CN108469643A - A kind of adjustment method of plane holographic grating scanning-exposure apparatus - Google Patents
A kind of adjustment method of plane holographic grating scanning-exposure apparatus Download PDFInfo
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- CN108469643A CN108469643A CN201810132412.9A CN201810132412A CN108469643A CN 108469643 A CN108469643 A CN 108469643A CN 201810132412 A CN201810132412 A CN 201810132412A CN 108469643 A CN108469643 A CN 108469643A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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Abstract
The invention discloses a kind of adjustment methods of plane holographic grating scanning-exposure apparatus, convenient for the debugging of device is rapidly completed, shorten the testing time, the scan exposure of plane holographic grating can be carried out using grade interference pattern, it avoids in conventional planar holographic grating exposure device, influence of the flaw to preparing grating on optical elements of large caliber, and homogenizing can be scanned to the disturbance in exposure process, system composition is relatively simple, cost is relatively low, relatively low to environmental requirement.
Description
Technical field
The present invention relates to holographic grating making field, more particularly to a kind of debugging of plane holographic grating scanning-exposure apparatus
Method.
Background technology
Exposure process is one of process procedure mostly important during holographic grating making.It is complete in traditional Static planar
It ceases in grating exposure method, the optical element of exposure device is fixed on static optical table, to ensure that grating substrate is effective
The size of the exposure of area, interference field need to be more than grating substrate size.It therefore will packet in Static planar holographic grating exposure system
Containing bigbore collimation lens or Lloyd's mirror, the flaw on optical elements of large caliber will be directly recorded on grating substrate.And it is outer
Portion's environmental change will influence the exposure contrast of static holographic grating exposure device.
Massachusetts Institute Technology it is proposed that grade bore scanning interferometer field exposure method, osculum is used in this method
The optical element of diameter effectively prevents the flaw of optical elements of large caliber.And in scanning process, caused by external environment
Fringe phase changes, and can be effectively homogenized during scanning motion.This method is measured using heterodyne phase, by two maintenance and operations
Dynamic workbench carrying grating substrate carries out two dimensional motion, and the accurate measurement of worktable displacement is carried out by laser interferometer, realizes anti-
Feedback control, but system composition is complicated, it is with high costs, and requirement of the use of interferometer to environmental Kuznets Curves is very high.
Invention content
In view of this, an embodiment of the present invention provides a kind of adjustment methods of plane holographic grating scanning-exposure apparatus.
The present invention provides a kind of adjustment method of plane holographic grating scanning-exposure apparatus, the plane holographic grating scanning
Exposure device include light source laser, colimated light system, beam splitter prism, the first plane mirror, second plane mirror, light splitting piece,
Angle mirror, piezoelectric ceramics, third plane mirror, X are to motion workbench, Y-direction motion workbench, controller, the light source laser
After colimated light system, the plane wave of millimeter magnitude diameter is formed, it is relevant to form first after beam splitter prism beam splitting for plane wave
Light beam and the second coherent beam, the first coherent beam after the first plane mirror, second plane mirror, after light splitting piece,
It is used to form interference pattern, for the second coherent beam after angle mirror, third plane mirror, two beam coherent beams form grade
The interference pattern of diameter, beam splitter prism, the first plane mirror, second plane mirror, light splitting piece, piezoelectric ceramics, third are flat
Face speculum is fixed on X on motion workbench, and controller drives piezoelectric ceramics to drive angle mirror along the direction parallel with incident light
Movement, X drive the step motion of interference pattern in X direction, Y-direction motion workbench back and forth to be swept along Y-direction realization to motion workbench
Movement is retouched, the light intensity for adjusting first coherent beam and second coherent beam is equal, adjusts in the interference pattern
Interference fringe direction is parallel with the direction of motion of Y-direction motion workbench, adjusts the direction of motion of the angle mirror until described
The debugging that phase change then completes plane holographic grating scanning-exposure apparatus only occurs for Moire fringe.
Optionally, the movement in the interference fringe direction and the Y-direction motion workbench in the adjustment interference pattern
Direction is parallel, including：
A benchmark grating is placed in interference field areas, it is the period of benchmark grating and the cycle phase of interference fringe etc., described dry
It relates to pattern to interact with benchmark grating, the reflected light of the first-order diffraction light and the second coherent beam of the first coherent beam is passed through
Light splitting piece forms Moire fringe, places receiving screen in Moire fringe region, receiving screen is fixed on X on motion workbench 14, makes
It obtains Y-direction motion workbench and drives the movement of benchmark grating, the phase change of Moire fringe is shown by receiving screen, if Moire fringe phase
Position, which changes, adjusts interference fringe direction, until Moire fringe phase does not change when the movement of Y-direction motion workbench, does
It is parallel with the Y-direction motion workbench direction of motion to relate to stripe direction.
Optionally, phase change only occurs until the Moire fringe for the direction of motion of the adjustment angle mirror, including：
It drives angle mirror to move using controller driving piezoelectric ceramics, Moire fringe phase change is shown according to receiving screen, if
The Moire fringe period changes, and adjusts piezoelectric ceramics and angle mirror direction, and readjusts rear end light path until More's item
Phase change only occurs for line.
Optionally, the period D=d of the Moire fringe0d1/|d0-d1|, wherein d0And d1Respectively benchmark grating and interference
The period of striped, d0And d1It numerically approaches, keeps D values larger, observable Moire fringe could be formed.
Optionally, the plane wave uses the plane wave of grade diameter.
Optionally, the colimated light system includes spatial filter and collimation lens, and the collimation lens is using quartzy material
Expect convex lens, the spatial filter includes microcobjective and pin hole.
Optionally, the stroke of the piezoelectric ceramics is more than ± λ/2, wherein λ is the wavelength of the light source laser.
Optionally, the photodetector uses photomultiplier.
Optionally, first plane mirror, the second plane mirror, the third plane mirror are all made of
Substrate of glass aluminum reflector.
Optionally, the X uses the precision one-dimensional workbench for meeting vertical raster groove directional run to motion workbench,
The Y-direction motion workbench is using the precision one-dimensional workbench for meeting grating line directional run.
As can be seen from the above technical solutions, the embodiment of the present invention has the following advantages：
An embodiment of the present invention provides a kind of adjustment methods of plane holographic grating scanning-exposure apparatus, convenient for being rapidly completed
The testing time is shortened in the debugging of device, and the scan exposure of plane holographic grating can be carried out using grade interference pattern, is avoided
In conventional planar holographic grating exposure device, influence of the flaw to preparing grating on optical elements of large caliber, and can be right
Disturbance in exposure process is scanned homogenizing, and system composition is relatively simple, cost is relatively low, relatively low to environmental requirement.
Description of the drawings
Fig. 1 is the plane holographic grating scanning-exposure apparatus involved in the present invention.
Fig. 2 is the plane holographic grating scanning-exposure apparatus adjustment schematic diagram involved in the present invention.
Fig. 3 is the plane complete set raster scan exposure process schematic involved in the present invention.
Specific implementation mode
In order to enable those skilled in the art to better understand the solution of the present invention, below in conjunction in the embodiment of the present invention
Attached drawing, technical scheme in the embodiment of the invention is clearly and completely described, it is clear that described embodiment is only
The embodiment of a part of the invention, instead of all the embodiments.Based on the embodiments of the present invention, ordinary skill people
The every other embodiment that member is obtained without making creative work should all belong to the model that the present invention protects
It encloses.
Term " first ", " second ", " third " in description and claims of this specification and above-mentioned attached drawing, "
The (if present)s such as four " are for distinguishing similar object, without being used to describe specific sequence or precedence.It should manage
The data that solution uses in this way can be interchanged in the appropriate case, so that the embodiments described herein can be in addition to illustrating herein
Or the sequence other than the content of description is implemented.In addition, term " comprising " and " having " and their any deformation, it is intended that
Cover it is non-exclusive include, for example, containing the process of series of steps or unit, method, system, product or equipment need not limit
In those of clearly listing step or unit, but may include not listing clearly or for these processes, method, production
The intrinsic other steps of product or equipment or unit.
The present invention provides a kind of adjustment method of plane holographic grating scanning-exposure apparatus, the plane holographic grating scanning
Exposure device include light source laser, colimated light system, beam splitter prism, the first plane mirror, second plane mirror, light splitting piece,
Angle mirror, piezoelectric ceramics, third plane mirror, X are to motion workbench, Y-direction motion workbench, controller, the light source laser
After colimated light system, the plane wave of millimeter magnitude diameter is formed, it is relevant to form first after beam splitter prism beam splitting for plane wave
Light beam and the second coherent beam, the first coherent beam after the first plane mirror, second plane mirror, after light splitting piece,
It is used to form interference pattern, for the second coherent beam after angle mirror, third plane mirror, two beam coherent beams form grade
The interference pattern of diameter, beam splitter prism, the first plane mirror, second plane mirror, light splitting piece, piezoelectric ceramics, third are flat
Face speculum is fixed on X on motion workbench, and controller drives piezoelectric ceramics to drive angle mirror along the direction parallel with incident light
Movement, X drive the step motion of interference pattern in X direction, Y-direction motion workbench back and forth to be swept along Y-direction realization to motion workbench
Movement is retouched, the light intensity for adjusting first coherent beam and second coherent beam is equal, adjusts in the interference pattern
Interference fringe direction is parallel with the direction of motion of Y-direction motion workbench, adjusts the direction of motion of the angle mirror until described
The debugging that phase change then completes plane holographic grating scanning-exposure apparatus only occurs for Moire fringe.
Optionally, the movement in the interference fringe direction and the Y-direction motion workbench in the adjustment interference pattern
Direction is parallel, including：
A benchmark grating is placed in interference field areas, it is the period of benchmark grating and the cycle phase of interference fringe etc., described dry
It relates to pattern to interact with benchmark grating, the reflected light of the first-order diffraction light and the second coherent beam of the first coherent beam is passed through
Light splitting piece forms period larger Observable Moire fringe, places receiving screen in Moire fringe region, receiving screen is fixed on X to fortune
On dynamic workbench 14 so that Y-direction motion workbench drives the movement of benchmark grating, shows that the phase of Moire fringe becomes by receiving screen
Change, the adjustment interference fringe direction if Moire fringe phase changes, until Moire fringe phase when the movement of Y-direction motion workbench
The then interference fringe direction that do not change is parallel with the Y-direction motion workbench direction of motion.
Optionally, phase change only occurs until the Moire fringe for the direction of motion of the adjustment angle mirror, including：
It drives angle mirror to move using controller driving piezoelectric ceramics, Moire fringe phase change is shown according to receiving screen, if
The Moire fringe period changes, and adjusts piezoelectric ceramics and angle mirror direction, and readjusts rear end light path until More's item
Phase change only occurs for line.
Optionally, the period D=d of the Moire fringe0d1/|d0-d1|, wherein d0And d1Respectively benchmark grating and interference
The period of striped, d0And d1It numerically approaches, keeps D values larger, observable Moire fringe could be formed.
Optionally, the plane wave uses the plane wave of grade diameter.
Optionally, the colimated light system includes spatial filter and collimation lens, and the collimation lens is using quartzy material
Expect convex lens, the spatial filter includes microcobjective and pin hole.
Present invention structure as shown in Figure 1 is implemented, and wherein light source laser 1 is by meeting swashing for exposure wavelength and coherence requirement
Light device generates, and selects Kr+ lasers, wavelength 413.1nm here.2 inside of colimated light system includes spatial filter and collimation
Lens, spatial filter include microcobjective and pin hole, and collimation lens is selected quartz material convex lens, do not limited this.
In the present embodiment, the first plane mirror 6, second plane mirror 7, third plane mirror 11 are substrate of glass
Aluminum reflector does not limit this.
In the present embodiment, X to motion workbench 12 be the precision one-dimensional workbench for meeting vertical raster groove directional run,
Y-direction motion workbench 14 is the precision one-dimensional workbench for meeting grating line directional run, is not limited this.
In the present embodiment, photodetector 18 selects photomultiplier, and photomultiplier is to be converted into faint optical signal
The vacuum electron device of electric signal does not limit this with realizing the measurement of faint energy Moire fringe.
In the present embodiment, 10 stroke of piezoelectric ceramics is more than ± λ/2, and λ is laser wavelength, i.e. the interference with minimum ± π
Fringe phase adjusting range selects the integrated piezoelectric driving linear stage XP-620.12K of core scientific ＆ technical corporation's tomorrow herein, right
This is not limited.
In the present embodiment, grating substrate 13 uses K9 optical glass or material requested substrate, the light applied on grating substrate
Resist is caused, is herein 1805 positive light anti-etching agents of Japanese Shipley, this is not limited.
In the present embodiment, analog controller or the digitial controller with modulus and digital-to-analogue conversion can be selected in controller, interior
Portion carries out feedback control using control algolithms such as PID or lead-lags, does not limit this.
It should be noted that those of ordinary skill in the art are also an option that other devices met the requirements, this is not done
It limits.
When carrying out the work of plane holographic grating scan exposure, it may comprise steps of：
As shown in Figure 1, Step 1: building a kind of plane holographic grating scanning-exposure apparatus, which includes light source laser
1, colimated light system 2, beam splitter prism 4, the first plane mirror 6, second plane mirror 7, light splitting piece 8, angle mirror 10, piezoelectric ceramics
11, third plane mirror 12, X are to motion workbench 14, Y-direction motion workbench 15, controller 16.
Light source laser 1 forms the plane wave 3 of millimeter magnitude diameter after colimated light system 2, and plane wave 3 passes through beam splitting rib
After 4 beam splitting of mirror, the first coherent beam 5 of formation and the second coherent beam 9, the first plane mirror 6 of the first coherent beam 5 process,
After second plane mirror 7, after light splitting piece 8, it is used to form interference pattern 13.Second coherent beam 9 is flat by angle mirror 10, third
After face speculum 12, two beam coherent beams form the interference pattern 13 of grade diameter, beam splitter prism 4, the first plane mirror
6, second plane mirror 7, light splitting piece 8, piezoelectric ceramics 11, third plane mirror 12 are fixed on X on motion workbench 12.
Piezoelectric ceramics 11 connects angle mirror 10 by modes such as flexible hinges so that angle mirror 10 can be transported along the direction parallel with incident light
It is dynamic.X can drive optical element to motion workbench 14, realize the step motion of interference pattern 13 in X direction.Y-direction moves work
Platform can realize that shuttle-scanning moves along Y-direction.With preparation controller 16, controller 16 can drive piezoelectric ceramics 10 to move.
Step 2: carrying out accurate adjustment to the plane holographic grating scanning-exposure apparatus built.
First, in the light path of the first coherent beam 5, by light splitting piece 8, therefore, in order to ensure that exposure contrast, should utilize
Power meter measures the light intensity of the first coherent beam 5 and the second coherent beam 9 at interference field, keeps the two equal as possible, can improve
Expose contrast.
As shown in Fig. 2, secondly, adjusting interference fringe direction and 15 direction of motion of Y-direction motion workbench in interference pattern 13
It is parallel, a benchmark grating 17 is placed in interference field areas at this time, benchmark screen periods are equal with fringe period, interfere at this time
Pattern 13 interacts with benchmark grating 17, the reflected light of the first-order diffraction light of the first coherent beam 5 and the second coherent beam 9,
Moire fringe 18 is formed by light splitting piece 8, places receiving screen 19 in Moire fringe region, receiving screen 19 is fixed on X to movement work
Make on platform 14, is not moved with Y-direction motion workbench 15.At this point, making Y-direction motion workbench 15 that benchmark grating 17 be driven to move, lead to
The phase change for visually observing Moire fringe 18 on receiving screen 19 is crossed, receiving screen 19 can be replaced with photodetector, and photoelectricity is visited
The phase change that the voltage signal variation of survey device represents Moire fringe passes through optical system if 18 phase of Moire fringe changes
System adjustment interference fringe direction, until when Y-direction motion workbench 15 moves, 18 phase of Moire fringe does not change.It does at this time
It is parallel with the Y-direction motion workbench direction of motion to relate to stripe direction.
There is the angular movement deviation around z-axis to motion workbench 14 in X, but when the angular movement deviation is smaller, to exposing
The influence of optical contrast ratio can be ignored.
Again, 10 direction of motion of angle mirror is adjusted.Method of adjustment as shown in Fig. 2, using controller 16 drive piezoelectric ceramics 11,
So that angle mirror 10 is slowly moved, observes the Moire fringe 18 of receiving screen 19 at this time.If 18 period of Moire fringe changes, adjustment pressure
10 direction of electroceramics 11 and angle mirror, and readjust rear end light path.If phase change only occurs for Moire fringe 18, angle mirror 10 is completed
The adjustment of the direction of motion.
Step 3: carrying out the exposure of grating substrate using plane holographic grating scanning-exposure apparatus.
Technology is realized as shown in figure 3, the grating substrate 20 for being coated with photoresist is placed on Y-direction motion workbench 15.It exposes
In photoreduction process, X drives interference pattern 13 to realize that step motion, Y-direction motion workbench 15 drive grating base to motion workbench 14
Back and forth realize scanning motion in bottom 20.X is exposed in scanning at this time to the radius that 14 step-wise displacement of motion workbench is about interference pattern 13
In photoreduction process, there are Chong Die, the first coherent lights between present scan interference pattern 13 and the sub-image grating 21 of scanned formation
Beam 5 forms More's item by the reflected light of first-order diffraction light and the second coherent beam 9 that sub-image grating is formed after light splitting piece 8
Line, the Moire fringe are received by highly sensitive photodetector 22.Highly sensitive photodetector 22 is fixed on X to movement work
On platform, light intensity is changed into input controller 16, controller 16 drives piezoelectric ceramics 11, adjusts the displacement of angle mirror 10, overlapping is made to sweep
Retouch the interference fringe phase matched in region.X completes monoblock grating base to motion workbench and Y-direction motion workbench alternating movement
The exposure at bottom.
Operation principle explanation of the present invention：This method is divided into three steps, in the first step, using colimated light system by light source laser
Collimation is the plane wave of grade bore, and the interference pattern for dividing amplitude type exposure light path to form grade bore by rear end is used for
Exposure.The angle mirror that wherein side coherent beam is driven by one by piezoelectric ceramics interferes item by adjusting the adjustment of displacement of angle mirror
The phase of line.Optical element is placed on X-direction motion workbench, and for realizing the step motion of low speed, Y-direction moves work
Platform is used to carry the scanning motion that grating substrate realizes high speed.
In second step, adjusting coherent beam energy is equal, is to improve exposure contrast.It is placed in interference pattern position
One benchmark grating, benchmark grating have the period equal with interference fringe, and benchmark grating interacts with interference pattern at this time, will
Form Moire fringe.The variation of raster phase and interference fringe phase difference value on the basis of the phase change of Moire fringe.For adjustment
Interference fringe direction is parallel with the direction of motion of Y-direction motion workbench, the phase change of observable Moire fringe.If interference fringe
There are angles with Y-direction working table movement direction in direction, during working table movement, the phase difference of interference fringe and benchmark grating
It will change, i.e., phase shift will occur for Moire fringe, using the method, change interference fringe side by adjusting optical system
To until the two is parallel.To adjust the direction of motion of angle mirror, also using the method for observation Moire fringe, the period D of Moire fringe
=d0d1/|d0-d1|, wherein d0And d1The respectively period of benchmark grating and interference fringe.In the feelings that benchmark screen periods are constant
Under condition, D is related to fringe period, i.e., the angle change of coherent beam is related.If angle mirror is not parallel with incident light, exist at this time
When angle mirror moves, the angle of side coherent beam can be changed, the period of Moire fringe is made to change.Utilize the method adjusting angle
The direction of motion of mirror only changes Moire fringe phase until when angle mirror movement.
In third step, in building with after accurate adjustment for completion plane holographic scanning-exposure apparatus, in exposure process, it is
Ensure the matching of interference fringe phase in adjacent scanning process twice.Utilize the sub-image grating of exposed formation, interference pattern
Sample forms sub-image optical grating Moire fringe with sub-image overlap of grating part, and the variation of sub-image raster phase is interference fringe and sub-image grating
The variation of phase difference detects sub-image optical grating Moire fringe phase change using highly-sensitive detector, and controller is by adjusting angle
Mirror displacement adjusts interference fringe phase, keeps detector signal constant, you can ensure the phase matching relationship of adjacent Scanning Section.
An embodiment of the present invention provides a kind of adjustment methods of plane holographic grating scanning-exposure apparatus, convenient for being rapidly completed
The testing time is shortened in the debugging of device, and the scan exposure of plane holographic grating can be carried out using grade interference pattern, is avoided
In conventional planar holographic grating exposure device, influence of the flaw to preparing grating on optical elements of large caliber, and can be right
Disturbance in exposure process is scanned homogenizing, and system composition is relatively simple, cost is relatively low, relatively low to environmental requirement.
It is apparent to those skilled in the art that for convenience and simplicity of description, the system of foregoing description,
The specific work process of device and unit, can refer to corresponding processes in the foregoing method embodiment, and details are not described herein.
In several embodiments provided herein, it should be understood that disclosed system, device and method can be with
It realizes by another way.For example, the apparatus embodiments described above are merely exemplary, for example, the unit
It divides, only a kind of division of logic function, formula that in actual implementation, there may be another division manner, such as multiple units or component
It can be combined or can be integrated into another system, or some features can be ignored or not executed.Another point, it is shown or
The mutual coupling, direct-coupling or communication connection discussed can be the indirect coupling by some interfaces, device or unit
It closes or communicates to connect, can be electrical, machinery or other forms.
The unit illustrated as separating component may or may not be physically separated, aobvious as unit
The component shown may or may not be physical unit, you can be located at a place, or may be distributed over multiple
In network element.Some or all of unit therein can be selected according to the actual needs to realize the mesh of this embodiment scheme
's.
In addition, each functional unit in each embodiment of the present invention can be integrated in a processing unit, it can also
It is that each unit physically exists alone, it can also be during two or more units be integrated in one unit.Above-mentioned integrated list
The form that hardware had both may be used in member is realized, can also be realized in the form of SFU software functional unit.
One of ordinary skill in the art will appreciate that all or part of step in the various methods of above-described embodiment is can
It is completed with instructing relevant hardware by program, which can be stored in a computer readable storage medium, storage
Medium may include：Read-only memory (ROM, Read Only Memory), random access memory (RAM, Random
Access Memory), disk or CD etc..
A kind of adjustment method of plane holographic grating scanning-exposure apparatus provided by the present invention has been carried out in detail above
It introduces, for those of ordinary skill in the art, the thought of embodiment according to the present invention, in specific implementation mode and application range
Upper there will be changes, in conclusion the content of the present specification should not be construed as limiting the invention.
Claims (10)
1. a kind of adjustment method of plane holographic grating scanning-exposure apparatus, which is characterized in that the plane holographic grating scanning
Exposure device include light source laser, colimated light system, beam splitter prism, the first plane mirror, second plane mirror, light splitting piece,
Angle mirror, piezoelectric ceramics, third plane mirror, X are to motion workbench, Y-direction motion workbench, controller, the light source laser
After colimated light system, the plane wave of millimeter magnitude diameter is formed, it is relevant to form first after beam splitter prism beam splitting for plane wave
Light beam and the second coherent beam, the first coherent beam after the first plane mirror, second plane mirror, after light splitting piece,
It is used to form interference pattern, for the second coherent beam after angle mirror, third plane mirror, two beam coherent beams form grade
The interference pattern of diameter, beam splitter prism, the first plane mirror, second plane mirror, light splitting piece, piezoelectric ceramics, third are flat
Face speculum is fixed on X on motion workbench, and controller drives piezoelectric ceramics to drive angle mirror along the direction parallel with incident light
Movement, X drive the step motion of interference pattern in X direction, Y-direction motion workbench back and forth to be swept along Y-direction realization to motion workbench
Movement is retouched, the light intensity for adjusting first coherent beam and second coherent beam is equal, adjusts in the interference pattern
Interference fringe direction is parallel with the direction of motion of Y-direction motion workbench, adjusts the direction of motion of the angle mirror until described
The debugging that phase change then completes plane holographic grating scanning-exposure apparatus only occurs for Moire fringe.
2. according to the method described in claim 1, it is characterized in that, the interference fringe direction adjusted in the interference pattern
It is parallel with the direction of motion of Y-direction motion workbench, including：
A benchmark grating, the period of the benchmark grating and the cycle phase etc. of the interference fringe, institute are placed in interference field areas
It states interference pattern to interact with benchmark grating, the first-order diffraction light of the first coherent beam and the reflected light of the second coherent beam pass through
It crosses light splitting piece and forms observable Moire fringe, place receiving screen in Moire fringe region, receiving screen is fixed on X to movement work
On platform 14 so that Y-direction motion workbench drives the movement of benchmark grating, and the phase change of Moire fringe is shown by receiving screen, if
Moire fringe phase, which changes, adjusts interference fringe direction, until Moire fringe phase is not sent out when the movement of Y-direction motion workbench
Then interference fringe direction is parallel with the Y-direction motion workbench direction of motion for changing.
3. according to the method described in claim 1, it is characterized in that, the direction of motion of the adjustment angle mirror until it is described not
Phase change only occurs by striped in you, including：
It drives angle mirror to move using controller driving piezoelectric ceramics, Moire fringe phase change is shown according to receiving screen, if More
Fringe period changes, and adjusts piezoelectric ceramics and angle mirror direction, and readjust rear end light path until the Moire fringe only
Phase change occurs.
4. according to the method described in claim 3, it is characterized in that, the period D=d of the Moire fringe0d1/|d0-d1|, wherein
d0And d1The respectively period of benchmark grating and interference fringe, d0And d1It is numerically close to keep D values larger, it is observable to be formed
Moire fringe.
5. according to the method described in claim 1, it is characterized in that, the plane wave uses the plane wave of grade diameter.
6. according to the method described in claim 1, it is characterized in that, the colimated light system includes that spatial filter and collimation are saturating
Mirror, the collimation lens use quartz material convex lens, and the spatial filter includes microcobjective and pin hole.
7. according to the method described in claim 1, it is characterized in that, the stroke of the piezoelectric ceramics is more than ± λ/2, wherein λ is
The wavelength of the light source laser.
8. according to the method described in claim 1, it is characterized in that, the photodetector uses photomultiplier.
9. according to the method described in claim 1, it is characterized in that, first plane mirror, second plane reflection
Mirror, the third plane mirror are all made of substrate of glass aluminum reflector.
10. according to the method described in claim 1, it is characterized in that, the X is carved to motion workbench using vertical raster is met
The precision one-dimensional workbench of line directional run, the Y-direction motion workbench is using the precision one for meeting grating line directional run
Tie up workbench.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810132412.9A CN108469643B (en) | 2018-02-09 | 2018-02-09 | Debugging method of planar holographic grating scanning exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810132412.9A CN108469643B (en) | 2018-02-09 | 2018-02-09 | Debugging method of planar holographic grating scanning exposure device |
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| Publication Number | Publication Date |
|---|---|
| CN108469643A true CN108469643A (en) | 2018-08-31 |
| CN108469643B CN108469643B (en) | 2019-12-27 |
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| CN201810132412.9A Active CN108469643B (en) | 2018-02-09 | 2018-02-09 | Debugging method of planar holographic grating scanning exposure device |
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| US12038690B2 (en) | 2019-10-31 | 2024-07-16 | Tsinghua University | Laser interference photolithography system |
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| CN108469643B (en) | 2019-12-27 |
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