CN109143792A - A kind of Patterning method of open tubular column stereochemical structure - Google Patents
A kind of Patterning method of open tubular column stereochemical structure Download PDFInfo
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- CN109143792A CN109143792A CN201811019376.1A CN201811019376A CN109143792A CN 109143792 A CN109143792 A CN 109143792A CN 201811019376 A CN201811019376 A CN 201811019376A CN 109143792 A CN109143792 A CN 109143792A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of Patterning methods of hollow cylinder stereochemical structure, this method comprises: step 1, cylinder is immersed in photoresists, the surface of cylinder are made to form photosensitive layer；Step 2, according to the exposure size on the surface of cylinder and the structure of the cylinder intentionally got, Two-dimensional electron figure required for being drawn with mapping software calculates the surface segmentation of cylinder into several subregions and the exposure focus of determining each subregion, and forms figure to be processed；Step 3, using maskless photoetching technology, by graph exposure to be processed on the surface of cylinder；Step 4, figure addition or figure subtraction process are carried out to the surface of the cylinder after development；Step 5, the photoresists for removing the surface of cylinder obtain the surface that continuous fine pattern is formed in cylinder.Method provided by the invention can be produced stringent with one heart with the structural member of ripple or the duplicate any precision graphic of stringent figure stepping.
Description
Technical field
Technical field of lithography of the present invention, more particularly to a kind of Patterning method of open tubular column stereochemical structure.
Background technique
The continuous development of electronic technology has expedited the emergence of a series of electronic product of special constructions.The complicated essence of processing in the plane
Thin figure has had the complete technological process of production, but makes in stereochemical structure fine pattern there are still a series of problem,
Such as figure orientation problem, product structure processing consistency and repeated problem, product figure offset issue and product structure
Stability problem etc..
Thus, it is desirable to have a kind of technical solution come overcome or at least mitigate in the drawbacks described above of the prior art at least one
It is a.
Summary of the invention
The purpose of the present invention is to provide a kind of Patterning methods of open tubular column stereochemical structure to overcome or at least mitigate
At least one of drawbacks described above of the prior art.
To achieve the above object, the present invention provides a kind of Patterning method of open tubular column stereochemical structure, this method comprises:
Step 1, cylinder is immersed in photoresists, the surface of the cylinder is made to form photosensitive layer in homogeneous thickness；Step 2, according to
The exposure size on the surface of the cylinder and the structure of the cylinder intentionally got, Two-dimensional electron figure required for obtaining,
And the exposure focus by calculating the surface segmentation of the cylinder into several subregions and determining each subregion, and root
The electrical patterns are split to form subgraph according to the size and location of each subregion, finally fill the subgraph
The corresponding subregion to the corresponding cylinder, and form figure to be processed；Step 3, maskless lithography skill is utilized
Art is specifically included by the graph exposure to be processed on the surface of the cylinder: step 31, to the figure to be processed
Filling position and tilt angle be modified, make the position of the figure to be processed on the surface of the corresponding cylinder
Physical location is consistent, generates dynamic electron mask；Wherein, " filling position and tilt angle to the figure to be processed carry out
Amendment " specifically includes: carrying out initial alignment to position to be exposed in the damaged surface, image controller captures the cylinder
Shape, and the cylinder is subjected to figure positioning, exposure machine positions the position coordinates of automatic modification graph exposure according to figure
Starting point and angle；Step 32, according to the exposure focus of each subregion, the step 31 is pressed using maskless photoetching technology
The dynamic electron mask of middle generation, by the graph exposure to be processed on the surface of the cylinder, in which: in photoetching
Cheng Zhong, the cylinder are rotated along axial direction by the uniform velocity or in a manner of speed change, and the speed of cylinder rotation and the figure to be processed
The beam spot scans speed of the luminous point for the exposure figure that shape provides when exposing is consistent, and is realized between adjacent twice sweep luminous point
The seamless connection of figure, the exposure figure of each subregion is in described in exposure process on the surface of the cylinder
Within the focal depth range of exposure focus, consistency and continuous effective and the figure to guarantee the figure of multiple exposure are final
Total length with it is required consistent；Remove what the step 32 was formed on the surface of the cylinder using developing method with step 33
The part being exposed in exposure figure, and leave the part protected by photoresists；Step 4, to the cylinder after development
Surface carries out figure addition or figure subtraction process；Step 5, the photoresists for removing the surface of the cylinder obtain continuous
Fine pattern is formed in the surface of the cylinder.
Further, " figure addition " use " galvanoplastic " in the step 4, specifically includes following process: firstly,
One end of the fixed cylinder, and the end is electrically connected with positive pole；Then, the other end inner core of the cylinder is blocked；Most
Afterwards, the end cylinder blocked is immersed in electroplating liquid medicine, and the electroplating liquid medicine is electrically connected to the cathode of the power supply, is led to
In electric process, positively charged metal ion is toward being sunk in the metallic substrates on the surface of the cylinder in the electroplating liquid medicine
Product, the thickness for depositing the electrodeposition of metals of formation are less than or equal to photoresists film thickness.
Further, before the step 1, further includes: step 6, the cylinder is electroplated: firstly, the fixed cylinder
One end blocks the other end inner core of the cylinder；Then, the cylinder is immersed in electroplate liquid, using chemical method described
Layer of conductive material is adhered on the surface of cylinder.
Further, " figure subtraction " use " chemical method for etching " in the step 4, specifically includes following process:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；Then, the end cylinder blocked
It immerses in chemical liquid, the metal etch for the position that development is fallen is fallen, leave the metal below the part protected by photoresists.
Further, the step 33 specifically: the cylinder after exposure is immersed in mass percent concentration range
The sodium hydroxide medical fluid for being 20~30 DEG C for 0.5~1%, temperature range removes the step 32 by sodium hydroxide medical fluid and exists
The redundance in exposure figure formed on the surface of the cylinder.
Further, the step 1 specifically: firstly, one end of the fixed cylinder, blocks the other end of the cylinder
Inner core；
Then, the end cylinder blocked is immersed in photoresists, and the surface to the cylinder infiltrates in photoresists,
It is taken out after complete wetting, obtains the consistent photoresists of uniform film thickness, get rid of extra photoresists.
Method provided by the invention can be produced stringent with one heart with ripple or duplicate of stringent figure stepping
The structural member of meaning precision graphic.
Detailed description of the invention
Fig. 1 is the operation chart that cylinder provided by the present invention enters in liquid；
Fig. 2 is to invent motion state schematic diagram in provided cylinder exposure process.
Specific embodiment
In the accompanying drawings, same or similar element is indicated using same or similar label or there is same or like function
Element.The embodiment of the present invention is described in detail with reference to the accompanying drawing.
In the description of the present invention, term " center ", " longitudinal direction ", " transverse direction ", "front", "rear", "left", "right", "vertical",
The orientation or positional relationship of the instructions such as "horizontal", "top", "bottom" "inner", "outside" is that orientation based on the figure or position are closed
System, is merely for convenience of description of the present invention and simplification of the description, rather than the device or element of indication or suggestion meaning must have
Specific orientation is constructed and operated in a specific orientation, therefore should not be understood as limiting the scope of the invention.
The Patterning method of open tubular column stereochemical structure provided by the present embodiment includes:
Step 1, cylinder is immersed in photoresists, the surface of the cylinder is made to form photosensitive layer in homogeneous thickness.This
Field those of ordinary skill could be aware that: be base via the surface of the cylinder after step 1, the material of the base is
One layer of photosensitive layer is adhered in the outer surface of metal material, base.
Step 2, according to the exposure size on the surface of the cylinder and the structure of the cylinder intentionally got, needed for acquisition
The Two-dimensional electron figure wanted, and by calculating the surface segmentation of the cylinder into several subregions and determining each sub-district
The exposure focus in domain, and be split to form subgraph by the electrical patterns according to the size and location of each subregion,
Finally the subgraph is filled to the corresponding subregion on the corresponding cylinder, and forms figure to be processed.Wherein,
" according to the exposure size on the surface of the cylinder and the structure of the cylinder intentionally got, Two-dimensional electron required for obtaining
" acquisition " in figure " refers to 3-D graphic dismantling of the mapping software by cylinder at X-Y scheme, i.e. Two-dimensional electron figure, tool
Body be by cylinder from side split straight line along the direction of center axis thereof O, directly expansion can be realized the three of cylinder
Figure dismantling is tieed up into X-Y scheme.
Step 3, using maskless photoetching technology, by the graph exposure to be processed on the surface of the cylinder.This reality
It applies example and uses the mask plate for not needing figure egative film, but directly adopt digitized projection Imagewise exposure mode, it will be required
On cylinder, the digitized projection Imagewise exposure system and mode need to guarantee enough depths of focus and realize superelevation essence graph exposure
The figure of degree docks, so that the figure processed on cylinder is docking dislocation there is no linewidth difference exclusive or, reduces bad generation.
Step 4, figure addition or figure subtraction process are carried out to the surface of the cylinder after development.
Step 5, the photoresists for removing the surface of the cylinder obtain the table that continuous fine pattern is formed in the cylinder
Face.The method of " photoresists for removing the surface of the cylinder " specifically includes: firstly, by the cylinder obtained by step 4
One end is fixed, and the other end inner core of the cylinder is blocked；Then, the other end cylinder blocked immerses quality percentage
Specific concentration is the remaining sense in surface in 20% lye or hydroxy compounds corresponding with photoresists, to remove the cylinder
Optical cement.
It can be produced using method provided in this embodiment stringent with one heart with ripple or stringent figure stepping weight
The structural member of multiple any precision graphic.
In one embodiment, step 3 specifically includes:
Step 31, the filling position and tilt angle of the figure to be processed are modified, make the figure to be processed
Position it is consistent with the physical location on the surface of the corresponding cylinder, generate dynamic electron mask；Wherein, " to it is described to
The filling position and tilt angle of graphics processing are modified " specifically include: to position to be exposed in the damaged surface into
Row initial alignment, image controller captures the shape of the cylinder, and the cylinder is carried out figure positioning, and exposure machine is according to figure
The position coordinates starting point and angle of the automatic modification graph exposure of shape positioning.
Step 32, according to the exposure focus of each subregion, using maskless photoetching technology by the step 31
The dynamic electron mask generated, by the graph exposure to be processed on the surface of the cylinder, in which: in photoetching process
In, the cylinder along axial direction at the uniform velocity or in a manner of speed change to rotate (as shown in Figure 2), and the speed and described of cylinder rotation
The beam spot scans speed of the luminous point of the exposure figure provided when graph exposure to be processed is consistent, and concrete operations are by exposure diagram
The speed that the beam spot scans speed setting cylinder of shape luminous point rotates, such as: the beam spot scans speed of luminous point is 10mm/s, then cylinder
The movement velocity of periphery cambered surface be also 10mm/s, the two is consistent.Figure is realized between adjacent twice sweep luminous point
Seamless connection, should " seamless connection of figure " specifically refer to the patent application No. is 201310349453.0.The cylinder
Surface on the exposure figure of each subregion be in exposure process within the focal depth range of the exposure focus,
With guarantee multiple exposure figure consistency and the final total length of continuous effective and figure with it is required consistent.
Wherein, " consistency of the figure of multiple exposure " is mainly that the width needs of the figure of multiple exposure are consistent,
Such as: the figure exposed every time all includes the figure of the various sizes such as 2um/3um/5um, what " consistency " of the present embodiment referred to
It is that the line width of 2um will accomplish consistent 2um ± 10%, similarly, 3um line width is also all 3um ± 10%, and so on.
Wherein, " continuous effective for guaranteeing the figure of multiple exposure " can Optical System Design by exposure machine and debugging
It is fixed value in view of depth of focus after good, is designed depth of focus by depth of focus fixed value, decomposes exposure figure, to guarantee multiple exposure
Figure continuous effective." continuous effective " refers to the figure of a preceding beam spot scans and the figure of a rear beam spot scans
Shape will be able to maintain docking, and figure is continuous, when straight line or circular arc are across two scanning light spots, cannot disconnect.
Wherein, " guarantee the final total length of figure of exposure with required consistent " specific method is: in the shifting of exposure sources
Grating scale is set on dynamic platform, the read head on platform reads the calibration data of grating scale, i.e. mobile position (the mobile station phase of exposure sources
For the position of platform).According to feedback data real time calibration exposure position and exposure figure that grating scale is read, guarantee exposure
The final total length of figure with it is required consistent." real time calibration " generally refers to read head reading position, driving motor correction position,
For example the coordinate of the target position of exposure sources movement is (100,100), and the coordinate of the physical location of grating scale detection movement
It is (100,100.005) that real time calibration can be realized in the 0.005mm at this point, driving motor is gone back.Relative to reference value, scheming
The total length of shape is elongated or shortens, and is uniformly distributed compensation in data.That is, such as: the reference value of displacement of targets is
500, and displacement is 500.1 when actually debugging measurement, this time difference value 0.1mm needs compensate.It needs to run in view of every 5mm
100 times, for 0.1mm divided by 100 parts, every displacement 5mm then compensates 0.001mm, and real-time detection may be implemented in this way, and real-time compensation is protected
Demonstrate,prove the final total length of figure of exposure with it is required consistent.
Wherein, " axial direction " refers to the central axial direction of cylinder.
Step 33, it using developing method, removes in the exposure figure that the step 32 is formed on the surface of the cylinder
The part being exposed, and leave by photoresists protect part.That is, the damaged surface after step 33 has two
Part, a part be development fall photoresists substrate surface, the partial denudation be metal, another part do not develop fall be sense
Optical cement.Wherein, the method for " developing method " specifically includes: firstly, one end of the cylinder obtained by step 32 is fixed, institute
The other end inner core for stating cylinder is blocked；Then, it is 1% that the other end cylinder blocked, which immerses mass percent concentration,
Lye in, to remove the part being exposed in the exposure figure that the step 32 is formed on the surface of the cylinder.
In one embodiment, " figure addition " use " galvanoplastic " in step 4, specifically includes following process:
Firstly, one end of the fixed cylinder, and the end is electrically connected with positive pole；
Then, the other end inner core of the cylinder is blocked；
Finally, the end that the cylinder is blocked is immersed in electroplating liquid medicine, and the electroplating liquid medicine is electrically connected the electricity
The cathode in source, in galvanization, positively charged metal ion is toward the Metal Substrate on the surface of the cylinder in the electroplating liquid medicine
It is deposited on bottom, the thickness for depositing the electrodeposition of metals of formation is less than or equal to photoresists film thickness.Wherein, " electroplating liquid medicine "
Using specifically: copper chloride can be used in such as copper facing.Such as nickel plating, the soluble compound salt of nickel can be used.For example it plates
Ambrose alloy admixing medical solutions can be used in alloy.The intensity and characteristic for the cylinder that those skilled in the art can according to need are chosen
The ratio of metal component in " electroplating liquid medicine ".Acceptable electroplating velocity as needed, chooses quality of liquid medicine percent concentration,
The speed of the high electroplating deposition of mass percent concentration is fast.
In one embodiment, before step 1, further includes:
Step 6, the cylinder is electroplated:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；
Then, the cylinder is immersed in electroplate liquid, adheres to one layer of conduction on the surface of the cylinder using chemical method
Material.
By step 6, due to some cylinders, i.e. the material of base is electrically non-conductive material, even if alternatively, the material of base is
Metal material, but electric conductivity is bad.For these situations, need to enclose the base of one layer of metal on the surface of cylinder, such as
Copper, gold etc.." chemical method " can be surface chemical reaction metal displacement reaction redox reaction or electrification
Learn reaction.
In one embodiment, " figure subtraction " use " chemical method for etching " in step 4, specifically includes mistake as follows
Journey:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；
Then, the end cylinder blocked is immersed in chemical liquid, and the metal etch for the position that development is fallen is fallen,
The metal below the part protected by photoresists is left, which is the metal of cylinder material body.Wherein, " chemical liquid "
Use be specifically: such as etch copper can be used hydrochloric acid and add iron chloride.For example other metals are etched, hydrochloric acid can be used and add
Nitric acid.
In one embodiment, step 33 specifically: the cylinder after exposure is immersed in mass percent concentration model
The sodium hydroxide medical fluid for being 20~30 DEG C for 0.5~1%, temperature range is enclosed, the step 32 is removed by sodium hydroxide medical fluid
The redundance in exposure figure formed on the surface of the cylinder.
In one embodiment, step 1 specifically:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；
Then, the end cylinder blocked is immersed in photoresists, and the surface to the cylinder infiltrates in photoresists,
It is taken out after complete wetting, obtains the consistent photoresists of uniform film thickness, get rid of extra photoresists.Wherein, the range of " film thickness " can
Between 1~2um.
In one embodiment, " cylinder " is to stretch process units using hollow cylinder to make to obtain, specifically open circles
Column stretches process units and the material of stainless steel glass or other materials is drawn into cylindricality hollow pipe, such as cylindrical body
Shape can also be other shapes of cylinder, such as tetrahedron cylinder, six face shape cylinders, or even can also be antarafacial shape cylinder,
This is not listed one by one.
It should be noted that " figure addition " and " figure subtraction ", step 5, step 6 in step 1, step 33, step 4
It is required to immerse the one end of cylinder 1 blocked in corresponding liquid 2, and the part of the needs of cylinder 1 needs all leachings
Enter into liquid 2, the part of the clamped fixation of cylinder 1 finally by excision, concrete operations text above
There is detailed introduction, while can be in conjunction with reference to Fig. 1.
In addition the present invention is that the invention is described for making open tubular column stereochemical structure, and the structure of actual processing can be sky
Stem body, hollow polyhedral are also possible to non-hollow three-dimensional structure.
Finally it is noted that the above embodiments are merely illustrative of the technical solutions of the present invention, rather than its limitations.This
The those of ordinary skill in field is it is understood that be possible to modify the technical solutions described in the foregoing embodiments or right
Part of technical characteristic is equivalently replaced；These are modified or replaceed, and it does not separate the essence of the corresponding technical solution originally
Invent the spirit and scope of each embodiment technical solution.
Claims (6)
1. a kind of Patterning method of open tubular column stereochemical structure characterized by comprising
Step 1, cylinder is immersed in photoresists, the surface of the cylinder is made to form photosensitive layer in homogeneous thickness；
Step 2, according to the exposure size on the surface of the cylinder and the structure of the cylinder intentionally got, required for acquisition
Two-dimensional electron figure, and the surface segmentation of the cylinder at several subregions and is determined by each subregion by calculating
Exposure focus, and be split to form subgraph by the electrical patterns according to the size and location of each subregion, finally
The subgraph is filled to the corresponding subregion on the corresponding cylinder, and forms figure to be processed；
Step 3, specific to wrap by the graph exposure to be processed on the surface of the cylinder using maskless photoetching technology
It includes:
Step 31, the filling position and tilt angle of the figure to be processed are modified, make the position of the figure to be processed
Set, generation dynamic electron mask consistent with the physical location on the surface of the corresponding cylinder；
Step 32, according to the exposure focus of each subregion, using maskless photoetching technology by being generated in the step 31
The dynamic electron mask, by the graph exposure to be processed on the surface of the cylinder, in which: in a photolithographic process,
The cylinder is rotated along axial direction by the uniform velocity or in a manner of speed change, and the speed of cylinder rotation and the graph exposure to be processed
When the beam spot scans speed of the luminous point of exposure figure that provides be consistent, figure is realized between adjacent twice sweep luminous point
Seamless connection, it is burnt to be in the exposure in exposure process for the exposure figure of each subregion on the surface of the cylinder
Within the focal depth range of point, to guarantee the consistency and continuous effective and the final total length of figure of the figure of multiple exposure
With it is required consistent；With
Step 33, using developing method, the quilt in the exposure figure that the step 32 is formed on the surface of the cylinder is removed
The part of exposure, and leave the part protected by photoresists；
Step 4, figure addition or figure subtraction process are carried out to the surface of the cylinder after development；
Step 5, the photoresists for removing the surface of the cylinder obtain the surface that continuous fine pattern is formed in the cylinder.
2. the Patterning method of open tubular column stereochemical structure as described in claim 1, which is characterized in that in the step 4
" figure addition " use " galvanoplastic ", specifically includes following process:
Firstly, one end of the fixed cylinder, and the end is electrically connected with positive pole；
Then, the other end inner core of the cylinder is blocked；
Finally, the end that the cylinder is blocked is immersed in electroplating liquid medicine, and the electroplating liquid medicine is electrically connected the power supply
Cathode, in galvanization, positively charged metal ion is toward in the metallic substrates on the surface of the cylinder in the electroplating liquid medicine
It is deposited, the thickness for depositing the electrodeposition of metals of formation is less than or equal to photoresists film thickness.
3. the Patterning method of open tubular column stereochemical structure as claimed in claim 2, which is characterized in that before the step 1,
Further include:
Step 6, the cylinder is electroplated:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；
Then, the cylinder is immersed in electroplate liquid, adheres to layer of conductive material on the surface of the cylinder using chemical method.
4. the Patterning method of open tubular column stereochemical structure as described in claim 1, which is characterized in that in the step 4
" figure subtraction " use " chemical method for etching ", specifically includes following process:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；
Then, the end cylinder blocked is immersed in chemical liquid, and the metal etch for the position that development is fallen is fallen, is left
The metal below part protected by photoresists.
5. the Patterning method of open tubular column stereochemical structure as described in claim 1, which is characterized in that the step 33 is specific
Are as follows: the cylinder after exposure is immersed in mass percent concentration range is 0.5~1%, temperature range is 20~30 DEG C
Sodium hydroxide medical fluid is removed by sodium hydroxide medical fluid in the exposure figure that the step 32 is formed on the surface of the cylinder
Redundance.
6. the Patterning method of open tubular column stereochemical structure as described in claim 1, which is characterized in that the step 1 is specific
Are as follows:
Firstly, one end of the fixed cylinder, blocks the other end inner core of the cylinder；
Then, the end cylinder blocked is immersed in photoresists, and the surface to the cylinder infiltrates in photoresists, completely
It is taken out after infiltration, obtains the consistent photoresists of uniform film thickness, get rid of extra photoresists.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811019376.1A CN109143792A (en) | 2018-09-03 | 2018-09-03 | A kind of Patterning method of open tubular column stereochemical structure |
| PCT/CN2018/122149 WO2020048046A1 (en) | 2018-09-03 | 2018-12-19 | Graphic processing method for hollow column stereoscopic structure |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811019376.1A CN109143792A (en) | 2018-09-03 | 2018-09-03 | A kind of Patterning method of open tubular column stereochemical structure |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113703280A (en) * | 2021-09-08 | 2021-11-26 | 深圳市龙图光电有限公司 | Exposure method and exposure apparatus |
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| WO2020048046A1 (en) | 2020-03-12 |
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