CN109706425A - A method of graphic edge material is spread after reducing vapor deposition - Google Patents
A method of graphic edge material is spread after reducing vapor deposition Download PDFInfo
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- CN109706425A CN109706425A CN201910127408.8A CN201910127408A CN109706425A CN 109706425 A CN109706425 A CN 109706425A CN 201910127408 A CN201910127408 A CN 201910127408A CN 109706425 A CN109706425 A CN 109706425A
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Abstract
The present invention relates to evaporation coating technique fields, the method that graphic edge material is spread after especially a kind of reduction vapor deposition, the graphics field that the needs of hollow out are deposited is set on the sheet of the high-flexibility on open mask, is spread around along the graphics field edge that the needs are deposited and plates one layer of closed isolated film.After adopting the above method, the invention has the following advantages that 1, before vapor deposition, when open mask is bonded with substrate, the graphic edge region of sheet, film is with substrate because pressure thight is bonded.2, after the metal copper film on sheet is bonded with substrate, insulated column is formed on substrate, reduces diffusion of the evaporation material on substrate, to reduce the size variation of vapor deposition figure.3, at the same time, metal copper film is because there is certain thickness, after sheet is bonded with substrate, so that sheet itself can generate slight deformation, so that the deformation that sheet is generated by heated or other reasons is reduced, to influence the size that region is deposited.
Description
Technical field
The present invention relates to evaporation coating technique field, the method for graphic edge material diffusion after especially a kind of reduction vapor deposition.
Background technique
Sheet on existing open mask is that figure is deposited in acquisitions easy to process so that sheet be relatively thin flexibility very
Good steel disc, because temperature is higher when evaporation material contacts mask, easily leads to sheet so that easily deformation occurs by sheet itself
Deformation occurs, or leads to sheet out-of-flatness itself because sheet itself generates deformation in process, and this deformation exists
The vapor deposition graphic edge region of sheet is particularly evident, so that the figure that vapor deposition obtains is greater than the figure needed.
In the prior art, the light emitting sub-pixel generation type of OLED is formed using evaporation coating method, mainly passes through metal
Mask configures between the vapor deposition face of oled substrate and evaporation source, and evaporation material evaporates when passing through heating, and by metal cover
Opening sub-pixel corresponding on vapor deposition face is deposited.But the method for metal cover vapor deposition, it is easy to produce shadow effect
(shadow effect), that is, to the first sub-pixel be deposited when, evaporation material may be diffused into the first sub-pixel regulation
It except region, that is, diffuses to second seed pixel region or the third subpixel area and causes colour mixture, influence shining for OLED
Display effect.
107636191 A of Chinese invention patent application CN discloses a kind of metal cover and OLED for OLED vapor deposition
Evaporation coating method, by the way that barricade is arranged at metal cover upper opening edge, barricade can reflect and stop the diffusion of evaporation material, make
Evaporation material is deposited in region as defined in maximumlly staying in.
Summary of the invention
The technical problem to be solved by the invention is to provide a kind of methods that can effectively reduce evaporation material diffusion.
In order to solve the above technical problems, the method that graphic edge material is spread after a kind of reduction vapor deposition of the invention,
The graphics field that the needs of hollow out are deposited is set on the sheet of the high-flexibility on open mask, is deposited along the needs
Graphics field edge is spread around plates one layer of closed isolated film.
Preferably, the isolated film with a thickness of 5-10 μm.
Preferably, the width of the isolated film is 2-4mm.
Preferably, the material of the isolated film is copper.
After adopting the above method, the invention has the following advantages that
1, before vapor deposition, when open mask is bonded with substrate, the graphic edge region of sheet, film and substrate are because of pressure thight
Fitting.
2, after the metal copper film on sheet is bonded with substrate, insulated column is formed on substrate, reduces evaporation material in base
Diffusion on plate, to reduce the size variation of vapor deposition figure.
3, at the same time, metal copper film is because there is certain thickness, after sheet is bonded with substrate, so that sheet itself
Slight deformation can be generated, so that the deformation that sheet is generated by heated or other reasons is reduced, to influence that the big of region is deposited
It is small.
Detailed description of the invention
The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
Fig. 1 is structural schematic diagram of the present invention in the graphics field edge plating isolated film for needing to be deposited.
In figure: 1 is open exposure mask piece, and 2 be graphics field, and 3 be isolated film.
Specific embodiment
As shown in Figure 1, the method that graphic edge material is spread after a kind of reduction vapor deposition of the invention, on open mask
High-flexibility sheet on (i.e. open exposure mask piece 1 on) setting hollow out the graphics field 2 that is deposited of needs, along the need
2 edge of graphics field to be deposited is spread around plates one layer of closed isolated film 3.
Preferably, the isolated film with a thickness of 5-10 μm.
Preferably, the width of the isolated film is 2-4mm.
Preferably, the material of the isolated film is copper.
1, yellow film as shown in the figure should be spread around along fringe region, and all films should keep thickness uniform.
2, film thickness is unsuitable blocked up, leads to be in contact with substrate rear sheet that biggish deformation is generated because of film.It is specific thick
Degree should be determined according to total film thickness be deposited.
3, thin-film width is unsuitable wide, and wide time of width is empty because uneven film thickness causes the edge sheet and substrate to generate
Gap, so as to cause material diffusion.
4, film should cause to influence vapor deposition figure no more than edge strictly along vapor deposition graphic edge region.
5, film material is metallic copper, it is not oxidizable to be primarily due to it, and flexibility is good.The formation of the upper film of sheet can
To be formed by the method for being electroplated or being deposited.
Although specific embodiments of the present invention have been described above, those skilled in the art should be appreciated that this
It is merely illustrative of, various changes or modifications can be made to present embodiment, without departing from the principle and substance of the present invention,
Protection scope of the present invention is only limited by the claims that follow.
Claims (4)
1. a kind of method that graphic edge material is spread after reduction vapor deposition, it is characterised in that: the high-flexibility on open mask
Sheet on the graphics field that is deposited of needs of hollow out is set, expand around along the graphics field edge that the needs are deposited
It dissipates and plates one layer of closed isolated film.
2. the method that graphic edge material is spread after a kind of reduction vapor deposition according to claim 1, it is characterised in that: described
Isolated film with a thickness of 5-10 μm.
3. the method that graphic edge material is spread after a kind of reduction vapor deposition according to claim 1, it is characterised in that: described
The width of isolated film is 2-4mm.
4. the method that graphic edge material is spread after a kind of reduction vapor deposition according to claim 1, it is characterised in that: described
The material of isolated film is copper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910127408.8A CN109706425A (en) | 2019-02-20 | 2019-02-20 | A method of graphic edge material is spread after reducing vapor deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910127408.8A CN109706425A (en) | 2019-02-20 | 2019-02-20 | A method of graphic edge material is spread after reducing vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109706425A true CN109706425A (en) | 2019-05-03 |
Family
ID=66264801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910127408.8A Pending CN109706425A (en) | 2019-02-20 | 2019-02-20 | A method of graphic edge material is spread after reducing vapor deposition |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109706425A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105633301A (en) * | 2014-11-17 | 2016-06-01 | 上海和辉光电有限公司 | Method for reducing OLED color mixture defect and OLED display panel |
| CN107636191A (en) * | 2016-09-30 | 2018-01-26 | 深圳市柔宇科技有限公司 | Metal cover and OLED evaporation coating methods for OLED evaporations |
| CN108232041A (en) * | 2018-01-03 | 2018-06-29 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof |
-
2019
- 2019-02-20 CN CN201910127408.8A patent/CN109706425A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105633301A (en) * | 2014-11-17 | 2016-06-01 | 上海和辉光电有限公司 | Method for reducing OLED color mixture defect and OLED display panel |
| CN107636191A (en) * | 2016-09-30 | 2018-01-26 | 深圳市柔宇科技有限公司 | Metal cover and OLED evaporation coating methods for OLED evaporations |
| CN108232041A (en) * | 2018-01-03 | 2018-06-29 | 京东方科技集团股份有限公司 | A kind of mask plate and preparation method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190503 |
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| RJ01 | Rejection of invention patent application after publication |