CN108677161A - 一种轴承的镀膜方法 - Google Patents

一种轴承的镀膜方法 Download PDF

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CN108677161A
CN108677161A CN201810543757.3A CN201810543757A CN108677161A CN 108677161 A CN108677161 A CN 108677161A CN 201810543757 A CN201810543757 A CN 201810543757A CN 108677161 A CN108677161 A CN 108677161A
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plating process
nickel
film plating
layer
bearing
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胡加中
樊月
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Jiangsu Heng Jia Mechanical Engineering Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/325—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with layers graded in composition or in physical properties
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Sliding-Contact Bearings (AREA)

Abstract

本发明涉及一种轴承的镀膜方法，在基底上铺设基底层，在所述基底层上镀金刚石涂层，所述基底层包括第一基底层和第二基底层，所述第一基底层为镍铬合金层，所述镍铬合金层采用梯度镀膜方法，所述镍铬合金层中镍含量由靠近镀膜件到远离镀膜件厚度逐渐增加，所述第二基底层包括碳化铟和碳化铬，所述基底层厚度小于金刚石涂层厚度。通过本发明中镀膜方法得到的轴承膜层强度高，结合性强，不易脱落。

Description

一种轴承的镀膜方法
技术领域
本发明涉及一种镀膜方法，尤其涉及一种轴承的镀膜方法。
背景技术
轴承是当代机械设备中一种重要零部件。它的主要功能是支撑机械旋转体，降低其运动过程中的摩擦系数，并保证其回转精度。按运动元件摩擦性质的不同，轴承可分为滚动轴承和滑动轴承两大类。其中滚动轴承已经标准化、系列化，但与滑动轴承相比它的径向尺寸、振动和噪声较大，价格也较高。
轴承需要具备良好的耐磨性和润滑度，以内通常在轴承外增加镀层，增加其外层强度。
现有技术一般采用化学相沉积方法进行金刚石涂层，因为轴承一般含有钴，因钴的析出导致成膜困难或者膜层结合力差。
发明内容
本发明为了解决现有轴承镀膜方法存在膜层结合力差，膜层耐磨性不足的问题，提供了一种轴承的镀膜方法。
本发明所采取的技术方案为：一种轴承的镀膜方法，在基底上铺设基底层，在所述基底层上镀金刚石涂层，所述基底层包括第一基底层和第二基底层，所述第一基底层为镍铬合金层，所述镍铬合金层采用梯度镀膜方法，所述镍铬合金层中镍含量由靠近镀膜件到远离镀膜件厚度逐渐增加，所述第二基底层包括碳化铟和碳化铬，所述基底层厚度小于金刚石涂层厚度。
进一步的，所述轴承经过丙酮清洗脱水后，放入化学气相沉积金刚石生长设备中的真空室。
进一步的，所述真空室与所述真空泵相连接.
进一步的，所述真空室连接有辅助减压设备，所述辅助减压装置含有：辅助减压舱和连接管，连接管一端与所述真空室相连通，另一端与 所述辅助减压舱相连通。
进一步的，所述镍铬合金层中镍铬质量比为2~5:4~8。
进一步的，所述基底层中碳化铟置于碳化铬下部。
本发明所产生的有益效果包括：通过本发明中镀膜方法得到的轴承膜层强度高，结合性强，不易脱落。
具体实施方式
下面结合具体实施例对本发明做进一步详细的解释说明，但应当理解为本发明的保护范围并不受具体实施方式的限制。
实施例1
一种轴承的镀膜方法，在基底上铺设基底层，在所述基底层上镀金刚石涂层，所述基底层包括第一基底层和第二基底层，所述第一基底层为镍铬合金层，所述镍铬合金层采用梯度镀膜方法，所述镍铬合金层中镍含量由靠近镀膜件到远离镀膜件厚度逐渐增加，所述第二基底层包括碳化铟和碳化铬，所述基底层厚度小于金刚石涂层厚度。镍铬合金层中镍铬质量比为1:2。所述基底层中碳化铟置于碳化铬下部。
所述轴承经过丙酮清洗脱水后，放入化学气相沉积金刚石生长设备中的真空室。所述真空室与所述真空泵相连接.所述真空室连接有辅助减压设备，所述辅助减压装置含有：辅助减压舱和连接管，连接管一端与所述真空室相连通，另一端与 所述辅助减压舱相连通。
实施例2
一种轴承的镀膜方法，在基底上铺设基底层，在所述基底层上镀金刚石涂层，所述基底层包括第一基底层和第二基底层，所述第一基底层为镍铬合金层，所述镍铬合金层采用梯度镀膜方法，所述镍铬合金层中镍含量由靠近镀膜件到远离镀膜件厚度逐渐增加，所述第二基底层包括碳化铟和碳化铬，所述基底层厚度小于金刚石涂层厚度。镍铬合金层中镍铬质量比为3:8。所述基底层中碳化铟置于碳化铬下部。
所述轴承经过丙酮清洗脱水后，放入化学气相沉积金刚石生长设备中的真空室。所述真空室与所述真空泵相连接.所述真空室连接有辅助减压设备，所述辅助减压装置含有：辅助减压舱和连接管，连接管一端与所述真空室相连通，另一端与 所述辅助减压舱相连通。
实施例3
一种轴承的镀膜方法，在基底上铺设基底层，在所述基底层上镀金刚石涂层，所述基底层包括第一基底层和第二基底层，所述第一基底层为镍铬合金层，所述镍铬合金层采用梯度镀膜方法，所述镍铬合金层中镍含量由靠近镀膜件到远离镀膜件厚度逐渐增加，所述第二基底层包括碳化铟和碳化铬，所述基底层厚度小于金刚石涂层厚度。镍铬合金层中镍铬质量比为5:7。所述基底层中碳化铟置于碳化铬下部。
所述轴承经过丙酮清洗脱水后，放入化学气相沉积金刚石生长设备中的真空室。所述真空室与所述真空泵相连接.所述真空室连接有辅助减压设备，所述辅助减压装置含有：辅助减压舱和连接管，连接管一端与所述真空室相连通，另一端与 所述辅助减压舱相连通。
上述仅为本发明的优选实施例，本发明并不仅限于实施例的内容。对于本领域中的技术人员来说，在本发明的技术方案范围内可以有各种变化和更改，所作的任何变化和更改，均在本发明保护范围之内。

Claims (6)

1.一种轴承的镀膜方法，其特征在于：在基底上铺设打底层，在所述打底层上镀金刚石涂层，所述打底层包括第一打底层和第二打底层，所述第一打底层为镍铬合金层，所述镍铬合金层采用梯度镀膜方法，所述镍铬合金层中镍含量由靠近镀膜件到远离镀膜件厚度逐渐增加，所述第二打底层包括碳化铟和碳化铬，所述打底层厚度小于金刚石涂层厚度。
2.根据权利要求1所述的轴承的镀膜方法，其特征在于：所述轴承经过丙酮清洗脱水后，放入化学气相沉积金刚石生长设备中的真空室。
3.根据权利要求2所述的轴承的镀膜方法，其特征在于：所述真空室与所述真空泵相连接。
4.根据权利要求2所述的轴承的镀膜方法，其特征在于：所述真空室连接有辅助减压设备，所述辅助减压装置含有：辅助减压舱和连接管，连接管一端与所述真空室相连通，另一端与 所述辅助减压舱相连通。
5.根据权利要求1所述的轴承的镀膜方法，其特征在于：所述镍铬合金层中镍铬质量比为2~5:4~8。
6.根据权利要求1所述的轴承的镀膜方法，其特征在于：所述基底层中碳化铟置于碳化铬下部。
CN201810543757.3A 2018-05-31 2018-05-31 一种轴承的镀膜方法 Pending CN108677161A (zh)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102286719A (zh) * 2011-07-21 2011-12-21 中国第一汽车股份有限公司 一种应用于汽车铝合金运动摩擦副表面耐磨涂层

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102286719A (zh) * 2011-07-21 2011-12-21 中国第一汽车股份有限公司 一种应用于汽车铝合金运动摩擦副表面耐磨涂层

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