CN108646504A - A kind of galvanometer holder applied in laser projection device - Google Patents
A kind of galvanometer holder applied in laser projection device Download PDFInfo
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- CN108646504A CN108646504A CN201810238352.9A CN201810238352A CN108646504A CN 108646504 A CN108646504 A CN 108646504A CN 201810238352 A CN201810238352 A CN 201810238352A CN 108646504 A CN108646504 A CN 108646504A
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- light beam
- catch
- semicylinder
- cylinder
- eyeglass
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/142—Adjusting of projection optics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2066—Reflectors in illumination beam
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laser Beam Processing (AREA)
Abstract
The invention discloses a kind of galvanometer holders applied in laser projection device, which is characterized in that drives area including eyeglass fixed area, eyeglass；Eyeglass fixed area is located at TIR prism and is emitted in the light path of the first light beam, for penetrating the first light beam；Eyeglass driving area is located at TIR prism and is emitted in the light path of the second light beam, drives the second light beam incidence side in area that catch is arranged in eyeglass, catch is for absorbing the second light beam or the second light beam being reflected into the outside of TIR prism.Include that eyeglass fixed area and eyeglass drive area by a kind of galvanometer holder applied in laser projection device proposed using the application, on the galvanometer holder of the application.And it by the way that catch is arranged in driving area in eyeglass, by the beam absorption being emitted by TIR prism or can reflex to outside TIR prism.And then can solve in illumination system since galvanometer coil is by the coil aging caused by prolonged strong illumination, the problems such as galvanometer misalignment.
Description
Technical field
This application involves optical field, more particularly to a kind of galvanometer holders applied in laser projection device.
Background technology
DLP (Digital Light Processing, digital light processing) lamp optical system is used for front projection light
The three primary colours light for the timing that source provides guides to (DMD Digital Micromirror Device, digital micromirror device)
Smooth surface, DMD drive control components reflect according to the numerous speculum eyeglasses of projection image signal content-control DMD, pass through
To the rotation angle and direction controlling of DMD speculums, positive light extraction and off light light extractions are realized.
For DLP lighting systems, OFF light in system trend as shown in Figure 1, as seen from Figure 1, OFF light by
It is irradiated to galvanometer and galvanometer coil region below galvanometer and is incident in camera lens 130 through galvanometer, wherein galvanometer coil is that control is shaken
The critical piece of mirror rotation, reliability go wrong, and directly the rotation of galvanometer can be caused to change, to influence system
Resolution ratio.
However, since the light energy of off light is higher, when OFF light shines directly into galvanometer coil with its peripheral region
Galvanometer coil temperature can be caused to increase when domain.Long-time irradiate galvanometer coil in the case of, can not only influence its operation can
By property, it can also accelerate the aging of galvanometer coil.Therefore, one kind how is designed in DLP lighting systems can reduce irradiation shake
Mirror coil and its optical module of neighboring area become those skilled in the art and compel problem to be solved.
Invention content
The invention discloses a kind of galvanometer holders applied in laser projection device, including：Eyeglass fixed area, eyeglass drive
Dynamic area；
The eyeglass fixed area is located at TIR prism and is emitted in the light path of the first light beam, for penetrating first light beam；
Eyeglass driving area is located at the TIR prism and is emitted in the light path of the second light beam, and area is driven in the eyeglass
Catch is arranged in the second light beam incidence side, and the catch is for absorbing second light beam or reflecting second light beam
To the outside of the TIR prism.
Preferably, the reflection micro-structure is mounted in one side of the catch towards the TIR prism.
Preferably, the reflection micro-structure is made of N number of cylinder or semicylinder, the cylinder or semicylinder
Quantity be more than or equal to D/2H, the radius of the cylinder or semicylinder is less than or equal to H, wherein：H is the TIR prism
Light-emitting surface is to the distance of the catch, and 1mm≤H≤5mm, N >=5, D is the lateral dimension of the catch；
The cylinder or semicylinder are for being reflected and being scattered to second light beam.
Preferably, the cylinder or semicylinder are internally provided with atomizing layer or scattering particles layer, the atomizing layer or
Second light beam that scattering particles layer is used to be incident on inside the cylinder or semicylinder is scattered and is emitted to
The catch.
Preferably, the catch is arranged with predetermined angle on the galvanometer holder, for will be from the TIR prism
The second emergent ray projected is reflected into the outside of the TIR prism.
Preferably, the predetermined angle α is between 5 ° to 40 °.
Preferably, the catch is connected with eyeglass driving area by the rubber tack.
Preferably, the catch is the catch of pre-set color.
Correspondingly, the application also proposes a kind of galvanometer holder applied in laser projection device, including：Eyeglass is fixed
Area, eyeglass drive area；
The eyeglass fixed area is located at TIR prism and is emitted in the light path of the first light beam, for penetrating first light beam；
Eyeglass driving area is located at the TIR prism and is emitted in the light path of the second light beam, and area is driven in the eyeglass
The second light beam incidence side is provided with reflection micro-structure, and the reflection micro-structure is used to second light beam being reflected into institute
State the outside of TIR prism.
Preferably, the reflection micro-structure is made of N number of cylinder or semicylinder, the cylinder or semicylinder
Quantity be more than or equal to D/2H, the radius of the cylinder or semicylinder is less than or equal to H, wherein：H is the TIR prism
Light-emitting surface is to the distance of the catch, and 1mm≤H≤5mm, N >=5, D is the lateral dimension of the catch；
The cylinder or semicylinder are for being reflected and being scattered to second light beam.
Preferably, the cylinder or semicylinder are internally provided with atomizing layer or scattering particles layer, the atomizing layer or
Second light beam that scattering particles layer is used to be incident on inside the cylinder or semicylinder is scattered and is emitted to
The catch.
Preferably, the second light beam incidence side in eyeglass driving area is the region of pre-set color.
Pass through a kind of galvanometer holder applied in laser projection device proposed using the application, the galvanometer of the application
Include that eyeglass fixed area and eyeglass drive area on holder.It, can will be by TIR ribs and by the way that catch is arranged in driving area in eyeglass
The beam absorption or reflex to outside TIR prism that mirror is emitted.And then can solve in illumination system due to galvanometer coil by it is long when
Between strong illumination caused by coil aging, the problems such as galvanometer misalignment.
Description of the drawings
Fig. 1 is a kind of galvanometer supporting structure schematic diagram applied in laser projection device that the application proposes；
Fig. 2 is a kind of another galvanometer supporting structure schematic diagram applied in laser projection device proposed by the present invention；
Fig. 3 is a kind of another galvanometer supporting structure schematic diagram applied in laser projection device proposed by the present invention；
Fig. 4 is a kind of another galvanometer supporting structure schematic diagram applied in laser projection device proposed by the present invention；
Fig. 5 is an a kind of also galvanometer supporting structure schematic diagram applied in laser projection device proposed by the present invention；
Fig. 6 is a kind of another galvanometer supporting structure schematic diagram applied in laser projection device proposed by the present invention；
Fig. 7 is a kind of another galvanometer supporting structure schematic diagram applied in laser projection device proposed by the present invention；
Marginal data：
110. eyeglass fixed area, 120. eyeglasses drive area, 130. camera lenses 130,140, TIR prism, 150, galvanometer, 160 shake
Mirror coil, 170, catch, 180, reflection micro-structure, 190, cylinder or semicylinder, 200, scattering particles layer
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiment is only a part of the embodiment of the present invention, instead of all the embodiments.Base
Embodiment in the present invention, those of ordinary skill in the art obtained without creative efforts it is all its
His embodiment, shall fall within the protection scope of the present invention.
It is to be appreciated that the directional instruction (such as up, down, left, right, before and after ...) of institute is only used in the embodiment of the present invention
In explaining relative position relation, motion conditions etc. under a certain particular pose (as shown in the picture) between each component, if should
When particular pose changes, then directionality instruction also correspondingly changes correspondingly.
In addition, the description for being such as related to " first ", " second " in the present invention is used for description purposes only, and should not be understood as
It indicates or implies its relative importance or implicitly indicate the quantity of indicated technical characteristic.Define as a result, " first ",
The feature of " second " can explicitly or implicitly include at least one of the features.In the description of the present invention, " multiple " contain
Justice is at least two, such as two, three etc., unless otherwise specifically defined.
In the present invention unless specifically defined or limited otherwise, term " connection ", " fixation " etc. shall be understood in a broad sense,
For example, " fixation " may be a fixed connection, it may be a detachable connection, or integral；It can be mechanical connection, can also be
Electrical connection；It can be directly connected, can also can be indirectly connected through an intermediary the connection inside two elements or two
The interaction relationship of a element, unless otherwise restricted clearly.It for the ordinary skill in the art, can basis
Concrete condition understands the concrete meaning of above-mentioned term in the present invention.
In addition, the technical solution between each embodiment of the present invention can be combined with each other, but must be general with this field
Logical technical staff can be implemented as basis, will be understood that when the combination of technical solution appearance is conflicting or cannot achieve this
The combination of technical solution is not present, also not the present invention claims protection domain within.
The present invention proposes a kind of galvanometer holder applied in laser projection device, it is intended to solve in DLP illumination optical systems
The light being emitted at a certain angle in system is irradiated the problem of caused performance declines to galvanometer coil.
A kind of galvanometer holder applied in laser projection device proposed as shown in Figure 1 for the embodiment of the present application.
Eyeglass fixed area 110 is located at TIR prism 140 and is emitted in the light path of the first light beam, for penetrating the first light beam；
Eyeglass driving area 120 is located at TIR prism 140 and is emitted in the light path of the second light beam, and the second of area 120 is driven in eyeglass
Catch 180 is arranged in light beam incidence side, and catch 180 is for absorbing the second light beam or the second light beam being reflected into TIR prism 140
It is external.
As shown in Figure 1, the galvanometer holder that the application proposes includes eyeglass fixed area 110 and eyeglass driving area 120.Its
In, eyeglass fixed area 110 for galvanometer 150 is supported and is fixed on TIR (Total Internal Reflection, it is complete in it is anti-
Penetrate) between prism 140 and camera lens 130.In the present embodiment, the first light beam projected from TIR prism 140 is transmitted by galvanometer 150
Onto camera lens, image finally is formed in screen, and be achieved the projecting function of projection arrangement.
Further, the eyeglass fixed area 110 in the application is also located at TIR prism 140 and is emitted in the light path of the first light beam,
For penetrating the first light beam.
Further, eyeglass fixed area 110 may be used cantilever beam structure and galvanometer 150 be fixed on eyeglass fixed area 110,
It, can also be by galvanometer 150 and illumination shell in order to reduce the influence of 150 radiography of galvanometer in specific implementation mode in the application
It is connected, by galvanometer 150 at work since noise caused by vibrations is imported into other structures part.
In DLP 4k-TRP systems, the outgoing beam trend of system is as shown in Fig. 2, the light projected via TIR prism 140
Line can shine directly on galvanometer 150150 and galvanometer coil 160160.Further, due to the energy comparison of emergent ray
Height, therefore, when for a long time and when shining directly into the structural member around galvanometer coil 160 and galvanometer coil 160, causing
Coil temperature increases, and then the problems such as reduction of coil reliability and accelerated ageing occurs.Coil is that control galvanometer 150 rotates
Critical piece, reliability go wrong, and directly the rotation of galvanometer 150 can be caused to change, to influence system resolution
Rate.The normal operation of DLP 4k-TRP light path systems can be influenced when serious.
To solve the above-mentioned problems, the application proposes to further include having eyeglass to drive area 120 in galvanometer holder, wherein mirror
Piece driving area 120 is located in the light path for the second light beam being emitted by TIR prism 140.As shown in figure 3, in the application, driven in eyeglass
Dynamic area 120 is provided with catch 180 positioned at the second light beam incidence side, and the catch 180 is for the second light beam of absorption or by second
Light beam is reflected into the outside of TIR prism 140.
Catch 180 in the present embodiment, can be to being scattered from the second light beam that TIR prism 140 is emitted after, then carry out
It absorbs, so that the second light beam is limited or collapse in the inside of catch 1804, to change the second emergent ray.Pass through the upper of the application
The setting of catch 180 is stated, can not only prevent to be irradiated to galvanometer coil 160 by the second light beam that TIR prism 140 is emitted, may be used also
To prevent the second light beam, to TIR prism 140, the temperature caused by being reflected by big intensity illumination increases, and then ensures TIR ribs
Mirror 140 and galvanometer coil 160 are not irradiated by light beam, to keep the working performance of projection arrangement unaffected.
It optionally,, can be by catch 180 in the application in order to further improve the noise that galvanometer 150 generates at work
It is connected by preset quantity rubber tack with eyeglass driving area 120.Wherein, the application does not do concrete restriction to preset quantity,
In a kind of preferred embodiment, preset quantity can be 5.
Further, catch 180 is set to the top of TIR prism 140, and positioned at the projected from the TIR prism 140
One light beam and from the TIR prism 140 project the second light beam exit path on.Further, catch 180 and TIR prism
140 interval pre-determined distances, wherein the pre-determined distance can be configured according to actual demand, as the pre-determined distance specifically can be with
For 2mm~15mm, the embodiment of the present invention is not specifically limited this.
It should be noted that in the application, the light-emitting surface that catch 180 and TIR prism 140 can be arranged is in predetermined angle α.
Predetermined angle α is not specifically limited in the application, in a kind of more preferably embodiment, predetermined angle α 5 ° to 40 ° it
Between.
It should be noted that catch 180 can be located at the second light beam incidence side in eyeglass driving area 120 in the application
Arbitrary region.Concrete restriction is not done to 180 region of catch in the application.In a kind of preferred embodiment, such as Fig. 4 institutes
Show, the underface that the galvanometer coil 160 positioned at the second light beam incidence side in area 120 is driven in eyeglass can be arranged in catch 180.
By above-mentioned setting, the light beam for being incident on galvanometer coil 160 maximumlly can be absorbed or reflected by catch 180.
It should be noted that can the one side setting towards 140 outgoing beam of TIR prism in catch 180 in the application
For pre-set color.The application does not do concrete restriction to pre-set color, for example, the application can set catch 180 to black, it is brown
The colors such as color, so that catch 180 can further absorb light.
Further, it is provided with reflection micro-structure 190 on the catch 180.Wherein it is possible to towards TIR in catch 180
It is provided with reflection micro-structure 190 in the one side of 140 outgoing beam of prism.As shown in Figure 5.The reflection micro-structure 190 is used for will
Second light beam is reflexed to from the direction for being pointed into galvanometer coil 160 except TIR prism 140.It should be noted that in the present embodiment,
The one side of reflection micro-structure 190 can be coated with the material of absorbable light in the application, and the color of light absorbent is generally selected
Black, naturally it is also possible to be other colors, such as red, brown.The present invention does not do specific limit to the color of light absorbent herein
Fixed, as long as can meet the absorption light material to the second beam absorption, those skilled in the art can need specific choosing according to product
Any color is selected, and the variation of its color can't influence protection scope of the present invention.
Further, as shown in fig. 6, the reflection micro-structure 190 is made of N number of cylinder or semicylinder 190190,
The quantity of the cylinder or semicylinder 190 is more than or equal to D/2H, and the radius of the cylinder or semicylinder 190 is less than
Equal to H, wherein：H is that the distance of the TIR prism 1401 to catch 180 determines that H, and 1mm≤H≤5mm, N >=5, D are described
The lateral dimension of catch 180；
The cylinder or semicylinder 190 are used to that second light beam to be reflected and be scattered, and described in reduction
The spacing of catch 180 and 140 upper surface of the TIR prism.
In the present embodiment, circle is set in the reflection micro-structure 190 of the incident path for the second light beam that TIR prism 140 projects
Cylinder or semicylinder 190, cylinder or semicylinder 190 can both reduce catch 180 at a distance from 140 upper surface of TIR prism,
Light processing requirement of the TIR prism 140 to the second light beam can be met again.
Wherein, the geometry on reflection micro-structure 190 can be not only cylinder or semicylinder 190, or
Other solids etc., the present invention are not specifically limited the geometry on reflection micro-structure 190 herein, those skilled in the art
It can be needed to be specifically chosen any geometry according to product, and the variation of its geometry can't influence the protection model of the present invention
It encloses.
Wherein, the quantity to cylinder or semicylinder 190, radius, the present embodiment are defined, but people in the art
Member can be needed specifically according to product to select quantity, the radius of cylinder or semicylinder 190, and its cylinder or semicylinder
190 quantity, radius change can't influence protection scope of the present invention.
Wherein, to the orientation of cylinder or semicylinder 190 on reflection micro-structure 190, the present embodiment is not done specifically
It limits, those skilled in the art can be needed specifically according to product to arrange to cylinder or semicylinder 190, and its cylinder
The arrangement variation of body or semicylinder 190 can't influence protection scope of the present invention.
Wherein, the surface of the cylinder or semicylinder 190 has translucency, the cylinder or semicylinder 190
Surface be used to second emergent ray for being injected into 190 surface of the cylinder or semicylinder being refracted to the cylinder
The inside of body or semicylinder 190.
In the present embodiment, the surface of cylinder or semicylinder 190 is smooth surface, due to cylinder or semicylinder
The translucency on 190 surfaces makes its second emergent ray pass through the surface of cylinder or semicylinder 190, reflect into cylinder or
The inside of semicylinder 190, to make cylinder or semicylinder 190 fully absorb its second emergent ray.
Further, as shown in fig. 6, the inside of the cylinder or semicylinder 190 is additionally provided with atomizing layer (not shown)
Scattering particles layer 200200, the atomizing layer or scattering particles layer 200 will be for that will be refracted to the cylinder or semicylinder 190
Internal second light beam is reflected and is emitted to except TIR prism 140.
In the present embodiment, by the way that 200 pairs of atomizing layer or scattering particles layer are arranged inside cylinder or semicylinder 190
It reflects and is scattered into the second light beam inside cylinder or semicylinder 190, thus by the limitation as much as possible of the second light beam
In the inside of cylinder or semicylinder 190, and then change the trend of the second light beam, prevent the second light beam to TIR prism 140 because
Temperature increases caused by being reflected by big intensity illumination, ensures that the working performance of projection arrangement is unaffected.
Wherein, atomizing layer or scattering particles layer can be not only arranged in the form object inside cylinder or semicylinder 190
200, other form objects can also be set, and the purpose that atomizing layer or scattering particles layer 200 is arranged is dissipated to the second light beam
It penetrates, stays in the second light beam as much as possible inside cylinder or semicylinder 190 after scattering, the present invention is not herein to cylinder
Or the form species type inside semicylinder 190 is specifically limited, those skilled in the art can need to be specifically chosen according to product
Any form object, and the variation of its form species type can't influence protection scope of the present invention.
Preferred embodiment two provided by the invention, a kind of galvanometer holder applied in laser projection device, including eyeglass
Fixed area 110, eyeglass drive area 120；
Eyeglass fixed area 110 is located at TIR prism 140 and is emitted in the light path of the first light beam, for penetrating the first light beam；
Eyeglass driving area 120 is located at TIR prism 140 and is emitted in the light path of the second light beam, and the second of area 120 is driven in eyeglass
Light beam incidence side is provided with reflection micro-structure 180, and reflection micro-structure 180 is used to the second light beam being reflected into TIR prism 140
It is external.
The galvanometer holder that the application proposes includes eyeglass fixed area 110 and eyeglass driving area 120.Wherein, eyeglass is fixed
Area 110 by galvanometer 150 for supporting and being fixed on TIR (Total Internal Reflection, total internal reflection) prisms and mirror
Between head.In the present embodiment, the first emergent ray projected from TIR prism 140 is transmitted to by galvanometer 150 on camera lens, finally
Image is formed in screen, realizes the projecting function of projection arrangement.
Further, the eyeglass fixed area 110 in the application is also located at TIR prism 140 and is emitted in the light path of the first light beam,
For penetrating the first light beam.
Further, eyeglass fixed area 110 may be used cantilever beam structure and galvanometer 150 be fixed on eyeglass fixed area 110,
It, can also be by galvanometer 150 and illumination shell in order to reduce the influence of 150 radiography of galvanometer in specific implementation mode in the application
It is connected, by galvanometer 150 at work since noise caused by vibrations is imported into other structures part.
In DLP 4k-TRP systems, the outgoing beam trend of system is as shown in Fig. 2, the light projected via TIR prism 140
Line can shine directly on galvanometer 150 and galvanometer coil 160.Further, since the energy comparison of emergent ray is high, because
This, when for a long time and when shining directly into the structural member around galvanometer coil 160 and galvanometer coil 160, leading to coil
Temperature increases, and then the problems such as reduction of coil reliability and accelerated ageing occurs.Coil is the key that control galvanometer 150 rotates
Property component, reliability go wrong, and can directly cause the rotation of galvanometer 150 to change, to influence systemic resolution.Sternly
The normal operation of DLP 4k-TRP light path systems can be influenced when weight.
To solve the above-mentioned problems, as shown in fig. 7, the application proposes to further include having eyeglass to drive area in galvanometer holder
120, wherein eyeglass driving area 120 is located in the light path for the second light beam being emitted by TIR prism 140.In the application, in eyeglass
Driving area 120 is provided with reflection micro-structure 190 positioned at the second light beam incidence side, which is used for second
Light beam is reflected into the outside of TIR prism 140.
By the setting of the above-mentioned reflection micro-structure 190 of the application, be emitted by TIR prism 140 can be not only prevented
Two light beams are irradiated to galvanometer coil 160, can also prevent the second light beam to TIR prism 140 due to being reflected by big intensity illumination
Caused temperature increases, and then ensures that TIR prism 140 and galvanometer coil 160 are not irradiated by light beam, to make projection arrangement
Working performance it is unaffected.
It should be noted that the installation position of reflection micro-structure 190 can drive being located at for area 120 in eyeglass in the application
The arbitrary region of second light beam incidence side.I.e. the application can be located at the second light beam incidence side in eyeglass driving area 120
All areas be both provided with reflection micro-structure 190, the second light beam incidence side can also be located at what eyeglass drove area 120
The underface of galvanometer coil 160 is provided with reflection micro-structure 190.Concrete restriction is not done to 180 region of catch in the application.
In a kind of preferred embodiment, reflection micro-structure 190 can be arranged is located at the second light beam incidence one in eyeglass driving area 120
In all areas of side.By above-mentioned setting, maximumlly it can absorb or reflect by reflection micro-structure 190 and be incident on galvanometer
The light beam of coil 160.
Further, in the present embodiment, the one side of reflection micro-structure 190 can be coated with the material of absorbable light, inhale
The color of luminescent material generally selects black, naturally it is also possible to be other colors, such as red, brown.The present invention is not herein to inhaling
The color of luminescent material is specifically limited, as long as can meet the absorption light material to the second beam absorption, those skilled in the art
It can be needed to be specifically chosen any color according to product, and the variation of its color can't influence protection scope of the present invention.
Further, described as shown in figure 5, the reflection micro-structure 190 is made of N number of cylinder or semicylinder 190
The quantity of cylinder or semicylinder 190 is more than or equal to D/2H, and the radius of the cylinder or semicylinder 190 is less than or equal to
H, wherein：H is that the distance of the TIR prism 1401 to catch 180 determines that H, and 1mm≤H≤5mm, N >=5, D are the catch
180 lateral dimension；
The cylinder or semicylinder 190 are used to that second light beam to be reflected and be scattered, and described in reduction
The spacing of catch 180 and 140 upper surface of the TIR prism.
In the present embodiment, circle is set in the reflection micro-structure 190 of the incident path for the second light beam that TIR prism 140 projects
Cylinder or semicylinder 190, cylinder or semicylinder 190 can both reduce catch 180 at a distance from 140 upper surface of TIR prism,
Light processing requirement of the TIR prism 140 to the second light beam can be met again.
Wherein, the geometry on reflection micro-structure 190 can be not only cylinder or semicylinder 190, or
Other solids etc., the present invention are not specifically limited the geometry on reflection micro-structure 190 herein, those skilled in the art
It can be needed to be specifically chosen any geometry according to product, and the variation of its geometry can't influence the protection model of the present invention
It encloses.
Wherein, the quantity to cylinder or semicylinder 190, radius, the present embodiment are defined, but people in the art
Member can be needed specifically according to product to select quantity, the radius of cylinder or semicylinder 190, and its cylinder or semicylinder
190 quantity, radius change can't influence protection scope of the present invention.
Wherein, to the orientation of cylinder or semicylinder 190 on reflection micro-structure 190, the present embodiment is not done specifically
It limits, those skilled in the art can be needed specifically according to product to arrange to cylinder or semicylinder 190, and its cylinder
The arrangement variation of body or semicylinder 190 can't influence protection scope of the present invention.
Wherein, the surface of the cylinder or semicylinder 190 has translucency, the cylinder or semicylinder 190
Surface be used to second emergent ray for being injected into 190 surface of the cylinder or semicylinder being refracted to the cylinder
The inside of body or semicylinder 190.
In the present embodiment, the surface of cylinder or semicylinder 190 is smooth surface, due to cylinder or semicylinder
The translucency on 190 surfaces makes its second emergent ray pass through the surface of cylinder or semicylinder 190, reflect into cylinder or
The inside of semicylinder 190, to make cylinder or semicylinder 190 fully absorb its second emergent ray.
Further, as shown in fig. 6, the atomizing layer (not shown) that is internally provided with of the cylinder or semicylinder 190 scatters
Particle layer 200, the atomizing layer or scattering particles layer 200 will be for that will be refracted to inside the cylinder or semicylinder 190
Second light beam is reflected and is emitted to except TIR prism 140.
In the present embodiment, by the way that 200 pairs of atomizing layer or scattering particles layer are arranged inside cylinder or semicylinder 190
It reflects and is scattered into the second light beam inside cylinder or semicylinder 190, thus by the limitation as much as possible of the second light beam
In the inside of cylinder or semicylinder 190, and then change the trend of the second light beam, prevent the second light beam to TIR prism 140 because
Temperature increases caused by being reflected by big intensity illumination, ensures that the working performance of projection arrangement is unaffected.
Wherein, atomizing layer or scattering particles layer can be not only arranged in the form object inside cylinder or semicylinder 190
200, other form objects can also be set, and the purpose that atomizing layer or scattering particles layer 200 is arranged is dissipated to the second light beam
It penetrates, stays in the second light beam as much as possible inside cylinder or semicylinder 190 after scattering, the present invention is not herein to cylinder
Or the form species type inside semicylinder 190 is specifically limited, those skilled in the art can need to be specifically chosen according to product
Any form object, and the variation of its form species type can't influence protection scope of the present invention.
Pass through a kind of galvanometer holder applied in laser projection device proposed using the application, the galvanometer of the application
Include that eyeglass fixed area and eyeglass drive area on holder.It, can will be by TIR ribs and by the way that catch is arranged in driving area in eyeglass
The beam absorption or reflex to outside TIR prism that mirror is emitted.And then can solve in illumination system due to galvanometer coil by it is long when
Between strong illumination caused by coil aging, the problems such as galvanometer misalignment.
The foregoing is merely the preferred embodiment of the present invention, are not intended to limit the scope of the invention, every at this
Under the design of invention, using equivalent structure transformation made by description of the invention and accompanying drawing content, or directly/it is used in it indirectly
His relevant technical field is included in the scope of patent protection of the present invention.
By embodiments described above, it will be appreciated by those skilled in the art that attached drawing is a preferred embodiment field
The schematic diagram of scape, device or flow in attached drawing are not necessarily required by the embodiments of the present application.
Above-mentioned the application serial number is for illustration only, does not represent the quality of implement scene.
In the instructions provided here, numerous specific details are set forth.It is to be appreciated, however, that the implementation of the present invention
Example can be put into practice without these specific details.In some instances, well known method, structure is not been shown in detail
And technology, so as not to obscure the understanding of this description.
Similarly, it should be understood that in order to simplify the disclosure and help to understand one or more of each inventive aspect,
Above in the description of exemplary embodiment of the present invention, each feature of the invention is grouped together into single implementation sometimes
In example, figure or descriptions thereof.However, the method for the disclosure should be construed to reflect following intention：It is i.e. required to protect
Shield the present invention claims the more features of feature than being expressly recited in each claim.More precisely, as following
Claims reflect as, inventive aspect is all features less than single embodiment disclosed above.Therefore,
Thus the claims for following specific implementation mode are expressly incorporated in the specific implementation mode, wherein each claim itself
All as a separate embodiment of the present invention.
Those skilled in the art be appreciated that can to the equipment in embodiment carry out adaptively change and
They are arranged in the one or more equipment different from the embodiment.May be used any combinations to this specification (including
Adjoint claim, abstract and attached drawing) disclosed in all features and so disclosed any method or equipment institute
There are process or unit to be combined.Unless expressly stated otherwise, this specification (including adjoint claim, abstract and attached drawing)
Disclosed in each feature can be replaced by providing the alternative features of identical, equivalent or similar purpose.
Claims (12)
1. a kind of galvanometer holder applied in laser projection device, which is characterized in that driven including eyeglass fixed area, eyeglass
Area；
The eyeglass fixed area is located at TIR prism and is emitted in the light path of the first light beam, for penetrating first light beam；
Eyeglass driving area is located at the TIR prism and is emitted in the light path of the second light beam, described in eyeglass driving area
Catch is arranged in second light beam incidence side, and the catch is for absorbing second light beam or second light beam being reflected into institute
State the outside of TIR prism.
2. as described in claim 1 applied to the galvanometer holder in laser projection device, which is characterized in that the catch packet
It includes：Reflection micro-structure, wherein：
The reflection micro-structure is mounted in one side of the catch towards the TIR prism.
3. as claimed in claim 2 applied to the galvanometer holder in laser projection device, which is characterized in that the micro- knot of reflection
Structure is made of N number of cylinder or semicylinder, and the quantity of the cylinder or semicylinder is more than or equal to D/2H, the cylinder
The radius of body or semicylinder is less than or equal to H, wherein：H is the light-emitting surface of the TIR prism to the distance of the catch, and 1mm
≤ H≤5mm, N >=5, D are the lateral dimension of the catch；
The cylinder or semicylinder are for being reflected and being scattered to second light beam.
4. as claimed in claim 3 applied to the galvanometer holder in laser projection device, which is characterized in that the cylinder or
Semicylinder is internally provided with atomizing layer or scattering particles layer, and the atomizing layer or scattering particles layer will be for that will be incident on the circle
Second light beam inside cylinder or semicylinder is scattered and is emitted to the catch.
5. as described in claim 1 applied to the galvanometer holder in laser projection device, which is characterized in that including：
The catch with predetermined angle be arranged on the galvanometer holder, for will from the TIR prism project second
Emergent ray is reflected into the outside of the TIR prism.
6. as claimed in claim 5 applied to the galvanometer holder in laser projection device, which is characterized in that the predetermined angle
α is between 5 ° to 40 °.
7. as described in claim 1 applied to the galvanometer holder in laser projection device, which is characterized in that further include：Rubber
Nail, wherein：
The catch is connected with eyeglass driving area by the rubber tack.
8. the galvanometer holder as described in any one of claim 1 to 7 applied in laser projection device, which is characterized in that institute
State the catch that catch is pre-set color.
9. a kind of galvanometer holder applied in laser projection device, which is characterized in that driven including eyeglass fixed area, eyeglass
Area；
The eyeglass fixed area is located at TIR prism and is emitted in the light path of the first light beam, for penetrating first light beam；
Eyeglass driving area is located at the TIR prism and is emitted in the light path of the second light beam, described in eyeglass driving area
Second light beam incidence side is provided with reflection micro-structure, and the reflection micro-structure is used to second light beam being reflected into described
The outside of TIR prism.
10. as claimed in claim 9 applied to the galvanometer holder in laser projection device, it is characterised in that the micro- knot of reflection
Structure is made of N number of cylinder or semicylinder, and the quantity of the cylinder or semicylinder is more than or equal to D/2H, the cylinder
The radius of body or semicylinder is less than or equal to H, wherein：H is the light-emitting surface of the TIR prism to the distance of the catch, and 1mm
≤ H≤5mm, N >=5, D are the lateral dimension of the catch；
The cylinder or semicylinder are for being reflected and being scattered to second light beam.
11. as claimed in claim 10 applied to the galvanometer holder in laser projection device, which is characterized in that the cylinder
Or semicylinder is internally provided with atomizing layer or scattering particles layer, the atomizing layer or scattering particles layer be described for that will be incident on
Second light beam inside cylinder or semicylinder is scattered and is emitted to the catch.
12. as claimed in claim 9 applied to the galvanometer holder in laser projection device, which is characterized in that the eyeglass drives
The second light beam incidence side in dynamic area is the region of pre-set color.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810238352.9A CN108646504A (en) | 2018-03-22 | 2018-03-22 | A kind of galvanometer holder applied in laser projection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810238352.9A CN108646504A (en) | 2018-03-22 | 2018-03-22 | A kind of galvanometer holder applied in laser projection device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108646504A true CN108646504A (en) | 2018-10-12 |
Family
ID=63744675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810238352.9A Pending CN108646504A (en) | 2018-03-22 | 2018-03-22 | A kind of galvanometer holder applied in laser projection device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108646504A (en) |
Cited By (6)
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| CN109557746A (en) * | 2018-12-05 | 2019-04-02 | 青岛海信激光显示股份有限公司 | Projection device |
| CN111856845A (en) * | 2019-04-28 | 2020-10-30 | 青岛海信激光显示股份有限公司 | Optical machine assembly of projection equipment and projection equipment |
| WO2020244051A1 (en) * | 2019-06-03 | 2020-12-10 | 青岛海信激光显示股份有限公司 | Laser projection apparatus |
| CN112631051A (en) * | 2020-12-25 | 2021-04-09 | 成都极米科技股份有限公司 | Vibrating mirror coil heat dissipation structure and heat dissipation method |
| WO2021213105A1 (en) * | 2020-04-20 | 2021-10-28 | 青岛海信激光显示股份有限公司 | Optical engine |
| WO2022078410A1 (en) * | 2020-10-14 | 2022-04-21 | 青岛海信激光显示股份有限公司 | Projection apparatus |
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Address after: 266555 Qingdao economic and Technological Development Zone, Shandong, Hong Kong Road, No. 218 Applicant after: Hisense Video Technology Co.,Ltd. Address before: 266555 Qingdao economic and Technological Development Zone, Shandong, Hong Kong Road, No. 218 Applicant before: QINGDAO HISENSE ELECTRONICS Co.,Ltd. |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181012 |
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