CN109830419B - Miniature penning ion source - Google Patents
Miniature penning ion source Download PDFInfo
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- CN109830419B CN109830419B CN201910070225.7A CN201910070225A CN109830419B CN 109830419 B CN109830419 B CN 109830419B CN 201910070225 A CN201910070225 A CN 201910070225A CN 109830419 B CN109830419 B CN 109830419B
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Abstract
The invention relates to the field of superconducting cyclotrons, and discloses a miniature penning ion source which comprises a machine shell, wherein an anode cylinder is arranged in the machine shell, cathodes are arranged in the machine shell and are positioned at two ends of the machine shell, the anode cylinder is positioned between the cathodes, an insulating part is arranged on the cathodes, the insulating part comprises a first insulating block arranged on the cathodes and used for insulating the machine shell, a second insulating block arranged on the first insulating block and used for insulating the anode cylinder, and a third insulating block arranged on the first insulating block and used for insulating the machine shell, hydrogen channels are arranged at two ends of the anode cylinder, a leading-out slit is arranged at one side, away from the hydrogen channels, of the anode cylinder, and a gas transmission channel communicated with the hydrogen channels is arranged on the machine shell. The invention is not easy to influence the effect of plasma generation.
Description
Technical Field
The invention relates to the technical field of superconducting cyclotron, in particular to a micro penning ion source.
Background
The current cyclotron is a device which uses a magnetic field and an electric field to make charged particles perform cyclotron motion together, and repeatedly accelerates the charged particles through a high-frequency electric field in the motion, and is an important instrument in high-energy physics, wherein a superconducting isochronous cyclotron (a branch of the superconducting cyclotron) is a core device of the current medical proton therapy accelerator. The medical proton treatment accelerator can realize the treatment of tumors by using protons and heavy ion rays in the microscopic world, is the most advanced radiotherapy technology in the world, and is mastered and applied only by individual developed countries.
In the prior art, plasma is generally generated by a penning ion source, hydrogen enters an anode cylinder through a hydrogen channel on one side of the anode cylinder, kilovolt voltage is loaded between the anode cylinder and a cathode, and a large amount of plasma is formed by collision of electrons and neutral gas molecules.
The above prior art solutions have the following drawbacks: the hydrogen enters the anode cylinder through the hydrogen channel on one side of the anode cylinder, so that the hydrogen in the anode cylinder is unevenly distributed; if the hydrogen is distributed uniformly, more hydrogen is introduced, which causes a larger amount of introduced hydrogen, and thus a big fire is likely to occur between the cathode and the anode cylinder, and at the same time, the insulation between the cathode and the anode cylinder is likely to be reduced under long-time operation, which affects the generation of plasma.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a miniature penning ion source which has the effect of not easily influencing the generation of plasma.
In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a miniature penning ion source, includes the casing, be provided with an anode barrel in the casing, be provided with the negative pole in the casing, the negative pole is located the both ends of casing, an anode barrel is located between the negative pole, be provided with the insulating part on the negative pole, the insulating part is including setting up be used for carrying out insulating first collets, the setting with the casing on the negative pole be used for carrying out insulating second collets, the setting with an anode barrel on the first collets be used for carrying out insulating third collets with the casing on the first collets, the hydrogen passageway has been seted up at the both ends of an anode barrel, the lead-out seam has been seted up to one side that an anode barrel kept away from the hydrogen passageway, set up on the casing with the gas transmission passageway of hydrogen passageway intercommunication.
By adopting the technical scheme, hydrogen enters the two ends of the anode cylinder through the gas transmission channel and the hydrogen channel, then ionization is carried out, electrons move in the anode cylinder in a spiral line manner, and in the movement process of the electrons, the electrons collide with neutral gas molecules in the anode cylinder, so that a large amount of plasma is formed, and the plasma is led out from the lead-out seam to form a particle flow beam; because hydrogen enters into the anode cylinder from the two ends of the anode cylinder, the hydrogen distribution in the anode cylinder is uniform, and the amount of the introduced hydrogen is reduced, so that the plasma distribution in the anode cylinder is uniform, the main vacuum is better, the extraction efficiency of the plasma is higher, the insulativity between the cathode and the anode cylinder is not easy to reduce, and the generation of the plasma is not easy to influence.
The invention is further configured to: the two sides of the third insulating block are respectively abutted against the inner walls of the first insulating block and the shell, and the two ends of the second insulating block are respectively abutted against the first insulating block and the anode cylinder.
Through adopting above-mentioned technical scheme, insulating between first insulating block and the third insulating block anticathode and the casing, insulating between second insulating block anticathode and the positive pole section of thick bamboo to make plasma can normally produce.
The invention is further configured to: the anode cylinder comprises a cylinder body and an anode cavity formed in the cylinder body, the anode cavity comprises a middle cavity and end cavities which are positioned at two ends of the middle cavity and communicated with the middle cavity, the inner diameter of one end, close to the middle cavity, of each end cavity is smaller than the inner diameter of one end, far away from the middle cavity, of each end cavity, the hydrogen channel is communicated with the end cavities, and the lead-out seams are communicated with the middle cavities.
By adopting the technical scheme, hydrogen enters from the end cavity, and plasma is converged in the middle cavity under the driving of the electromagnetic field and then leaves from the middle cavity, so that the extraction efficiency is improved.
The invention is further configured to: the thickness of the inner wall of the cylinder body at the side far away from the leading-out seam is greater than that of the inner wall at the side where the leading-out seam is located.
Through adopting above-mentioned technical scheme, the length of drawing the seam is shorter to shorten the migration time of plasma in drawing the seam, the inner wall thickness of opposite side is great, thereby makes the hydrogen passageway longer, increases the income volume of hydrogen.
The invention is further configured to: the first insulating block, the second insulating block and the third insulating block are all made of boron nitride.
By adopting the technical scheme, the boron nitride has higher resistivity and can play an insulating role, and meanwhile, the boron nitride has good high-temperature stability and high heat conductivity coefficient, so that the whole plasma generation process is stable.
The invention is further configured to: the length of the lead-out seam is 5mm, and the width is 0.5 mm.
By adopting the technical scheme, the ratio of the length to the width of the extraction slit is large, so that a small amount of continuous plasma leaves from the extraction slit, and the plasma beam is formed quickly.
The invention is further configured to: the diameter of the hydrogen channel was 2 mm.
Through adopting above-mentioned technical scheme, the diameter of hydrogen passageway is less to can realize comparatively accurate control to the entering volume of hydrogen, thereby make the volume of letting in of hydrogen comparatively accurate.
The invention is further configured to: the hydrogen in the anode cavity is high-purity hydrogen, and the output pressure is 202.6 kilopascal.
By adopting the technical scheme, the influence of impurity gas on ionization is reduced by the high-purity hydrogen, and the gas transmission pressure is 202.6 kilopascals.
The invention is further configured to: the anode cylinder is made of copper.
By adopting the technical scheme, the copper is conducted with the outside, so that the ground potential is formed.
The invention is further configured to: the cathode is made of 100% pure tantalum with low outgassing.
By adopting the technical scheme, the tantalum self is stable, so that the cathode is not easy to generate chemical reaction during ionization.
In conclusion, the invention has the following beneficial effects:
through setting up an anode cylinder and a hydrogen passageway, hydrogen enters into the both ends of an anode cylinder from the hydrogen passageway, thereby make hydrogen comparatively even enter into in the anode cylinder, make the hydrogen distribution in the anode cylinder comparatively even, the volume of the hydrogen that lets in has also been reduced simultaneously, thereby make the plasma distribution in the anode cylinder comparatively even, make main vacuum better, make plasma draw forth efficiency higher, make the insulating nature between negative pole and the anode cylinder be difficult for reducing, thereby be difficult for influencing the production of plasma.
Drawings
FIG. 1 is a schematic view of the internal structure of the present invention;
fig. 2 is an enlarged view of a portion a of fig. 1, showing a connection structure of the main pipe and the first sub-pipe.
Reference numerals: 1. a housing; 2. an anode cylinder; 21. a barrel; 22. an anode cavity; 221. an intermediate chamber; 222. an end chamber; 223. a hydrogen gas passage; 224. leading out a seam; 3. a cathode; 4. an insulating member; 41. a first insulating block; 42. a second insulating block; 43. a third insulating block; 5. a gas transmission channel; 51. a main pipeline; 52. a first secondary conduit; 53. a second secondary line.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
Referring to fig. 1 and 2, the micro penning ion source disclosed by the invention comprises a casing 1, wherein the casing 1 is made of a tungsten-copper alloy material with high temperature resistance, high pressure resistance and low outgassing. An anode cylinder 2 is fixedly connected in the casing 1, the anode cylinder 2 is made of copper, and the anode cylinder 2 is positioned in the middle of the casing 1. The two ends of the casing 1 are fixedly connected with cathodes 3, and the cathodes 3 are made of tantalum with low outgas purity of 100%. The casing 1 is located the magnetic field, and the magnetic field direction is parallel with the length direction of anode cylinder 2, and magnetic field intensity is 5000GS-6000GS, is provided with insulating part 4 on the negative pole 3, and insulating part 4 includes first insulating block 41, second insulating block 42 and third insulating block 43, and first insulating block 41, second insulating block 42 and third insulating block 43 all adopt boron nitride to make, and first insulating block 41 fixed connection is on negative pole 3, and the both sides of third insulating block 43 contradict with the inner wall of casing 1 and negative pole 3 respectively. Both ends of the second insulating block 42 are respectively abutted against the first insulating block 41 and the anode cylinder 2.
The anode cylinder 2 comprises a cylinder body 21 and an anode cavity 22, the anode cavity 22 is located in the cylinder body 21, and a hydrogen channel 223 and an extraction slit 224 are respectively arranged on two sides of the anode cavity 22. The anode chamber 22 comprises a middle chamber 221 and end chambers 222, the inner diameter of the middle chamber 221 is 10mm, the end chambers 222 are positioned at both ends of the middle chamber 221 and are communicated with the middle chamber 221, the inner diameter of one end of the end chamber 222 far away from the middle chamber 221 is 15mm, and the total length of the anode cylinder 2 is 20 mm. Each end chamber 222 is provided with a hydrogen channel 223, the diameter of the hydrogen channel 223 is 2mm, the lead-out seam 224 is positioned in the middle of the middle chamber 221, the length of the lead-out seam 224 is 5mm, the width of the lead-out seam is 0.5mm, and the thickness of the inner wall of the cylinder 21 on the side far away from the lead-out seam 224 is larger than that of the inner wall on the side where the lead-out seam 224 is positioned.
The casing 1 is provided with a gas transmission channel 5, the gas transmission channel 5 comprises a main pipeline 51, a first auxiliary pipeline 52 and a second auxiliary pipeline 53, two ends of the first auxiliary pipeline 52 and the second auxiliary pipeline 53 are respectively communicated with the main pipeline 51 and the hydrogen channel 223, and the main pipeline 51, the first auxiliary pipeline 52 and the second auxiliary pipeline 53 form an F shape.
The implementation principle of the embodiment is as follows: high-purity hydrogen with an output pressure level of 202.6 kilopascals enters two ends of the anode cylinder 2 through the gas transmission channel 7 and the hydrogen channel 223, the hydrogen flow is 3sccm-4sccm at the moment, then 1.5Kv-3Kv of voltage is loaded on the cathode 3 for ionization, electrons move in the anode cylinder 2 in a spiral line, and collide with neutral gas molecules in the anode cylinder 2 in the electron moving process, so that a large amount of plasma is formed, and the plasma is led out from the lead-out slit 224 to form a particle flow beam; because hydrogen enters into in the anode cylinder 2 from the both ends of anode cylinder 2 for hydrogen distribution in the anode cylinder 2 is comparatively even, has also reduced the volume of the hydrogen of letting in simultaneously, thereby makes the plasma distribution in the anode cylinder 2 comparatively even, makes main vacuum better, makes the extraction efficiency of plasma higher, makes the insulating nature between negative pole 3 and the anode cylinder 2 be difficult for reducing, thereby is difficult for influencing the production of plasma.
The embodiments of the present invention are preferred embodiments of the present invention, and the scope of the present invention is not limited by these embodiments, so: all equivalent changes made according to the structure, shape and principle of the invention are covered by the protection scope of the invention.
Claims (10)
1. A miniature penning ion source is characterized in that: comprises a casing (1), an anode cylinder (2) is arranged in the casing (1), a cathode (3) is arranged in the casing (1), the cathode (3) is positioned at two ends of the casing (1), the anode cylinder (2) is positioned between the cathodes (3), an insulating part (4) is arranged on the cathode (3), the insulating part (4) comprises a first insulating block (41) which is arranged on the cathode (3) and used for insulating the casing (1), a second insulating block (42) which is arranged on the first insulating block (41) and used for insulating the anode cylinder (2), and a third insulating block (43) which is arranged on the first insulating block (41) and used for insulating the casing (1), a hydrogen passage (223) is arranged at two ends of the anode cylinder (2), a leading-out seam (224) is arranged at one side of the anode cylinder (2) far away from the hydrogen passage (223), the shell (1) is provided with a gas transmission channel (5) communicated with the hydrogen channel (223).
2. The micro penning ion source of claim 1, wherein: the two sides of the third insulating block (43) are respectively abutted to the inner walls of the first insulating block (41) and the casing (1), and the two ends of the second insulating block (42) are respectively abutted to the first insulating block (41) and the anode cylinder (2).
3. The micro penning ion source of claim 1, wherein: the anode cylinder (2) comprises a cylinder body (21) and an anode cavity (22) formed in the cylinder body (21), the anode cavity (22) comprises a middle chamber (221) and an end chamber (222) which is positioned at two ends of the middle chamber (221) and communicated with the middle chamber (221), the inner diameter of one end, close to the middle chamber (221), of the end chamber (222) is smaller than that of one end, far away from the middle chamber (221), of the end chamber (222), the hydrogen channel (223) is communicated with the end chamber (222), and the lead-out seam (224) is communicated with the middle chamber.
4. The micro penning ion source of claim 3, wherein: the thickness of the inner wall of the barrel (21) on the side far away from the leading-out seam (224) is larger than that of the inner wall on the side where the leading-out seam (224) is located.
5. The micro penning ion source of claim 1, wherein: the first insulating block (41), the second insulating block (42) and the third insulating block (43) are all made of boron nitride.
6. The micro penning ion source of claim 1, wherein: the length of the lead-out seam (224) is 5mm, and the width is 0.5 mm.
7. The micro penning ion source of claim 1, wherein: the diameter of the hydrogen passage (223) is 2 mm.
8. The micro penning ion source of claim 3, wherein: the hydrogen input in the anode cavity (22) is high-purity hydrogen, and the output pressure is 202.6 kilopascal.
9. The micro penning ion source of claim 1, wherein: the anode cylinder (2) is made of copper.
10. The micro penning ion source of claim 1, wherein: the cathode (3) is made of 100% pure tantalum with low outgassing.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910070225.7A CN109830419B (en) | 2019-01-24 | 2019-01-24 | Miniature penning ion source |
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| CN201910070225.7A CN109830419B (en) | 2019-01-24 | 2019-01-24 | Miniature penning ion source |
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| CN109830419A CN109830419A (en) | 2019-05-31 |
| CN109830419B true CN109830419B (en) | 2020-05-19 |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111681937B (en) * | 2020-06-09 | 2021-04-06 | 中国科学院合肥物质科学研究院 | Cold cathode penning ion source device for high-energy ion implanter |
| CN113488364A (en) * | 2021-07-13 | 2021-10-08 | 迈胜医疗设备有限公司 | Multi-particle hot cathode penning ion source and cyclotron |
| CN115188648B (en) * | 2022-09-08 | 2022-12-23 | 合肥中科离子医学技术装备有限公司 | Internal penning source structure and cyclotron |
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| CN101045989A (en) * | 2007-04-30 | 2007-10-03 | 大连理工大学 | Low energy ion implanter based on great area DC pulse plasma |
| CN101128911A (en) * | 2005-02-28 | 2008-02-20 | 爱普斯碧德股份有限公司 | System and process for high-density, low-energy plasma enhanced vapor phase epitaxy |
| CN103038387A (en) * | 2011-08-02 | 2013-04-10 | 新柯隆株式会社 | Method for forming silicon carbide thin film |
| CN106098517A (en) * | 2016-07-29 | 2016-11-09 | 中国原子能科学研究院 | Miniature Penning ion source under a kind of highfield |
| CN106128928A (en) * | 2016-07-29 | 2016-11-16 | 中国原子能科学研究院 | The deriving structure of miniature Penning ion source under a kind of highfield |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8324592B2 (en) * | 2010-11-02 | 2012-12-04 | Twin Creeks Technologies, Inc. | Ion source and a method of generating an ion beam using an ion source |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101128911A (en) * | 2005-02-28 | 2008-02-20 | 爱普斯碧德股份有限公司 | System and process for high-density, low-energy plasma enhanced vapor phase epitaxy |
| CN101045989A (en) * | 2007-04-30 | 2007-10-03 | 大连理工大学 | Low energy ion implanter based on great area DC pulse plasma |
| CN103038387A (en) * | 2011-08-02 | 2013-04-10 | 新柯隆株式会社 | Method for forming silicon carbide thin film |
| CN106098517A (en) * | 2016-07-29 | 2016-11-09 | 中国原子能科学研究院 | Miniature Penning ion source under a kind of highfield |
| CN106128928A (en) * | 2016-07-29 | 2016-11-16 | 中国原子能科学研究院 | The deriving structure of miniature Penning ion source under a kind of highfield |
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