CN109648450A - A kind of polishing of precision element, cleaning process - Google Patents
A kind of polishing of precision element, cleaning process Download PDFInfo
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- CN109648450A CN109648450A CN201811622517.9A CN201811622517A CN109648450A CN 109648450 A CN109648450 A CN 109648450A CN 201811622517 A CN201811622517 A CN 201811622517A CN 109648450 A CN109648450 A CN 109648450A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/08—Acids
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/10—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
- B08B2203/0288—Ultra or megasonic jets
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The invention discloses a kind of polishing of precision element, cleaning process, the polishing, cleaning process polish the following steps are included: polished precision element is pressed on polished die；Precision element after polishing is placed in cleaning solution and is impregnated, deionized water is rinsed；EtOH Sonicate cleaning；Deionized water high pressure cleaning showers；It is dry, obtain precision element；Polished die is made in polishing pitch and alumina powder by the present invention according to a certain ratio, is polished using the polished die to precision element, and precision element can be made to reach good surface smoothness, guarantees the machining accuracy of precision element；Cleaning solution can completely remove the stained of precision element surface, hickie etc.；Using multi-frequency ultrasonic cleaning technique, the precision element surface after making cleaning has good cleanliness；Testing result shows that polishing of the invention, cleaning process have good polishing effect and cleaning effect to precision element.
Description
Technical field
The present invention relates to the manufacture field of precision element, the polishing of specifically a kind of precision element, cleaning process.
Background technique
Precision element will enter the polishing stage after cutting, grinding, currently, the domestic polishing to precision element, greatly
It mostly uses polishing pitch that pitch polishing tol (disk) is made to polish precision element, the hardness of polishing pitch directly determines to polish
The hardness of mould, polished die made of the polishing pitch of high rigidity have higher hardness, can effectively ensure that the face shape of precision element
It is smooth；But if with the unmatched pitch polishing tol of precision element hardness, a large amount of throw will be generated on precision element surface
Light scratch seriously affects the processing qualities such as the finish of precision element.In addition, the combination of the polished die now with polished glass
Agent is polyurethane, solid abrasive powder (common cerium oxide, zirconium oxide) is added with polyurethane, composite polishing mold materials, but poly- ammonia is made
The high speed polishing that the composite polishing mold materials that solid abrasive powder is added in ester is only suitable for high hardness material such as glass etc. is used, and will be to material
The softer precision element of matter, polyurethane are added polished die made of the composite polishing mold materials of solid abrasive powder and high-precision are not achieved
It is required that.
Precision element is after polishing, the pollutants such as surface meeting residual organic matter, polishing powder particle, not only to precision element
Surface generates corrosion, and therefore induction source and the short slab that can become precision element damage carry out the precision element after polishing
High-cleanness, high cleaning is very important.The cleaning method of precision element has the RCA cleaning of traditional wipe method, semi-conductor industry
Method, ultrasonic cleaning process, laser cleaning method, plasma arcs ablution etc..Traditional wipe method can more effectively remove micro-
Meter or more large scale particle, but be difficult to removal submicron-scale particle, and due to wiping personnel technical level and
Qualification is inconsistent, and when wiping the precision element of large area or needing to produce in enormous quantities, efficiency is very low；RCA cleaning
Belong to chemical cleaning, can reduce the adsorption capacity between particle and precision element surface using different chemical solvents, but such as
The concentration that fruit controls improper chemical solution can then cause the heavy corrosion on precision element surface, cause the increase of surface roughness；
Ultrasonic cleaning belongs to physical cleaning method, by selecting suitable ultrasonic frequency that can efficiently remove substrate surface from micron
To the particle of the various scales of sub-micron, however when supersonic frequency and power selection is improper or ultrasonic time is too long, it will cause
The physical damnification on precision element surface.So the selection for precision element cleaning process, will not only pay close attention to the cleaning of pollutant
Efficiency will also avoid the destruction caused by precision element in cleaning process.
Summary of the invention
The purpose of the present invention is to provide a kind of polishings of precision element, cleaning process, to solve in the prior art ask
Topic.
To achieve the above object, the invention provides the following technical scheme:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes: polished precision element being pressed on polished die and is polished；
(2) it cleans:
(A) it is impregnated in cleaning solution, deionized water is rinsed；
(B) EtOH Sonicate cleans；
(C) deionized water high pressure cleaning showers；
(D) dry, obtain precision element.
As optimization, a kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes: polished die being fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, it will be polished
Precision element be pressed on polished die, open grinding machine, polished；
(2) it cleans:
(A) step (1) resulting precision element is put into cleaning solution and is impregnated, then rinsed with deionized water；
(B) step (A) resulting precision element is placed in ethyl alcohol and is cleaned by ultrasonic；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with deionized water；
(D) step (C) resulting precision element is dried, obtains precision element.
As optimization, a kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes: polished die being fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, it will be polished
Precision element be pressed on polished die, open grinding machine, the revolving speed of grinding machine spindle is 50-100r/min, and the surface of polished die is to essence
The pressure of close element is 0.4-1.2bar, and polish temperature is 15-25 DEG C；
(2) it cleans:
(A) step (1) resulting precision element is put into 40-60 DEG C of cleaning solution and impregnates 5-10min, then spend from
Sub- water rinses 3-5min；
(B) being placed in step (A) resulting precision element in 30-50 DEG C of ethyl alcohol successively is 20-40KHz, 60- in frequency
It is cleaned by ultrasonic 3-5min under 80KHz, 120-150KHz respectively；Precision element is placed in ethyl alcohol, successively in low frequency, intermediate frequency
Precision element is cleaned by ultrasonic under rate, high-frequency, the precision element table using multi-frequency ultrasonic cleaning technique, after making cleaning
Face has good cleanliness；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers, water outlet pressure with 40-60 DEG C of deionized water
Power is 5-10MPa, and water outlet is apart from precision element surface 3-5cm, cleaning rate 0.2-0.5m2/min；Using high-pressure spraying
Cleaning can make precision element reach very high cleanliness；
(D) step (C) resulting precision element is dried, obtains precision element.
As optimization, solid polishing pitch the preparation method of polished die in step (1): is fused into liquid at 45-100 DEG C
Body polishing pitch, is added alumina powder in Xiang Shangshu liquor finish pitch, and the mass ratio of polishing pitch and alumina powder is 3-10:
1, it is uniformly mixed, obtains the mixed liquor of polishing pitch and alumina powder, above-mentioned mixed liquor is poured on planarizing substrate, it is natural
Cooling, solidification obtains polished die.Polished die is made by certain proportion by polishing pitch and alumina powder, utilizes the polished die
Precision element is polished, precision element can be made to reach good surface smoothness, guarantees the machining accuracy of precision element,
The bad abrasion the purpose is to reduce polished die to precision element of alumina powder is added in polishing pitch, improves the throwing of precision element
Light finish reduces polishing time, saves production cost.
As optimization, in polishing mould surface fluting, groove depth 1-5mm, groove width 1-3mm, slot is for holding polishing fluid.
As optimization, polishing pitch is in 55# polishing pitch, 64# polishing pitch, 73# polishing pitch or 82# polishing pitch
Any one.
As optimization, polishing fluid includes the component of following parts by weight in step (1): 10-25 parts of polishing powder, dispersing agent 1-
5 parts, 2-8 parts of surfactant, 60-100 parts of water and pH adjusting agent, the dosage of pH adjusting agent reach 8.0- with polishing fluid pH value
Subject to 11.0.Dispersing agent and surfactant in the polishing fluid, can prevent the sedimentation of polishing powder, make polishing powder in polishing fluid
In be uniformly dispersed, stablize, promote the polishing speed of polishing fluid and improve polishing fluid to the quality of finish of precision element.
As optimization, polishing powder is silica polishing powder, silicon carbide polishing powder, fluorine cerium lanthanum oxide polishing powder or titanium dioxide
Any two kinds in zirconium polishing powder, polishing powder is the combination of two of above-mentioned four kinds of polishing powders, and one of which polishing powder particles are round and smooth,
Scratch is not likely to produce to precision element, another polishing powder hardness is high, and grinding force is strong, during the polishing process, two kinds of polishing powder phases
Complementation obtains good polishing effect.
Dispersing agent is polyethylene glycol, Sodium Polyacrylate, calgon, polyvinylpyrrolidone or lauryl sodium sulfate
In any one, surfactant is neopelex, Stearic acid diethanolamine salt, isopropyl palmitate, single hard
Any one in glycerol or hexadecyltrimethylammonium chloride, pH adjusting agent are triethanolamine, sodium bicarbonate, ammonia
Any one in water, sodium carbonate or sodium hydroxide.
As optimization, the cleaning solution in step (A) includes the component of following parts by weight: 1-3 parts of oxidant, hydrofluoric acid 3-
8 parts, 10-20 parts of aqueous organic solvent and 20-30 parts of water.Oxidant in cleaning solution can make precision element surface form one layer of oxygen
Change film, the polishing powder, dispersing agent, surfactant etc. of precision element adsorption are wrapped in oxidation film, hydrofluoric acid can incite somebody to action
Erosion is aoxidized, erosion can be dissolved by aqueous organic solvent, to completely remove the stained of precision element surface, hickie
Deng.
As optimization, oxidant is any one in potassium permanganate, postassium hypochlorite or hydrogen peroxide, aqueous organic solvent
For any one in ethylene glycol, propylene glycol, triethylene glycol, dimethyl sulfoxide or N-Methyl pyrrolidone.
Compared with prior art, the beneficial effects of the present invention are:
First is that being matched by polishing pitch and alumina powder by certain in a kind of polishing of precision element of the present invention, cleaning process
Than polished die is made, precision element is polished using the polished die, precision element can be made to reach good surface smoothness,
Guarantee precision element machining accuracy, in polishing pitch be added alumina powder the purpose is to reduce polished dies to precision element
Bad abrasion improves the polishing finish of precision element, reduces polishing time, saves production cost；
Second is that polishing powder is silica polishing powder, silicon carbide in a kind of polishing of precision element of the present invention, cleaning process
Combination of two in polishing powder, fluorine cerium lanthanum oxide polishing powder and zirconium dioxide polishing powder, one of which polishing powder particles are round and smooth, right
Precision element is not likely to produce scratch, and another polishing powder hardness is high, and grinding force is strong, and during the polishing process, two kinds of polishing powders are mutual
It mends, obtains good polishing effect；Dispersing agent and surfactant in the polishing fluid, can prevent the sedimentation of polishing powder, make
Polishing powder is uniformly dispersed in polishing fluid, stablizes, and promotes the polishing speed of polishing fluid and improves throwing of the polishing fluid to precision element
Light quality；
Third is that the oxidant in a kind of polishing of precision element of the present invention, cleaning process in cleaning solution can make precision element table
Face forms layer oxide film, and the polishing powder, dispersing agent, surfactant etc. of precision element adsorption are wrapped in oxidation film
In, hydrofluoric acid can will aoxidize erosion, can be dissolved erosion by aqueous organic solvent, to completely remove precision element table
The stained of face, hickie etc.；
Fourth is that precision element is placed in ethyl alcohol in cleaning solution in a kind of polishing of precision element of the present invention, cleaning process,
Successively precision element is cleaned by ultrasonic under low frequency, middle frequency, high-frequency, using multi-frequency ultrasonic cleaning technique, is made
Precision element surface after cleaning has good cleanliness.
Specific embodiment
Below in conjunction with the embodiment of the present invention, technical scheme in the embodiment of the invention is clearly and completely described,
Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based in the present invention
Embodiment, every other embodiment obtained by those of ordinary skill in the art without making creative efforts, all
Belong to the scope of protection of the invention.
Embodiment 1:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) solid 55# polishing pitch the preparation of polished die: is fused into liquid 55# polishing pitch, Xiang Shangshu at 45 DEG C
It is added alumina powder in liquid 55# polishing pitch, the mass ratio of 55# polishing pitch and alumina powder is 3:1, is stirred
It is even, the mixed liquor of 55# polishing pitch and alumina powder is obtained, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 1mm, groove width 1mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 50r/min, the pressure of the surface of polished die to precision element
Power is 0.4bar, and polish temperature is 15 DEG C；Polishing fluid includes the component of following parts by weight: silica polishing powder and silicon carbide
60 parts of 2 parts of 1 part of 10 parts of mixture, polyethylene glycol, neopelex, the water and triethanolamine of polishing powder, triethanolamine
Dosage, polishing fluid pH value of being subject to reaches 8.0；
(2) it cleans:
(A) step (1) resulting precision element is put into 40 DEG C of cleaning solution and impregnates 5min, then rushed with deionized water
Wash 3min；Cleaning solution includes the component of following parts by weight: 1 part of potassium permanganate, 3 parts of hydrofluoric acid, 10 parts of ethylene glycol and 20 parts of water；
(B) by step (A) resulting precision element be placed in 30 DEG C of ethyl alcohol successively frequency be 20KHz, 60KHz,
It is cleaned by ultrasonic 3min under 120KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 40 DEG C of deionized water, discharge pressure is
5MPa, water outlet is apart from precision element surface 3-5cm, cleaning rate 0.2m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
Embodiment 2:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) solid 64# polishing pitch the preparation of polished die: is fused into liquid 64# polishing pitch, Xiang Shangshu at 50 DEG C
It is added alumina powder in liquid 64# polishing pitch, the mass ratio of 64# polishing pitch and alumina powder is 4:1, is stirred
It is even, the mixed liquor of 64# polishing pitch and alumina powder is obtained, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 2mm, groove width 1.5mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 60r/min, the pressure of the surface of polished die to precision element
Power is 0.5bar, and polish temperature is 18 DEG C；Polishing fluid includes the component of following parts by weight: silicon carbide polishing powder and fluorine lanthana
65 parts of 3 parts of 2 parts of 12 parts of mixture, Sodium Polyacrylate, Stearic acid diethanolamine salt, the water and sodium bicarbonate of cerium polishing powder, carbonic acid
The dosage of hydrogen sodium, polishing fluid pH value of being subject to reach 8.5；
(2) it cleans:
(A) step (1) resulting precision element is put into 45 DEG C of cleaning solution and impregnates 6min, then rushed with deionized water
Wash 3.5min；Cleaning solution includes the component of following parts by weight: 1.5 parts of postassium hypochlorite, 4 parts of hydrofluoric acid, 12 parts of propylene glycol and water
22 parts；
(B) by step (A) resulting precision element be placed in 32 DEG C of ethyl alcohol successively frequency be 22KHz, 62KHz,
It is cleaned by ultrasonic 3.5min under 125KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 45 DEG C of deionized water, discharge pressure is
6MPa, water outlet is apart from precision element surface 3.5cm, cleaning rate 0.25m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
Embodiment 3:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) solid 73# polishing pitch the preparation of polished die: is fused into liquid 73# polishing pitch, Xiang Shangshu at 70 DEG C
It is added alumina powder in liquid 73# polishing pitch, the mass ratio of 73# polishing pitch and alumina powder is 7:1, is stirred
It is even, the mixed liquor of 73# polishing pitch and alumina powder is obtained, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 3mm, groove width 2mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 75r/min, the pressure of the surface of polished die to precision element
Power is 0.8bar, and polish temperature is 20 DEG C；Polishing fluid includes the component of following parts by weight: silica polishing powder and fluorine oxidation
80 parts of 5 parts of 3 parts of 18 parts of mixture, calgon, isopropyl palmitate, the water and ammonium hydroxide of lanthanum cerium polishing powder, the dosage of ammonium hydroxide,
Polishing fluid pH value of being subject to reaches 10.5；
(2) it cleans:
(A) step (1) resulting precision element is put into 50 DEG C of cleaning solution and impregnates 8min, then rushed with deionized water
Wash 4min；Cleaning solution includes the component of following parts by weight: 2 parts of hydrogen peroxide, 5 parts of hydrofluoric acid, 15 parts of triethylene glycol and water 25
Part；
(B) by step (A) resulting precision element be placed in 40 DEG C of ethyl alcohol successively frequency be 30KHz, 70KHz,
It is cleaned by ultrasonic 4min under 135KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 50 DEG C of deionized water, discharge pressure is
8MPa, water outlet is apart from precision element surface 4cm, cleaning rate 0.35m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
Embodiment 4:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) solid 82# polishing pitch the preparation of polished die: is fused into liquid 82# polishing pitch, Xiang Shangshu at 95 DEG C
It is added alumina powder in liquid 82# polishing pitch, the mass ratio of 82# polishing pitch and alumina powder is 9:1, is stirred
It is even, the mixed liquor of 82# polishing pitch and alumina powder is obtained, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 4mm, groove width 2.5mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 90r/min, the pressure of the surface of polished die to precision element
Power is 1.0bar, and polish temperature is 22 DEG C；Polishing fluid includes the component of following parts by weight: silica polishing powder and titanium dioxide
90 parts of 7 parts of 4 parts of 22 parts of mixture, polyvinylpyrrolidone, glycerin monostearate, the water and sodium carbonate of zirconium polishing powder, carbonic acid
The dosage of sodium, polishing fluid pH value of being subject to reach 10.5；
(2) it cleans:
(A) step (1) resulting precision element is put into 55 DEG C of cleaning solution and impregnates 9min, then rushed with deionized water
Wash 4.5min；Cleaning solution includes the component of following parts by weight: 2.5 parts of potassium permanganate, 7 parts of hydrofluoric acid, 18 parts of dimethyl sulfoxide
With 28 parts of water；
(B) by step (A) resulting precision element be placed in 48 DEG C of ethyl alcohol successively frequency be 38KHz, 75KHz,
It is cleaned by ultrasonic 4.5min under 145KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 55 DEG C of deionized water, discharge pressure is
9MPa, water outlet is apart from precision element surface 4.5cm, cleaning rate 0.45m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
Embodiment 5:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) preparation of polished die: solid 55# polishing pitch is fused into liquid 55# polishing pitch at 100 DEG C, upwards
It states and alumina powder is added in liquid 55# polishing pitch, the mass ratio of 55# polishing pitch and alumina powder is 10:1, is stirred
Uniformly, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling by the mixed liquor for obtaining 55# polishing pitch and alumina powder, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 5mm, groove width 3mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 100r/min, the pressure of the surface of polished die to precision element
Power is 1.2bar, and polish temperature is 25 DEG C；Polishing fluid includes the component of following parts by weight: silicon carbide polishing powder and zirconium dioxide
25 parts of the mixture of polishing powder, 5 parts of lauryl sodium sulfate, 8 parts of hexadecyltrimethylammonium chloride, 100 parts of water and hydroxide
Sodium, the dosage of sodium hydroxide, polishing fluid pH value of being subject to reach 11.0；
(2) it cleans:
(A) step (1) resulting precision element is put into 60 DEG C of cleaning solution and impregnates 10min, then use deionized water
Rinse 5min；Cleaning solution includes the component of following parts by weight: 3 parts of postassium hypochlorite, 8 parts of hydrofluoric acid, N-Methyl pyrrolidone 20
Part and 30 parts of water；
(B) by step (A) resulting precision element be placed in 50 DEG C of ethyl alcohol successively frequency be 40KHz, 80KHz,
It is cleaned by ultrasonic 5min under 150KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 60 DEG C of deionized water, discharge pressure is
10MPa, water outlet is apart from precision element surface 5cm, cleaning rate 0.5m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
Comparative example 1:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) solid 73# polishing pitch the preparation of polished die: is fused into liquid 73# polishing pitch, Xiang Shangshu at 70 DEG C
It is added alumina powder in liquid 73# polishing pitch, the mass ratio of 73# polishing pitch and alumina powder is 7:1, is stirred
It is even, the mixed liquor of 73# polishing pitch and alumina powder is obtained, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 3mm, groove width 2mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 75r/min, the pressure of the surface of polished die to precision element
Power is 0.2bar, and polish temperature is 20 DEG C；Polishing fluid includes the component of following parts by weight: silica polishing powder and fluorine oxidation
80 parts of 5 parts of 3 parts of 18 parts of mixture, calgon, isopropyl palmitate, the water and ammonium hydroxide of lanthanum cerium polishing powder, the dosage of ammonium hydroxide,
Polishing fluid pH value of being subject to reaches 10.5；
(2) it cleans:
(A) step (1) resulting precision element is put into 50 DEG C of cleaning solution and impregnates 8min, then rushed with deionized water
Wash 4min；Cleaning solution includes the component of following parts by weight: 2 parts of hydrogen peroxide, 5 parts of hydrofluoric acid, 15 parts of triethylene glycol and water 25
Part；
(B) by step (A) resulting precision element be placed in 40 DEG C of ethyl alcohol successively frequency be 30KHz, 70KHz,
It is cleaned by ultrasonic 4min under 135KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 50 DEG C of deionized water, discharge pressure is
8MPa, water outlet is apart from precision element surface 4cm, cleaning rate 0.35m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
The polishing of comparative example 1, the polishing of cleaning process and embodiment 3, cleaning process are except that the step of comparative example 1
(b) surface of polished die is 0.2bar to the pressure of precision element in.
Comparative example 2:
A kind of polishing of precision element, cleaning process, the polishing, cleaning process the following steps are included:
(1) it polishes:
(a) solid 73# polishing pitch the preparation of polished die: is fused into liquid 73# polishing pitch, Xiang Shangshu at 70 DEG C
It is added alumina powder in liquid 73# polishing pitch, the mass ratio of 73# polishing pitch and alumina powder is 7:1, is stirred
It is even, the mixed liquor of 73# polishing pitch and alumina powder is obtained, above-mentioned mixed liquor is poured on planarizing substrate, natural cooling, Gu
Change, obtain polished die, in polishing mould surface fluting, groove depth 3mm, groove width 2mm, slot is for holding polishing fluid；
(b) polished die is fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished precision
Element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 75r/min, the pressure of the surface of polished die to precision element
Power is 0.8bar, and polish temperature is 20 DEG C；Polishing fluid includes the component of following parts by weight: silica polishing powder and fluorine oxidation
80 parts of 5 parts of 3 parts of 18 parts of mixture, calgon, isopropyl palmitate, the water and ammonium hydroxide of lanthanum cerium polishing powder, the dosage of ammonium hydroxide,
Polishing fluid pH value of being subject to reaches 10.5；
(2) it cleans:
(A) step (1) resulting precision element is put into 50 DEG C of cleaning solution and impregnates 8min, then rushed with deionized water
Wash 4min；Cleaning solution includes the component of following parts by weight: 2 parts of hydrogen peroxide, 5 parts of hydrofluoric acid, 15 parts of triethylene glycol and water 25
Part；
(B) step (A) resulting precision element is placed in 40 DEG C of ethyl alcohol in the case where frequency is 30KHz and is cleaned by ultrasonic
4min；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 50 DEG C of deionized water, discharge pressure is
8MPa, water outlet is apart from precision element surface 4cm, cleaning rate 0.35m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
The polishing of comparative example 2, the polishing of cleaning process and embodiment 3, cleaning process are except that the step of comparative example 2
(B) step (A) resulting precision element is placed in 40 DEG C of ethyl alcohol in and is cleaned by ultrasonic 4min in the case where frequency is 30KHz.
Effect example 1: polishing effect
By Taylor Hobson contact contourgraph to the obtained precision element of the embodiment of the present invention 1 to 5 and comparison
The obtained precision element of example 1 to 2 carries out surface roughness detection, and testing result is shown in Table 1.
Table 1
From table 1 it follows that the surface roughness of the obtained precision element of the embodiment of the present invention 1 to 5 is in 120nm
Hereinafter, and the surface roughness of the obtained precision element of comparative example 1 be 832.5nm, the obtained precision element of comparative example 2
Surface roughness is 135.7nm, the results showed that, the polishing of the embodiment of the present invention 1 to 5, cleaning process all have precision element
Good polishing effect.
Effect example 2: cleaning effect
Under strong light, to the surface cleanliness of the embodiment of the present invention 1 to 5 and the obtained precision element of comparative example 1 to 2 into
Row range estimation, it is dirty with surface particles of the surface analyzer to the embodiment of the present invention 1 to 5 and the obtained precision element of comparative example 1 to 2
Dye object (particulate pollutant greater than 0.2 μm) is tested, and test result is shown in Table 2.
Table 2
From Table 2, it can be seen that the obtained precision element of the embodiment of the present invention 1 to 5 all has good cleanliness, table
Face is remained without apparent particulate pollutant, and surface particulate contamination object number is at 1 hereinafter, the obtained accurate member of comparative example 1
Part also has good cleanliness, and surface is remained without apparent particulate pollutant, and surface particulate contamination object number is 4, this hair
Bright embodiment 1 to 5 and the obtained precision element of comparative example 1 have reached the requirement to precision element surface cleanliness, and right
The obtained precision element of ratio 2 has particulate pollutant residual, and surface particulate contamination object number is 12, not up to accurate member
The requirement of part surface cleanliness, the results showed that, the polishing of the embodiment of the present invention 1 to 5, cleaning process all have very precision element
Good cleaning effect.
It is obvious to a person skilled in the art that invention is not limited to the details of the above exemplary embodiments, Er Qie
In the case where without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, the present embodiments are to be considered as illustrative and not restrictive, and the scope of the present invention is by appended power
Benefit requires rather than above description limits, it is intended that all by what is fallen within the meaning and scope of the equivalent elements of the claims
Variation is included within the present invention.Any label in claim should not be construed as limiting the claims involved.
Claims (10)
1. a kind of polishing of precision element, cleaning process, which is characterized in that the polishing, cleaning process the following steps are included:
(1) it polishes: polished precision element being pressed on polished die and is polished；
(2) it cleans:
(A) it is impregnated in cleaning solution, deionized water is rinsed；
(B) EtOH Sonicate cleans；
(C) deionized water high pressure cleaning showers；
(D) dry, obtain precision element.
2. a kind of polishing of precision element according to claim 1, cleaning process, which is characterized in that the polishing, scavenger
Skill the following steps are included:
(1) it polishes: polished die being fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished essence
Close element is pressed on polished die, is opened grinding machine, is polished；
(2) it cleans:
(A) step (1) resulting precision element is put into cleaning solution and is impregnated, then rinsed with deionized water；
(B) step (A) resulting precision element is placed in ethyl alcohol and is cleaned by ultrasonic；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with deionized water；
(D) step (C) resulting precision element is dried, obtains precision element.
3. a kind of polishing of precision element according to claim 2, cleaning process, which is characterized in that the polishing, scavenger
Skill the following steps are included:
(1) it polishes: polished die being fixed on grinding machine spindle, pours into polishing fluid on the surface of polished die, by polished essence
Close element is pressed on polished die, opens grinding machine, and the revolving speed of grinding machine spindle is 50-100r/min, and the surface of polished die is to accurate member
The pressure of part is 0.4-1.2bar, and polish temperature is 15-25 DEG C；
(2) it cleans:
(A) step (1) resulting precision element is put into 40-60 DEG C of cleaning solution and impregnates 5-10min, then use deionized water
Rinse 3-5min；
(B) being placed in step (A) resulting precision element in 30-50 DEG C of ethyl alcohol successively is 20-40KHz, 60- in frequency
It is cleaned by ultrasonic 3-5min under 80KHz, 120-150KHz respectively；
(C) step (B) resulting precision element is subjected to high pressure cleaning showers with 40-60 DEG C of deionized water, discharge pressure is
5-10MPa, water outlet is apart from precision element surface 3-5cm, cleaning rate 0.2-0.5m2/min；
(D) step (C) resulting precision element is dried, obtains precision element.
4. a kind of polishing of precision element according to claim 3, cleaning process, which is characterized in that in the step (1)
The preparation method of polished die: solid polishing pitch is fused into liquor finish pitch, Xiang Shangshu liquor finish at 45-100 DEG C
It is added alumina powder in pitch, the mass ratio of the polishing pitch and alumina powder is 3-10:1, is uniformly mixed, is thrown
Above-mentioned mixed liquor is poured on planarizing substrate, natural cooling by the mixed liquor of light pitch and alumina powder, and solidification obtains polished die.
5. a kind of polishing of precision element according to claim 4, cleaning process, it is characterised in that: in the polished die
Surface fluting, groove depth 1-5mm, groove width 1-3mm, the slot is for holding polishing fluid.
6. a kind of polishing of precision element according to claim 5, cleaning process, which is characterized in that the polishing pitch
For any one in 55# polishing pitch, 64# polishing pitch, 73# polishing pitch or 82# polishing pitch.
7. a kind of polishing of precision element according to any one of claim 3 to 6, cleaning process, which is characterized in that institute
State the component that polishing fluid in step (1) includes following parts by weight: 10-25 parts of polishing powder, 1-5 parts of dispersing agent, surfactant
2-8 parts, 60-100 parts of water and pH adjusting agent, the dosage of the pH adjusting agent, polishing fluid pH value of being subject to reach 8.0-11.0.
8. a kind of polishing of precision element according to claim 7, cleaning process, it is characterised in that: the polishing powder is
It is any two kinds in silica polishing powder, silicon carbide polishing powder, fluorine cerium lanthanum oxide polishing powder or zirconium dioxide polishing powder, described
Dispersing agent is any in polyethylene glycol, Sodium Polyacrylate, calgon, polyvinylpyrrolidone or lauryl sodium sulfate
One kind, the surfactant are neopelex, Stearic acid diethanolamine salt, isopropyl palmitate, monostearate
Any one in glyceride or hexadecyltrimethylammonium chloride, the pH adjusting agent are triethanolamine, sodium bicarbonate, ammonia
Any one in water, sodium carbonate or sodium hydroxide.
9. a kind of polishing of precision element according to claim 8, cleaning process, which is characterized in that in the step (A)
Cleaning solution include following parts by weight component: 1-3 parts of oxidant, 3-8 parts of hydrofluoric acid, 10-20 parts of aqueous organic solvent and
20-30 parts of water.
10. a kind of polishing of precision element according to claim 9, cleaning process, it is characterised in that: the oxidant is
Any one in potassium permanganate, postassium hypochlorite or hydrogen peroxide, the aqueous organic solvent are ethylene glycol, propylene glycol, three second
Any one in glycol, dimethyl sulfoxide or N-Methyl pyrrolidone.
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| CN112213927A (en) * | 2020-10-22 | 2021-01-12 | 苏州航菱微精密组件有限公司 | Cleaning method for base chassis module of photoetching machine |
| CN116970446A (en) * | 2023-09-22 | 2023-10-31 | 山东天岳先进科技股份有限公司 | Pretreatment solution, product and application of silicon carbide single crystal material AMB coated copper |
| CN116970446B (en) * | 2023-09-22 | 2024-01-09 | 山东天岳先进科技股份有限公司 | Pretreatment solution, product and application of silicon carbide single crystal material AMB coated copper |
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