CN109764585A - Refrigerant purification system with film protection - Google Patents
Refrigerant purification system with film protection Download PDFInfo
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- CN109764585A CN109764585A CN201811323690.9A CN201811323690A CN109764585A CN 109764585 A CN109764585 A CN 109764585A CN 201811323690 A CN201811323690 A CN 201811323690A CN 109764585 A CN109764585 A CN 109764585A
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- film
- refrigeration system
- gas
- fluid circulation
- pollutant
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B43/00—Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B43/00—Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat
- F25B43/04—Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat for withdrawing non-condensible gases
- F25B43/043—Arrangements for separating or purifying gases or liquids; Arrangements for vaporising the residuum of liquid refrigerant, e.g. by heat for withdrawing non-condensible gases for compression type systems
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B49/00—Arrangement or mounting of control or safety devices
- F25B49/02—Arrangement or mounting of control or safety devices for compression type machines, plants or systems
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
A kind of refrigeration system is disclosed, the refrigeration system includes heat transfer fluid circulation circuit, and the heat transfer fluid circulation circuit is configured to permit refrigerant circulation to pass through the circulation loop.Purified gas outlet is operationally connected to the heat transfer fluid circulation circuit.The system also includes at least one ventilated membrane, the ventilated membrane has the first side and second side, and first side is operationally connected to the purified gas outlet.The film includes separating layer, and the separating layer includes porous inorganic material, and the size permission pollutant in the hole of the porous inorganic material is passed through by the film and limits the refrigerant to be passed through by the film, and the polymer coating in the separating layer.Permeant outlet is operationally connected to described second side of the film.
Description
Background technique
The disclosure relates generally to the chiller systems for air-conditioning system, and more particularly relate to from refrigeration system
The purification system of system removal pollutant.
It may include such as in the part of subatmospheric lower operation using the chiller system of centrifugal compressor.Therefore,
Leakage in chiller system may draw air into system, to pollute refrigerant.This pollutant reduces cooler system
The performance of system.In order to solve this problem, existing low pressure cooler includes clean unit to remove pollutant.Existing purification
Unit is using vapor-compression cycle to separate uncondensable gas with refrigerant.Existing clean unit be it is complicated and
Refrigerant can be lost during removing pollutant.
Summary of the invention
A kind of refrigeration system is disclosed, the refrigeration system includes heat transfer fluid circulation circuit, the heat transfer fluid circulation
Circuit is configured to permit refrigerant to recycle wherein.Purified gas outlet is operationally connected to heat transfer fluid circulation circuit.
System further includes at least one ventilated membrane, at least one described ventilated membrane has the first side and second side, first side and net
Change gas vent to be operationally connected to.Film includes separating layer, and the separating layer includes porous inorganic material, the porous, inorganic material
The size permission pollutant in the hole of material is passed through by film and limits refrigerant to be passed through by film, and the polymer in separating layer
Coating.Permeant outlet is operationally connected to second side of film.
In some embodiments, system further includes the prime mover for being operably linked to permeant outlet, and former dynamic
Machine is configured to gas being moved to the exhaust outlet led to outside fluid circulation loop from second side of film.
In any of foregoing embodiments or combination, heat transfer fluid circulation circuit includes being sequentially connected by conduit
Compressor, heat rejection heat exchanger, expansion device and endothermic heat exchanger together, and purified gas outlet and heat extraction heat are handed over
At least one of parallel operation, endothermic heat exchanger or film are operationally connected to.
In any of foregoing embodiments or combination, system further includes retentate return conduit, the retentate
First side of film is operationally connected to fluid circulation loop by return conduit.In some embodiments, prime mover is vacuum
Pump.
In any of foregoing embodiments or combination, system further includes being operably linked to purge outlet and film
Purification gas collector.
In some embodiments, system further includes the prime mover for being operably linked to permeant outlet, described former dynamic
Machine is configured to gas being moved to the exhaust outlet led to outside fluid circulation loop from second side of film.In some embodiments
In, prime mover includes the vacuum pump being operationally connected to second side of film.
In any of foregoing embodiments or combination, system further includes that can grasp with the first side of purge outlet and film
Make the filter of ground connection.
In any of foregoing embodiments or combination, separating layer includes ceramic material.
In any of foregoing embodiments or combination, wherein film includes zeolite.
In any of foregoing embodiments or combination, at least one ventilated membrane includes multiple ventilated membranes；It is wherein more
A ventilated membrane arranges in series or in parallel.
Any one of foregoing embodiments or combination in, polymeric layer include selected from silicon rubber, fluorosilicone or
The polymer of polyimides.
In any of foregoing embodiments or combination, polymeric layer has 0.05 μm to 50 μm of thickness.
In any of foregoing embodiments or combination, system further includes controller, and the controller is configured to
It is operated in response to cooling requirement signal operation fluid circulation loop and in response to determining for the pollutant in fluid circulation loop
Prime mover.
In any of foregoing embodiments or combination, controller is configured to start purification recoil mode, net
Change the first side that gas in recoil mode is transported to film from second side of film.
In any one or combination of foregoing embodiments, controller is configured to start heat source so that film is heated to one
Temperature is determined to remove pollutant.
A kind of method for operating refrigeration system is also disclosed, the method includes making refrigerant in response to cooling requirement signal
Cycle through heat transfer fluid circulation circuit.The purification gas comprising pollutant is collected from the purge outlet in fluid circulation loop.
Pollutant is shifted by the permeable molecular screen membrane with prime mover, and the film includes porous, inorganic or metal organic framework, institute
The size permission pollutant for stating the hole of porous, inorganic or metal organic framework is passed through by film and limits refrigerant to be passed through by film.
The method also includes by the way that gas is transported to the first side of film from second side of film come film or the period of periodically recoiling
Film is heated to property certain temperature to remove pollutant, or gas was periodically both transported to film from second side of film
Film is periodically heated to certain temperature again to remove pollutant by the first side.
In any of foregoing embodiments or combination, the method includes by the way that second side of gas from film is defeated
The first side of film is sent to come the film that periodically recoils.
In any of foregoing embodiments or combination, the method also includes being periodically heated to film centainly
Temperature is to remove pollutant.
In any of foregoing embodiments or combination, the method also includes making before purification gas reaches film
Purification gas passes through filter.
In any of foregoing embodiments or combination, the method also includes by pollutant transportation by inorganic or
Polymer coating on metal organic framework film.
In any of foregoing embodiments or combination, the method also includes net between purge outlet and film
Change collection and purification gas in gas collector.
In any of foregoing embodiments or combination, the method also includes returning refrigerant from the first side of film
Return to fluid circulation loop.
Detailed description of the invention
Be described below should not be construed as anyway it is restrictive.Referring to attached drawing, similar components are numbered with same numbers:
Fig. 1 be include it is steam compressed heat transfer refrigerant fluid circulation loop refrigeration system schematic diagram；
Fig. 2 is the schematic diagram of the exemplary implementation scheme of the film purification system for refrigeration system；
Fig. 3 is the schematic diagram of seperation film；
Fig. 4 is the film purification system of the associated components with purification collector and steam compressed heat transfer refrigerant fluid circulation loop
Exemplary implementation scheme schematic diagram；And
Fig. 5 is the film purification system of the associated components with purification collector and steam compressed heat transfer refrigerant fluid circulation loop
Another exemplary embodiment schematic diagram.
Specific embodiment
Present one or more of disclosed device and method by way of example and not limitation herein by reference to attached drawing
The detailed description of a embodiment.
Referring to Fig.1, the heat transfer fluid circulation circuit that can be used for cooler is shown in block diagram form such as in Fig. 1.Such as
Shown in Fig. 1, compressor 10 pressurizes in its gaseous refrigerant, offer pressure that the compressor 10 had not only heated fluid again so that
Fluid recycles in the entire system.In some embodiments, heat-transfer fluid or refrigerant include organic compound.In some realities
It applies in scheme, refrigerant includes hydrocarbon or substituted hydrocarbon.In some embodiments, refrigerant includes the hydrocarbon that halogen replaces.One
In a little embodiments, refrigerant includes the fluorine-substituted hydrocarbon of fluorine-substituted or chlorine.The pressurized gaseous biography for the heat left from compressor 10
Hot fluid flows to heat exchanger condenser 20 by conduit 15, and the heat exchanger condenser 20 is used as heat exchanger with by heat
It is transmitted to ambient enviroment from heat-transfer fluid, the gaseous heat transfer fluid of heat is caused to be condensed into the liquid of the moderate temperature of pressurization.From cold
The liquid heat transfer fluid that condenser 20 leaves flows to expansion valve 30 by conduit 25, and pressure is reduced at the expansion valve 30.It leaves
The depressurized fluid heat-transfer fluid of expansion valve 30 flows to heat exchanger evaporator 40, the heat exchanger evaporator 40 by conduit 35
As heat exchanger to absorb heat from ambient enviroment and heat-transfer fluid is made to boil.The gaseous heat transfer fluid for leaving evaporator 40 is logical
It crosses conduit 45 and flows to compressor 10, to complete heat transfer fluid loop.Heat transfer system has heat from around evaporator 40
Environment is transmitted to the effect of the environment around condenser 20.The macroscopic property of heat-transfer fluid must be allowed for it to reach when compressed
To sufficiently high temperature, so that its temperature for being greater than the environment around condenser 20, to allow heat transfer to ambient enviroment.
The macroscopic property of heat-transfer fluid must also have boiling point under the bulbs of pressure behind, and the boiling point allows around evaporator 40
Temperature provides heat to evaporate liquid heat transfer fluid.
Referring now to Fig. 2, the purification system that may be connected to steam compressed heat transfer fluid circulation circuit of such as Fig. 1 is shown
Exemplary implementation scheme.As shown in Fig. 2, purification system by connector 52 will comprising refrigerant gas and pollutant (for example,
Nitrogen, oxygen, vapor) gas receive the membrane separator 54 on the first side of film 56.Such as connected by connector 60
Prime mover to the vacuum pump 58 of membrane separator 54 provides driving force so that pollutant is by film 56 and by exporting 62 from film
56 second side leaves system.In some embodiments, prime mover can be in fluid circuit (for example, refrigerated medium pump or compression
Machine) in.Refrigerant gas is retained on the first side of film 56 and can return to fluid circulation loop by connector 64.
Film 56 includes porous inorganic material.The example of porous inorganic material may include ceramics, such as metal oxide or
Metal silicate, more specifically, aluminosilicate (for example, chabasie skeleton (CHA) zeolite, Linde A type (LTA) zeolite), more
Hole carbon, cellular glass, clay (for example, montmorillonite, galapectite).Porous inorganic material can also include porous metals, such as platinum
And nickel.Also mixing inorganic-organic material, such as metal organic framework (MOF) can be used.Other materials can reside in film
In, it can such as disperse the carrier of microporous materials, the carrier may include in structure or technique consider.
Metal-organic framework materials include with the metal ion of organoligand coordination or metal ion cluster with formed it is one-dimensional, two
Dimension or three-dimensional structure.Metal organic framework can be characterized as the coordinated network with the organic ligand containing gap.Coordinated network
It can be characterized as the complex by duplicate coordination entity in one-dimensional upper extension, but it is individual at two or more
There is crosslinking, or the complex extended in two dimension or three-dimensional through duplicate coordination entity between chain, ring or loop coil.Match
Position compound may include the coordination polymer with the repetition coordination entity in one-dimensional, two-dimentional or three-dimensional upper extension.Organic ligand
Example include but is not limited to two tooth carboxylates (for example, oxalic acid, succinic acid, O-phthalic acid isomer etc.), three tooth carboxylates
(for example, citric acid, trimesic acid), azole (such as 1,2,3-triazoles) and other known organic ligand.The organic bone of metal
It may include various metals in frame.The example of special metal organic framework material include but is not limited to zeolite imidazole skeleton (ZIF),
HKUST-1。
In some embodiments, aperture can be characterized by pore-size distribution, and wherein average pore size is 2.5 to 10.0
, and pore-size distribution is at least 0.1.In some embodiments, the average pore size of porous material can be 2.5 in lower end
To 4.0 and upper end be 2.6 to 10.0 in the range of.In some embodiments, average pore size can be 2.5 in lower end
, 3.0,3.5, and upper end be 3.5,5.0 or 6.0 in the range of.These endpoints of ranges can independently be combined with shape
At multiple and different ranges, and all ranges for the possible combination that each of endpoints of ranges is disclosed.The porosity of material
Can be 5%, 10% or 15% in lower end, and upper end is 85%, 90% or 95%(percent by volume) in the range of.These ends of range
Put the institute that each of can independently combine to form multiple and different ranges, and endpoints of ranges is disclosed possible combination
There is range.
Above-mentioned microporous materials can be synthesized by hydro-thermal or solvent thermal technology (for example, collosol and gel), wherein crystal from
It is slowly grown in solution.The templating of micro-structure can be provided by secondary building units (SBU) and organic ligand.Also it can be used
Substitute synthetic technology, such as physical vapour deposition (PVD) or chemical vapor deposition, wherein depositing metal oxide precursor layer, as main
Microporous materials, or as the precursor of the MOF structure formed and being exposed to precursor layer in distillation ligand molecular, thus will
Phase transformation passes to MOF lattice.
In some embodiments, above-mentioned inorganic or MOF membrane material, which can provide, promotes pollutant (for example, nitrogen, oxygen
Or hydrone) technical effect with low loss of refrigerant is separated with refrigerant gas.Other membrane materials, for example, it is porous and non-porous
Solvent interaction may occur with host material for polymer, this can interfere and efficiently separate.In some embodiments, herein
The ability of the material of description can provide the implementation for promoting to have the various exemplary implementation schemes of refrigeration system of purification
Technical effect, be such as more fully described referring to following illustrative embodiment.For example, non porous polymeric is typically used as sky
Film in gas separation, operates under the mechanism for being known as " solution diffusion ", from there through being dissolved into polymer substrate first then
It is spread in film layer with different rates to separate molecule.In most cases, the difference based on molecular size completes separation.
However, although refrigerant molecules are more much bigger than uncondensable air and water vapour molecule, it has been found that they are in this polymerization
There is very high solubility, this causes than based on the lower separation factor of separation factor expected from molecular dimension in object film.
As described above, more micro porous molecular sieve materials can be set the inorganic porous supporting element of gas permeability (such as aluminium oxide or
Zirconium oxide) on or other porous ceramics or metal (for example, iron, nickel) material on.The thickness of supporting element can be at 10 μm to 10
In the range of mm, in the range of 100 nm to 750 nm, or even specifically in 250 nm to the model of 500 nm
In enclosing.In the case where tubular film 70 as shown in Figure 3, fibre diameter can in the range of 0.1 mm to 100 mm, and
Fibre length can be in the range of 0.02 m to 2 m.
In some embodiments, microporous materials can be used as the particle in powder and be deposited on supporting element, or make
In a liquid carrier with the various technology dispersions such as spraying, dip-coating, solution-cast.Dispersion can contain various additives,
Dispersing aid, rheology modifier etc..Polymeric additive can be used；However, it is not necessary to polymer adhesive, although can
It to include polymer adhesive, and in some embodiments include polymer adhesive.However, continuous to be enough to be formed
Polymer adhesive existing for the amount of polymer phase can provide channel in film so that bigger molecule bypasses sieve particle.Cause
This, in some embodiments, polymer adhesive is excluded.In other embodiments, polymer adhesive can be lower than
Formed continuous polymer phase needed for amount exist, such as wherein film with may other more restrictive film cascades embodiment party
Case.In some embodiments, the particle of microporous materials is (for example, effective diameter is 0.01 μm to 10 mm, or in some realities
Apply the particle in scheme for 0.5 μm to 10 μm) it can apply in powder form or be dispersed in liquid-carrier (for example, organic solvent
Or aqueous liquid carriers) in and be coated in supporting element on, then remove liquid.It in some embodiments, can be by propping up
Apply pressure difference in support member to help the solid particle by microporous materials to be applied to support surface from liquid phase ingredient.For example, can
To apply vacuum as the liquid phase ingredient comprising the more microporous particles of solid, to help to apply solid particle from the opposite side of supporting element
It is added to the surface of supporting element.
In some example embodiments, with vacuum enhance dipping process applied layer, wherein support surface with it is mostly micro-
The liquid dispersion of Porous materials dispersion contacts, while applying vacuum (or the hollow periosteum in Fig. 3 from the opposite side of supporting element
In the case where configuration, tubular supporting piece 72 can immerse in liquid in addition to open end).Vacuum will pass through porous branch from dispersion
Support member draws solvent, and more microporous particles is caused to be deposited on supporting element.In the case where hollow-fibre membrane as shown in Figure 3, this
Kind of vacuum filter technology can be particularly effective, because hollow core 76 provides a closed space, take out from the space
Vacuum is without similar structures needed for vacuum frame or flat or plane membrane structure out.
It, can be dry to remove remaining solvent and appoint by layer by after microporous particles are coated on supporting element more than one layer
Choosing heating by more microporous particles to fuse together to form pantostrat.Exemplary heating condition can at least 50 DEG C, 75 DEG C or
Within the temperature range of 100 DEG C, within the temperature range of 20 DEG C to 75 DEG C, or even specifically in 20 DEG C to 50 DEG C
In temperature range.
It can use various membrane structure configurations, including but not limited to flat or planar configuration, tubular configuration or coiled arrangement.
The exemplary implementation scheme of tubular configuration is schematically depicted in Fig. 3.As shown in figure 3, tubular film 70 includes foraminous support,
The foraminous support is configured as the tubular shell 72 surrounded by molecular sieve layer 74.The thickness of molecular sieve layer can 2 nm extremely
In the range of 500 nm, in the range of 2 nm to 100 nm, or even specifically in 2 nm to the range of 50 nm
It is interior.Shell 72 defines the hollow core 76 in both ends open.In some embodiments, multiple tubular films are arranged in together restrains
In, there is the collector (not shown) being in fluid communication with hollow core 76 in each end.It in use, include refrigerant gas and dirt
The purification gas of dye object is transported to the outside of film 70 (for example, by hollow with the pressure bigger than 76 internal pressure of hollow core
Vacuum is extracted out by collector on core 76).This pressure difference provides driving force for uncondensable nitrogen, oxygen or hydrone to pass through
Molecular sieve layer, while limiting biggish refrigerant molecules and being passed through by molecular sieve layer 74.
In some embodiments, microporous materials can be configured as nanometer sheet, such as zeolite nanometer sheet.Zeolite nanometer
Piece particle can have thickness in the range of 2 nm to 50 nm, in the range of 2 nm to 20 nm, even
In the range of 2 nm to 10 nm.The average diameter of nanometer sheet can be in the range of 50 nm to 5000 nm, more
Specifically in the range of 100 nm to 2500 nm, in addition specifically in 100 nm to 1000 nm in the range of.Irregularly
The average diameter of the tabular particle of shape can have by calculating in x-y direction (that is, along tabular smooth surface)
The diameter of the circular plate particle of surface area identical with irregularly shaped particles determines.Zeolite (such as zeolite nanometer sheet)
Can by any various zeolite structured formation, including but not limited to matrix type MFI, MWW, FER, LTA, FAU and it is aforementioned each other
Mixture or the mixture zeolite structured with other.In more specific one group of exemplary implementation scheme, zeolite (such as zeolite
Nanometer sheet) it may include zeolite structured selected from MFI, MWW, FER, LTA matrix type.Known technology (such as zeolite crystal can be used
The removing of structure precursor) prepare zeolite nanometer sheet.For example, can be by the way that lamellar precursor, (respectively multilayer silicon boils in a solvent
Stone -1 and ITQ-1) it is ultrasonically treated to prepare MFI and MWW zeolite nanometer sheet.Before ultrasonic treatment, zeolite layer can be optional
Ground swelling, such as with the combination of alkali and surfactant, and/or with polystyrene melt blending.It is more to be generally employed for preparation
The routine techniques (such as sol-gal process) of poromerics prepares zeolite lamellar precursor.
Referring again to Fig. 3, polymer coating 78 is arranged on molecular sieve layer 74.Polymer can actually be any type
Polymer, the polymer can resist the erosion of the refrigerant as solvent and can be coated on molecular sieve layer, wrap
It includes but is not limited to siloxane polymer (i.e. polysiloxanes), fluorosilicone or polyimides.Polymer coating can be by any
Technology applies, including but not limited to spraying, dip-coating, roller coating or extrusion, then curing polymer coating.In some embodiments
In, polymer coating 78 can be sieved by hole or any one of polymer solvent effect or two kinds to refrigerant gas and
Pollutant is all permeable.In some embodiments, polymer coating 78 can permit two kinds of gas by molten
Liquid flooding mechanism passes through.In some embodiments, it is 0.05 μm, 0.1 μm, 0.5 that polymer coating, which can have in lower end,
μm, and upper end is the thickness in the range of 4 μm, 10 μm or 50 μm.These endpoints of ranges can be combined independently to be formed
Multiple and different ranges, and all ranges for the possible combination that each of endpoints of ranges is disclosed.In some embodiments
In, polymer coating can provide protection molecular sieve layer 74 and imitate from exposure to the technology of such as oily pollutant or physical damage
Fruit.In some embodiments, polymer coating can provide the technical effect reduced through pin hole refrigerant leakage through the membrane.
Although polymer coating may not be to refrigerant molecules it is impermeable, it can fill any pin hole and it is significant reduce it is logical
Cross the quality transfering rate of any this pin hole.Inorganic layer 74 can also include crystal boundary, and biggish refrigerant molecules can pass through
Crystal boundary, it reduce the selectivity of layer.Polymer coating can cover this crystal boundary, to reduce infiltration of the refrigerant by film.
Referring now to Fig. 4, the selected portion of another purification system and the refrigerant fluid circulation loop of Fig. 1 is shown
Part.As shown in figure 4, purification collector 66 receives the gas being discharged from condenser 20.In some embodiments, exhaust line with
The connection of condenser can carry out at the high point of condenser structure.In some embodiments, purification collector can provide
Promote the technical effect of the pollutant of higher concentration on film, this can promote more effective mass transfer and separation.This effect
Fruit can be occurred by the stratification of hot gas in purification collector, wherein top collection of the lighter pollutant towards purification collector
In, and the bottom of heavier refrigerant gas towards purification collector is concentrated.In some embodiments, purification collector 66 can
To be any kind of container or chamber with volume or cross section open space, in the operation of purification system vacuum pump 58
The collection of period offer purification gas and low gas velocity are to promote to be layered.Layering (can also be wrapped when purification system is not run
Include during the operation of refrigeration system fluid circulation loop) occur at any time, because of purification collector 66 and condenser exhaust gas pipeline
It keeps being in fluid communication, and purifying the gas in collector is substantially to stagnate.Other embodiments are also in UF membrane
The pollutant for promoting higher concentration at device 54, discusses in greater detail below.
In some embodiments, the refrigerant of the first side from film 56 can return to refrigerant fluid circulation loop.
As shown in figure 4, connector 67 is returned to retentate gas from the first side of film 56 by control device (such as expansion valve 68)
Refrigerant fluid circulation loop at evaporator 40, the expansion valve 68 are used to accommodate the first side (its close condensation of film 56
Pressure at device 20) and evaporator 40 at pressure between pressure difference.It should be noted that control device can control on control device
Flow passes through or any of pressure drop or both, and expansion valve 68 is shown as integrated control device unit, described integrated
Control device unit executes two functions in order to illustrate, but can be individual component, such as control valve and expansion hole.?
In some embodiments, after removing contaminant molecule by film 56, a kind of skill is capable of providing using bypass refrigerant return
Art effect, the technical effect promote the first side position of film 56 by removing the gas at the film 56 being concentrated using refrigerant
The pollutant of higher concentration allows refrigerant concentrated gas with from the purification collector 66 with more high pollution object concentration
Gas replace.Connector 67 may also include control valve or shut-off valve, can be integrated with expansion device (i.e. expansion valve), such as the U.S.
It is more fully described in patent application serial number 62/584,012, the disclosure of which is incorporated herein in its entirety by reference.?
In alternate embodiment (not shown), the gas for being loaded with refrigerant can be returned to the colder side of condenser 20 by bypass manifold 67
Or the entrance of compressor 10 in this case, can due to returning to the relatively low pressure difference of pressure difference of evaporator 40 with bypass
Expansion device can not be needed.In this case, connector 67, which can use, does not provide the control device of gas expansion, such as controls
System or shutoff valve 68.Other systems variation, such as cyclone or the cooling coil integrated with clean room, penetrant is returned
The pumping circulation for going back to retentate (upstream) side of film, cascades multiple films, heating film, or substitution prime mover (such as thermal motor or
Pump or compressor in fluid circulation loop), in the U.S. Patent application of entitled " refrigeration purification system ", sequence
Number _ _/_ _ _ _ _ _ _, in be described in more detail, this application and attorney number are 98251US01(U301399US) on the same day
It submits, the disclosure of which is incorporated herein in its entirety by reference.
Other embodiments can also be used for protecting or promoting the durability of film.For example, in some embodiments, and it is
The various sensings of system may be configured to be periodically turned on net with the controller (not shown) that control unit is operationally connected to
Change recoil, wherein gas is transferred to first (i.e. retentate) side of film from second (that is, penetrant) side of film.As used herein,
" periodicity " means that starting can start based on any kind of standard, including operator；Or preassigned, including but not
It is limited to the passage of time, the system operating time of accumulation, the system purification circulation time of accumulation；Or the system standard of measurement, it is all
The pressure difference of the cross-film such as measured during the decontamination cycle operation of prime mover.Can by by membrane separator 54 and purification collector
66 are isolated and are driven reverse the direction of power to start recoil mode.For example, this can in the example embodiment of Fig. 4 to Fig. 5
To be come from by the triple valve (not shown) in the conduit between switching purification collector 66 and membrane separator 54 with connecting simultaneously
The by-pass line (not shown) of the triple valve of the suction side of vacuum pump 58 and the first side of film 56 are connected, while by the first of film 56
Side is isolated to realize with purification collector 66.It can be connected in the suction side of vacuum pump 58 using similar triple valve, it will be
Vacuum pump connection or by-pass line between second side of film 56 are re-introduced to the first side of film 56.In some embodiments
In, controller may be configured to periodically exposed film 56 to heat the pollutant to remove such as oily.In some embodiment party
In case, film can be heated to at least 200 DEG C, or at least 300 DEG C, or at least 400 DEG C.Heating may be typically maintained in 200
DEG C hereinafter, degradation to prevent polymeric layer 78, saves energy and simultaneously simplifies heat management.
In some embodiments, the durability of film 56 and protection can pass through filter (such as coalescing filter, moisture
Particulate filter between filter or purge outlet and film 56) promote.In example embodiment shown in Fig. 5, coalescence
Filter 79 is arranged in the gas flow paths between purification collector 66 and membrane separator 54.A type of coalescence filtration
Device can have cylindrical interior rigid open mesh core (for example, stainless steel), and fibre conglomerates medium is (for example, borosilicate glass
Glass fiber) it is arranged around the core.In some embodiments, coalescing medium has ladder by using the increased layer of pore-size
Spend pore structure.Inlet gas initially encounters the smallest hole, and the hole increases with the increase of seepage distance, thus
Allow more spaces when the droplet growth of coalescence.Coalescing medium is provided mechanical strength by outer mesh structural support, then
It is used as the coarse outer wrap of discharge region.Gas flows into the hollow core of cylinder, then radially outwardly through filter medium.
Small drop captures and is agglomerated into bigger drop by inner filtration medium, and the bigger drop is in radially outer discharge
It is captured and removes in area.
Term " about ", if used, being intended to include and the survey of the specific quantity based on equipment available when submitting the application
Measure associated error degree.For example, " about " may include ± 8% or 5% or 2% range of given value.
Terms used herein are only used for the purpose of description specific embodiment, and are not intended as the limitation of the disclosure.
As used herein, unless the context clearly indicates otherwise, otherwise singular "one", "an" and " described " be also intended to including
Plural form.It should also be understood that when used in this manual, term " includes " and/or "comprising" specify the feature, whole
The presence of number, step, operations, elements, and/or components, but it is not excluded that one or more other features, integer, step, behaviour
Make, the presence or addition of element assembly and/or its group.
Although describing the disclosure with reference to one or more exemplary implementation schemes, those skilled in the art should be managed
Solution can carry out the element of various changes and the available equivalents substitution disclosure without departing from the scope of the disclosure.This
Outside, in the case where not departing from the base region of the disclosure, many modify so that specific condition or material are suitable for this can be carried out
Disclosed religious doctrine.Therefore, the disclosure is not intended to be limited to as the optimal mode for being contemplated for carrying out the disclosure and disclosed specific reality
Scheme is applied, but the disclosure will include all embodiments fallen within the scope of the claims.
Claims (20)
1. a kind of refrigeration system comprising:
Heat transfer fluid circulation circuit, the heat transfer fluid circulation circuit are configured to permit refrigerant to recycle wherein；
Purified gas outlet, the purified gas outlet are operationally connected to the heat transfer fluid circulation circuit；
At least one ventilated membrane, the ventilated membrane have the first side and second side, first side and the purified gas outlet
It is operationally connected to, the film includes separating layer, and the separating layer includes porous inorganic material, the hole of the porous inorganic material
Size allow pollutant to pass through by the film and limit the refrigerant and pass through by the film, and in the separating layer
On polymer coating；With
Permeant outlet, the permeant outlet are operationally connected to described second side of the film.
2. refrigeration system according to claim 1 further includes prime mover, described prime mover is operably linked to described
Permeant outlet, described prime mover, which is configured to for gas being moved to from described second side of the film, leads to the fluid circulation
The exhaust outlet of loop-external.
3. refrigeration system according to claim 1, wherein the heat transfer fluid circulation circuit includes successively being connected by conduit
Compressor, heat rejection heat exchanger, expansion device and the endothermic heat exchanger being connected together；
Wherein at least one in the purified gas outlet and the heat rejection heat exchanger, the endothermic heat exchanger or the film
It is a to be operationally connected to.
4. refrigeration system according to claim 2, wherein described prime mover includes that can grasp with described second side of the film
Make the vacuum pump of ground connection.
5. refrigeration system described in any one of -4 according to claim 1 further includes and the purge outlet and the film
The filter that first side is operationally connected to.
6. refrigeration system according to any preceding claims, wherein the separating layer includes ceramic material.
7. refrigeration system according to claim 6, wherein the film includes zeolite.
8. refrigeration system according to any preceding claims, wherein at least one described ventilated membrane includes multiple ventilative
Film；Wherein the multiple ventilated membrane arranges in series or in parallel.
9. refrigeration system according to any preceding claims, wherein the polymeric layer includes being selected from silicon rubber, fluorine silicon
The polymer of oxygen alkane or polyimides.
10. refrigeration system according to any preceding claims, wherein the polymeric layer has 0.05 μm to 50 μm
Thickness.
11. refrigeration system according to any preceding claims further includes controller, the controller is configured to ring
Should the fluid circulation loop described in cooling requirement signal operation, and really in response to the pollutant in the fluid circulation loop
Surely described prime mover is operated.
12. refrigeration system according to claim 11, wherein the controller is configured to start purification recoil mode,
Gas is transported to first side of the film from described second side of the film in the purification recoil mode.
13. refrigeration system according to claim 11 or 12, wherein the controller is configured to start heat source with by institute
It states film and is heated to certain temperature to remove pollutant.
14. a kind of method for operating refrigeration system comprising:
Heat transfer fluid circulation circuit is circulated a refrigerant through in response to cooling requirement signal；
The purification gas comprising pollutant is collected from the purge outlet in the fluid circulation loop；
The pollutant is transmitted across permeable molecular screen membrane with prime mover, the film includes porous, inorganic or metal organic framework,
The size in the hole of the porous, inorganic or metal organic framework allows the pollutant to pass through by the film and limit the system
Cryogen is passed through by the film；And
It is periodically recoiled by the way that gas is transported to first side of the film from described second side of the film described
The film is perhaps periodically heated to certain temperature to remove pollutant or both periodically by gas from described by film
Described second side of film is transported to first side of the film and the film is periodically heated to certain temperature to remove
Pollutant.
15. according to the method for claim 14 comprising by the way that gas is transported to institute from described second side of the film
First side of film is stated come the film that periodically recoils.
16. method according to claim 14 or 15 comprising the film is periodically heated to certain temperature to go
Depollution object.
17. method described in any one of 4-16 according to claim 1 further includes making before purification gas reaches the film
The purification gas passes through filter.
18. method described in any one of 4-17 according to claim 1 further includes that the pollutant transportation is passed through the nothing
Polymer coating on machine or metal organic framework film.
19. method described in any one of 4-18 according to claim 1, further include collected in purification gas collector described in
Purification gas, the purification gas collector is between the purge outlet and the film.
20. method described in any one of 4-20 according to claim 1 further includes described first by refrigerant from the film
Side returns to the fluid circulation loop.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762584073P | 2017-11-09 | 2017-11-09 | |
| US62/584073 | 2017-11-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109764585A true CN109764585A (en) | 2019-05-17 |
Family
ID=64267685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811323690.9A Pending CN109764585A (en) | 2017-11-09 | 2018-11-08 | Refrigerant purification system with film protection |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP3483527A1 (en) |
| CN (1) | CN109764585A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112384739A (en) * | 2019-06-05 | 2021-02-19 | 开利公司 | System and method for removing non-condensable gases from a refrigeration system |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021133151A1 (en) * | 2019-12-23 | 2021-07-01 | Speed Car Auto Parts Sdn Bhd | Filtering device |
| DE102020117276A1 (en) * | 2020-07-01 | 2022-01-05 | Vaillant Gmbh | Membrane gas separator |
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|---|---|---|---|---|
| US3357197A (en) * | 1966-06-03 | 1967-12-12 | John L Massengale | Process and apparatus for purging refrigeration system |
| US5044166A (en) * | 1990-03-05 | 1991-09-03 | Membrane Technology & Research, Inc. | Refrigeration process with purge and recovery of refrigerant |
| US5062273A (en) * | 1990-07-12 | 1991-11-05 | E. I. Du Pont De Nemours And Company | Method and apparatus for removal of gas from refrigeration system |
| CN1791774A (en) * | 2003-06-20 | 2006-06-21 | 大金工业株式会社 | Freezing device construction method and freezing device |
| CN1871481A (en) * | 2003-10-22 | 2006-11-29 | 大金工业株式会社 | Freezing apparatus installation method and freezing apparatus |
| CN105683687A (en) * | 2013-08-09 | 2016-06-15 | 开利公司 | Purge system for chiller system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4417451A (en) * | 1980-05-07 | 1983-11-29 | Hilliard-Lyons Patent Management, Inc. | Vapor compression refrigerant system monitor and gas removal apparatus |
-
2018
- 2018-11-08 EP EP18205217.5A patent/EP3483527A1/en not_active Withdrawn
- 2018-11-08 CN CN201811323690.9A patent/CN109764585A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3357197A (en) * | 1966-06-03 | 1967-12-12 | John L Massengale | Process and apparatus for purging refrigeration system |
| US5044166A (en) * | 1990-03-05 | 1991-09-03 | Membrane Technology & Research, Inc. | Refrigeration process with purge and recovery of refrigerant |
| US5062273A (en) * | 1990-07-12 | 1991-11-05 | E. I. Du Pont De Nemours And Company | Method and apparatus for removal of gas from refrigeration system |
| CN1791774A (en) * | 2003-06-20 | 2006-06-21 | 大金工业株式会社 | Freezing device construction method and freezing device |
| CN1871481A (en) * | 2003-10-22 | 2006-11-29 | 大金工业株式会社 | Freezing apparatus installation method and freezing apparatus |
| CN105683687A (en) * | 2013-08-09 | 2016-06-15 | 开利公司 | Purge system for chiller system |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112384739A (en) * | 2019-06-05 | 2021-02-19 | 开利公司 | System and method for removing non-condensable gases from a refrigeration system |
| CN112384739B (en) * | 2019-06-05 | 2024-03-01 | 开利公司 | System and method for removing non-condensable gases from a refrigeration system |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3483527A1 (en) | 2019-05-15 |
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