CN109031799A - Display panel and manufacturing method thereof - Google Patents
Display panel and manufacturing method thereof Download PDFInfo
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- CN109031799A CN109031799A CN201811125603.9A CN201811125603A CN109031799A CN 109031799 A CN109031799 A CN 109031799A CN 201811125603 A CN201811125603 A CN 201811125603A CN 109031799 A CN109031799 A CN 109031799A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 67
- 229920002120 photoresistant polymer Polymers 0.000 claims description 162
- 239000000758 substrate Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 13
- 238000002347 injection Methods 0.000 claims description 9
- 239000007924 injection Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 230000006750 UV protection Effects 0.000 claims description 8
- 239000012528 membrane Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 abstract 3
- 239000010410 layer Substances 0.000 description 39
- 239000010408 film Substances 0.000 description 12
- 238000005286 illumination Methods 0.000 description 11
- 239000011159 matrix material Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000004974 Thermotropic liquid crystal Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 230000004224 protection Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 241001062009 Indigofera Species 0.000 description 1
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- 230000003098 cholesteric effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000029264 phototaxis Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a display panel and a manufacturing method thereof. The manufacturing method comprises the following steps: providing a light alignment machine, and placing the display panel injected with the liquid crystal on the light alignment machine; and in a preset time, carrying out optical alignment on the display panel by using the optical alignment machine so as to enable the pretilt angle of the liquid crystal in the display panel to reach a target pretilt angle. In the invention, the liquid crystal is subjected to optical alignment within the preset time, so that the pretilt angle of the liquid crystal can reach the target pretilt angle, and the stability of the light resistor is not greatly reduced, thereby ensuring the yield of the display panel.
Description
Technical field
The present invention relates to field of liquid crystal display more particularly to a kind of display panel and preparation method thereof.
Background technique
Liquid crystal display (Liquid Crystal Display, LCD) has thin fuselage, power saving, radiationless etc. numerous excellent
Point, is widely used, such as LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or pen
Remember this computer screen etc..
Liquid crystal display includes shell, the liquid crystal display panel being set in the housing and the backlight module being set in the housing.Usual liquid
Crystal panel is by a thin-film transistor array base-plate (Thin Film Transistor Array Substrate, TFT Array
Substrate), liquid crystal layer colored filter substrate (Color Filter, CF) and be filled between two substrates
(Liquid Crystal Layer) is constituted, its working principle is that by applying driving voltage on CF substrate and TFT substrate
Come control liquid crystal layer liquid crystal molecule rotation, control the output quantity of light, by the light refraction of backlight module come out generate picture.
In the manufacturing process of liquid crystal display panel, need to realize liquid crystal molecule according to specific side by allocating process
It is arranged to angle.At present in TFT-LCD production, there are two types of alignment methods: friction matching and light orientation.Friction matching is object
Reason method can generate the pollution of electrostatic and particle.Light orientation is a kind of contactless alignment technique, is penetrated using linearly polarized light
Light shield is radiated on photosensitive high molecular polymer alignment film, micro- in the orientation that orientation film surface forms certain tilt angle
Structure reaches orientation effect.
Existing smooth process of alignment are as follows: first mix a certain proportion of high-purity reactive liquid crystals (phototaxis in the liquid crystal layer
Monomer), then apply an orientation voltage between CF substrate and TFT substrate, liquid crystal molecule is promoted to generate a pretilt angle,
And the different farmland of respective pixel, liquid crystal molecule are inclined to that direction is different, then with ultraviolet (UV) light in particular range of wavelengths from
The reactive liquid crystals are irradiated in TFT substrate side, so that reactive liquid crystals aggregate into the liquid crystal point that macromolecule network attracts surface layer
Son forms fixed pre-tilt angle.But in light process of alignment, UV light may occur anti-with the photoresist of the color film layer on CF substrate
It answers, so that photoresist bad stability, causes to generate bubble (bubble) or bright spot (mura), display panel yield in subsequent panel
It is lower.
Summary of the invention
Based on this, it is necessary at present because in light process of alignment UV light irradiate caused by photoresist stability reduction, from
And the problem of influencing panel yield, a kind of display panel and preparation method thereof is provided.
The embodiment of the invention provides a kind of production methods of display panel, comprising:
Light orientation board is provided, the display panel after injection liquid crystal is placed on the smooth orientation board；
Within a preset time, light orientation is carried out to the display panel using the smooth orientation board, so that the display
The pre-tilt angle of liquid crystal in panel reaches target pre-tilt angle.
In some embodiments provided by the invention, the preset time is 100-200 minutes.
In some embodiments provided by the invention, the production method further include:
Before carrying out light orientation to the display panel, the preset time is determined, wherein the preset time is institute
The ultraviolet tolerance time for stating the photoresist layer of display panel and the intersection the time required to being the LCD alignment.
In some embodiments provided by the invention, the production method further include:
Corresponding first tolerance time of red photoresist, the photoresist layer Green photoresist pair in the photoresist layer are determined respectively
The corresponding third tolerance time of blue light resistance in the second tolerance time and the photoresist layer answered；
According to first tolerance time, second tolerance time and the third tolerance time, the photoresist is determined
The ultraviolet tolerance time of layer.
In some embodiments provided by the invention, red photoresist corresponding first in the determination photoresist layer
Tolerance time, comprising:
Form the red photoresist in photoresist layer described in multiple groups；
Under default ultraviolet light intensity, the multiple groups red photoresist is irradiated, and by the multiple groups after irradiation
Red photoresist stands 120h under the conditions of 110 DEG C, wherein the light application time of red photoresist described in every group is different；；
The characteristic for detecting multiple groups red photoresist red photoresist under the conditions of different light application times, determines described red
First tolerance time of coloured light resistance.
In some embodiments provided by the invention, when the determination photoresist layer Green photoresist corresponding second is resistant to
Between, comprising:
Form the green photoresist in photoresist layer described in multiple groups；
Under default ultraviolet light intensity, the multiple groups green photoresist is irradiated, and by the multiple groups after irradiation
Green photoresist stands 120h under the conditions of 110 DEG C, wherein the light application time of green photoresist described in every group is different；
The characteristic for detecting multiple groups green photoresist green photoresist under the conditions of different light application times, determines described green
Second tolerance time of coloured light resistance.
In some embodiments provided by the invention, when the corresponding third of blue light resistance is resistant in the determination photoresist layer
Between, comprising:
Form the blue light resistance in photoresist layer described in multiple groups；
Under default ultraviolet light intensity, the multiple groups blue light resistance is irradiated, and by the multiple groups after irradiation
Blue light resistance stands 120h under the conditions of 110 DEG C, wherein the light application time of blue light resistance described in every group is different；
The characteristic for detecting multiple groups blue light resistance blue light resistance under the conditions of different light application times, determines the indigo plant
The third tolerance time of coloured light resistance.
In some embodiments provided by the invention, the production method further include:
Before carrying out light orientation to the display panel, according to the material of the liquid crystal of injection, it is determined as the liquid
Brilliant light orientation is so that the liquid crystal pretilt angle reaches target pre-tilt angle required time.
In some embodiments provided by the invention, the production method further include:
It array substrate to the display panel and carries out with the matched color membrane substrates of the array substrate to box；
In to the display panel after box, liquid crystal is injected, forms liquid crystal layer.
Based on the same inventive concept, the embodiment of the invention also provides a kind of display panels, and the display panel is using upper
State method production.
To sum up, the present invention provides a kind of display panels and preparation method thereof.The production method includes: to provide light orientation
Display panel after injection liquid crystal is placed on the smooth orientation board by board；Within a preset time, the smooth orientation is utilized
Board carries out light orientation to the display panel, so that the pre-tilt angle of the liquid crystal in the display panel reaches target pre-tilt angle.
Light orientation is carried out to the liquid crystal in the preset time in the present invention, that is, the pre-tilt angle of the liquid crystal may make to reach target
Pre-tilt angle, the stability that not will cause the photoresist also decline to a great extent, to ensure that the yield of the display panel.
Detailed description of the invention
Fig. 1 is a kind of flow diagram of the production method of display panel provided in an embodiment of the present invention；
Fig. 2 is the technological principle schematic diagram that light orientation is carried out to liquid crystal；
Fig. 3 is a kind of structural schematic diagram of display panel provided in an embodiment of the present invention；
Fig. 4 is the flow diagram of the production method of another display panel provided in an embodiment of the present invention.
Drawing reference numeral explanation:
10 display panels
100 array substrates
200 color membrane substrates
210 underlay substrates
220 black matrix
230 photoresist layers
231 red photoresists
232 green photoresists
233 blue light resistances
240 insulated columns
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, with reference to the accompanying drawing to the present invention
Specific embodiment be described in detail.Many details are explained in the following description in order to fully understand this hair
It is bright.But the invention can be embodied in many other ways as described herein, those skilled in the art can be not
Similar improvement is done in the case where violating intension of the present invention, therefore the present invention is not limited to the specific embodiments disclosed below.
Please also refer to Fig. 1 and Fig. 2, the embodiment of the invention provides a kind of production method of display panel 10, the systems
Include: as method
Step S110 provides light orientation board, and the display panel 10 after injection liquid crystal is placed on the smooth orientation board
On；
Step S120 carries out light orientation to the display panel 10 using the smooth orientation board within a preset time, with
The pre-tilt angle of the liquid crystal in the display panel 10 is set to reach target pre-tilt angle.
In some embodiments provided by the invention, the preset time is 100-200 minutes.
It is appreciated that referring to Fig. 3, usual liquid crystal display panel is by a thin-film transistor array base-plate, a colour
Filter sheet base plate 200 and the liquid crystal layer 300 being filled between two substrates are constituted.The CF substrate 200 includes underlay substrate
210, black matrix 220, color film layer 230 and insulated column 240.Wherein, the color film layer 230 include red (Red, R) photoresist 231,
Green (Green, G) photoresist 232 and blue (Blue, B) photoresist 233.In light process of alignment, when irradiating one section using UV light
Between after, the R photoresist 231, the G photoresist 232 and the B photoresist 233 can deformation occurs, and surface roughness can also become
Change, leads to the bad stability of the R photoresist 231, the G photoresist 232 and the B photoresist 233, lead to liquid crystal display display surface
The yield of plate reduces.In the present invention, orientation is carried out to the liquid crystal in the preset time, can both make the liquid crystal
Pre-tilt angle reaches target pre-tilt angle, and the stability change of the R photoresist 231, the G photoresist 232 and the B photoresist 233
It is unobvious, the yield of the display panel 10 is influenced less, to guarantee the quality of the display panel 10.
Refer to Fig. 4, in some embodiments provided by the invention, the production method further include:
Step S100 determines the preset time, when described default before carrying out light orientation to the display panel 10
Between be the display panel 10 photoresist layer UV tolerance time be the liquid crystal light orientation the time required to intersection.
It is appreciated that in the present invention, in the UV tolerance time of the photoresist layer, the R photoresist 231, the G photoresist
232 and the B photoresist 233 stability change it is unobvious, i.e., the described R photoresist 231, the G photoresist 232 and the B photoresist
233 characteristic variations are unobvious.It is described be the LCD alignment the time required in, can using the UV light irradiating liquid crystal
So that the inclination angle of the liquid crystal reaches target tilt angle.Based on this, seeks common ground to the two periods and preset to get to described
Time.Therefore, in the preset time, the pre-tilt angle of the liquid crystal can both have been made to reach target pre-tilt angle, the R photoresist
231, the characteristic of the G photoresist 232 and the B photoresist 233 will not be substantially change.
In some embodiments provided by the invention, the production method further include:
Corresponding first tolerance time of R photoresist 231 in the photoresist layer is determined respectively, G photoresist 232 is right in the photoresist layer
The corresponding third tolerance time of B photoresist 233 in the second tolerance time and the photoresist layer answered；
According to first tolerance time, second tolerance time and the third tolerance time, the photoresist is determined
The UV tolerance time of layer.
In some embodiments provided by the invention, when R photoresist 231 corresponding first is resistant in the determination photoresist layer
Between, comprising:
Form the R photoresist 231 in photoresist layer described in multiple groups；
Under default UV intensity of illumination, the multiple groups R photoresist 231 is irradiated, and by the multiple groups R light after irradiation
Resistance 231 stands 120h under the conditions of 110 DEG C, wherein the light application time of R photoresist 231 described in every group is different；；
The characteristic for detecting the R photoresist 231 under the conditions of different light application times of multiple groups R photoresist 231, determines the R
First tolerance time of photoresist 231.
Table 1
It refers to table 1, in the present embodiment, one layer of 231 material of R photoresist is first coated on underlay substrate, forms photoresist
Layer forms the R photoresist 231 then after overexposure, development and toasting 24 minutes at a high temperature of 230 DEG C.It is to be cooled
Afterwards, film thickness, coloration and the roughness in 231 all directions of R photoresist are measured, and is recorded.Repetition makes the R photoresist 231, with
Form R photoresist 231 described in multiple groups.Secondly, the multiple groups R photoresist 231 is irradiated under default UV intensity of illumination, wherein
The light application time of R photoresist 231 described in every group is different.After UV illumination irradiation, in 110 DEG C of environment, by the multiple groups R light
Resistance 231 is lower to stand 120h, so that the bad point in the R photoresist 231 shows as early as possible.Then, R photoresist described in the multiple groups is measured
231 characteristic value, i.e., film thickness and surface roughness in described 231 all directions of R photoresist etc..Finally, according to the multiple groups R photoresist
231 characteristic value determines corresponding first tolerance time of the R photoresist 231.
In some embodiments provided by the invention, when G photoresist 232 corresponding second is resistant in the determination photoresist layer
Between, comprising:
Form the G photoresist 232 in photoresist layer described in multiple groups；
Under default UV intensity of illumination, the multiple groups G photoresist 232 is irradiated, and by the multiple groups G light after irradiation
Resistance 232 stands 120h under the conditions of 110 DEG C, wherein the light application time of G photoresist 232 described in every group is different；
The characteristic for detecting the G photoresist 232 under the conditions of different light application times of multiple groups G photoresist 232, determines the G
Second tolerance time of photoresist 232.
Table 2
It refers to table 2, in the present embodiment, one layer of 232 material of G photoresist is first coated on underlay substrate, forms photoresist
Layer forms the G photoresist 232 then after overexposure, development and toasting 24 minutes at a high temperature of 230 DEG C.It is to be cooled
Afterwards, film thickness, coloration and the roughness etc. in 232 all directions of G photoresist are measured, and is recorded.Repetition makes the G photoresist 232,
To form G photoresist 232 described in multiple groups, and film thickness, coloration and roughness in 232 all directions of G photoresist described in recording every group.Its
It is secondary, under default UV intensity of illumination, the multiple groups G photoresist 232 is irradiated, wherein described in every group when the illumination of G photoresist 232
Between it is different.After UV illumination irradiation, in 110 DEG C of environment, by the lower standing 120h of the multiple groups G photoresist 232, so that described
Bad point in G photoresist 232 shows as early as possible.Then, the characteristic value of G photoresist 232 described in the multiple groups is measured, i.e., the described G photoresist
The arithmetic mean of instantaneous value Ra of film thickness, roughness in the 232 all directions and root-mean-square value Rq of roughness.Finally, according to the multiple groups G
The characteristic value of photoresist 232 determines corresponding second tolerance time of the G photoresist 232.
In some embodiments provided by the invention, when the corresponding third of B photoresist 233 is resistant in the determination photoresist layer
Between, comprising:
Form the B photoresist 233 in photoresist layer described in multiple groups；
Under default UV intensity of illumination, the multiple groups B photoresist 233 is irradiated, and by the multiple groups B light after irradiation
Resistance 233 stands 120h under the conditions of 110 DEG C, wherein the light application time of B photoresist 233 described in every group is different；
The characteristic for detecting the B photoresist 233 under the conditions of different light application times of multiple groups B photoresist 233, determines the B
The third tolerance time of photoresist 233.
Table 3
It refers to table 3, in the present embodiment, one layer of 233 material of B photoresist is first coated on underlay substrate, forms the B photoresist
233.Repetition makes the B photoresist 233, to form B photoresist 233 described in multiple groups, after cooling, measures 233 each side of B photoresist
Upward film thickness, coloration and roughness, and record.Secondly, being carried out under default UV intensity of illumination to the multiple groups B photoresist 233
Irradiation, wherein the light application time of B photoresist 233 described in every group is different.After UV illumination irradiation, in 110 DEG C of environment, by institute
Standing 120h under multiple groups B photoresist 233 is stated, so that the bad point in the G photoresist 232 shows as early as possible.Then, the multiple groups are measured
The characteristic value of the B photoresist 233, i.e., the arithmetic mean of instantaneous value Ra of film thickness, roughness in described 232 all directions of G photoresist and coarse
The root-mean-square value Rq of degree.Finally, determining that the corresponding third of the B photoresist 233 is resistance to according to the characteristic value of the multiple groups B photoresist 233
By the time.
In some embodiments provided by the invention, the production method further include:
Before carrying out light orientation to the display panel 10, according to the material of the liquid crystal of injection, it is determined as described
LCD alignment is so that the liquid crystal pretilt angle reaches target pre-tilt angle required time.
It is appreciated that the liquid crystal material currently used for display is essentially all thermotropic liquid crystal.In thermotropic liquid crystal, and basis
Liquid Crystal Molecules Alignment structure is divided into three categories: smectic phase (SMECTIC), nematic phase (NEMATIC) and cholesteric phase
(CHOLESTERIC).According to liquid crystal display mode, common nematic phase, which is shown just, TN (twisted nematic) mode, HTN (height torsion
Bent nematic phase) mode, STN (super-twist nematic) mode, TFT (thin film transistor (TFT)) mode etc..Therefore, the liquid crystal material of injection
Difference, when carrying out light orientation using the UV light of same intensity, the required time that the inclination angle of liquid crystal reaches target tilt angle can also
It can be different.Therefore, before carrying out light orientation, the inclination angle of the liquid crystal material and the liquid crystal that should also determine use reaches mesh
The time required to marking inclination angle, to determine described default according to the UV tolerance time of the required time and the photoresist layer
Time.
In some embodiments provided by the invention, the production method further include:
It array substrate to the display panel 10 and carries out with the matched color membrane substrates of the array substrate to box；
In to the display panel 10 after box, liquid crystal is injected, forms liquid crystal layer.
It is noted that UV illumination can also have an impact the stability of the black matrix 220 and the insulated column 240,
And hence it is also possible to first tolerance time, second tolerance time or the third tolerance time is determined in the present invention
Method, determine the black matrix 220 and the corresponding tolerance time of the insulated column 240.It, will during light orientation
The black matrix 220 and the corresponding tolerance time of the insulated column 240 are considered into, and display panel is further promoted
10 yield.
Based on the same inventive concept, the present invention also provides a kind of display panel 10, the display panel 10 uses this hair
The production method of bright offer is made.
To sum up, the present invention provides a kind of display panels 10 and preparation method thereof.The production method includes: to provide light to match
To board, the display panel 10 after injection liquid crystal is placed on the smooth orientation board；Within a preset time, the light is utilized
Orientation board carries out light orientation to the display panel 10, so that the pre-tilt angle of the liquid crystal in the display panel 10 reaches target
Pre-tilt angle.Light orientation is carried out to the liquid crystal in the preset time in the present invention, that is, may make the pre-tilt angle of the liquid crystal
Reach target pre-tilt angle, the stability that not will cause the photoresist also declines to a great extent, to ensure that the display panel 10
Yield.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (10)
1. a kind of production method of display panel characterized by comprising
Light orientation board is provided, the display panel after injection liquid crystal is placed on the smooth orientation board；
Within a preset time, light orientation is carried out to the display panel using the smooth orientation board, so that the display panel
In the pre-tilt angle of liquid crystal reach target pre-tilt angle.
2. production method as described in claim 1, which is characterized in that the preset time is 100-200 minutes.
3. production method as described in claim 1, which is characterized in that further include:
Before carrying out light orientation to the display panel, the preset time is determined, wherein the preset time is described aobvious
The ultraviolet tolerance time for showing the photoresist layer of panel and the intersection the time required to being the LCD alignment.
4. production method as claimed in claim 3, which is characterized in that further include:
Determine that corresponding first tolerance time of red photoresist, the photoresist layer Green photoresist are corresponding in the photoresist layer respectively
The corresponding third tolerance time of blue light resistance in second tolerance time and the photoresist layer；
According to first tolerance time, second tolerance time and the third tolerance time, the photoresist layer is determined
Ultraviolet tolerance time.
5. production method as claimed in claim 4, which is characterized in that red photoresist is corresponding in the determination photoresist layer
First tolerance time, comprising:
Form the red photoresist in photoresist layer described in multiple groups；
Under default ultraviolet light intensity, the multiple groups red photoresist is irradiated, and the multiple groups after irradiation are red
Photoresist stands 120h under the conditions of 110 DEG C, wherein the light application time of red photoresist described in every group is different；
The characteristic for detecting multiple groups red photoresist red photoresist under the conditions of different light application times, determines the red light
First tolerance time of resistance.
6. production method as claimed in claim 4, which is characterized in that the determination photoresist layer Green photoresist is corresponding
Second tolerance time, comprising:
Form the green photoresist in photoresist layer described in multiple groups；
Under default ultraviolet light intensity, the multiple groups green photoresist is irradiated, and the multiple groups after irradiation are green
Photoresist stands 120h under the conditions of 110 DEG C, wherein the light application time of green photoresist described in every group is different；
The characteristic for detecting multiple groups green photoresist green photoresist under the conditions of different light application times, determines the green light
Second tolerance time of resistance.
7. production method as claimed in claim 4, which is characterized in that blue light resistance is corresponding in the determination photoresist layer
Third tolerance time, comprising:
Form the blue light resistance in photoresist layer described in multiple groups；
Under default ultraviolet light intensity, the multiple groups blue light resistance is irradiated, and the multiple groups after irradiation are blue
Photoresist stands 120h under the conditions of 110 DEG C, wherein the light application time of blue light resistance described in every group is different；
The characteristic for detecting multiple groups blue light resistance blue light resistance under the conditions of different light application times, determines the blue light
The third tolerance time of resistance.
8. production method as described in claim 1, which is characterized in that further include:
Before carrying out light orientation to the display panel, according to the material of the liquid crystal of injection, it is determined as the liquid crystal light
Orientation is so that the liquid crystal pretilt angle reaches target pre-tilt angle required time.
9. production method as described in claim 1, which is characterized in that further include:
It array substrate to the display panel and carries out with the matched color membrane substrates of the array substrate to box；
In to the display panel after box, liquid crystal is injected, forms liquid crystal layer.
10. a kind of display panel, which is characterized in that the display panel is using the system as described in any claim of claim 1-9
Make method production.
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|---|---|---|---|
| CN201811125603.9A CN109031799B (en) | 2018-09-26 | 2018-09-26 | Display panel and manufacturing method thereof |
| PCT/CN2018/114642 WO2020062465A1 (en) | 2018-09-26 | 2018-11-08 | Display panel and manufacturing method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811125603.9A CN109031799B (en) | 2018-09-26 | 2018-09-26 | Display panel and manufacturing method thereof |
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| CN109031799A true CN109031799A (en) | 2018-12-18 |
| CN109031799B CN109031799B (en) | 2020-04-28 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109445148A (en) * | 2019-01-11 | 2019-03-08 | 惠科股份有限公司 | Adjusting method of pixel structure and pixel voltage value adjusting system |
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| CN109031799B (en) | 2020-04-28 |
| WO2020062465A1 (en) | 2020-04-02 |
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