CN108920003A - Touch panel and preparation method thereof - Google Patents
Touch panel and preparation method thereof Download PDFInfo
- Publication number
- CN108920003A CN108920003A CN201810718538.4A CN201810718538A CN108920003A CN 108920003 A CN108920003 A CN 108920003A CN 201810718538 A CN201810718538 A CN 201810718538A CN 108920003 A CN108920003 A CN 108920003A
- Authority
- CN
- China
- Prior art keywords
- layer
- opaque
- touch panel
- metal line
- transparent insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Position Input By Displaying (AREA)
Abstract
The present invention provides a kind of touch panels and preparation method thereof, after forming routing layer on the nano metal line conductive layer of rim area, full wafer covers transparent insulating layer on the routing layer and nano metal line conductive layer again, then it is formed on the insulating layer opaque layer again, the opaque layer eliminates can operating space part, i.e., the inward flange of the opaque layer with it is described can the edge of operating space be aligned, if the routing layer is applied into visible area, since the transparent insulating layer is transparent, the opaque layer is opaque, the opaque layer cover the routing layer and it is described can operating space edge and the visible area edge gap, the routing layer can also be covered to be applied into the part of the visible area, reduce the probability that touch panel generates visual bad order.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of touch panel and preparation method thereof.
Background technique
Touch panel (Touch Panel) because its convenient for operation, imaging effect is good, function diversification the advantages that gradually by
The favor of electronic communication industry, and be widely used in information system equipment, household appliance, communication apparatus, personal portable etc.
On product.
Existing touch panel generally includes visible area and the rim area around visible area, to be formed with touching in the visible area
Electrode is controlled, cabling is formed in the rim area, is connect the touch control electrode with mainboard by cabling.However, invention human hair
It is existing, current touch panel narrow frame design relatively difficult to achieve.
Summary of the invention
The purpose of the present invention is to provide a kind of preparation method of touch panel, touch panel and touch panels, to solve
The problems such as cabling of touch panel is easily accessible visible area, causes the visibility bad order of touch panel.
In order to achieve the above object, the present invention provides a kind of touch panel, the touch panel includes：
Substrate, the substrate include visible area and around the rim area of the visible area, and the visible area includes that can operate
Area, it is described can operating space edge and the visible area edge have gap；
Nano metal line conductive layer, the nano metal line conductive layer are located on visible area and the rim area of the substrate；
Routing layer, the routing layer are located on the nano metal line conductive layer of the rim area；
Transparent insulating layer, the transparent insulating layer are located at the nano metal line conductive layer of the routing layer and the visible area
On；And
Opaque layer, the opaque layer are located on the transparent insulating layer of the rim area and the gap location simultaneously
It can operating space described in exposure.
Optionally, it is described can operating space edge and the visible area edge gap be less than or equal to 0.3mm.
Optionally, the material of the transparent insulating layer includes silica and/or silicon nitride, and the thickness of the transparent insulating layer
Degree is 50nm-500nm.
Optionally, the material of the opaque layer includes one of nano silver, nanogold or Nanometer Copper or a variety of, and institute
State opaque layer with a thickness of 500nm-1500nm.
Optionally, the touch panel further includes cover board and laminating layer, the laminating layer be located at the opaque layer and
The opaque layer to be bonded with the cover board between the cover board.
The present invention also provides a kind of preparation method of touch panel, the preparation method of the touch panel includes：
There is provided substrate, the substrate includes visible area and around the rim area of the visible area, and the visible area includes can
Operating space, it is described can operating space edge and the visible area edge have gap；
Nano metal line conductive layer is formed, the nano metal line conductive layer is located at visible area and the rim area of the substrate
On；
Routing layer is formed, the routing layer is located on the nano metal line conductive layer of the rim area；And
Form transparent insulating layer and opaque layer, the transparent insulating layer is located at receiving for the routing layer and the visible area
On rice metal wire conductive layer, the opaque layer is located on the transparent insulating layer of the rim area and the gap location simultaneously
It can operating space described in exposure.
Optionally, it is formed after the nano metal line conductive layer, the preparation method of the touch panel further includes：
Adhesion promoting layer is formed, the adhesion promoting layer covers the nano metal line conductive layer；
The adhesion promoting layer and the nano metal line conductive layer are etched, to form touch control electrode.
Optionally, the adhesion promoting layer is at least partly mutually embedding with the nano metal line conductive layer in the thickness direction thereof
Enter.
Optionally, the step of forming the transparent insulating layer and opaque layer include：
The transparent insulating layer is formed, the transparent insulating layer is located at the nano metal of the routing layer and the visible area
On line conductive layer；
Opaque material layer is formed, the opaque material layer covers the transparent insulating layer；
Described in removal can operating space opaque material layer, form the opaque layer, the opaque layer is located at described
And it can operating space described in exposure on the transparent insulating layer of rim area and the gap location.
Optionally, it is formed using at least one of chemical vapor deposition, physical vapour deposition (PVD) or atomic layer deposition method
The transparent insulating layer and the opaque material layer.
In touch panel provided by the invention and preparation method thereof, formed on the nano metal line conductive layer of rim area
After routing layer, then the full wafer covering transparent insulating layer on the routing layer and nano metal line conductive layer, then again described exhausted
Form opaque layer in edge layer, the opaque layer eliminates can operating space part, that is, the inward flange of the opaque layer and institute
State can operating space edge alignment, if the routing layer is applied into visible area, since the transparent insulating layer is transparent, institute
State opaque layer be it is opaque, the opaque layer cover the routing layer and it is described can operating space edge and it is described can
The gap at the edge of vision area can also cover the routing layer and be applied into the part of the visible area, reduce touch panel
Generate the probability of visual bad order.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of touch panel；
Fig. 2 is the structural schematic diagram of touch panel provided in an embodiment of the present invention；
Fig. 3 is the flow chart of the preparation method of touch panel provided in an embodiment of the present invention；
Fig. 4 is the structural schematic diagram provided in an embodiment of the present invention on substrate after formation nano metal line conductive layer；
Fig. 5 is the structural schematic diagram after the etching nano metal line conductive layer provided in an embodiment of the present invention；
Fig. 6 is the structural schematic diagram after formation routing layer provided in an embodiment of the present invention；
Fig. 7 is the structural schematic diagram after formation transparent insulating layer and opaque material layer provided in an embodiment of the present invention；
Fig. 8 is the another structural schematic diagram of touch panel provided in an embodiment of the present invention；
Wherein, 1- substrate, 1 '-substrate, 11- visible area, 11 '-visible areas, 111- can operating space, 111 '-can operating space,
The gap 112-, the rim area 12-, 12 '-rim areas, 2- nano metal line conductive layer, 3- adhesion promoting layer, 4- routing layer, 4 '-routing layers,
5- transparent insulating layer, 6- opaque material layer, 61- opaque layer.
Specific embodiment
In the background technology it has been already mentioned that current touch panel narrow frame design relatively difficult to achieve.This is because cabling is logical
It is often to be formed using printing technology, but the process deviation of printing technology is bigger, cabling is easily accessible visible area, causes touch surface
The visibility bad order of plate.For this purpose, inventors have found that can be bonded a cover board in the subsequent technique of touch panel, usually may be used
The edge of vision area can reserve a certain distance with guarantee to be bonded it is smooth there is not bubble, and this gap of visual area edge can be with
Adequately it is utilized.
With specific reference to shown in Fig. 1, a kind of touch panel includes on substrate 1 ', and the substrate 1 ' includes visible area 11 ' and side
Frame area 12 ', the rim area 12 ' surround the visible area 11 ', and the routing layer 4 ' of touch panel covers the rim area 12 ', is
Avoid the routing layer 4 ' from entering the visible area 11 ', cause bad order, need the rim area 12 ' with it is described can
A certain distance (being greater than 0.3mm) is left between vision area 11 '.And in order to be bonded cover board, the edge of the visible area 11 ' also needs
A certain distance (being greater than 0.3mm) is reserved, the gap in area 111 ' Yu the 11 ' edge of visible area can be operated, this comes,
When the routing layer 4 ' is printed in the rim area 12 ', the routing layer 4 ' can be applied into the 11 ' edge of visible area away from
From to not interfere with the visible area 11 '.But this method is needed in the rim area 12 ' and the visible area
Between 11 ' and the edge of visible area 11 ' and gap can be reserved between operating space 111 ', further increase the rim area 12 '
Size, do not meet the design requirement of narrow frame.
In view of this, the nano metal line in rim area is led the present invention provides a kind of touch panel and preparation method thereof
After forming routing layer in electric layer, then the full wafer covering transparent insulating layer on the routing layer and nano metal line conductive layer, then
It is formed on the insulating layer opaque layer again, the opaque layer eliminates can operating space part, that is, the opaque layer
Inward flange with it is described can the edge of operating space be aligned, if the routing layer is applied into visible area, due to the transparent insulating layer
Be it is transparent, the opaque layer be it is opaque, the opaque layer cover the routing layer and it is described can operating space
The gap at the edge of edge and the visible area can also cover the routing layer and be applied into the part of the visible area, drop
Low touch panel generates the probability of visual bad order.
Touch panel proposed below in conjunction with attached drawing to the embodiment of the present invention and preparation method thereof is retouched in more detail
It states.According to following description, advantages and features of the invention will be become apparent from.It should be noted that attached drawing is all made of very simplified shape
Formula and use non-accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
Fig. 2 and Fig. 8 is please referred to, a kind of touch panel is present embodiments provided, the touch panel includes：Substrate 1, it is described
Substrate 1 includes visible area 11 and around the rim area 12 of the visible area 11, the visible area 11 include can operating space 111, institute
State can operating space 111 edge and the visible area 11 edge have gap 112；Nano metal line conductive layer 2, the nanometer
Metal wire conductive layer 2 is located on visible area 11 and the rim area 12 of the substrate 1；Routing layer 4, the routing layer 4 are located at described
On the nano metal line conductive layer 2 of rim area 12；Transparent insulating layer 5, the transparent insulating layer 5 are located at the routing layer 4 and institute
It states on the nano metal line conductive layer 2 of visible area 11；Opaque layer 61, the opaque layer 61 be located at the rim area 12 and
And it can operating space 111 described in exposure on transparent insulating layer 5 at the gap 112.
" transparent " referred to herein refers to that transmissivity is greater than or equal to 80% in visible light region, and " opaque " refers to
Be in visible light region transmissivity be less than or equal to 10%, it is to be understood that the transparent insulation in the present embodiment
The transparency of layer 5 is the bigger the better, and the transparency of the opaque layer 61 is the smaller the better.
Further, the touch panel further includes cover board and laminating layer, and the laminating layer is located at the opaque layer 61
And the opaque layer 61 to be bonded with the cover board between the cover board.
Referring to Fig. 3, a kind of preparation method of touch panel is present embodiments provided, including：
S1：Substrate is provided, the substrate includes visible area and around the rim area of the visible area, and the visible area includes
Can operating space, it is described can operating space edge and the visible area edge have gap；
S2：Nano metal line conductive layer is formed, the nano metal line conductive layer is located at visible area and the side of the substrate
In frame area；
S3：Routing layer is formed, the routing layer is located on the nano metal line conductive layer of the rim area；And
S4：It forms transparent insulating layer and opaque layer, the transparent insulating layer is located at the routing layer and the visible area
Nano metal line conductive layer on, the opaque layer is located on the transparent insulating layer of the rim area and the gap location simultaneously
It can operating space described in exposure.
Referring to Fig. 4, providing substrate 1 first, the substrate 1 provides support for the entire touch panel.The substrate 1
Usually it is made of transparent insulating materials, such as：The material of the substrate 1 can be using such as glass, metal or ceramics material
Expect the rigid substrates formed, is also possible to using such as acryl, polymethyl methacrylate (PMMA), polyacrylonitrile-butadiene-
Styrene (ABS), polyamide (PA), polyimides (PI), polybenzimidazoles polybutene (PB), polybutylene terephthalate (PBT)
(PBT), polycarbonate (PC), polyether-ether-ketone (PEEK), polyetherimide (PEI), polyether sulfone (PES), polyethylene (PE), poly- pair
Ethylene terephthalate (PET), polyethylene tetrafluoroethene (ETFE), polyethylene oxide, polyglycolic acid (PGA), poly- methylpent
Alkene (PMP), polyformaldehyde (POM), polyphenylene oxide (PPE), polypropylene (PP), polystyrene (PS), polytetrafluoroethylene (PTFE) (PTFE), poly- ammonia
Ester (PU), polyvinyl chloride (PVC), polyvinyl fluoride (PVF), polyvinylidene chloride (PVDC), polyvinylidene fluoride (PVDF) or benzene
The flexible base board that any appropriate insulating materials such as ethylene-propylene nitrile (SAN) is formed.
The substrate 1 including visible area 11 and around the rim area 12 of the visible area 11, usually use by the visible area 11
It is shown in light transmission, the usual opaque display content with the protrusion visible area 11 in the rim area 12.Further, described can
Vision area 11 include can operating space 111, it is described can operating space 111 edge and the visible area 11 edge have gap 112.Example
Such as, the shape of the substrate 1 is rectangle, and the shape in the rim area 12 and gap 112 is ring-type.Also, it is described can operating space
111 edge and the width in the gap 112 at the edge of the visible area 11 are equal everywhere.Optionally, the section in the gap 112
Width is less than or equal to 0.3mm, e.g. 0.1mm, 0.15mm, 0.2mm or 0.25mm, and the present invention is with no restriction.
Next, being coated with nano metal line solution on the substrate 1, the nano metal line solution is nano metal line
The aaerosol solution for being dissolved in specific solvent and being formed, the solvent can be water, aqueous solution, solion, saline solns, surpass and face
Or mixtures thereof boundary's fluid, oil etc., in the solvent can also containing as dispersing agent, surfactant, crosslinking agent, stabilizer,
The additives such as wetting agent or thickener, the coated nano metal line solution on the substrate 1 carry out heating, drying, to institute
It states the nano metal line solution being coated on substrate 1 to be solidified, forms the nano metal line conductive layer 2, the nano metal
Line conductive layer 2 includes the nano metal line in matrix and the insertion matrix, is taken between the nano metal line by molecular force
It connects to form conductive network, the matrix is used to protecting the nano metal line influences of external environments such as be not corroded, wear.
The nano metal line can be the nano wire of golden (Au), silver-colored (Ag), platinum (Pt), copper (Cu), cobalt (Co), palladium (Pd) etc., according to
The features such as electric conductivity, translucency, the nano metal line are preferably silver nanowires (i.e. nano-silver thread).The length of silver nanowires is about
The profile diameter (i.e. line footpath) of 10 μm to 300 μm, preferably 20 μm to 100 μm, silver nanowires is less than 500nm, preferably smaller than
100nm.The thickness of nano metal line conductive layer 2 is, for example, between 10nm to 1 μm.
Please continue to refer to Fig. 4, adhesion promoting layer 3 is formed on the nano metal line conductive layer 2.Optionally, the adhesion promoting layer 3
Material can be such as one of high molecular polymer, nitride and oxide material or a variety of, the high molecular polymerization
Object can be polyvinyl alcohol (PVA), polyvinyl butyral (PVB resin), polyaniline (PAN or PANI), polyphenylene ether
(PPE), polyparaphenylene's acetylene (PPV), poly- 3,4- ethylidene dioxy pheno (PEDOT), polystyrolsulfon acid (PSS), poly- 3- hexyl
Thiophene (P3HT), poly- 3- octyl thiophene (P3OT), poly- C-61- butyric acid-methyl esters (PCBM), it is poly- [2- methoxyl group -5- (2- ethyl-oneself
Oxygroup)-Isosorbide-5-Nitrae-phenylene ethylene] the sticking organic material of the tool such as (MEH-PPV), the nitride can be silicon nitride, described
Oxide can be silica.In the present embodiment, the material of the adhesion promoting layer 3 be using polyamide, polyurethane resin and
The step of one of adhesive materials such as epoxy resin or a variety of allotments form transparent optical cement, form adhesion promoting layer 3 can
To be：Transparent optical sol solution is coated on the nano metal line conductive layer 2 using spraying process；Heating baking is carried out again
It is dry, it is formed by curing the adhesion promoting layer 3.Further, the transparent optical sol solution has mobility, and the nano metal line is led
Usually in netted, before uncured, the transparent optical sol solution can penetrate into the nano metal line conductive layer 2 electric layer 2, make
The adhesion promoting layer 3 formed after must solidifying can be at least partly embedded in the thickness direction thereof in the nano metal line conductive layer 2, make institute
It states nano metal line conductive layer 2 to be preferably attached on the substrate 1, and is not susceptible to swim between the nano metal line
It moves, overlap joint is stronger, and then increases the touch panel conductivity and sensitivity.
Then, described referring to Fig. 5, etching the adhesion promoting layer 3 and the nano metal line conductive layer 2 to form figure
The adhesion promoting layer 3 and nano metal line conductive layer 2 of visible area 11 constitute touch control electrode, the adhesion promoting layer 3 and nanometer of the rim area 12
Metal wire conductive layer 2 is for drawing the touch control electrode.
Then, referring to Fig. 6, on the nano metal line conductive layer 2 of the rim area 12 printed traces layer 4, it is described walk
Line layer 4 covers the nano metal line conductive layer 2 of the rim area 12.The material of the routing layer 4 can be silver, gold, indium oxide
One of tin or graphene are a variety of.In the present embodiment, after forming the routing layer 4 using printing technology, also using sharp
Photo-etching processes perform etching the routing layer 4, a plurality of to be formed on the nano metal line conductive layer 2 of the rim area 12
Cabling is overlapped the cabling and the touch control electrode by subsequent technique.It is further, unstable due to printing technology,
When the routing layer 4 is printed in the rim area 12, the routing layer 4 is easy to be applied into the visible area 11, specifically, institute
Routing layer 4 is stated to be easier to be applied into 11 edge of visible area and described can make in gap 112 between 111 edge of operating space
At visual bad order.
Next, referring to Fig. 7, formation transparent insulating layer 5 and opaque material layer 6, the transparent insulating layer 5 cover whole
A rim area 12 and visible area 11, the opaque material layer 6 are covered on the transparent insulating layer 5, described transparent exhausted
Edge layer 5 is for being isolated the routing layer 4 and the opaque material layer 6 and the touch control electrode and the opaque material being isolated
Layer 6.Further, the material of the transparent insulating layer 5 is transparent insulating materials, and e.g. silica and/or silicon nitride are described
Opaque material layer 6 be opaque conductive material or opaque electrically non-conductive material, e.g. nano silver, nanogold or
One of Nanometer Copper is a variety of, and certainly, the material of the transparent insulating layer 5 and the opaque material layer 6 can also be it
His material, no longer illustrates one by one here.In the present embodiment, using chemical vapor deposition, physical vapour deposition (PVD) or atomic layer deposition
At least one of product technique forms the transparent insulating layer 5 and the opaque material layer 6, these depositing operations are more steady
It is fixed, very thin transparent insulating layer 5 and opaque material layer 6 can be formed, the transparent insulating layer 5 and described opaque is avoided
Material layer 6 is blocked up cause it is subsequent generate bubble when being bonded cover board, influence yield.Specifically, the thickness of the transparent insulating layer 5
The thickness of for example, 50nm-500nm, the opaque material layer 6 are, for example, 500nm-1500nm.
Then referring to Fig. 8, etching the opaque material layer 6, with remove described in can operating space 111 opaque material
Layer 6, forms the opaque layer 61, the opaque layer 61 cover the rim area 12 transparent insulating layer 5 and the gap
Transparent insulating layer 5 in 112, if the routing layer 4 is applied into the gap 112, since the opaque layer 61 is not
It is transparent, and the inward flange of the opaque layer 61 with it is described can the edge of operating space 111 be aligned, i.e., the described opaque layer 61 can
With block it is described applied into the routing layer 4 in the gap 112, to avoid the generation of visual bad order product.
To sum up, the nano metal line in touch panel provided in an embodiment of the present invention and preparation method thereof, in rim area
After forming routing layer on conductive layer, then the full wafer covering transparent insulating layer on the routing layer and nano metal line conductive layer, so
It is formed on the insulating layer opaque layer again afterwards, the opaque layer eliminates can operating space part, that is, the opaque layer
Inward flange with it is described can the edge of operating space be aligned, if the routing layer is applied into visible area, due to the transparent insulation
Layer be it is transparent, the opaque layer be it is opaque, the opaque layer cover the routing layer and it is described can operating space
Edge and the visible area edge gap, the routing layer can also be covered and applied into the part of the visible area,
Reduce the probability that touch panel generates visual bad order.
The above is only a preferred embodiment of the present invention, does not play the role of any restrictions to the present invention.Belonging to any
Those skilled in the art, in the range of not departing from technical solution of the present invention, to the invention discloses technical solution and
Technology contents make the variation such as any type of equivalent replacement or modification, belong to the content without departing from technical solution of the present invention, still
Within belonging to the scope of protection of the present invention.
Claims (10)
1. a kind of touch panel, which is characterized in that the touch panel includes：
Substrate, the substrate include visible area and around the rim area of the visible area, the visible area include can operating space, institute
State can operating space edge and the visible area edge have gap；
Nano metal line conductive layer, the nano metal line conductive layer are located on visible area and the rim area of the substrate；
Routing layer, the routing layer are located on the nano metal line conductive layer of the rim area；
Transparent insulating layer, the transparent insulating layer are located on the nano metal line conductive layer of the routing layer and the visible area；
And
Opaque layer, the opaque layer be located on the transparent insulating layer of the rim area and the gap location and exposure described in
It can operating space.
2. touch panel as described in claim 1, which is characterized in that it is described can operating space edge and the visible area side
The gap of edge is less than or equal to 0.3mm.
3. touch panel as described in claim 1, which is characterized in that the material of the transparent insulating layer include silica and/
Or silicon nitride, and the transparent insulating layer with a thickness of 50nm-500nm.
4. touch panel as described in claim 1, which is characterized in that the material of the opaque layer includes nano silver, nanometer
Gold or one of Nanometer Copper are a variety of, and the opaque layer with a thickness of 500nm-1500nm.
5. touch panel as described in claim 1, which is characterized in that the touch panel further includes cover board and laminating layer,
The laminating layer is between the opaque layer and the cover board the opaque layer to be bonded with the cover board.
6. a kind of preparation method of touch panel, which is characterized in that the preparation method of the touch panel includes：
There is provided substrate, the substrate includes visible area and around the rim area of the visible area, and the visible area includes that can operate
Area, it is described can operating space edge and the visible area edge have gap；
Nano metal line conductive layer is formed, the nano metal line conductive layer is located on visible area and the rim area of the substrate；
Routing layer is formed, the routing layer is located on the nano metal line conductive layer of the rim area；And
It forms transparent insulating layer and opaque layer, the transparent insulating layer is located at the nanogold of the routing layer and the visible area
Belong on line conductive layer, the opaque layer be located on the transparent insulating layer of the rim area and the gap location and it is exposed described in
It can operating space.
7. the preparation method of touch panel as claimed in claim 6, which is characterized in that form the nano metal line conductive layer
Later, the preparation method of the touch panel further includes：
Adhesion promoting layer is formed, the adhesion promoting layer covers the nano metal line conductive layer；
The adhesion promoting layer and the nano metal line conductive layer are etched, to form touch control electrode.
8. the preparation method of touch panel as claimed in claim 7, which is characterized in that the adhesion promoting layer is in the thickness direction thereof
At least partly mutually it is embedded in the nano metal line conductive layer.
9. the preparation method of touch panel as claimed in claim 6, which is characterized in that form the transparent insulating layer and impermeable
The step of bright layer include：
The transparent insulating layer is formed, the transparent insulating layer is located at the routing layer and the nano metal line of the visible area is led
In electric layer；
Opaque material layer is formed, the opaque material layer covers the transparent insulating layer；
Described in removal can operating space opaque material layer, form the opaque layer, the opaque layer is located at the frame
And it can operating space described in exposure on the transparent insulating layer of area and the gap location.
10. the preparation method of touch panel as claimed in claim 9, which is characterized in that use chemical vapor deposition, physics gas
Mutually at least one of deposition or atomic layer deposition method form the transparent insulating layer and the opaque material layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810718538.4A CN108920003B (en) | 2018-06-30 | 2018-06-30 | Touch panel and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810718538.4A CN108920003B (en) | 2018-06-30 | 2018-06-30 | Touch panel and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108920003A true CN108920003A (en) | 2018-11-30 |
| CN108920003B CN108920003B (en) | 2022-03-18 |
Family
ID=64424770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810718538.4A Active CN108920003B (en) | 2018-06-30 | 2018-06-30 | Touch panel and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108920003B (en) |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000299033A (en) * | 1999-04-15 | 2000-10-24 | Matsushita Electric Ind Co Ltd | Transparent touch panel |
| US20080225423A1 (en) * | 2007-03-12 | 2008-09-18 | Samsung Sdi Co., Ltd. | Filter and plasma display apparatus including the same |
| TW201205149A (en) * | 2010-06-14 | 2012-02-01 | Wintek Corp | Touch-sensitive display device |
| CN102819343A (en) * | 2011-06-10 | 2012-12-12 | 胜华科技股份有限公司 | Touch display device |
| CN203644011U (en) * | 2013-12-31 | 2014-06-11 | 陈祖辉 | Narrow-frame single-chip type capacitance sensing touch screen |
| CN204028865U (en) * | 2014-07-23 | 2014-12-17 | 南昌欧菲光科技有限公司 | Touch screen |
| US20150193044A1 (en) * | 2014-01-08 | 2015-07-09 | Samsung Electronics Co., Ltd. | Touch panel and method for fabricating the touch panel |
| CN204759382U (en) * | 2015-06-11 | 2015-11-11 | 达鸿先进科技股份有限公司 | Touch panel with narrowed frame and routing structure thereof |
| CN105426025A (en) * | 2014-09-17 | 2016-03-23 | 宸鸿科技(厦门)有限公司 | Touch panel |
| CN105446565A (en) * | 2015-11-13 | 2016-03-30 | 业成光电（深圳）有限公司 | Bezel region narrowing type touch panel and touch display apparatus |
| TWI598659B (en) * | 2016-12-14 | 2017-09-11 | 宏碁股份有限公司 | Transflective display |
| CN107229373A (en) * | 2017-06-30 | 2017-10-03 | 深圳欧菲光科技股份有限公司 | Contact panel and display device |
-
2018
- 2018-06-30 CN CN201810718538.4A patent/CN108920003B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000299033A (en) * | 1999-04-15 | 2000-10-24 | Matsushita Electric Ind Co Ltd | Transparent touch panel |
| US20080225423A1 (en) * | 2007-03-12 | 2008-09-18 | Samsung Sdi Co., Ltd. | Filter and plasma display apparatus including the same |
| TW201205149A (en) * | 2010-06-14 | 2012-02-01 | Wintek Corp | Touch-sensitive display device |
| CN102819343A (en) * | 2011-06-10 | 2012-12-12 | 胜华科技股份有限公司 | Touch display device |
| CN203644011U (en) * | 2013-12-31 | 2014-06-11 | 陈祖辉 | Narrow-frame single-chip type capacitance sensing touch screen |
| US20150193044A1 (en) * | 2014-01-08 | 2015-07-09 | Samsung Electronics Co., Ltd. | Touch panel and method for fabricating the touch panel |
| CN204028865U (en) * | 2014-07-23 | 2014-12-17 | 南昌欧菲光科技有限公司 | Touch screen |
| CN105426025A (en) * | 2014-09-17 | 2016-03-23 | 宸鸿科技(厦门)有限公司 | Touch panel |
| CN204759382U (en) * | 2015-06-11 | 2015-11-11 | 达鸿先进科技股份有限公司 | Touch panel with narrowed frame and routing structure thereof |
| CN105446565A (en) * | 2015-11-13 | 2016-03-30 | 业成光电（深圳）有限公司 | Bezel region narrowing type touch panel and touch display apparatus |
| TWI598659B (en) * | 2016-12-14 | 2017-09-11 | 宏碁股份有限公司 | Transflective display |
| CN107229373A (en) * | 2017-06-30 | 2017-10-03 | 深圳欧菲光科技股份有限公司 | Contact panel and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108920003B (en) | 2022-03-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI726659B (en) | Touch panel and display | |
| US10928937B2 (en) | Touch panel and sheet of touch sensors | |
| KR101095097B1 (en) | Transparent electrode film, and its preparing Method | |
| US9098162B2 (en) | Touch panel including graphene and method of manufacturing the same | |
| US11086459B2 (en) | Touch panel and manufacturing method thereof | |
| JP2019192216A (en) | Touch panel and direct patterning method thereof | |
| KR20110090398A (en) | Method for forming pattern of graphene | |
| TWI749832B (en) | Etching solution, touch panel and manufacturing method thereof | |
| CN113126829B (en) | Touch panel and manufacturing method thereof | |
| US11256380B2 (en) | Touch panel, method for manufacturing the same and display device | |
| CN108920003A (en) | Touch panel and preparation method thereof | |
| CN109032401B (en) | Conductive laminated structure, preparation method of conductive laminated structure and touch panel | |
| KR20110090134A (en) | Touch panel and method of manufacturing the touch panel | |
| US11510323B2 (en) | Conductive laminated structure, a manufacturing method thereof, and a display panel | |
| CN108920004B (en) | Preparation method of conductive laminated structure, conductive laminated structure and touch panel | |
| KR20110090399A (en) | Touch panel and method of manufacturing the touch panel | |
| KR101675794B1 (en) | Method of manufacturing touch panel | |
| KR101695256B1 (en) | Touch panel and method of manufacturing the touch panel | |
| CN108845706A (en) | Conductive laminate structure, the preparation method of conductive laminate structure and touch panel | |
| CN108920035A (en) | Touch panel and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20181130 Assignee: Yungu (Gu'an) Technology Co., Ltd.|Bazhou Yungu Electronic Technology Co., Ltd.|Kunshan Institute of technology new flat panel display technology center Co., Ltd Assignor: Kunshan Guo Xian Photoelectric Co., Ltd. Contract record no.: X2019990000156 Denomination of invention: Touch panel and preparation method thereof License type: Common License Record date: 20191030 |
|
| EE01 | Entry into force of recordation of patent licensing contract | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20191206 Address after: No. 2 Xiangshan Avenue, Yongning Street, Zengcheng District, Guangzhou, Guangdong province (the core of Zengcheng economic and Technological Development Zone) Applicant after: Guangzhou Guoxian Technology Co., Ltd Address before: 215300, No. 1, Longteng Road, Kunshan Development Zone, Jiangsu, Suzhou, 4 Applicant before: Kunshan Guo Xian Photoelectric Co., Ltd. |
|
| TA01 | Transfer of patent application right | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |