CN109461642A - A kind of ion initiation electron impact ionization source - Google Patents
A kind of ion initiation electron impact ionization source Download PDFInfo
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- CN109461642A CN109461642A CN201811491709.0A CN201811491709A CN109461642A CN 109461642 A CN109461642 A CN 109461642A CN 201811491709 A CN201811491709 A CN 201811491709A CN 109461642 A CN109461642 A CN 109461642A
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- electronics
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- electron impact
- impact ionization
- photo
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- 230000000977 initiatory effect Effects 0.000 title description 4
- 230000003321 amplification Effects 0.000 claims abstract description 18
- 238000003199 nucleic acid amplification method Methods 0.000 claims abstract description 18
- 230000001133 acceleration Effects 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 7
- 230000005684 electric field Effects 0.000 claims abstract description 6
- 230000000740 bleeding effect Effects 0.000 claims description 5
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 36
- 238000010849 ion bombardment Methods 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000009835 boiling Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 150000001555 benzenes Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 230000005596 ionic collisions Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/08—Electron sources, e.g. for generating photo-electrons, secondary electrons or Auger electrons
Abstract
A kind of ion causes electron impact ionization source, it is characterised in that: including metal cavity, sets vacuum ultraviolet light source in the cavity and within the cavity along beam projecting direction is followed successively by photo-ionisation area, electronics generates area, electron impact ionization area；Vacuum ultraviolet light source is for generating vacuum ultraviolet photon, in carrying out photo-ionisation to the calibrating gas molecule of introducing in photo-ionisation area to generate primary ion；Primary ion generates area after electric field acceleration, into electronics, and the surface of bombardment electronics amplification microchannel plate generates a large amount of electronics；Electronics is after electric field acceleration, into electron impact ionization area, carries out electron impact ionization to the gas molecule of introducing, generates ion；Ion enters mass spectrographic mass analyzer through ion transmission range.The beneficial effects of the invention are as follows the electronics enlarge-effects that electronics amplification microchannel plate is utilized, and the electron number in electron impact ionization source are greatly improved, to improve the ionizing efficiency of ionization source.
Description
Technical field
The invention belongs to mass spectral analysis field, in particular to a kind of ion causes electron impact ionization source.This method utilizes
Vacuum ultraviolet photon carries out photo-ionisation to calibrating gas, generates primary ion；Microchannel plate is amplified by ion bombardment electronics, is generated
Electronics；After electronics is accelerated, for carrying out electron impact ionization to sample gas molecule.
Background technique
Electron impact ionization source is the ionization mode for gas molecule being most widely used at present.Its working principle
Be: under certain vacuum condition, when electric current passes through filament, the temperature of filament is up to 2000 DEG C, in filament free electron without
Regular motion aggravation can generate thermionic emission, the electronics of transmitting is ionizing when electronic kinetic energy is greater than metal surface work function
Accelerate to obtain energy under voltage, collision gas ionizes gas molecule.The advantages of ionization source, is that structure is simple, operation side
Just.The ionizing efficiency in electron impact ionization source and the electron amount of transmitting are directly related, and electron amount mainly has current strength
It determines.Too low current strength will have a direct impact on the ionizing efficiency of ionization source, and excessively high current strength then influences ionization source
Service life.
Summary of the invention
The purpose of the present invention is developing a kind of ion initiation electron impact ionization source, using vacuum ultraviolet photon to Standard Gases
Body carries out photo-ionisation, generates primary ion；Microchannel plate is amplified by ion bombardment electronics, generates electronics；After electronics is accelerated, use
In to sample gas molecule progress electron impact ionization.This process employs electronics amplification microchannel plate electronics enlarge-effect,
It is greatly improved the electron number in electron impact ionization source, to improve ionizing efficiency.
The purpose of the present invention is achieved through the following technical solutions:
A kind of ion initiation electron impact ionization source, including metal cavity, sets vacuum ultraviolet light source in the cavity and is located at
Along beam projecting direction is followed successively by photo-ionisation area, electronics generates area, electron impact ionization area in cavity；
The junction that photo-ionisation area, electronics generate between area, electron impact ionization area is respectively equipped with air pressure difference mouth, photo-ionisation
Area, electronics generate area and are respectively equipped with bleeding point, are connected with vacuum pump；
It is generated in electronics and is provided with electronics amplification microchannel plate combination in area, quantity is 2-4 piece；Electronics amplifies between microchannel plate
Equipped with DC voltage, to form electric-force gradient；
It is equipped with calibrating gas sample introduction pipeline in photo-ionisation area, is equipped with sample feeding pipeline in electron impact ionization area；
Vacuum ultraviolet light source generates vacuum ultraviolet photon, in photo-ionisation area to the calibrating gas molecule of introducing carry out photo-ionisation with
Primary ion is generated, primary ion generates area after electric field acceleration, into electronics, and bombardment electronics amplifies the surface of microchannel plate,
A large amount of electronics are generated, electronics is after electric field acceleration, into electron impact ionization area, carries out electronics to the gaseous sample molecule of introducing
Bombardment ionization, generates ion.
The vacuum ultraviolet light source is that vacuum UV lamp or ultraviolet laser light source, photon energy should be higher than that calibrating gas
Ionization energy can carry out photo-ionisation to calibrating gas molecule.
Repeller electrode in photo-ionisation area, which is equipped with, can make ion acceleration enter the repulsion electrode that electronics generates area.Electronics amplification is micro-
It is equipped with DC voltage 500-800V between channel plate, forms 2.5 × 105-4×105The electric-force gradient of V/m.
Invention mechanism of the invention or the course of work are: the photon beam of vacuum ultraviolet light source is emitted directly toward photo-ionisation area, light
Ionized region side is provided with calibrating gas sample introduction pipeline, can be quartz capillary or metal capillary；Calibrating gas is through sample feeding pipe
Road enters photo-ionisation area, and reaches the beam area of vacuum-ultraviolet light, carries out light to calibrating gas molecule by vacuum ultraviolet photon
Ionization generates primary ion.The molecular ionization of calibrating gas can should be lower than the photon energy of vacuum-ultraviolet light, low-boiling benzene series
Object sensitivity with higher usually under photo-ionisation mode can be used as photon and cause the preferred standard in electron impact ionization source
Gas.The repeller electrode of ionized region is equipped with repulsion voltage, effect of the primary ion after calibrating gas can be made to ionize in accelerating field
Under, it accelerates into electronics and generates area.
Electronics, which generates, is provided with electronics amplification microchannel plate combination in area, quantity is 2-4 piece；Electronics amplify microchannel plate it
Between be equipped with DC voltage, to form electric-force gradient.Electronics amplification microchannel plate has the function of electronics gain amplifier, when there is ion
When bombarding the surface of first order electronics amplification microchannel plate, ion, with its impact several times, sputters a large amount of electronics in microchannel；
Then, electronics moves to the second level electronics amplification microchannel plate under the action of accelerating field, and electron amount is further magnified；
Amplify by multistage electronics, ultimately forms a large amount of electronics.Electronics accelerates to transport to electron ionization area under accelerating field effect
It is dynamic.
Electron ionization area side is provided with gas sample introduction pipeline, for introducing gaseous sample to be measured；Gaseous sample
Into in electron impact ionization area, the electronics of gas molecule and accelerated motion collides, and makes gas molecule that electron bombardment occur
Ionization.
Beneficial effects of the present invention are as follows: the present invention carries out photo-ionisation to calibrating gas using vacuum ultraviolet photon, generates
Primary ion；Microchannel plate is amplified by ion bombardment electronics, generates electronics；The use of electronics amplification microchannel plate considerably increases
Using the quantity of electronics, it is conducive to provide the ionizing efficiency of ionization source.Compared to " it is a kind of can photovoltaic mode switching vacuum it is purple
What outer characteristic of a navigation light spectrum ionization source " (Patent No. 201721124168.9) was introduced is generated using ultraviolet light direct irradiation microchannel plate
The mode of electronics, the present invention, due to the increase in ion collision section, are greatly improved by the way of ion bombardment microchannel plate
The generation efficiency of microchannel plate electronics, to make this ionization source ionizing efficiency with higher.
Detailed description of the invention
The schematic diagram of Fig. 1 ionization source of the present invention.
1. metal cavity, 2. vacuum ultraviolet light sources, 3. photo-ionisation areas, 4. electronics generate area, the amplification of 5. electronics is micro- logical
Guidance tape, 6. electron impact ionization areas, 7. calibrating gas sample introduction pipelines, 8. gas sample introduction pipelines, 9. repeller electrodes, 10. air pressures
Difference mouth, 11. bleeding points.
Specific embodiment
The present invention is described further below in conjunction with figure embodiment:
A kind of ion causes electron impact ionization source as shown in Figure 1:, including metal cavity 1, sets vacuum-ultraviolet light in the cavity
Source 2 and it is within the cavity along beam projecting direction be followed successively by photo-ionisation area 4, electronics generate area 4, electron impact ionization area 6；
Photo-ionisation area 3 and electronics generate between 4 between area, the connection that electronics generates between area 4 and electron impact ionization area 6 is punished
Not She You air pressure difference mouth 10, photo-ionisation area 3, electronics generate area 4 be respectively equipped with bleeding point 11, be connected with vacuum pump；
It is generated in electronics and is provided with electronics amplification microchannel plate 5 in area 4, quantity is 3；It is set between each electronics amplification microchannel plate
There is DC voltage 500V, forms 2.5 × 105The electric-force gradient of V/m.
It is equipped with calibrating gas sample introduction pipeline 7 in photo-ionisation area 4, is equipped with gas sample introduction in electron impact ionization area 6
Pipeline 8；
The present invention is more specifically, the internal vacuum UV lamp filled with Krypton may be selected in vacuum ultraviolet light source 2, when it is swashed by high pressure
When hair, vacuum ultraviolet photon can be projected by optical window, form photon beam.Krypton vacuum UV lamp transmitting photon energy be
10.6eV is conducive to calibrating gas molecular ionization forming primary ion higher than the ionization energy of most of volatile organic matters.
The photon beam of vacuum ultraviolet light source 2 is emitted directly toward photo-ionisation area 3,3 side of photo-ionisation area be provided with calibrating gas into
Sample pipeline 7 can be quartz capillary；Calibrating gas enters photo-ionisation area 3 through sample introduction pipeline, and reaches the light beam of vacuum-ultraviolet light
Region carries out photo-ionisation to calibrating gas molecule by vacuum ultraviolet photon, generates primary ion.The molecular ionization energy of calibrating gas
Should be lower than vacuum-ultraviolet light photon energy, the sensitivity with higher usually under photo-ionisation mode of low-boiling benzene homologues,
It can be used as photon and cause the preferred calibrating gas in electron impact ionization source.The repeller electrode 9 in photo-ionisation area 3 is equipped with repulsion voltage,
Primary ion after calibrating gas can be made to ionize accelerates into electronics and generates area 4 under the action of accelerating field.
Electronics generates the combination that electronics amplification microchannel plate 5 is provided in area 4, and quantity is 3；Electronics amplifies microchannel plate
DC voltage is equipped between 5, to form electric-force gradient.Electronics amplification microchannel plate 5 has the function of electronics gain amplifier, when having
When ion bombardment first order electronics amplifies the surface of microchannel plate 5, ion, with its impact several times, sputters a large amount of in microchannel
Electronics；Then, electronics moves to second level electronics amplification microchannel plate 5 under the action of accelerating field, and electron amount is by into one
Step amplification；Amplify by multistage electronics, ultimately forms a large amount of electronics.Electronics accelerates under accelerating field effect to electronics
Ionized region 6 is bombarded to move.
6 side of electron impact ionization area is provided with gas sample introduction pipeline 8, for introducing gaseous sample to be measured；Gas
Body sample enters in electron impact ionization area 6, and the electronics of gas molecule and accelerated motion collides, and makes gas molecule that electricity occur
Son bombardment ionization.
In the ionization source, the junction that photo-ionisation area 3, electronics generate between area 4, electron impact ionization area 6 is respectively equipped with
Air pressure difference mouth 10, photo-ionisation area 3, electronics generate area 4 and are respectively equipped with bleeding point 11, be connected with vacuum pump, to adjust difference
The vacuum degree in region.
Claims (4)
1. a kind of ion causes electron impact ionization source, it is characterised in that: including metal cavity, set vacuum ultraviolet in the cavity
Light source and it is within the cavity along beam projecting direction be followed successively by photo-ionisation area, electronics generate area, electron impact ionization area；
The junction that photo-ionisation area, electronics generate between area, electron impact ionization area is respectively equipped with air pressure difference mouth, photo-ionisation
Area, electronics generate area and are respectively equipped with bleeding point, are connected with vacuum pump；
It is generated in electronics and is provided with electronics amplification microchannel plate combination in area, quantity is 2-4 piece；Electronics amplifies between microchannel plate
Equipped with DC voltage, to form electric-force gradient；
It is equipped with calibrating gas sample introduction pipeline in photo-ionisation area, is equipped with sample feeding pipeline in electron impact ionization area；
Vacuum ultraviolet light source generates vacuum ultraviolet photon, in photo-ionisation area to the calibrating gas molecule of introducing carry out photo-ionisation with
Primary ion is generated, primary ion generates area after electric field acceleration, into electronics, and bombardment electronics amplifies the surface of microchannel plate,
A large amount of electronics are generated, electronics is after electric field acceleration, into electron impact ionization area, carries out electronics to the gaseous sample molecule of introducing
Bombardment ionization, generates ion.
2. ion according to claim 1 causes electron impact ionization source, it is characterised in that: the vacuum ultraviolet light source is
Vacuum UV lamp or ultraviolet laser light source, photon energy should be higher than that the ionization energy of calibrating gas, can to calibrating gas molecule into
Row photo-ionisation.
3. ion according to claim 1 causes electron impact ionization source, it is characterised in that: the repeller electrode in photo-ionisation area
Equipped with the repulsion electrode that ion acceleration can be made to enter electronics generation area.
4. ion according to claim 1 causes electron impact ionization source, it is characterised in that: electronics amplify microchannel plate it
Between be equipped with DC voltage 500-800V, formed 2.5 × 105-4×105The electric-force gradient of V/m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811491709.0A CN109461642B (en) | 2018-12-07 | 2018-12-07 | Ion-initiated electron bombardment ionization source |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811491709.0A CN109461642B (en) | 2018-12-07 | 2018-12-07 | Ion-initiated electron bombardment ionization source |
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| Publication Number | Publication Date |
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| CN109461642A true CN109461642A (en) | 2019-03-12 |
| CN109461642B CN109461642B (en) | 2024-04-02 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112151352B (en) * | 2020-09-24 | 2024-01-26 | 中国科学院合肥物质科学研究院 | Mass spectrum sample injection ionization device and working method thereof |
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