CN108912572B - Radiation-induced cooling film with self-cleaning function and preparation method thereof - Google Patents
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- 230000005855 radiation Effects 0.000 title claims abstract description 82
- 238000004140 cleaning Methods 0.000 title claims abstract description 55
- 238000001816 cooling Methods 0.000 title claims description 33
- 238000002360 preparation method Methods 0.000 title abstract description 16
- 239000002105 nanoparticle Substances 0.000 claims abstract description 103
- 238000005057 refrigeration Methods 0.000 claims abstract description 77
- 239000002245 particle Substances 0.000 claims abstract description 60
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 49
- 238000005266 casting Methods 0.000 claims description 48
- 239000000758 substrate Substances 0.000 claims description 45
- 238000001035 drying Methods 0.000 claims description 22
- 238000002156 mixing Methods 0.000 claims description 22
- 239000011347 resin Substances 0.000 claims description 21
- 229920005989 resin Polymers 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 19
- 230000010355 oscillation Effects 0.000 claims description 11
- 238000003756 stirring Methods 0.000 claims description 11
- 239000005543 nano-size silicon particle Substances 0.000 claims description 10
- GTJOHISYCKPIMT-UHFFFAOYSA-N 2-methylundecane Chemical group CCCCCCCCCC(C)C GTJOHISYCKPIMT-UHFFFAOYSA-N 0.000 claims description 8
- SGVYKUFIHHTIFL-UHFFFAOYSA-N Isobutylhexyl Natural products CCCCCCCC(C)C SGVYKUFIHHTIFL-UHFFFAOYSA-N 0.000 claims description 8
- VKPSKYDESGTTFR-UHFFFAOYSA-N isododecane Natural products CC(C)(C)CC(C)CC(C)(C)C VKPSKYDESGTTFR-UHFFFAOYSA-N 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052681 coesite Inorganic materials 0.000 claims description 5
- 229910052906 cristobalite Inorganic materials 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052682 stishovite Inorganic materials 0.000 claims description 5
- 229910052905 tridymite Inorganic materials 0.000 claims description 5
- 239000008096 xylene Substances 0.000 claims description 5
- 239000006184 cosolvent Substances 0.000 claims description 3
- 239000010954 inorganic particle Substances 0.000 claims 2
- 230000000694 effects Effects 0.000 abstract description 25
- 239000000428 dust Substances 0.000 abstract description 6
- 238000010521 absorption reaction Methods 0.000 abstract description 3
- 238000009825 accumulation Methods 0.000 abstract description 3
- 238000002834 transmittance Methods 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 47
- 239000011521 glass Substances 0.000 description 17
- 239000004925 Acrylic resin Substances 0.000 description 15
- 229920000178 Acrylic resin Polymers 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 7
- 239000007888 film coating Substances 0.000 description 7
- 238000009501 film coating Methods 0.000 description 7
- 239000011116 polymethylpentene Substances 0.000 description 7
- 229920000306 polymethylpentene Polymers 0.000 description 7
- 229920002620 polyvinyl fluoride Polymers 0.000 description 7
- 230000009467 reduction Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004134 energy conservation Methods 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/04—Homopolymers or copolymers of ethene
- C08J2323/08—Copolymers of ethene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2323/00—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers
- C08J2323/02—Characterised by the use of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Derivatives of such polymers not modified by chemical after treatment
- C08J2323/18—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms
- C08J2323/20—Homopolymers or copolymers of hydrocarbons having four or more carbon atoms having four to nine carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
- C08K2003/0831—Gold
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2237—Oxides; Hydroxides of metals of titanium
- C08K2003/2241—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2248—Oxides; Hydroxides of metals of copper
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2265—Oxides; Hydroxides of metals of iron
- C08K2003/2272—Ferric oxide (Fe2O3)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
Abstract
The invention belongs to the technical field of radiation refrigeration, and particularly relates to a radiation refrigeration film with a self-cleaning function and a preparation method thereof, wherein the radiation refrigeration film comprises a base film, and a radiator and hydrophobic nano particles which are dispersed in the base film, wherein the infrared emission peak of the radiator is positioned in the infrared radiation waveband range of 8-13 mu m and at least covers a waveband interval in the range of 8-13 mu m. The invention utilizes the high hydrophobicity of the nano hydrophobic particles to lead the radiation refrigeration film to have self-cleaning effect, and avoids the phenomenon of reducing the refrigeration effect due to dust accumulation. The radiation refrigeration film has high emissivity in a wave band of 8-13 mu m, high transmittance in a visible light wave band and good daylighting performance, and can reduce the absorption of energy of objects to other wave bands and ensure the refrigeration effect. The invention further adopts two radiators with different grain sizes, widens the radiation range, radiates the ground heat to the outer space to the maximum extent and improves the refrigeration effect.
Description
Technical Field
The invention belongs to the technical field of radiation refrigeration, and particularly relates to a radiation refrigeration film with a self-cleaning function and a preparation method thereof.
Background
Since the twenty-first century, energy problems have attracted much attention, energy conservation and consumption reduction have also become important concerns of people, and energy conservation and consumption reduction in the field of refrigeration and temperature control are important research fields. Radiation refrigeration is gradually paid attention to by researchers as a refrigeration mode without energy consumption, the principle is the fourth power law of radiation heat transfer in heat transfer science, the temperature of the space outside the atmosphere is close to absolute zero, the radiation refrigeration is an ideal cold source, if direct radiation heat exchange between a ground object and a space cold source close to 0K is realized, a good cooling effect is achieved, but the atmosphere obstructs radiation heat dissipation from the ground to the space, however, the absorptivity of the atmosphere is very low and the transmittance is very high between atmospheric windows (8-13 mu m) of wave bands, the wave bands are just in a far infrared region of normal temperature radiation of the ground object, the radiation refrigeration film has high emissivity in the atmospheric window wave bands, the film is attached to the surface of the object, and the energy of the ground can be radiated to the outer space through the wave bands, so that the refrigeration effect is achieved.
However, the conventional radiation refrigeration membrane lacks a self-cleaning function, so that dust and dirty substances are easily attached to the surface of the radiation refrigeration membrane, and the refrigeration effect of the radiation refrigeration membrane is reduced.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides a radiation-induced cooling film with a self-cleaning function and a preparation method thereof.
The technical scheme of the invention is as follows:
a radiation refrigeration film with a self-cleaning function comprises a base film, a radiator and hydrophobic nano particles, wherein the radiator and the hydrophobic nano particles are dispersed in the base film, and an infrared emission peak of the radiator is located in an infrared radiation waveband range of 8-13 mu m and at least covers a waveband interval of 8-13 mu m.
Furthermore, the radiator is composed of inorganic nanoparticles I with the particle size of 0.4-0.9 mu m, or inorganic nanoparticles II with the particle size of 1-4 mu m, or inorganic nanoparticles I with the particle size of 0.4-0.9 mu m and inorganic nanoparticles II with the particle size of 1-4 mu m according to a certain volume ratio.
Furthermore, the volume ratio of the inorganic nanoparticles I to the inorganic nanoparticles II is 1 (3-5).
Further, the inorganic nano particles I and II are both SiO2Nanoparticles, CuO nanoparticles, TiO2Nanoparticles or Fe2O3One or more combinations of nano particles。
Further, the base film is made of a resin material.
Further, the resin material is one of acrylic resin, polyvinyl fluoride, EVA resin or polymethylpentene.
Furthermore, the hydrophobic nano particles are one or a combination of several of inorganic nano silicon, nano titanium dioxide or hydrophobic nano gold particles with the particle size of 0.005-0.5 mu m.
The invention provides a preparation method of a radiation refrigeration film with a self-cleaning function, which comprises the following steps:
preparing a substrate casting solution: mixing a resin material and a cosolvent according to a certain volume ratio, adding a radiator and hydrophobic nanoparticles, fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with the radiator and the hydrophobic nanoparticles uniformly dispersed;
(II) preparing a refrigeration film: and when the base casting solution reaches the standard viscosity, coating the base casting solution into a film, and drying and forming the film to obtain the self-cleaning radiation-induced cooling film.
Furthermore, the volume ratio of the resin material to the latent solvent in the step (I) is 1 (3-5), the latent solvent is isododecane or xylene, the addition amount of the radiator is 3-6% of the volume of the resin material, and the addition amount of the hydrophobic nanoparticles is 1-3% of the volume of the resin material.
Further, the step (two) of enabling the substrate casting solution to reach the standard viscosity means that a glass rod is used for dipping up the substrate casting solution, and the substrate casting solution can flow down along the glass rod to form a line.
Further, a film coater is used for coating the substrate casting solution to form a film in the step (II), and the drying refers to drying or standing for natural drying.
Further, the thickness of the radiation refrigeration film with the self-cleaning function obtained in the step (II) is 20-500 mu m.
The radiation refrigeration film with the self-cleaning function provided by the invention is applied to building cooling, photovoltaic cells, cold chain transportation or electronic equipment cooling.
The invention has the beneficial effects that:
1. the radiation refrigeration film with the self-cleaning function provided by the invention utilizes the high hydrophobicity of the nano hydrophobic particles to ensure that water cannot be completely attached to the surface of the radiation refrigeration film, but water drops are formed due to the surface tension of the water drops, and dust is taken away in the process that the water drops slide off from the surface of the film, so that the radiation refrigeration film has the self-cleaning effect, and the phenomenon that the refrigeration effect is reduced due to dust accumulation is avoided.
2. The radiation refrigeration film with the self-cleaning function has high emissivity in an atmospheric window waveband of 8-13 mu m, and can radiate the energy of the ground to the outer space through the waveband and perform radiation heat exchange with the outer space so as to achieve the refrigeration effect; meanwhile, the film provided by the invention has large integral transmittance and small absorption rate in a visible light waveband of 380-760 nm, not only has good daylighting performance in the visible light waveband, but also can reduce the absorption of objects on the energy of other wavebands, and ensures the refrigeration effect of the film.
3. In order to further improve the refrigeration effect, the invention adopts two radiators with different grain sizes, and utilizes the superposition of the infrared emission peaks of the radiators with different grain sizes, thereby widening the radiation range of the infrared composite wave band, and being capable of radiating the ground heat to the outer space with the temperature close to absolute zero to the maximum extent, thereby improving the refrigeration effect.
4. Compared with the coating material with larger brittleness, the radiation cooling film prepared by the invention has good tensile property and flexibility, can cover the surfaces of the objects needing cooling, such as the existing building, the photovoltaic cell, the cold chain transportation equipment, the electronic equipment and the like, and has wider application range.
5. The radiation refrigeration film with the self-cleaning function and the preparation method thereof have the advantages of energy conservation, consumption reduction, environmental protection, huge social benefit and economic benefit and very wide market prospect.
Drawings
FIG. 1 is a surface SEM photograph of a radiation-cooled film having a self-cleaning function prepared in example 12;
FIG. 2 is a graph showing the spectral properties of the radiation-cooled film having a self-cleaning function prepared in example 11;
FIG. 3 is a graph showing the spectral properties of the radiation-cooled film having a self-cleaning function prepared in example 12;
FIG. 4 is a photograph showing the contact angle of a water droplet with the radiation-cooled film having the self-cleaning function prepared in example 12;
FIG. 5 is a photograph of a contact angle of a water droplet with a radiation-cooled film prepared in comparative example 1 without adding hydrophobic nanoparticles;
fig. 6 is a graph showing the refrigerating effect of the radiation refrigerating film having the self-cleaning function prepared in example 12.
Detailed Description
The technical solutions of the present invention are further described below with reference to the following examples, but the present invention is not limited thereto, and any modifications or equivalent substitutions may be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.
Example 1
A radiation refrigeration film with a self-cleaning function comprises a base film, a radiator and hydrophobic nano particles, wherein the radiator and the hydrophobic nano particles are dispersed in the base film, and an infrared emission peak of the radiator is located in an infrared radiation waveband range of 8-13 mu m and at least covers a waveband interval of 8-13 mu m.
Example 2
A radiation refrigeration film with a self-cleaning function comprises a base film, and a radiator and hydrophobic nanoparticles which are dispersed in the base film, wherein the radiator is composed of inorganic nanoparticles I with the particle size of 0.4-0.9 mu m, or inorganic nanoparticles II with the particle size of 1-4 mu m, or inorganic nanoparticles I with the particle size of 0.4-0.9 mu m and inorganic nanoparticles II with the particle size of 1-4 mu m according to a certain volume ratio.
Example 3
A radiation refrigeration film with a self-cleaning function comprises a base film, and a radiator and hydrophobic nano particles which are dispersed in the base film, wherein the radiator is composed of inorganic nano particles I with the particle size of 0.4-0.9 mu m and inorganic nano particles II with the particle size of 1-4 mu m according to the volume ratio of 1 (3-5).
Example 4
A radiation refrigeration film with a self-cleaning function comprises a base film, and a radiator and hydrophobic nanoparticles which are dispersed in the base film, wherein the radiator consists of inorganic nanoparticles I with the particle size of 0.4-0.9 mu m, or inorganic nanoparticles II with the particle size of 1-4 mu m, or the inorganic nanoparticles I with the particle size of 0.4-0.9 mu m and the inorganic nanoparticles II with the particle size of 1-4 mu m according to the volume ratio of 1 (3-5); wherein the inorganic nanoparticles I and the inorganic nanoparticles II are both SiO2Nanoparticles, TiO2Nanoparticles, CuO nanoparticles or Fe2O3The substrate film is made of a resin material, and the resin material is one of acrylic resin, polyvinyl fluoride, EVA resin or polymethylpentene; the hydrophobic nano particles are one or a combination of several of inorganic nano silicon, nano titanium dioxide or hydrophobic nano gold particles with the particle size of 0.005-0.5 mu m.
Example 5
A radiation refrigeration film with a self-cleaning function comprises a substrate film made of acrylic resin, and a radiator and hydrophobic nano particles which are dispersed in the substrate film, wherein the radiator is SiO with the particle size of 0.4-0.9 mu m2The hydrophobic nano particles are inorganic nano silicon with the particle size of 0.005-0.5 mu m.
Example 6
A radiation refrigeration film with a self-cleaning function comprises a base film made of polyvinyl fluoride, and a radiator and hydrophobic nano particles which are dispersed in the base film, wherein the radiator is TiO with the particle size of 1-4 mu m2The hydrophobic nano particles are nano titanium dioxide with the particle size of 0.005-0.5 mu m.
Example 7
A radiation refrigeration film with a self-cleaning function comprises a base film made of polymethylpentene, and a radiator and hydrophobic nanoparticles which are dispersed in the base film, wherein the radiator is composed of CuO nanoparticles I with the particle size of 0.4-0.9 mu m and CuO nanoparticles II with the particle size of 1-4 mu m, the volume ratio of the CuO nanoparticles I to the CuO nanoparticles II is 1:4, and the hydrophobic nanoparticles are hydrophobic gold nanoparticles with the particle size of 0.005-0.5 mu m.
Example 8
The preparation method of the radiation-cooled film with the self-cleaning function provided by the embodiment comprises the following steps:
preparing a substrate casting solution: mixing a resin material and a cosolvent according to a certain volume ratio, adding a radiator and hydrophobic nanoparticles, fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with the radiator and the hydrophobic nanoparticles uniformly dispersed;
(II) preparing a refrigeration film: and when the base casting solution reaches the standard viscosity, coating the base casting solution into a film, and drying and forming the film to obtain the self-cleaning radiation-induced cooling film.
Example 9
The preparation method of the radiation-cooled film with the self-cleaning function provided by the embodiment comprises the following steps:
preparing a substrate casting solution: mixing a resin material and a latent solvent according to a volume ratio of 1 (3-5), wherein the resin material is one of acrylic resin, polyvinyl fluoride, EVA resin or polymethylpentene, the latent solvent is isododecane or xylene, adding a radiator and hydrophobic nanoparticles into the mixed solution, the addition amount of the radiator is 3-6% of the volume of the resin material, and the addition amount of the hydrophobic nanoparticles is 1-3% of the volume of the resin material; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with uniformly dispersed radiators and hydrophobic nano particles;
(II) preparing a refrigeration film: and (3) dipping the substrate casting solution by a glass rod to form a line, coating the substrate casting solution by a film coater to form a film, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
Example 10
The embodiment provides a SiO with a particle size of 0.4-0.9 μm2The preparation method of the radiation refrigeration film with the self-cleaning function prepared by the nano particles comprises the following steps:
preparing a substrate casting solution: mixing acrylic resin and isododecane according to a volume ratio of 1:3, and adding SiO with the particle size of 0.4-0.9 mu m, wherein the volume percentage of the SiO is 3 percent of the volume of the acrylic resin2Inorganic nano silicon with the volume of the nano particles and 1 percent of the acrylic resin; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain SiO2A substrate casting solution with uniformly dispersed nano particles and inorganic nano silicon particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
Example 11
The embodiment provides SiO with the grain diameter of 1-4 mu m2The preparation method of the radiation refrigeration film with the self-cleaning function prepared by the nano particles comprises the following steps:
preparing a substrate casting solution: mixing acrylic resin and isododecane according to a volume ratio of 1:3, and adding SiO (silicon dioxide) with the particle size of 1-4 mu m, wherein the volume percentage of the acrylic resin is 3%2Inorganic nano silicon with the volume of the nano particles and 1 percent of the acrylic resin; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain SiO2A substrate casting solution with uniformly dispersed nano particles and inorganic nano silicon particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
Example 12
This example provides a SiO with two different particle sizes2The preparation method of the radiation refrigeration film with the self-cleaning function prepared by the nano particles comprises the following steps:
preparing a substrate casting solution: mixing acrylic resin and isododecane according to a volume ratio of 1:3, and adding a radiator accounting for 3% of the volume of the acrylic resin and inorganic nano-silicon accounting for 1% of the volume of the acrylic resin; wherein the radiator is made of SiO with a particle size of 0.4-0.9 μm2Nano particles I and SiO with particle size of 1-4 μm2The nano particles II consist of 1:3 by volume; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with uniformly dispersed radiators and hydrophobic nano particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
As can be seen from the surface SEM image of the self-cleaning radiation refrigeration film prepared in this embodiment shown in fig. 1, the radiator and the hydrophobic nanoparticles are distributed on the surface of the radiation refrigeration film more densely and uniformly.
Example 13
This example provides a TiO blend of two different particle sizes2The preparation method of the radiation refrigeration film with the self-cleaning function prepared by the nano particles comprises the following steps:
preparing a substrate casting solution: mixing polyvinyl fluoride and xylene according to a volume ratio of 1:4, and adding a radiator accounting for 4% of the volume of the polyvinyl fluoride and nano titanium dioxide accounting for 2% of the volume of the polyvinyl fluoride; wherein the radiator is made of TiO with the particle size of 0.4-0.9 μm2Nano particle I and TiO with particle size of 1-4 μm2The nano particles II consist of nano particles according to the volume ratio of 1: 4; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with uniformly dispersed radiators and hydrophobic nano particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
Example 14
The embodiment provides a preparation method for preparing a radiation-induced cooling film with a self-cleaning function from CuO nano particles with two different particle sizes, which comprises the following steps:
preparing a substrate casting solution: mixing EVA and isododecane according to a volume ratio of 1:5, and adding a radiator accounting for 5% of the volume of the EVA and hydrophobic gold nanoparticles accounting for 3% of the volume of the EVA; the radiator consists of CuO nanoparticles I with the particle size of 0.4-0.9 mu m and CuO nanoparticles II with the particle size of 1-4 mu m according to the volume ratio of 1: 5; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with uniformly dispersed radiators and hydrophobic nano particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
Example 15
This example provides a Fe alloy of two different particle sizes2O3The preparation method of the radiation refrigeration film with the self-cleaning function prepared by the nano particles comprises the following steps:
preparing a substrate casting solution: mixing polymethylpentene and xylene according to the volume ratio of 1:3, and adding a radiator accounting for 6% of the volume of the polymethylpentene and inorganic nano-silicon accounting for 2% of the volume of the polymethylpentene; wherein the radiator is made of Fe with a particle size of 0.4-0.9 μm2O3Nano particles I and Fe with particle size of 1-4 μm2O3The nano particles II consist of 1:3 by volume; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with uniformly dispersed radiators and hydrophobic nano particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the self-cleaning radiation-induced cooling film with the thickness of 20-500 mu m.
Comparative example 1
The comparative example provides a method for preparing a radiation-induced cooling film without adding hydrophobic nanoparticles, comprising the following steps:
preparing a substrate casting solution: mixing acrylic resin and isododecane according to the volume ratio of 1:3, and adding a radiator with the volume of 3% of the acrylic resin; wherein the radiator is made of SiO with a particle size of 0.4-0.9 μm2Nano particles I and SiO with particle size of 1-4 μm2The nano particles II consist of 1:3 by volume; fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with uniformly dispersed radiators and hydrophobic nano particles;
(II) preparing a refrigeration film: and (3) after the substrate casting solution is dipped by a glass rod and can flow down along the glass rod to form a line, adjusting the coating rod, coating the substrate casting solution into a film by using a film coating device, and drying or standing for natural drying and forming to obtain the radiation-induced cooling film with the thickness of 20-500 mu m.
Effect verification test:
1. emission spectrum property diagram:
as can be seen from the spectral property diagrams of the self-cleaning radiation-cooled films prepared in the examples 11 and 12 shown in FIGS. 2 and 3, in the example 12, SiO with two different particle sizes is used2The radiation refrigeration film prepared by the nano particles has a wider wave band range covered in an infrared radiation wave band range of 8-13 mu m, the average emissivity can reach 90%, and in example 11, only SiO with one particle size is added2The coverage waveband interval of the radiation refrigeration film prepared from the nano particles in the infrared radiation waveband range of 8-13 microns is relatively narrow, and the emissivity of the film prepared in example 11 in the coverage waveband is 76%. Therefore, by adopting two radiators with different particle sizes, the infrared emission peaks of the radiators with different particle sizes can be superposed, the radiation range of the infrared composite wave band is widened, and the ground heat can be maximizedTo a large extent to the outer space where the temperature approaches absolute zero, thereby improving the refrigeration effect.
2. Hydrophobic Effect test
The contact angles of the films prepared in example 12 and comparative example 1 with respect to water droplets were measured, respectively, and as a result, as shown in fig. 4 and 5, the average contact angle of the radiation-cooled film having the self-cleaning function prepared in example 12 was 132 °, whereas the average contact angle of the radiation-cooled film without the addition of the hydrophobic nanoparticles prepared in comparative example 1 was only 50 °. Therefore, the invention utilizes the high hydrophobicity of the nano hydrophobic particles to increase the contact angle of water drops on the surface of the film, the water drops can not be completely attached to the surface of the radiation refrigeration film, but small water drops are formed on the surface of the film, the small water drops are polymerized and enlarged under the action of wind power or gravity, and dust on the surface of the film is further taken away by flowing or sliding, so that the self-cleaning effect is achieved, and the problem that the emissivity and the reflectivity of the film are reduced due to dust accumulation is solved.
3. Cooling effect verification test
A test experiment of the on-site cooling effect was performed by covering the aluminum sheet with a radiation cooling film according to the preparation methods of examples 10, 11, and 12 and comparative example 1, and the influence of convection heat transfer was excluded during the experiment, and the test results are shown in fig. 6 and table 1;
TABLE 1
Fig. 6 is a diagram showing the refrigeration effect of the radiation refrigeration film with the self-cleaning function prepared in example 12, and it can be seen from fig. 6 that the temperature of the aluminum sheet coated with the film is reduced by 15.78 ℃ at most, the average cooling amplitude is 10 ℃, and the cooling effect is significant compared with the aluminum sheet not coated with the film.
As can be seen from the data in Table 1, the radiation refrigeration films provided by the invention all have good refrigeration effect, and the refrigeration effect at night is better than that in the daytime. Example 12 use of SiO in two different particle sizes2The refrigeration effect of the radiation refrigeration film prepared by the nano particles is better than that of the SiO added with only one particle size in the example 10 and the example 112A radiation-induced cooling film prepared from nano particles.In which two SiO particles of different sizes are used2The average cooling amplitude of the radiation refrigeration film prepared by the nano particles in the daytime is 9 ℃ compared with the ambient temperature, and the cooling amplitude of the radiation refrigeration film at night is 18.6 ℃; adding SiO of only one particle size2Compared with the ambient temperature, the average cooling amplitude of the radiation refrigeration film prepared by the nano particles in the daytime is 5.25 ℃, and the average cooling amplitude of the radiation refrigeration film prepared by the nano particles in the nighttime is 13.6 ℃. It has been shown that two SiO particles of different particle size are used2The radiation refrigeration film prepared by the nano particles can radiate more ground heat to the outer space with the temperature close to absolute zero, thereby further improving the refrigeration effect.
The average temperature reduction amplitude of comparative example 1 is similar to that of example 12, which shows that the addition of the hydrophobic nanoparticles does not affect the temperature reduction of the radiator.
Claims (5)
1. A radiation refrigeration film with a self-cleaning function is characterized by comprising a base film, a radiator and hydrophobic nano particles, wherein the radiator and the hydrophobic nano particles are dispersed in the base film, and an infrared emission peak of the radiator is positioned in an infrared radiation waveband range of 8-13 mu m and at least covers a waveband interval in the range of 8-13 mu m; the hydrophobic nano particles are one or a combination of several of inorganic nano silicon, nano titanium dioxide or hydrophobic nano gold particles with the particle size of 0.005-0.5 mu m; the radiator is composed of inorganic nanoparticles I with the particle size of 0.4-0.9 mu m and inorganic particles II with the particle size of 1-4 mu m according to the volume ratio of 1 (3-5); the base film is made of a resin material, the addition amount of the radiator is 3-6% of the volume of the resin material, and the addition amount of the hydrophobic nano particles is 1-3% of the volume of the resin material; the inorganic nano particles I and the inorganic particles II are both SiO2Particles.
2. The method for preparing a radiation-cooled film having a self-cleaning function as claimed in claim 1, wherein the steps of the method are as follows:
preparing a substrate casting solution: mixing a resin material and a cosolvent according to a certain volume ratio, adding a radiator and hydrophobic nanoparticles, fully stirring and uniformly mixing, and performing ultrasonic oscillation to obtain a substrate casting solution with the radiator and the hydrophobic nanoparticles uniformly dispersed;
(II) preparing a refrigeration film: and when the base casting solution reaches the standard viscosity, coating the base casting solution into a film, and drying and forming the film to obtain the self-cleaning radiation-induced cooling film.
3. The method for preparing a self-cleaning radiation-cooled film as claimed in claim 2, wherein the volume ratio of the resin material to the latent solvent in step (I) is 1 (3-5), and the latent solvent is isododecane or xylene.
4. The method according to claim 3, wherein the thickness of the self-cleaning radiation-cooled film obtained in step (II) is 20-500 μm.
5. Use of the self-cleaning radiant cooling film of claim 1 for cooling buildings, photovoltaic cells, cold chain transportation or electronic equipment.
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| CN110042564A (en) * | 2019-04-18 | 2019-07-23 | 东华大学 | A kind of radiation refrigeration tunica fibrosa and its preparation method and application |
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