CN108878249B - Pulse penning discharge plasma generating device - Google Patents
Pulse penning discharge plasma generating device Download PDFInfo
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- CN108878249B CN108878249B CN201810658135.5A CN201810658135A CN108878249B CN 108878249 B CN108878249 B CN 108878249B CN 201810658135 A CN201810658135 A CN 201810658135A CN 108878249 B CN108878249 B CN 108878249B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Abstract
A pulse penning discharge plasma generating device belongs to the field of material surface modification. The plasma generator comprises a plasma generating part, a vacuum chamber, a workbench, a high-voltage pulse power supply, a time sequence control circuit, a first adjustable resistor, a second adjustable resistor and a vacuum system. And starting the time sequence control circuit after the vacuum chamber reaches the working pressure, forming space discharge in the penning anode and in a region opposite to the cathode and the auxiliary anode when the magnetic field intensity reaches a set value to obtain discharge plasma, axially expanding the discharge plasma under the constraint of the magnetic field, and acting on the surface of the workpiece after the discharge plasma passes through the auxiliary anode. The plasma generating part and the workpiece are relatively independent, and the influence of the workpiece on the generation of the plasma can be ignored in the generating process of the discharge plasma; the distribution density of the discharge plasma and the action strength of the discharge plasma on the workpiece can be adjusted, and the method is suitable for surface modification of various materials.
Description
Technical Field
The invention belongs to the field of material surface modification, and relates to a pulse penning discharge plasma generating device.
Background
In the existing material surface modification technology, the material surface modification technology realized by means of a plasma method has the advantages of high efficiency, energy conservation, environmental protection and the like, and the technology has been developed into the leading-edge field of the current material science. The common characteristic of the surface modification processes is that active energy-carrying ions are generated by plasma discharge, and the energy, density distribution and motion trail of the active energy-carrying ions can be controlled by an electric field and a magnetic field. When the plasma interacts with the surface of a workpiece, element distribution, tissue morphology and physicochemical changes in an energy action area of the surface layer of the material are initiated, and the surface modification of the material is realized.
How to fully exert the advantages of the plasma discharge method in the material surface modification and develop a reasonably used material surface modification process and equipment depends on the energy characteristics and the working mode of a designed device. Compared with other discharge methods, penning discharge has the following advantages: the structure of no filament, the power system is simple; the working life is long in the active gas, and the reliability is high; stable discharge can be realized in a large vacuum range. Most of the existing penning discharge devices are used for film preparation, ion implantation and the like by means of ion source generation; a few discharge devices used for surface modification technology exploration have the problems of small plasma discharge caliber, weak beam current, limited energy input range and the like. In the earlier stage of the subject group, a pulse penning discharge large-caliber plasma generating device is developed, and space discharge is formed in a penning anode and in a region opposite to a cathode and a workbench, so that a small part of conductive materials can be subjected to better surface modification. However, in practical application, the following defects are found:
(1) the discharge is formed in the penning anode and in the interval opposite to the cathode and the workbench, so that the material, the surface appearance and the structure of the workpiece can directly influence the generation and the distribution of the plasma;
(2) the workpiece with magnetic conductivity can interfere the parallel magnetic field and influence the directionality of plasma;
(3) the plasma density distribution of the discharge channel is not adjustable.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides a pulse penning discharge plasma generating device. The plasma generating part of the device is relatively independent from a workpiece, the density distribution of the generated plasma is adjustable, the whole structure is compact, the operation is stable, the reliability is high, and the device is suitable for effective surface modification of various materials such as insulation materials, electric conduction materials and the like.
In order to achieve the purpose, the invention adopts the technical scheme that:
a pulse penning discharge plasma generating device comprises a plasma generating part 1, a workbench 2, an adjustable resistor I3, an adjustable resistor II 4, a vacuum chamber 5, a vacuum system 6, a high-voltage pulse power supply 7 and a time sequence control circuit 8. The plasma generating section 1 and the stage body 3 are installed inside the vacuum chamber 2.
The plasma generating part 1 comprises a magnetic field coil 1-1, a circular support frame 1-2, a penning anode 1-3, a cathode 1-4 and an auxiliary anode 1-5, and is arranged in the vacuum chamber 2. The magnetic field coil 1-1 is fixed on the outer circle of the circular ring type support frame 1-2; the cathode 1-4 and the auxiliary anode 1-5 are oppositely arranged at two ends of an inner hole of the circular support frame 1-2, the penning anode 1-3 is arranged between the cathode 1-4 and the auxiliary anode 1-5, and the working voltage of the penning anode 1-3 is led out from the end part of the vacuum chamber 5 through an insulated wire and high-voltage sealed insulation and is connected with the output end of the high-voltage pulse power supply 7. The magnetic field coil 1-1 consists of two closely wound coils which are arranged in parallel, and the magnetic field coil 1-1 provides a magnetic field parallel to the axis of the vacuum chamber to restrain the discharge plasma 9 from axially expanding. The cathodes 1-4 are embedded into a copper conducting rod, and the conducting rod is grounded after being connected with an adjustable resistor I3; and the auxiliary anodes 1 to 5 are connected with the second adjustable resistor 4 and then grounded.
The workbench 2 is arranged at the front ends of the auxiliary anodes 1-5 and is grounded through an insulated wire; the distance between the workbench 2 and the auxiliary anode 1-5 is adjustable and ranges from 100 mm to 150mm, and in the process of generating the discharge plasma 9, the workpiece 10 is arranged outside the plasma generating part 1, so that the influence on the discharge plasma 9 can be ignored. The workpiece 10 is arranged above the workbench 2, and the surface of the workpiece 10 to be modified is just opposite to the leading-out position of the discharge plasma 9 of the auxiliary anode 1-5.
The vacuum chamber 5 is grounded through an insulated wire and is connected with the vacuum system 6, so that the required working pressure in the vacuum chamber 5 is ensured.
The time sequence control circuit 8 controls the high-voltage pulse power supply 7 to be started and operated in sequence, the high-voltage pulse power supply 7 respectively provides independent high-voltage outputs for the magnetic field coil 1-1 and the penning anode 1-3, the polarity is positive, and the two high-voltage outputs can be continuously adjusted according to the specific treatment process requirements.
The resistance values of the first adjustable resistor 3 and the second adjustable resistor 4 are respectively adjusted, so that the current value of the discharge plasma 9 flowing through the cathode 1-4 and the auxiliary anode 1-5 after generation can be adjusted, the current value corresponds to the distribution density of the discharge plasma 9, namely, the distribution density of the discharge plasma 9, the action strength and the extension distance of the discharge plasma 9 on the workpiece 10 can be adjusted by adjusting the resistance values of the first adjustable resistor 3 and the second adjustable resistor 4, and the surface modification with different requirements can be adapted.
And starting the time sequence control circuit 8, and forming space discharge in the penning anode 1-3 and in a region opposite to the cathode 1-4 and the auxiliary anode 1-5 when the magnetic field intensity reaches a set value to obtain discharge plasma 9. The discharge plasma 9 expands along the axial direction under the restraint of the magnetic field, and the plasma 9 passes through the filament-shaped grid mesh of the auxiliary anode 1-5 and then acts on the surface of the workpiece 10 on the workbench 2. The discharge process is weakened to be extinguished along with the voltage drop of the penning anode 1-3. The high-voltage pulse power supply 7 charges by itself and waits for the time sequence control circuit 8 to start working again.
Through the following settings, the device provided by the invention can generate discharge plasma with the magnetic field intensity of 0.5T, the penning discharge voltage of 5000V, the magnetic field coil voltage of 3000V, the time delay error of a time sequence control circuit of +/-0.2 us, the discharge duration of-500 us, the repeated working frequency of 0.1-0.5Hz, the diameter of 60-120mm and adjustable density distribution.
The penning anode 1-3 is a thin-wall stainless steel circular ring with the diameter of 60-120 mm. The cathodes 1-4 are made of common electrode materials including stainless steel, red copper or graphite fibers and are made into blocky structures with the diameters of 60-120mm and the thicknesses of 15-30 mm. The auxiliary anode 1-5 is a thin wire grid structure with a symmetrical structure, the diameter is 60-120mm, and the auxiliary anode is made of molybdenum, stainless steel and the like. The vacuum chamber 5 is made of stainless steel material.
The vacuum system 6 comprises an air inlet pipeline 6-1, an air outlet pipeline 6-2, a vacuum pump 6-3, a gas flowmeter 6-4 and a gas storage bottle 6-5; one end of an air inlet pipeline 6-1 is connected with the vacuum chamber 5, the other end of the air inlet pipeline is connected with an air storage bottle 6-5 after passing through an air flow meter 6-4, and two ends of an air outlet pipeline 6-2 are respectively connected with the vacuum chamber 5 and a vacuum pump 6-3. The flow of working gas such as argon, nitrogen or hydrogen can be controlled by the vacuum system 6 to make the vacuum chamber 5 reach the required working pressure.
The high-voltage pulse power supply 7 provides 3000V high-voltage output for the magnetic field coil 1-1 and 5000V high-voltage output for the penning anode 1-3 respectively.
The invention has the beneficial effects that:
(1) through reasonable structure and electrical design, the plasma generation part and the workpiece are relatively independent, and in the generation process of the discharge plasma, the workpiece is arranged outside the plasma generation part, so that the influence on the plasma generation part can be ignored.
(2) The distribution density of the discharge plasma, the action strength of the discharge plasma on the workpiece and the extension distance are adjustable, and the method is not only suitable for modifying conductive materials, but also suitable for modifying the surfaces of insulating materials.
(3) The diameter of the discharge plasma reaches 60-120mm, and the treatment of a large processing surface can be realized at one time. And a repetitive pulse working mode is adopted, so that the over-high requirement on the power supply power is reduced, and meanwhile, the melting and evaporation of materials caused by the accumulation of heat on the surface of the anode are avoided.
Drawings
FIG. 1 is a schematic structural diagram of a pulse penning discharge plasma generating device;
FIG. 2 is a view showing the construction of an auxiliary anode;
in the figure: 1 a plasma generating section; 1-1 magnetic field coil; 1-2 ring type supporting frames; 1-3 penning anode; 1-4 cathodes; 1-5 auxiliary anodes; 2, a workbench; 3, an adjustable resistor I; 4, an adjustable resistor II; 5, a vacuum chamber; 6, a vacuum system; 6-1 air inlet pipeline; 6-2 of an air outlet pipeline; 6-3 vacuum pumps; 6-4 gas flow meter; 6-5 gas cylinders; 7 high-voltage pulse power supply; 8 a time sequence control circuit; 9 discharging the plasma; 10 workpiece.
Detailed Description
The invention will be described in more detail below with reference to the accompanying drawings, but the invention is not limited thereto.
The pulse penning discharge plasma generating device comprises a plasma generating part 1, a workbench 2, an adjustable resistor I3, an adjustable resistor II 4, a vacuum chamber 5, a vacuum system 6, a high-voltage pulse power supply 7 and a time sequence control circuit 8. The plasma generating section 1 and the stage body 3 are installed in the vacuum chamber 2.
The plasma generating part 1 consists of a magnetic field coil 1-1, a circular support frame 1-2, a penning anode 1-3, a cathode 1-4 and an auxiliary anode 1-5, and the part is arranged in the vacuum chamber 2. The magnetic field coil 1-1 is fixed on the outer circle of the circular ring type support frame 1-2; the cathode 1-4 and the auxiliary anode 1-5 are oppositely arranged at two ends of an inner hole of the circular support frame 1-2, and the penning anode 1-3 is arranged between the cathode 1-4 and the auxiliary anode 1-5.
The magnetic field coil 1-1 is composed of two closely wound coils which are arranged in parallel, and the magnetic field coil 1-1 provides a magnetic field which is parallel to the axis of the vacuum chamber and restrains the discharge plasma 9 from axially expanding.
The penning anode 1-3 is a thin-wall stainless steel circular ring with the diameter of 80 mm. The working voltage of the penning anode 1-3 is led out from the end part of the vacuum chamber 5 through an insulated wire and high-voltage sealed insulation and is connected to the output end of a high-voltage pulse power supply 7.
The cathodes 1-4 can be made of common electrode materials, including stainless steel, red copper or graphite fiber, and are made into blocks with the diameter of 80mm and the thickness of 20mm, and the blocks are embedded into a copper conducting rod, and the conducting rod is grounded after being connected with an adjustable resistor I3.
The auxiliary anodes 1 to 5 are of a fine wire grid structure with a symmetrical structure, the diameter of the fine wire grid structure is 80mm, the auxiliary anodes 1 to 5 are made of molybdenum, stainless steel and the like, and the auxiliary anodes 1 to 5 are grounded after being connected with the adjustable resistor II 4.
The workbench 2 is arranged at the front end of the auxiliary anode 1-5 and is grounded through an insulated wire; the distance between the workbench 2 and the auxiliary anode 1-5 is adjustable and is 120 mm.
The vacuum chamber 5 is made of stainless steel material and is grounded through an insulated wire; the vacuum system 6 consists of an air inlet pipeline 6-1, an air outlet pipeline 6-2, a vacuum pump 6-3, a gas flowmeter 6-4 and a gas storage bottle 6-5; one end of an air inlet pipeline 6-1 is connected with the vacuum chamber 5, the other end of the air inlet pipeline is connected with an air storage bottle 6-5 after passing through an air flow meter 6-4, and two ends of an air outlet pipeline 6-2 are respectively connected with the vacuum chamber 5 and a vacuum pump 6-3. The flow of working gas such as argon, nitrogen or hydrogen can be controlled by the vacuum system 6 to make the vacuum chamber 5 reach the required working pressure.
The high-voltage pulse power supply 7 respectively provides independent high-voltage outputs of 3000V and 5000V for the magnetic field coil 1-1 and the penning anode 1-3, wherein 3000V is used for supplying voltage to the magnetic field coil 1-1, 5000V is used for applying voltage to the penning anode 1-3, and the polarity of the voltage is positive.
The timing control circuit 8 operates the sequential on operation of the high-voltage pulse power supply 7. The resistance values of the first adjustable resistor 3 and the second adjustable resistor 4 are respectively adjusted, so that the current value flowing through the cathode and the auxiliary anode after the discharge plasma 9 occurs can be adjusted, the current value corresponds to the distribution density of the discharge plasma, and the distribution density of the discharge plasma 9 can be adjusted by adjusting the resistance values of the first adjustable resistor 3 and the second adjustable resistor 4; meanwhile, the action strength and the extension distance of the discharge plasma 9 on the workpiece 10 can be directly adjusted by adjusting the resistance value of the adjustable resistor II 4 so as to adapt to surface modification with different requirements.
The device can generate magnetic field intensity of 0.5T, penning discharge voltage of 5000V, time sequence circuit delay error of +/-0.2 us, discharge duration of 500us and repeated working frequency of 0.1-0.5 Hz; the diameter is 60-120mm, and the distribution density of the discharge plasma 9 can be adjusted.
The working process of the device is as follows:
(1) adjusting the resistance values of the first adjustable resistor 3 and the second adjustable resistor 4 according to the specific requirements of surface modification of the workpiece 10;
(2) cleaning the workpiece, fixing the workpiece 10 on the workbench 2, and leading out the surface of the workpiece 10 to be modified from the discharge plasma 9 of the auxiliary anode 1-5.
(3) Starting the vacuum pump 6-3 to pump the vacuum chamber 5 to the background vacuum of 7.0 multiplied by 10-3Pa; and opening the gas storage bottle 6-5, filling argon gas through the gas inlet pipeline 6-1, and controlling the working vacuum pressure through the gas flowmeter 6-4.
(4) And setting the voltage parameter of the high-voltage pulse power supply 7, and storing the electric energy in an energy storage device to reach a preset value.
(5) The on operation of the high-voltage pulse power supply 7 is operated by the timing control circuit 8.
(6) The magnetic field coil 1-1 passes through the current to form a confined magnetic field parallel to the axes of the cathode 1-4 and the auxiliary anode 1-5.
(7) When the current of the magnetic field coil 1-1 reaches a set value, plasma discharge is formed inside the penning anode 1-5 and in a relative interval between the cathode 1-4 and the auxiliary anode 1-5, a large-caliber discharge plasma 9 is obtained, and the discharge plasma 9 extends along the axis to penetrate through the auxiliary anode 1-5 and then acts on the surface of the workpiece 10.
(8) And (3) finishing the discharge of the penning anode 1-5, automatically charging the high-voltage pulse power supply 7, and waiting for the re-starting action of the time sequence control circuit 8.
The above-mentioned embodiments only express the embodiments of the present invention, but not should be understood as the limitation of the scope of the invention patent, it should be noted that, for those skilled in the art, many variations and modifications can be made without departing from the concept of the present invention, and these all fall into the protection scope of the present invention.
Claims (5)
1. A pulse penning discharge plasma generating device is characterized by comprising a plasma generating part (1), a workbench (2), an adjustable resistor I (3), an adjustable resistor II (4), a vacuum chamber (5), a vacuum system (6), a high-voltage pulse power supply (7) and a time sequence control circuit (8); the plasma generating part (1) and the workbench (3) are independently arranged in the vacuum chamber (2);
the plasma generating part (1) comprises a magnetic field coil (1-1), a circular support frame (1-2), a penning anode (1-3), a cathode (1-4) and an auxiliary anode (1-5), and the plasma generating part is arranged inside the vacuum chamber (2); the magnetic field coil (1-1) is fixed on the excircle of the circular ring type support frame (1-2); the cathode (1-4) and the auxiliary anode (1-5) are oppositely arranged at two ends of an inner hole of the circular support frame (1-2), the penning anode (1-3) is arranged between the cathode (1-4) and the auxiliary anode (1-5), and the working voltage of the penning anode (1-3) is led out from the end part of the vacuum chamber (5) through an insulated wire and high-voltage sealed insulation and is connected with the output end of a high-voltage pulse power supply (7); the magnetic field coil (1-1) consists of two closely wound coils which are arranged in parallel, the magnetic field coil (1-1) provides a magnetic field parallel to the axis of the vacuum chamber, and the discharge plasma (9) is restrained to expand axially; the cathodes (1-4) are embedded into a copper conducting rod, and the conducting rod is grounded after being connected with an adjustable resistor I (3); the auxiliary anode (1-5) is connected with the second adjustable resistor (4) and then grounded; the distribution density of the discharge plasma (9), the action strength of the discharge plasma (9) on the workpiece (10) and the extension distance are adjusted by adjusting the resistance values of the adjustable resistor I (3) and the adjustable resistor II (4) so as to adapt to surface modification with different requirements;
the workbench (2) is not contacted with the auxiliary anode (1-5), is arranged at the front end of the auxiliary anode (1-5), and is grounded through an insulated wire; a workpiece (10) is arranged above the workbench (2), and the surface of the workpiece (10) to be modified is opposite to the discharge plasma (9) leading-out position of the auxiliary anode (1-5); in the process of generating the discharge plasma (9), because the workpiece (10) is outside the plasma generating part (1), the influence on the discharge plasma (9) is ignored;
the vacuum chamber (5) is grounded through an insulated wire and is connected with a vacuum system (6); the time sequence control circuit (8) controls the high-voltage pulse power supply (7) to be started and operated in sequence, and the high-voltage pulse power supply (7) respectively provides independent high-voltage outputs for the magnetic field coil (1-1) and the penning anode (1-3);
starting a time sequence control circuit (8), and when the magnetic field intensity reaches a set value, forming space discharge in the penning anode (1-3) and in a region opposite to the cathode (1-4) and the auxiliary anode (1-5) to obtain discharge plasma (9); the discharge plasma (9) expands along the axial direction under the restraint of the magnetic field, and the plasma (9) passes through the filament-shaped grid mesh of the auxiliary anode (1-5) and then acts on the surface of the workpiece (10) on the workbench (2); when the voltage of the penning anode (1-3) is reduced, the discharge process is weakened to be extinguished; the high-voltage pulse power supply (7) is charged automatically and waits for the time sequence control circuit (8) to start to work again;
the penning anode (1-3) is a stainless steel ring with the diameter of 60-120 mm; the cathode (1-4) is a common electrode material and is of a blocky structure with the diameter of 60-120mm and the thickness of 15-30 mm; the auxiliary anode (1-5) is of a thin wire grid structure with a symmetrical structure, the diameter of the auxiliary anode is 60-120mm, and the auxiliary anode is made of molybdenum and stainless steel; the vacuum chamber (5) is made of stainless steel material.
2. A pulsed penning discharge plasma generating device according to claim 1, characterized in that the distance between the working platform (2) and the auxiliary anode (1-5) is adjustable and is 100-150 mm.
3. A pulsed penning discharge plasma generating device according to claim 1 or 2, characterized in that the vacuum system (6) comprises an air inlet pipe (6-1), an air outlet pipe (6-2), a vacuum pump (6-3), a gas flow meter (6-4), a gas bomb (6-5); one end of an air inlet pipeline (6-1) is connected with the vacuum chamber (5), the other end of the air inlet pipeline is connected with an air storage bottle (6-5) after passing through a gas flowmeter (6-4), and two ends of an air outlet pipeline (6-2) are respectively connected with the vacuum chamber (5) and a vacuum pump (6-3); the flow of working gas such as argon, nitrogen, hydrogen and the like can be controlled by the vacuum system (6) to ensure that the required working pressure in the vacuum chamber (5) is achieved.
4. A pulsed penning discharge plasma generating device according to claim 1 or 2, characterised in that the high voltage pulse power supply (7) provides a high voltage output of 3000V for the magnetic field coil (1-1) and a high voltage output of 5000V for the penning anode (1-3), respectively.
5. A pulsed penning discharge plasma generating device according to claim 3, wherein the high voltage pulse power supply (7) provides 3000V high voltage output for the magnetic field coil (1-1) and 5000V high voltage output for the penning anode (1-3), respectively.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005089272B1 (en) * | 2004-03-15 | 2006-11-02 | Terje Asbjorn Skotheim | Pulsed cathodic arc plasma source |
| CN101582367A (en) * | 2009-06-15 | 2009-11-18 | 大连理工大学 | Pulse type large beam spot electronic beam generating device |
| CN102024658A (en) * | 2009-09-22 | 2011-04-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing equipment and method |
| CN103118478A (en) * | 2013-01-18 | 2013-05-22 | 大连理工大学 | Pulse penning discharge big-aperture plasma generating device |
| CN106847661A (en) * | 2017-01-24 | 2017-06-13 | 北京丹华科技发展有限公司 | A kind of plasma source and coating machine |
| CN107949899A (en) * | 2015-09-25 | 2018-04-20 | 株式会社日立高新技术 | Ion milling device |
-
2018
- 2018-06-19 CN CN201810658135.5A patent/CN108878249B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005089272B1 (en) * | 2004-03-15 | 2006-11-02 | Terje Asbjorn Skotheim | Pulsed cathodic arc plasma source |
| CN101582367A (en) * | 2009-06-15 | 2009-11-18 | 大连理工大学 | Pulse type large beam spot electronic beam generating device |
| CN102024658A (en) * | 2009-09-22 | 2011-04-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma processing equipment and method |
| CN103118478A (en) * | 2013-01-18 | 2013-05-22 | 大连理工大学 | Pulse penning discharge big-aperture plasma generating device |
| CN107949899A (en) * | 2015-09-25 | 2018-04-20 | 株式会社日立高新技术 | Ion milling device |
| CN106847661A (en) * | 2017-01-24 | 2017-06-13 | 北京丹华科技发展有限公司 | A kind of plasma source and coating machine |
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