in solution mobile to processing district, inhibits concentration polarization, promote the efficient fast fast-growing of nano-micro structure
It is long, significantly improve electrodeposit reaction efficiency；
S6: opening micropump 8 and carry out circulating picture-changing liquid, guarantees that the concentration of solution, ingredient are uniform in work nest 16；
S7: laser parameter and direct current pulse power source parameter, the voltage swing of direct current pulse power source 2 are adjusted by computer 1
Adjustable for 0~20V, duty ratio is 0~80%, and frequency is consistent with laser parameter, and oscillograph 3 is connected with direct current pulse power source 2, real
When monitor power parameter, it is ensured that the stability of power supply in process；
S8: opening pulse laser 18, direct current pulse power source 2 and motion controller 4, according to set motion path,
The region and path that x-y-z triaxial movement platform 5 controls laser ablation are controlled by motion controller 4, to workpiece substrate
13 carry out continuing processing, realize the high efficiency synchronous manufacture and processing of micro-nano compound structure.
The embodiment is a preferred embodiment of the present invention, but present invention is not limited to the embodiments described above, not
In the case where substantive content of the invention, any conspicuous improvement that those skilled in the art can make, replacement
Or modification all belongs to the scope of protection of the present invention.
Claims (10)
1. a kind of processing method for preparing micro-nano two-dimensional structure in workpiece surface, simultaneously using laser beam ablation and electrochemical deposition
Micron-nanometer two-dimensional structure is generated in workpiece surface, obtains super thin/hydrophile function of component surface；It is characterized in that, laser
Focusing of the laser beam that device issues Jing Guo optic path system and convex lens, irradiates on workpiece substrate (13) surface, in workpiece base
Plate (13) ablated surface goes out micron scale construction；Meanwhile DC power anode, cathode distinguish bonding tool anode (11) and workpiece substrate
(13), power on, keep tool anode (11) face laser ablated region, sunk on micrometer structure using the method for electrochemistry
Product goes out nanoscale structures.
2. the processing method according to claim 1 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that including
Following steps:
Motion path model is drawn, and is input in computer (1)；
Surface preparation is carried out to workpiece substrate (13)；
Workpiece substrate (13) is fixed in work nest (16), tool anode (11) connects direct current pulse power source (2) anode, and by work
Make arm clamping to be placed in above workpiece substrate (13), workpiece substrate (13) is connected with direct current pulse power source (2) cathode, makes workpiece
Substrate (13) and tool anode (11) lower end are immersed in deposition liquid, and when energization, workpiece substrate (13) and workpiece anode (11) exist
It deposits and constitutes electrochemical circuit in liquid；
On the moving platform by work nest (16) installation, the height of x-y-z triaxial movement platform (5) is adjusted, laser is focused on
Workpiece substrate (13) surface；
It opens micropump (8) and carries out circulating picture-changing liquid, guarantee the even concentration of solution in work nest (16)；
It opens direct current pulse power source (2), electrochemistry occurs for the charged metal ion deposited in liquid also on workpiece substrate (13) surface
Original reaction, while unbalanced pulse laser (18), laser beam (19) irradiation synchronous with electro-deposition pulse current is in deposition site, in fact
It is processed while existing laser is with electro-deposition；
According to set motion path, x-y-z triaxial movement platform (5) are controlled by motion controller (4), to workpiece substrate
(13) it carries out continuing processing, realizes the simultaneously and rapidly processing of micron-nanometer two-dimensional structure.
3. the processing unit (plant) of the processing method according to claim 1 for preparing micro-nano two-dimensional structure in workpiece surface, special
Sign is, including laser irradiation system, system of processing and control system；
The laser irradiation system includes pulse laser (18), reflecting mirror (14), condenser lens (15)；Laser is by pulse laser
Device (18) issues, and changes transmission direction through reflecting mirror (14), then focus by condenser lens (15), the laser beam (19) after focusing
Irradiation is on workpiece substrate (13)；
The system of processing includes direct current pulse power source (2), work nest (16), workpiece substrate (13), tool anode (11), x-y-
Z triaxial movement platform (5)；The work nest (16) is set on x-y-z triaxial movement platform (5)；The direct current pulse power source
(2) anode is connected with tool anode (11), and cathode is connected with workpiece substrate (13)；Workpiece substrate (13) and tool anode (11)
Lower end be immersed in deposition liquid, workpiece substrate (13) and workpiece anode (11) constitute electrochemical circuit in deposition liquid；It is described
Tool anode (11) is clamped by the working arm of x-y-z triaxial movement platform (5)；
The control system includes computer (1) and motion controller (4), computer (1) control pulse laser (18),
Direct current pulse power source (2) and motion controller (4)；The motion controller (4) controls x-y-z triaxial movement platform (5).
4. the processing unit (plant) according to claim 3 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that institute
Tool anode (11) lateral wall insulation is stated, tool anode (11) is insoluble petal silk.
5. the processing unit (plant) according to claim 4 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that pass through
Insulating glass pipe (12) carries out lateral wall insulation to the tool anode (11).
6. according to the described in any item processing unit (plant)s for preparing micro-nano two-dimensional structure in workpiece surface of claim 3 to 5, feature
It is, tool anode (11) is set to above workpiece substrate (13) at 0.5~1.5mm.
7. the processing unit (plant) according to claim 3 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that processing
Device further includes working solution circulating system, and the working solution circulating system includes reservoir (6), micropump (8), filter (7)
With throttle valve (9)；The micropump (8), filter (7), throttle valve (9) are connected in the loop, reservoir (6) and micropump
(8) input terminal is connected, and work nest (16) is connected with filter (7)；Described throttle valve (9) one end is connected with work nest (16), separately
One end is connected with reservoir (6).
8. the processing unit (plant) according to claim 3 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that described
It further include oscillograph (3) in system of processing；The direct current pulse power source (2) is connected with oscillograph (3).
9. the processing unit (plant) according to claim 3 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that described
Pulse laser (18) is nanosecoud pulse laser or picosecond pulse laser.
10. the processing unit (plant) according to claim 3 for preparing micro-nano two-dimensional structure in workpiece surface, which is characterized in that heavy
Hydrops liquid level is higher than (13) 2~10mm of workpiece substrate, and deposition liquid temperature is 30~50 DEG C；Direct current pulse power source (2) voltage is adjustable
For 0~20V, frequency is consistent with laser parameter, and duty ratio is 0~80%.
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