CN108485554A - A kind of preparation method of the resistance to knifing of bloom and its facial mask - Google Patents
A kind of preparation method of the resistance to knifing of bloom and its facial mask Download PDFInfo
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- CN108485554A CN108485554A CN201810613298.1A CN201810613298A CN108485554A CN 108485554 A CN108485554 A CN 108485554A CN 201810613298 A CN201810613298 A CN 201810613298A CN 108485554 A CN108485554 A CN 108485554A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/29—Laminated material
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/47—Levelling agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/24—Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/245—Vinyl resins, e.g. polyvinyl chloride [PVC]
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
- C08J2327/06—Homopolymers or copolymers of vinyl chloride
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/122—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present only on one side of the carrier, e.g. single-sided adhesive tape
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2427/00—Presence of halogenated polymer
- C09J2427/006—Presence of halogenated polymer in the substrate
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The invention discloses the preparation methods of a kind of resistance to knifing of bloom and its facial mask, belong to functional membrane field, and the preparation method is simple for process, safe, cost-effective, can obtain the resistance to knifing of the good bloom of ductility.Inventive film is followed successively by nano coating, bloom scratch resistance facial mask, water-based ink layer, PVC printing primers, aqueous gum layer from top to bottom, and for bloom scratch resistance facial mask using slide as base material, substrate surface sequentially consists of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：10% 30% reactive diluent, 20% 50% soft component, 30% 60% hard component, 2% 5% photoinitiator, 0.1% 1% levelling agent；It is coated with compo in substrate by dimple precision coating method, is dried using floated baking oven, last oxygen barrier ultra-violet curing obtains bloom scratch resistance facial mask.
Description
Technical field
The invention belongs to functional membrane field more particularly to the preparation methods of a kind of resistance to knifing of bloom and its facial mask.
Background technology
The film of the object surfaces such as automobile, furniture is easy to be damaged by sandstone, washing or artificial scrape in use
Wound causes gloss decrease, cut apparent, seriously affects film quality and beauty, and therefore, scratch resistance, which becomes, weighs film performance
One important indicator.High scratch resistance means that film can make material surface keep gloss and beauty in a long time, makes dress
The service life is longer for exterior material.At present mainly by increasing the hardness of polymer coating film to improve the scratch resistance of film, but this
The hardness by increasing polymer coating film in print face can cause film to prolong with the scratch resistance for improving film due to excessive high hardness
Malleability is poor, the prodigious scope of application for limiting coating.And existing decorating film reflecting rate is low, leads to luminance shortage, influences
The aesthetics of film.
Invention content
The present invention provides the preparation method of a kind of resistance to knifing of bloom and its facial mask, the preparation method is simple for process, safe
Property it is high, cost-effective, the resistance to knifing of the good bloom of ductility can be obtained.
In order to achieve the above object, the present invention uses following technical scheme：
A kind of resistance to knifing of bloom, is followed successively by nano coating, water-based ink layer, PVC printing primers, aqueous gum layer from top to bottom,
Bloom scratch resistance facial mask is equipped between the nano coating and water-based ink layer；The bloom scratch resistance facial mask using slide as base material,
Substrate surface sequentially consists of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：10%-30%
Reactive diluent, the soft component of 20%-50%, the hard component of 30%-60%, the photoinitiator of 2%-5%, 0.1%-1% levelling agent.
Soft component described in component described above is soft polyurethane acrylate, and described hard group is divided into hard polyurethane acrylic acid
Fat, the photoinitiator are ultraviolet light active photoinitiators, and the levelling agent is reactive siloxane, preferably double bond containing anti-
Answering property siloxanes, the reactive diluent are 1,6- ethylene glycol diacrylate fat and acryloyl Ma Lin.
A kind of preparation method of bloom scratch resistance facial mask, includes the following steps：
(1) it is soft component, the hard component of 30%-60%, the reactive diluent of 10%-30%, the 0.1%-1% of 20%-50% to take mass ratio
Levelling agent be uniformly mixed, sequentially add while stirring mass ratio be 2%-5% photoinitiator；
(2) base material is dusted, then carries out sided corona treatment, then base material is heated and is plated；
(3) coating substrate on step (2) processed base material, then be uniformly mixed step (1) by the coating of dimple precision
Coating is coated on substrate upper layer；
(4) base material after being coated with step (3) is dried in floated baking oven, and drying temperature is 40 DEG C -70 DEG C, is then carried out again
Oxygen barrier ultra-violet curing obtains bloom scratch resistance facial mask.
Beneficial effects of the present invention：The present invention provides the preparation method of a kind of resistance to knifing of bloom and its facial mask, facial mask bases
The transparent PVC piece that material uses have the characteristics that flatness is good, transparency is high, environment-protective no-smell, the miscellaneous point of crystalline substance less, ductility it is good,
The adhesive force that substrate enhances base material and coating is first applied before being coated with coating in preparation process, utilizes the accurate coating apparatus of import
Keep coating more smooth using the method that dimple precision is coated with, drying is avoided to generate in drying course using floated baking oven and be scraped
Trace finally uses oxygen barrier ultra-violet curing, ensure that faster curing rate and good solidification effect.
Facial mask is combined using soft or hard component, so that facial mask is had certain scratch resistance, is also improved the table of decorating film
Face brightness, levelling agent reactive siloxane may participate in polymer reaction, improve polymer surfaces performance, make coating leveling and hand
The performances such as sense are improved；The film formed in substrate surface after paint solidification has scratch resistance and good ductility, and outer
Table lubricates, and after facial mask and water-based ink layer fitting embossing, facial mask surface is coated with nano-macromolecule material shape by repeatedly accurate
At the nano coating of scratch resistance, the scratch resistance performance of film is not only increased, and under the premise of maintaining facial mask ductility, make decoration
Film surface is smooth, and the paint effect with high brightness enables to entire film surface more smooth in use in this way,
Light, and the water-based ink used has the advantages that the low smell of environmental protection, and stringent printing is required especially suitable for sanitary condition
Product can solve the problems, such as that traditional decoration film smell again, not environmentally, can select different in water-based ink layer preparation process
Aqueous pigment realizes the solid colour with whole household or automobile decoration, while according to the difference of coating applications, adjustable coating
Hardness and tough sex ratio, expand the use scope of coating, reduce the production cost.
Specific implementation mode
Embodiment 1
A kind of resistance to knifing of bloom, is followed successively by nano coating, water-based ink layer, PVC printing primers, aqueous gum layer from top to bottom,
Bloom scratch resistance facial mask is equipped between the nano coating and water-based ink layer；The bloom scratch resistance facial mask using slide as base material,
Substrate surface sequentially consists of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：The 1 of 30%,
6- ethylene glycol diacrylates fat, 30% soft polyurethane acrylate, 34% hard polyurethane acrylate, 5% ultraviolet photolytic activity
Photoinitiator, 1% double bond containing reactive siloxane.
A kind of preparation method of bloom scratch resistance facial mask, includes the following steps：
(1) take mass ratio be 30% 1,6- ethylene glycol diacrylates fat, 30% soft polyurethane acrylate, 34% hard poly- ammonia
Fat acrylate, 1% double bond containing reactive siloxane be uniformly mixed, sequentially add while stirring mass ratio be 5% it is ultraviolet
Photolytic activity photoinitiator；
(2) base material is dusted, then carries out sided corona treatment, then base material is heated and is plated；
(3) coating substrate on step (2) processed base material, then be uniformly mixed step (1) by the coating of dimple precision
Coating is coated on substrate upper layer；
(4) base material after being coated with step (3) is dried in floated baking oven, and drying temperature is 70 DEG C, is then carried out again oxygen barrier
Ultra-violet curing obtains bloom scratch resistance facial mask.
Embodiment 2
A kind of resistance to knifing of bloom, is followed successively by nano coating, water-based ink layer, PVC printing primers, aqueous gum layer from top to bottom,
Bloom scratch resistance facial mask is equipped between the nano coating and water-based ink layer；The bloom scratch resistance facial mask using slide as base material,
Substrate surface sequentially consists of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：The third of 10%
Alkene acyl Ma Lin, 50% soft polyurethane acrylate, 36% hard polyurethane acrylate, 3.1% ultraviolet photolytic activity are light-initiated
Agent, 0.1% double bond containing reactive siloxane.
A kind of preparation method of bloom scratch resistance facial mask, includes the following steps：
(1) take mass ratio be 10% acryloyl Ma Lin, 50% soft polyurethane acrylate, 36% hard polyurethane acrylate,
0.1% double bond containing reactive siloxane is uniformly mixed, and sequentially adds the ultraviolet photolytic activity light that mass ratio is 3.1% while stirring
Initiator；
(2) base material is dusted, then carries out sided corona treatment, then base material is heated and is plated；
(3) coating substrate on step (2) processed base material, then be uniformly mixed step (1) by the coating of dimple precision
Coating is coated on substrate upper layer；
(4) base material after being coated with step (3) is dried in floated baking oven, and drying temperature is 40 DEG C, is then carried out again oxygen barrier
Ultra-violet curing obtains bloom scratch resistance facial mask.
Embodiment 3
A kind of resistance to knifing of bloom, is followed successively by nano coating, water-based ink layer, PVC printing primers, aqueous gum layer from top to bottom,
Bloom scratch resistance facial mask is equipped between the nano coating and water-based ink layer；The bloom scratch resistance facial mask using slide as base material,
Substrate surface sequentially consists of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：17.5%
Acryloyl Ma Lin, 20% soft polyurethane acrylate, 60% hard polyurethane acrylate, 2% ultraviolet photolytic activity are light-initiated
Agent, 0.5% double bond containing reactive siloxane.
A kind of preparation method of bloom scratch resistance facial mask, includes the following steps：
(1) take mass ratio be 17.5% acryloyl Ma Lin, 20% soft polyurethane acrylate, 60% hard polyurethane acrylic acid
Fat, 0.5% double bond containing reactive siloxane be uniformly mixed, sequentially add while stirring mass ratio be 2% ultraviolet photolytic activity
Photoinitiator；
(2) base material is dusted, then carries out sided corona treatment, then base material is heated and is plated；
(3) coating substrate on step (2) processed base material, then be uniformly mixed step (1) by the coating of dimple precision
Coating is coated on substrate upper layer；
(4) base material after being coated with step (3) is dried in floated baking oven, and drying temperature is 50 DEG C, is then carried out again oxygen barrier
Ultra-violet curing obtains bloom scratch resistance facial mask.
Embodiment 4
A kind of resistance to knifing of bloom, is followed successively by nano coating, water-based ink layer, PVC printing primers, aqueous gum layer from top to bottom,
Bloom scratch resistance facial mask is equipped between the nano coating and water-based ink layer；The bloom scratch resistance facial mask using slide as base material,
Substrate surface sequentially consists of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：The 1 of 14%,
6- ethylene glycol diacrylates fat, 50% soft polyurethane acrylate, 30% hard polyurethane acrylate, 5% ultraviolet photolytic activity
Photoinitiator, 1% double bond containing reactive siloxane.
A kind of preparation method of bloom scratch resistance facial mask, includes the following steps：
(1) take mass ratio be 14% 1,6- ethylene glycol diacrylates fat, 50% soft polyurethane acrylate, 30% hard poly- ammonia
Fat acrylate, 1% double bond containing reactive siloxane be uniformly mixed, sequentially add while stirring mass ratio be 5% it is ultraviolet
Photolytic activity photoinitiator；
(2) base material is dusted, then carries out sided corona treatment, then base material is heated and is plated；
(3) coating substrate on step (2) processed base material, then be uniformly mixed step (1) by the coating of dimple precision
Coating is coated on substrate upper layer；
(4) base material after being coated with step (3) is dried in floated baking oven, and drying temperature is 60 DEG C, is then carried out again oxygen barrier
Ultra-violet curing obtains bloom scratch resistance facial mask.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art
For, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also considered as
Protection scope of the present invention.
Claims (5)
1. a kind of resistance to knifing of bloom, which is characterized in that be followed successively by nano coating, water-based ink layer, PVC printings bottom from top to bottom
Film, aqueous gum layer, which is characterized in that bloom scratch resistance facial mask is equipped between the nano coating and water-based ink layer.
2. the resistance to knifing of bloom according to claim 1, which is characterized in that the bloom scratch resistance facial mask is using slide as base
Material, substrate surface sequentially consist of adhesive layer, hyaline layer；The transparent coating includes following components mass ratio：10%-
The levelling of 30% reactive diluent, the soft component of 20%-50%, the hard component of 30%-60%, the photoinitiator of 2%-5%, 0.1%-1%
Agent.
3. the resistance to knifing of bloom according to claim 2, which is characterized in that the soft component is soft polyurethane acrylate,
Described hard group is divided into hard polyurethane acrylate, and the photoinitiator is ultraviolet light active photoinitiators, and the levelling agent is anti-
Answering property siloxanes, the reactive diluent are 1,6- ethylene glycol diacrylate fat or acryloyl Ma Lin.
4. the resistance to knifing of bloom according to claim 3, which is characterized in that the levelling agent is double bond containing reactive silica
Alkane.
5. a kind of preparation method of bloom scratch resistance facial mask, which is characterized in that include the following steps：
(1) it is soft component, the hard component of 30%-60%, the reactive diluent of 10%-30%, the 0.1%-1% of 20%-50% to take mass ratio
Levelling agent be uniformly mixed, sequentially add while stirring mass ratio be 2%-5% photoinitiator；
(2) base material is dusted, then carries out sided corona treatment, then base material is heated and is plated；
(3) coating substrate on step (2) processed base material, then be uniformly mixed step (1) by the coating of dimple precision
Coating is coated on substrate upper layer；
(4) base material after being coated with step (3) is dried in floated baking oven, and drying temperature is 40 DEG C -70 DEG C, is then carried out again
Oxygen barrier ultra-violet curing obtains bloom scratch resistance facial mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810613298.1A CN108485554A (en) | 2018-06-14 | 2018-06-14 | A kind of preparation method of the resistance to knifing of bloom and its facial mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810613298.1A CN108485554A (en) | 2018-06-14 | 2018-06-14 | A kind of preparation method of the resistance to knifing of bloom and its facial mask |
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| Publication Number | Publication Date |
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| CN108485554A true CN108485554A (en) | 2018-09-04 |
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| CN201810613298.1A Pending CN108485554A (en) | 2018-06-14 | 2018-06-14 | A kind of preparation method of the resistance to knifing of bloom and its facial mask |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111559149A (en) * | 2020-05-19 | 2020-08-21 | 无锡特丽斯新材料科技有限公司 | Polyvinyl chloride decorative film and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204725966U (en) * | 2015-05-13 | 2015-10-28 | 杭州谦欣塑胶科技有限公司 | Environment-friendly weather-resistant decorative film for steel plate |
| CN205853507U (en) * | 2016-05-26 | 2017-01-04 | 佛山美林数码影像材料有限公司 | A kind of brilliant steel membrane |
| CN107987719A (en) * | 2017-12-13 | 2018-05-04 | 无锡特丽斯新材料科技有限公司 | A kind of scratch resistance polyurethane acrylic acid paint and preparation method thereof |
-
2018
- 2018-06-14 CN CN201810613298.1A patent/CN108485554A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN204725966U (en) * | 2015-05-13 | 2015-10-28 | 杭州谦欣塑胶科技有限公司 | Environment-friendly weather-resistant decorative film for steel plate |
| CN205853507U (en) * | 2016-05-26 | 2017-01-04 | 佛山美林数码影像材料有限公司 | A kind of brilliant steel membrane |
| CN107987719A (en) * | 2017-12-13 | 2018-05-04 | 无锡特丽斯新材料科技有限公司 | A kind of scratch resistance polyurethane acrylic acid paint and preparation method thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111559149A (en) * | 2020-05-19 | 2020-08-21 | 无锡特丽斯新材料科技有限公司 | Polyvinyl chloride decorative film and preparation method thereof |
| CN111559149B (en) * | 2020-05-19 | 2022-04-12 | 无锡特丽斯新材料科技有限公司 | Polyvinyl chloride decorative film and preparation method thereof |
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Application publication date: 20180904 |