CN108873622A - Sided exposure machine and double-faced exposure method - Google Patents
Sided exposure machine and double-faced exposure method Download PDFInfo
- Publication number
- CN108873622A CN108873622A CN201810836043.1A CN201810836043A CN108873622A CN 108873622 A CN108873622 A CN 108873622A CN 201810836043 A CN201810836043 A CN 201810836043A CN 108873622 A CN108873622 A CN 108873622A
- Authority
- CN
- China
- Prior art keywords
- exposure
- loading
- exposed
- components
- workbench
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 21
- 230000001953 sensory effect Effects 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 6
- 230000001360 synchronised effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004579 marble Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to a kind of sided exposure machine and double-faced exposure methods.Sided exposure machine includes workbench；Exposure mechanism includes that can form exposure region along the first exposure components of movable workbench and the second exposure components and in workbench；Loader mechanism includes loading stage, and loading stage is equipped with the first loading part and the second loading part, and in spacing setting, loading stage along movable workbench and can make the first loading part or the second loading part be moved to exposure region for the first loading part and the second loading part.Pass through the setting of moveable first exposure components and the second exposure components, when exposure, loading stage is moved to predeterminated position, make the first loading part or the second loading station in exposure region, later the first exposure components and the second exposure components it is mobile, to be exposed to corresponding first part to be exposed or the second part to be exposed, due to double-sided exposure simultaneously, avoid the operation such as overturning, the problems such as reducing exposure process and contraposition, improve exposure efficiency and exposure accuracy.
Description
Technical field
The present invention relates to double-sided exposure technical fields, more particularly to a kind of sided exposure machine and double-faced exposure method.
Background technique
Traditional sided exposure machine generallys use the exposure that film transfer carries out double-sided PCB.Before exposure, need first to make
Make the film of pattern to be transferred；Then, it will be separately fixed on upper and lower surface glass with the two-sided patterned film；Then, will
The circuit board of pattern to be transferred is clipped between two blocks of glass up and down, is exposed using bluish violet higher source luminance, by line map
Case is transferred on wiring board, completes double-sided exposure.And for laser direct-writing exposure machine, generally use single side exposure.First to circuit
Plate is wherein exposed on one side, is overturn, is then exposed again to the another side of circuit board, finally after the completion of to be exposed
Complete the double-sided exposure to circuit board.
However, turning operation need to be carried out when laser direct-writing exposure machine carries out double-sided exposure, and turning operation will necessarily generate
The problem of being aligned after overturning not only increases exposure process, while also can influence exposure accuracy because of aligning accuracy problem, from
And influence final exposure effect.
Summary of the invention
Based on this, it is necessary to provide a kind of sided exposure machine and double-faced exposure method.The sided exposure machine is being exposed
Shi Wuxu overturning, reduces exposure process, improves exposure accuracy, and then promote exposal image-forming quality；The double-faced exposure method application
In sided exposure machine above-mentioned, exposure efficiency is higher, and is easy to implement automatic operation.
Its technical solution is as follows：
On the one hand, a kind of sided exposure machine, including workbench are provided, workbench is equipped with exposure through-hole；Exposure mechanism exposes
Ray machine structure includes the first exposure components and the second exposure components, and the first exposure components and the second exposure components are respectively arranged on workbench
Two sides and can be moved along movable workbench, the first exposure components and the second exposure components and workbench formed expose
Light area, exposure region are correspondingly arranged with exposure through-hole；And loader mechanism, loader mechanism include loading stage, loading stage is equipped with the first dress
Load portion and the second loading part, for the first loading part for loading the first part to be exposed, the second loading part is to be exposed for loading second
Part, the first loading part and the second loading part are arranged in spacing, and loading stage along movable workbench and can make the first loading part or the
Two loading parts are moved to exposure region, the first exposure components and the movement of the second exposure components and to the first parts to be exposed of exposure region
Or second part to be exposed be exposed.
Above-mentioned sided exposure machine, by the setting of moveable first exposure components and the second exposure components, when exposure, dress
Microscope carrier is moved to predeterminated position, makes the first loading part or the second loading station in exposure region, later the first exposure components and second
Exposure components are mobile, to be exposed to corresponding first part to be exposed or the second part to be exposed, due to double-sided exposure simultaneously,
The problems such as avoiding the operation such as overturning, reducing exposure process and contraposition, improves exposure efficiency and exposure accuracy.
Technical solution is illustrated further below：
Exposure mechanism further includes exposure mounting rack and exposure driver, the first exposure components in one of the embodiments,
It is set to exposure mounting rack with the second exposure components, exposure driver is for driving exposure mounting rack and making to expose mounting rack edge
Movable workbench.
Exposure mechanism further includes the first mounting rack, the second mounting rack, the first driver and in one of the embodiments,
Two drivers, the first exposure components are set to the first mounting rack, and the second exposure components are set to the second mounting rack, and the first driver is used for
Drive the first mounting rack along movable workbench, the second driver is for driving the second mounting rack along movable workbench.
In one of the embodiments, loader mechanism further include load driver, load driver for drive loading stage,
And make loading stage along movable workbench.
Loader mechanism further includes lock in one of the embodiments, and lock is for locking loading stage and making first
Loading part or the second loading station are in exposure region.
It in one of the embodiments, further include sensing mechanism, sensing mechanism includes the first sensory package and the second sensing
Component, the first sensory package be used for detect the first exposure components shift position and the second exposure components shift position, second
Sensory package is used to detect the shift position of loading stage.
The first exposure components and the second exposure components are moved along workbench in a first direction in one of the embodiments,
Dynamic, loading stage moves in a first direction along workbench；Or first exposure components and the second exposure components along workbench second
Direction is mobile, and loading stage is moved along workbench in third direction.
Loading stage is equipped with the first guide rail in one of the embodiments, and workbench is equipped with first cooperated with the first guide rail
Sliding slot.
It in one of the embodiments, further include Mechanizm for taking and putting material, Mechanizm for taking and putting material includes the first fetching device and the
Two fetching devices, the first fetching device are used to pick and place the first part to be exposed of the first loading part, and the second fetching device is for picking and placing the second dress
The part to be exposed of the second of load portion.
On the other hand, a kind of double-faced exposure method is additionally provided, can be applied to as described in any one above-mentioned technical solution
Sided exposure machine, include the following steps：
(S1), the first exposure components are located at the first initial position, and the second exposure components are located at the second initial position, loading stage
Positioned at the second exposure position, the first part to be exposed is loaded in the first loading part of loading stage；
(S2), loading stage is moved to the first exposure position and the first part to be exposed is made to be located at exposure region；
(S3), the first exposure components be moved to the first predeterminated position and the second exposure components be moved to the second predeterminated position,
And the first part to be exposed is exposed, obtains the first exposure finished product；The second part to be exposed is loaded in the second loading part simultaneously；
(S4), loading stage is moved to the second exposure position and the second part to be exposed is made to be located at exposure region；
(S5), the first exposure components be moved to the first initial position and the second exposure components be moved to the second initial position,
And the second part to be exposed is exposed, obtains the second exposure finished product；The first exposure finished product, simultaneously of the first loading part is unloaded simultaneously
Load the next first part to be exposed；
(S6), loading stage is moved to the first exposure position, and unloads the second exposure finished product of the second loading part.
Above-mentioned double-faced exposure method can simultaneously expose the tow sides of the first part to be exposed or the second part to be exposed
Light, and the first part to be exposed expose while carry out the second part to be exposed loading or be completed exposure second exposure finished product into
Row unloading, improves time availability, improves exposure efficiency, and be easy to implement automatic operation.
Detailed description of the invention
Fig. 1 is the exposure process figure of double-faced exposure method in embodiment；
Fig. 2 is the overall structure main view of sided exposure machine in embodiment；
Fig. 3 is the overall structure top view of sided exposure machine in embodiment.
Attached drawing marks explanation：
100, workbench, 110, exposure region, the 121, first mounting rack, the 122, second mounting rack, the 210, first exposure components,
220, the second exposure components, 300, loading stage, the 310, first loading part, the 320, second loading part.
Specific embodiment
The embodiment of the present invention is described in detail with reference to the accompanying drawing：
It should be noted that it can be directly in another element when alleged element is with another element " fixation " in text
Above or there may also be elements placed in the middle.When an element is considered as with another element " connection ", it be can be directly
It is connected to another element in succession or may be simultaneously present centering elements.On the contrary, when element is referred to as " directly existing " another element
When "upper", intermediary element is not present.Term as used herein "vertical", "horizontal", "left" and "right" and similar table
It states for illustrative purposes only, is not meant to be the only embodiment.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention
The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more
Any and all combinations of relevant listed item.
Embodiment as shown in Figure 1 to Figure 3, provides a kind of sided exposure machine, including workbench 100, and workbench 100 is set
There is exposure through-hole；Exposure mechanism, exposure mechanism include the first exposure components 210 and the second exposure components 220, the first exposure components
210 and second exposure components 220 be respectively arranged on the two sides of workbench 100 and can be moved along workbench 100, first exposure
Component 210 and the second exposure components 220 move and form exposure region 110, exposure region 110 and exposure through-hole in workbench 100
It is correspondingly arranged；And loader mechanism, loader mechanism include loading stage 300, loading stage 300 is equipped with the first loading part 310 and the second dress
Load portion 320, the first loading part 310 are used to load the second part to be exposed for loading the first part to be exposed, the second loading part 320,
First loading part 310 and the second loading part 320 are arranged in spacing, and loading stage 300 can move along workbench 100 and make first
Loading part 310 or the second loading part 320 are moved to exposure region 110, the first exposure components 210 and the second exposure components 220 it is mobile,
And the first part to be exposed or the second part to be exposed of exposure region 110 are exposed.
By the setting of moveable first exposure components 210 and the second exposure components 220, when exposure, loading stage 300 is moved
Predeterminated position is moved, so that the first loading part 310 or the second loading part 320 is located at exposure region 110, later the first exposure components 210
With the movement of the second exposure components 220, to be exposed to corresponding first part to be exposed or the second part to be exposed, due to simultaneously
The problems such as double-sided exposure avoids the operation such as overturning, reduces exposure process and contraposition improves exposure efficiency and exposure essence
Degree.
Traditional laser direct-writing exposure machine can only single side exposure, cannot simultaneously double-sided exposure, also needed after having exposed one side
It overturns, to carry out the exposure of another side, due to needing to overturn, not only process flow is more, and overturns holding time waste, exposure
Low efficiency, and also aligned after overturning, it is easy to influence exposure accuracy because of aligning accuracy problem；Meanwhile the two-sided exposure of tradition
Light mostly uses the film to transfer, and film production is same to increase process flow, and film cost of manufacture is high, and the film is after a period of use
It must also replace.
In the present embodiment, the first exposure components 210 and the second exposure components 220 are respectively provided at the two sides of workbench 100, work
Make platform 100 setting exposure through-hole enable the first exposure components 210 and the second exposure components 220 sending light by and
The specific region of workbench 100 forms exposure region 110, to make the first part to be exposed or the second dress on the first loading part 310
The second part to be exposed in load portion 320 is able to carry out exposure when being located at exposure region 110；Simultaneously as 210 He of the first exposure components
Second exposure components 220 can be mobile in workbench 100, so that loading stage 300 be made to be moved to the first exposure position or the
When two exposure positions, by the mobile realization of the first exposure components 210 and the second exposure components 220 to the first part to be exposed or
The double-sided exposure of two parts to be exposed, exposure efficiency is higher, and exposure accuracy is also higher.
Further, as shown in Fig. 2, the first exposure components 210 and the second exposure components 220 are respectively provided at workbench 100
Two sides up and down and in being correspondingly arranged, here be correspondingly arranged pair for referring to be formed exposure region 110 and carrying out double-sided exposure
It should be arranged, those skilled in the art can be accordingly arranged according to mode is specifically correspondingly arranged in the prior art, no longer superfluous here
It states.
In addition, it is necessary to explanation, since the first part to be exposed or the second part to be exposed are when exposure region 110 is exposed
The light that the light and the second exposure components 220 that the first exposure components 210 need to be made to issue issue reaches the first part to be exposed or second
Part to be exposed, therefore, the first loading part 310 or the second loading part 320 should be equipped with the exposure front and back sides for making the first part to be exposed
The overseas leakage of front and back sides exposure region 110 of region or the second part to be exposed, to meet the requirement of exposure.Such as the first loading part 310
It is arranged in frame structure, the outline border that the first part to be exposed is located at the first loading part 310 makes luminous energy so that the middle part of frame is unobstructed
The front and back sides region for enough exposing to the first part to be exposed carries out normal front and back sides exposure；For another example the first loading part 310 is to load
The set-up modes such as through slot, this is the structure that those skilled in the art must be configured as needed, and can be used, which can satisfy, sets
Any prior art for setting requirement is specifically arranged, and which is not described herein again.
Further, loading stage 300 can be wholely set, and can also be equipped with two parts, and a part is loaded for being arranged first
Portion 310, the second loading part 320 is arranged in another part, and two parts are fixed together and to form loading stage 300, to realize first
The synchronizing moving of loading part 310 and the second loading part 320.
As with the embodiments shown in figures 2 and 3, exposure mechanism further includes exposure mounting rack and exposure driver, the first exposure
Component 210 and the second exposure components 220 are set to exposure mounting rack, and exposure driver is for driving exposure mounting rack and making to expose
Light mounting rack is moved along workbench 100.
In the embodiment, the first exposure components 210 and the second exposure components 220 are each provided on exposure mounting rack, work as exposure
When driver driving exposure mounting rack is mobile, exposure mounting rack drives the first exposure components 210 and the second exposure components 220 simultaneously
It is moved, improves the mobile synchronization accuracy of the first exposure components 210 and the second exposure components 220, improve exposure accuracy.
As with the embodiments shown in figures 2 and 3, exposure mechanism further includes the first mounting rack 121, the second mounting rack 122, first
Driver and the second driver, the first exposure components 210 are set to the first mounting rack 121, and the second exposure components 220 are set to the second peace
122 are shelved, the first driver is for driving the first mounting rack 121 to move along workbench 100, and the second driver is for driving second
Mounting rack 122 is moved along workbench 100.
As shown in Figures 2 and 3, in the embodiment, the first mounting rack 121 and the second mounting rack 122 are independently arranged, and first drives
Dynamic device drives the first mounting rack 121 mobile and drives the first exposure components 210 mobile, and the second driver drives the second mounting rack
122 mobile and drive the second exposure components 220 movements.
Here, those skilled in the art can be made by the way of control as needed the first driver and the second driver into
Row matching, so that the first exposure components 210 realize that moving direction is synchronous with movement speed with the second exposure components 220.
Certainly, as needed, those skilled in the art can also be such that the first driver and second drives by way of control
Dynamic device is matched, so that the moving direction of the first exposure components 210 and the second exposure components 220 is on the contrary, such as the first of top
Exposure components 210 are from left to right exposed the upper face of the first part to be exposed towards moving right；And the second exposure group of lower part
Part 220 is exposed the lower face of the first part to be exposed, to meet actual needs, here not from right to left towards moving left
It repeats again.
In addition, marble can be selected in specific select in exposure mounting rack, the first mounting rack 121 and the second mounting rack 122
Beam structure.
On the basis of any of the above-described a embodiment, loader mechanism further includes loading driver, loads driver for driving
Dynamic loading stage 300 simultaneously moves loading stage 300 along workbench 100.
On the basis of any of the above-described a embodiment, loader mechanism further includes lock, and lock is for locking loading stage
300 and the first loading part 310 or the second loading part 320 is made to be located at exposure region 110.
When loading stage 300 is moved to the first exposure position, the first loading part 310 is located at exposure region 110, and subsequent first exposes
Optical assembly 210 and the movement of the second exposure components 220 are simultaneously exposed the first part to be exposed of the first loading part 310, and first
310 position of loading part is constant, and lock locking loading stage 300 is arranged at this time move loading stage 300 can not, to guarantee first
The position of loading part 310 is constant, i.e. the first part to be exposed on the first loading part 310 is motionless, thus during post-exposure
Avoiding the first part to be exposed from shaking influences exposure accuracy；After the completion of the first part exposure to be exposed, lock, which unclamps, to be loaded
Platform 300, so that loading stage 300 be made to continue to act in next step.
Further, lock can be holding device, be also possible to other locking devices.
Further include sensing mechanism on the basis of any of the above-described a embodiment, sensing mechanism include the first sensory package and
Second sensory package, the first sensory package are used to detect shift position and second exposure components 220 of the first exposure components 210
Shift position, the second sensory package are used to detect the shift position of loading stage 300.
On the basis of any of the above-described a embodiment, the first exposure components 210 and the second exposure components 220 are along workbench
100 move in a first direction, and loading stage 300 moves in a first direction along workbench 100.
As shown in Figures 2 and 3, the first exposure components 210 and 220 synchronizing moving of the second exposure components and left and right directions shifting
It is dynamic, and loading stage 300 similarly moves in left and right directions.
When exposure, the first loading part 310 loads the first part to be exposed, and loading stage 300 moves to left, and is located at the first part to be exposed
Exposure region 110, the first exposure components 210 and the second court of exposure components 220 move right and expose to the first part to be exposed
Light, meanwhile, the second loading part 320 loads the second part to be exposed, and after the completion of the first part exposure to be exposed, loading stage 300 moves to right, makes
Second part to be exposed is located at exposure region 110, and the first exposure components 210 and the second court of exposure components 220 move left and to second
Part to be exposed is exposed, while unloading the first exposure finished product that exposure is completed, and load the next first part to be exposed, so
Circulation carries out.
It is, of course, also possible to be：First exposure components 210 and the second exposure components 220 are along workbench 100 in second direction
Mobile, loading stage 300 is moved along workbench 100 in third direction.
Optionally：First exposure components 210 and the second exposure components 220 fill along 100 front and back synchronizing moving of workbench
Microscope carrier 300 is moved left and right along workbench 100.
When exposure, the first loading part 310 loads the first part to be exposed, and loading stage 300 moves to left, and is located at the first part to be exposed
The synchronous Forward of exposure region 110, the first exposure components 210 and the second exposure components 220 simultaneously exposes the first part to be exposed
Light, meanwhile, the second loading part 320 loads the second part to be exposed, and after the completion of the first part exposure to be exposed, loading stage 300 moves to right, makes
Second part to be exposed is located at exposure region 110, the first exposure components 210 and the second exposure components 220 synchronize move back and to second
Part to be exposed is exposed, while unloading the first exposure finished product that exposure is completed, and load the next first part to be exposed, so
Circulation carries out.
On the basis of any of the above-described a embodiment, loading stage 300 is equipped with the first guide rail, and workbench 100 is equipped with and first
The first sliding groove of guide rail cooperation.
First guide rail and first sliding groove not only act as the effect that loading stage 300 cooperates movement with workbench 100 that is easy to implement,
The kinetic stability of loading stage 300 can also be further increased and guarantee that the position of the first part to be exposed and the second part to be exposed is steady
It is qualitative, to improve exposure precision.
It further include Mechanizm for taking and putting material on the basis of any of the above-described a embodiment, Mechanizm for taking and putting material takes including first
Device and the second fetching device are put, the first fetching device is used to pick and place the first part to be exposed of the first loading part 310, and the second fetching device is used for
Pick and place the second part to be exposed of the second loading part 320.
Further, the first fetching device and the second fetching device select manipulator, and are respectively arranged on the left and right two of workbench 100
Side moves left and right realization automatic operation with cooperate loading stage 300, it is horizontal to improve automatic operation.
On the basis of any of the above-described a embodiment, the first exposure components 210 include the first exposed part and the second exposed part,
First exposed part is equipped with multiple first light source parts, and first light source part be arranged in spacing and sets in a row, and the second exposed part is equipped with more
A second light source part, second light source part be arrangeds in spacing and set in a row, first light source part and second light source part be set side by side,
And in the gap position pair being arranged between position and two second light source parts for being arranged in a staggered manner, making a first light source part
It answers；Second exposure components 220 can be similarly arranged, and which is not described herein again.
As shown in figure 3, the first exposure components 210 include the first exposed part and the second exposed part, the first exposed part and second
Exposed part is juxtaposed to the left and righ setting, is set on the first exposed part there are six first light source part and sets in a row, set on the second exposed part
There are six second light source part and set in a row, the first exposed part and the second exposed part are in being arranged in a staggered manner setting for i.e. the first exposed part
Set the setting height that height is higher than the second exposed part, thus make first light source part on the first exposed part respectively with the second exposed part
Setting position between upper two neighboring second light source part is corresponding, the first light source part exposure in exposure, on the first exposed part
Exposure figure is collectively formed in exposed portion splicing between part and second light source part, thus realize that single exposure can be completed,
Splice without multiple exposure, improves exposure efficiency.
Optionally, the first exposure components 210 and the second exposure components 220 form maskless exposure system (Digital
Micromirror Device, abbreviation DMD exposure system), maskless exposure system is amplified image by projection objective, is realized
Disposable exposure, the first light source part of DMD exposure system and the arrangement quantity of second light source part are determined according to the size of exposing patterns
Fixed, exposure accuracy is higher.
Embodiment as shown in Figure 1 additionally provides a kind of double-faced exposure method, can be applied to such as any one above-mentioned implementation
Sided exposure machine described in example, includes the following steps：
(S1), the first exposure components 210 are located at the first initial position, and the second exposure components 220 are located at the second initial position,
Loading stage 300 is located at the second exposure position, loads the first part to be exposed in the first loading part 310 of loading stage 300；
(S2), loading stage 300 is moved to the first exposure position and the first part to be exposed is made to be located at exposure region 110；
(S3), the first exposure components 210 are moved to the first predeterminated position and the second exposure components 220 are moved to second in advance
If position is simultaneously exposed the first part to be exposed, obtains the first exposure finished product；Second is loaded in the second loading part 320 simultaneously
Part to be exposed；
(S4), loading stage 300 is moved to the second exposure position and the second part to be exposed is made to be located at exposure region 110；
(S5), the first exposure components 210 are moved to the first initial position and the second exposure components 220 are moved at the beginning of second
Beginning and is exposed the second part to be exposed, obtains the second exposure finished product position；The first of the first loading part 310 is unloaded simultaneously
Exposure finished product simultaneously loads the next first part to be exposed；
(S6), loading stage 300 is moved to the first exposure position, and unloads the second exposure finished product of the second loading part 320.
The tow sides of the first part to be exposed or the second part to be exposed can be exposed simultaneously, and the first part to be exposed
While exposure carry out the second part to be exposed loading or be completed exposure second exposure finished product unloaded, improve the time
Utilization rate improves exposure efficiency, and is easy to implement automatic operation.
It should be noted that the step of here (S1) to step (S6) be for convenience of description, when specific operation, ability
Field technique personnel can carry out appropriate adjustment as needed, meet actual operation needs.
As the second loading part of initial time 320 can also load the second part to be exposed；
The loading of unloading and the next first part to be exposed such as the first exposure finished product can be in the second part exposure to be exposed
When carry out simultaneously；The loading of the next first part to be exposed can also be only carried out in exposure, and complete first in back and expose
The unloading of light finished product；It is, of course, also possible to be exposure when carry out first exposure finished product unloading, carry out again later next first to
The loading of exposed part；
Those skilled in the art can determine reasonable operating procedure as needed, subject to producing and operating, to close
Other operations that reason is synchronized using the time for exposure, improve exposure efficiency.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
The embodiments described above only express several embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection of the invention
Range.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.
Claims (10)
1. a kind of sided exposure machine, which is characterized in that including：
Workbench, the workbench are equipped with exposure through-hole；
Exposure mechanism, the exposure mechanism include the first exposure components and the second exposure components, first exposure components and institute
The second exposure components are stated to be respectively arranged on the two sides of the workbench and can expose along the movable workbench, described first
Component and second exposure components move and form exposure region in the workbench, and the exposure region and the exposure are logical
Hole is correspondingly arranged；And
Loader mechanism, the loader mechanism include loading stage, and the loading stage is equipped with the first loading part and the second loading part, described
First loading part is for loading the first part to be exposed, and second loading part is for loading the second part to be exposed, first dress
Load portion and second loading part are arranged in spacing, and the loading stage along the movable workbench and can make first dress
Load portion or second loading part are moved to the exposure region, first exposure components and second exposure components it is mobile,
And the described first part to be exposed to the exposure region or second part to be exposed are exposed.
2. sided exposure machine according to claim 1, which is characterized in that the exposure mechanism further include exposure mounting rack and
Driver is exposed, first exposure components and second exposure components are set to the exposure mounting rack, and the exposure is driven
Dynamic device is for driving the exposure mounting rack and making the exposure mounting rack along the movable workbench.
3. sided exposure machine according to claim 1, which is characterized in that the exposure mechanism further include the first mounting rack,
Second mounting rack, the first driver and the second driver, first exposure components be set to first mounting rack, described second
Exposure components are set to second mounting rack, and first driver is for driving first mounting rack to move along the workbench
Dynamic, second driver is for driving second mounting rack along the movable workbench.
4. sided exposure machine according to claim 1, which is characterized in that the loader mechanism further includes loading driver,
The loading driver is for driving the loading stage and making the loading stage along the movable workbench.
5. sided exposure machine according to claim 1, which is characterized in that the loader mechanism further includes lock, described
Lock is for locking the loading stage and making first loading part or second loading station in the exposure region.
6. sided exposure machine according to claim 1, which is characterized in that it further include sensing mechanism, the sensing mechanism packet
The first sensory package and the second sensory package are included, first sensory package is used to detect the mobile position of first exposure components
The shift position with second exposure components is set, second sensory package is used to detect the shift position of the loading stage.
7. sided exposure machine according to claim 1, which is characterized in that first exposure components and second exposure
Component is moved along the workbench in a first direction, and the loading stage is moved along the workbench in the first direction；
Or first exposure components and second exposure components are moved along the workbench in second direction, the loading
Platform is moved along the workbench in third direction.
8. sided exposure machine according to claim 1, which is characterized in that the loading stage is equipped with the first guide rail, the work
Make platform and is equipped with the first sliding groove cooperated with first guide rail.
9. sided exposure machine according to claim 1-8, which is characterized in that it further include Mechanizm for taking and putting material, institute
Stating Mechanizm for taking and putting material includes the first fetching device and the second fetching device, and first fetching device is for picking and placing first loading part
The described first part to be exposed, second fetching device is used to pick and place the described second part to be exposed of second loading part.
10. a kind of double-faced exposure method can be applied to such as the described in any item sided exposure machines of claim 1-9, feature
It is, includes the following steps：
(S1), the first exposure components are located at the first initial position, and the second exposure components are located at the second initial position, and loading stage is located at
Second exposure position loads the first part to be exposed in the first loading part of the loading stage；
(S2), the loading stage is moved to the first exposure position and the described first part to be exposed is made to be located at exposure region；
(S3), first exposure components are moved to the first predeterminated position and second exposure components are moved to second and preset
Position is simultaneously exposed the described first part to be exposed, obtains the first exposure finished product；Simultaneously the second loading part load second to
Exposed part；
(S4), the loading stage is moved to second exposure position and the described second part to be exposed is made to be located at the exposure region；
(S5), first exposure components be moved to first initial position and second exposure components be moved to it is described
Second initial position is simultaneously exposed the described second part to be exposed, obtains the second exposure finished product；First dress is unloaded simultaneously
The first exposure finished product in load portion simultaneously loads the next first part to be exposed；
(S6), the loading stage is moved to first exposure position, and unloads second exposure of second loading part
Finished product.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810836043.1A CN108873622B (en) | 2018-07-26 | 2018-07-26 | Double-side exposure machine with double loading parts and double-side exposure method |
| PCT/CN2018/122483 WO2020019652A1 (en) | 2018-07-26 | 2018-12-20 | High-efficiency double-table-board double-sided digitization exposure system and working procedure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810836043.1A CN108873622B (en) | 2018-07-26 | 2018-07-26 | Double-side exposure machine with double loading parts and double-side exposure method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108873622A true CN108873622A (en) | 2018-11-23 |
| CN108873622B CN108873622B (en) | 2020-03-31 |
Family
ID=64305565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810836043.1A Active CN108873622B (en) | 2018-07-26 | 2018-07-26 | Double-side exposure machine with double loading parts and double-side exposure method |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN108873622B (en) |
| WO (1) | WO2020019652A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110308621A (en) * | 2019-06-20 | 2019-10-08 | 合肥芯碁微电子装备有限公司 | A kind of alignment localization method of laser direct-writing imaging device internal substrate |
| WO2020019651A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | Novel double-sided digital exposure system and work process |
| WO2020019652A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | High-efficiency double-table-board double-sided digitization exposure system and working procedure |
| CN111965944A (en) * | 2019-05-20 | 2020-11-20 | 中山新诺科技股份有限公司 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
| CN112631087A (en) * | 2021-01-25 | 2021-04-09 | 苏州源卓光电科技有限公司 | Double-face processing system and processing method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103913955A (en) * | 2013-01-06 | 2014-07-09 | 上海华虹宏力半导体制造有限公司 | Double-sided photoetching machine and double-sided photoetching method |
| CN205862101U (en) * | 2016-08-02 | 2017-01-04 | 无锡影速半导体科技有限公司 | A kind of exposure system of dual stage face write-through exposure machine |
| CN206920817U (en) * | 2017-03-31 | 2018-01-23 | 苏州微影激光技术有限公司 | It is a kind of to have dual stage face direct write exposure machine that is independent and merging both of which concurrently |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013186291A (en) * | 2012-03-08 | 2013-09-19 | Seiko Epson Corp | Exposure device |
| CN108073044A (en) * | 2016-11-07 | 2018-05-25 | 俞庆平 | The double-faced exposure method and device of a kind of flexible material |
| CN206557525U (en) * | 2016-11-07 | 2017-10-13 | 俞庆平 | A kind of two-sided write-through exposure machine system |
| CN207164466U (en) * | 2017-09-20 | 2018-03-30 | 浙江欧视达科技有限公司 | A kind of platform frame transmission mechanism for sided exposure machine |
| CN108897197A (en) * | 2018-07-26 | 2018-11-27 | 中山新诺科技股份有限公司 | Sided exposure machine and double-faced exposure method |
| CN108873622B (en) * | 2018-07-26 | 2020-03-31 | 中山新诺科技股份有限公司 | Double-side exposure machine with double loading parts and double-side exposure method |
| CN108873621B (en) * | 2018-07-26 | 2020-06-05 | 中山新诺科技股份有限公司 | Cantilever type double-table-board double-side exposure machine and double-side exposure method |
| CN108983556A (en) * | 2018-07-26 | 2018-12-11 | 中山新诺科技股份有限公司 | Sided exposure machine and double-faced exposure method |
-
2018
- 2018-07-26 CN CN201810836043.1A patent/CN108873622B/en active Active
- 2018-12-20 WO PCT/CN2018/122483 patent/WO2020019652A1/en active Application Filing
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103913955A (en) * | 2013-01-06 | 2014-07-09 | 上海华虹宏力半导体制造有限公司 | Double-sided photoetching machine and double-sided photoetching method |
| CN205862101U (en) * | 2016-08-02 | 2017-01-04 | 无锡影速半导体科技有限公司 | A kind of exposure system of dual stage face write-through exposure machine |
| CN206920817U (en) * | 2017-03-31 | 2018-01-23 | 苏州微影激光技术有限公司 | It is a kind of to have dual stage face direct write exposure machine that is independent and merging both of which concurrently |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020019651A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | Novel double-sided digital exposure system and work process |
| WO2020019652A1 (en) * | 2018-07-26 | 2020-01-30 | 中山新诺科技股份有限公司 | High-efficiency double-table-board double-sided digitization exposure system and working procedure |
| CN111965944A (en) * | 2019-05-20 | 2020-11-20 | 中山新诺科技股份有限公司 | Novel double-sided double-carrier-plate mechanism digital direct-writing exposure machine and exposure method |
| CN110308621A (en) * | 2019-06-20 | 2019-10-08 | 合肥芯碁微电子装备有限公司 | A kind of alignment localization method of laser direct-writing imaging device internal substrate |
| CN110308621B (en) * | 2019-06-20 | 2021-09-17 | 合肥芯碁微电子装备股份有限公司 | Alignment positioning method for inner layer substrate of laser direct writing imaging equipment |
| CN112631087A (en) * | 2021-01-25 | 2021-04-09 | 苏州源卓光电科技有限公司 | Double-face processing system and processing method |
| CN112631087B (en) * | 2021-01-25 | 2022-04-22 | 苏州源卓光电科技有限公司 | Double-face processing system and processing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108873622B (en) | 2020-03-31 |
| WO2020019652A1 (en) | 2020-01-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108873622A (en) | Sided exposure machine and double-faced exposure method | |
| CN108897197A (en) | Sided exposure machine and double-faced exposure method | |
| CN108873621A (en) | Sided exposure machine and double-faced exposure method | |
| JP4551599B2 (en) | Component mounting apparatus and method | |
| CN100552503C (en) | Make the system and method for flat-panel monitor | |
| TWI735695B (en) | Method and apparatus for transferring electronic components between substrates | |
| CN105388707A (en) | Drawing apparatus | |
| CN212433581U (en) | Photoetching system and substrate handover system thereof | |
| KR20140024953A (en) | Device and method for producing substrate | |
| CN110187608A (en) | A kind of exposure method of write-through exposure machine | |
| CN108983556A (en) | Sided exposure machine and double-faced exposure method | |
| KR101104267B1 (en) | Exposure apparatus for stage module recycling and substrate align & transferring control method of stage module | |
| KR20100044450A (en) | The apparatus for aligning of the cassette for the exposure equipment | |
| CN108594602A (en) | Exposure sources | |
| JP2002118398A (en) | Method for detecting position of printed circuit board | |
| KR102212541B1 (en) | Pattern drawing apparatus and pattern drawing method | |
| CN208969427U (en) | Flexible base board sided exposure machine | |
| KR101471900B1 (en) | Substrate processing apparatus | |
| CN107450275B (en) | Workpiece exposure method, exposure equipment and workpiece setting mechanism thereof | |
| JP4025092B2 (en) | Substrate pasting apparatus and substrate pasting method | |
| CN209962089U (en) | Direct-writing type exposure machine | |
| KR20230081535A (en) | Apparatus for Transferring Micro LED Chips | |
| JP2000323894A (en) | Semiconductor device | |
| CN108303853B (en) | XY multiaxis movable light path direct-writing exposure machine of DMD structure | |
| CN112631087B (en) | Double-face processing system and processing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20240119 Address after: 528400 No. 3 Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee after: Zhongshan Xinnuo Microelectronics Co.,Ltd. Address before: No. 3, Mingzhu Road, Torch Development Zone, Zhongshan City, Guangdong Province Patentee before: ZHONGSHAN AISCENT TECHNOLOGIES Co.,Ltd. |