CN109913839B - Device and method for preparing target material for magnetron sputtering - Google Patents

Device and method for preparing target material for magnetron sputtering Download PDF

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Publication number
CN109913839B
CN109913839B CN201910353358.5A CN201910353358A CN109913839B CN 109913839 B CN109913839 B CN 109913839B CN 201910353358 A CN201910353358 A CN 201910353358A CN 109913839 B CN109913839 B CN 109913839B
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opening
furnace body
sintering furnace
magnetron sputtering
heat
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CN109913839A (en
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王永超
王伟涛
杨玉杰
付宪坡
张军营
李建勋
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Henan Oriental Materials Co ltd
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Henan Oriental Materials Co ltd
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Abstract

The invention discloses a device and a method for preparing a target material for magnetic control sputtering, which comprises a storage bin, wherein a blanking pipe is arranged below the storage bin, an electromagnetic valve is arranged on the blanking pipe, a sintering furnace body is arranged below the blanking pipe, a controller is arranged on one side of the sintering furnace body, a feeding pipe is arranged on the sintering furnace body, the feeding pipe is matched with the blanking pipe, a weighing hopper is arranged in the feeding pipe, an electric control automatic door is arranged at the lower end of the weighing hopper, the electric control automatic door is arranged on the inner wall of the feeding pipe, a pressure sensor is arranged between the electric control automatic door and the weighing hopper, and an electric heating wire placing cavity is arranged in the sintering furnace body. Has the advantages that: the method has the advantages of simple equipment, short sintering time, low cost, high product density, high quality and high degree of mechanization, can be used for continuous production, increases the production efficiency, effectively utilizes waste heat, and reduces the energy consumption.

Description

Device and method for preparing target material for magnetron sputtering
Technical Field
The invention relates to the technical field of targets, in particular to a device and a method for preparing a target for magnetron sputtering.
Background
As is well known, the technical development trend of target materials is closely related to the development trend of thin film technology in downstream application industries, and as the application industries improve on thin film products or components, the target technology should be changed accordingly. As Ic manufacturers, have for some time been working on the development of low resistivity copper wiring, and are expected to replace the original aluminum film by a large amount in the coming years, so that the development of copper targets and their required barrier targets will be very slow. In recent years, Flat Panel Displays (FPDs) have largely replaced the computer display and television market, which is primarily a Cathode Ray Tube (CRT). The technical and market demands for ITO targets will also be greatly increased. In addition, the method has the advantage of storage technology. The demand for high-density, large-capacity hard disks and high-density rewritable optical disks is continuously increasing. These have resulted in varying target requirements for the application industry.
However, the conventional target material needs to be manufactured by preheating, melting and then casting and pressing raw materials, continuous operation cannot be performed, and the production efficiency is low.
An effective solution to the problems in the related art has not been proposed yet.
Disclosure of Invention
The present invention is directed to a device and a method for preparing a target material for magnetron sputtering to solve the problems of the background art.
In order to achieve the purpose, the invention provides the following technical scheme:
a device for preparing a target material for magnetic control sputtering comprises a storage bin, wherein a blanking pipe is arranged below the storage bin, a solenoid valve is arranged on the blanking pipe, a sintering furnace body is arranged below the blanking pipe, a controller is arranged on one side of the sintering furnace body, a feeding pipe is arranged on the sintering furnace body, the feeding pipe is matched with the blanking pipe, a weighing hopper is arranged in the feeding pipe, an electric control automatic door is arranged at the lower end of the weighing hopper, the electric control automatic door is arranged on the inner wall of the feeding pipe, a pressure sensor is arranged between the electric control automatic door and the weighing hopper, a heating wire placing cavity is arranged in the sintering furnace body, an electric heating wire is arranged on the inner wall of the heating wire placing cavity, a heat collecting cavity is arranged in the sintering furnace body on the upper portion of the heating wire placing cavity, a main heating opening is formed in, the two sides of the main heating opening are positioned on the heat collecting cavity and are respectively provided with a preheating opening and a heat preservation opening, one side of the sintering furnace body is positioned above the heat collecting cavity and is provided with a notch, a turntable is arranged in the notch, the middle part of the turntable is provided with a rotating shaft, one end of the rotating shaft, which is far away from the turntable, is positioned at the output end of a first motor, a plurality of placing grooves are arranged around the turntable, first through holes are arranged under the placing grooves, bottom molds are arranged in the placing grooves, each bottom mold comprises a shell, rotating rods are arranged on two sides of the shell, vertical plates are arranged on two sides of each placing groove, clamping grooves are arranged on the vertical plates and are matched with the rotating rods, second through holes are arranged under the shell and are matched with the first through holes, an inner mold is arranged in the shell, a handle plate is arranged on the inner mold, and, the improved sintering furnace is characterized in that a second motor is fixedly arranged in the placing cavity, a rotating plate is fixedly arranged at the output end of the second motor, a fixed column is fixedly arranged at the edge position of the rotating plate, a lantern ring is sleeved on the fixed column, a first transmission rod is fixedly arranged on one side of the lantern ring, the first transmission rod is far away from one end of the lantern ring, which is movably connected with a second transmission rod through a movable shaft, a transmission rod channel is arranged between the placing cavity and the second transmission rod, the second transmission rod penetrates through the transmission rod channel, extends to the placing cavity, is matched with the outer wall of the bottom die, a hydraulic rod is arranged on one side of the sintering furnace body, an upper die is arranged at the output end of the hydraulic rod, the upper die is matched with the inner die, and the electromagnetic valve, the electric control automatic door, the.
Furthermore, a material guide plate is arranged on the inner wall of the feeding pipe.
Furthermore, one side of the electric heating wire placing cavity is provided with an access door.
Furthermore, a plurality of limiting columns are arranged on the inner wall of the shell, and a heat conduction cavity is formed between the shell and the inner die through the limiting columns.
Further, the inner die comprises a ceramic side wall and an alloy bottom plate, the alloy bottom plate is fixed to the bottom of the ceramic side wall, and the alloy bottom plate is matched with the second through hole.
Furthermore, a bearing table is arranged on one side of the sintering furnace body below the rotary table, and the bearing table is in contact with the rotary table.
Furthermore, a plurality of rollers are arranged on the bearing platform, and the bearing platform is in contact with the turntable through the rollers.
Furthermore, the weighing hopper comprises three side plates and one bottom plate, the side plates are fixedly arranged on three side walls of the bottom plate, a discharging notch is arranged on the other side of the bottom plate, and the position of the discharging notch is consistent with the inclination direction of the electric control automatic door.
According to another aspect of the present invention, a method for using a device for manufacturing a target for magnetron sputtering is provided.
The use of the device for preparing the target material for magnetron sputtering comprises the following steps:
placing the crushed raw materials into a bin, opening an electromagnetic valve according to requirements, and enabling the raw materials to fall into a weighing hopper;
the controller controls the electric control automatic door to be opened to a certain degree according to the change of the gravity, so that the quantitative raw materials fall into the inner mold above the preheating opening;
the electric heating wire is electrified to rapidly heat;
the main heating port bears main heat, and the rest heat is collected by the heat collecting cavity and is discharged through the preheating opening and the heat preservation opening respectively;
rotating the preheated raw materials through a first motor, and rotating the bottom die to a main heating opening for melting;
simultaneously, quantitative raw materials fall into the inner die above the preheating opening;
rotating the melted material to a heat-preservation opening for heat preservation, and rotating the preheated material to a main heating opening;
after the preheated material rotates to the main heating opening to melt, the material continues to rotate, the melted material at the heat preservation position is rotated out of the notch, and at the moment, the upper die is moved downwards by the hydraulic rod to extrude and form the material;
continuing to rotate, finishing cooling when the formed material is about to enter the notch, manually taking out the inner mold, and simultaneously placing a new inner mold;
and removing the mold of the inner mold to obtain the finished target.
Compared with the prior art, the invention has the following beneficial effects:
through setting up the carousel, can utilize the waste heat to preheat, melt then the pouring suppression when melting the material simultaneously, can continue to produce after the centre form can be taken out afterwards and then pack into new, equipment is simple, sintering time is short, and at the bottom of the cost, the density of product is high, and high, the high level of mechanization degree of quality, can carry out continuous production, increased the efficiency of production, effectual waste heat of having utilized has reduced the consumption of the energy.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic structural diagram of an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 2 is a sectional view of a turntable in an apparatus for manufacturing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 3 is a cross-sectional view of a sintering furnace in an apparatus for producing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a vertical plate in an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the invention;
FIG. 5 is a schematic structural diagram of a second motor in an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 6 is a schematic structural diagram of a load-bearing hopper in an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 7 is a top view of a turntable in an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 8 is a schematic structural diagram of a bottom mold in an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 9 is a diagram illustrating a connection node between a feeding pipe and a feeding pipe in an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention;
FIG. 10 is a flowchart illustrating a method for using an apparatus for preparing a target for magnetron sputtering according to an embodiment of the present invention;
fig. 11 is a second flowchart of a method for using an apparatus for preparing a target material for magnetron sputtering according to an embodiment of the present invention.
Reference numerals:
1. a storage bin; 2. a discharging pipe; 3. an electromagnetic valve; 4. a sintering furnace body; 5. a controller; 6. a feed pipe; 7. a weighing hopper; 8. an electrically controlled automatic door; 9. a pressure sensor; 10. a heating wire placing cavity; 11. An electric heating wire; 12. a heat collection cavity; 13. a main heating opening; 14. preheating the opening; 15. opening for heat preservation; 16. a notch; 17. a turntable; 18. a rotating shaft; 19. a first motor; 20. a placement groove; 21. a first through hole; 22. bottom die; 23. a housing; 24. rotating the rod; 25. a vertical plate; 26. a card slot; 27. a second through hole; 28. an inner mold; 29. a handle plate; 30. a second motor; 31. a rotating plate; 32. fixing a column; 33. a collar; 34. a first drive lever; 35. a second transmission rod; 36. a drive rod channel; 37. a hydraulic lever; 38. an upper die; 39. a material guide plate; 40. an access door; 41. a thermally conductive cavity; 42. a bearing platform.
Detailed Description
The invention is further described with reference to the following drawings and detailed description:
referring to fig. 1 to 9, a device for preparing a target material for magnetron sputtering according to an embodiment of the present invention includes a storage bin 1, a feeding pipe 2 is disposed below the storage bin 1, an electromagnetic valve 3 is disposed on the feeding pipe 2, a sintering furnace body 4 is disposed below the feeding pipe 2, a controller 5 is disposed on one side of the sintering furnace body 4, a feeding pipe 6 is disposed on the sintering furnace body 4, the feeding pipe 6 is matched with the feeding pipe 2, where the matching means that the middle of the feeding pipe 6 is aligned with the middle of the feeding pipe 2, the diameter of the feeding pipe 2 is larger than the diameter of the feeding pipe 6, or a spring pipe may be connected between the feeding pipe 2 and the feeding pipe 6, as shown in fig. 9; a weighing hopper 7 is arranged in the feeding pipe 6, an electric control automatic door 8 is arranged at the lower end of the weighing hopper 7, it is noted that the electric control automatic door 8 is a single door, the electric control automatic door 8 is arranged on the inner wall of the feeding pipe 6, a pressure sensor 9 is arranged between the electric control automatic door 8 and the weighing hopper 7, a heating wire placing cavity 10 is arranged in the sintering furnace body 4, an electric heating wire 11 is arranged on the inner wall of the heating wire placing cavity 10, a heat collecting cavity 12 is arranged in the sintering furnace body 4 on the heating wire placing cavity 10, a main heating opening 13 is arranged on the heat collecting cavity 12, the electric heating wire 11 is positioned below the main heating opening 13, two sides of the main heating opening 13 are positioned on the heat collecting cavity 12 and are respectively provided with a preheating opening 14 and a heat preservation opening 15, a notch 16 is arranged on one side of the sintering furnace body 4 above the heat collecting cavity, the improved structure of the electric heating furnace is characterized in that a turntable 17 is arranged in the notch 16, a rotating shaft 18 is arranged in the middle of the turntable 17, one end, far away from the turntable 17, of the rotating shaft 18 is located at the output end of a first motor 19, a plurality of placing grooves 20 are arranged around the turntable 17, first through holes 21 are formed in the lower portions of the placing grooves 20, a bottom die 22 is arranged in the placing grooves 20, the bottom die 22 comprises a shell 23, rotating rods 24 are arranged on two sides of the shell 23, vertical plates 25 are arranged on two sides of the placing grooves 20, clamping grooves 26 are formed in the vertical plates 25, the clamping grooves 26 are matched with the rotating rods 24, second through holes 27 are formed in the shell 23, the second through holes 27 are matched with the first through holes 21, an inner die 28 is arranged in the shell 23, a handle plate 29 is arranged on the inner die 28, a placing cavity is formed in one side, a rotating plate 31 is fixedly arranged at the output end of the second motor 30, a fixing column 32 is fixedly arranged at the edge position of the rotating plate 31, a lantern ring 33 is sleeved on the fixed column 32, a first transmission rod 34 is fixedly arranged on one side of the lantern ring 33, one end of the first transmission rod 34 far away from the lantern ring 33 is movably connected with a second transmission rod 35 through a movable shaft, a transmission rod channel 36 is arranged between the placing groove 20 and the placing cavity, the second transmission rod 35 penetrates through the transmission rod channel 36 and extends into the placing groove 20 to be matched with the outer wall of the bottom die 22, a hydraulic rod 37 is arranged on one side of the sintering furnace body 4, an upper die 38 is arranged at the output end of the hydraulic rod 37, the upper die 38 is matched with the inner die 28, and the electromagnetic valve 3, the electric control automatic door 8, the first motor 19, the second motor 30 and the electric heating wire 11 are respectively electrically connected with the controller 5.
According to the scheme of the invention, materials can be put on the bottom die 22 through the stock bin 1, then the materials are melted by heating, the newly added materials can be preheated after the rotary table 17 rotates, the melted materials are subjected to heat preservation, meanwhile, the second motor 30 works the second transmission rod 35 to strike the bottom die 22 to discharge bubbles in the inner die 28, and then the heat-preserved materials are extruded and formed by rotating, so that the production can be continued.
In a specific application, for the feeding pipe 6, a material guide plate 39 is arranged on the inner wall of the feeding pipe 6. The material guide plate 39 is used to facilitate the material to enter the inner mold 28, and for the heating wire placing chamber 10, an access door 40 is provided at one side of the heating wire placing chamber 10. The electric heating wire 11 is convenient to maintain and replace. For the outer shell 23, a plurality of limiting columns are arranged on the inner wall of the outer shell 23, and a heat conducting cavity 41 is formed between the outer shell 23 and the inner mold 28 by the limiting columns. The heat conducting cavity can conveniently and uniformly conduct heat to the periphery of the inner mold 28 through air so as to uniformly heat the inner mold. For the inner mold 28, the inner mold 28 includes a ceramic sidewall and an alloy bottom plate fixed to the bottom of the ceramic sidewall, the alloy bottom plate matching the second through hole 27. The ceramic side wall is arranged for reducing the time of temperature cooling and is convenient to preserve heat. For the turntable 17, a bearing table 42 is arranged on one side of the sintering furnace body 4 under the turntable 17, and the bearing table 42 is in contact with the turntable 17. For the bearing table 42, a plurality of rollers are arranged on the bearing table 42, and the bearing table 42 is in contact with the turntable 17 through the rollers. So that the bottom of the turntable 17 can generate an upward lifting force. For the weighing hopper 7, the weighing hopper 7 comprises three side plates and one bottom plate, the side plates are fixedly arranged on three side walls of the bottom plate, a discharging notch is arranged on the other side of the bottom plate, and the position of the discharging notch is consistent with the inclination direction of the electric control automatic door 8. The material is convenient to pour.
According to the embodiment of the invention, the use method of the device for preparing the target material for magnetron sputtering is also provided.
As shown in fig. 10 to 11, the use of the apparatus for producing a target material for magnetron sputtering in an actual production process includes the steps of:
step S101, placing the crushed raw materials into a bin, opening an electromagnetic valve according to requirements, and enabling the raw materials to fall into a weighing hopper;
step S103, controlling the electric control automatic door to open by the controller according to the gravity change to a certain degree, so that quantitative raw materials fall into the inner mold above the preheating opening;
step S105, electrifying the electric heating wire to enable the electric heating wire to rapidly heat;
s107, the main heating port bears main heat, and the rest heat is collected by the heat collecting cavity and is discharged through the preheating opening and the heat preservation opening respectively;
step S109, rotating the preheated raw material through a first motor, and rotating the bottom die to a main heating opening for melting;
step S111, simultaneously, quantitative raw materials fall into the inner mold above the preheating opening;
step S113, rotating the melted material to a heat-preservation opening for heat preservation, and simultaneously rotating the preheated material to a main heating opening;
s115, after the preheated material rotates to the main heating opening to be melted, continuing to rotate, rotating the melted material at the heat preservation position out of the notch, and moving the upper die downwards by the hydraulic rod at the moment to extrude and form the material;
step S117, continuing to rotate, finishing cooling when the formed material is about to enter the notch, then manually taking out the inner mold, and simultaneously placing a new inner mold;
and step S119, removing the taken out inner mold to obtain a finished target.
In summary, according to the above technical scheme of the present invention, the material is put on the bottom die 22 through the bin 1, and then melted by heating, the newly added material can be preheated after the rotation of the turntable 17, at this time, the melted material is subjected to heat preservation, at the same time, the second motor 30 works the second transmission rod 35 to hit the bottom die 22 to discharge bubbles in the inner die 28, and then the second motor rotates to extrude the heat preserved material, so that the production can be continued.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (9)

1. The device for preparing the target material for magnetron sputtering is characterized by comprising a storage bin (1), a blanking pipe (2) is arranged below the storage bin (1), an electromagnetic valve (3) is arranged on the blanking pipe (2), a sintering furnace body (4) is arranged below the blanking pipe (2), a controller (5) is arranged on one side of the sintering furnace body (4), a feeding pipe (6) is arranged on the sintering furnace body (4), the feeding pipe (6) is matched with the blanking pipe (2), a weighing hopper (7) is arranged in the feeding pipe (6), an electric control automatic door (8) is arranged at the lower end of the weighing hopper (7), the electric control automatic door (8) is arranged on the inner wall of the feeding pipe (6), a pressure sensor (9) is arranged between the electric control automatic door (8) and the weighing hopper (7), an electric heating wire placing cavity (10) is arranged inside the sintering furnace body (4), the inner wall of the heating wire placing cavity (10) is provided with an electric heating wire (11), the heating wire placing cavity (10) is located inside a heat collecting cavity (12) in the sintering furnace body (4), a main heating opening (13) is formed in the heat collecting cavity (12), the electric heating wire (11) is located below the main heating opening (13), two sides of the main heating opening (13) are located on the heat collecting cavity (12) and are respectively provided with a preheating opening (14) and a heat preservation opening (15), one side of the sintering furnace body (4) is located above the heat collecting cavity (12) and is provided with a notch (16), a turntable (17) is arranged in the notch (16), the middle of the turntable (17) is provided with a rotating shaft (18), one end of the rotating shaft (18) far away from the turntable (17) is located at the output end of a first motor (19), and a plurality of placing grooves (20) are formed around the turntable (17), a first through hole (21) is formed in the lower portion of the placing groove (20), a bottom die (22) is arranged in the placing groove (20), the bottom die (22) comprises an outer shell (23), rotating rods (24) are arranged on two sides of the outer shell (23), vertical plates (25) are arranged on two sides of the placing groove (20), clamping grooves (26) are formed in the vertical plates (25), the clamping grooves (26) are matched with the rotating rods (24), second through holes (27) are formed in the lower portion of the outer shell (23), the second through holes (27) are matched with the first through holes (21), an inner die (28) is arranged in the outer shell (23), a handle plate (29) is arranged on the inner die (28), a placing cavity is formed in one side of the placing groove (20), a second motor (30) is fixedly arranged in the placing cavity, and a rotating plate (31) is fixedly arranged at the output end of the second motor (30), the fixed column (32) that is equipped with in marginal position of rotor plate (31), the cover is equipped with lantern ring (33) on fixed column (32), one side of lantern ring (33) is fixed and is equipped with first transfer line (34), keep away from first transfer line (34) the one end of lantern ring (33) is equipped with second transfer line (35) through loose axle swing joint, standing groove (20) with it is equipped with transfer line passageway (36) to place between the cavity, second transfer line (35) run through transfer line passageway (36) extend to in standing groove (20) with the outer wall phase-match of die block (22), one side of sintering furnace body (4) is equipped with hydraulic stem (37), the output of hydraulic stem (37) is equipped with mould (38), go up mould (38) with centre form (28) phase-match, solenoid valve (3), automatically controlled automatically-operated gate (8), The first motor (19), the second motor (30) and the electric heating wire (11) are respectively electrically connected with the controller (5).
2. The apparatus for preparing a target material for magnetron sputtering as claimed in claim 1, wherein a material guide plate (39) is provided on an inner wall of the feeding pipe (6).
3. The apparatus for preparing a target material for magnetron sputtering as claimed in claim 2, wherein an access door (40) is provided at one side of the heating wire placing chamber (10).
4. The apparatus for preparing a target material for magnetron sputtering according to claim 3, wherein the inner wall of the outer shell (23) is provided with a plurality of limiting columns, and the limiting columns enable a heat conducting cavity (41) to be formed between the outer shell (23) and the inner mold (28).
5. The apparatus as claimed in claim 4, wherein the inner mold (28) comprises a ceramic sidewall and an alloy bottom plate, the alloy bottom plate is fixed on the bottom of the ceramic sidewall, and the alloy bottom plate is matched with the second through hole (27).
6. The apparatus for preparing a target material for magnetron sputtering according to claim 5, wherein a bearing table (42) is provided below the turntable (17) on one side of the sintering furnace body (4), and the bearing table (42) is in contact with the turntable (17).
7. The apparatus for preparing a target material for magnetron sputtering as claimed in claim 6, wherein the carrier (42) is provided with a plurality of rollers, and the carrier (42) is in contact with the turntable (17) through the rollers.
8. The device for preparing the target material for magnetron sputtering according to claim 7, wherein the weighing hopper (7) comprises three side plates and one bottom plate, the three side walls of the bottom plate are fixedly provided with the side plates, the other side of the bottom plate is provided with a discharging gap, and the position of the discharging gap is consistent with the inclined direction of the electric control automatic door (8).
9. A method for using the apparatus for producing a target material for magnetron sputtering according to claim 8, comprising the steps of:
placing the crushed raw materials into a bin, opening an electromagnetic valve according to requirements, and enabling the raw materials to fall into a weighing hopper;
the controller controls the electric control automatic door to be opened to a certain degree according to the change of the gravity, so that the quantitative raw materials fall into the inner mold above the preheating opening;
the electric heating wire is electrified to rapidly heat;
the main heating port bears main heat, and the rest heat is collected by the heat collecting cavity and is discharged through the preheating opening and the heat preservation opening respectively;
rotating the preheated raw materials through a first motor, and rotating the bottom die to a main heating opening for melting;
simultaneously, quantitative raw materials fall into the inner die above the preheating opening;
rotating the melted material to a heat-preservation opening for heat preservation, and rotating the preheated raw material to a main heating opening;
after the preheated material rotates to the main heating opening to melt, the material continues to rotate, the melted material at the heat preservation position is rotated out of the notch, and at the moment, the upper die is moved downwards by the hydraulic rod to extrude and form the material;
continuing to rotate, finishing cooling when the formed material is about to enter the notch, manually taking out the inner mold, and simultaneously placing a new inner mold;
and removing the mold of the inner mold to obtain the finished target.
CN201910353358.5A 2019-04-29 2019-04-29 Device and method for preparing target material for magnetron sputtering Active CN109913839B (en)

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Application Number Priority Date Filing Date Title
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CN109913839B true CN109913839B (en) 2021-06-29

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Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6165413A (en) * 1999-07-08 2000-12-26 Praxair S.T. Technology, Inc. Method of making high density sputtering targets
US20070062804A1 (en) * 2005-09-20 2007-03-22 Cp Technologies, Inc. Device and method of manufacturing sputtering targets
CN102260802B (en) * 2011-07-20 2013-06-12 佛山市钜仕泰粉末冶金有限公司 Target preparation device and target processing method thereof
WO2016067717A1 (en) * 2014-10-28 2016-05-06 三井金属鉱業株式会社 Cylindrical ceramic sputtering target and manufacturing device and manufacturing method therefor
CN109231997B (en) * 2018-09-04 2021-10-12 房孝兰 Manufacturing equipment of composite ceramic target

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