CN108559953A - Evaporation coating device - Google Patents

Evaporation coating device Download PDF

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Publication number
CN108559953A
CN108559953A CN201810792716.8A CN201810792716A CN108559953A CN 108559953 A CN108559953 A CN 108559953A CN 201810792716 A CN201810792716 A CN 201810792716A CN 108559953 A CN108559953 A CN 108559953A
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CN
China
Prior art keywords
heater
coating device
primary heater
heated material
evaporation coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810792716.8A
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Chinese (zh)
Inventor
张冲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Apollo Ding Rong Solar Technology Co Ltd
Original Assignee
Beijing Apollo Ding Rong Solar Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Apollo Ding Rong Solar Technology Co Ltd filed Critical Beijing Apollo Ding Rong Solar Technology Co Ltd
Priority to CN201810792716.8A priority Critical patent/CN108559953A/en
Publication of CN108559953A publication Critical patent/CN108559953A/en
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a kind of evaporation coating devices, primary heater and secondary heater including rotary part, in vacuum cavity, the primary heater and the secondary heater are located in different planes, the primary heater connect with secondary heater and is formed therebetween the space for accommodating heated material, and the rotary part is for driving the primary heater and secondary heater to rotate.On the one hand the center of heated material and the marginal position temperature difference can be made not too large, to be not easy deformation at high temperature；On the other hand, due to foring the space for accommodating heated material between primary heater and secondary heater, the space can embody certain heat storage function, the top and side of heated material are heated simultaneously, avoid the diffusion of heat around, the upper and lower surface temperature difference of heated material is set to maintain in the reasonable scope, can more realistically embody film growth temperature.

Description

Evaporation coating device
Technical field
The present invention relates to photovoltaic module technical fields, particularly relate to a kind of evaporation coating device.
Background technology
CIGS(CuInxGa(1-x)Se2, copper indium gallium selenide) thin film solar cell have stability is good, photoelectric conversion efficiency is high, The advantages that dim light performance is good, thus it is increasingly subject to the favor of industrial circle.CIGS thin film solar cell in entire battery as most closing The functional layer of key absorbs layer material and is typically chosen under vacuum condition using evaporation or magnetron sputtering method deposition.
When using soda-lime glass as the substrate for supporting entire battery structure, especially total using three more universal steps During evaporation technology prepares CIGS absorbed layers, underlayer temperature has a major impact film crystalline quality.On the one hand, if lining Bottom temperature is too low, and film crystal grain is small, and crystal boundary is caused to increase, and can form more complex centre, influences carrier collection, while mistake Low temperature also results in alkali metal (mainly Na) element in substrate and hardly enters absorbed layer, to not have improvement film Crystalline quality, the effect for increasing carrier concentration；On the other hand, if underlayer temperature is too high, four Charltons of glass substrate are to low Warm area is bent, and then influences the uniformity of film thickness and component, while also to follow-up buffer layer, transparency conducting layer and metal electricity The deposition of pole has an adverse effect.Therefore, it is vital that the temperature of glass substrate, which controls in entire preparation process,.
In realizing process of the present invention, inventor has found that at least there are the following problems in the prior art：
Within the scope of current experiment room or industrialization, heater is generally located to the surface of sample, in order to ensure that heating is equal Even property makes heater area be more than Substrate Area.But can thus there are problems that two：First, although heating surface (area) (HS is more than lining Floor space, but heater inherently central area temperature is higher than lip temperature, and it is uneven thus to be easy to cause silicon, especially , at high temperature (T >=600 DEG C), the temperature difference of center and peripheral can make the deformation that glass generative center protrusion, edge drop, and influence for it Resulting devices structure；Second, heater is located above substrate, but film deposition position is below substrate, simple glass there is also Certain thickness about (2~3mm), thus causes the waste of heat, while top is just when ideal temperature is not achieved in lower section temperature Have occurred and that deformation.
Invention content
In view of this, it is an object of the invention to propose a kind of evaporation coating device, to solve, silicon is uneven, heat is unrestrained The technical issues of taking.
An embodiment of the present invention provides a kind of evaporation coating devices, including rotary part 1, the first heating in vacuum cavity Device 31 and secondary heater 32, the primary heater 31 and the secondary heater 32 are located in different planes, and described One heater 31 connect with secondary heater 32 and is formed therebetween the space for accommodating heated material 2, the rotation Rotation member 1 is for driving the primary heater 31 and secondary heater 32 to rotate.
In some embodiments of the invention, the primary heater 31 and the secondary heater 32 are connected by side It connects, the quantity of the secondary heater 32 is at least two pieces, and at least two pieces of secondary heaters 32 are connected to described The opposite sides of one heater 31.
In some embodiments of the invention, the quantity of the secondary heater 32 is four pieces, four pieces of second heating Device 32 is connected to around the primary heater 31.
In some embodiments of the invention, the edge of each adjacent secondary heater 32 is sequentially connected.
In some embodiments of the invention, the secondary heater 32 is rounded.
In some embodiments of the invention, the primary heater 31 and the angle of the secondary heater 32 are 45- 135°。
In some embodiments of the invention, the rotary part 1 is for driving the primary heater 31, second to heat Device 32 and the heated material 2 below the primary heater 31 rotate together.
In some embodiments of the invention, the evaporation coating device further includes the survey positioned at 2 surface of the heated material Warm element 5, the temperature element 5 are used to detect the temperature on 2 surface of the heated material.
In some embodiments of the invention, the evaporation coating device further includes the baffle 4 being located in vacuum cavity and is located at Evaporation source below the vacuum cavity, the baffle 4 are located at 32 lower section of the primary heater 31 and secondary heater, and energy It is enough to be moved back and forth along horizontal direction, the channel for being turned on or off between the evaporation source and the heated material 2.
In some embodiments of the invention, the quantity of the evaporation source is multiple, and multiple evaporation sources are rounded It is even to be distributed in below the vacuum cavity.
In some embodiments of the invention, the chamber walls 6 outside the vacuum cavity carry circulating water.
On the one hand evaporation coating device provided in an embodiment of the present invention can make center and the marginal position of heated material The temperature difference is not too large, to be not easy deformation at high temperature；On the other hand, due to being formed between primary heater and secondary heater Space for accommodating heated material, which can embody certain heat storage function, while heating heated material Top and side avoid the diffusion of heat around, and the upper and lower surface temperature difference of heated material is made to maintain in the reasonable scope, Film growth temperature can more realistically be embodied.
Description of the drawings
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with Obtain other attached drawings according to these attached drawings.
Fig. 1 is the structural schematic diagram of the evaporation coating device of the embodiment of the present invention.
Specific implementation mode
In order to enable those skilled in the art to better understand the solution of the present invention, below in conjunction in the embodiment of the present invention Attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is only The embodiment of a part of the invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill people The every other embodiment that member is obtained without making creative work should all belong to the model that the present invention protects It encloses.
It should be noted that term " first " in description and claims of this specification and above-mentioned attached drawing, " Two " etc. be for distinguishing similar object, without being used to describe specific sequence or precedence.It should be appreciated that using in this way Data can be interchanged in the appropriate case, so as to the embodiment of the present invention described herein can in addition to illustrating herein or Sequence other than those of description is implemented.In addition, term " comprising " and " having " and their any deformation, it is intended that cover It includes to be not necessarily limited to for example, containing the process of series of steps or unit, method, system, product or equipment to cover non-exclusive Those of clearly list step or unit, but may include not listing clearly or for these processes, method, product Or the other steps or unit that equipment is intrinsic.It should be noted that the structural schematic diagram of evaporation coating device shown in FIG. 1 is exemplary , and not restrictive.
At least one embodiment of the present invention provides a kind of evaporation coating device, structural schematic diagram such as Fig. 1 of the evaporation coating device It is shown, including rotary part 1, the primary heater 31 in vacuum cavity and secondary heater 32, the primary heater 31 and the secondary heater 32 be located in different planes, the primary heater 31 connect with secondary heater 32 and two Form space for accommodating heated material 2 between person, the rotary part 1 is for driving the primary heater 31 and the Two heaters 32 rotate.The heated material 2 can be glass substrate, stainless steel lining bottom etc..In an embodiment of the present invention, Due to connecting secondary heater 32 in the side of primary heater 31, the area of primary heater 31, a side can be reduced Face can make the center of heated material and the marginal position temperature difference not too large, to be not easy deformation at high temperature；It is another Aspect, due to foring the space for accommodating heated material between primary heater and secondary heater, which can Certain heat storage function is embodied, while heating the top and side of heated material, the diffusion of heat around is avoided, makes to wait for The upper and lower surface temperature difference for heating object maintains in the reasonable scope, can more realistically embody film growth temperature.
In another embodiment of the present invention, the primary heater 31 and the secondary heater 32 are connected by side It connects, the quantity of the secondary heater 32 is at least two pieces, and at least two pieces of secondary heaters 32 are connected to described The opposite sides of one heater 31.In view of now widely used roll-to-roll deposition technique, the embodiment of the present invention is only first The opposite sides of heater connects secondary heater so that and reel-shaped substrate is jointly equably heated in both sides and top, with Meet the shape need of reel-shaped substrate.
In yet another embodiment of the present invention, the quantity of the secondary heater 32 is four pieces, and four pieces described second add Hot device 32 is connected to around the primary heater 31.In view of being further reduced the center of heated material 2 With the temperature difference and raising heat storage function of marginal position, surrounding connection second heating of the embodiment of the present invention in primary heater Device.Optionally, the edge of each adjacent secondary heater 32 is sequentially connected, to be further reduced heated material 2 Center and marginal position the temperature difference and improve heat storage function.Optionally, the secondary heater 32 can it is rounded, Ellipse or other irregular shapes being closed, the embodiment of the present invention are not restricted this.
In another embodiment of the present invention, the primary heater 31 and the angle of the secondary heater 32 are 45-135 °, the technique effect of the present invention can be reached in the range, can both make the center and side of heated material The edge position temperature difference is not too large, to be not easy deformation at high temperature, and can heat the top and side of heated material simultaneously, The diffusion of heat around is substantially avoided, the upper and lower surface temperature difference of heated material is made to maintain in the reasonable scope.For example, described Primary heater 31 and the angle of the secondary heater 32 are 85 °.The primary heater 31 and the secondary heater 32 Angle be 90 °.The primary heater 31 and the angle of the secondary heater 32 are 105 °.
In yet another embodiment of the present invention, the rotary part 1 is for driving the primary heater 31, second to add Hot device 32 and the heated material 2 below the primary heater 31 rotate together.In this embodiment it is possible to pass through Driving mechanism drives 1 rotation of rotary part, to drive coupled primary heater 31, secondary heater 32 and be located at The heated material 2 of 31 lower section of the primary heater rotates together, and guarantee is equably deposited.
Optionally, the evaporation coating device further includes the temperature element 5 positioned at 2 surface of the heated material, the thermometric Element 5 is used to detect the temperature on 2 surface of the heated material.Optionally, the temperature element 5 can be thermocouple, be used for The accurately temperature on 2 surface of detection heated material.
Optionally, the evaporation coating device further includes the baffle 4 being located in vacuum cavity and is located at below the vacuum cavity Evaporation source (not shown), the baffle 4 is located at the primary heater 31 and the lower section of secondary heater 32, and being capable of edge Dampening square to reciprocating movement, for be turned on or off the evaporation source (not shown) and the heated material 2 it Between channel.In this embodiment, it can control evaporation source along the reciprocating movement of horizontal direction by baffle and (not show in figure Going out) channel between heated material is turned on or off.
In yet another embodiment of the present invention, the quantity of the evaporation source is multiple, and multiple evaporation sources are rounded It is evenly distributed below the vacuum cavity.Optionally, the evaporation source can be Se (selenium), In (indium), Ga (gallium), Cu (copper) Evaporation source, this four evaporation sources are rounded to be evenly distributed below the vacuum cavity, uniform for being carried out to heated material Se, In, Ga, Cu is deposited in ground.
Optionally, the chamber walls 6 outside the vacuum cavity carry circulating water, for being cooled down to vacuum cavity, Prevent temperature excessively high.
It can be seen that evaporation coating device provided in an embodiment of the present invention on the one hand can make heated material center and The marginal position temperature difference is not too large, to be not easy deformation at high temperature；On the other hand, due to primary heater and secondary heater Between form space for accommodating heated material, which can embody certain heat storage function, while heat to be added The top and side of hot object avoid the diffusion of heat around, and the upper and lower surface temperature difference of heated material is made to maintain conjunction It manages in range, can more realistically embody film growth temperature.
Those of ordinary skills in the art should understand that：The discussion of any of the above embodiment is exemplary only, not It is intended to imply that the scope of the present disclosure (including claim) is limited to these examples；Under the thinking of the present invention, above example Or can also be combined between the technical characteristic in different embodiments, and there are different aspects present invention as described above Many other variations, in order to it is concise they do not provided in details.Therefore, all within the spirits and principles of the present invention, Any omission, modification, equivalent replacement, improvement for being made etc., should all be included in the protection scope of the present invention.

Claims (10)

1. a kind of evaporation coating device, which is characterized in that the primary heater (31) including rotary part (1), in vacuum cavity With secondary heater (32), the primary heater (31) and the secondary heater (32) are located in different planes, described Primary heater (31) connect with secondary heater (32) and forms the sky for accommodating heated material (2) therebetween Between, the rotary part (1) is for driving the primary heater (31) and secondary heater (32) to rotate.
2. evaporation coating device according to claim 1, which is characterized in that the primary heater (31) and second heating Device (32) is connected by side, and the quantity of the secondary heater (32) is at least two pieces, at least two pieces of secondary heaters (32) it is connected to the opposite sides of the primary heater (31).
3. evaporation coating device according to claim 2, which is characterized in that the quantity of the secondary heater (32) is four pieces, Four pieces of secondary heaters (32) are connected to around the primary heater (31).
4. evaporation coating device according to claim 3, which is characterized in that the side of each adjacent secondary heater (32) Edge is sequentially connected.
5. evaporation coating device according to claim 4, which is characterized in that the secondary heater (32) is rounded.
6. evaporation coating device according to claim 1, which is characterized in that the primary heater (31) is heated with described second The angle of device (32) is 45-135 °.
7. evaporation coating device according to claim 1, which is characterized in that the rotary part (1) is for driving described first Heater (31), secondary heater (32) and the heated material (2) below the primary heater (31) are revolved together Turn.
8. evaporation coating device according to claim 1, which is characterized in that further include being located at the heated material (2) surface Temperature element (5), the temperature element (5) is used to detect the temperature on the heated material (2) surface.
9. evaporation coating device according to claim 1, which is characterized in that further include be located at vacuum cavity in baffle (4) and Evaporation source below the vacuum cavity, the baffle (4) are located at the primary heater (31) and secondary heater (32) lower section, and can be moved back and forth along horizontal direction, for being turned on or off the evaporation source and the material to be heated Channel between body (2).
10. evaporation coating device according to claim 9, which is characterized in that the quantity of the evaporation source be it is multiple, it is multiple described Evaporation source is rounded to be evenly distributed below the vacuum cavity.
CN201810792716.8A 2018-07-18 2018-07-18 Evaporation coating device Pending CN108559953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810792716.8A CN108559953A (en) 2018-07-18 2018-07-18 Evaporation coating device

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Application Number Priority Date Filing Date Title
CN201810792716.8A CN108559953A (en) 2018-07-18 2018-07-18 Evaporation coating device

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101245442A (en) * 2008-03-21 2008-08-20 南开大学 Method for producing indium-gallium-stibium polycrystalline film with multi-component coevaporation
US20090068355A1 (en) * 2003-12-01 2009-03-12 Superconductor Technologies, Inc. Device and method for fabricating thin films by reactive evaporation
CN101921987A (en) * 2009-06-10 2010-12-22 鸿富锦精密工业（深圳）有限公司 Film sputtering and coating device
CN103911586A (en) * 2013-01-04 2014-07-09 台积太阳能股份有限公司 Method and system for forming absorber layer on metal coated glass for photovoltaic devices
CN104919599A (en) * 2013-01-09 2015-09-16 阿森特太阳能技术公司 Systems and methods for thermally managing high- temperature processes on temperature sensitive substrates
CN105629666A (en) * 2014-10-29 2016-06-01 李东明 Improved light resistance pre-baking oven heating device
CN208667830U (en) * 2018-07-18 2019-03-29 北京铂阳顶荣光伏科技有限公司 Evaporation coating device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090068355A1 (en) * 2003-12-01 2009-03-12 Superconductor Technologies, Inc. Device and method for fabricating thin films by reactive evaporation
CN101245442A (en) * 2008-03-21 2008-08-20 南开大学 Method for producing indium-gallium-stibium polycrystalline film with multi-component coevaporation
CN101921987A (en) * 2009-06-10 2010-12-22 鸿富锦精密工业（深圳）有限公司 Film sputtering and coating device
CN103911586A (en) * 2013-01-04 2014-07-09 台积太阳能股份有限公司 Method and system for forming absorber layer on metal coated glass for photovoltaic devices
CN104919599A (en) * 2013-01-09 2015-09-16 阿森特太阳能技术公司 Systems and methods for thermally managing high- temperature processes on temperature sensitive substrates
CN105629666A (en) * 2014-10-29 2016-06-01 李东明 Improved light resistance pre-baking oven heating device
CN208667830U (en) * 2018-07-18 2019-03-29 北京铂阳顶荣光伏科技有限公司 Evaporation coating device

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Application publication date: 20180921