CN108681623A - The method for placing scribe line figure - Google Patents
The method for placing scribe line figure Download PDFInfo
- Publication number
- CN108681623A CN108681623A CN201810323372.6A CN201810323372A CN108681623A CN 108681623 A CN108681623 A CN 108681623A CN 201810323372 A CN201810323372 A CN 201810323372A CN 108681623 A CN108681623 A CN 108681623A
- Authority
- CN
- China
- Prior art keywords
- scribe line
- coordinate
- placing
- areas
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
- G06F30/39—Circuit design at the physical level
- G06F30/392—Floor-planning or layout, e.g. partitioning or placement
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Architecture (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
The invention discloses a kind of methods for placing scribe line figure, include the following steps:Step 1 calculates the coordinate (x, y) of centre of figure point;Scribe line is divided into four blocks by step 2:L, the area R, T, B;Step 3 calculates the placement location in the areas L;Gained calculating position is respectively mapped to each area R, T, B by step 4 by coordinate transform;Step 5, if when each area R, T, B cannot generate effective coordinate, the position for correcting the areas L repeats step 4.The present invention is using coordinate projection transformation, and reactionary slogan, anti-communist poster amendment can place successfully well in the case where scribe line figure is more after tested, and keeps symmetrical.
Description
Technical field
The present invention relates to IC manufacturing fields, and in particular to a method of placing scribe line figure.
Background technology
In mask plate design process, need to place some scribe line figures, these figures be mainly used for alignment or other
Purposes.Alignment mark (ROTATION) figure as shown in Figure 1 is exactly used for rotation error between test mask version.Two
It is exactly a complete figure that alignment mark between exposure region (shot), which is stitched together,.Since these figures need to splice, institute
To need to keep between figure to be aligned.Previous technology, which is mainly used as by software calculating centre of figure point, is placed on scribe line
Reference point in coordinate system.As shown in Fig. 2, P points are the reference point in scribe line coordinate system, coordinate is P (x, y).It is placed on
When scribe line in a certain order, such as:It is again finally the upper right corner to the upper left corner from the lower left corner to the lower right corner.As shown in figure 4,
P1Coordinate be (x1, y1), P2Coordinate be (x2, y2), if x1≤x2, y1≤y2, then P1(x1, y1) prior to P2(x2, y2)。
But when the chip size being related to is larger, mark and PCM are relatively more, the algorithm of existing tool can not be placed, and can only use
It is artificial to place, cause to need to be manually operated when designing frame data, forgets alignment mark requirement, lead to mistake.Exposure
Section alignment mark can not proper alignment, measurement bring error, bring puzzlement to engineering.
Invention content
The purpose of the present invention is to provide a kind of methods for placing scribe line figure, can be in the premise for ensureing pattern alignment
Under placement figure as much as possible.
In order to solve the above technical problems, the present invention provides a kind of method for placing scribe line figure, include the following steps:
Step 1 calculates the coordinate (x, y) of centre of figure point;Scribe line is divided into four blocks by step 2:L, the area R, T, B;Step
Three, calculate the placement location in the areas L;Gained calculating position it is each to be respectively mapped to R, T, B by step 4 by coordinate transform
Area;Step 5, if when each area R, T, B cannot generate effective coordinate, the position for correcting the areas L repeats step 4.
Preferably, further include step 6, when each area R, T, B generates effective coordinate, cycle terminates.
Preferably, the coordinate (x, y) of the step 1 central point is as the reference point being placed in scribe line coordinate system.
Preferably, the area L, R, T, B in the step 2 respectively represents the left side, the right, top, following.
Preferably, it is the areas the L point nearest from scribe line origin that gained position is calculated in the step 3.
Preferably, the θ in the step 4 in coordinate transformation process is determined by angle.
Preferably, it in the step 5, after obtaining Zone R coordinate (x ', y '), calculates and whether meets with other scribe line figures
The requirement of minimum spacing, then new coordinate reactionary slogan, anti-communist poster to the areas L, checks the areas L and its if conditions are not met, until then increasing to satisfaction
His sliding vane groove figure meets the requirement of minimum spacing.
Preferably, in the step 6, the operation of step 4 is repeated, until each area each L, R, T, B all meets minimum spacing
It is required that.
What the present invention can reach has the technical effect that:
Successfully solves the problem of existing tool such as NEC, placement scribe line symmetry of figure and most save space can not be taken into account.
It is projected and is converted using coordinate, and reactionary slogan, anti-communist poster amendment can be well positioned to after tested in the case where scribe line figure is more
Work(, and keep symmetrical.
Description of the drawings
The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments:
Fig. 1-3 is to place scribe line pictorial diagram in the prior art.
Fig. 4-9 is each step schematic diagram that the present invention places scribe line graphical method.
Figure 10 is the comparison diagram that the present invention places scribe line graphical method and conventional art.
Figure 11 is that the step of present invention places scribe line graphical method is schemed.
Specific implementation mode
The present invention realizes a kind of method for placing alignment patterns, this method can be under the premise of ensureing pattern alignment
Placement figure as much as possible.It is excessive that this method solves previous alignment patterns, the problem of can not placing.
The principle of the present invention is the method for placing alignment patterns by mapping, and Figure 11 shows the step of the present invention:
Step 1: the coordinate (x, y) of centre of figure point is calculated, as the reference point being placed in scribe line coordinate system.
Step 2: scribe line is divided into four blocks:L, the area R, T, B respectively represents the left side, the right, top, following.
As shown in Figure 4.
Step 3: calculating the placement location in the areas L first.As shown in figure 5, position obtained by calculating is the areas L from scribe line origin
Nearest point.Formula is as follows:
P (x, y)=Min (| max (m1, m2, m3, K) |, | max (n1, n2, n3, K) |)
Step 4: by coordinate transform, by gained calculating position, it is respectively mapped to each area R, T, B.As shown in Fig. 6,
By coordinate transform Zone R can be mapped to from the areas L.
θ in coordinate transformation process is determined by angle, as shown in fig. 7, corresponding to 8 kinds of different situations respectively.Such as Fig. 8 institutes
Show, Δ x and Δ y respectively represent distance of the graphic reference point to scribing groove center to each area incident point.
Step 5: if when each area R, T, B cannot generate effective coordinate, the position in the areas L is corrected, repeats step 4.
After obtaining Zone R coordinate (x ', y '), the requirement for whether meeting minimum spacing with other scribe line figures is calculated, if conditions are not met, then
Until increasing to satisfaction, then new coordinate reactionary slogan, anti-communist poster to the areas L, check that the areas L and other scribe line figures meet wanting for minimum spacing
It asks.As shown in Figure 9.
Step 6, when each area R, T, B generates effective coordinate, cycle terminates.
The difference of the present invention and conventional method are that the present invention considers the placement situation in four areas, then optimum selecting simultaneously
Best placement location may be implemented to place symmetric figure as much as possible in minimum space in this way.Overcome original NEC
The algorithm of tool can not be placed, and can only manually place, and the error problem occurred.Figure 10 shows that the present invention is put with the prior art
It is set to the comparison of power.It is tested with 500 figures, and limits some figures at random wherein and need to match, in chip size
It is fewer for the space of placement in the case of smaller.As shown, the placement success rate of the present invention is significantly higher.
Claims (8)
1. a kind of method for placing scribe line figure, which is characterized in that include the following steps:
Step 1 calculates the coordinate (x, y) of centre of figure point;
Scribe line is divided into four blocks by step 2:L, the area R, T, B;
Step 3 calculates the placement location in the areas L;
Gained calculating position is respectively mapped to each area R, T, B by step 4 by coordinate transform;
Step 5, if when each area R, T, B cannot generate effective coordinate, the position for correcting the areas L repeats step 4.
2. the method for placing scribe line figure as described in claim 1, which is characterized in that further include step 6, when R, T, B are each
When a area generates effective coordinate, cycle terminates.
3. the method for placing scribe line figure as claimed in claim 1 or 2, which is characterized in that the step 1 central point
Coordinate (x, y) is as the reference point being placed in scribe line coordinate system.
4. the method for placing scribe line figure as claimed in claim 1 or 2, which is characterized in that L, R in the step 2,
T, the areas B respectively represent the left side, the right, top, following.
5. the method for placing scribe line figure as claimed in claim 1 or 2, which is characterized in that calculate institute in the step 3
It is the areas the L point nearest from scribe line origin to obtain position.
6. the method for placing scribe line figure as claimed in claim 1 or 2, which is characterized in that coordinate becomes in the step 4
θ during changing is determined by angle.
7. the method for placing scribe line figure as claimed in claim 2, which is characterized in that in the step 5, obtain Zone R seat
Mark (x ', y ') after, whether calculating meets the requirement of minimum spacing with other scribe line figures, if conditions are not met, then increasing to full
Until foot, then new coordinate reactionary slogan, anti-communist poster to the areas L, check that the areas L and other sliding vane groove figures meet the requirement of minimum spacing.
8. the method for placing scribe line figure as claimed in claim 2, which is characterized in that in the step 6, repeat step
Four operation, until each area each L, R, T, B all meets minimum spacing requirement.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810323372.6A CN108681623A (en) | 2018-04-11 | 2018-04-11 | The method for placing scribe line figure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810323372.6A CN108681623A (en) | 2018-04-11 | 2018-04-11 | The method for placing scribe line figure |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108681623A true CN108681623A (en) | 2018-10-19 |
Family
ID=63800910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810323372.6A Pending CN108681623A (en) | 2018-04-11 | 2018-04-11 | The method for placing scribe line figure |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108681623A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110309549A (en) * | 2019-06-05 | 2019-10-08 | 上海华虹宏力半导体制造有限公司 | The method for placing Fuse figure by Boolean calculation |
CN110334402A (en) * | 2019-06-05 | 2019-10-15 | 上海华虹宏力半导体制造有限公司 | The method for placing symmetric figure |
CN111222300A (en) * | 2020-01-08 | 2020-06-02 | 上海华虹宏力半导体制造有限公司 | Method and computer device for identifying marking pattern in scribing slot mask layout |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1154404A (en) * | 1997-08-04 | 1999-02-26 | Nec Corp | Alignment method |
CN1677616A (en) * | 2004-04-01 | 2005-10-05 | 上海宏力半导体制造有限公司 | Mask with two-way alignment pattern |
CN101135859A (en) * | 2007-08-20 | 2008-03-05 | 上海微电子装备有限公司 | Transmission aligning mark combination and alignment method of light scribing device |
CN101241315A (en) * | 2008-03-14 | 2008-08-13 | 中国科学院上海光学精密机械研究所 | Asymmetric phase-shift grating mark and application thereof in object image difference detection of photoetching machine |
CN101526750A (en) * | 2009-01-13 | 2009-09-09 | 上海微电子装备有限公司 | Alignment system for photolithographic device and photolithographic device applying same |
CN105511238A (en) * | 2014-09-26 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Lithography alignment mark structure and formation method and formation method of semiconductor structure |
-
2018
- 2018-04-11 CN CN201810323372.6A patent/CN108681623A/en active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1154404A (en) * | 1997-08-04 | 1999-02-26 | Nec Corp | Alignment method |
CN1677616A (en) * | 2004-04-01 | 2005-10-05 | 上海宏力半导体制造有限公司 | Mask with two-way alignment pattern |
CN101135859A (en) * | 2007-08-20 | 2008-03-05 | 上海微电子装备有限公司 | Transmission aligning mark combination and alignment method of light scribing device |
CN101241315A (en) * | 2008-03-14 | 2008-08-13 | 中国科学院上海光学精密机械研究所 | Asymmetric phase-shift grating mark and application thereof in object image difference detection of photoetching machine |
CN101526750A (en) * | 2009-01-13 | 2009-09-09 | 上海微电子装备有限公司 | Alignment system for photolithographic device and photolithographic device applying same |
CN105511238A (en) * | 2014-09-26 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Lithography alignment mark structure and formation method and formation method of semiconductor structure |
US20170170129A1 (en) * | 2014-09-26 | 2017-06-15 | Semiconductor Manufacturing International (Shanghai) Corporation | Photolithography alignment mark structures and semiconductor structures |
Non-Patent Citations (1)
Title |
---|
李月景: "二维图形及三维图形的矩阵变换运算", 《上海理工大学学报》 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110309549A (en) * | 2019-06-05 | 2019-10-08 | 上海华虹宏力半导体制造有限公司 | The method for placing Fuse figure by Boolean calculation |
CN110334402A (en) * | 2019-06-05 | 2019-10-15 | 上海华虹宏力半导体制造有限公司 | The method for placing symmetric figure |
CN110309549B (en) * | 2019-06-05 | 2023-04-07 | 上海华虹宏力半导体制造有限公司 | Method for placing Fuse graph through Boolean operation |
CN111222300A (en) * | 2020-01-08 | 2020-06-02 | 上海华虹宏力半导体制造有限公司 | Method and computer device for identifying marking pattern in scribing slot mask layout |
CN111222300B (en) * | 2020-01-08 | 2023-08-22 | 上海华虹宏力半导体制造有限公司 | Method and computer device for identifying mark patterns in scribe line mask layout |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108681623A (en) | The method for placing scribe line figure | |
CN107636535B (en) | Method for applying vertex-based correction to semiconductor design | |
CN107230255B (en) | Tooth restoration method based on universal template | |
US8984451B2 (en) | Free form fracturing method for electronic or optical lithography | |
CN101334586A (en) | Method of manufacturing mask for semiconductor device | |
CN104765254B (en) | A kind of alignment mark | |
CN102138106A (en) | Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography | |
CN107450266A (en) | The modification method and system of optical approach effect | |
CN107595419A (en) | Artificial tooth computer-implemented method, terminal and computer-readable recording medium | |
CN104465335B (en) | Plotting method and drawing apparatus | |
CN109086495A (en) | The method that BIM goes out hard-cover construction drawing | |
CN103311103B (en) | The territory map layer design method of semiconductor chip and mask plate thereof | |
EP4094126A1 (en) | System, software application, and method for lithography stitching | |
CN104457691B (en) | Method for obtaining elevation information of main building body | |
CN106773544A (en) | A kind of OPC modeling methods of control secondary graphics signal rate of false alarm | |
CN108333881A (en) | A kind of splicing adjustment method applied to write-through exposure machine | |
CN104216235B (en) | Figure pretreatment method and method for measuring figure density | |
CN100592494C (en) | Method for correcting layout design for correcting metallic coating of contact hole | |
CN103777460A (en) | Method for improving precision of optical proximity effect correction model | |
CN106227002A (en) | A kind of method improving the efficiency adjusting splicing and multiplying power size | |
US8141009B2 (en) | Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process | |
CN110334402A (en) | The method for placing symmetric figure | |
CN105446090B (en) | It is directed at measurement method | |
CN111474820A (en) | Optimization method for simulating generation of reentrant angle target graph | |
TW200418084A (en) | Integrated circuit pattern designing method, exposure mask manufacturing method, exposure mask, and integrated circuit device manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181019 |