CN109517527A - A kind of wear-resisting polishing material - Google Patents
A kind of wear-resisting polishing material Download PDFInfo
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- CN109517527A CN109517527A CN201811474198.1A CN201811474198A CN109517527A CN 109517527 A CN109517527 A CN 109517527A CN 201811474198 A CN201811474198 A CN 201811474198A CN 109517527 A CN109517527 A CN 109517527A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The present invention relates to a kind of wear-resisting polishing materials, belong to polishing material technical field.Further increase the wearability of polyurethane polishing disc.Wear-resisting polishing material of the invention, by 100 parts by weight of polyether polyol, 100 parts by weight of diisocyanate, bisphenol A type epoxy resin 1-2 parts by weight, be chopped nylon fiber 3-5 parts by weight, chitin 4-6 parts by weight, silicone oil 2-3 parts by weight, chlorinated paraffin 2-3 parts by weight, ethylene glycol 1-2 parts by weight, maleic anhydride inoculated polypropylene 10-15 parts by weight, dimethyl cyclohexyl amine 0.5-1 parts by weight, acetone 2-4 parts by weight, conch meal 2-3 parts by weight, rutile type titanium white 1-2 parts by weight, hollow sial microballon 1-1.5 parts by weight, zinc stearate 2-3 parts by weight, three (2, 4- di-tert-butyl-phenyl) phosphite ester 1-2 parts by weight, antioxidant 1010 1-2 parts by weight, carbodiimides 0.5-1 parts by weight and cerium oxide 4-8 weight Measure part composition.The polishing material tensile strength is high, and resilience is good, and wearability is good, and molding property is good, is not easy to be passivated.
Description
Technical field
The invention belongs to polishing material technical fields, and in particular to a kind of wear-resisting polishing material.
Background technique
Glass is with a long history, and property is stablized, and is the excellent material of elapsed time test, is not only able to for decorating, can also
It plays a significant role in various wear-resisting instruments, or even can be used to help building energy conservation noise reduction.Glass surface is not smooth bright enough
Only, it is all needed before application by necessary surface polishing, therefore just generates polishing material.
In the prior art, the polishing material of early application mainly has titanium oxide, iron oxide or silica etc.；In recent years,
With the fast development of electronic information technology, lens, plate glass, liquid crystal display (LCD), glasses, anti-wear component and ceramics
The demand of the glass baseplates such as material greatly increases, and higher requirements are also raised for the precision and polishing speed for polishing material,
Cerium oxide have polishing velocity is fast, finish is good, long service life, it is free from environmental pollution and be easy to from be stained on object remove etc. it is excellent
Point, therefore be considered the surface polishing more suitable for glass material, it has also become it is current it is applied widely, dosage is big, technology content
High polishing product.
But single use rare earth, as polishing material, higher cost, in order to solve this problem, people grind rare earth
Powder and high molecular material carry out laminating production polishing material and oxygen such as are added in microporous polyurethane foaming system to reduce cost
Change cerium polishing powder, it is foamed, solidify the thermoset material with microcellular structure is made, polyurethane polishing is obtained after being cut into sheet
Piece is polished for abrasion-resistance glass.But as people are to the higher pursuit of product quality, the wearability of this polished silicon wafer needs
It improves.
Summary of the invention
In view of this, the present invention is to further increase the wearability of polyurethane polishing disc, a kind of wear-resisting polishing material is provided.
Wear-resisting polishing material of the invention, composition and parts by weight are as follows:
Preferably, the molecular weight of the polyether polyol is 100-300, and polyether polyol is polyethers 210, polyethers 303
Or polyethers 3010.
Preferably, the polyisocyanates is diisocyanate.
Preferably, the epoxy resin is bisphenol A type epoxy resin.
Preferably, the length of the chopped nylon fiber is 4-10mm.
Preferably, the chain extender is ethylene glycol or ethylenediamine.
Preferably, the antioxidant is suffocated amine antioxidant or Hinered phenols antioxidant；It is furthermore preferred that the antioxygen
Agent is three (2,4-DTBP) phosphite esters, four (β-(3,5 di-tert-butyl-hydroxy phenyl) propionic acid) pentaerythrites
Ester, (3,5- di-tert-butyl-hydroxy phenyl) propionic acid octadecyl ester or β-(3,5- di-tert-butyl-hydroxy phenyl) cyclohexenyl formate
Ester.
Preferably, the heat stabilizer is three (2,4- di-tert-butyl-phenyl) phosphite esters or bis- (2,4- di-t-butyls
Phenyl) pentaerythritol diphosphites.
Preferably, the foaming agent is acetone.
Preferably, the partial size of the hollow sial microballon is 45-300 μm.
Preferably, the partial size of the conch meal, cerium oxide and rutile type titanium white is 0.5-300 μm.
The present invention also provides the preparation methods of above-mentioned wear-resisting polishing material, and steps are as follows:
Step 1: weighing each component by composition and parts by weight；
Step 2: by polyether polyol, polyisocyanates, epoxy resin, be chopped nylon fiber, chitin, silicone oil, chlorination
Paraffin, chain extender, maleic anhydride inoculated polypropylene, foaming agent, conch meal, rutile type titanium white, hollow sial microballon, tristearin
Sour zinc, heat stabilizer, antioxidant, carbodiimides and cerium oxide are uniformly mixed, and obtain the first mixture；
Step 2: dimethyl cyclohexyl amine is added in the first mixture, it is uniformly mixed, obtains the second mixture；
Step 3: the second mixture is poured into mold internal pressure mold forming, last mechanical slice molding obtains wear-resisting polishing material
Material.
Compared with prior art, the invention has the benefit that
Wear-resisting polishing material wearability of the invention is good, and tensile strength is high, and resilience is good, and molding property is good, is not easy to be passivated, and protects
It is indeformable to hold the steady of polishing process, surface, is suitable for LCD crystal liquid substrate, optical prism, lens, hand-set lid, watch or clock glass
And the polishing of crystal glass element plane in groups.
Specific embodiment
For a further understanding of the present invention, the preferred embodiment of the invention is described below with reference to embodiment, still
It should be appreciated that these descriptions are only further explanation the features and advantages of the present invention, rather than to the claims in the present invention
Limitation.
Embodiment 1
Wear-resisting polishing material, by 100 parts by weight of polyether polyol, 105 parts by weight of diisocyanate, bisphenol type epoxy tree
1 parts by weight of rouge, be chopped nylon fiber (4mm) 3 parts by weight, 4 parts by weight of chitin, 2 parts by weight of silicone oil, 1 parts by weight of chlorinated paraffin,
1 parts by weight of ethylene glycol, 10 parts by weight of maleic anhydride inoculated polypropylene, 0.5 parts by weight of dimethyl cyclohexyl amine, 2 parts by weight of acetone, shellfish
Shell powder (50 μm) 2 parts by weight, rutile type titanium white (50 μm) 1 parts by weight, hollow sial microballon (70 μm) 1 parts by weight, tristearin
Sour 2 parts by weight of zinc, three (2,4- di-tert-butyl-phenyl) phosphite esters, 1 parts by weight, 0.5 parts by weight of antioxidant 1010, carbonization two are sub-
0.5 parts by weight of amine, cerium oxide (100 μm) 4 parts by weight composition.
Embodiment 2
Wear-resisting polishing material, by 100 parts by weight of polyether polyol, 105 parts by weight of diisocyanate, bisphenol type epoxy tree
1.5 parts by weight of rouge, be chopped nylon fiber (4mm) 4 parts by weight, 5 parts by weight of chitin, 2.5 parts by weight of silicone oil, chlorinated paraffin 1.5
Parts by weight, 1.5 parts by weight of ethylene glycol, 13 parts by weight of maleic anhydride inoculated polypropylene, 0.9 parts by weight of dimethyl cyclohexyl amine, acetone 3
Parts by weight, conch meal (50 μm) 2.5 parts by weight, rutile type titanium white (50 μm) 1.5 parts by weight, hollow sial microballon (70 μm)
1.3 parts by weight, 2.5 parts by weight of zinc stearate, three (2,4- di-tert-butyl-phenyl) phosphite esters, 1.5 parts by weight, antioxidant 1010 1
Parts by weight, 0.6 parts by weight of carbodiimides, cerium oxide (100 μm) 6 parts by weight composition.
Embodiment 3
Wear-resisting polishing material, by 100 parts by weight of polyether polyol, 105 parts by weight of diisocyanate, bisphenol type epoxy tree
2 parts by weight of rouge, be chopped nylon fiber (4mm) 5 parts by weight, 6 parts by weight of chitin, 3 parts by weight of silicone oil, 2 parts by weight of chlorinated paraffin,
2 parts by weight of ethylene glycol, 15 parts by weight of maleic anhydride inoculated polypropylene, 1 parts by weight of dimethyl cyclohexyl amine, 4 parts by weight of acetone, shell
Powder (50 μm) 3 parts by weight, rutile type titanium white (50 μm) 2 parts by weight, hollow sial microballon (70 μm) 1.5 parts by weight, tristearin
Sour 3 parts by weight of zinc, three (2,4- di-tert-butyl-phenyl) phosphite esters, 2 parts by weight, 0.6 parts by weight of antioxidant 1010, carbonization two are sub-
1 parts by weight of amine, cerium oxide (100 μm) 8 parts by weight composition.
The performance of the wear-resisting polishing material of embodiment 1-3 is detected, the results are shown in Table 1.
The performance characterization of the wear-resisting polishing material of 1 embodiment 1-3 of table
The foregoing description of the disclosed embodiments enables those skilled in the art to implement or use the present invention.
Various modifications to these embodiments will be readily apparent to those skilled in the art, as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, of the invention
It is not intended to be limited to the embodiments shown herein, and is to fit to and the principles and novel features disclosed herein phase one
The widest scope of cause.
Claims (10)
1. wear-resisting polishing material, which is characterized in that composition and parts by weight are as follows:
2. wear-resisting polishing material according to claim 1, which is characterized in that the molecular weight of the polyether polyol is 100-
300, polyether polyol is polyethers 210, polyethers 303 or polyethers 3010.
3. wear-resisting polishing material according to claim 1, which is characterized in that the polyisocyanates is diisocyanate.
4. wear-resisting polishing material according to claim 1, which is characterized in that the epoxy resin is bisphenol type epoxy tree
Rouge.
5. wear-resisting polishing material according to claim 1, which is characterized in that the length of the chopped nylon fiber is 4-
10mm。
6. wear-resisting polishing material according to claim 1, which is characterized in that the chain extender is ethylene glycol or ethylenediamine.
7. wear-resisting polishing material according to claim 1, which is characterized in that the antioxidant be suffocated amine antioxidant or
Hinered phenols antioxidant.
8. wear-resisting polishing material according to claim 1, which is characterized in that the heat stabilizer is three (2,4- bis- tertiary fourths
Base phenyl) phosphite ester or bis- (2,4- di-tert-butyl-phenyl) pentaerythritol diphosphites.
9. wear-resisting polishing material according to claim 1, which is characterized in that the foaming agent is acetone.
10. wear-resisting polishing material according to claim 1, which is characterized in that the partial size of the hollow sial microballon is 45-
300μm；The partial size of the conch meal, cerium oxide and rutile type titanium white is 0.5-300 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811474198.1A CN109517527A (en) | 2018-12-04 | 2018-12-04 | A kind of wear-resisting polishing material |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811474198.1A CN109517527A (en) | 2018-12-04 | 2018-12-04 | A kind of wear-resisting polishing material |
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| CN109517527A true CN109517527A (en) | 2019-03-26 |
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| CN201811474198.1A Pending CN109517527A (en) | 2018-12-04 | 2018-12-04 | A kind of wear-resisting polishing material |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111117493A (en) * | 2019-12-09 | 2020-05-08 | 广州鑫荣彩印包装有限公司 | High-brightness metal polishing paste |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103333313A (en) * | 2013-06-09 | 2013-10-02 | 合肥宏光研磨科技有限公司 | Preparation method of polyurethane polishing material |
| CN103481208A (en) * | 2012-06-13 | 2014-01-01 | 台山市兰宝磨具有限公司 | Grinding tool and preparation method thereof |
| CN106607772A (en) * | 2016-07-01 | 2017-05-03 | 台山市兰宝磨具有限公司 | Grinding tool |
| CN106977685A (en) * | 2017-04-19 | 2017-07-25 | 台山市远鹏研磨科技有限公司 | A kind of wet type hard precision polishing wheel polishing material and preparation method thereof |
-
2018
- 2018-12-04 CN CN201811474198.1A patent/CN109517527A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103481208A (en) * | 2012-06-13 | 2014-01-01 | 台山市兰宝磨具有限公司 | Grinding tool and preparation method thereof |
| CN103333313A (en) * | 2013-06-09 | 2013-10-02 | 合肥宏光研磨科技有限公司 | Preparation method of polyurethane polishing material |
| CN106607772A (en) * | 2016-07-01 | 2017-05-03 | 台山市兰宝磨具有限公司 | Grinding tool |
| CN106977685A (en) * | 2017-04-19 | 2017-07-25 | 台山市远鹏研磨科技有限公司 | A kind of wet type hard precision polishing wheel polishing material and preparation method thereof |
Non-Patent Citations (6)
| Title |
|---|
| 丁彤: "《中国化工产品大全 上》", 31 October 1994, 化学工业出版社 * |
| 丁浩: "《塑料工业实用手册 中》", 31 August 2000, 材料科学与工程出版中心 * |
| 孔萍，刘青山: "《塑料材料》", 31 July 2017, 广东高等教育出版社 * |
| 李焕生，高峰: "聚氨酯抛光材料的研究", 《聚氨酯工业》 * |
| 杨茹果: "聚氨酯抛光材料的研究与应用进展", 《化学工程师》 * |
| 舒朝濂: "《现代光学制造技术》", 31 August 2008, 国防工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111117493A (en) * | 2019-12-09 | 2020-05-08 | 广州鑫荣彩印包装有限公司 | High-brightness metal polishing paste |
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Address after: Room 5-7, No. 5 Special Technical Platform, No. 5218 Longhu Road, Changchun High-tech North District, 130000 Jilin Province Applicant after: CHANGCHUN A&Z SCIENCE CO., LTD. Address before: 130000 Changbei High-tech Center A District, Changbei, Changchun City, Jilin Province Applicant before: CHANGCHUN A&Z SCIENCE CO., LTD. |
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Application publication date: 20190326 |