CN108710268A - A kind of parallel lithography system and method based on two-photon polymerized exposure - Google Patents
A kind of parallel lithography system and method based on two-photon polymerized exposure Download PDFInfo
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- CN108710268A CN108710268A CN201810511347.0A CN201810511347A CN108710268A CN 108710268 A CN108710268 A CN 108710268A CN 201810511347 A CN201810511347 A CN 201810511347A CN 108710268 A CN108710268 A CN 108710268A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
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- Optics & Photonics (AREA)
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Abstract
The invention discloses a kind of parallel lithography systems based on two-photon polymerized exposure, including：Light source module, including femto-second laser and phase type volume holography, phase type volume holography are modulated the femtosecond laser that femto-second laser is sent out, and form several luminous points in space lattice arrangement；Liquid crystal light valve is loaded into binary mask image by computer, it is individually switch to control each luminous point；Two-dimensional scanning mirrors module, the spot scan that liquid crystal light valve is opened to micro- print module；Micro- print module carries out hierarchic parallel photoetching using the luminous point of scanning galvanometer module scans according to the three-dimensional wiener structure of Computer Design to photosensitive material；Computer controls the action of liquid crystal light valve, scanning galvanometer module and micro- print module.The invention also discloses the methods that the parallel lithography system carries out parallel photoetching.The parallel lithography system of the present invention, which can realize quick, parallel two-photon polymerized exposure photo-etching, and cost is relatively low.
Description
Technical field
The present invention relates to micro-nano structure field of lithography more particularly to a kind of parallel photoetching systems based on two-photon polymerized exposure
System and method.
Background technology
Laser technology is 20th century, four invention of great significance one of eponymous with atomic energy, semiconductor and computer.More than 40
Nian Lai, it is growing with small-sized electronic product and microelectronic component demand, for rapidoprint (especially polymer
Material and materials with high melting point) accurate processing increasingly become laser one of field with fastest developing speed in commercial Application.Swash
Light processing is the important application of laser industry, and compared with conventional mechanical processing, laser processing is more accurate, more acurrate, rapider.
Femtosecond laser photoetching technique has high precision machining, fuel factor is small, damage threshold is low and can realize really
The advantages that three-dimensional microstructures are processed, these characteristics, which are traditional laser processing technologys, to be replaced.
Last decade people conduct in-depth research Laser Two-photon micro Process.Two-photon polymerized is that substance is double in generation
A kind of photo-polymerization process caused after photonic absorption, two-photon absorption refer to a molecule of substance while absorbing two light
Son, the main ultra-intense laser focal point caused by pulse laser of the generation of two-photon absorption, the laser in other places in light path
Intensity is not enough to generate two-photon absorption, and since optical wavelength used is longer, energy is relatively low, corresponding Single Photon Absorption process
It cannot occur.Therefore, biphotonic process has good spatial selectivity.It is two-photon polymerized compared with other existing techniques
The three-dimensional micro-nano structure of higher resolution can be manufactured.
Two-photon polymerized exposure photo-etching technology can be used for making medical devices, the three-D micro-nano optics device of specific function
Part.The technology uses the nonlinear effect of femto-second laser, (such as to photosensitive material：Photosensitive resin material) carry out the poly- of selectivity
It closes, generates the micro-structure of micron or nanoscale.One difficult point of the technology is：Since structure dimension is very small, realize larger
When the micronano optical element manufacturing of size, the mode of simple scan photoetching takes very much.The photoetching time is reduced, realizes large scale doctor
The three-D micro-nano optical device for learning device or specific function makes, and has important market significance.
Improving a kind of scheme of two-photon polymerized exposure photo-etching efficiency is, using pure phase type spatial light modulator, calculates
Hologram is loaded into pure phase type spatial light modulator by phase-only hologram, is formed lattice structure and is carried out parallel exposure (with reference to text
It offers：Shaun D.Gittard, Alexander Nguyen, et al.Fabrication of microscale medical
devices by two-photon polymerization with multiple foci via a spatial light
modulator[J].BIOMEDICAL OPTICS EXPRESS.2011：3167-3178), it important is asked using one of which
Topic is that equipment cost is higher.The pure phase type spatial light modulator master of current 2K resolution ratio (1920 × 1080) existing on the market
There are holoeye and jasper Liang Ge producers, the price of every pure phase type spatial light modulator to be not less than 10w RMB.
Invention content
When for carrying out the parallel photoetching of two-photon polymerized exposure using pure phase type spatial light modulator in the prior art, deposit
In the higher problem of cost, the present invention provides a kind of parallel lithography systems based on two-photon polymerized exposure, which can
Realize quick, parallel two-photon polymerized exposure photo-etching, and cost is relatively low.
The present invention provides following technical solutions：
A kind of parallel lithography system based on two-photon polymerized exposure, including：
Light source module, including femto-second laser and phase type volume holography, the phase type volume holographic optics member
Part is modulated the femtosecond laser that femto-second laser is sent out, and forms several luminous points in space lattice arrangement；
Liquid crystal light valve is loaded into binary mask image by computer, it is individually switch to control each luminous point；
Scanning galvanometer module, the spot scan that liquid crystal light valve is opened to micro- print module；
Micro- print module utilizes the luminous point of scanning galvanometer module scans according to the three-dimensional micro-nano structure of Computer Design
Hierarchic parallel photoetching is carried out to photosensitive material；
Computer designs binary mask image and three-dimensional micro-nano structure, according to binary mask image and three-dimensional micro-nano structure
Control the action of liquid crystal light valve, scanning galvanometer module and micro- print module.
In light source module, femto-second laser sends out divergent spherical wave and is irradiated on phase type volume holography and meets
Bragg diffraction condition, phase type volume holography are modulated the divergent spherical wave for being irradiated to thereon, reflection or thoroughly
Imaging is penetrated, forms several luminous points in space lattice arrangement in space；Liquid crystal light valve is loaded into binary mask by computer again
Image controls each luminous point and is independently turned on or off；Two-dimensional scanning mirrors module is by open spot scan to micro- printing
In module；Micro- print module is according to the three-dimensional micro-nano structure of Computer Design, using several luminous points of scanning to photosensitive material
It is carried out at the same time photoetching, realizes the parallel photoetching to photosensitive material, improves photoetching efficiency, and large scale medical devices can be fast implemented
Or the three-D micro-nano optical device of specific function makes.
Phase type volume holography is usually to be made in photosensitive film material according to optical element made of holography principle
On material, the femtosecond laser that femto-second laser by the diffraction of light, can be sent out to hair is diffracted into the luminous point that several are in lattice arrangement.
Phase type volume holography production method is simple, at low cost, and the pure of costliness is replaced using phase type volume holography
Phase type spatial light modulator realizes the parallel photoetching of two-photon polymerized exposure, greatly reduces cost.
Preferably, the light source module further includes the first lens, spatial filter and the second lens；
The spatial filter between the first lens and the second lens, the spatial filter be located at the first lens and
On the focal plane of second lens；
The femtosecond laser that femto-second laser is sent out passes sequentially through coaxial after the first lens, spatial filter and the second lens
Phase type volume holography is exposed to, several luminous points in space lattice arrangement are formed.
The femtosecond laser that femto-second laser is sent out by filtering out veiling glare after spatial filter, then by the second lens after, shape
At planar light, reflects or transmit through phase type volume holography again later, form several luminous points.It is excluded through spatial filter
After light disturbance, the quality of laser is higher so that lithographic results are more preferably more precisely.
Preferably, the phase type volume holography is reflective or transmission-type.
It is further preferred that the phase type volume holography is complete to be made by holographic interference exposure
Cease dry plate.
Existing method making can be used in the phase type volume holography.
Preferably, the liquid crystal light valve is amplitude type spatial light modulator, it is located at through phase type volume holographic optics member
Part is modulated and in the lattice plane of the luminous point of formation.
The position for the binary mask image being loaded into liquid crystal light valve adjusts the light to be formed with phase type volume holography
Whether point position is corresponding, can be penetrated with independent control specific luminous point by adjusting binary mask image, liquid crystal light valve fills
When the switch of luminous point.
The binary mask image being loaded into liquid crystal light valve is updated in real time according to printing situation.
The scanning galvanometer module is two-dimensional scanning mirrors.
The present invention scanning galvanometer select high-precision, high speed two-dimensional scanning mirrors, can accurately carry out the directions x and
The scanning of two dimensions in the directions y can change the direction for being irradiated to light thereon that array light source is sent out.PLC technology, root
Quick scan control is carried out to luminous point dot matrix according to the three-dimensional micro-nano structure of design.
Preferably, the micro- print module includes：
Object lens carry out micro imaging to the luminous point dot matrix of scanning galvanometer module scans；
There is piezotable piezoelectric ceramics, the luminous point dot matrix after micro is imaged to focus on the certain depth of photosensitive material；
Two-dimensional movement platform carries photosensitive material, is controlled by computer, is moved according to the three-dimensional micro-nano structure of Computer Design
The position of dynamic luminescent material.
Preferably, the mobile accuracy of the two-dimensional movement platform is μm magnitude.
Two-dimensional movement platform is high-accuracy mobile platform, and the seamless spliced of adjacent photoetching subregion may be implemented.
Preferably, the micro- print module has monitoring device, the monitoring device includes：
Monitor light source, lighting photosensitive material；
Camera is communicated with computer, and implementing monitoring photoetching process is simultaneously transferred to computer.
Monitoring light source provides illumination for photosensitive material, so that camera shoots the exposure process of photosensitive material, monitoring light source hair
The light gone out is safety light for photosensitive material, photosensitive material will not be made to expose.
The camera is CMOS or CCD camera.
Photoetching process can be monitored by monitoring device, records photoetching process in real time.
The present invention also provides a kind of methods carrying out parallel photoetching based on the parallel lithography system, including：
(1) patterned area is decomposed into the identical photoetching subregion of several areas；
(2) a certain photoetching subregion a is moved to the working region of micro- print module, liquid crystal light is controlled by computer
Valve, scanning galvanometer module and micro- print module, according to the three-dimensional micro-nano structure of Computer Design to photoetching subregion a hierarchic parallels
Photoetching；
(3) after the completion of photoetching subregion a photoetching, by another photoetching subregion b be moved to the working region of micro- print module into
Row hierarchic parallel photoetching；
(4) step (3) is repeated, until all photoetching subregion photoetching are completed.
The movement of photoetching subregion is realized by micro- impression block two-dimensional movement platform in the block.
In a photoetching subregion, photoetching position is controlled by the scanning of scanning galvanometer, completes photoetching；Single photoetching point
After area completes photoetching, by the two-dimensional movement platform of micro- print module, next photoetching subregion is moved to micro- print module
Working region carry out photoetching.
In a photolithographic process, photolithography light source is modulated by several dot matrix luminous points due to phase type volume holography,
Several dot matrix luminous points are carried out at the same time photoetching to photosensitive material, and which greatly enhances photoetching speed；Subregion block-by-block photoetching can be with
Realize large scale micronano optical element manufacturing.
Compared with prior art, beneficial effects of the present invention are：
The parallel lithography system of the present invention is modulated femtosecond laser using phase type volume holography, forms point
Array light source, phase type volume holography diffraction efficiency is high, makes simply, cheap, this greatly reduces parallel photoetching
The cost of system；
The parallel photolithography method of the present invention carries out subregion photoetching, it can be achieved that large scale micronano optical device to patterned area
It makes.
Description of the drawings
Fig. 1 is that reflective volume holography makes schematic diagram；
Fig. 2 is that transmission-type volume holography 1 makes schematic diagram；
Fig. 3 is that transmission-type volume holography 2 makes schematic diagram；
Fig. 4 is the light source module structure schematic diagram based on reflective volume holography；
Fig. 5 is the light source module structure schematic diagram based on transmission-type volume holography 1；
Fig. 6 is the light source module structure schematic diagram based on transmission-type volume holography 2；
Fig. 7 is the parallel lithography system structural schematic diagram based on reflective volume holography；
Fig. 8 is the principle schematic of parallel photoetching；Wherein, (a) is three-dimensional photoetching area schematic；(b) it is input liquid crystal
Binary mask image in light valve；(c) some photoetching subregion schematic diagram；
Fig. 9 is the aircraft mould that parallel lithography system using the present invention and parallel photolithography method are lithographically derived
Type.
Specific implementation mode
Present invention is further described in detail with reference to the accompanying drawings and examples, it should be pointed out that reality as described below
It applies example to be intended to be convenient for the understanding of the present invention, and does not play any restriction effect to it.
Light source module corresponds to the volume holography manufacturing process of three types there are three types of design scheme respectively, three kinds
Volume holographic element production method is as follows：
Fig. 1 is that reflective volume holography makes schematic diagram, the light that laser is sent out, by optical fiber Of1And Of2
It is divided into two-way, wherein Of2Port coordinate be R (xr, yr, zr), divergent spherical wave illumination holographic dry plate (the silver salt dry plate sent out
Or photoresist sheet) H, Of1Port coordinate be O (xo, yo, zo), distribution of the light sent out on hologram is located at s1Place
In region, point P is focused on1(x1, y1, z), O (xo, yo, zo) on the optical axis of lens Lens, optical axis and the hologram H of lens
Vertically, therefore there is relationship x1=xo, y1=yo.Wherein Shutter is electronic shutter.After light path is adjusted, electronic shutter is opened
Shutter carries out single exposure, obtains corresponding to P1(x1, y1, z) point reflection hologram.Of1Fiber port O (xo, yo, zo)
It fixes, is located in a two-dimensional movement platform with the relative position of lens Lens, after the completion of first position exposes, control two
It ties up motor and drives Of1Fiber port O (xo, yo, zo) with lens Lens it is moved to a new position, open shutter, exposure, shape
At the reflection hologram of second point.By repeatedly moving, after exposure reflection hologram is formed by be reproduced, can simultaneously shape
At the lattice structure of multiple spatial points.Finally develop to hologram, be fixed and bleach, obtains the phase type of high-diffraction efficiency
Reflective volume holography, for the two-photon polymerized parallel lithography system of exposure.
Fig. 2 is the making schematic diagram of transmission-type volume holography 1.The light that laser is sent out, by optical fiber Of1With
Of2It is divided into two-way, wherein Of2Port coordinate be R (xr, yr, zr), (silver salt is dry for the divergent spherical wave illumination holographic dry plate sent out
Plate or photoresist sheet) H, Of1Port coordinate be O (xo, yo, zo), distribution of the light sent out on hologram is located at s1Place
Region in, focus on point P1(x1, y1, z), O (xo, yo, zo) on the optical axis of lens Lens, the optical axis and hologram of lens
H is vertical, therefore has relationship x1=xo, y1=yo.Wherein Shutter is electronic shutter.After light path is adjusted, it is fast to open electronics
Door Shutter carries out single exposure, obtains corresponding to P1(x1, y1, z) point transmission-type volume hologram.Of1Fiber port O (xo,
yo, zo) fixed with the relative position of lens Lens, it is located in a two-dimensional movement platform, after the completion of first position exposes,
It controls two-dimensional motor and drives Of1Fiber port O (xo, yo, zo) with lens Lens it is moved to a new position, shutter is opened, is exposed
Light forms the transmission-type volume hologram of second point.The progress of transmission-type volume hologram is formed by by repeatedly moving, after exposure
It reproduces, the lattice structure of multiple spatial points can be formed simultaneously.Finally develop to hologram, is fixed and bleaches, obtain Gao Yan
The phase type transmission-type holographic element 1 of efficiency is penetrated, for the two-photon polymerized parallel lithography system of exposure.
Transmission-type holographic optical elements (HOE) 1 is made to be only in that with difference when reflection holographic optical elements：It makes reflective
When holographic optical elements (HOE), illumination light is located at the both sides of holographic dry plate with reference light；And when making transmission-type holographic optical elements (HOE) 1,
Illumination light is located at homonymy with reference light.
Fig. 3 is the making schematic diagram of transmission-type volume holographic element 2.The light that laser is sent out, by optical fiber Of1And Of2Point
For two-way.In Of2The port of optical fiber sends out spherical wave, passes through a short focal length lens Lens1Divergent spherical wave is converged, is being converged
A spatial filter is placed in accumulation position, eliminates the influence of stray light, passes through Lens later later2After form plane wave.Space
Filter is located at Lens2Front focal plane on.Plane wave passes through semi-transparent semi-reflecting speculum M, wherein reflective portion vertical illumination
Hologram.And another way light passes through Of1The port of optical fiber sends out divergent spherical wave, and the coordinate of port is O (xo, yo, zo), pass through
Convergence sphere wave, convergent point P are formed after lens1(x1, y1, z).Two-beam is interfered on holographic facet, is formed and is corresponded to P1(x1,
y1, z) reflection hologram.Of1Fiber port O (xo, yo, zo) fixed with the relative position of lens Lens, it is located at a two dimension and moves
On moving platform, after the completion of first position exposes, control two-dimensional motor drives Of1Fiber port O (xo, yo, zo) and lens
Lens is moved to a new position, opens shutter, and exposure forms the transmission-type volume hologram of second point.By repeatedly moving
It is dynamic, it is formed by transmission-type volume hologram after exposure and is reproduced, the lattice structure of multiple spatial points can be formed simultaneously.It is finally right
Hologram develops, and is fixed and bleaches, and obtains the phase type transmission-type volume holography 2 of high-diffraction efficiency, for double
The parallel lithography system of photon polymerization exposure.
Above-mentioned three kinds of volume holographies are phase type volume holography, with above-mentioned three kinds of volume holographies
Corresponding three kinds of light source modules are as described below：
Fig. 4 provides the light source module schematic diagram based on reflective volume holography.The light that femto-second laser is sent out leads to
It crosses fiber port R and sends out the divergent spherical wave reflective volume holography H of illumination, fiber port and reflective volume holographic optics
Relative position is consistent when the relative position of element H makes with reflective volume holographic light source component, ensures the diverging sent out from port R
Meet Bragg diffraction condition in spherical wave illumination to reflective volume holographic element H, reflected light diffraction imaging forms space lattice
Structure.On space lattice structural plan, liquid crystal light valve is placed, liquid crystal light valve is connected with computer, by being loaded into binary mask figure
As the switch each put in control dot matrix.
Fig. 5 is the light source module based on transmission-type volume holography 1.The light that femto-second laser is sent out, passes through optical fiber
Port R sends out divergent spherical wave illumination transmission-type volume holography H, fiber port and transmission-type volume holography H
Relative position when being made with transmission-type volume holographic light source component 1 relative position it is consistent, ensure the diverging spherical sent out from port R
Meet Bragg diffraction condition in wave illumination to transmission-type volume holographic element, transmitted light imaging forms space lattice structure.In sky
Between in lattice structure plane, place liquid crystal light valve, liquid crystal light valve is connected with computer, passes through loading binary mask image control dot matrix
In, the switch each put.
Fig. 6 is the light source module based on transmission-type volume holography 2.The light that femto-second laser is sent out, passes through optical fiber
Port R sends out divergent spherical wave and passes through short focal length lens Lens1After converge, it is dry to eliminate veiling glare in convergent point placement space filter
It disturbs, improves beam quality, pass through lens Lens later2After form directional light, after speculum M reflection, vertical illumination transmission
Formula volume holography H, transmitted light diffraction imaging form lattice structure in space.On space lattice structural plan, place
Liquid crystal light valve, liquid crystal light valve are connected with computer, by being loaded into binary mask image control dot matrix, the switch each put.
Above-mentioned three kinds of light source modules, the first and second have simple in structure, and light path is easy to the advantage of adjustment, but directly
Second-rate using the diverging light sent out from optical fiber head, the relative position of optic fibre end and hologram, which is accurately positioned, to be existed compared with disaster
Degree.The third light source module eliminates interference of stray light by space filtering, the light wave of high quality is formed, after being reflected by speculum
Vertical illumination hologram, the structure is complex, but light wave is high-quality, and contraposition difficulty is small, it is easy to accomplish.In practical applications may be used
According to circumstances accepted or rejected.
The design principle for introducing entire lithography system by taking reflective volume holography as an example below, when using in addition
When two kinds of volume holographies, replaces light source module and parallel photoetching can be realized.
Fig. 7 is the parallel lithography system based on reflective volume holography.The laser coupled that femto-second laser is sent out
Into optical fiber, the phase when optical fiber head sends out divergent spherical wave, and optical fiber head endpoint location is shot with reflective volume holography
It is identical to position, reflective volume holography H is illuminated, after illumination light is modulated by reflective volume hologram, reflected light is one
Set a distance forms lattice structure, in the plane where the lattice structure, places liquid crystal light valve, liquid crystal light valve and computer phase
Even, by being loaded into binary mask image, the switch of each luminous point in lattice structure is controlled.It is mapped to two by the illumination of liquid crystal light valve
Galvanometer is tieed up, the accurate scan in the directions x and the directions y can be carried out by galvanometer, scanning light enters micro- print system.It is incident on micro-
The light of print system, by dichroscope be reflected into object lens carry out micro, light the accurately controlling by piezoelectric ceramics of micro,
Accurately focus on photosensitive material (such as：Photosensitive resin material) some depth location carry out two-photon polymerized exposure.Illumination light
For illuminating photosensitive material (such as photosensitive resin material), CMOS cameras or CCD focus on photosensitive resin table by lens and object lens
Face acquires lithographic images, monitoring and record print procedure in real time.
In a photolithographic process, while multiple luminous points are scanned exposure photo-etching, compared to single spot scan photoetching speed
Degree improves more times, and compared to using pure phase type spatial light modulator to generate space lattice, which substantially reduces.In light
During quarter, according to the quantity and position for using luminous point, designed three-dimensional structure is divided into corresponding region, is layered light
It carves, each luminous point is responsible for the scanning photoetching in a region, and the mask images being loaded into liquid crystal light valve, control are controlled by computer
Sometime, several luminous points are lighted, and are used for photoetching, and other luminous points extinguish, to form designed three-dimensional micro-nano structure.
Fig. 8 is the principle schematic of parallel photoetching.Fig. 8 (a) is three-dimensional photoetching area schematic, for large area
Patterned area is broken down into multiple areas and the identical small photoetching subregion of size, and one of zone number is (m, n),
Total patterned area is divided into M × N blocks, and the mode of each piece of Sao Miao photoetching is identical, uses precise 2-D mobile station Perceived control
The displacement of luminescent material (such as photosensitive resin sample) after the completion of one piece of photoetching, is moved to next position, lower piece of region of photoetching.
By the mode that piecemeal photoetching is spliced, the making of large scale micronano optical element is realized.
Fig. 8 (b) is the binary mask image inputted in liquid crystal light valve, wherein s1、s2、s3And s4For four small circle
Domain, position is consistent with four light spot positions generated by reflective volume holography, small for one of those
Border circular areas is white when image data is 1, and the light for allowing to be irradiated to luminous point thereon penetrates liquid crystal light valve, works as picture number
According to being black when being 0, the light that blocking is irradiated to luminous point thereon penetrates liquid crystal light valve, and liquid crystal light valve serves as the work of photoswitch
With.Mask images are updated in real time according to the three-dimension object situation of printing, and to control in four luminous points, each luminous point is opened
It closes.
For a photoetching subregion, the scan mode of 2-D vibration mirror is identical.A photoetching subregion, quilt shown in Fig. 8 (c)
Four sub-regions are divided into, wherein dash area is print area, and other parts are background area.2-D vibration mirror controls four simultaneously
The corresponding light of a luminous point is scanned, in the mask images being loaded by liquid crystal light valve region corresponding with four luminous points be 1 or
Person 0, controls the light that four luminous points are sent out respectively and is used for photoetching or is not used in photoetching.For a photoetching subregion, specific controlling party
Formula is as described below：
For the first sub-regions (the second quadrant), when 2-D vibration mirror scanning area is located at s1-1When in region, with the region
S in corresponding mask images1It is set as 0, prevents and s1The light that corresponding luminous point is sent out enters lithography system, the background area
Without photoetching.When 2-D vibration mirror scanning area is located at S1-2When in region, the s in mask images corresponding with the region1Setting
It is 1, permission and s1The light that corresponding luminous point is sent out enters lithography system, carries out photoetching；
For the second sub-regions (first quartile), when 2-D vibration mirror scanning area is located at S2-1When in region, with the region
S in corresponding mask images2It is set as 0, prevents and s2The light that corresponding luminous point is sent out enters lithography system, the background area
Without photoetching.When 2-D vibration mirror scanning area is located at S2-2When in region, the s in mask images corresponding with the region2Setting
It is 1, permission and s2The light that corresponding luminous point is sent out enters lithography system, carries out photoetching；
For third sub-regions (third quadrant), when 2-D vibration mirror scanning area is located at s3-1When in region, with the region
S in corresponding mask images3It is set as 0, prevents and s3The light that corresponding luminous point is sent out enters lithography system, the background area
Without photoetching.When 2-D vibration mirror scanning area is located at S3-2When in region, the s in mask images corresponding with the region3Setting
It is 1, permission and s3The light that corresponding luminous point is sent out enters lithography system, carries out photoetching；
For the 4th sub-regions (fourth quadrant), when 2-D vibration mirror scanning area is located at s4-1When in region, with the region
S in corresponding mask images4It is set as 0, prevents and s4The light that corresponding luminous point is sent out enters lithography system, the background area
Without photoetching.When 2-D vibration mirror scanning area is located at S4-2When in region, the s in mask images corresponding with the region4Setting
It is 1, permission and s4The light that corresponding luminous point is sent out enters lithography system, carries out photoetching；
After the completion of the photoetching subregion photoetching, photosensitive resin sample is moved to next photoetching using precise 2-D mobile station
Subregion is repeated up to all photoetching subregions and completes photoetching.
Fig. 9 is the aircraft mould that parallel lithography system using the present invention and parallel photolithography method are lithographically derived
Type, size are 200um × 200um.The system using wavelength is 780nm, the femto-second laser that power is 40mw, can be realized
Micro-structure line width be 100nm or so.
Technical scheme of the present invention and advantageous effect is described in detail in embodiment described above, it should be understood that
Above is only a specific embodiment of the present invention, it is not intended to restrict the invention, it is all to be done in the spirit of the present invention
Any modification, supplementary, and equivalent replacement etc., should all be included in the protection scope of the present invention.
Claims (9)
1. a kind of parallel lithography system based on two-photon polymerized exposure, which is characterized in that including：
Light source module, including femto-second laser and phase type volume holography, the phase type volume holography pair
The femtosecond laser that femto-second laser is sent out is modulated, and forms several luminous points in space lattice arrangement；
Liquid crystal light valve is loaded into binary mask image by computer, it is individually switch to control each luminous point；
Two-dimensional scanning mirrors module, the spot scan that liquid crystal light valve is opened to micro- print module；
Micro- print module, according to the three-dimensional wiener structure of Computer Design, using the luminous point of scanning galvanometer module scans to sense
Luminescent material carries out hierarchic parallel photoetching；
Computer, design binary mask image and three-dimensional wiener structure, according to binary mask image and three-dimensional wiener structure control
The action of liquid crystal light valve, scanning galvanometer module and micro- print module.
2. the parallel lithography system according to claim 1 based on two-photon polymerized exposure, which is characterized in that the light
Source module further includes the first lens, spatial filter and the second lens；
For the spatial filter between the first lens and the second lens, the spatial filter is located at the first lens and second
On the focal plane of lens；
The femtosecond laser that femto-second laser is sent out passes sequentially through coaxial illumination after the first lens, spatial filter and the second lens
To phase type volume holography, several luminous points in space lattice arrangement are formed.
3. the parallel lithography system according to claim 1 or 2 based on two-photon polymerized exposure, which is characterized in that described
Phase type volume holography be to expose the holographic dry plate that is made by holographic interference.
4. the parallel lithography system according to claim 1 based on two-photon polymerized exposure, which is characterized in that the liquid
Brilliant light valve is amplitude type spatial light modulator, and the dot matrix for being located at the luminous point formed through the modulation of phase type volume holography is flat
On face.
5. the parallel lithography system according to claim 1 based on two-photon polymerized exposure, which is characterized in that described is aobvious
Micro- print module includes：
Object lens carry out micro imaging to the luminous point dot matrix of scanning galvanometer module scans；
There is piezotable piezoelectric ceramics, the luminous point dot matrix after micro is imaged to focus on the certain depth of photosensitive material；
Two-dimensional movement platform carries photosensitive material, is controlled by computer, is moved and is felt according to the three-dimensional micro-nano structure of Computer Design
The position of luminescent material.
6. the parallel lithography system according to claim 5 based on two-photon polymerized exposure, which is characterized in that described two
The mobile accuracy for tieing up mobile platform is μm magnitude.
7. the parallel lithography system according to claim 5 based on two-photon polymerized exposure, which is characterized in that described is aobvious
Micro- print module has monitoring device, and the monitoring device includes：
Monitor light source, lighting photosensitive material；
Camera is communicated with computer, and implementing monitoring photoetching process is simultaneously transferred to computer.
8. the parallel lithography system according to claim 7 based on two-photon polymerized exposure, which is characterized in that the phase
Machine is CMOS or CCD camera.
9. a kind of method carrying out parallel photoetching based on the parallel lithography system of claim 1~8 any one of them, feature exist
In, including：
(1) patterned area is decomposed into the identical photoetching subregion of several areas；
(2) a certain photoetching subregion a is moved to the working region of micro- print module, liquid crystal light valve is controlled by computer, is swept
Galvanometer module and micro- print module are retouched, according to the three-dimensional micro-nano structure of Computer Design to photoetching subregion a hierarchic parallel photoetching；
(3) after the completion of photoetching subregion a photoetching, the working regions for being moved to micro- print module another photoetching subregion b are divided
The parallel photoetching of layer；
(4) step (3) is repeated, until all photoetching subregion photoetching are completed.
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