CN109161868A - A kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof - Google Patents

A kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof Download PDF

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Publication number
CN109161868A
CN109161868A CN201811331570.3A CN201811331570A CN109161868A CN 109161868 A CN109161868 A CN 109161868A CN 201811331570 A CN201811331570 A CN 201811331570A CN 109161868 A CN109161868 A CN 109161868A
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CN
China
Prior art keywords
layer deposition
cutter
atomic layer
soft coating
tungsten disulfide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811331570.3A
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Chinese (zh)
Inventor
吴泽
刘磊
邢佑强
黄鹏
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Southeast University
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Southeast University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Southeast University filed Critical Southeast University
Priority to CN201811331570.3A priority Critical patent/CN109161868A/en
Publication of CN109161868A publication Critical patent/CN109161868A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0227Pretreatment of the material to be coated by cleaning or etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/305Sulfides, selenides, or tellurides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

The invention belongs to metal-cutting machine tool manufacturing technology field, it is related to a kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof.The soft coating cutter structure includes matrix and surface tungsten disulfide soft coating, basis material is sintered carbide tool material, surface tungsten disulfide soft coating is obtained by the method for atomic layer deposition, for coating material with basis material there are in conjunction with the weak chemical bond of part, the bond strength of coating and basis material is higher.The atomic layer deposition tungsten disulfide soft coating cutter is that the techniques such as cobalt, tungsten source and sulphur source atomic layer deposition is gone to be prepared by substrate material surface sour.The cutter can be widely applied to the Dry-cutting of difficult processing metal, and atomic layer deposition can overcome the drawback of traditional soft coating Yu substrate combinating strength weakness, significantly improve the lubrication service life of cutter.

Description

A kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof
Technical field
The present invention relates to a kind of atomic layer deposition tungsten disulfide soft coating cutters and preparation method thereof, belong to metal cutter Has manufacturing technology field.
Background technique
Cutter rake face, flank constantly contact with chip and workpiece and occur strong friction when machining, cause Tool wear.Currently, the main method for reducing fretting wear when Tool in Cutting processing both at home and abroad is using cutting fluid.However, With the increase of cutting fluid dosage, negative effect is also increasing, and the use of cutting fluid increases the manufacturing cost of product, dirty Environment is contaminated, workers ' health is damaged.The method for solving the problems, such as this is using dry machining technology technology, and dry machining technology is not letter The use of single stopping cutting fluid, to cutter itself and Cutting Process, more stringent requirements are proposed simultaneously.It is dry in order to meet The requirement of the comprehensive cutting ability of machining, metal-cutting machine tool industry are continuously attempting to exploitation novel wear resistant cutter material, knife Have coating, auxiliary micro lubricating technique and the optimization design for carrying out cutter geometry, these methods are to a certain extent Solve requirement of the dry machining technology technology to cutter.In these methods, wherein the applicability with coating is wide, but coating Combination problem between basis material becomes the big factor that its performance plays that restricts.For this purpose, seeking a kind of raising coating With the new coating technique of substrate combinating strength, novel high associativity coated cutting tool is developed, to promotion coated cutting tool application range Expansion and the progress of dry machining technology technology be of great significance.
Chinese patent " patent No.: ZL200610068975 " reports the compound soft coating cutter of self-lubricating and its preparation side Method, the cutter are using intermediate frequency magnetic control+multi sphere method film plating process preparation MoS2/ Zr/Ti composite coating layer cutter, the Tool in Cutting When can surface formed have lubricating action continuous solid-state lubricant layer, to realize the self-lubricating function of cutter.Chinese patent " application number: 201711013252 " reporting a kind of preparation process of WS soft coating cutter based on electric jet stream, which utilizes Electric jetting method is by WS2Soft coating is deposited on tool matrix surface, prepared WS2Soft coating cutter can be applied to dry cutting and The machining of difficult-to-machine material.
Summary of the invention
Goal of the invention: it is an object of the invention to overcome the deficiencies in the prior art, improve the coating material of soft coating cutter Bond strength between basis material provides a kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof.
Technical solution: a kind of structure of atomic layer deposition tungsten disulfide soft coating cutter of the invention includes matrix and surface Tungsten disulfide soft coating, basis material are sintered carbide tool material, and surface tungsten disulfide soft coating is to pass through atomic layer deposition Method obtain, coating material and basis material there are in conjunction with the weak chemical bond of part, the bond strength of coating and basis material compared with It is high.
A kind of atomic layer deposition tungsten disulfide soft coating cutter of the invention the preparation method is as follows: hard alloy cutter base Body material puts into the acid solution that can dissolve cobalt element, and material matrix surface sour is removed cobalt;By sour treated blade material into The ultrasonic wave added cleaning that row organic solution is impregnated, and carry out vacuum drying treatment;Using the method for atomic layer deposition, pass through tungsten source With sulphur source from limitation chemical reaction in sour and the tool matrix surface layer-by-layer of cleaning treatment deposition tungsten disulfide film.
The utility model has the advantages that the present invention deposits soft coating material on cutter material surface by the method for atomic layer deposition, it can be real Self-lubricating effect of cash category Dry-cutting.Relative to existing uncoated universal cutter, the soft coating ingredient of the cutter With excellent greasy property, when cutting, can effectively slow down tool wear and improve workpiece processing quality.Relative to existing soft painting Layer cutter, the sour in cutter preparation process go cobalt processing that can enhance coating in conjunction with the agreeing with property of basis material and store and Soft coating lubriation material is carried, atomic layer deposition can promote to generate weak chemical bond knot in part between basis material and coating material It closes, enhances the bond strength of soft coating and basis material.A kind of atomic layer deposition tungsten disulfide soft coating cutter tool of the invention Standby excellent self-lubricating property and lasting cutting wear-resistant service life, the cutting that can be widely applied to obdurability difficult-to-machine material add Work.
Specific embodiment
Below by specific embodiment, the invention will be further described, and it is not limit that following embodiment, which is descriptive, Qualitatively, this does not limit the scope of protection of the present invention.
Embodiment 1:
A kind of atomic layer deposition tungsten disulfide soft coating cutter, cutter structure include matrix and the soft painting of surface tungsten disulfide Layer, tool matrix material are YG6 hard alloy, and there are part weak chemical bonds with YG6 basis material for surface tungsten disulfide soft coating In conjunction with.
The atomic layer deposition tungsten disulfide soft coating cutter the preparation method is as follows:
(1) it in the trifluoromethanesulfonic acid solution for being 30% by YG6 hard alloy cutter basis material investment concentration, stops and places 1 minute, the Binder Phase cobalt of corrosion dissolution substrate material surface.
(2) by trifluoromethanesulfonic acid solution, treated that blade material is placed on impregnates in dehydrated alcohol and ultrasonic wave added cleans Then the blade cleaned placement is dried by 15min in a vacuum drying oven.
(3) WF is selected6As tungsten source, C2H6S2As sulphur source, by atomic layer deposition from limitation chemical reaction clear It washes, dried YG6 carbide tool surface layer by layer deposition WS2Film, 450 DEG C of deposit manufacture temperature, number of deposition cycles 10000 times, substantially 2 μm of coating layer thickness of tungsten disulfide soft coating cutter can be formed.
Embodiment 2:
A kind of atomic layer deposition tungsten disulfide soft coating cutter, cutter structure include matrix and the soft painting of surface tungsten disulfide Layer, tool matrix material are YT15 hard alloy, and surface tungsten disulfide soft coating and YT15 basis material have part reduction and learn Bond is closed.
The atomic layer deposition tungsten disulfide soft coating cutter the preparation method is as follows:
(1) it in the sulfuric acid solution for being 25% by YT15 hard alloy cutter basis material investment concentration, stops and places 2 points Clock, the Binder Phase cobalt of corrosion dissolution substrate material surface.
(2) blade material after sulfuric acid solution is placed and impregnates simultaneously ultrasonic wave added cleaning 20min in acetone, then The blade cleaned placement is dried in a vacuum drying oven.
(3) W (CO) is selected6As tungsten source, H2S is as sulphur source, by atomic layer deposition from limitation chemical reaction clear It washes, dried YT15 carbide tool surface layer by layer deposition WS2Film, 420 DEG C of deposit manufacture temperature, number of deposition cycles 12000 times, substantially 3 μm of coating layer thickness of tungsten disulfide soft coating cutter can be formed.

Claims (2)

1. a kind of atomic layer deposition tungsten disulfide soft coating cutter, it is characterised in that: cutter structure includes two sulphur of matrix and surface Change tungsten soft coating, basis material is sintered carbide tool material, and surface tungsten disulfide soft coating is the side by atomic layer deposition Method obtains, and for coating material with basis material there are in conjunction with the weak chemical bond of part, the bond strength of coating and basis material is higher.
2. a kind of atomic layer deposition tungsten disulfide soft coating cutter according to claim 1, it is characterized in that by the following method Preparation:
(1) hard alloy cutter basis material puts into the acid solution that can dissolve cobalt element, and material matrix surface sour is removed cobalt.
(2) ultrasonic wave added that sour treated blade material carries out organic solution immersion is cleaned, and carried out at vacuum drying Reason.
(3) method for using atomic layer deposition, by tungsten source and sulphur source from limitation chemical reaction in sour and cleaning treatment Tool matrix surface layer-by-layer deposits tungsten disulfide film.
CN201811331570.3A 2018-11-09 2018-11-09 A kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof Pending CN109161868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811331570.3A CN109161868A (en) 2018-11-09 2018-11-09 A kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811331570.3A CN109161868A (en) 2018-11-09 2018-11-09 A kind of atomic layer deposition tungsten disulfide soft coating cutter and preparation method thereof

Publications (1)

Publication Number Publication Date
CN109161868A true CN109161868A (en) 2019-01-08

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110016653A (en) * 2019-04-11 2019-07-16 东南大学 A kind of soft or hard composite coating self-lubricating knife tool of atomic layer deposition and preparation method thereof
CN110607516A (en) * 2019-10-24 2019-12-24 云南师范大学 Preparation method of single-layer or double-layer tungsten disulfide film
CN111233513A (en) * 2020-02-12 2020-06-05 南京医科大学 Method for modifying bonding surface of zirconia ceramic restoration
CN114958036A (en) * 2022-06-30 2022-08-30 厦门韫茂科技有限公司 Pearlescent pigment and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012121677A1 (en) * 2011-03-09 2012-09-13 Nanyang Technological University Method for depositing gradient films on a substrate surface by atomic layer deposition
CN103436883A (en) * 2013-08-07 2013-12-11 青岛科技大学 Self-lubricating coated cutting tool prepared based on electric spark deposition and preparation method thereof
CN104561937A (en) * 2015-01-05 2015-04-29 上海纳米技术及应用国家工程研究中心有限公司 Method for preparing WS2 film having solid lubrication function by means of atomic layer deposition
CN105937021A (en) * 2016-02-24 2016-09-14 苏州乐晶新材料科技有限公司 Preparation method for diamond composite coating of micro milling cutter
CN107761072A (en) * 2017-10-09 2018-03-06 江苏大学 A kind of matrix and preparation method of the enhancing of face coat bond strength

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012121677A1 (en) * 2011-03-09 2012-09-13 Nanyang Technological University Method for depositing gradient films on a substrate surface by atomic layer deposition
CN103436883A (en) * 2013-08-07 2013-12-11 青岛科技大学 Self-lubricating coated cutting tool prepared based on electric spark deposition and preparation method thereof
CN104561937A (en) * 2015-01-05 2015-04-29 上海纳米技术及应用国家工程研究中心有限公司 Method for preparing WS2 film having solid lubrication function by means of atomic layer deposition
CN105937021A (en) * 2016-02-24 2016-09-14 苏州乐晶新材料科技有限公司 Preparation method for diamond composite coating of micro milling cutter
CN107761072A (en) * 2017-10-09 2018-03-06 江苏大学 A kind of matrix and preparation method of the enhancing of face coat bond strength

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110016653A (en) * 2019-04-11 2019-07-16 东南大学 A kind of soft or hard composite coating self-lubricating knife tool of atomic layer deposition and preparation method thereof
CN110607516A (en) * 2019-10-24 2019-12-24 云南师范大学 Preparation method of single-layer or double-layer tungsten disulfide film
CN110607516B (en) * 2019-10-24 2021-06-29 云南师范大学 Preparation method of single-layer or double-layer tungsten disulfide film
CN111233513A (en) * 2020-02-12 2020-06-05 南京医科大学 Method for modifying bonding surface of zirconia ceramic restoration
CN114958036A (en) * 2022-06-30 2022-08-30 厦门韫茂科技有限公司 Pearlescent pigment and preparation method thereof
CN114958036B (en) * 2022-06-30 2023-12-01 丰田自动车株式会社 Pearlescent pigment and preparation method thereof

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Application publication date: 20190108