CN108899292A - A kind of liquid delivery device and transmission method - Google Patents

A kind of liquid delivery device and transmission method Download PDF

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Publication number
CN108899292A
CN108899292A CN201810687989.6A CN201810687989A CN108899292A CN 108899292 A CN108899292 A CN 108899292A CN 201810687989 A CN201810687989 A CN 201810687989A CN 108899292 A CN108899292 A CN 108899292A
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CN
China
Prior art keywords
bye
pass
valve
liquid
delivery device
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CN201810687989.6A
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Chinese (zh)
Inventor
何军
李涛
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to CN201810687989.6A priority Critical patent/CN108899292A/en
Publication of CN108899292A publication Critical patent/CN108899292A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67023Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

This application involves a kind of liquid delivery device and transmission methods.Liquid delivery device is provided with the first monitoring device and the first valve for cleaning or etching array substrate, including the first bye-pass;Second bye-pass, is arranged in parallel with the first branch, is provided with the second valve.The application in the first bye-pass by being provided with monitoring device, monitoring device can monitor the flow of the first bye-pass, when the flow of the first bye-pass is less than or equal to preset flow threshold, first valve closes the first bye-pass, second the second bye-pass of valve opening, so that the second bye-pass continues to transmit liquid.The application can switch transfer conduit according to the flow in transmission device, to guarantee that substrate in the continuity of processing procedure, reduces the fatigue strength of operator.

Description

A kind of liquid delivery device and transmission method
Technical field
This application involves display panel manufacturing technology field, in particular to a kind of liquid delivery device and transmission method.
Background technique
For existing wet etching equipment and cleaning equipment, cleaning or replacement filter, need the staff of profession into Row handwork.In the replacement and washing and cleaning operation of filter, since it is desired that dismantling filter and being provided clearly for cleaning filter Washing lotion, it usually needs 2-3 professional staff's work compounds, because wherein most work is all to need to manually complete, because This needs to expend a large amount of working time to clean or replace filter.In addition, when cleaning or replacement filter, accordingly Wet etching and cleaning equipment need to reduce the utilization rate of equipment in shutdown status.Moreover, taking required for replacement filter With nor regular guest see.As it can be seen that the normal production of above-mentioned cleaning equipment or wet etching equipment to be maintained to need higher production cost.
Summary of the invention
The purpose of the application is to provide a kind of liquid delivery device, and array substrate may be implemented in the processing procedures such as cleaning or etching The continuity that liquid transmits in technical process, to reduce the fatigue strength of operator.
In order to solve the above technical problems, the application the technical solution adopted is that:
A kind of liquid delivery device is used for transmission liquid, and liquid is for cleaning or etching array substrate, liquid transmission dress It sets and includes at least:
First bye-pass is provided with the first monitoring device and the first valve, and the first monitoring device is for monitoring described first The flow of bye-pass;
Second bye-pass, is arranged in parallel with the first branch, is provided with the second valve;
First valve is used to close the first branch pipe when the flow of the first bye-pass is less than or equal to preset flow threshold Road;
Second valve is used to open the second bye-pass when the first valve is closed, and transmits liquid using the second bye-pass.
In order to solve the above technical problems, another technical solution that the application uses is:
A kind of transmission method for liquid delivery device, liquid delivery device is foregoing device, in initial shape Under state, the first bye-pass transmits liquid, and transmission method includes:
The flow of the first bye-pass is monitored by the first monitoring device;
Judge whether the flow of the first bye-pass is less than or equal to preset flow threshold;
If so, close first bye-pass by the first valve, by the second bye-pass described in the second valve opening, with The second bye-pass is set to transmit the liquid.
The beneficial effect of the application is:It is different from the prior art, the application proposes a kind of liquid delivery device and method, liquid Body transmitting device includes the first bye-pass and the second bye-pass, and the first bye-pass includes monitoring device.By in the first bye-pass In be provided with monitoring device, monitoring device can monitor the flow of the first bye-pass, be less than or wait in the flow of the first bye-pass When preset flow threshold, the first bye-pass, by second the second bye-pass of valve opening, second are closed by the first valve Bye-pass continues to transmit liquid, can switch transfer conduit according to the flow in transmission device, thus guarantee the continuity of processing procedure, Reduce the fatigue strength of operator.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of one embodiment of the application liquid delivery device;
Fig. 2 is the structural schematic diagram of the another embodiment of the application liquid delivery device;
Fig. 3 is the apparatus module connection schematic diagram of the application liquid delivery device;
Fig. 4 is the structural schematic diagram of another embodiment of the application liquid delivery device;
Fig. 5 is step flow diagram of the application for the transmission method of liquid delivery device.
Specific embodiment
Below by the technical scheme in the embodiment of the application is clearly and completely described, it is clear that described implementation Example is merely a part but not all of the embodiments of the present application.Based on the embodiment in the application, this field is common Technical staff's every other embodiment obtained without making creative work belongs to the model of the application protection It encloses.
It is worth noting that, the direction term being previously mentioned in the application, for example, "upper", "lower", "front", "rear", " left side ", " right side ", "inner", "outside", " side " etc. are only the directions with reference to annexed drawings, therefore, the direction term used be in order to it is more preferable, Be illustrated more clearly that and understand the application, rather than indicate or imply signified device or element must have a particular orientation, It is constructed and operated in a specific orientation, therefore should not be understood as the limitation to the application.
In the manufacturing process of semiconductor, it is often necessary to etching removal part metals material, insulating materials and semiconductor Material, to form the figure of certain shapes.Etching apparatus is generally divided into wet-method etching equipment and dry etching equipment.For wet Method etching apparatus, it is often necessary to use various etching liquids.In addition, the equipment being commonly used is also in semiconductor fabrication process Cleaning equipment.In order to guarantee the cleanliness of various etching liquids and cleaning solution, usually in the feed system of etching liquid and cleaning solution Filter is set.
The core component of filter is the filtration core of filter, and filter after a period of use, can deposit in filtration core Certain tamper when the tamper of deposition is excessive, can block the mesh of filter, cause liquid before filtration after pressure difference increase Greatly, flow velocity declines.In order to guarantee the normal flow of etching liquid and cleaning solution, fixed time cleaning filter or replacement filtering are needed Device.
By taking the wet etching equipment of etching oxidation silicon as an example, filter one end connects a transmission pump, and transmission pump connects wet etching equipment Phosphoric acid storage box, the other end of filter connects the deposition chamber of the phosphoric acid of a wet etching equipment.When the phosphoric acid warp in above equipment After etching after a period of time, the silica of phosphoric acid etching removal can gradually be gathered in the filtration core of filter, be blocked, At this moment filter is just needed replacing, replacement frequency is usually 1 month 1 time.That is, monthly requiring etching oxidation silicon Wet etching equipment stop, used phosphoric acid filter is all replaced by the staff of profession.
Based on this, referring to Fig. 1, Fig. 1 is a kind of structural schematic diagram for liquid delivery device 100 that the application proposes.Liquid Body transmitting device 100 includes the first bye-pass 111, the second bye-pass 112 and main line 110.Wherein, the first bye-pass 111 It is arranged in parallel with the second bye-pass 112, and is connected to main line 110.
Specifically, it is equipped with the first valve 1111 in the first bye-pass 111, is equipped with the second valve in second branch pipe 112 1121.First valve 1111 is used to control the closing and conducting of the first bye-pass 111, and the second valve 1121 is for controlling second The closing and conducting of road pipe 112.The quantity of first valve 1111 is 2, is separately positioned on the inlet and outlet of the first bye-pass 111 Near;The quantity of second valve 1121 is 2, is separately positioned near the inlet and outlet of the second bye-pass 111.
It during liquid crystal panel manufacture process, is indicated according to the arrow in Fig. 1, liquid needed for processing procedure can pass through main line 110 by any one liquid transmission in the first bye-pass 111 and the second bye-pass 112.
Further, in the present embodiment, the first bye-pass 111 can be common transmission pipeline, and the second bye-pass 112 can be with For standby transport channel.Liquid delivery device 100 further includes the first monitoring device 1113, and the first monitoring device 1113 is for monitoring Flow through the flow of liquid in the first bye-pass 111.When the first monitoring device 1113 monitors to flow through the liquid in the first bye-pass 111 When the flow of body is less than or equal to preset flow threshold, illustrate that some components in the first bye-pass 111 (such as filter Device) it there is a problem, lead to the ability decline for transmitting liquid.
At this point, the first valve 1111 in the first bye-pass 111 will close in order to not influence efficiency of transmission, second The second valve 1121 in pipeline 112 will be opened, so that the transmission process of liquid is not interrupted.In the first bye-pass After 111 switch to the second bye-pass 112, staff can be repaired or replaced the components in the first bye-pass 111.
After the components of the first bye-pass 111 are repaired or replace, staff can be by the transmission path of liquid It is switched back into common the first bye-pass of transmission pipeline 111 from the second bye-pass of standby transport pipeline 112, so that liquid is at first Components in pipeline 111 are without interruption during maintenance and replacement, to ensure that the company that liquid transmits during processing procedure Continuous property, improves process efficiency.
In the present embodiment, monitoring device 1113 can be flowmeter or pressure gauge, and flowmeter can be by monitoring unit Liquid flows through the volume of the first bye-pass 111 to judge the transmittability of the first bye-pass 111 in time;Pressure gauge can pass through Monitoring current liquid flows into the pressure of the first bye-pass 111 generation to judge the transmittability of the first bye-pass 111.
Specifically, the first bye-pass 111 is arranged in close to the position that liquid flows out in monitoring device 1113, can directly monitor Influence of the components to flow rate of liquid in first bye-pass 111;If being arranged in what the first bye-pass 111 was flowed into close to liquid Entrance location, liquid at this time do not flow into the first bye-pass 111 completely, and flow velocity is very fast, it is likely that measurement error occurs.When So, monitoring device also can be set in the second bye-pass 112.
First bye-pass 111 is at the initial stage of transmission liquid, and the ability for transmitting liquid is stronger, and the flow of liquid is very fast, to the The pressure that one bye-pass 111 generates is also larger.With the components aging in the first bye-pass 111 or service life is reached, The transmittability meeting sharp fall of first bye-pass 111, the fluid flow transmitted at this time will reduce, to the first bye-pass 111 pressure generated can also weaken.
Optionally, the transmission liquid in the present embodiment can be selected according to the actual demand during processing procedure.Such as When etching metal wire, transmission liquid can select the nitration mixture of phosphoric acid, nitric acid and acetic acid;Indium tin oxide is etched, liquid is transmitted Oxalic acid liquid can be selected;When cleaning base plate, transmission liquid can select high-purity water.
Optionally, the flow threshold in the present embodiment can require and transmit liquid according to the technique during processing procedure Soda acid characteristic is configured.For example, be that can set 120lpm for flow threshold carrying out cleaning to substrate using pure water, Then when the flow in the first bye-pass 111 is less than 120lpm, then need transmission pipeline being switched to the from the first bye-pass 111 In two transfer conduits 112.
Present applicant proposes a kind of liquid delivery devices, including the first bye-pass and the second bye-pass, by first Monitoring device is provided in pipeline, monitoring device can monitor the flow of the first bye-pass.It is less than in the flow of the first bye-pass Or when being equal to preset flow threshold, the first bye-pass is closed by the first valve, by second the second bye-pass of valve opening, Second bye-pass continues to transmit liquid, can switch transfer conduit according to the flow in transmission device, to guarantee the company of processing procedure Continuous property, reduces the fatigue strength of operator.
Referring to Fig. 2, Fig. 2 is a kind of structural schematic diagram for liquid delivery device 200 that the application proposes.In the present embodiment Liquid delivery device 200 include main line 210 and deposition chamber 250, liquid 220 is transmitted to deposition chamber 250 by main line 210, The substrate 260 to processing procedure is placed in deposition chamber 250, liquid 220 can carry out clearly substrate 260 according to different processing procedure processes It washes or etches.Wherein, main line 210 includes the first bye-pass 211 and the second bye-pass 212 being arranged in parallel, the first branch pipe Road 211 and the second bye-pass 212 are connected to main line 210.
Specifically, the first bye-pass 211 include the first valve 2113 and filter 2112, first filter 2112 for pair The liquid 220 for flowing through the first bye-pass 211 is filtered, and the quantity of the first valve 2113 is 2, is separately positioned on first filter 2112 two sides;Second bye-pass 212 include the second valve 2123 and the second filter 2122, the second filter 2122 for pair The liquid 220 for flowing through the second bye-pass 212 is filtered, and the quantity of the second valve 2123 is also 2, is separately positioned on the second filtering The two sides of device 2122.
Further, liquid delivery device 200 further includes monitoring device 270, and monitoring device 270 can be flowmeter or pressure Meter, is arranged in the transmission path of main line 210, and is located at the first bye-pass 211 and the second bye-pass 212 transmission liquid The rear in 220 directions.Since the first main line 211 and the second bye-pass 212 are only wherein one during transmitting liquid 220 Branch pipe is transmitted, and in this way, monitoring device 270 can monitor the flow in corresponding transmission bye-pass.When So, monitoring device 270 can also be set in the first bye-pass 211 and the second bye-pass 212 respectively.
Further, liquid delivery device 200 further includes controller (not shown), controller respectively with the first valve 2113, Second valve 2123 and monitoring device 270 connect.In the present embodiment, the weight of the first bye-pass 211 and the second bye-pass 212 Identical, the two can be used as common transfer conduit.Therefore, the flow that controller can be monitored according to monitoring device 270 The opening and closing of the first valve 2113 and the second valve 2123 are controlled, to realize transmission liquid 220 in the first bye-pass 211 With the switching in the second bye-pass 212.
Specifically, liquid delivery device 220 in the initial state, the transmission of liquid 220 is carried out by the first bye-pass 211, The first valve 2113 in first bye-pass 211 is opened, and the second valve 2123 in second branch pipe 212 is closed.When first After first filter 2112 in pipeline 211 reaches service life, due to 2112 blocking action of first filter, so that liquid 220 in the first bye-pass 211 transport resistance become larger, flow becomes smaller.When monitoring device 270 monitors to flow through the first bye-pass When the flow of 211 liquid 220 is less than preset flow threshold, controller closes the first valve 2113, opens simultaneously second Valve 2123, so that the transmission path of liquid 220 is switched in the second bye-pass 212 by the first bye-pass 211.Due to second Completely the same in component and the first bye-pass 211 in pipeline 212, liquid delivery device 220 can be in the second bye-pass The transmission of liquid 220 is carried out under 212 transmitting effect.
In some embodiments, liquid delivery device 200 further includes alarm device (not shown), and alarm device connects in controller It connects, alarm device is used to be less than or equal to the flow threshold in the flow of the first bye-pass 211 or the liquid 220 of second branch 212 Signal an alert when value.For example, monitoring that the flow of the first bye-pass 211 is less than preset flow threshold value in monitoring device 270 When, controller controls the first valve 2113 and closes, and the second valve 2123 is opened.Meanwhile controller control alarm device issues alarm Signal, to prompt staff to be replaced the first filter 2112 in replaced first bye-pass 211.
In some embodiments, in order to make staff replacement recognize that the pipeline of current transmission is which item, this implementation Liquid delivery device 200 in example further includes indicator (not shown), and indicator is connected with controller, and controller receives the first valve The status information of the open and close of door 2113 and the second valve 2123, and it is transferred to indicator, indicator, which can be shown, works as forward pass Defeated pipeline information.
Further, the first bye-pass 211 further includes third valve 2111, and the quantity of third valve 2111 is 2, setting first Between valve 2111 and first filter 2112;Second bye-pass 212 further includes the 4th valve 2121, the setting of the 4th valve 2121 Between the second valve 2123 and the second filter 2122.In the present embodiment, third valve 2111 and the 4th valve 2121 are hand Movable valve leads to 2123 handover failure of the first valve 2113 and the second valve, causes not cutting off for preventing controller out of control The problem of transmitting branch pipe.And the first valve 2113 and the second valve 2123 in the present embodiment are either automatic-switching type valve Door can also carry out automation synchronously control to all valves by controlling program.
Certainly, valve used herein, including the first valve 2113, the second valve 2123,2111 and of third valve 4th valve 2121 can as long as being that by the valve of effective switch control, the operation for not influencing Integral cleaning system To be that independent two-way valve is also possible to combined three-way valve.
Further, in the present embodiment, liquid delivery device 220 further comprise transmission pump 230 and with storage box 240, pass Defeated pump 230 is arranged in the transmission path of main line 210, and for providing power source, storage box 240 for the transmission of liquid 220 It is connect with one end of main line 210, for storing liquid 220, provides supply source for liquid delivery device 220.
It is worth noting that, the liquid delivery device processing in the application includes interchangeable filter, can also include Other interchangeable components.Especially in the use process of transmission acidic liquid, some devices in bye-pass are easily damaged Bad or consumptive material needs to be replaced frequently, it is often necessary to and suspend liquid transmission and is replaced or repaired, it can be fine by the application Ground solves the technical problem.
Present applicant proposes a kind of liquid delivery devices, including main line, are used for transmission liquid, and wherein main line includes the One bye-pass and the second bye-pass, by being arranged monitoring device in main line, monitoring device can monitor the first bye-pass or The flow of second bye-pass passes through corresponding valve when the flow of a wherein bye-pass is less than or equal to preset flow threshold Door closes the bye-pass, and by another bye-pass of another unlatching, another bye-pass continues to transmit liquid, can be according to transmission Flow in equipment automatically switches transfer conduit, while can replace to the device in the transfer conduit of replacement, to protect The continuity for demonstrate,proving processing procedure, reduces the fatigue strength of operator.
In order to more clearly describe the connection relationship of controller and all parts in the application, referring to FIG. 3, Fig. 3 is this A kind of apparatus module connection schematic diagram of the liquid delivery device proposed in application.In the present embodiment, liquid delivery device 300 Including connect respectively with controller 370 the first monitoring device 310, the first valve 320, the second valve 330, the second monitoring device 340, indicator 350 and alarm device 360.The specific structure of liquid delivery device 300 will not repeat them here, and can refer to upper one Embodiment.
Specifically, the first monitoring device 310 is located in the first bye-pass, monitors the flow of the first bye-pass, the first valve 320 are located in the first bye-pass, for controlling conductor and the closing of the first pipeline;Second monitoring device 340 is located at the second branch pipe Lu Zhong monitors the flow of the second bye-pass, and the second valve 330 is located in the second bye-pass, for controlling the conductor of the second pipeline And closing.Alarm device 360 and indicator 350 can be set in the main body of liquid delivery device 300, can also be separately provided.
Further, the data on flows respectively monitored is sent to control by the first monitoring device 310 and the second monitoring device 340 Device 370 processed, controller 370 control the first valve according to the data on flows that the first monitoring device 310 and the second monitoring device are fed back 320 and second valve 330 switch state, and switch state can be sent to control by the first valve 320 and the second valve 330 Device 370 processed, controller can show switch state on indicator 350, to show the first bye-pass and the second bye-pass Transmission state.The data on flows control that controller 370 can also be fed back according to the first monitoring device 310 and the second monitoring device 340 Whether alarm device 360 processed issues alarm signal.
Certainly, the present embodiment only lists the case where controller 370 controls other components respectively, in other embodiments In, controller 370 can save or be located inside other elements.Specifically, the first valve 320 and the second valve 330 can be with It for automatic valve, can directly be connect with the first monitoring device and the second monitoring device, alarm device 360 and indicator can also be straight It connects and is connect with the first valve 320 and the second valve 330, directly carry out the transmission of signal, without by the way that controller 370 is additionally arranged It is controlled.
Further, referring to Fig. 4, Fig. 4 is a kind of structural schematic diagram for liquid delivery device 400 that the application proposes.Liquid Body transmitting device 400 includes main line 410, storage box 440 and deposition chamber 450, and main line 410 includes the first bye-pass 411, the Two bye-passes 412, third bye-pass 413 and the 4th bye-pass 414.Liquid 420 passes through the first bye-pass from storage box 440 411 or second bye-pass 412 filter after, be transmitted in deposition chamber 450, and by deposition chamber 450 to substrate 460 carry out cleaning or The liquid 220 of post-etch residue is exported, and is transmitted to storage box 440 by third bye-pass 413 or the 4th bye-pass 414. The concrete operating principle of switching about each bye-pass can refer to previous embodiment, and therefore not to repeat here.
Specifically, liquid delivery device 400 further includes the first transmission pump 430 and the second transmission pump 490, the first transmission pump 430, which are mainly used for liquid 420 pumping from storage box 440, comes out and is delivered to deposition chamber 450, and the second transmission pump 490 is main For extracting the liquid 420 of cleaning or post-etch residue from deposition chamber 450, by third bye-pass 413 and the 4th branch pipe Liquid 420 is delivered to storage box 440 by the filtration in road 414 again.In this way liquid can be realized during processing procedure 420 recycling, to have the function that save the cost.
Further, liquid delivery device 400 further includes the first monitoring device 470 and the second monitoring device 480, the first monitoring Device 470 and the second monitoring device 480 are similarly disposed in main line 410.First monitoring device 470 is mainly used for monitoring first Flow in bye-pass 411 and the second bye-pass 412, the second monitoring device 480 are mainly used for monitoring third bye-pass 413 and the Flow in four bye-passes 414.
Significantly, since cleaning and etched rear 420 impurity of residual liquid are certainly more than before, therefore the Filter in three bye-passes 413 and the 4th bye-pass 414 can be chosen according to the actual situation.Meanwhile in the application The quantity of bye-pass also can be adjusted according to the actual situation, it is not limited to only include two branches.
It is worth noting that, each embodiment is only schematic diagram in the application, the shape and structure of actual product is not represented, Those skilled in the art can be adjusted according to the actual situation and design, but all should belong to the protection scope of the application.
Referring to Fig. 5, the step process that Fig. 5 is a kind of transmission method for liquid delivery device that the application proposes is shown It is intended to.This method is suitable for foregoing liquid delivery device, specifically includes:
S100:The flow of the first bye-pass is monitored by the first monitoring device.
Specifically, the first monitoring device can be located at the main line being connected in the first bye-pass or with the first bye-pass In, the first monitoring device can be flowmeter or pressure gauge, flow through liquid in the first bye-pass by cooling water of units of measurement time Volume or the pressure of generation, can obtain the transmittability in the first bye-pass.
S200:Judge that the flow of the first bye-pass is less than or equal to preset flow threshold.
Specifically, the flow threshold in the present embodiment can require and transmit liquid according to the technique during processing procedure Soda acid characteristic is configured.For example, be that can set 120lpm for flow threshold carrying out cleaning to substrate using pure water, Then when the flow in the first bye-pass is less than 120lpm, then need transmission pipeline being switched to the second transmission from the first bye-pass In pipeline.
S300:If so, first bye-pass is closed by first valve, by described in second valve opening Second bye-pass, so that second bye-pass transmits the liquid.
Specifically, since the first valve is arranged in the first bye-pass, the second valve is arranged in the second bye-pass, is sentencing The transmittability of disconnected first bye-pass drops to be unable to normal transmission liquid after, need that the first valve in the first bye-pass will be located at Door is closed, so that the transmission of the first bye-pass is closed, while opening the second valve in the second bye-pass is located at, so that liquid It can continue to transmit by the second bye-pass.
In conclusion the application proposes a kind of liquid delivery device and method, liquid delivery device includes the first bye-pass With the second bye-pass, by being provided with monitoring device in the first bye-pass, monitoring device can monitor the stream of the first bye-pass Amount.When the flow of the first bye-pass is less than or equal to preset flow threshold, the first bye-pass is closed by the first valve, is led to Second the second bye-pass of valve opening is crossed, the second bye-pass continues to transmit liquid, can be automatic according to the flow in transmission device Switch transfer conduit, while the device in the transfer conduit of replacement can be replaced, to guarantee the continuity of processing procedure, is dropped The fatigue strength of low operator.
The foregoing is merely presently filed embodiments, are not intended to limit the scope of the patents of the application, all to utilize this Equivalent structure or equivalent flow shift made by application specification and accompanying drawing content, it is relevant to be applied directly or indirectly in other Technical field similarly includes in the scope of patent protection of the application.

Claims (10)

1. a kind of liquid delivery device, which is characterized in that be used for transmission liquid, the liquid is for cleaning or etching array base Plate, the liquid delivery device include at least:
First bye-pass is provided with the first monitoring device and the first valve, and first monitoring device is for monitoring described first The flow of bye-pass;
Second bye-pass is arranged in parallel with the first branch, is provided with the second valve;
First valve is used for when the flow of first bye-pass is less than or equal to preset flow threshold, described in closing First bye-pass;
Second valve is used to open second bye-pass when first valve is closed, and utilizes second bye-pass Transmit the liquid.
2. liquid delivery device according to claim 1, which is characterized in that the liquid delivery device further includes control Device, the controller are connect with first monitoring device, first valve and second valve, and the controller is used for When the flow of first bye-pass is less than or equal to preset flow threshold, controls first valve opening and control simultaneously Second valve is closed.
3. liquid delivery device according to claim 2, which is characterized in that second bye-pass is equipped with the second monitoring dress It sets, second monitoring device is connect with the controller, and second monitoring device is for monitoring second bye-pass Flow;The controller is used to control first valve when the flow of second bye-pass is less than the flow threshold First bye-pass is opened, and controls second valve and closes second bye-pass, is passed using first bye-pass The defeated liquid.
4. liquid delivery device according to claim 3, which is characterized in that first bye-pass further comprises first Filter, second bye-pass further comprise the second filter, and the first filter and second filter are used for The liquid is filtered.
5. liquid delivery device according to claim 4, which is characterized in that first bye-pass further comprises third Valve, the third valve is between first valve and the first filter;Second bye-pass further wraps The 4th valve is included, the 4th valve is between second valve and second filter.
6. liquid delivery device according to claim 1, which is characterized in that the liquid delivery device further includes instruction Device, the indicator are used to indicate the transmission state of first bye-pass and second bye-pass.
7. liquid delivery device according to claim 1, which is characterized in that the liquid delivery device further includes alarm Device, the alarm device are used to generate when first bye-pass or the flow of second branch are less than or equal to the flow threshold Alarm signal.
8. liquid delivery device according to claim 1, which is characterized in that the liquid delivery device further includes main line And transmission pump, first bye-pass and second bye-pass are connected to the main line, the transmission pump is set to institute It states in the transmission path of main line.
9. liquid delivery device according to claim 1, which is characterized in that the liquid delivery device further includes that liquid is deposited Storage tank, the liquid storage box are connect with the main line, and the liquid storage box is for storing liquid.
10. a kind of transmission method of liquid delivery device, which is characterized in that the liquid delivery device is such as claim 1 to 9 Described in any item devices, in the initial state, first bye-pass transmit the liquid, the method includes:
The flow of first bye-pass is monitored by first monitoring device;
Judge whether the flow of first bye-pass is less than or equal to preset flow threshold;
If so, closing first bye-pass by first valve, pass through the second branch pipe described in second valve opening Road, so that second bye-pass transmits the liquid.
CN201810687989.6A 2018-06-28 2018-06-28 A kind of liquid delivery device and transmission method Pending CN108899292A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6533927B1 (en) * 1999-11-17 2003-03-18 Sodick Co., Ltd. Liquid feeder for electrodischarge machining
CN203034101U (en) * 2013-01-14 2013-07-03 英利集团有限公司 Parallel liquid supply system employing wet etching
CN105478398A (en) * 2015-12-11 2016-04-13 武汉华星光电技术有限公司 Washing unit
CN207137497U (en) * 2017-07-03 2018-03-27 四川中雅科技有限公司 A kind of filter pipeline system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6533927B1 (en) * 1999-11-17 2003-03-18 Sodick Co., Ltd. Liquid feeder for electrodischarge machining
CN203034101U (en) * 2013-01-14 2013-07-03 英利集团有限公司 Parallel liquid supply system employing wet etching
CN105478398A (en) * 2015-12-11 2016-04-13 武汉华星光电技术有限公司 Washing unit
CN207137497U (en) * 2017-07-03 2018-03-27 四川中雅科技有限公司 A kind of filter pipeline system

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Application publication date: 20181127