CN109594047A - A kind of preparation method of chiral metal micro-nano helical structure - Google Patents
A kind of preparation method of chiral metal micro-nano helical structure Download PDFInfo
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Abstract
The present invention relates to chiral metal micro-nano structure preparation fields, more particularly to a kind of preparation method of chiral metal micro-nano helical structure, the metal micro-nano helical structure is using polystyrene sphere as substrate, insulating materials is deposited in circulation rotating inclination clockwise or counterclockwise on its substrate, form helical structure, the vertical evaporation metal material on its helical structure again, ultimately forms metal spiral type structure.The preparation method is simply easily operated, and the requirement to experimental facilities is low, and the chiral metal micro-nano helical structure circular dichroism signal prepared is strong.
Description
Technical field
The invention belongs to chiral metal micro-nano structure preparation fields, and in particular to a kind of chiral metal micro-nano helical structure
Preparation method.
Background technique
Chirality refers to the characteristic that the structure and its mirror image enantiomer can not be completely coincident.Chirality is the substantially special of life process
Sign, the organic molecule overwhelming majority for constituting life entity is chiral molecules.Circular dichroism is a chiral important means of research.
The circular dichroism signal of chiral molecules is very faint in nature, is unfavorable for biomedical and materia medica actual signal
Detection and application.Since metal and light have stronger interaction, metal Nano structure makees apparatus due to surface phasmon
Have stronger circular dichroism, as document " MarioHentschel, MartinSchaferling, ThomasWeiss, NaLiu,
andHaraldGiessen.Three-DimensionalChiralPlasmonicOligomers.NanoLett.2012,12,
Metal Nano structure is by laboratory using more set instrument systems in 2542-2547 ", using multiple electron beam exposure come complete
At preparation, chiral structure mode very complicated and valuableness are realized；And and sample long using the electron-beam exposure system preparation time period
Product area is smaller (30 30 μm of μ m), and Wen Zhong 100nm thickness A u vapor deposition still uses electron beam vacuum vaporation system (or magnetic control
Sputtering system) carry out evaporated metal layer, the circular dichroism signal of the structure is still relatively weak, and spectroscopic acquisition method is same
It is restricted, acquisition condition is harsh, needs to build expensive microscopic spectrum system and is detected.
Metal helical structure preparation method very complicated and valuableness are prepared now, and its circular dichroism signal is fainter,
Signal acquisition and detection are restricted.
Summary of the invention
In order to solve the problems, such as metal micro-nano helical structure preparation process very complicated existing in the prior art, the present invention
A kind of chiral metal micro-nano helical structure preparation method is provided, which is deposited insulating materials and gold by multiple loop skewing
Metal micro-nano helical structure is prepared in the method for category, moreover, detection method is simple and convenient, it is easily operated.
The technical problem to be solved in the present invention is achieved through the following technical solutions:
A kind of preparation method of chiral metal micro-nano helical structure, the metal micro-nano helical structure is small with polystyrene
Ball is substrate, and insulating materials is deposited in circulation rotating inclination clockwise or counterclockwise on its substrate, forms helical structure, then at it
Vertical evaporation metal material on helical structure forms metal helical structure.
Further, the insulating materials is silica, and the metal material is gold or silver.
A kind of preparation method of chiral metal micro-nano helical structure, includes the following steps:
Step 1 prepares single layer polystyrene sphere template；
Step 2, the single layer polystyrene sphere template that will be prepared, is adhesive in substrate with two-sided, is put into Vacuum Deposition
On the sample stage of film machine, electron beam evaporation deposition instrument is closed, and vacuumize；
Deposition angles are set 4 ° by step 3, insulating materials is deposited, and by gyrobearing clockwise or counterclockwise
Angle recycles repeatedly vapor deposition insulating materials；
Deposition angles are set 90 ° by step 4, and evaporation metal material obtains metal helical structure；
Step 5, cooling instrument, inflated with nitrogen take out sample.
Further, the process of the specific plated film of the step 3 are as follows:
4 ° are set by deposition angles first, insulating materials 5nm is deposited at No. 1 position, rotation side counterclockwise each later
120 ° of parallactic angle, insulating materials 5nm is deposited, recycles 5 times in this way, that is, is the sequence circulation with 2-3-1-2-No. 3 positions respectively
Vapor deposition 5 times, first layer vapor deposition are completed, and the similar triangular structure that endpoint connects is formed；
Secondly continue to be deposited on the basis of first layer, 240 ° of rotational orientation angle counterclockwise, insulation is deposited at No. 2 positions
Insulating materials 5nm is deposited in material 5nm, 120 ° of another mistake hour hands rotational orientation angle at No. 3 positions；Recycle primary above-mentioned vapor deposition
Process, that is, successively 240 ° and 120 ° of rotational orientation angle counterclockwise, respectively at 2-No. 3 positions be deposited insulating materials 5nm, second
Layer vapor deposition is completed, and step-like semi-spiral structure is formed；
Then continue to be deposited on the basis of the second layer, insulating materials 5nm be deposited respectively at No. 3 positions, be deposited twice,
Ultimately form a spiral-shaped structure.
Further, the process of the specific plated film of the step 3 are as follows:
4 ° are set by deposition angles first, insulating materials 5nm is deposited at No. 1 position, later the side of rotating clockwise every time
120 ° of parallactic angle, insulating materials 5nm is deposited, recycles 5 times in this way, that is, is the sequence circulation with 3-2-1-3-No. 2 positions respectively
Vapor deposition 5 times, first layer vapor deposition are completed, and the similar triangular structure that endpoint connects is formed；
Secondly continue to be deposited on the basis of first layer, rotate clockwise 240 ° of azimuth, insulating materials is deposited No. 3 positions
5nm, then 120 ° of azimuth is rotated clockwise, insulating materials 5nm is deposited at No. 2 positions；Primary above-mentioned vapor deposition process is recycled,
That is, successively rotating clockwise 240 ° and 120 ° of azimuth, insulating materials 5nm, second layer vapor deposition is deposited at the position 3-2 respectively
It completes, forms step-like semi-spiral structure；
Then continue to be deposited on the basis of the second layer, insulating materials 5nm be deposited respectively at No. 2 positions, be deposited twice,
Ultimately form a spiral-shaped structure.
Further, the specific coating process of the step 4 are as follows: on the basis for the spiral-shaped structure that the vapor deposition is completed
On, deposition angles are adjusted to 90 °, vertical evaporation metal material 20nm.
Further, the line evaporation rate of the vapor deposition insulating materials isThe line of evaporation metal material steams
Sending out rate is
Further, the beginning condition of the step 3 plated film is that the chamber pressure of vacuum coating equipment described in step 2 is low
In 3 × 10-6Torr.
Further, the process that single layer polystyrene sphere template is prepared in the step 1 is as follows:
Step 1: preparing the width of sheet glass a and two sheets b, glass a and sheet glass b no more than 1cm, and clean
Completely, cleaning process are as follows: the sheet glass is scrubbed clean with detergent, with acetone ultrasound 15 minutes, is rinsed with deionized water
Clean acetone, then with alcohol ultrasound 15 minutes, rinse alcohol well with deionized water, be put into deionized water and save backup；
Step 2: the two sheets b cleaned being gathered into folds and is put into culture dish, deionized water is injected in culture dish, is gone
Ion water level is lower than the upper surface of sheet glass b above；
Step 3: polystyrene sphere suspension is mixed with alcohol, is packed into sample cell ultrasound 3 minutes,
Polystyrene sphere and alcohol mixed solution are obtained, the diameter of the polystyrene sphere is 600nm, polystyrene
The volume ratio of bead suspension and alcohol is 1:1~5:1；
Step 4: the mixed solution of polystyrene sphere and alcohol being slowly injected into two sheets surface with needle tubing, is gathered
Styrene bead solution can form the polystyrene sphere film of single layer, continue note slowly in deionized water solution diffusion into the surface
Enter solution until single layer polystyrene sphere is covered with entire liquid level；
Step 5: deionized water will be slowly injected into the deionized water solution of step 4, promote liquid level of solution；
Step 6: with the single layer polystyrene sphere film of the deionized water liquid level formed in Tx100 polymerisation in solution step 4；
Step 7: sheet glass a is put into the region without single layer polystyrene sphere film handled by step 6, glass
The position of glass piece is adjusted to the lower section of single layer polystyrene film, then lifts sheet glass a with tweezers, will retain single layer polystyrene
The sheet glass a of glomerular membrane is put into 40 DEG C of oven and dries, and obtains single layer polystyrene sphere template.
Compared with prior art, beneficial effects of the present invention:
(1) method that the embodiment of the present application utilizes electron beam evaporation deposition, by controlling the parameter of electron beam evaporation deposition,
Multiple circulation rotating vapor deposition insulating materials has been obtained as medium, primary vertical evaporation metal with chiral metal micro-nano spiral shell
Revolve structure；
(2) since polystyrene sphere is during preparation, it is easy to cause bead to arrange non-uniform situation, and show
The chiral structure for thering is technology to prepare, it may appear that in the case where offsetting chiral on different characteristic direction, integrally-built chirality is small.But
Be the embodiment of the present application preparation method preparation chiral metal micro-nano helical structure by bead arrangement it is non-uniform influence it is small because
On the different characteristic direction of array structure, the chirality of single structure is identical, so that the inherence of total is chiral big.
(3) the embodiment of the present application forms helical structure, then the method for evaporation metal using insulating materials is first deposited, and simplifies
Preparation process reduces the preparation cost of chiral metal structure；
(4) insulating materials is deposited using multiple circulation rotating in the method that metal helical structure is prepared in the embodiment of the present application,
Step effect is reduced, keeps preparation process more accurate；
(5) the chiral metal helical structure of the embodiment of the present application scheme preparation has good Chiral effects, can apply
In biological monitoring, mapping sensor, polarization conversion and photoelectronic circuit polarizer.
Detailed description of the invention
Fig. 1 is the metal spiral shell prepared in the embodiment of the present application 1 by the preparation method of chiral metal micro-nano helical structure
Revolve the scanning electron microscope diagram piece of structure single structure；
Fig. 2 is the metal spiral shell prepared in the embodiment of the present application 1 by the preparation method of chiral metal micro-nano helical structure
Revolve the scanning electron microscope diagram piece of array of structures；
Fig. 3 is the metal spiral shell prepared in the embodiment of the present application 1 by the preparation method of chiral metal micro-nano helical structure
Revolve the circular dichroism figure of structure；
Wherein, in Fig. 1: 1, No. 1 position；2, No. 2 positions；3, No. 3 positions.
Specific embodiment
To solve the problems, such as chiral metal helical structure preparation method very complicated existing in the prior art, the present invention is mentioned
A kind of chiral metal helical structure preparation method is supplied, which utilizes the principle of glancing angle deposition technology, make metal spiral shell
The preparation method for revolving structure is simple, and the chiral metal helical structure Chiral effects being prepared are strong.
Further detailed description is done to the present invention combined with specific embodiments below, but embodiments of the present invention are not limited to
This.
Embodiment 1:
A kind of preparation method of chiral metal micro-nano helical structure, it is characterised in that: the metal micro-nano helical structure is
Using polystyrene sphere as substrate, insulating materials is deposited in circulation rotating inclination clockwise or counterclockwise on its substrate, forms spiral shell
Structure, then the vertical evaporation metal material on its helical structure are revolved, metal helical structure is formed.The insulating materials is titanium dioxide
Silicon, the metal material are gold or silver.
The preparation method of above-mentioned chiral metal micro-nano helical structure, includes the following steps:
Step 1 prepares single layer polystyrene sphere template；
Step 2, the single layer polystyrene sphere template that will be prepared, is adhesive in substrate with two-sided, is put into Vacuum Deposition
On the sample stage of film machine, electron beam evaporation deposition instrument is closed, and vacuumize；
Specifically: when the chamber pressure of vacuum coating equipment is lower than 3 × 10-6Torr, then carrying out next step plated film work
Make.
Deposition angles are set 4 ° by step 3, insulating materials is deposited, and by gyrobearing clockwise or counterclockwise
Angle recycles repeatedly vapor deposition insulating materials；
Specifically: setting 4 ° for deposition angles first, insulating materials 5nm is deposited at No. 1 position, later each inverse time
120 ° of needle rotational orientation angle, insulating materials 5nm is deposited, recycles 5 times in this way, that is, be with 2-3-1-2-No. 3 positions respectively
Sequence circulation vapor deposition 5 times, first layer vapor deposition is completed, and forms the similar triangular structure that endpoint connects；
Secondly continue to be deposited on the basis of first layer, 240 ° of rotational orientation angle counterclockwise, insulation is deposited at No. 2 positions
Insulating materials 5nm is deposited in material 5nm, 120 ° of another mistake hour hands rotational orientation angle at No. 3 positions；Recycle primary above-mentioned vapor deposition
Process, that is, successively 240 ° and 120 ° of rotational orientation angle counterclockwise, respectively at 2-No. 3 positions be deposited insulating materials 5nm, second
Layer vapor deposition is completed, and step-like semi-spiral structure is formed；
Then continue to be deposited on the basis of the second layer, insulating materials 5nm be deposited respectively at No. 3 positions, be deposited twice,
Ultimately form a spiral-shaped structure.
Deposition angles are set 90 ° by step 4, and evaporation metal material obtains metal helical structure；
Specifically: on the basis of the spiral-shaped structure that the vapor deposition is completed, deposition angles are adjusted to 90 °, it is vertical to steam
Metallization 20nm.
Step 5, cooling instrument, inflated with nitrogen take out sample.
Specifically:
It is electron beam evaporation deposition instrument, the angle and plated film of rotation that used instrument is deposited in the embodiment of the present application
Velocity and time can be adjusted by control panel.
Deposition angles in the embodiment of the present application are defined as to the angle of sample stage and beam direction, azimuth is defined as sample
The angle that platform is rotated using crossing the normal in the center of circle as axis.
The line evaporation rate of the above-mentioned vapor deposition insulating materials of the embodiment of the present application isThe beam of evaporation metal material
Flow evaporator rate isBy controlling the line evaporation rate in the preparation process, it is ensured that the helical structure of preparation
Pattern.
As shown in Figure 1, be the SEM figure for the metal micro-nano helical structure prepared using this application embodiment preparation method,
Show a complete single structure in figure, 1,2,3 indicated in Fig. 1 be respectively No. 1 position when being deposited in step 3,
No. 2 positions, No. 3 positions.From the point of view of the structure top view of the preparation, it is similar to a triangular structure, but due to 1,2, No. 3
The height of position circulation vapor deposition is different, just constitutes from No. 1 position of position 2 to No. 3 positions, height successively increases from lower to upper
High stereo spiral type metal micro-nanostructure, the structure have chirality.
As shown in Fig. 2, be the SEM figure for the metal micro-nano helical structure prepared using this application embodiment preparation method,
Metal micro-nano helical structure array is shown in figure, it can be seen from the figure that the metal micro-nano spiral that the present embodiment is prepared
Structure is the helical structure of six close heap periodic arrangements.
The normal incidence or oblique feeding method measurement that this is used up with structure prepared by the embodiment of the present application preparation method obtain it
Circular dichroism, circular dichroism signal spectrum line such as Fig. 3, signal have been up to 300mdeg.
Embodiment 2:
The present embodiment preparation step is essentially identical with embodiment 1, distinguishes the film plating process being only that in step 3, this reality
Apply the process of the specific plated film of step 3 described in a preparation method are as follows:
4 ° are set by deposition angles first, insulating materials 5nm is deposited at No. 1 position, later the side of rotating clockwise every time
120 ° of parallactic angle, insulating materials 5nm is deposited, recycles 5 times in this way, that is, is the sequence circulation with 3-2-1-3-No. 2 positions respectively
Vapor deposition 5 times, first layer vapor deposition are completed, and the similar triangular structure that endpoint connects is formed；
Secondly continue to be deposited on the basis of first layer, rotate clockwise 240 ° of azimuth, insulating materials is deposited No. 3 positions
5nm, then 120 ° of azimuth is rotated clockwise, insulating materials 5nm is deposited at No. 2 positions；Primary above-mentioned vapor deposition process is recycled,
That is, successively rotating clockwise 240 ° and 120 ° of azimuth, insulating materials 5nm, second layer vapor deposition is deposited at the position 3-2 respectively
It completes, forms step-like semi-spiral structure；
Then continue to be deposited on the basis of the second layer, insulating materials 5nm be deposited respectively at No. 2 positions, be deposited twice,
Ultimately form a spiral-shaped structure.
The chiral metal micro-nano helical structure being prepared using the embodiment of the present application preparation method is to prepare in embodiment 1
Chiral metal micro-nano structure chiral isomer, the circular dichroism signal size of two structures is identical, and symbol is opposite.
Normal incidence that the structure of preparation is used up or oblique feeding method measurement are obtained into its circular dichroism.
Embodiment 3
A kind of preparation method for chiral metal micro-nano helical structure that Examples 1 and 2 propose wherein is prepared in step 1 single
The process of strata styrene bead template is as follows:
Step 1: preparing the width of sheet glass a and two sheets b, glass a and sheet glass b no more than 1cm, and clean
Completely, cleaning process are as follows: the sheet glass is scrubbed clean with detergent, with acetone ultrasound 15 minutes, is rinsed with deionized water
Clean acetone, then with alcohol ultrasound 15 minutes, rinse alcohol well with deionized water, be put into deionized water and save backup；
Step 2: the two sheets b cleaned being gathered into folds and is put into culture dish, deionized water is injected in culture dish, is gone
Ion water level is lower than the upper surface of sheet glass b above；
Step 3: polystyrene sphere suspension is mixed with alcohol, is packed into sample cell ultrasound 3 minutes,
Polystyrene sphere and alcohol mixed solution are obtained, the diameter of the polystyrene sphere is 600nm, polystyrene
The volume ratio of bead suspension and alcohol is 1:1~5:1；
Step 4: the mixed solution of polystyrene sphere and alcohol being slowly injected into two sheets surface with needle tubing, is gathered
Styrene bead solution can form the polystyrene sphere film of single layer, continue note slowly in deionized water solution diffusion into the surface
Enter solution until single layer polystyrene sphere is covered with entire liquid level；
Step 5: deionized water will be slowly injected into the deionized water solution of step 4, promote liquid level of solution；
Step 6: with the single layer polystyrene sphere film of the deionized water liquid level formed in Tx100 polymerisation in solution step 4；
Step 7: sheet glass a is put into the region without single layer polystyrene sphere film handled by step 6, glass
The position of glass piece is adjusted to the lower section of single layer polystyrene film, then lifts sheet glass a with tweezers, will retain single layer polystyrene
The sheet glass a of glomerular membrane is put into 40 DEG C of oven and dries, and obtains single layer polystyrene sphere template.
Specifically:
When preparing single layer polystyrene sphere template, the polystyrene sphere of different-diameter size also can be used, gather
The size of styrene the small ball's diameter determine the distance between last preparation-obtained metal micro-nano spiral single structure and
The screw pitch of single helical structure.Bead template prepared by preparation method with embodiment proposition, is arranged in a manner of six close heaps
The single layer bead template of column, uses as the subsequent template for preparing metal micro-nanostructure.
Embodiment 4
The present embodiment preparation step and Examples 1 and 2 are essentially identical, and difference is only that insulating materials used is titanium dioxide
Silicon.
Normal incidence that the structure of preparation is used up or oblique feeding method measurement are obtained into its circular dichroism.
Embodiment 5
The present embodiment preparation step is substantially the same manner as Example 4, and difference is only that metal material used for gold.
Normal incidence that the structure of preparation is used up or oblique feeding method measurement are obtained into its circular dichroism.
Embodiment 6
The present embodiment preparation step is substantially the same manner as Example 5, and difference is only that precious metal material used for silver.
Normal incidence that the structure of preparation is used up or oblique feeding method measurement are obtained into its circular dichroism.
The metal micro-nano helical structure of the application preparation has big inherence chiral, the external factor shadow during being prepared
Sound is smaller.Since polystyrene sphere is during preparation, it is easy to cause bead to arrange non-uniform situation, and existing skill
The chiral structure of art preparation, it may appear that in the case where offsetting chiral on different characteristic direction, integrally-built chirality is small.But this
Application embodiment preparation method preparation chiral metal micro-nano helical structure by bead arrangement it is non-uniform influence it is small because in battle array
On the different characteristic direction of array structure, the chirality of single structure is identical, so that the chirality of total is big, can be applied to biology
Monitoring, mapping sensor, polarization conversion and photoelectronic circuit polarizer.
And the embodiment of the present application forms helical structure, then gold is deposited using first repeatedly insulating materials is deposited in circulation rotating
The method of category simplifies preparation process, reduces step effect, keep preparation process more accurate, also reduce chiral metal structure
Preparation cost.
The above content is a further detailed description of the present invention in conjunction with specific preferred embodiments, and it cannot be said that
Specific implementation of the invention is only limited to these instructions.For those of ordinary skill in the art to which the present invention belongs, exist
Under the premise of not departing from present inventive concept, a number of simple deductions or replacements can also be made, all shall be regarded as belonging to of the invention
Protection scope.
Claims (9)
1. a kind of preparation method of chiral metal micro-nano helical structure, it is characterised in that: the metal micro-nano helical structure be with
Polystyrene sphere is substrate, and insulating materials is deposited in circulation rotating inclination clockwise or counterclockwise on its substrate, forms spiral
Structure, then the vertical evaporation metal material on its helical structure form metal helical structure.
2. the preparation method of chiral metal micro-nano helical structure as described in claim 1, it is characterised in that: the insulating materials is
Silica, the metal material are gold or silver.
3. the preparation method of chiral metal micro-nano helical structure as claimed in claim 2, characterized by the following steps:
Step 1 prepares single layer polystyrene sphere template；
Step 2, the single layer polystyrene sphere template that will be prepared, is adhesive in substrate with two-sided, is put into vacuum coating equipment
Sample stage on, close electron beam evaporation deposition instrument, and vacuumize；
Deposition angles are set 4 ° by step 3, and insulating materials is deposited, and by rotational orientation angle clockwise or counterclockwise, follows
Insulating materials is repeatedly deposited in ring；
Deposition angles are set 90 ° by step 4, and evaporation metal material obtains metal helical structure；
Step 5, cooling instrument, inflated with nitrogen take out sample.
4. the preparation method of chiral metal micro-nano helical structure according to claim 3, it is characterised in that: the step 3
The process of specific plated film are as follows:
4 ° are set by deposition angles first, insulating materials 5nm is deposited at No. 1 position, later each rotational orientation angle counterclockwise
120 °, insulating materials 5nm is deposited, recycles 5 times in this way, that is, is the sequence circulation vapor deposition with 2-3-1-2-No. 3 positions respectively
5 times, first layer vapor deposition is completed, and forms the similar triangular structure that endpoint connects；
Secondly continue to be deposited on the basis of first layer, 240 ° of rotational orientation angle counterclockwise, insulating materials is deposited at No. 2 positions
Insulating materials 5nm is deposited in 5nm, 120 ° of another mistake hour hands rotational orientation angle at No. 3 positions；Primary above-mentioned vapor deposition process is recycled,
That is, successively 240 ° and 120 ° of rotational orientation angle counterclockwise, insulating materials 5nm is deposited at 2-No. 3 positions respectively, the second layer steams
Plating is completed, and step-like semi-spiral structure is formed；
Then continue to be deposited on the basis of the second layer, insulating materials 5nm is deposited respectively at No. 3 positions, be deposited twice, finally
Form a spiral-shaped structure.
5. the preparation method of chiral metal micro-nano helical structure according to claim 3, it is characterised in that: the step 3
The process of specific plated film are as follows:
4 ° are set by deposition angles first, insulating materials 5nm is deposited at No. 1 position, rotates clockwise azimuth every time later
120 °, insulating materials 5nm is deposited, recycles 5 times in this way, that is, is the sequence circulation vapor deposition with 3-2-1-3-No. 2 positions respectively
5 times, first layer vapor deposition is completed, and forms the similar triangular structure that endpoint connects；
Secondly continue to be deposited on the basis of first layer, rotate clockwise 240 ° of azimuth, insulating materials 5nm is deposited No. 3 positions,
120 ° of azimuth is rotated clockwise again, and insulating materials 5nm is deposited at No. 2 positions；Recycle primary above-mentioned vapor deposition process, that is,
240 ° and 120 ° of azimuth is successively rotated clockwise, insulating materials 5nm is deposited at the position 3-2 respectively, the second layer has been deposited
At forming step-like semi-spiral structure；
Then continue to be deposited on the basis of the second layer, insulating materials 5nm is deposited respectively at No. 2 positions, be deposited twice, finally
Form a spiral-shaped structure.
6. the preparation method of chiral metal micro-nano helical structure according to claim 4 or 5, which is characterized in that the step
Rapid four specific coating process are as follows:
On the basis of the spiral-shaped structure that the vapor deposition is completed, deposition angles are adjusted to 90 °, vertical evaporation metal material
20nm。
7. the preparation method of chiral metal micro-nano helical structure according to claim 6, it is characterised in that: the vapor deposition is exhausted
The line evaporation rate of edge material isThe line evaporation rate of evaporation metal material is
8. the preparation method of chiral metal micro-nano helical structure according to claim 7, it is characterised in that: the step 3
The beginning condition of plated film is that the chamber pressure of vacuum coating equipment described in step 2 is lower than 3 × 10-6Torr.
9. the preparation method of chiral metal micro-nano helical structure according to claim 8, it is characterised in that: the step 1
The middle process for preparing single layer polystyrene sphere template is as follows:
Step 1: preparing the width of sheet glass a and two sheets b, glass a and sheet glass b no more than 1cm, and clean dry
Only, cleaning process are as follows: the sheet glass is scrubbed clean with detergent, with acetone ultrasound 15 minutes, is rinsed with deionized water dry
Net acetone, then with alcohol ultrasound 15 minutes, rinse alcohol well with deionized water, be put into deionized water and save backup；
Step 2: the two sheets b cleaned being gathered into folds and is put into culture dish, deionized water, deionization are injected in culture dish
Water level is lower than the upper surface of sheet glass b above；
Step 3: polystyrene sphere suspension being mixed with alcohol, is packed into sample cell ultrasound 3 minutes, obtains polystyrene sphere
With alcohol mixed solution, the diameter of the polystyrene sphere is 600nm, the volume ratio of polystyrene sphere suspension and alcohol
For 1:1~5:1；
Step 4: the mixed solution of polystyrene sphere and alcohol is slowly injected into two sheets surface, polyphenyl second with needle tubing
Alkene bead solution can form the polystyrene sphere film of single layer in deionized water solution diffusion into the surface, and the injection continued slowly is molten
Liquid is covered with entire liquid level until single layer polystyrene sphere；
Step 5: deionized water will be slowly injected into the deionized water solution of step 4, promote liquid level of solution；
Step 6: with the single layer polystyrene sphere film of the deionized water liquid level formed in Tx100 polymerisation in solution step 4；
Step 7: sheet glass a is put into the region without single layer polystyrene sphere film handled by step 6, sheet glass
Position be adjusted to the lower section of single layer polystyrene film, then lift sheet glass a with tweezers, single layer polystyrene sphere will be retained
The sheet glass a of film is put into 40 DEG C of oven and dries, and obtains single layer polystyrene sphere template.
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