CN108957835B - Method for manufacturing reflecting layer of display and reflecting display - Google Patents
Method for manufacturing reflecting layer of display and reflecting display Download PDFInfo
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- CN108957835B CN108957835B CN201810827810.2A CN201810827810A CN108957835B CN 108957835 B CN108957835 B CN 108957835B CN 201810827810 A CN201810827810 A CN 201810827810A CN 108957835 B CN108957835 B CN 108957835B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
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Abstract
The invention provides a manufacturing method of a reflective display, which comprises the steps of doping nano titanium dioxide particles and a dispersing agent in a color resistance material to form a color resistance stock solution, coating the color resistance stock solution on a protective layer of an array substrate and baking to separate out the nano titanium dioxide particles from the color resistance material, and forming a nano titanium dioxide film layer deposited on the surface of the protective layer and a color resistance material layer covering the nano titanium dioxide film layer; and carrying out a color resistance forming process on the baked color resistance material layer and the nanometer titanium dioxide film layer to enable the nanometer titanium dioxide film layer to form a reflecting layer fixed on the protective layer. The invention also provides a reflective display.
Description
Technical Field
The invention relates to the technical field of display screens, in particular to a method for manufacturing a reflecting layer of a display and the reflective display.
Background
With the application of liquid crystal display screens in electronic products such as electronic books, electronic labels, mobile phones, etc., people have different requirements on the display performance, such as readability outdoors, eye protection for reading electronic books, etc., and reflective displays are increasingly widely applied and developed. The reflective display has the main advantages that the reflective display does not have a backlight source, utilizes the reflection of ambient light to display, and adds a reflective layer in the reflective display in order to improve the display effect, but adds the manufacturing process of the display screen.
Disclosure of Invention
The present invention provides a manufacturing method of a reflective layer of a display and a reflective display with reduced manufacturing process.
The invention provides a method for manufacturing a reflective display, which comprises the following steps,
nanometer titanium dioxide particles and a dispersing agent are doped in the color resistance material to form color resistance stock solution,
coating the color resistance stock solution on a protective layer of the array substrate and baking to separate out the nano titanium dioxide particles from the color resistance material to form a nano titanium dioxide film layer deposited on the surface of the protective layer and a color resistance material layer covering the nano titanium dioxide film layer;
and carrying out a color resistance forming process on the baked color resistance material layer and the nanometer titanium dioxide film layer to enable the color resistance material layer to form a color resistance layer and enable the nanometer titanium dioxide film layer to form a reflecting layer, wherein the reflecting layer is positioned between the color resistance layer and the protective layer.
Wherein, the content of the doped nano titanium dioxide particles in the color resistance material is 0.05-5%.
Wherein the content of the dispersing agent doped in the color resistance material is 0.0001-0.001 g per 100 g of nano titanium dioxide particles.
The step of performing the color resist forming process on the baked color resist raw liquid layer includes the steps of exposing, developing, and etching the color resist raw liquid layer.
Wherein the dispersant is polyhydroxy acid ester. The dispersing action of the dispersant decreases with increasing temperature.
Wherein the method further comprises a step of forming a protective layer and a pixel electrode layer on the color resistance layer.
Wherein, the protective layer is made of organic materials.
The invention provides a reflective display, which comprises an array substrate, wherein a color resistance layer and a reflective layer formed by the same process as the color resistance layer are arranged on the array substrate, the reflective layer is fixed on a protective layer of the array substrate, and the color resistance layer covers the reflective layer.
The array substrate comprises a TFT switch layer, the protective layer covers the TFT switch layer, and the color resistance layer is laminated with the protective layer and a pixel electrode layer.
Wherein, the reflecting layer is formed by nano titanium dioxide materials. The nano titanium dioxide film layer is formed by doping nano titanium dioxide particles and a dispersing agent in a color resistance stock solution and separating out and precipitating the nano titanium dioxide particles from the color resistance stock solution in the baking process. The method for manufacturing the reflective display comprises the steps of doping nano titanium dioxide particles and a dispersing agent in a color resistance material to form a color resistance stock solution, precipitating the nano titanium dioxide particles to form a nano titanium dioxide film layer in the process of manufacturing the color resistance layer, and enabling the nano titanium dioxide film layer to be used as a reflecting layer to reflect incident light due to the good reflection characteristic of the nano titanium dioxide particles, so that the manufacturing process of an additional emitting layer is reduced, and the manufacturing cost is reduced.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a flowchart illustrating steps of a method for fabricating a reflective display according to an embodiment of the present invention.
Fig. 2 to fig. 4 are simplified diagrams of structures formed by steps of a method for manufacturing a reflective display according to an embodiment of the present invention.
Fig. 5 is a schematic cross-sectional view of a reflective display of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention provides a method for manufacturing a reflective display, which is used for manufacturing the reflective display. The method comprises the following steps of,
referring to fig. 1, in step S1, nanometer titanium dioxide particles and a dispersant are doped into a color-resisting material to form a color-resisting stock solution. The dispersing agent is used for uniformly dispersing the nano titanium dioxide particles in the color resistance material as much as possible. Wherein, the content of the doped nano titanium dioxide particles in the color resistance material is 0.05-5%. The content of the dispersing agent doped in the color resistance material is 0.0001-0.001 g per 100 g of nano titanium dioxide particles. The dispersing agent is polyhydroxy acid ester.
Before the step, the method also comprises the step of forming a TFT switch layer on the array substrate and a protective layer covering the switch layer. It should be noted that, according to the actual design requirement of the reflective display, other application layers may be formed in this step, and are not limited to the TFT switching layer.
Referring to fig. 2 and 3, in step S2, the color-resisting stock solution is coated on the protection layer 12 of the array substrate 10 and baked to separate the nano titanium dioxide particles 13 from the color-resisting material 14, so as to form a nano titanium dioxide film layer 15 deposited on the surface of the protection layer 12 and a color-resisting material layer 16 covering the nano titanium dioxide film layer 15, as shown in fig. 3. Wherein, the protective layer is made of organic materials. In this embodiment, in the process of baking the color resist stock solution, i.e., pre-baking, the dispersion of the dispersant decreases with increasing temperature. The titanium dioxide particles will precipitate downwards and deposit on the surface of the protective layer 12 in a thin film state, i.e. forming the nano titanium dioxide film layer 15. The color-resisting material forms a color-resisting material layer 16 and covers the nano titanium dioxide film layer 15. In fact, the nano titanium dioxide film layer 15 is embedded on the surface of the color resistance material layer 16 facing the protective layer 12 and contacts with the surface of the protective layer 12.
Referring to fig. 4, in step S3, a color-resist forming process is performed on the baked color-resist material layer 16 and the nano titanium dioxide film layer 15 to form a color-resist layer 18, and the nano titanium dioxide film layer 15 forms a reflective layer 17 fixed on the protective layer 12. In the step of performing the color resist forming process on the baked color resist raw liquid layer, the steps of exposing, developing and etching the color resist raw liquid layer are mainly included, so that the color resist layer 16 forms the color resist layer 18 including, for example, red, green and blue cells, and the nano-titania film layer 15 is located in the display area of the display. Meanwhile, the performance of the crosslinked network of the protective layer 12 can enable the nano titanium dioxide film layer 15 to be fixed on the protective layer 12 to form a fixed reflecting layer 17 which is used as a reflecting layer of a reflective display to realize the reflecting function.
The method further includes the step of forming a protective layer and a pixel electrode layer on the color resistance layer.
The reflective display manufacturing method of the invention dopes nano titanium dioxide particles and dispersant in the color resistance material to form color resistance stock solution before forming the color layer, then the color resistance layer is manufactured, the dispersant enables the nano titanium dioxide particles to be separated out from the color resistance material according to the change of temperature, the color resistance material is not influenced to form the color resistance layer, and the reflective layer is formed in the process of forming the color resistance layer, namely, the manufacturing of the reflective layer is synchronously completed in the color resistance manufacturing process, the manufacturing process of an additional emitting layer is reduced, and the manufacturing cost is reduced.
Referring to fig. 5, the present invention further provides a reflective display, which is manufactured by the above method. In this embodiment, a liquid crystal display is taken as an example for description, but the reflective display of the present application may be other types of displays having a reflective layer. The reflective display comprises an array substrate 10, a color film substrate 20 and a liquid crystal layer 30 packaged between the array substrate and the color film substrate, wherein a color resistance layer 18 and a reflective layer 17 formed by the same process with the color resistance layer 18 are arranged on the array substrate 10, the reflective layer 17 is fixed on a protective layer 12 of the array substrate, and the color resistance layer 18 covers the reflective layer 17 and faces the liquid crystal layer 30. The reflecting layer is a nano titanium dioxide film layer. The nano titanium dioxide film layer is formed by doping nano titanium dioxide particles and a dispersing agent in a color resistance stock solution and separating out and precipitating the nano titanium dioxide particles from the color resistance stock solution in the baking process.
Specifically, the array substrate 10 further includes a TFT switch layer 11, the TFT switch layer is formed on the surface of the substrate 10, and the protective layer 12 is an organic layer and covers the TFT switch layer, so as to protect and insulate the TFT switch layer 11. The resist layer 18 is laminated with a protective layer 171 and a pixel electrode layer 19. The protective layer 171 serves to protect the color resist layer 17. The pixel electrode layer 19 is electrically connected to the TFT switching layer. This embodiment merely illustrates the main constituent structure, and does not exclude any other layer structure and connection relationship.
The emitting layer adopted by the reflective display is formed simultaneously with the color resistance layer, so that the manufacturing process can be reduced, and the manufacturing cost of the reflective display is reduced.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the invention.
Claims (9)
1. A method of fabricating a reflective display, the method comprising,
nanometer titanium dioxide particles and a dispersing agent are doped in the color resistance material to form color resistance stock solution,
coating the color resistance stock solution on a protective layer of the array substrate and baking to separate out the nano titanium dioxide particles from the color resistance material to form a nano titanium dioxide film layer deposited on the surface of the protective layer and a color resistance material layer covering the nano titanium dioxide film layer;
and carrying out a color resistance forming process on the baked color resistance material layer and the nanometer titanium dioxide film layer to enable the color resistance material layer to form a color resistance layer and enable the nanometer titanium dioxide film layer to form a reflecting layer, wherein the reflecting layer is positioned between the color resistance layer and the protective layer.
2. The method of claim 1, wherein the color-resistant material is doped with nano-titania particles in an amount of 0.05% to 5%.
3. The method of claim 2, wherein the dispersion medium is doped in the color-resist material in an amount of 0.0001 to 0.001g per 100 g of nano-titania particles.
4. A method of manufacturing a reflective display according to claim 1, wherein the step of performing a color resist forming process on the baked color resist precursor layer comprises the steps of exposing, developing, and etching the color resist precursor layer.
5. A method of fabricating a reflective display according to claim 2 wherein the dispersing agent is a polyhydroxy acid ester.
6. A method of fabricating a reflective display according to claim 1 wherein the dispersion of the dispersing agent decreases with increasing temperature.
7. A reflective display is characterized by comprising an array substrate, wherein a color resistance layer and a reflective layer are arranged on the array substrate, the color resistance layer is laminated on the reflective layer, and the reflective layer is formed in the color resistance layer forming process.
8. The reflective display of claim 7, wherein the reflective layer is a nano-titania film layer.
9. The reflective display of claim 8, wherein the nano-titania film layer is formed by doping nano-titania particles and a dispersant into a color-resist stock solution, and the nano-titania particles precipitate from the color-resist stock solution during a baking process.
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| CN201810827810.2A CN108957835B (en) | 2018-07-25 | 2018-07-25 | Method for manufacturing reflecting layer of display and reflecting display |
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| CN201810827810.2A CN108957835B (en) | 2018-07-25 | 2018-07-25 | Method for manufacturing reflecting layer of display and reflecting display |
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Citations (4)
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| JP2006098447A (en) * | 2004-09-28 | 2006-04-13 | Seiko Epson Corp | Method for manufacturing substrate for electrooptical device, and device for manufacturing electrooptical device |
| CN200941140Y (en) * | 2005-11-22 | 2007-08-29 | 比亚迪股份有限公司 | Semi-reflecting colour optical filter, colour filter film and LCD device |
| CN105140247A (en) * | 2015-10-10 | 2015-12-09 | 京东方科技集团股份有限公司 | Organic light-emitting diode array substrate, manufacture method thereof and displayer using same |
| CN106033764A (en) * | 2015-03-11 | 2016-10-19 | 上海和辉光电有限公司 | OLED panel reflection layer and manufacturing method thereof |
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- 2018-07-25 CN CN201810827810.2A patent/CN108957835B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006098447A (en) * | 2004-09-28 | 2006-04-13 | Seiko Epson Corp | Method for manufacturing substrate for electrooptical device, and device for manufacturing electrooptical device |
| CN200941140Y (en) * | 2005-11-22 | 2007-08-29 | 比亚迪股份有限公司 | Semi-reflecting colour optical filter, colour filter film and LCD device |
| CN106033764A (en) * | 2015-03-11 | 2016-10-19 | 上海和辉光电有限公司 | OLED panel reflection layer and manufacturing method thereof |
| CN105140247A (en) * | 2015-10-10 | 2015-12-09 | 京东方科技集团股份有限公司 | Organic light-emitting diode array substrate, manufacture method thereof and displayer using same |
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