CN108615585A - A kind of preparation method of doped stannum oxide composite conductive thin film - Google Patents

A kind of preparation method of doped stannum oxide composite conductive thin film Download PDF

Info

Publication number
CN108615585A
CN108615585A CN201810468090.5A CN201810468090A CN108615585A CN 108615585 A CN108615585 A CN 108615585A CN 201810468090 A CN201810468090 A CN 201810468090A CN 108615585 A CN108615585 A CN 108615585A
Authority
CN
China
Prior art keywords
mixed liquor
thin film
graphene
oxide composite
conductive thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810468090.5A
Other languages
Chinese (zh)
Inventor
朱凯
何寿成
侯海军
戴海璐
吴其胜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yangcheng Institute of Technology
Yancheng Institute of Technology
Original Assignee
Yangcheng Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yangcheng Institute of Technology filed Critical Yangcheng Institute of Technology
Priority to CN201810468090.5A priority Critical patent/CN108615585A/en
Publication of CN108615585A publication Critical patent/CN108615585A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0026Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal

Abstract

The present invention relates to a kind of preparation methods of doped stannum oxide composite conductive thin film, by SnCl4, dopant and organic solvent mixed liquor is made, graphene is added after standing and carries out ultrasonic disperse, substrate surface is sprayed on by ultrasonic spray pyrolysis film applicator, then spray the mixed liquor of not graphene-containing, it is placed in argon gas and is made annealing treatment at 500 DEG C, tin oxide conductive film is made.The present invention solves the problems, such as that SnO 2 thin film conductivity is relatively low, and the equipment of use is simple, easily controllable, and conductive film surface obtained is uniform, and compact structure, conductive effect is good, and film is firmly combined with substrate.

Description

A kind of preparation method of doped stannum oxide composite conductive thin film
Technical field
The present invention relates to a kind of preparation methods of doped stannum oxide composite conductive thin film, belong to inorganic non-metallic material neck Domain.
Background technology
Conductive film receives every profession and trade concern as a kind of green, energy-efficient new material.Since its conductivity is good, can Light-exposed transmitance is high, is widely used in the fields such as electronic display, solar cell.Oxidation film accounts for leading in conductive film Status, such as SnO2Film.SnO2It is a kind of n-type semiconductor with cubic rutile structure, has chemical stability good and light The characteristics of learning anisotropy.SnO2The Sn atoms of interior surplus play alms giver, make SnO2The conductive energy of film.But SnO2 The conductivity of film is very low.
In order to improve SnO2The electric conductivity of conductive film, often in SnO2Such as Sb, In, Pt are adulterated in membrane-film preparation process With the elements such as F, but to improve situation still limited for the electric conductivity of conductive film.
Currently, the common preparation method of conductive film is magnetron sputtering method and vacuum vapor deposition method.Magnetron sputtering method equipment is multiple Miscellaneous, cost is higher;Vacuum vapor deposition method prepare film crystal structure growth is poor, adhesive force on substrate is smaller.
Invention content
It is an object of the invention to solve the problems, such as that SnO 2 thin film conductive capability is poor in the prior art, provides one kind and mixes The preparation method of miscellaneous composite tin oxide conducting film, the equipment of use is simple, easily controllable, and conductive film surface obtained is equal Even, compact structure, conductive effect is good, and film is firmly combined with substrate.
Technical solution
Raw material is dissolved in wiring solution-forming in organic solvent by the present invention, adds graphene, and atomization under high pressure sprays into high temperature In atmosphere, the chemical reactions such as thermal decomposition or burning occur for reactant, to obtain the ultra micron product with completely new chemical composition, And graphene solution is free of in substrate surface spraying, protection graphene is not oxidized, and bilayer film is made.Concrete scheme is as follows:
A kind of preparation method of doped stannum oxide composite conductive thin film, includes the following steps:
(1) by SnCl4, dopant be dissolved in organic solvent, be made mixed liquor;
(2) after the mixed liquor of step (1) being stood 10~20h, graphene is added, ultrasonic disperse is uniform, obtains graphitiferous The mixed liquor of alkene;
(3) step (1) is repeated, the mixed liquor of not graphene-containing is prepared, by the mixed of graphene-containing made from step (2) It closes liquid and substrate surface is sprayed to by ultrasonic spray pyrolysis film applicator, then spray the mixed liquor of not graphene-containing, be subsequently placed in argon It is made annealing treatment in gas, obtains doped stannum oxide composite conductive thin film;
Further, in step (1), the dopant is selected from lanthanum nitrate ﹣ antimony trichlorides, yttrium nitrate ﹣ antimony trichlorides or nitric acid Any one in cerium ﹣ antimony trichlorides, wherein the molar ratio of lanthanum nitrate, yttrium nitrate and cerous nitrate and antimony trichloride is 0.1 ~1:1.
Further, in step (1), the dopant and SnCl4Molar ratio 1:20~100.
Further, in step (1), the organic solvent is selected from the mixed of ethyl alcohol, dimethylformamide or the two arbitrary proportion Liquid is closed, the preferably volume ratio of ethyl alcohol and dimethylformamide is 1~9:1 mixed liquor.
Further, in step (1), in mixed liquor, SnCl4A concentration of 0.5~0.9mol/L.
Further, in step (2), graphene and SnCl4Mass ratio be 0.01~0.1:100.
Further, in step (2), the frequency of ultrasonic disperse is 40kHz, and the time is 2~5h.
Further, in step (3), the volume of the mixed liquor of graphene-containing is 2 times of the not mixed liquor of graphene-containing.
Further, in step (3), the running parameter of the ultrasonic spray pyrolysis film applicator:Substrate temperature is 400 ± 10 DEG C, fluid injection speed:10mm/min-45mm/min.
Further, in step (3), the temperature of the annealing is 500 DEG C, time 30min.
Beneficial effects of the present invention are:The present invention provides a kind of preparation method of doped stannum oxide composite conductive thin film, By codope and the method compound with graphene, carrier concentration in SnO 2 thin film is increased, tin oxide obtained is thin The conductive effect of film is more preferable, more secured with substrate adsorption.
Description of the drawings
Fig. 1 is the square resistance figure of the conductive film of embodiment and comparative example;
Fig. 2 is the carrier mobility rate diagram of the conductive film of embodiment and comparative example.
Specific implementation mode
The invention will be further described in the following with reference to the drawings and specific embodiments.For the ease of comparing, following embodiments In, ultrasonic spray pyrolysis film applicator model used is MSK-USP-04C, and but it is not limited to this.
Embodiment 1
A kind of preparation method of doped stannum oxide composite conductive thin film, includes the following steps:
(1) by SnCl4, dopant be dissolved in organic solvent, be made mixed liquor;Dopant is yttrium nitrate ﹣ antimony trichlorides, the two Molar ratio is 0.4:1, dopant and SnCl4Molar ratio is 1:50, SnCl4A concentration of 0.5mol/L, organic solvent are ethyl alcohol and two Methylformamide volume ratio is 1:1 mixed liquor;
(2) after the mixed liquor of step (1) being stood 12h, graphene, graphene and SnCl is added4Mass ratio be 0.025:100, ultrasonic disperse is uniform, obtains the mixed liquor of graphene-containing;
(3) step (1) is repeated, the mixed liquor of not graphene-containing is prepared, by the mixed of graphene-containing made from step (2) Closing liquid, (substrate temperature is 390 DEG C, fluid injection speed by ultrasonic spray pyrolysis film applicator:Substrate surface 20mm/min) is sprayed to, The mixed liquor of not graphene-containing is sprayed again, and the volume of the mixed liquor of graphene-containing is 2 times of the not mixed liquor of graphene-containing, then It is placed in argon gas the annealing 30min at 500 DEG C, obtains doped stannum oxide composite conductive thin film.
Embodiment 2
Dopant is yttrium nitrate ﹣ antimony trichlorides, and the two molar ratio is 0.8:1, remaining is same as Example 1.
Embodiment 3
Dopant and SnCl in step (1)4Molar ratio is 1:25, remaining is same as Example 1.
Embodiment 4
SnCl in step (1)4A concentration of 0.8mol/L, remaining is same as Example 1.
Embodiment 5
Dopant yttrium nitrate ﹣ antimony trichlorides in step (1), the two molar ratio are 0.8, dopant and SnCl4Molar ratio is 1:25, remaining is same as Example 1.
Embodiment 6
Dopant and SnCl in step (1)4Molar ratio is 1:25, SnCl4A concentration of 0.8mol/L, remaining and 1 phase of embodiment Together.
Embodiment 7
Dopant yttrium nitrate ﹣ antimony trichlorides in step (1), the two molar ratio are 0.8, SnCl4A concentration of 0.8mol/L, It is same as Example 1.
Embodiment 8
Organic solvent is the mixed liquor of ethyl alcohol and dimethylformamide, volume ratio 9 in step (1):1, remaining and implementation Example 1 is identical.
Embodiment 9
Graphene and SnCl in step (2)4Mass ratio is 0.01:100, remaining is same as Example 1.
Embodiment 10
Graphene and SnCl in step (2)4Mass ratio is 0.05:100, remaining is same as Example 1.
Embodiment 11
Graphene and SnCl in step (2)4Mass ratio is 0.075:100, remaining is same as Example 1.
Embodiment 12
Graphene and SnCl in step (2)4Mass ratio is 0.1:100, remaining is same as Example 1.
Embodiment 13
Substrate temperature is 410 DEG C in step (3), remaining is same as Example 1.
Embodiment 14
Fluid injection speed in step (3):40mm/min, remaining is same as Example 1.
Comparative example
A kind of preparation method of doped stannum oxide composite conductive thin film, is specifically completed according to the following steps:
The first step, by SnCl4, antimony trichloride is dissolved in dimethylformamide and mixed liquor, antimony trichloride and SnCl is made4Mole Than being 1:50, SnCl4A concentration of 0.8mol/L;
Second step, by ultrasonic spray pyrolysis film applicator, (substrate temperature is 400 DEG C, fluid injection speed after standing:30mm/ Min substrate surface) is sprayed to;
Third walks, and anneals in 500 DEG C of argon atmospheres, obtains SnO2Based conductive film.
Performance test:
1. the square resistance of the conductive film by four probe sheet resistance tester testing example and comparative example, is as a result shown in figure 1.Fig. 1 is the square resistance figure of the conductive film of embodiment and comparative example, namely the tin oxide of doping yttrium ﹣ antimony and different graphenes The square resistance variation diagram of compound quantity is as seen from Figure 1, thin using doped stannum oxide composite conducting made from the method for the present invention Electric resistance value is low, and conductive effect is good.
2. the carrier mobility rate of the conductive film by Hall effect tester testing example and comparative example, as a result See that Fig. 2, Fig. 2 are the carrier mobility rate diagrams of the conductive film of embodiment and comparative example, namely doping yttrium ﹣ antimony tin oxide with The carrier mobility rate variation diagram of different graphene compound quantities, as seen from Figure 2, the conductive film of the embodiment of the present invention Carrier mobility rate is big, and electric conductivity is more preferable.

Claims (9)

1. a kind of preparation method of doped stannum oxide composite conductive thin film, which is characterized in that include the following steps:
(1) by SnCl4, dopant be dissolved in organic solvent, be made mixed liquor;
(2) after the mixed liquor of step (1) being stood 10~20h, graphene is added, ultrasonic disperse is uniform, obtains graphene-containing Mixed liquor;
(3) step (1) is repeated, the mixed liquor of not graphene-containing is prepared, by the mixed liquor of graphene-containing made from step (2) Substrate surface is sprayed to by ultrasonic spray pyrolysis film applicator, then sprays the mixed liquor of not graphene-containing, is subsequently placed in argon gas Annealing, obtains doped stannum oxide composite conductive thin film;
In step (1), the dopant is selected from lanthanum nitrate ﹣ antimony trichlorides, yttrium nitrate ﹣ antimony trichlorides or cerous nitrate ﹣ antimony trichlorides In any one, wherein the molar ratio of lanthanum nitrate, yttrium nitrate and cerous nitrate and antimony trichloride is 0.1~1:1;
In step (1), the organic solvent is selected from the mixed liquor of ethyl alcohol, dimethylformamide or the two arbitrary proportion.
2. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (1), The dopant and SnCl4Molar ratio 1:20~100.
3. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (1), The organic solvent is that the volume ratio of ethyl alcohol and dimethylformamide is 1~9:1 mixed liquor.
4. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (1), In mixed liquor, SnCl4A concentration of 0.5~0.9mol/L.
5. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (2), Graphene and SnCl4Mass ratio be 0.01~0.1:100.
6. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (2), The frequency of ultrasonic disperse is 40kHz, and the time is 2~5h.
7. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (3), The volume of the mixed liquor of graphene-containing is 2 times of the not mixed liquor of graphene-containing.
8. the preparation method of doped stannum oxide composite conductive thin film as described in claim 1, which is characterized in that in step (3), The running parameter of the ultrasonic spray pyrolysis film applicator:Substrate temperature is 400 ± 10 DEG C, fluid injection speed:10-45mm/min.
9. such as the preparation method of claim 1 to 8 any one of them doped stannum oxide composite conductive thin film, which is characterized in that In step (3), the temperature of the annealing is 500 DEG C, time 30min.
CN201810468090.5A 2018-05-15 2018-05-15 A kind of preparation method of doped stannum oxide composite conductive thin film Pending CN108615585A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810468090.5A CN108615585A (en) 2018-05-15 2018-05-15 A kind of preparation method of doped stannum oxide composite conductive thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810468090.5A CN108615585A (en) 2018-05-15 2018-05-15 A kind of preparation method of doped stannum oxide composite conductive thin film

Publications (1)

Publication Number Publication Date
CN108615585A true CN108615585A (en) 2018-10-02

Family

ID=63663725

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810468090.5A Pending CN108615585A (en) 2018-05-15 2018-05-15 A kind of preparation method of doped stannum oxide composite conductive thin film

Country Status (1)

Country Link
CN (1) CN108615585A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109957789A (en) * 2019-04-12 2019-07-02 盐城工学院 A kind of high IR emissivity double-layer electric heating film and preparation method thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102060447A (en) * 2010-11-26 2011-05-18 武汉理工大学 Transparent coated glass with dual functions of preventing static electricity and cutting off ultraviolet rays and manufacturing method thereof
CN102568654A (en) * 2010-12-13 2012-07-11 国家纳米科学中心 Transparent conductive film and preparation method of transparent conductive film
CN103924381A (en) * 2014-04-18 2014-07-16 北京航空航天大学 Flexible transparent conductive oxide nanofiber membrane and preparation method thereof
CN105239094A (en) * 2015-11-12 2016-01-13 南京信息职业技术学院 Graphene-doped and lanthanum-modified titanium-based lead dioxide electrode and preparation method thereof
CN105916220A (en) * 2016-05-09 2016-08-31 苏州思创源博电子科技有限公司 Composite electric heating film preparation method
CN106992292A (en) * 2017-04-29 2017-07-28 天津大学 Three-dimensional grapheme embeds extra small tin antimony particle material and preparation and application

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102060447A (en) * 2010-11-26 2011-05-18 武汉理工大学 Transparent coated glass with dual functions of preventing static electricity and cutting off ultraviolet rays and manufacturing method thereof
CN102568654A (en) * 2010-12-13 2012-07-11 国家纳米科学中心 Transparent conductive film and preparation method of transparent conductive film
CN103924381A (en) * 2014-04-18 2014-07-16 北京航空航天大学 Flexible transparent conductive oxide nanofiber membrane and preparation method thereof
CN105239094A (en) * 2015-11-12 2016-01-13 南京信息职业技术学院 Graphene-doped and lanthanum-modified titanium-based lead dioxide electrode and preparation method thereof
CN105916220A (en) * 2016-05-09 2016-08-31 苏州思创源博电子科技有限公司 Composite electric heating film preparation method
CN106992292A (en) * 2017-04-29 2017-07-28 天津大学 Three-dimensional grapheme embeds extra small tin antimony particle material and preparation and application

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
朱辰杰等: "石墨烯掺杂氧化锡薄膜的结构与光学性能的研究", 《有色金属科学与工程》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109957789A (en) * 2019-04-12 2019-07-02 盐城工学院 A kind of high IR emissivity double-layer electric heating film and preparation method thereof

Similar Documents

Publication Publication Date Title
CN103779425B (en) A kind of indium gallium zinc oxide semiconductive thin film and indium gallium zinc oxide TFT preparation method
Lee et al. Fabrication of tin oxide film by sol–gel method for photovoltaic solar cell system
CN101560059B (en) Aluminum-doped zinc oxide film coating and nano-rod array material as well as preparation method thereof
Wu et al. Fabricate heterojunction diode by using the modified spray pyrolysis method to deposit nickel–lithium oxide on indium tin oxide substrate
CN106191775A (en) A kind of transparent conductive film and its preparation method and application
CN104105666A (en) Oxide film containing indium and method for manufacturing same
CN105489486A (en) Method for preparing thin-film transistor based on ultra-thin magnesium oxide high-k dielectric layer
CN101333107B (en) Process for preparing niobium-doped strontium titanate film
CN1948221A (en) Method of preparing high temperature ferromagnetism ZnO:(Co,Al) nano-material using sol-gel method
CN106206292A (en) A kind of low temperature liquid phase preparation method of high mobility indium gallium zinc oxygen thin film transistor (TFT)
Liu et al. Low-voltage SnO 2 nanowire transistors gated by solution-processed chitosan-based proton conductors
CN103601250A (en) Layer-by-layer alternatively doped low-leakage-current BiFeO3 film and preparation method thereof
CN108615585A (en) A kind of preparation method of doped stannum oxide composite conductive thin film
CN106328492A (en) Low temperature solution method of preparing indium oxide thin film transistor having high mobility
CN102593282A (en) Doping method for ZnO nanowire array
CN106653858A (en) Solution method for preparing high-mobility indium-zirconium-oxide thin film transistor at low temperature
CN103343335B (en) The preparation method of boron-doping zinc-oxide film
Meng et al. Low-resistance orthorhombic MoO3-x thin film derived by two-step annealing
CN106245007B (en) A kind of preparation method being orientated ito thin film
CN106410041B (en) Polymer solar battery and preparation method
CN106128941A (en) A kind of low temperature prepares the liquid phase process of indium gallium zinc oxygen transparent semiconductor film
CN106783564A (en) A kind of cryogenic fluid preparation method of indium oxide transparent semiconductor film
CN106653859A (en) Liquid-phase method for preparing high-mobility indium-zinc-oxide thin film transistor at low temperature
CN102061460B (en) Nanometer Ag particle-(Ba0.65, Sr0.35)TiO3 seepage-type composite ceramic film and preparation method thereof
Gao et al. Solvent effects on properties of metallo-organic derived Ni/NiO thin films

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20181002

RJ01 Rejection of invention patent application after publication