CN108646488A - A kind of liquid crystal display device - Google Patents
A kind of liquid crystal display device Download PDFInfo
- Publication number
- CN108646488A CN108646488A CN201810482527.0A CN201810482527A CN108646488A CN 108646488 A CN108646488 A CN 108646488A CN 201810482527 A CN201810482527 A CN 201810482527A CN 108646488 A CN108646488 A CN 108646488A
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- China
- Prior art keywords
- liquid crystal
- layer
- crystal display
- insulating layer
- substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of liquid crystal display devices, including:Substrate, the substrate include display area and the frame region around the display area;Controlling grid scan line layer in the frame region on the substrate;The first insulating layer on the controlling grid scan line layer;Active layer on first insulating layer;Second insulating layer on the active layer.Compared to traditional liquid crystal display device; the present invention is added to one layer of active layer among dielectric layers; it thus can be in the case where not increasing processing procedure; reinforce the protection to controlling grid scan line; the display reduced in process of production caused by cabling scratches is bad; product yield is promoted, product cost is reduced.
Description
Technical field
The present invention relates to display technology fields, more particularly to a kind of liquid crystal display device.
Background technology
Liquid crystal display (LCD) be used as a kind of flat-panel monitor, have image clearly is accurate, thickness is thin, it is light-weight, without spoke
It penetrates, the plurality of advantages such as low energy consumption and operating voltage are low, has been widely used in every field at present.In general, liquid crystal display
There are two the substrates containing electrode for utensil, and the liquid crystal layer being arranged between two substrates, are controlled by the electrode on two substrates
The electric field strength of the liquid crystal layer is applied to control the deflection of liquid crystal molecule, and then adjusts the transmissivity of incident light, with realization pair
The bright and dark control of display pixel.
Thin film transistor (TFT) (ThinFilmTransistor, TFT) liquid crystal display has more and more in the modern life
Use, such as mobile phone display screen, NoteBook display screens, MP3, MP4 display screen, GPS display screens, LCD-TV display screens etc..
With the development of TFT-LCD technologies, requirement of the user to display is also higher and higher.The high display of product competitiveness is necessary
Has many-sided advantage such as best in quality, economy, practicability.The advantages of quality includes that contrast is high, clarity is high, wide viewing angle
Deng;The advantages of economy includes low in energy consumption, and use cost is low, and production cost is low etc.;The advantages of practicability includes flexibility, and size is suitable
In, it can show much information format.
And in the production process of liquid crystal display, it needs mother matrix cutting into liquid crystal display one by one, later part grid
Pole scan line by it is exposed outside, the operation of artificial and machine may all scratch cabling, reduce the yield of product.
Invention content
In order to make up the defect of prior art, the present invention provides a kind of liquid crystal display device.
The technical problems to be solved by the invention are achieved by the following technical programs:
A kind of liquid crystal display device, including:
Substrate, the substrate include display area and the frame region around the display area;
Controlling grid scan line layer in the frame region on the substrate;
The first insulating layer on the controlling grid scan line layer;
Active layer on first insulating layer;
Second insulating layer on the active layer.
Further, the substrate is glass substrate.
Further, the active layer is formed by the semiconductor including non-crystalline silicon and polysilicon.
Further, the material of first insulating layer and second insulating layer is silicon nitride, silica or silicon oxynitride.
The present invention has the advantages that:
Compared to traditional liquid crystal display device, the present invention is added to one layer of active layer among dielectric layers, thus can be not
In the case of increasing processing procedure, reinforce the protection to controlling grid scan line, reduces aobvious caused by cabling scratches in process of production
Show bad, promotion product yield, reduction product cost.
Description of the drawings
Fig. 1 is the structural schematic diagram of traditional liquid crystal display device;
Fig. 2 is the structural schematic diagram of liquid crystal display device of the present invention.
In figure:1, substrate, 2, controlling grid scan line layer, the 3, first insulating layer, 4, second insulating layer, 5, active layer.
Specific implementation mode
With reference to embodiment, the present invention will be described in detail, and embodiment is only the preferred embodiment of the present invention,
It is not limitation of the invention.
Fig. 1 be traditional liquid crystal display device structural schematic diagram, the liquid crystal display device, including:Substrate, the substrate
Frame region including display area and around the display area;Gated sweep in the frame region on the substrate
Line layer;The first insulating layer on the controlling grid scan line layer;Second insulating layer on first insulating layer.It is this
Traditional liquid crystal display device in process of production part of grid pole scan line by it is exposed outside, it is artificial all with machine operation
Cabling is scratched, causes to show bad.
Based on the above issues, the present invention provides a kind of liquid crystal display device, referring to Fig.2, it includes:
Substrate, the substrate include display area and the frame region around the display area;
Controlling grid scan line layer in the frame region on the substrate;
The first insulating layer on the controlling grid scan line layer;
Active layer on first insulating layer;
Active layer on the active layer.
Compared to traditional liquid crystal display device, the present invention is added to one layer of active layer among dielectric layers, thus can
In the case where not increasing processing procedure, reinforce the protection to controlling grid scan line, reduces in process of production caused by cabling scratches
Display it is bad, promoted product yield, reduce product cost.
In the present invention, the substrate is glass substrate.In general, the glass substrate needs to have high transparency, lower
Reflectivity, preferable thermal stability and corrosion resistance, higher mechanical strength and preferable machining characteristics, in addition, glass
Substrate needs have good electrical insulating property.Glass substrate in the embodiment of the present invention is preferably the borosilicate without basic ion
Glass, alkali-free aluminosilicate glass etc..
In the present invention, the material of the active layer is not particularly limited, it is preferable that the active layer can be by including amorphous
The semiconductor of silicon and polysilicon is formed.
In the present invention, the material of first insulating layer and second insulating layer is not particularly limited, nitridation can be used
Silicon can also use silica and silicon oxynitride etc..
It should be noted that controlling grid scan line layer, the first insulating layer, active layer and active layer can be adopted in the present invention
With with controlling grid scan line layer, the first insulating layer, active layer and the identical manufacture craft of active layer in available liquid crystal display device
It makes, is no longer described in detail herein.
Embodiments of the present invention above described embodiment only expresses, the description thereof is more specific and detailed, but can not
Therefore it is interpreted as the limitation to the scope of the claims of the present invention, as long as skill obtained in the form of equivalent substitutions or equivalent transformations
Art scheme should all be fallen within the scope and spirit of the invention.
Claims (4)
1. a kind of liquid crystal display device, including:
Substrate, the substrate include display area and the frame region around the display area;
Controlling grid scan line layer in the frame region on the substrate;
The first insulating layer on the controlling grid scan line layer;
Active layer on first insulating layer;
Second insulating layer on the active layer.
2. liquid crystal display device as described in claim 1, which is characterized in that the substrate is glass substrate.
3. liquid crystal display device as described in claim 1, which is characterized in that the active layer is by including non-crystalline silicon and polysilicon
Semiconductor formed.
4. liquid crystal display device as described in claim 1, which is characterized in that the material of first insulating layer and second insulating layer
Matter is silicon nitride, silica or silicon oxynitride.
Priority Applications (1)
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CN201810482527.0A CN108646488A (en) | 2018-05-18 | 2018-05-18 | A kind of liquid crystal display device |
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CN201810482527.0A CN108646488A (en) | 2018-05-18 | 2018-05-18 | A kind of liquid crystal display device |
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CN201810482527.0A Pending CN108646488A (en) | 2018-05-18 | 2018-05-18 | A kind of liquid crystal display device |
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Citations (9)
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CN1693972A (en) * | 2004-04-29 | 2005-11-09 | Lg.菲利浦Lcd株式会社 | Fabrication method of polycrystalline silicon liquid crystal display device |
US20090026444A1 (en) * | 2007-07-24 | 2009-01-29 | Samsung Electronics Co., Ltd. | Organic thin film transistor array panel and manufacturing method of the same |
CN101604695A (en) * | 2008-06-10 | 2009-12-16 | 北京京东方光电科技有限公司 | Array base palte and manufacture method thereof and liquid crystal indicator |
CN102253544A (en) * | 2011-07-29 | 2011-11-23 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display device |
CN102654702A (en) * | 2012-03-06 | 2012-09-05 | 京东方科技集团股份有限公司 | TFT (thin film transistor) array substrate, manufacturing method of TFT array substrate and display device |
CN102723365A (en) * | 2012-06-08 | 2012-10-10 | 京东方科技集团股份有限公司 | TFT (Thin Film Transistor), manufacturing method thereof, array substrate and display device |
CN102759832A (en) * | 2012-07-27 | 2012-10-31 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display substrate and manufacturing method thereof |
CN103676354A (en) * | 2013-12-06 | 2014-03-26 | 合肥京东方光电科技有限公司 | Electrode structure, preparation method of electrode structure, array substrate, preparation method of array substrate and display device |
CN103676386A (en) * | 2013-12-27 | 2014-03-26 | 京东方科技集团股份有限公司 | Display panel and display device |
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2018
- 2018-05-18 CN CN201810482527.0A patent/CN108646488A/en active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1693972A (en) * | 2004-04-29 | 2005-11-09 | Lg.菲利浦Lcd株式会社 | Fabrication method of polycrystalline silicon liquid crystal display device |
US20090026444A1 (en) * | 2007-07-24 | 2009-01-29 | Samsung Electronics Co., Ltd. | Organic thin film transistor array panel and manufacturing method of the same |
CN101604695A (en) * | 2008-06-10 | 2009-12-16 | 北京京东方光电科技有限公司 | Array base palte and manufacture method thereof and liquid crystal indicator |
CN102253544A (en) * | 2011-07-29 | 2011-11-23 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display device |
CN102654702A (en) * | 2012-03-06 | 2012-09-05 | 京东方科技集团股份有限公司 | TFT (thin film transistor) array substrate, manufacturing method of TFT array substrate and display device |
CN102723365A (en) * | 2012-06-08 | 2012-10-10 | 京东方科技集团股份有限公司 | TFT (Thin Film Transistor), manufacturing method thereof, array substrate and display device |
CN102759832A (en) * | 2012-07-27 | 2012-10-31 | 南京中电熊猫液晶显示科技有限公司 | Liquid crystal display substrate and manufacturing method thereof |
CN103676354A (en) * | 2013-12-06 | 2014-03-26 | 合肥京东方光电科技有限公司 | Electrode structure, preparation method of electrode structure, array substrate, preparation method of array substrate and display device |
CN103676386A (en) * | 2013-12-27 | 2014-03-26 | 京东方科技集团股份有限公司 | Display panel and display device |
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Application publication date: 20181012 |