CN108677166A - A kind of chemical vapor deposition unit being used to prepare new material - Google Patents
A kind of chemical vapor deposition unit being used to prepare new material Download PDFInfo
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- CN108677166A CN108677166A CN201810678354.XA CN201810678354A CN108677166A CN 108677166 A CN108677166 A CN 108677166A CN 201810678354 A CN201810678354 A CN 201810678354A CN 108677166 A CN108677166 A CN 108677166A
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- new material
- chemical vapor
- vapor deposition
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- 239000000463 material Substances 0.000 title claims abstract description 32
- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 27
- 230000007246 mechanism Effects 0.000 claims abstract description 56
- 238000010438 heat treatment Methods 0.000 claims abstract description 18
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 14
- 241000883990 Flabellum Species 0.000 claims abstract description 10
- 238000000429 assembly Methods 0.000 claims description 9
- 230000000712 assembly Effects 0.000 claims description 9
- 230000005611 electricity Effects 0.000 claims description 2
- 238000000465 moulding Methods 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 238000000151 deposition Methods 0.000 abstract description 15
- 230000008021 deposition Effects 0.000 abstract description 15
- 239000007789 gas Substances 0.000 abstract description 13
- 238000004519 manufacturing process Methods 0.000 abstract description 13
- 239000012495 reaction gas Substances 0.000 abstract description 10
- 238000001514 detection method Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000003889 chemical engineering Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000010977 unit operation Methods 0.000 description 1
- 230000003519 ventilatory effect Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45589—Movable means, e.g. fans
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The present invention relates to a kind of chemical vapor deposition units being used to prepare new material,Including pedestal,Air guide mechanism,Deposited tube,Clamping device,Kind stick,Rotating mechanism and two heating mechanisms,Air guide mechanism includes air inlet pipe,Air guide room and gas-guide tube,Shaft is equipped in air guide room,Turntable,First motor,Drive block,Adjusting part and two flabellums,Heating mechanism includes slide plate,Moving assembly,Oxyhydrogen flame blowtorch,Riser,Top plate,X-ray emitter and X-ray receptor,The chemical vapor deposition unit for being used to prepare new material adjusts the dosage for being passed through reaction gas by air guide mechanism,So that device is reduced with the running time increases and is passed through gas flow,Ensure to reduce equipment production cost while deposition reaction,Moreover,The detection mobile in the lower section of deposited tube and carrying out deposition conditions by heating mechanism,The movement of slide plate is controlled according to the attachment of film,So that film uniform deposition is on kind of a stick surface,Improve the quality of production of new material.
Description
Technical field
The present invention relates to new material production equipment field, more particularly to a kind of chemical vapor deposition being used to prepare new material
Device.
Background technology
Chemical vapor deposition is a kind of Chemical Engineering Technology, which mainly using one kind containing film element or concentrates gas
The method that phase compound carries out chemical reaction production film on simple substance, substrate surface.Chemical vapor deposition, which is widely used in, to be carried
Pure material develops new crystal, the various monocrystalline of deposition, polycrystalline or glassy state inorganic thin film material.Therefore, chemical vapor deposition is common
In preparing various new materials.
Chemical vapor deposition in the process of running, needs constantly to be passed through reaction gas, with the progress of reaction, is attached to
New material film on matrix surface gradually increases, and therefore, with the increase in reaction time, the gas aequum of reaction gradually subtracts
It is small, but since the gas flow being passed through immobilizes, cause to be passed through additional excessive gas, and then increase reaction cost,
Moreover, during the reaction, it is influenced by the variation of reactant gas flow, the film of matrix surface is unevenly distributed, and is reduced
The quality of the new material of production.
Invention content
The technical problem to be solved by the present invention is to：For overcome the deficiencies in the prior art, it provides one kind and being used to prepare green wood
The chemical vapor deposition unit of material.
The technical solution adopted by the present invention to solve the technical problems is：A kind of chemical vapor deposition being used to prepare new material
Product device, including pedestal, air guide mechanism, deposited tube, clamping device, kind stick, controller, rotating mechanism, two heating mechanisms and
The both ends of two supporting mechanisms, the deposited tube are arranged by two supporting mechanisms in the top of pedestal, the support machine respectively
Structure includes support plate and support ring, and the support ring is fixed on the top of pedestal by support plate, and the support ring is set in deposited tube
On, the air guide mechanism and clamping device are separately positioned on the both ends of deposited tube, and described kind of stick is arranged in deposited tube, the control
Device and rotating mechanism processed are respectively positioned on the top of air guide mechanism, and PLC is equipped in the controller；
The air guide mechanism includes air inlet pipe, air guide room and gas-guide tube, and the air inlet pipe and gas-guide tube are located at air guide
The both sides of room, the air inlet pipe are connected to air guide room, and one end of the gas-guide tube is connected to air guide room, the gas-guide tube it is another
End is arranged in deposited tube, and shaft, turntable, first motor, drive block, adjusting part, two bearings are equipped in the air guide room
On the inner wall for the both sides for being separately fixed at air guide room with two flabellums, two bearings, the both ends of the shaft are separately positioned on two
In a bearing, two flabellums are located at the both sides of shaft, and the turntable is set in shaft, and the shape of the drive block is circle
Taper, the drive block are resisted against on turntable, and the first motor is electrically connected with PLC, and the first motor is driven with drive block
Connection, the adjusting part are connect with first motor；
The heating mechanism includes slide plate, moving assembly, oxyhydrogen flame blowtorch, riser, top plate, X-ray emitter and X-ray
Receiver, the moving assembly are located at the lower section of slide plate, and the top plate is fixed on the top of slide plate, the top plate position by riser
In the top of deposited tube, the oxyhydrogen flame blowtorch and X-ray emitter are each attached to the top of slide plate, the X-ray receptor
It is fixed on the lower section of top plate, the oxyhydrogen flame blowtorch, X-ray emitter and X-ray receptor are electrically connected with PLC.
Preferably, in order to drive deposited tube to rotate, the rotating mechanism includes the second motor, first gear and the second tooth
Wheel, second motor are fixed on the top of air guide room, and second motor is electrically connected with PLC, second motor and first
Gear drive connects, and the second gear is set on deposited tube, and the first gear is engaged with second gear.
Preferably, in order to realize the movement of slide plate, the moving assembly includes third motor and two idler wheels, described
Three motors are fixed on the lower section of slide plate, and the third motor is electrically connected with PLC, and two idler wheels are located at the two of third motor
Side, the third motor are sequentially connected with idler wheel.
Preferably, for the moving direction of fixed glides, slide bar, the both ends point of the slide bar are equipped between two support plates
It is not fixedly connected with two support plates, the slide plate is set on slide bar.
Preferably, in order to drive first motor to move, the adjusting part includes air pump, cylinder and piston, the gas
Cylinder is fixed on the inner wall of air guide room, and the air pump is connected to cylinder, and the air pump is electrically connected with PLC, one end of the piston
It is arranged in cylinder, the other end of the piston is fixedly connected with first motor.
Preferably, in order to which kind of a stick is clamped, the clamping device includes several clamp assemblies, and the clamp assemblies are circumferentially equal
The even periphery for being distributed in deposited tube, the clamp assemblies include connecting rod, tablet, telescopic unit and clamping plate, and the tablet passes through
Connecting rod is fixedly connected with deposited tube, and the telescopic unit is located at the side of close kind of the stick of tablet, the telescopic unit and folder
Plate is sequentially connected.
Preferably, in order to drive clamping plate to move, the telescopic unit includes the 4th motor, the 4th drive shaft and casing,
4th motor is connect with 4 wheel driven driving-axle gearing, and the 4th motor is electrically connected with PLC, and described sleeve pipe is set in 4 wheel driven
On moving axis, described sleeve pipe be equipped with the junction of the 4th drive shaft and the 4th matched screw thread of drive shaft, described sleeve pipe and folder
Plate is fixedly connected.
Preferably, for the moving direction of strap, the both ends of the clamping plate are equipped with orientation lever, and the tablet is arranged
On orientation lever.
Preferably, in order to detect whether tablet is resisted against on kind of stick, pressure sensor, the pressure are equipped in the tablet
Force snesor is electrically connected with PLC.
Preferably, in order to reinforce the connection between connecting rod and tablet, the connecting rod and tablet are integrally formed knot
Structure.
The invention has the advantages that the chemical vapor deposition unit for being used to prepare new material is adjusted by air guide mechanism
It is passed through the dosage of reaction gas, so that device is reduced with the running time increases and is passed through gas flow, while ensureing deposition reaction
Equipment production cost is reduced, compared with existing air guide mechanism, which can need flexibly control logical according to reaction
Enter gas flow, moreover, the detection mobile in the lower section of deposited tube and carrying out deposition conditions by heating mechanism, according to film
Attachment control slide plate movement so that film uniform deposition improves the quality of production of new material on kind of a stick surface, with
Existing heating mechanism is compared, the heating mechanism flexible structure, stable and reliable operation.
Description of the drawings
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is the structural schematic diagram of the chemical vapor deposition unit for being used to prepare new material of the present invention；
Fig. 2 is the portions the A enlarged drawing of Fig. 1；
Fig. 3 is the portions the B enlarged drawing of Fig. 1；
Fig. 4 is the structural schematic diagram of the heating mechanism of the chemical vapor deposition unit for being used to prepare new material of the present invention；
In figure：1. pedestal, 2. deposited tubes, 3. kinds of sticks, 4. controllers, 5. support plates, 6. support rings, 7. air inlet pipe, 8. air guides
Room, 9. gas-guide tubes, 10. shafts, 11. turntables, 12. first motors, 13. drive blocks, 14. bearings, 15. flabellums, 16. slide plates, 17.
Oxyhydrogen flame blowtorch, 18. risers, 19. top plates, 20.X ray emitters, 21.X ray receivers, 22. second motors, 23. first
Gear, 24. second gears, 25. third motors, 26. idler wheels, 27. slide bars, 28. air pumps, 29. cylinders, 30. pistons, 31. connections
Bar, 32. tablets, 33. clamping plates, 34. the 4th motors, 35. the 4th drive shafts, 36. casings, 37. orientation levers, 38. pressure sensors.
Specific implementation mode
In conjunction with the accompanying drawings, the present invention is further explained in detail.These attached drawings are simplified schematic diagram, only with
Illustration illustrates the basic structure of the present invention, therefore it only shows the composition relevant to the invention.
As shown in Figure 1, a kind of chemical vapor deposition unit being used to prepare new material, including it is pedestal 1, air guide mechanism, heavy
Product pipe 2, clamping device, kind stick 3, controller 4, rotating mechanism, two heating mechanisms and two supporting mechanisms, the deposited tube 2
Both ends be arranged respectively in the top of pedestal 1 by two supporting mechanisms, the supporting mechanism includes support plate 5 and support ring 6, institute
State the top that support ring 6 is fixed on pedestal 1 by support plate 5, the support ring 6 is set on deposited tube 2, the air guide mechanism and
Clamping device is separately positioned on the both ends of deposited tube 2, and described kind of stick 3 is arranged in deposited tube 2, the controller 4 and whirler
Structure is respectively positioned on the top of air guide mechanism, and PLC is equipped in the controller 4；
In the chemical vapor deposition unit, deposited tube 2 is supported using the support ring 6 of 5 top of support plate, it is heavy that kind stick 3 is inserted into
In product pipe 2, equipment operation is operated by controller 4, will be planted after stick 3 is clamped by clamping device, by air guide mechanism by reaction gas
Body is passed through in deposited tube 2, is internally heated to deposited tube 2 by heating mechanism so that and deposition reaction carries out on 3 surface of kind of stick,
Kind of stick 3 and deposited tube 2 can be driven to rotate by rotating mechanism so that film is uniform in the attachment of 3 surface of kind of stick, improves generation
The quality of new material.
As shown in Fig. 2, the air guide mechanism includes air inlet pipe 7, air guide room 8 and gas-guide tube 9, the air inlet pipe 7 and air guide
Pipe 9 is located at the both sides of air guide room 8, and the air inlet pipe 7 is connected to air guide room 8, one end and the air guide room 8 of the gas-guide tube 9
The other end of connection, the gas-guide tube 9 is arranged in deposited tube 2, and shaft 10, the 11, first electricity of turntable are equipped in the air guide room 8
Machine 12, drive block 13, adjusting part, two bearings 14 and two flabellums 15, two bearings 14 are separately fixed at the two of air guide room 8
On the inner wall of side, the both ends of the shaft 10 are separately positioned in two bearings 14, and two flabellums 15 are located at shaft 10
Both sides, the turntable 11 are set in shaft 10, and the shape of the drive block 13 is cone, and the drive block 13, which is resisted against, to be turned
On disk 11, the first motor 12 is electrically connected with PLC, and the first motor 12 is sequentially connected with drive block 13, the adjusting group
Part is connect with first motor 12；
When air guide mechanism is run, is started by PLC controls first motor 12, drive block 13 is driven to rotate, drive block 13 acts on
On turntable 11 so that turntable 11 drives shaft 10 to be rotated between two bearings 14, so that flabellum 15 rotates, generates gas
External reaction gas is passed through by air inlet pipe 7 in air guide room 8 by stream, air-flow, by reaction gas from gas-guide tube 9 to deposited tube
2 inside import, and with the progress of reaction, PLC controls to adjust assembly operating, drives first motor 12 to close to the side of deposited tube 2
To movement, change the contact position of turntable 11 and drive block 13, reduce the rotating speed of turntable 11 so that air-flow weakens, and reduction is passed through
Amount of reactant gases so that equipment controls ventilatory capacity according to flexible reaction time in process of production, reduces the reaction gas being passed through
The dosage of body, reduces production cost.
As shown in figure 4, the heating mechanism include slide plate 16, moving assembly, oxyhydrogen flame blowtorch 17, riser 18, top plate 19,
X-ray emitter 20 and X-ray receptor 21, the moving assembly are located at the lower section of slide plate 16, and the top plate 19 passes through riser
18 are fixed on the top of slide plate 16, and the top plate 19 is located at the top of deposited tube 2, the oxyhydrogen flame blowtorch 17 and X-ray emission
Device 20 is each attached to the top of slide plate 16, and the X-ray receptor 21 is fixed on the lower section of top plate 19, the oxyhydrogen flame blowtorch
17, X-ray emitter 20 and X-ray receptor 21 are electrically connected with PLC.
Slide plate 16 is driven to be moved in the lower section of deposited tube 2 by moving assembly, PLC controls oxyhydrogen flame blowtorch 17 to rotation
Deposited tube 2 is heated so that reaction gas carries out deposition reaction at this, is moved below deposited tube 2 by slide plate 16
It is dynamic so that oxyhydrogen flame blowtorch 17 heats deposited tube 2 everywhere, and in order to detect reaction condition, PLC controls X-ray emitter
20 emit X-ray to deposited tube 2, and traditional X-ray is received by the X-ray receptor 21 of the lower section of top plate 19, and by ray signal
PLC is fed back to, PLC judges film deposition conditions according to ray situation, when X-ray attenuation is small, shows that film thickness is smaller, this
When PLC control moving assembly it is out of service, when film deposits to certain thickness, then control moving assembly drive slide plate 16 move
It is heated by oxyhydrogen flame blowtorch 17 after to other positions.
As shown in Fig. 2, the rotating mechanism includes the second motor 22, first gear 23 and second gear 24, described second
Motor 22 is fixed on the top of air guide room 8, and second motor 22 is electrically connected with PLC, second motor 22 and first gear
23 are sequentially connected, and the second gear 24 is set on deposited tube 2, and the first gear 23 is engaged with second gear 24.
PLC controls the second motor 22 and starts, and first gear 23 is driven to rotate, and first gear 23 acts on second gear 24
On so that second gear 24 rotates, and then deposited tube 2 is driven to rotate.
Preferably, in order to realize the movement of slide plate 16, the moving assembly includes third motor 25 and two idler wheels 26,
The third motor 25 is fixed on the lower section of slide plate 16, and the third motor 25 is electrically connected with PLC, and two idler wheels 26 are located at
The both sides of third motor 25, the third motor 25 are sequentially connected with idler wheel 26.PLC controls third motor 25 and starts, and drives rolling
26 rotation of wheel so that idler wheel 26 is moved in the top of pedestal 1, and then realizes the movement of slide plate 16.
Preferably, for the moving direction of fixed glides 16, slide bar 27, the slide bar 27 are equipped between two support plates 5
Both ends be fixedly connected respectively with two support plates 5, the slide plate 16 is set on slide bar 27.Cunning is secured by two support plates 5
The position of bar 27 so that slide plate 16 is moved along 27 axis of fixed slide bar, and then secures the moving direction of slide plate 16.
As shown in Fig. 2, the adjusting part includes air pump 28, cylinder 29 and piston 30, the cylinder 29 is fixed on air guide
On the inner wall of room 8, the air pump 28 is connected to cylinder 29, and the air pump 28 is electrically connected with PLC, one end setting of the piston 30
In cylinder 29, the other end of the piston 30 is fixedly connected with first motor 12.
PLC controls air pump 28 and starts, and changes the air pressure in cylinder 29, according to the air pressure change in cylinder 29 so that piston
30 occur corresponding movement, and then first motor 12 is driven to move.
As shown in figure 3, the clamping device includes several clamp assemblies, the clamp assemblies are circumferentially evenly distributed on deposition
The periphery of pipe 2, the clamp assemblies include connecting rod 31, tablet 32, telescopic unit and clamping plate 33, and the tablet 32 passes through connection
Bar 31 is fixedly connected with deposited tube 2, the telescopic unit be located at tablet 32 close to the side of kind of stick 3, the telescopic unit with
Clamping plate 33 is sequentially connected.
Tablet 32 is fixed on deposited tube 2 by connecting plate, then PLC controls telescopic unit operation, drives clamping plate 33
It is mobile so that clamping plate 33 is resisted against on kind of stick 3, so as to complete the clamping to kind of stick 3.
Preferably, in order to drive clamping plate 33 to move, the telescopic unit includes the 4th motor 34,35 and of the 4th drive shaft
Casing 36, the 4th motor 34 and the 4th drive shaft 35 are sequentially connected, and the 4th motor 34 is electrically connected with PLC, the set
Pipe 36 is set in the 4th drive shaft 35, described sleeve pipe 36 be equipped with the junction of the 4th drive shaft 35 and the 4th drive shaft 35
Matched screw thread, described sleeve pipe 36 are fixedly connected with clamping plate 33.PLC controls the 4th motor 34 and starts, and drives the 4th drive shaft 35
Rotation, the 4th drive shaft 35 is by threaded function on casing 36 so that casing 36 drives clamping plate 33 along the 4th drive shaft 35
Axis direction movement.
Preferably, for the moving direction of strap 33, the both ends of the clamping plate 33 are equipped with orientation lever 37, described flat
Plate 32 is set on orientation lever 37.When preventing the 4th drive shaft 35 from rotating by orientation lever 37,33 turns of casing 36 and clamping plate are driven
It is dynamic, so that clamping plate 33 is smoothly moved along the axis of orientation lever 37.
Preferably, in order to detect whether tablet 32 is resisted against on kind of stick 3, pressure sensor is equipped in the tablet 32
38, the pressure sensor 38 is electrically connected with PLC.After tablet 32 is resisted against on kind of stick 3, kind stick 3 generates pressure to tablet 32,
So that the pressure sensor 38 in tablet 32 receives pressure data, and pressure data is fed back into PLC, PLC is according to number pressure
It is resisted against on kind of stick 3 according to determining tablet 32, so as to complete the clamping to kind of stick 3, the 4th motor 34 of then PLC controls stops fortune
Row.
Preferably, the feature consolidated using integrated formed structure, in order to reinforce the company between connecting rod 31 and tablet 32
It connects, the connecting rod 31 is an integral molding structure with tablet 32.
When the chemical vapor deposition unit is run, drives first motor 12 and drive block 13 to move by adjusting part, change
The contact position for becoming drive block 13 and turntable 11, to adjust the rotary speed of flabellum 15 according to reaction condition, it is heavy that reduction is passed through
The dosage of reaction gas in product pipe 2 moreover, in process of production, passes through moving assembly to save production cost
It drives slide plate 16 to be moved in the lower section of deposited tube 2, and is rotated by rotating mechanism, connect by X-ray emitter 20 and X-ray
It receives device 21 and detects deposition conditions, control the movement of moving assembly, concentration heating is carried out by oxyhydrogen flame blowtorch 17, film is made uniformly to sink
Product on the surface of kind of stick 3, to improve generation new material quality.
Compared with prior art, which is passed through by air guide mechanism adjusting
The dosage of reaction gas makes device reduce with the running time increases and is passed through gas flow, ensures to reduce while deposition reaction
Equipment production cost, compared with existing air guide mechanism, which can need flexibly control be passed through gas according to reaction
The scale of construction, moreover, the detection mobile in the lower section of deposited tube 2 and carrying out deposition conditions by heating mechanism, according to film
Attachment controls the movement of slide plate 16 so that and film uniform deposition improves the quality of production of new material on 3 surface of kind of stick,
Compared with existing heating mechanism, the heating mechanism flexible structure, stable and reliable operation.
It is enlightenment with above-mentioned desirable embodiment according to the present invention, through the above description, relevant staff is complete
Various changes and amendments can be carried out without departing from the scope of the technological thought of the present invention' entirely.The technology of this invention
Property range is not limited to the contents of the specification, it is necessary to determine its technical scope according to right.
Claims (10)
1. a kind of chemical vapor deposition unit being used to prepare new material, which is characterized in that including pedestal (1), air guide mechanism, sink
Product pipe (2), clamping device, kind stick (3), controller (4), rotating mechanism, two heating mechanisms and two supporting mechanisms are described heavy
The both ends of product pipe (2) are arranged by two supporting mechanisms in the top of pedestal (1) respectively, and the supporting mechanism includes support plate (5)
With support ring (6), the support ring (6) is fixed on the top of pedestal (1) by support plate (5), and it is heavy that the support ring (6) is set in
On product pipe (2), the air guide mechanism and clamping device are separately positioned on the both ends of deposited tube (2), and described kind of stick (3) setting is heavy
In product pipe (2), the controller (4) and rotating mechanism are respectively positioned on the top of air guide mechanism, equipped with PLC in the controller (4)；
The air guide mechanism includes air inlet pipe (7), air guide room (8) and gas-guide tube (9), and the air inlet pipe (7) and gas-guide tube (9) divide
Not Wei Yu air guide room (8) both sides, the air inlet pipe (7) is connected to air guide room (8), one end of the gas-guide tube (9) and air guide
Room (8) is connected to, the setting of the other end of the gas-guide tube (9) be equipped in deposited tube (2), in the air guide room (8) shaft (10),
Turntable (11), first motor (12), drive block (13), adjusting part, two bearings (14) and two flabellums (15), two bearings
(14) it is separately fixed on the inner wall of the both sides of air guide room (8), the both ends of the shaft (10) are separately positioned on two bearings
(14) in, two flabellums (15) are located at the both sides of shaft (10), and the turntable (11) is set in shaft (10), the drive
The shape of motion block (13) is cone, and the drive block (13) is resisted against on turntable (11), the first motor (12) and PLC electricity
Connection, the first motor (12) are sequentially connected with drive block (13), and the adjusting part is connect with first motor (12)；
The heating mechanism includes slide plate (16), moving assembly, oxyhydrogen flame blowtorch (17), riser (18), top plate (19), X-ray
Transmitter (20) and X-ray receptor (21), the moving assembly are located at the lower section of slide plate (16), and the top plate (19) passes through perpendicular
Plate (18) is fixed on the top of slide plate (16), and the top plate (19) is located at the top of deposited tube (2), the oxyhydrogen flame blowtorch (17)
The top of slide plate (16) is each attached to X-ray emitter (20), the X-ray receptor (21) is fixed under top plate (19)
Side, the oxyhydrogen flame blowtorch (17), X-ray emitter (20) and X-ray receptor (21) are electrically connected with PLC.
2. the chemical vapor deposition unit as described in claim 1 for being used to prepare new material, which is characterized in that the whirler
Structure includes the second motor (22), first gear (23) and second gear (24), and second motor (22) is fixed on air guide room (8)
Top, second motor (22) is electrically connected with PLC, and second motor (22) is sequentially connected with first gear (23), institute
It states second gear (24) to be set on deposited tube (2), the first gear (23) is engaged with second gear (24).
3. the chemical vapor deposition unit as described in claim 1 for being used to prepare new material, which is characterized in that described mobile group
Part includes third motor (25) and two idler wheels (26), and the third motor (25) is fixed on the lower section of slide plate (16), and described
Three motors (25) are electrically connected with PLC, and two idler wheels (26) are located at the both sides of third motor (25), the third motor (25)
It is sequentially connected with idler wheel (26).
4. the chemical vapor deposition unit as described in claim 1 for being used to prepare new material, which is characterized in that two support plates
(5) slide bar (27) is equipped between, the both ends of the slide bar (27) are fixedly connected with two support plates (5) respectively, the slide plate (16)
It is set on slide bar (27).
5. the chemical vapor deposition unit as described in claim 1 for being used to prepare new material, which is characterized in that the adjusting group
Part includes air pump (28), cylinder (29) and piston (30), and the cylinder (29) is fixed on the inner wall of air guide room (8), the gas
Pump (28) is connected to cylinder (29), and the air pump (28) is electrically connected with PLC, and one end of the piston (30) is arranged in cylinder (29)
Interior, the other end of the piston (30) is fixedly connected with first motor (12).
6. the chemical vapor deposition unit as described in claim 1 for being used to prepare new material, which is characterized in that the clamping machine
Structure includes several clamp assemblies, and the clamp assemblies are circumferentially evenly distributed on the periphery of deposited tube (2), and the clamp assemblies include
Connecting rod (31), tablet (32), telescopic unit and clamping plate (33), the tablet (32) pass through connecting rod (31) and deposited tube (2)
It is fixedly connected, the telescopic unit is located at being passed close to the side of kind of stick (3), the telescopic unit and clamping plate (33) for tablet (32)
Dynamic connection.
7. the chemical vapor deposition unit as claimed in claim 6 for being used to prepare new material, which is characterized in that the flexible list
Member includes the 4th motor (34), the 4th drive shaft (35) and casing (36), the 4th motor (34) and the 4th drive shaft (35)
It is sequentially connected, the 4th motor (34) is electrically connected with PLC, and described sleeve pipe (36) is set in the 4th drive shaft (35), described
Casing (36) be equipped with the junction of the 4th drive shaft (35) and the 4th drive shaft (35) matched screw thread, described sleeve pipe (36)
It is fixedly connected with clamping plate (33).
8. the chemical vapor deposition unit as claimed in claim 6 for being used to prepare new material, which is characterized in that the clamping plate
(33) both ends are equipped with orientation lever (37), and the tablet (32) is set on orientation lever (37).
9. the chemical vapor deposition unit as claimed in claim 6 for being used to prepare new material, which is characterized in that the tablet
(32) pressure sensor (38) is equipped in, the pressure sensor (38) is electrically connected with PLC.
10. the chemical vapor deposition unit as claimed in claim 6 for being used to prepare new material, which is characterized in that the connection
Bar (31) is an integral molding structure with tablet (32).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810678354.XA CN108677166B (en) | 2018-06-27 | 2018-06-27 | Chemical vapor deposition device for preparing new material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810678354.XA CN108677166B (en) | 2018-06-27 | 2018-06-27 | Chemical vapor deposition device for preparing new material |
Publications (2)
| Publication Number | Publication Date |
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| CN108677166A true CN108677166A (en) | 2018-10-19 |
| CN108677166B CN108677166B (en) | 2020-04-21 |
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ID=63812284
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810678354.XA Active CN108677166B (en) | 2018-06-27 | 2018-06-27 | Chemical vapor deposition device for preparing new material |
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| Country | Link |
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| CN (1) | CN108677166B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109692639A (en) * | 2019-01-21 | 2019-04-30 | 深圳市安思科电子科技有限公司 | A kind of nano material production equipment based on LICVD method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103510156A (en) * | 2012-06-29 | 2014-01-15 | 三菱综合材料株式会社 | Polycrystalline silicon rod |
| CN107601841A (en) * | 2017-10-18 | 2018-01-19 | 南京卓茨机电科技有限公司 | A kind of apparatus for preparing optical fiber blanks of the homogeneous heating based on Internet of Things |
-
2018
- 2018-06-27 CN CN201810678354.XA patent/CN108677166B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103510156A (en) * | 2012-06-29 | 2014-01-15 | 三菱综合材料株式会社 | Polycrystalline silicon rod |
| CN107601841A (en) * | 2017-10-18 | 2018-01-19 | 南京卓茨机电科技有限公司 | A kind of apparatus for preparing optical fiber blanks of the homogeneous heating based on Internet of Things |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109692639A (en) * | 2019-01-21 | 2019-04-30 | 深圳市安思科电子科技有限公司 | A kind of nano material production equipment based on LICVD method |
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| Publication number | Publication date |
|---|---|
| CN108677166B (en) | 2020-04-21 |
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