CN109465738A - A kind of polishing pedestal and polissoir - Google Patents
A kind of polishing pedestal and polissoir Download PDFInfo
- Publication number
- CN109465738A CN109465738A CN201811505573.4A CN201811505573A CN109465738A CN 109465738 A CN109465738 A CN 109465738A CN 201811505573 A CN201811505573 A CN 201811505573A CN 109465738 A CN109465738 A CN 109465738A
- Authority
- CN
- China
- Prior art keywords
- guide face
- draining
- polishing
- water fender
- draining guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/02—Frames; Beds; Carriages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a kind of polishing pedestal and polissoirs, collecting pit including being provided with pool wall, the bottom of the pool wall is provided with the first draining guide face and the second draining guide face, wherein the pool wall, the first draining guide face and the second draining guide face integral molding；The first draining guide face and the second draining guide face are burnishing surface and angle between the two less than 180 °；Drainage hole and the mounting portion for installing polishing unit are provided on the first draining guide face and the second draining guide face；Wherein, on the first draining guide face, the position where the mounting portion is higher than the drainage hole；It is described second draining guide face on, the mounting portion position be higher than the drainage hole.The polishing base construction is reasonable, and drainage performance is good.
Description
Technical field
The present invention relates to polishing technology field more particularly to a kind of polishing pedestals and polissoir.
Background technique
Chemically mechanical polishing is commonly used for a kind of technique of manufacture high density integrated circuit, to use in polishing process a large amount of
Polishing fluid, pure water and other liquid.
Chemical-mechanical polisher includes the polishing pedestal for installing polishing disk, the liquid used in polishing process and
Water needs polished pedestal outflow to be drained again by pipeline, but existing polishing base construction is unreasonable, and drain (water) performance is poor.
Summary of the invention
It is an object of the invention to overcome the deficiencies of existing technologies, a kind of polishing pedestal and polissoir are provided, to solve
Certainly the problems of the prior art.
To solve the above problems, the present invention provides: a kind of polishing pedestal, the collecting pit including being provided with pool wall are described
The bottom of pool wall is provided with the first draining guide face and the second draining guide face, wherein the pool wall, the first draining water conservancy diversion
Face and the second draining guide face integral molding；
The first draining guide face and the second draining guide face is burnishing surface and angle between the two is less than
180°；
Drainage hole is provided on the first draining guide face and the second draining guide face and for installing polishing
The mounting portion of unit；
Wherein, on the first draining guide face, the position where the mounting portion is higher than the drainage hole；Described
On second draining guide face, the position where the mounting portion is higher than the drainage hole.
As a further improvement of the above technical scheme, the first draining guide face and the second draining guide face two
Person is intersected at an intersecting lens；
Wherein, compared to the mounting portion, the distance between the drainage hole and the intersecting lens are shorter.
As a further improvement of the above technical scheme, the collecting pit is symmetrical structure, and it includes a planes of symmetry；
Wherein, the first draining guide face and the second draining guide face are symmetrical arranged about the plane of symmetry, institute
Mounting portion is stated also to be symmetrical arranged about the plane of symmetry.
As a further improvement of the above technical scheme, the pool wall includes the preceding water fender, arc-shaped of integral molding
Water fender, side water fender and rear water plate；
Wherein, the preceding water fender intersects with the plane of symmetry with the rear water plate, and the arc-shaped water fender has
Even number and the two sides for being symmetrically disposed on the plane of symmetry, side water fender have even number and are symmetrically disposed on the plane of symmetry
Two sides.
As a further improvement of the above technical scheme, it is provided with below the collecting pit for supporting
Support portion.
As a further improvement of the above technical scheme, the support portion includes being set to immediately below the preceding water fender
Intermediate support plate, wherein the preceding water fender and the intermediate support plate integral molding.
As a further improvement of the above technical scheme, the support portion includes under being set to the arc-shaped water fender just
The cylindrical support column of side, wherein the arc-shaped water fender and the cylindrical support column integral molding.
As a further improvement of the above technical scheme, the support portion includes being set to immediately below the side water fender
Side support plate, wherein the side water fender and the side support plate integral molding.
As a further improvement of the above technical scheme, the support portion includes being set to immediately below the rear water plate
Rear bearing sheet, wherein the rear water plate and the rear bearing sheet integral molding.
Present invention further provide that a kind of polissoir, including as above described in any item polishing pedestals.
The beneficial effects of the present invention are: the present invention proposes a kind of polishing pedestal, the collecting pit including being provided with pool wall, pool wall
Bottom be provided with the first draining guide face and second draining guide face, wherein first draining guide face and second draining water conservancy diversion
Face is burnishing surface and angle between the two less than 180 °.
The aqueous that the polishing unit being mounted on the first draining guide face is used during the polishing process can pass through first row
Drainage hole discharge on water guide face, the aqueous that the polishing unit being mounted on the second draining guide face is used during the polishing process
It can be discharged by the drainage hole on the second draining guide face, the shunting of aqueous so may be implemented, so as to improve draining effect
Rate.
Simultaneously as pool wall, the first draining guide face and the second draining guide face integral molding, can effectively avoid in this way
There is the case where leak in collecting pit.
The polishing base construction is reasonable, and drainage performance is good.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below will be to needed in the embodiment attached
Figure is briefly described.It should be appreciated that the following drawings illustrates only certain embodiments of the present invention, therefore it is not construed as pair
The restriction of range for those of ordinary skill in the art without creative efforts, can also be according to this
A little attached drawings obtain other relevant attached drawings.
Fig. 1 is a kind of the first shaft side figure for polishing pedestal in the embodiment of the present invention；
Fig. 2 is a kind of the second shaft side figure for polishing pedestal in the embodiment of the present invention；
Fig. 3 is a kind of top view for polishing pedestal in the embodiment of the present invention；
Fig. 4 be Fig. 3 in A-A to cross-sectional view；
Fig. 5 be Fig. 4 in J-J to cross-sectional view；
Fig. 6 be Fig. 3 in C-C to cross-sectional view；
Fig. 7 be Fig. 3 in D-D to cross-sectional view.
Main element symbol description:
1- collecting pit；2- first drains guide face；3- second drains guide face；4- drainage hole；5- polishing disk erecting bed；6-
Rubbing head pedestal erecting bed；7- polishing pad obturator erecting bed；Water fender before 8-；The arc-shaped water fender of 9-；The side 10- water fender；
11- rear water plate；12- support portion；13- intermediate support plate；14- cylindrical support column；15- side support plate；16- rear bearing sheet；
17- stiffener plate；18- bottom plate.
Specific embodiment
Hereinafter, various embodiments of the present invention will be described more fully.The present invention can have various embodiments, and
It can adjust and change wherein.It should be understood, however, that: there is no various embodiments of the present invention are limited to spy disclosed herein
Determine the intention of embodiment, but should invention is construed as cover in the spirit and scope for falling into various embodiments of the present invention
All adjustment, equivalent and/or optinal plan.
Hereinafter, disclosed in the term " includes " that can be used in various embodiments of the present invention or " may include " instruction
Function, operation or the presence of element, and do not limit the increase of one or more functions, operation or element.In addition, such as existing
Used in various embodiments of the present invention, term " includes ", " having " and its cognate are meant only to indicate special characteristic, number
Word, step, operation, the combination of element, component or aforementioned item, and be understood not to exclude first one or more other
Feature, number, step, operation, element, component or aforementioned item combined presence or increase one or more features, number,
Step, operation, element, component or aforementioned item combination a possibility that.
In various embodiments of the present invention, statement " A or/and B " includes any combination or the institute of the text listed file names with
There is combination, such as, it may include A, it may include B or may include A and B both.
The statement (" first ", " second " etc.) used in various embodiments of the present invention can be modified in various implementations
Various constituent element in example, but respective sets can not be limited into element.For example, the above statement is not intended to limit the suitable of the element
Sequence and/or importance.The above statement is only used for the purpose for differentiating an element and other elements.For example, the first user fills
It sets and indicates different user device with second user device, although the two is all user apparatus.For example, of the invention each not departing from
In the case where the range of kind embodiment, first element is referred to alternatively as second element, and similarly, second element is also referred to as first
Element.
It should also be noted that in the present invention, unless otherwise specific regulation and definition, the arts such as " installation ", " connection ", " fixation "
Language shall be understood in a broad sense, and can be and is directly connected to, and can be indirectly connected through an intermediary；It can be inside two elements
Connection.For the ordinary skill in the art, it can understand above-mentioned term in the present invention as the case may be
Concrete meaning.
In the present invention, those skilled in the art are it is to be appreciated that indicating position or positional relationship in text
Term be orientation based on the figure or positional relationship, be merely for convenience of description of the present invention and simplification of the description, without
It is that the device of indication or suggestion meaning or element must have a particular orientation, be constructed and operated in a specific orientation, therefore
It is not considered as limiting the invention.
The term used in various embodiments of the present invention is used only for the purpose of describing specific embodiments and not anticipates
In limitation various embodiments of the present invention.Unless otherwise defined, otherwise all terms used herein (including technical term and
Scientific term) there is contain identical with the normally understood meaning of various embodiments of the present invention one skilled in the art
Justice.The term (term such as limited in the dictionary generally used) be to be interpreted as have in the related technical field
The identical meaning of situational meaning and Utopian meaning or meaning too formal will be interpreted as having, unless this
It is clearly defined in the various embodiments of invention.
Embodiment 1
Refering to fig. 1 and Fig. 2 proposes a kind of polishing pedestal in the present embodiment, the collecting pit 1 including being provided with pool wall, pond
The bottom of wall is provided with the first draining guide face 2 and the second draining guide face 3, wherein pool wall, the first draining guide face 2 and the
Two draining 3 integral moldings of guide face.
First draining guide face 2 and the second draining guide face 3 are burnishing surface and angle between the two less than 180 °.
Drainage hole 4 is provided on first draining guide face 2 and the second draining guide face 3 and for installing polishing unit
Mounting portion.
Polishing unit is for carrying out polishing relevant work, and in the present embodiment, polishing unit may include polishing disk, throw
Shaven head and polishing pad obturator (polishing pad trimmer) etc., for this purpose, as shown in figure 3, mounting portion may include polishing disk peace
Fill platform 5, rubbing head pedestal erecting bed 6 and polishing pad obturator erecting bed 7, wherein be provided with rubbing head on rubbing head pedestal.
On the first draining guide face 2, the position where mounting portion is higher than drainage hole 4.In the present embodiment, this means that
Polishing disk erecting bed 5, rubbing head pedestal erecting bed 6 and polishing pad obturator erecting bed 7 on first draining guide face 2 are set
The position at place is above the drainage hole 4 on the first draining guide face 2.Since drainage hole 4 is located at low level, when the first draining water conservancy diversion
When arbitrarily polishing unit on face 2 and being worked, used polishing fluid or aqueous etc. can all flow under gravity
Drainage hole 4 on one draining guide face 2, and finally from the lower drainpipe outflow installed of the drainage hole 4.
On the second draining guide face 3, the position where mounting portion is higher than drainage hole 4.In the present embodiment, this means that
Polishing disk erecting bed 5, rubbing head pedestal erecting bed 6 and polishing pad obturator erecting bed 7 on second draining guide face 3 are set
The position at place is above the drainage hole 4 on the second draining guide face 3.Since drainage hole 4 is located at low level, when the second draining water conservancy diversion
When arbitrarily polishing unit on face 3 and being worked, used polishing fluid or aqueous etc. can all flow under gravity
Drainage hole 4 on two draining guide faces 3, finally from the lower drainpipe outflow installed of the drainage hole 4.
As shown in Figure 6 and Figure 7, guide face 3 is with respect to the horizontal plane inclined sets for the first draining guide face 2 and the second draining
It sets, wherein α and β in figure may be provided between 0 °~45 °, wherein do not include 0 °.
In the present embodiment, both the first draining guide face 2 and the second draining guide face 3 can intersect at an intersecting lens,
And not set lattice are kept off between the two, meanwhile, the position of drainage hole 4 can be lower than the height of all mounting portions in the two.When first
When water flow on draining guide face 2 is excessive, aqueous or polishing fluid etc. can be flowed out from drainage hole 4 on the second draining guide face 3；
Correspondingly, aqueous or polishing fluid etc. can be from the first draining guide faces 2 when the water flow on the second draining guide face 3 is excessive
Upper drainage hole 4 flows out.
Wherein, compared to mounting portion, the distance between drainage hole 4 and intersecting lens are shorter, can so easily facilitate polishing
The flowing and discharge of liquid, aqueous etc..In the present embodiment, this means that polishing disk erecting bed 5,6 and of rubbing head pedestal erecting bed
The distance between polishing pad obturator erecting bed 7 and intersecting lens, are all larger than the distance between drainage hole 4 and intersecting lens.
In the present embodiment, collecting pit 1 may be configured as symmetrical structure, and it includes a planes of symmetry.Wherein, the first draining water conservancy diversion
Face 2 and the second draining guide face 3 are symmetrical arranged about the plane of symmetry, correspondingly, intersecting lens is located on the plane of symmetry；Meanwhile mounting portion
Also it is symmetrical arranged about the plane of symmetry, specifically, polishing disk erecting bed 5 is even number and is symmetrical arranged about the plane of symmetry, rubbing head
Pedestal erecting bed 6 is even number and is symmetrical arranged about the plane of symmetry that polishing pad obturator erecting bed 7 is for even number and about symmetrical
Face is symmetrical arranged.
The water consumption of difference polishing unit is different, and the bigger polishing unit of water consumption should be remoter apart from drainage hole 4, such water
Amount will not excessively be deposited in the efficiency for around drainage hole 4 and influencing draining.For this purpose, in the present embodiment, draining water conservancy diversion first
On face 2, polishing disk erecting bed 5 compared to rubbing head pedestal erecting bed 6 and polishing pad obturator erecting bed 7 apart from drainage hole 4 most
Far, correspondingly, being also such in the second draining guide face 3.
In the present embodiment, collecting pit 1 in addition to include pool wall other than can also include the first deflector and the second deflector,
Wherein, the upper surface of the first deflector is the first draining guide face 2, and the upper surface of the second deflector is the second draining water conservancy diversion
Face 3.
For convenience of installing to each polishing unit, pool wall may include the preceding water fender 8 of integral molding, arc-shaped water blocking
Plate 9, side water fender 10 and rear water plate 11.
Symmetrical structure is set as by collecting pit 1 in this present embodiment, so pool wall is also symmetrical structure.In the present embodiment
In, preceding water fender 8 can intersect with rear water plate 11 with the plane of symmetry, and arc-shaped water fender 9 has even number and is symmetrically disposed on pair
The two sides in title face, side water fender 10 have even number and are symmetrically disposed on the two sides of the plane of symmetry.
Specifically, the quantity of preceding water fender 8 and rear water plate 11 can respectively be set as one, arc-shaped water fender 9 and side block
The quantity of water plate 10 can respectively be set as two.Using the plane of symmetry as reference, the both ends of preceding water fender 8 drain guide face with first respectively
The arc-shaped water fender 9 of 2 sides is connected with the arc-shaped water fender 9 of the second draining 3 side of guide face, the both ends of rear water plate 11
It is connected respectively with the side water fender 10 of the side water fender 10 of the first draining 2 side of guide face and the second draining 3 side of guide face.
Wherein, arc-shaped water fender 9 and side water fender 10 correspond, using the plane of symmetry as reference, ipsilateral arc-shaped gear
Water plate 9 is connected with side water fender 10.Wherein, arc-shaped water fender 9 can be corresponded with polishing disk erecting bed 5, corresponding circle
Arc-shaped watertight shutter 9 is conllinear with the axial line of polishing disk erecting bed 5.
In the present embodiment, the first deflector, the second deflector, preceding water fender 8, arc-shaped water fender 9, side water fender 10
Casting technique integral molding can be used with rear water plate 11.Collecting pit 1 uses integral molding, and structure can be more firm
Lean on, as long as grinding tool is qualified, the first deflector, the second deflector, preceding water fender 8, arc-shaped water fender 9, side water fender 10 and after
Junction between water fender 11 would not generate gap, so as to effectively junction be avoided the case where leak occur.
As shown in figure 4, to be supported to collecting pit 1, collecting pit 1 be can be positioned below for supporting
Support portion 12.
As shown in figure 5, in the present embodiment, support portion 12 may include the intermediate supports before being set to immediately below water fender 8
Plate 13, wherein 13 integral molding of preceding water fender 8 and intermediate support plate.Specifically, support portion 12, which may also include, is set to circular arc
Cylindrical support column 14 immediately below shape water fender 9, wherein arc-shaped water fender 9 and 14 integral molding of cylindrical support column.
Specifically, support portion 12 may also include the side support plate 15 being set to immediately below side water fender 10, wherein side water fender 10 and side
15 integral molding of support plate.Specifically, support portion 12 may also include the rear bearing sheet 16 being set to immediately below rear water plate 11,
Wherein, rear water plate 11 and 16 integral molding of rear bearing sheet.
In the present embodiment, casting technique integral molding can also be used in collecting pit 1 and support portion 12.
For the weight for reducing polishing pedestal, the inside of cylindrical support column 14 may be configured as hollow structure, meanwhile, centre branch
It may be provided with notch or/and hole on fagging 13, cylindrical support column 14, side support plate 15 and rear bearing sheet 16.
It wherein, is the intensity for improving support portion 12, it is settable between adjacent cylindrical support column 14 and side support plate 15
There is stiffener plate 17.
The bottom of support portion 12 may be provided with bottom plate 18, can provide the stability of polishing pedestal by bottom plate 18.Correspondingly,
To reduce weight, it may also set up the structures such as hole on pedestal.
In the present embodiment, it is also proposed that a kind of polissoir, polishing setting includes above to polish pedestal.
It will be appreciated by those skilled in the art that the accompanying drawings are only schematic diagrams of a preferred implementation scenario, module in attached drawing or
Process is not necessarily implemented necessary to the present invention.
It will be appreciated by those skilled in the art that the module in device in implement scene can be described according to implement scene into
Row is distributed in the device of implement scene, can also be carried out corresponding change and is located at the one or more dresses for being different from this implement scene
In setting.The module of above-mentioned implement scene can be merged into a module, can also be further split into multiple submodule.
Above-described embodiment serial number is for illustration only, does not represent the superiority and inferiority of implement scene.
Disclosed above is only several specific implementation scenes of the invention, and still, the present invention is not limited to this, Ren Heben
What the technical staff in field can think variation should all fall into protection scope of the present invention.
Claims (10)
1. a kind of polishing pedestal, which is characterized in that the collecting pit including being provided with pool wall, the bottom of the pool wall are provided with first
Drain guide face and the second draining guide face, wherein the pool wall, the first draining guide face and the second draining water conservancy diversion
Face integral molding；
The first draining guide face and the second draining guide face are burnishing surface and angle between the two less than 180 °；
Drainage hole is provided on the first draining guide face and the second draining guide face and for installing polishing unit
Mounting portion；
Wherein, on the first draining guide face, the position where the mounting portion is higher than the drainage hole；Described second
It drains on guide face, the position where the mounting portion is higher than the drainage hole.
2. polishing pedestal according to claim 1, which is characterized in that the first draining guide face and second draining
Both guide faces intersect at an intersecting lens；
Wherein, compared to the mounting portion, the distance between the drainage hole and the intersecting lens are shorter.
3. polishing pedestal according to claim 1, which is characterized in that the collecting pit is symmetrical structure, and it includes a pair
Title face；
Wherein, the first draining guide face and the second draining guide face are symmetrical arranged about the plane of symmetry, the peace
Dress portion is also symmetrical arranged about the plane of symmetry.
4. polishing pedestal according to claim 3, which is characterized in that the pool wall includes the preceding water blocking of integral molding
Plate, arc-shaped water fender, side water fender and rear water plate；
Wherein, the preceding water fender intersects with the plane of symmetry with the rear water plate, and the arc-shaped water fender has even number
Two sides that are a and being symmetrically disposed on the plane of symmetry, the side water fender have even number and are symmetrically disposed on the two of the plane of symmetry
Side.
5. polishing pedestal according to claim 4, which is characterized in that be provided with below the collecting pit for its into
The support portion of row support.
6. polishing pedestal according to claim 5, which is characterized in that the support portion includes being set to the preceding water fender
The intermediate support plate of underface, wherein the preceding water fender and the intermediate support plate integral molding.
7. polishing pedestal according to claim 5, which is characterized in that the support portion includes being set to the arc-shaped gear
Cylindrical support column immediately below water plate, wherein the arc-shaped water fender and the cylindrical support column integral molding.
8. polishing pedestal according to claim 5, which is characterized in that the support portion includes being set to the side water fender
The side support plate of underface, wherein the side water fender and the side support plate integral molding.
9. polishing pedestal according to claim 5, which is characterized in that the support portion includes being set to the rear water plate
The rear bearing sheet of underface, wherein the rear water plate and the rear bearing sheet integral molding.
10. a kind of polissoir, which is characterized in that including polishing pedestal of any of claims 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811505573.4A CN109465738A (en) | 2018-12-10 | 2018-12-10 | A kind of polishing pedestal and polissoir |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811505573.4A CN109465738A (en) | 2018-12-10 | 2018-12-10 | A kind of polishing pedestal and polissoir |
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| Publication Number | Publication Date |
|---|---|
| CN109465738A true CN109465738A (en) | 2019-03-15 |
Family
ID=65676020
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|---|---|---|---|
| CN201811505573.4A Pending CN109465738A (en) | 2018-12-10 | 2018-12-10 | A kind of polishing pedestal and polissoir |
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| CN108247541A (en) * | 2017-03-23 | 2018-07-06 | 钜升精机股份有限公司 | Cooling liquid guide seat for grinding machine |
| CN207043946U (en) * | 2017-07-20 | 2018-02-27 | 深圳市普盛旺科技有限公司 | Ceramic polishing machine |
| CN107378651A (en) * | 2017-08-04 | 2017-11-24 | 北京交通大学 | A kind of magnetorheological plane polishing device |
| CN207757567U (en) * | 2018-01-03 | 2018-08-24 | 北京京东方显示技术有限公司 | Workbench |
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Application publication date: 20190315 |