CN108876865A - A kind of depicting method of the micro-structure texture based on fm screening processing image - Google Patents
A kind of depicting method of the micro-structure texture based on fm screening processing image Download PDFInfo
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- CN108876865A CN108876865A CN201810631272.XA CN201810631272A CN108876865A CN 108876865 A CN108876865 A CN 108876865A CN 201810631272 A CN201810631272 A CN 201810631272A CN 108876865 A CN108876865 A CN 108876865A
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- 238000000034 method Methods 0.000 title claims abstract description 53
- 238000012216 screening Methods 0.000 title claims abstract description 36
- 238000012545 processing Methods 0.000 title claims abstract description 30
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 12
- 238000011161 development Methods 0.000 claims abstract description 7
- 238000012360 testing method Methods 0.000 claims description 17
- 238000009792 diffusion process Methods 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000000047 product Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000011549 displacement method Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
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- 238000001259 photo etching Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T9/00—Image coding
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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Abstract
The present invention discloses a kind of depicting method of micro-structure texture based on fm screening processing image, includes the following steps：（1）The secondary gray level image of input one, and fm screening processing is carried out to image；（2）Setting improves the mutually isostructural micro-structure of brightness at site；（3）Using exposure development method by step（2）Identified micro-structure is portrayed to photoresist sheet.A kind of micro-structure texture depicting method based on fm screening processing image according to the present invention is had size be determined micro-structure according to brightness and resolution ratio, is replaced handling obtained site by fm screening using the micro-structure.The micro-structure of each site is identical, indicates image by the density degree of micro-structure.So that image product more simple and effective made by micro-structure texture depicting method, and to be formed by pattern relatively sharp for prepared decorating film.
Description
Technical field
The present invention relates to technical field of image processing, the quarter of especially a kind of micro-structure texture based on fm screening processing
Drawing method.
Background technique
In LED or the electronic product of other imagings, it is sometimes desirable to which it can show special effect of shadow.Conventional
Production method step is relatively complicated, at high cost, low efficiency, and the image product with Peculiar Photographs effect made is not clear enough
It is clear.And the light luminance that the present image product with Peculiar Photographs effect is issued is higher, to the detrimental effect of human eye
It is larger.
Summary of the invention
It is and existing the object of the present invention is to provide a kind of depicting method of micro-structure texture based on fm screening processing image
Some image processing methods is different, and can relatively simple efficient production there is the image product of Peculiar Photographs effect.
In order to solve the above technical problems, the object of the present invention is achieved like this：
A kind of depicting method of micro-structure texture based on fm screening processing image according to the present invention, including it is as follows
Step：
(1) the secondary gray level image of input one, and fm screening processing is carried out to image；
(2) the mutually isostructural micro-structure for improving brightness is set at site；
(3) micro-structure determined by step (2) is portrayed to photoresist sheet using exposure development method.
As a further illustration of the above scheme, the algorithm of fm screening used in the step (1) is calculated using shake
Method or error diffusion algorithm.
As a further illustration of the above scheme, it is characterized in that, the micro-structure is orthopyramid, circle in step (2)
One of cone or dome-type.
As a further illustration of the above scheme, it is characterized in that, the bottom surface side length of the pyramid micro-structure is setting point
The size of pixel under resolution；The diameter of the bottom surface of the circular cone and dome-type micro-structure is the size for setting pixel under resolution ratio.
As a further illustration of the above scheme, the determination method of pyramid or circular cone depth is：It determines brightness range, makes
Test board, full version arrangement pyramid or circular cone on test board, so that pyramid or circular cone when brightness reaches maximum value in brightness range
Depth, the depth of as required pyramid or circular cone.
The beneficial effects of the invention are as follows：A kind of micro-structure texture based on fm screening processing image according to the present invention
Depicting method, according to brightness and resolution ratio determined micro-structure have size, replaced using the micro-structure by frequency modulation
The obtained site of screening processing.The micro-structure of each site is identical, indicates image by the density degree of micro-structure.So that
Image product more simple and effective made by micro-structure texture depicting method, and prepared decorating film is formed by pattern
It is relatively sharp.
Detailed description of the invention
Fig. 1 is former gray level image.
Fig. 2 is the gray level image after one fm screening of embodiment；
Fig. 3 is the image inserted micro-structure behind site.
Specific embodiment
Present invention will be further explained below with reference to the attached drawings and specific examples.
A kind of depicting method of micro-structure texture based on fm screening processing image according to the present invention, including it is as follows
Step：
(1) the secondary gray level image of input one, and fm screening processing is carried out to image；The gray level image inputted is by colour
Image passes through gradation conversion method, colors image into grayscale image.Used method be include floating-point method, integer side
All gradation conversion methods including method, displacement method and qualitative modeling.
(2) the mutually isostructural micro-structure for improving brightness is set at site.I.e. the bed-plate dimension of micro-structure and depth are equal
It is identical, it arranges according to the distribution of site.The bed-plate dimension and concentration of micro-structure and its arrangement mode constitute micro-structure
Full page data.
(3) micro-structure determined by step (2) is portrayed to photoresist sheet using exposure development method.By micro-structure
Full page data are input to litho machine, and litho machine receives above-mentioned data and automatically processes, and in output to photoresist sheet, are formed with recessed
The photoresist sheet for falling into micro-structure, obtains final product.Used photoresist sheet is the glass plate that surface is coated with photosensitive layer.
In above-mentioned step (1), the algorithm of used fm screening uses dither algorithm or error diffusion algorithm.It is used
Dither algorithm include orderly dither algorithm and unordered dither algorithm.
In above-mentioned step (2), the micro-structure is one of orthopyramid, circular cone or dome-type.The pyramid is micro-
The bottom surface side length of structure is to set the size of pixel under resolution ratio；The circular cone and the diameter of the bottom surface of dome-type micro-structure are to set
Determine the size of pixel under resolution ratio.
In above scheme, the determination method of pyramid or circular cone depth is：It determines brightness range, makes test board, test board
Upper full version arrangement pyramid or circular cone, so that the depth of pyramid or circular cone when brightness reaches maximum value in brightness range, as institute
The depth of the pyramid or circular cone that need.
Embodiment one
A kind of depicting method of micro-structure texture based on fm screening processing image involved in this embodiment, before this
The secondary gray level image of input one, the gray level image of input are to be colored image by color image by gradation conversion method
Grayscale image.Used method is all gray scales including floating-point method, integer method, displacement method and qualitative modeling
Conversion method.Fm screening processing is carried out to the gray level image of input.The algorithm of used fm screening in the present embodiment
It is using Bayer dither algorithm in ordered dither algorithm, the dither matrix of the dither algorithm is：
The gray level image inputted is handled according to above-mentioned dither algorithm, is made of the identical site of size, with
The density of site indicates image.
In the position of each site, replaced using identical micro-structure.Micro-structure is orthopyramid in the present embodiment, excellent
It is selected as positive rectangular pyramid.The size of positive rectangular pyramid includes the side length and depth of bottom surface, and the depth for the positive rectangular pyramid being previously mentioned is the bottom of at
Under the premise of face side length determines, apex angle is can be used to indicate in depth, and apex angle is formed by opposite flank by vertex and direction
The angle of bottom surface.
According to the needs of the fine degree of image, the resolution ratio of image is typically chosen in 500-1000dpi.In this embodiment
In be selected as 508dpi, i.e. per inch has 508 pixels.The positive rectangular pyramid of micro-structure selection in the present embodiment, positive rectangular pyramid
The side length of bottom surface is the size of each pixel, and the size of pixel is 25400um/508=50um.
The determination of just tetragonous apex angle involved in this embodiment is as follows：Successively make a series of 30mm*
The test board of 30mm, the size rectangular pyramid that full version arrangement bottom surface side length is 50um on every piece of test board, the depth of positive rectangular pyramid by
Big to take different values to small, the set depth for being equipped with positive rectangular pyramid is identical on each test board.And it determines through the bright of test board
The brightness of each test board is tested in degree, observation, and the apex angle of positive rectangular pyramid is positive four in the present embodiment when reaching maximum brightness value
The apex angle of pyramid, when the bottom surface side length and apex angle of positive rectangular pyramid determine, the structure of positive rectangular pyramid is uniquely determined.In this implementation
The apex angle of positive rectangular pyramid is 160 DEG C in example.
The data such as positive rectangular pyramid bottom surface side length and apex angle are input in litho machine, are exposed the method for development in photoetching
The photoresist sheet with concave microstructure is formed on offset plate, obtains final product.In the present embodiment, photoresist sheet is surface
It is coated with the glass plate of photosensitive layer.
Embodiment two
A kind of depicting method of micro-structure texture based on fm screening processing image involved in this embodiment, before this
The secondary gray level image of input one, the gray level image of input are to be colored image by color image by gradation conversion method
Grayscale image.Used method is all gray scales including floating-point method, integer method, displacement method and qualitative modeling
Conversion method.Fm screening processing is carried out to the gray level image of input.The algorithm of used fm screening in the present embodiment
It is using Halftone dither algorithm in ordered dither algorithm, the dither matrix of the dither algorithm is：
The gray level image inputted is handled according to above-mentioned dither algorithm, is made of the identical site of size, with
The density of site indicates image.
In the position of each site, replaced using identical micro-structure.Micro-structure is circular cone in the present embodiment.Circular cone
Size include bottom surface diameter and depth, the depth of the circular cone being previously mentioned is under the premise of bottom surface side length determines, depth
Apex angle can be used to indicate.
According to the needs of the fine degree of image, the resolution ratio of image is typically chosen in 500-1000dpi.In this embodiment
In be selected as 1000dpi, i.e. per inch has 1000 pixels.The circular cone of micro-structure selection in the present embodiment, circular cone bottom surface
Diameter is the size of each pixel, and the size of pixel is 25400um/1000=25.4um.
The determination of just tetragonous apex angle involved in this embodiment is as follows：Successively make a series of 30mm*
The test board of 30mm, the circular cone that full version arrangement basal diameter is 25.4um on every piece of test board, the depth of circular cone take from large to small
Different values, the set depth for being equipped with circular cone is identical on each test board.And the determining brightness by test board, observation test are every
The brightness of a test board, the apex angle of circular cone is the apex angle of circular cone in the present embodiment when reaching maximum brightness value, when the bottom of circular cone
When face side length and apex angle determine, the structure of circular cone is uniquely determined.The apex angle of circular cone is 150 DEG C in the present embodiment.
The data such as circular cone bottom surface side length and apex angle are input in litho machine, are exposed the method for development in photoresist sheet
It is upper to form the photoresist sheet with concave microstructure, obtain final product.In the present embodiment, photoresist sheet is coated with for surface
The glass plate of photosensitive layer.
Embodiment three
A kind of depicting method of the micro-structure texture based on fm screening processing image involved in the present embodiment, with implementation
The difference of example is that the fm screening algorithm to the gray level image processing inputted is CoaresFatting dither algorithm, is trembled
Dynamic matrix is：
According to the needs of the fine degree of image, the resolution ratio of image is typically chosen in 500-1000dpi.In this embodiment
In be selected as 500dpi, i.e. per inch has 500 pixels.The positive hexagonal pyramid of micro-structure selection in the present embodiment, positive hexagonal pyramid
The side length of bottom surface is the size of each pixel, and the size of pixel is 25400um/500=50.8um.
The big of positive hexagonal pyramid apex angle is determined according to the method that apex angle in embodiment one determines further according to the requirement of brightness
Small, the size of positive hexagonal pyramid apex angle is 120 DEG C in the present embodiment
Its exposure development method is identical as embodiment one, embodiment two.
Example IV
A kind of depicting method of the micro-structure texture based on fm screening processing image involved in the present embodiment, with implementation
The difference of example one is that the fm screening algorithm to the gray level image processing inputted for global pseudo-random dither algorithm, shakes square
The numerical value that battle array is is using Prime Modulus multiplicative congruential method.Other middle square methods, multiply congruential generator, combination multiplicative congruential method be applicable in
In the present invention.
According to the needs of the fine degree of image, the resolution ratio of image is typically chosen in 500-1000dpi.In this embodiment
In be selected as 1000dpi, i.e. per inch has 1000 pixels.Micro-structure is selected as dome-type in the present embodiment, and dome-type is micro-
The diameter of structure floor is the size of each pixel, and the size of pixel is 25400 um/1000=25.4um, due to for hemisphere
Type, depth are also radius.
Embodiment five
A kind of depicting method of the micro-structure texture based on fm screening processing image involved in the present embodiment, with implementation
The difference of example two is that the fm screening algorithm to the gray level image processing inputted is error diffusion algorithm, selected to be
Floy-Steinberg algorithm, error diffusion way are as follows：
● 7
3 5 1
Selected micro-structure is identical as embodiment two as the size of micro-structure.
Other error diffusion algorithms, for example, Burkes algorithm, Jarris-Judice-Ninke algorithm, Stucki algorithm,
Multidigit error diffusion algorithm etc. is suitable for the present invention.
The preferred embodiment of the present invention has been described in detail above.It should be appreciated that those skilled in the art without
It needs creative work according to the present invention can conceive and makes many modifications and variations.Therefore, all technologies in the art
Personnel are available by logical analysis, reasoning, or a limited experiment on the basis of existing technology under this invention's idea
Technical solution, all should be within the scope of protection determined by the claims.
Claims (5)
1. a kind of depicting method of the micro-structure texture based on fm screening processing image, which is characterized in that include the following steps：
(1) the secondary gray level image of input one, and fm screening processing is carried out to image；
(2) the mutually isostructural micro-structure for improving brightness is set at site；
(3) micro-structure determined by step (2) is portrayed to photoresist sheet using exposure development method.
2. the depicting method of the micro-structure texture as described in claim 1 based on fm screening processing image, which is characterized in that
The algorithm of fm screening used in the step (1) uses dither algorithm or error diffusion algorithm.
3. the depicting method of the micro-structure texture as described in claim 1 based on fm screening processing image, which is characterized in that
In step (2), the micro-structure is one of orthopyramid, circular cone or dome-type.
4. the depicting method of the micro-structure texture as claimed in claim 3 based on fm screening processing image, which is characterized in that
The bottom surface side length of the pyramid micro-structure is to set the size of pixel under resolution ratio；The bottom surface of the circular cone and dome-type micro-structure
Diameter be set resolution ratio under pixel size.
5. the depicting method of the micro-structure texture based on fm screening processing image as described in claim 3 or 4, feature exist
In the determination method of pyramid or circular cone depth is：Determine brightness range, make test board, on test board full version arrangement pyramid or
Circular cone, so that the depth of pyramid or circular cone when brightness reaches maximum value in brightness range, as required pyramid or circular cone
Depth.
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| CN201810631272.XA CN108876865A (en) | 2018-06-19 | 2018-06-19 | A kind of depicting method of the micro-structure texture based on fm screening processing image |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0734151A1 (en) * | 1995-03-22 | 1996-09-25 | Agfa-Gevaert N.V. | Size modulated stochastic screening |
| CN103052511A (en) * | 2010-08-25 | 2013-04-17 | 伊斯曼柯达公司 | Flexographic printing members |
| CN105631810A (en) * | 2016-01-20 | 2016-06-01 | 北京邮电大学 | Printing method and printing system based on pixel gridding dot multiplexing |
-
2018
- 2018-06-19 CN CN201810631272.XA patent/CN108876865A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0734151A1 (en) * | 1995-03-22 | 1996-09-25 | Agfa-Gevaert N.V. | Size modulated stochastic screening |
| CN103052511A (en) * | 2010-08-25 | 2013-04-17 | 伊斯曼柯达公司 | Flexographic printing members |
| CN105631810A (en) * | 2016-01-20 | 2016-06-01 | 北京邮电大学 | Printing method and printing system based on pixel gridding dot multiplexing |
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