CN108505017A - A kind of DLC film layer preparation method accurately controlling DLC film layer thickness - Google Patents

A kind of DLC film layer preparation method accurately controlling DLC film layer thickness Download PDF

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Publication number
CN108505017A
CN108505017A CN201810450574.7A CN201810450574A CN108505017A CN 108505017 A CN108505017 A CN 108505017A CN 201810450574 A CN201810450574 A CN 201810450574A CN 108505017 A CN108505017 A CN 108505017A
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CN
China
Prior art keywords
film layer
wear
dlc film
spare part
resisting spare
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810450574.7A
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Chinese (zh)
Inventor
辛存良
谢洪涛
何世安
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CETC 16 Research Institute
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CETC 16 Research Institute
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Publication date
Application filed by CETC 16 Research Institute filed Critical CETC 16 Research Institute
Priority to CN201810450574.7A priority Critical patent/CN108505017A/en
Publication of CN108505017A publication Critical patent/CN108505017A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated
    • C23C16/0227Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • C23C16/278Diamond only doping or introduction of a secondary phase in the diamond
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32Carbides
    • C23C16/325Silicon carbide

Abstract

The present invention relates to a kind of DLC film layer preparation methods accurately controlling DLC film layer thickness, include the following steps:(1)Multiple tracks cleaning is carried out to wear-resisting spare part;(2)Wear-resisting spare part after cleaning is placed on N2It is dried under atmosphere;(3)Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, until the vacuum degree of vacuum cavity is higher than 1 × 10‑6When mbar, DLC plated films are proceeded by;(4)It is bombarded using Ar gas ion pair wear-resisting spare parts;(5)DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane;(6)After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, measures the thickness of DLC film layer.The present invention can accurately control the thickness of DLC film layer, ensure the fit clearance between wear-resisting spare part friction is secondary, and no longer need to carry out match grinding manufacturing procedure, save assembly time, improve the efficiency of assembling of special equipment parts.

Description

A kind of DLC film layer preparation method accurately controlling DLC film layer thickness
Technical field
The present invention relates to special equipment wear-resisting spare part technical fields, and in particular to one kind accurately controlling DLC film layer thickness DLC film layer preparation method.
Background technology
Currently, the DLC film layer thickness deposited on the special equipment wear-resisting spare part surface of tribological field can not be controlled accurately System, which results in fit clearance of the friction corresponding to wear-resisting spare part between secondary to be unable to get guarantee, causes to friction Pair carries out match grinding again, and, to ensure the gap between friction is secondary, match grinding, which is processed, to be increased needed for entire special equipment parts assembly Time, reduce the efficiency of assembling of entire special equipment parts, affect manufacturing schedule.
Invention content
The purpose of the present invention is to provide a kind of DLC film layer preparation method accurately controlling DLC film layer thickness, this method energy It is enough that the thickness of DLC film layer is accurately controlled, ensure the fit clearance between wear-resisting spare part friction is secondary, and no longer need into Row match grinding manufacturing procedure, saves assembly time, improves the efficiency of assembling of special equipment parts.
To achieve the above object, present invention employs following technical schemes:
A kind of DLC film layer preparation method accurately controlling DLC film layer thickness, this approach includes the following steps:
(1)Multiple tracks cleaning is carried out to wear-resisting spare part, removes greasy dirt and surface attachments on wear-resisting spare part.
(2)Wear-resisting spare part surface oxidisation after cleaning in order to prevent, N is placed on by the wear-resisting spare part after cleaning2Atmosphere Lower drying.
(3)Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, directly Vacuum degree to vacuum cavity is higher than 1 × 10-6When mbar, DLC plated films are proceeded by.
(4)It is bombarded using Ar gas ion pair wear-resisting spare parts, further to remove wear-resisting spare part surface attachments And activate wear-resisting spare part surface.
(5)DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane.DLC film layer packet SiC layer, SiC and C layers, C layers of trilamellar membrane layer are included, the flow and sedimentation time by controlling n-hexane and tetramethylsilane are sunk Integrated membrane layer.
(6)After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, using outside micrometer The change in size before and after its plated film is measured, obtains the thickness of DLC film layer.
Further, step(4)In, the bombardment time of Ar gas ions is 20min, flow 60mL/min.
Further, step(5)In, it is respectively 35min and 60mL/min to control the sedimentation time of n-hexane and flow;Control The sedimentation time and flow of tetramethylsilane processed are respectively 40min and 92mL/min.
Further, step(6)In, the thickness for the DLC film layer measured is 3 μm.
By above technical scheme it is found that the present invention by it is prepared by DLC film layer the parameters such as raw material, time and flow for being into Row control, can accurately control the thickness of DLC film layer, ensure the fit clearance between wear-resisting spare part friction is secondary, and And no longer need to carry out match grinding manufacturing procedure, assembly time is saved, the efficiency of assembling of special equipment parts is improved.The present invention The densification of DLC film layer, the thickness of preparation can be made uniform, the present invention has the characteristics that simple, reliable, practical.
Description of the drawings
Fig. 1 is the preparation technology flow chart of DLC film layer in the present invention.
Specific implementation mode
The present invention will be further described below in conjunction with the accompanying drawings:
A kind of DLC film layer preparation method accurately controlling DLC film layer thickness as shown in Figure 1, this approach includes the following steps:
(1)Multiple tracks cleaning is carried out to wear-resisting spare part, removes greasy dirt and surface attachments on wear-resisting spare part.
(2)Wear-resisting spare part surface oxidisation after cleaning in order to prevent, N is placed on by the wear-resisting spare part after cleaning2Atmosphere Lower drying.
(3)Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, directly Vacuum degree to vacuum cavity is higher than 1 × 10-6When mbar, DLC plated films are proceeded by.
(4)It is bombarded using Ar gas ion pair wear-resisting spare parts, further to remove wear-resisting spare part surface attachments And activate wear-resisting spare part surface.
(5)DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane.DLC film layer packet SiC layer, SiC and C layers, C layers of trilamellar membrane layer are included, specifically, the DLC film layer includes being covered in wear-resisting spare part surface SiC layer, the SiC layer for being covered in SiC layer surface and C layers, the C layers for being covered in SiC layer and C layer surfaces.By control n-hexane and The flow and sedimentation time of tetramethylsilane carry out depositional coating.
(6)After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, using outside micrometer The change in size before and after its plated film is measured, obtains the thickness of DLC film layer.
Further, step(4)In, the bombardment time of Ar gas ions is 20min, flow 60mL/min.
Further, step(5)In, it is respectively 35min and 60mL/min to control the sedimentation time of n-hexane and flow;Control The sedimentation time and flow of tetramethylsilane processed are respectively 40min and 92mL/min.
Further, step(6)In, the thickness for the DLC film layer measured is 3 μm.
Embodiment described above is only that the preferred embodiment of the present invention is described, not to the model of the present invention It encloses and is defined, under the premise of not departing from design spirit of the present invention, technical side of the those of ordinary skill in the art to the present invention The various modifications and improvement that case is made should all be fallen into the protection domain of claims of the present invention determination.

Claims (4)

1. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness, it is characterised in that:This approach includes the following steps:
(1)Multiple tracks cleaning is carried out to wear-resisting spare part, removes greasy dirt and surface attachments on wear-resisting spare part;
(2)Wear-resisting spare part after cleaning is placed on N2It is dried under atmosphere;
(3)Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, until true The vacuum degree of cavity body is higher than 1 × 10-6When mbar, DLC plated films are proceeded by;
(4)It is bombarded using Ar gas ion pair wear-resisting spare parts, further to remove wear-resisting spare part surface attachments, and it is living Change wear-resisting spare part surface;
(5)DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane;DLC film layer includes SiC Layer, SiC and C layers, C layers of trilamellar membrane layer, flow and sedimentation time by controlling n-hexane and tetramethylsilane carry out deposition film Layer;
(6)After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, is measured using outside micrometer Change in size before and after its plated film obtains the thickness of DLC film layer.
2. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness according to claim 1, it is characterised in that: Step(4)In, the bombardment time of Ar gas ions is 20min, flow 60mL/min.
3. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness according to claim 1, it is characterised in that: Step(5)In, it is respectively 35min and 60mL/min to control the sedimentation time of n-hexane and flow;Control the heavy of tetramethylsilane Product time and flow are respectively 40min and 92mL/min.
4. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness according to claim 1, it is characterised in that: Step(6)In, the thickness for the DLC film layer measured is 3 μm.
CN201810450574.7A 2018-05-11 2018-05-11 A kind of DLC film layer preparation method accurately controlling DLC film layer thickness Pending CN108505017A (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
CN201810450574.7A CN108505017A (en) 2018-05-11 2018-05-11 A kind of DLC film layer preparation method accurately controlling DLC film layer thickness

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101864553A (en) * 2010-05-21 2010-10-20 南京理工大学 Integrated manufacturing method of microminiature parts based on surface coating
CN103484834A (en) * 2013-09-02 2014-01-01 河南省中原内配股份有限公司 Production process of DLC (Diamond Like Carbon) composite coating cylinder liner
US20140178637A1 (en) * 2012-12-21 2014-06-26 Exxonmobil Research And Engineering Company Low friction coatings with improved abrasion and wear properties and methods of making

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101864553A (en) * 2010-05-21 2010-10-20 南京理工大学 Integrated manufacturing method of microminiature parts based on surface coating
US20140178637A1 (en) * 2012-12-21 2014-06-26 Exxonmobil Research And Engineering Company Low friction coatings with improved abrasion and wear properties and methods of making
CN103484834A (en) * 2013-09-02 2014-01-01 河南省中原内配股份有限公司 Production process of DLC (Diamond Like Carbon) composite coating cylinder liner

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
杜昊等: "硬质合金表面SiC/DLC涂层组织和性能研究", 《工具技术》 *
陈文涛: "《LED技术基础及封装岗位任务解析》", 31 August 2013, 华中科技大学出版社 *

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Application publication date: 20180907