CN108715995B - Titanium palladium material for low-emissivity glass and preparation method thereof - Google Patents
Titanium palladium material for low-emissivity glass and preparation method thereof Download PDFInfo
- Publication number
- CN108715995B CN108715995B CN201810432036.5A CN201810432036A CN108715995B CN 108715995 B CN108715995 B CN 108715995B CN 201810432036 A CN201810432036 A CN 201810432036A CN 108715995 B CN108715995 B CN 108715995B
- Authority
- CN
- China
- Prior art keywords
- parts
- titanium
- ingot
- neodymium
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/02—Making non-ferrous alloys by melting
- C22C1/03—Making non-ferrous alloys by melting using master alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The invention relates to a titanium palladium material for low-emissivity glass and a preparation method thereof, wherein the titanium palladium material comprises the following components in parts by weight: 70-95 parts of titanium, 0.5-6 parts of tantalum, 0.1-4 parts of hafnium, 0.1-0.5 part of scandium and Ti30.2-5 parts of Si, 0.3-4 parts of vanadium, 0.1-4 parts of chromium, 0.1-2 parts of neodymium and 0.3-4 parts of boron. During preparation, firstly, melting titanium, neodymium blocks and scandium blocks, and then solidifying and preparing blocks; then, smelting by a vacuum consumable arc melting furnace to obtain a titanium alloy ingot, and finally forging and rolling to process the titanium alloy ingot into the target material. The preparation method is simple, the steps are easy to operate, the prepared titanium target material is a film prepared by a vacuum magnetron sputtering method, the compactness is good, the oxidation resistance is strong, and the service life of the low-radiation glass can be obviously prolonged; and the optical property is excellent, and the low-emissivity glass can be used for manufacturing high-quality low-emissivity glass.
Description
Technical Field
The invention relates to a titanium palladium material for low-emissivity glass and a preparation method thereof, belonging to the technical field of material preparation.
Background
The low-radiation glass is a film product formed by coating a plurality of layers of metal or other compounds on the surface of the glass. The coating layer has the characteristics of high visible light transmission and high mid-far infrared ray reflection, so that the coating layer has excellent heat insulation effect and good light transmission compared with common glass and traditional coating glass for buildings. Therefore, the door and window of the building made of the low-radiation glass can greatly reduce the transmission of indoor heat energy to the outdoor space caused by radiation, thereby achieving the ideal energy-saving effect. The above-mentioned properties of low-emissivity glass make it increasingly widely used in developed countries. China is a country with relatively deficient energy, the occupied amount of people of the energy is very low, and the energy consumption of buildings already accounts for about 27.5 percent of the total energy consumption of the whole country. Therefore, the production technology of the low-radiation glass is vigorously developed and the application field of the low-radiation glass is popularized, and remarkable social benefit and economic benefit are certainly brought. However, low emissivity glass monolithic films are relatively soft, have poor corrosion resistance, and slowly oxidize when subjected to moisture and certain oxidizing agents, and therefore must be processed into insulating glass in a short period of time. Due to the weak respiration of the hollow glass, after water vapor, sulfide and oxide enter the cavity, the film surface plated on the glass is damaged, the appearance becomes black, the color changes, a large number of mildew points gradually appear, and the function of the low-radiation glass is gradually lost. At present, the service life of the product is about 10 years, and the application range of the product is limited to a great extent.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provide a titanium target material for the low-emissivity glass industry and a manufacturing method thereof.
The invention adopts the following technical scheme: a titanium palladium material for low-emissivity glass comprises the following components in parts by weight: 70-95 parts of titanium, 0.5-6 parts of tantalum, 0.1-4 parts of hafnium, 0.1-0.5 part of scandium and Ti30.2-5 parts of Si, 0.3-4 parts of vanadium, 0.1-4 parts of chromium, 0.1-2 parts of neodymium and 0.3-4 parts of boron.
Further, the components are as follows according to parts by weight: 80-90 parts of titanium, 1-3 parts of tantalum, 0.1-2 parts of hafnium, 0.1-0.3 part of scandium and Ti30.5-4 parts of Si, 1.5-4 parts of vanadium, 0.8-2.6 parts of chromium, 0.6-1.2 parts of neodymium and 0.7-1.8 parts of boron.
Further, the components are as follows according to parts by weight: 85-88 parts of titanium, 2.1-2.6 parts of tantalum, 0.3-0.5 part of hafnium, 0.2-0.3 part of scandium and Ti30.9-1.6 parts of Si, 2.5-3 parts of vanadium, 2.2-2.6 parts of chromium, 0.9-1.1 parts of neodymium and 1.5-1.8 parts of boron.
Further, 85 parts of titanium, 3.4 parts of tantalum, 3.1 parts of hafnium, 0.2 part of scandium and Ti32.6 parts of Si, 1.0 part of vanadium, 1.5 parts of chromium, 0.6 part of neodymium and 2.6 parts of boron.
The preparation method of the titanium palladium material for the low-emissivity glass comprises the following steps: wherein the components are calculated according to parts by weight
(1) Preparing a titanium-neodymium-scandium alloy block: 0.1-2 parts of weighed neodymium ingot is put into a vacuum induction smelting furnace, the neodymium ingot is melted by 30-50kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.1-0.5 part of scandium into the melt, and smelting for 5min at the power of 20-30 kW; then adding 0.5-2 parts of titanium into the melt, smelting for 10min at the power of 40-60kW, then refining for 10min at the power of 15-25 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast into an ingot; processing and removing oxidation slag on the outer surface of the cast ingot, and cutting into square blocks;
(2) preparing a titanium alloy ingot: mixing the obtained cube with 68-94 parts of titanium, 0.5-6 parts of tantalum, 0.1-0.4 part of hafnium and Ti30.2-5 parts of Si, 0.3-4 parts of vanadium, 0.1-4 parts of chromium and 0.3-4 parts of boron block are uniformly mixed, pressed into a cylinder by a hydraulic press to form an electrode, smelted by a vacuum consumable arc smelting furnace and cast into an alloy ingot;
(3) forging and rolling: forging the obtained alloy ingot at 1250-1330 ℃ to prepare a rectangular square ingot; then rolling at 1280-1350 ℃, wherein the thickness after rolling is less than 40 percent of the thickness of the obtained forged square ingot;
(4) preparing a titanium target: the alloy ingot is machined into the target material.
The preparation method is simple, the steps are easy to operate, the prepared titanium target material is a film prepared by a vacuum magnetron sputtering method, the compactness is good, the oxidation resistance is strong, and the service life of the low-radiation glass can be obviously prolonged; and the optical property is excellent, and the low-emissivity glass can be used for manufacturing high-quality low-emissivity glass.
Detailed Description
The present invention will be further described with reference to specific examples.
Example 1
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 70 parts of titanium, 6 parts of tantalum, 4 parts of hafnium, 0.5 part of scandium and Ti35 parts of Si, 0.3 part of vanadium, 4 parts of chromium, 2 parts of neodymium and 0.3 part of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 2 parts of weighed neodymium ingot is placed into a vacuum induction melting furnace, the neodymium ingot is melted by 32kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.5 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 0.5 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: mixing the cubic alloy block with 69.5 parts of titanium, 6 parts of tantalum, 4 parts of hafnium and Ti3Evenly mixing 5 parts of Si, 0.3 part of vanadium, 4 parts of chromium and 0.3 part of boron block, pressing cylinders with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and then welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 5.61g/cm3The coating film has a visible light transmittance of 67% and a visible light reflectance of 23%.
Example 2
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 73 parts of titanium, 6 parts of tantalum, 4 parts of hafnium, 0.4 part of scandium and Ti34.5 parts of Si, 3.8 parts of vanadium, 3.5 parts of chromium, 1.6 parts of neodymium and 3.2 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block; 1.6 parts of weighed neodymium ingots are placed into a vacuum induction smelting furnace, the neodymium ingots are melted by 45kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.4 part of scandium into the melt, and smelting for 5min at the power of 28 kW; then adding 2 parts of titanium into the melt, smelting for 10min at the power of 43kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: uniformly mixing the cubic alloy block with 71 parts of titanium, 6 parts of tantalum, 4 parts of hafnium, 3Si, 4.5 parts of Ti3Si, 3.8 parts of vanadium, 3.5 parts of chromium and 3.2 parts of boron, pressing a cylinder with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 5.45g/cm3The coating film has a visible light transmittance of 68% and a visible light reflectance of 23%.
Example 3
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 76 parts of titanium, 5.5 parts of tantalum, 3.8 parts of hafnium, 0.4 part of scandium and Ti34.0 parts of Si, 3.2 parts of vanadium, 2.7 parts of chromium, 1.2 parts of neodymium and 3.2 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 1.2 parts of weighed neodymium ingots are placed into a vacuum induction smelting furnace, the neodymium ingots are melted by 40kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.4 part of scandium into the melt, and smelting for 5min at the power of 28 kW; then adding 1.5 parts of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: uniformly mixing the cubic alloy block obtained by the step with 74.5 parts of titanium, 5.5 parts of tantalum, 3.8 parts of hafnium, 3.0 parts of Ti3Si 4.0, 3.2 parts of vanadium, 2.7 parts of chromium and 3.2 parts of boron block, pressing cylinders with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 5.31g/cm3The visible light transmittance of the coating film is 71 percent, and the visible light reflectivity is 21 percent.
Example 4
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 79 parts of titanium, 4.9 parts of tantalum, 3.1 parts of hafnium, 0.3 part of scandium and Ti32.8 parts of Si, 2.9 parts of vanadium, 2.5 parts of chromium, 1.0 part of neodymium and 3.5 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 1.0 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by power of 38kw to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.3 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 1.2 parts of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) titanium alloyPreparation of ingots: mixing the cubic alloy block with 77.8 parts of titanium, 4.9 parts of tantalum, 3.1 parts of hafnium and Ti32.8 parts of Si, 2.9 parts of vanadium, 2.5 parts of chromium and 3.5 parts of boron block are uniformly mixed, cylinders with the diameter of 8-15 cm and the length of 26-38 cm are pressed by a hydraulic press, and then 4 cylinders are welded together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 5.19g/cm3The coating film has a visible light transmittance of 73% and a visible light reflectance of 20%.
Example 5
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 82 parts of titanium, 4.3 parts of tantalum, 3.6 parts of hafnium, 0.3 part of scandium and Ti32.9 parts of Si, 1.2 parts of vanadium, 2.2 parts of chromium, 0.8 part of neodymium and 2.7 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 0.8 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by power of 38kw to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.3 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 1.0 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: uniformly mixing the obtained cubic alloy block with 81 parts of titanium, 4.3 parts of tantalum, 3.6 parts of hafnium, 3 part of Ti3Si2.9 parts of vanadium, 2.2 parts of chromium and 2.7 parts of boron block, pressing cylinders with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 5.11g/cm3The visible light transmittance of the coating film is 76%, and the visible light reflectance is 16%.
Example 6
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 82 parts of titanium, 4.3 parts of tantalum, 3.6 parts of hafnium, 0.3 part of scandium and Ti32.9 parts of Si, 1.2 parts of vanadium, 2.2 parts of chromium, 0.8 part of neodymium and 2.7 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 0.8 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by power of 38kw to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.3 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 1.0 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: mixing the cubic alloy block with 81 portions of titanium, 4.3 portions of tantalum, 3.6 portions of hafnium and Ti3Uniformly mixing 2.9 parts of Si, 1.2 parts of vanadium, 2.2 parts of chromium and 2.7 parts of boron blocks, pressing cylinders with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 5.11g/cm3The visible light transmittance of the coating film is 77 percent, and the visible light reflectance is 15 percent.
Example 7
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 85 parts of titanium, 3.4 parts of tantalum, 3.1 parts of hafnium, 0.2 part of scandium and Ti32.6 parts of Si, 1.0 part of vanadium, 1.5 parts of chromium, 0.6 part of neodymium and 2.6 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 0.6 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by 35kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.2 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 0.8 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: uniformly mixing the cubic alloy block obtained by the step with 84.2 parts of titanium, 3.4 parts of tantalum, 3.1 parts of hafnium, 3Si2.6 parts of Ti3Si, 1.0 part of vanadium, 1.5 parts of chromium and 2.6 parts of boron block, pressing cylinders with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 4.95g/cm3The visible light transmittance of the coating film is 85 percent, and the visible light reflectivity is 12 percent.
Example 8
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 89 parts of titanium, 1.8 parts of tantalum, 2.2 parts of hafnium, 0.2 part of scandium, 3.2 parts of Ti3Si 2.2, 1.2 parts of vanadium, 1.1 parts of chromium, 0.3 part of neodymium and 2.0 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 0.3 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by 32kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.2 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 0.6 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: mixing the cubic alloy block with 88.4 parts of titanium, 1.8 parts of tantalum, 2.2 parts of hafnium and Ti3Uniformly mixing 2.6 parts of Si, 1.2 parts of vanadium, 1.1 parts of chromium and 2.0 parts of boron blocks, pressing cylinders with the diameter of 8-15 cm and the length of 26-38 cm by using a hydraulic press, and welding 4 cylinders together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 4.81g/cm3Transmittance of visible ray of the coating film 86% visible light reflectance of 10%.
Example 9
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 93 parts of titanium, 0.6 part of tantalum, 2.5 parts of hafnium, 0.1 part of scandium and Ti31.2 parts of Si, 0.7 part of vanadium, 0.6 part of chromium, 0.2 part of neodymium and 1.1 part of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 0.2 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by 32kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.1 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 0.5 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: mixing the cubic alloy block with 92.5 parts of titanium, 0.6 part of tantalum, 2.5 parts of hafnium and Ti31.2 parts of Si, 0.7 part of vanadium, 0.6 part of chromium and 1.1 parts of boron block are uniformly mixed, cylinders with the diameter of 8-15 cm and the length of 26-38 cm are pressed by a hydraulic press, and then 4 cylinders are welded together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 4.64g/cm3The visible light transmittance of the coating film is 88 percent, and the visible light reflectivity is 8 percent.
Example 10:
a titanium target material for low-emissivity glass comprises components in parts by weightComprises the following steps: 95 parts of titanium, 0.5 part of tantalum, 0.1 part of hafnium, 0.1 part of scandium and Ti30.2 part of Si, 4 parts of vanadium, 0.1 part of chromium, 0.1 part of neodymium and 4 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps:
(1) preparing a titanium-neodymium-scandium alloy block: 0.1 part of weighed neodymium ingot is put into a vacuum induction melting furnace, the neodymium ingot is melted by 32kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.1 part of scandium into the melt, and smelting for 5min at the power of 25 kW; then adding 0.5 part of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 16 kW, and controlling the temperature to 1550-; then casting the molten liquid into a mould to cast 10-50 kg of cast ingot; removing oxidation slag on the outer surface of the cast ingot, and forging into a plate with the thickness of 2-3 cm; cutting the plate into cubes with sides of about 2-3 cm;
(2) preparing a titanium alloy ingot: mixing the cubic alloy block with 94.5 parts of titanium, 0.5 part of tantalum, 0.1 part of hafnium and Ti30.2 part of Si, 4 parts of vanadium, 0.1 part of chromium and 4 parts of boron block are uniformly mixed, cylinders with the diameter of 8-15 cm and the length of 26-38 cm are pressed by a hydraulic press, and then the 4 cylinders are welded together to prepare the electrode. Smelting by a vacuum consumable arc melting furnace, and casting into alloy ingots with the diameter of 8-20 cm and the length of 40-90 cm;
(3) forging and rolling: forging and rolling the obtained alloy ingot to obtain an alloy ingot with the length of 90-300 cm, the width of 8-25 cm and the thickness of 0.5-3 cm;
(4) preparing a titanium target material: and machining the obtained alloy ingot to prepare the target material.
The density of the titanium target material is 4.50g/cm3The visible light transmittance of the coating film is 83 percent, and the visible light reflectance is 12 percent.
Example 11
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 80 parts of titanium, 3 parts of tantalum, 0.1 part of hafnium, 0.3 part of scandium and Ti30.5 part of Si, 4 parts of vanadium, 0.8 part of chromium, 1.2 parts of neodymium and 0.7 part of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps: wherein the components are calculated according to parts by weight
(1) Preparing a titanium-neodymium-scandium alloy block: 1.2 parts of weighed neodymium ingots are put into a vacuum induction smelting furnace, the neodymium ingots are melted by 30kw of power to obtain molten neodymium, the heat preservation temperature is controlled to be 1400 ℃, and the heat preservation time is 3 min; then adding 0.3 part of scandium into the melt, and smelting for 5min at the power of 20 kW; then adding 0.5-2 parts of titanium into the melt, smelting for 10min at the power of 40kW, then refining for 10min at the power of 25kW, and controlling the temperature to be 1600 ℃; finally, casting the molten liquid into a mould to cast into an ingot; processing and removing oxidation slag on the outer surface of the cast ingot, and cutting into square blocks;
(2) preparing a titanium alloy ingot: mixing the obtained cubic block with 80 parts of titanium, 3 parts of tantalum, 0.1 part of hafnium and Ti30.5 part of Si, 4 parts of vanadium, 0.8 part of chromium and 0.7 part of boron block are uniformly mixed, pressed into a cylinder by a hydraulic press to form an electrode, smelted by a vacuum consumable arc smelting furnace and cast into an alloy ingot;
(3) forging and rolling: forging the obtained alloy ingot at 1250 ℃ to prepare a rectangular square ingot; then rolling at 1350 ℃ until the thickness is less than 40 percent of the thickness of the obtained forged square ingot;
(4) preparing a titanium target: the alloy ingot is machined into the target material.
Example 12
A titanium target material for low-emissivity glass comprises the following components in parts by weight: 90 parts of titanium, 1 part of tantalum, 2 parts of hafnium, 0.1 part of scandium and Ti34 parts of Si, 4 parts of vanadium, 2.6 parts of chromium, 0.6 part of neodymium and 1.8 parts of boron.
A preparation method of a titanium target material for low-emissivity glass comprises the following steps: wherein the components are calculated according to parts by weight
(1) Preparing a titanium-neodymium-scandium alloy block: 0.6 part of weighed neodymium ingot is put into a vacuum induction smelting furnace, the neodymium ingot is melted by 50kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350 ℃, and the heat preservation time is 3 min; then adding 0.1 part of scandium into the melt, and smelting for 5min at the power of 30 kW; then adding 2 parts of titanium into the molten liquid, smelting for 10min at the power of 60kW, then refining for 10min at the power of 15 kW, and controlling the temperature to 1550 ℃; finally, casting the molten liquid into a mould to cast into an ingot; processing and removing oxidation slag on the outer surface of the cast ingot, and cutting into square blocks;
(2) preparing a titanium alloy ingot: mixing the obtained cubic block with 88 parts of titanium, 1 part of tantalum, 2 parts of hafnium and Ti34 parts of Si, 4 parts of vanadium, 2.6 parts of chromium and 1.8 parts of boron block are uniformly mixed, pressed into a cylinder by a hydraulic press to form an electrode, smelted by a vacuum consumable arc smelting furnace and cast into an alloy ingot;
(3) forging and rolling: forging the obtained alloy ingot at 1330 ℃ to prepare a rectangular square ingot; then rolling at 1280 ℃, wherein the thickness after rolling is less than 40% of the thickness of the obtained forged square ingot;
(4) preparing a titanium target: the alloy ingot is machined into the target material.
Claims (1)
1. A preparation method of titanium palladium material for low-emissivity glass is characterized by comprising the following steps: the method comprises the following steps: the composition comprises the following components in parts by weight:
(1) preparing a titanium-neodymium-scandium alloy block: 0.1-2 parts of weighed neodymium ingot is put into a vacuum induction smelting furnace, the neodymium ingot is melted by 30-50kw of power to obtain neodymium melt, the heat preservation temperature is controlled to 1350-; then adding 0.1-0.5 part of scandium into the melt, and smelting for 5min at the power of 20-30 kW; then adding 0.5-2 parts of titanium into the melt, smelting for 10min at the power of 40-60kW, then refining for 10min at the power of 15-25 kW, and controlling the temperature to 1550-; finally, casting the molten liquid into a mould to cast into an ingot; processing and removing oxidation slag on the outer surface of the cast ingot, and cutting into square blocks;
(2) preparing a titanium alloy ingot: mixing the obtained cube with 68-94 parts of titanium, 0.5-6 parts of tantalum, 0.1-0.4 part of hafnium and Ti30.2-5 parts of Si, 0.3-4 parts of vanadium, 0.1-4 parts of chromium and 0.3-4 parts of boron block are uniformly mixed, pressed into a cylinder by a hydraulic press to form an electrode, smelted by a vacuum consumable arc smelting furnace and cast into an alloy ingot;
(3) forging and rolling: forging the obtained alloy ingot at 1250-1330 ℃ to prepare a rectangular square ingot; then rolling at 1280-1350 ℃, wherein the thickness after rolling is less than 40 percent of the thickness of the obtained forged square ingot;
(4) preparing a titanium target: the alloy ingot is machined into the target material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810432036.5A CN108715995B (en) | 2018-05-08 | 2018-05-08 | Titanium palladium material for low-emissivity glass and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810432036.5A CN108715995B (en) | 2018-05-08 | 2018-05-08 | Titanium palladium material for low-emissivity glass and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108715995A CN108715995A (en) | 2018-10-30 |
| CN108715995B true CN108715995B (en) | 2020-05-26 |
Family
ID=63899516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810432036.5A Active CN108715995B (en) | 2018-05-08 | 2018-05-08 | Titanium palladium material for low-emissivity glass and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108715995B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60180935A (en) * | 1984-02-28 | 1985-09-14 | Asahi Glass Co Ltd | Formation of ti coated film on vitreous substrate |
| CN1246547A (en) * | 1999-09-09 | 2000-03-08 | 苏州华东镀膜玻璃有限公司 | Process for coating on glass to simulate low-radiation film and able to be thermally treated |
| CN1535326A (en) * | 2000-10-24 | 2004-10-06 | ����Τ�����ʹ�˾ | Methods of forming titanium-based and zirconium-based mixed-metal materials and sputtering targets |
| CN103732789A (en) * | 2011-08-23 | 2014-04-16 | 吉坤日矿日石金属株式会社 | Titanium target for sputtering |
| CN107502867A (en) * | 2017-08-22 | 2017-12-22 | 江阴恩特莱特镀膜科技有限公司 | One kind is used for heat-reflecting glass industry rotation silicon silver target and preparation method thereof |
-
2018
- 2018-05-08 CN CN201810432036.5A patent/CN108715995B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60180935A (en) * | 1984-02-28 | 1985-09-14 | Asahi Glass Co Ltd | Formation of ti coated film on vitreous substrate |
| CN1246547A (en) * | 1999-09-09 | 2000-03-08 | 苏州华东镀膜玻璃有限公司 | Process for coating on glass to simulate low-radiation film and able to be thermally treated |
| CN1535326A (en) * | 2000-10-24 | 2004-10-06 | ����Τ�����ʹ�˾ | Methods of forming titanium-based and zirconium-based mixed-metal materials and sputtering targets |
| CN103732789A (en) * | 2011-08-23 | 2014-04-16 | 吉坤日矿日石金属株式会社 | Titanium target for sputtering |
| CN107502867A (en) * | 2017-08-22 | 2017-12-22 | 江阴恩特莱特镀膜科技有限公司 | One kind is used for heat-reflecting glass industry rotation silicon silver target and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108715995A (en) | 2018-10-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107805738B (en) | Nickel-aluminum brass alloy and preparation process thereof | |
| CN103243232B (en) | The golden Vulcan metal of a kind of high anti-discolouring and sheet material preparation method thereof | |
| CN101629257B (en) | 0.022 mm temperature-tolerance decoration foil and preparation method thereof | |
| CN103484726B (en) | A kind of production technique of high niobium fire resistant aluminum alloy sheet material | |
| CN107858552A (en) | One kind casting tire enamel copper master alloy and preparation method thereof | |
| CN108715995B (en) | Titanium palladium material for low-emissivity glass and preparation method thereof | |
| CN102266922A (en) | Non-vacuum casting and forming method of chromium zirconium copper alloy plate for continuous casting crystallizer | |
| CN115029570A (en) | Preparation method of titanium-niobium alloy ingot | |
| CN108486340B (en) | High-carbon high-chromium stainless steel and processing method thereof | |
| CN109989045A (en) | A kind of aluminium silver alloy target and preparation method thereof for vacuum magnetic-control sputtering | |
| CN106756306B (en) | A kind of processing method of door and window aluminium alloy | |
| CN108754211A (en) | One kind is for vacuum magnetic-control sputtering class proof gold coloured gold alloy target material and preparation method thereof | |
| CN110129759B (en) | Silicon-aluminum-zirconium target material for Low-E glass and preparation method thereof | |
| KR100432448B1 (en) | Manufacturing method for Aluminum alloy plate containing Cr and Ni | |
| CN109706345B (en) | Rotary target alloy and processing method thereof | |
| CN101906547A (en) | Non-vacuum smelting method of CuCrZr alloy | |
| CA2408361A1 (en) | Copper alloy comprising zinc, tin and iron for electrical connection and a process for preparing the alloy | |
| CN104046866A (en) | Preparation method of high-electrical conductivity high-strength rare earth aluminum alloy transporting material | |
| CN109763034B (en) | Conductive aluminum alloy material of transformer | |
| CN1327181C (en) | Process for preparing composite crucible material for magnesium alloy | |
| CN113564412B (en) | Easily-processed gold-like copper alloy and preparation method thereof | |
| CN113265634B (en) | Rare earth alloy target material and preparation method and application thereof | |
| CN114345935B (en) | High-speed steel rolling method | |
| CN111593228B (en) | Champagne golden copper alloy material and preparation method thereof | |
| CN109321790B (en) | Aluminum base material for toast box and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |