CN108441826B - Enhanced arc source, and arc current excited gas ion source, metal ion source and electron source - Google Patents
Enhanced arc source, and arc current excited gas ion source, metal ion source and electron source Download PDFInfo
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- CN108441826B CN108441826B CN201810162922.0A CN201810162922A CN108441826B CN 108441826 B CN108441826 B CN 108441826B CN 201810162922 A CN201810162922 A CN 201810162922A CN 108441826 B CN108441826 B CN 108441826B
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Abstract
The invention discloses an enhanced arc source, and a gas ion source, a metal ion source and an electron source excited by arc current, which mainly comprise the following technical scheme: the outer cylinder is provided with an air inlet, and the outer cylinder is relatively provided with a plurality of external magnets on the outer wall of the area between the anode and the cathode metal arc targets. According to the invention, particle output can be selectively carried out through the baffle mechanism, the free path of electrons is improved by utilizing the interaction of the anode and the magnetic field, so that more collisions can be generated between the anode and working gas and metal atoms, further the ionization efficiency and the ion yield are improved, and the required particles are led out, so that the effect of high-efficiency ionization is achieved.
Description
Technical Field
The invention belongs to the field of surface protection coating equipment, and particularly relates to an enhanced arc source, a gas ion source excited by arc current, a metal ion source and an electron source.
Background
The surface protection coating technology is an important way for improving the quality and the service life of tools and molds and mechanical parts, and is one of the material surface protection technology, and the ion coating technology has the advantages of simple structure, high ionization rate and high incident particle energy, so that ceramic coatings and composite coatings with high hardness and high wear resistance which are difficult to obtain by other methods can be easily obtained, and the service life can be doubled when the ion coating technology is applied to the tools and the molds, and the effects of low cost and high income are better realized; in addition, the ion plating coating technology has the characteristics of low temperature and high energy, can be used for forming a film on any substrate, has a very wide application range, and shows great economic benefit and industrial application prospect.
The ion plating arc source is the source of arc plasma discharge and is a core component of ion plating technology. The metal arc target adopted by the ion plating arc source is used as a cathode to generate electrons, metal ions and metal atomic groups in the discharging process, wherein the electrons interact with the working gas in the emergent composition, so that the working gas is ionized, and gas ions are generated. In the prior art, the traditional ion plating arc source has single structural design, and electrons, gas ions, metal ions and metal atomic groups cannot be controllably selected according to application purposes (such as cleaning a workpiece, auxiliary deposition, plasma coating and the like), so that the application value of the ion plating arc source is limited. In addition, the ionization rate of electrons generated by the conventional metal arc target in the process of ionizing the process gas is low, so that the coating quality of the coating application is affected.
Therefore, there is a need for improvements.
Disclosure of Invention
It is a first object of the present invention to overcome the disadvantages and shortcomings of the prior art by providing an enhanced arc source that enhances the efficiency of gas ionization.
A second object of the present invention is to provide a gas ion source excited by an arc current.
A third object of the present invention is to provide an arc current excited metal ion source.
A fourth object of the present invention is to provide an arc current excited electron source.
In order to achieve the first purpose of the invention, the technical scheme of the invention comprises an outer cylinder body and a cathode metal arc target arranged at one end in the outer cylinder body, wherein the other end of the outer cylinder body is provided with an exit port, the outer cylinder body is provided with an air inlet, an anode corresponding to the cathode metal arc target is arranged in the exit port, the anode is provided with a through hole for connecting the inner side and the outer side of the anode, an outer magnet is arranged on the outer wall of the outer cylinder body relative to the area between the anode and the cathode metal arc target, the magnetic force line direction of the outer magnet is parallel to the central axis direction of the outer cylinder body, and electrons or ions emitted by the cathode metal arc target are magnetically enhanced through the magnetic field of the outer magnet and are led out of the outer cylinder body through the exit port.
The anode is a conductive ring with a through hole in the center or a wire spiral forming net with a plurality of through holes.
The second object of the invention is achieved by a gas ion source excited by arc current, which comprises an outer cylinder body and a cathode metal arc target arranged at one end in the outer cylinder body, wherein the other end of the outer cylinder body is an emergent opening, an air inlet is arranged on the outer cylinder body, an anode corresponding to the cathode metal arc target is arranged in the emergent opening, through holes which are connected with the inner side and the outer side of the anode are arranged on the anode, a solid baffle is arranged between the inner side of the outer cylinder body relative to the anode and the cathode metal arc target, the solid baffle comprises an upper baffle and a lower baffle which are mutually parallel and vertical, the lower end of the upper baffle is positioned below the upper end of the lower baffle, the upper baffle and the lower baffle are mutually staggered at the end part, electrons with upper openings and lower openings are arranged at the position of the end part which are mutually staggered at intervals, the outer cylinder body is provided with an outer magnet corresponding to the outer wall of the gas ionization enhancement zone, and a magnetic field formed in the outer cylinder body is an axial magnetic field parallel to the inner cavity axis of the outer cylinder body, a circular closed wall of the outer cylinder body, a magnetic field parallel to the inner cavity wall of the outer cylinder body, a rotating magnetic field parallel to the inner cavity or a plurality of magnetic field combined in parallel or parallel inner and outer cylinder rotating magnetic cavity; the electrons are treated to gas in the gas ionization enhancement region under the action of the magnetic field of the external magnet, gas ions are generated, an extraction grid is arranged at the outer end of the external cylinder relative to the outlet, and the gas ions in the gas ionization enhancement region are extracted from the outlet by utilizing the relative negative voltage of the extraction grid.
The anode is a conductive ring with a through hole in the center or a wire spiral forming net with a plurality of through holes.
The outer magnet is composed of a multi-pole iron core framework and an enameled wire winding coil, wherein the enameled wire winding coil is wound by polyurethane enameled copper wires or aluminum wires, and the enameled wire winding coil is connected into symmetrical three-phase windings according to a dipolar magnetic field rule; the connection mode of the windings is single-layer, double-layer or single-layer and double-layer mixture, the wiring mode of the winding end adopts stacked or wave mode, and the shape of the winding end adopts chain, cross, concentric or stacked mode; the windings are excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently regulated, the intensity of the diode transverse rotating magnetic field is regulated by the voltage, and the rotating speed of the diode transverse rotating magnetic field is regulated by the current frequency.
The third object of the invention is achieved, the technical proposal is a metal ion source excited by arc current, which comprises an outer cylinder body and a cathode metal arc target arranged at one end in the outer cylinder body, the other end of the outer cylinder body is an exit, and an air inlet is arranged on the outer cylinder body, and the invention is characterized in that: an anode corresponding to the cathode metal arc target is arranged in the emission port, through holes for connecting the inner side and the outer side of the anode are formed in the anode, a baffle plate for blocking metal atomic groups emitted by the cathode metal arc target and passing electrons, metal atoms and metal ions is arranged between the anode and the cathode metal arc target in the outer cylinder, a metal atom ionization enhancement area is formed in the outer cylinder relative to the area between the anode and the baffle plate, an outer magnet is arranged on the outer wall of the outer cylinder corresponding to the metal atom ionization enhancement area, and a magnetic field formed by the outer magnet in the outer cylinder is one or a combination of an axial magnetic field parallel to the axis of the inner cavity of the outer cylinder, a circular cutting closed magnetic field parallel to the inner cavity wall of the outer cylinder, an axial closed magnetic field parallel to the inner cavity wall of the outer cylinder or a rotary parallel magnetic field parallel to the cross section of the inner cavity of the outer cylinder; the electron ionizes the metal atom in the metal atom ionization enhancement area under the action of the magnetic field of the external magnet and generates metal ions, the external cylinder is provided with an extraction grid net relative to the outer end of the emission port, and the metal ions in the metal atom ionization enhancement area are extracted from the emission port by utilizing the relative negative voltage of the extraction grid net.
The baffle is a shutter type baffle, and the size of the through hole of the shutter type baffle is set so that metal atomic groups are blocked, and electrons, metal atoms and metal ions can pass through the shutter type baffle.
The further arrangement is that: the anode is a conductive circular ring with a through hole in the center or a wire spiral forming net with a plurality of through holes.
The outer magnet is composed of a multi-pole iron core framework and an enameled wire winding coil, wherein the enameled wire winding coil is wound by polyurethane enameled copper wires or aluminum wires, and the enameled wire winding coil is connected into symmetrical three-phase windings according to a dipolar magnetic field rule; the connection mode of the windings is single-layer, double-layer or single-layer and double-layer mixture, the wiring mode of the winding end adopts stacked or wave mode, and the shape of the winding end adopts chain, cross, concentric or stacked mode; the windings are excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently regulated, the intensity of the diode transverse rotating magnetic field is regulated by the voltage, and the rotating speed of the diode transverse rotating magnetic field is regulated by the current frequency.
The fourth object of the invention is realized, the technical scheme is that the electron source excited by arc current comprises an outer cylinder and a cathode metal arc target arranged at one end in the outer cylinder, the other end of the outer cylinder is an exit port, an air inlet is arranged on the outer cylinder, an anode corresponding to the cathode metal arc target is arranged in the exit port, a through hole which is connected with the inner side and the outer side of the anode is arranged on the anode, a baffle which is used for blocking metal atomic groups emitted by the cathode metal arc target and passing electrons, metal atoms and metal ions is arranged between the outer cylinder and the cathode metal arc target, an electron enhancement region is formed in the outer cylinder relative to the area between the anode and the baffle, an outer magnet is arranged on the outer wall of the outer cylinder corresponding to the electron enhancement region, and a magnetic field formed in the outer cylinder is one or a combination of an axial magnetic field parallel to the axis of the inner cavity of the outer cylinder, an annular closed magnetic field parallel to the inner cavity wall of the outer cylinder, or a rotary parallel magnetic field parallel to the inner cavity section of the outer cylinder; the electrons ionize metal atoms in the electron enhancement region under the action of the magnetic field of the external magnet, corresponding electrons are generated in the metal ion process at the same time, the external cylinder is provided with an extraction grid net relative to the outer end of the emission port, and the electrons in the electron enhancement region are extracted from the emission port by utilizing the relative positive voltage of the extraction grid net.
The invention has the advantages that: the invention can realize the purposes of an electron source, an arc source, a gas ion source and a metal ion source by using a set of mechanism and simply changing the type of the baffle plate and the size of the filter hole, thereby matching the requirements of specific application purposes such as cleaning a workpiece, assisting deposition, plasma coating and the like.
In addition, the invention utilizes the design of various magnetic field distributions of the external magnet, and utilizes the magnetic field to improve the free range of electrons, so that more collisions can be generated with working gas and metal atoms, further the ionization efficiency and the ion yield are improved, and meanwhile, the required particles are led out through the design of the leading-out grid mesh, so that the operation is convenient.
Drawings
In order to more clearly illustrate the embodiments of the invention or the technical solutions of the prior art, the drawings which are required in the description of the embodiments or the prior art will be briefly described, it being obvious that the drawings in the description below are only some embodiments of the invention, and that it is within the scope of the invention to one skilled in the art to obtain other drawings from these drawings without inventive faculty.
FIG. 1 is a perspective view of embodiment 1 of the present invention;
FIG. 2 is a semi-cutaway perspective view of embodiment 1 of the present invention;
FIG. 3a is a schematic view of the structure of the invention using a wire spiral forming wire as an anode;
FIG. 3b is a schematic view of the structure of the invention with the wire spiral forming wire as the anode;
FIG. 4a is a diagram of an external magnet arrangement of the present invention forming an axial magnetic field parallel to the axis of the inner cavity of the outer barrel;
FIG. 4b is a diagram of an external magnet arrangement of the present invention forming a circular cut closed magnetic field parallel to the inner cavity wall of the outer cylinder;
FIG. 4c is a diagram of an external magnet arrangement of the present invention forming an axially closed magnetic field parallel to the inner cavity wall of the outer cylinder;
FIG. 4d is a diagram of an external magnet arrangement of the present invention forming a rotating parallel magnetic field parallel to the cross section of the inner cavity of the outer cylinder;
FIG. 5 is a perspective view of embodiment 2 of the present invention;
FIG. 6 is a semi-cutaway perspective view of embodiment 2 of the present invention;
FIG. 7 is a perspective view of embodiment 3 of the present invention;
fig. 8 is a semi-cutaway perspective view of embodiment 3 of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings, for the purpose of making the objects, technical solutions and advantages of the present invention more apparent.
The terms of direction and position in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "top", "bottom", "side", etc., refer only to the direction or position of the drawing. Accordingly, directional and positional terms are used to illustrate and understand the invention and are not intended to limit the scope of the invention.
Example 1
As shown in fig. 1-2, embodiment 1 of the present invention provides an enhanced arc source, which comprises an outer cylinder 1 and a cathode metal arc target 2 disposed at one end in the outer cylinder 1, wherein the other end of the outer cylinder is an exit port 11, an air inlet 12 is disposed on the outer cylinder 1, an anode 3 corresponding to the cathode metal arc target is disposed in the exit port 11, a through hole 31 connecting the inner side and the outer side of the anode is disposed on the anode 3, an outer magnet 4 is disposed on the outer wall of the outer cylinder 1 opposite to the area between the anode 3 and the cathode metal arc target 2, the magnetic force line direction of the outer magnet 4 is parallel to the central axis direction of the outer cylinder 1, and electrons or ions (ions including metal ions and gas ions generated by the electron ionization process gas) emitted by the cathode metal arc target are magnetically enhanced by the magnetic field of the outer magnet 4 and are led out of the outer cylinder 1 through the exit port 11.
The anode 3 according to the present invention is a conductive ring 3a with a through hole 31 in the center (see fig. 3 a) or a wire spiral forming wire 3b with a plurality of through holes (see fig. 3 b).
In addition, the outer magnet 4 according to the present embodiment may be arranged using a permanent magnet as shown in fig. 1, or a solenoid electromagnetic coil may be used.
Example 2
As shown in fig. 5-6, embodiment 2 provides a gas ion source excited by arc current, comprising an outer cylinder 1 and a cathode metal arc target 2 arranged at one end in the outer cylinder, wherein the other end of the outer cylinder 1 is provided with an exit port 11, an air inlet 12 is arranged on the outer cylinder, working gas or hydrocarbon gas or the like is introduced through the air inlet 12, an anode 3 corresponding to the cathode metal arc target 2 is arranged in the exit port 11, a through hole 31 connecting the inner side and the outer side of the anode is arranged on the anode 3, a physical baffle 5 is arranged between the anode and the cathode metal arc target relative to the outer cylinder 1, the physical baffle 5 comprises an upper baffle 51 and a lower baffle 52 which are mutually parallel and vertical, the lower end of the upper baffle is positioned below the upper end of the lower baffle, the two are mutually staggered at the end parts, and the two are provided with upper and lower open electron passing slits 53 at the mutually staggered position of the end parts, the region between the outer cylinder 1 relative to the anode 3 and the solid baffle 5 forms a gas ionization enhancement region 13, the outer wall of the outer cylinder 1 corresponding to the gas ionization enhancement region 13 is provided with an outer magnet 4, and the magnetic field formed by the outer magnet 4 in the outer cylinder is one or a plurality of combinations of axial magnetic fields (shown in fig. 4 a), circular cutting closing magnetic fields (shown in fig. 4 b) parallel to the inner cavity wall of the outer cylinder, axial closing magnetic fields (shown in fig. 4 c) parallel to the inner cavity wall of the outer cylinder or rotating parallel magnetic fields (shown in fig. 4 d) parallel to the cross section of the inner cavity of the outer cylinder.
The magnetic field of the outer magnet is a rotary parallel magnetic field parallel to the section of the inner cavity of the outer cylinder, the outer magnet is composed of a multi-pole iron core framework and an enameled wire winding coil, the enameled wire winding coil is wound by polyurethane enameled copper wires or aluminum wires, and the enameled wire winding coil is connected into symmetrical three-phase winding according to a dipolar magnetic field rule; the connection mode of the windings is single-layer, double-layer or single-layer and double-layer mixture, the wiring mode of the winding end adopts stacked or wave mode, and the shape of the winding end adopts chain, cross, concentric or stacked mode; the windings are excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently regulated, the intensity of the diode transverse rotating magnetic field is regulated by the voltage, and the rotating speed of the diode transverse rotating magnetic field is regulated by the current frequency. See, in particular, the inventor's prior invention patent CN102936718A.
In addition, in this embodiment, electrons ionize the working gas in the gas ionization enhancement region 13 under the action of the magnetic field of the external magnet 4, and generate gas ions, and the external end of the external cylinder 1 opposite to the outlet 11 is provided with an extraction grid 6, and the gas ions in the gas ionization enhancement region 13 are extracted from the outlet by using the relative negative voltage of the extraction grid 6.
The anode 3 according to the present invention is a conductive ring 3b with a through hole 31 in the center (see fig. 3 b) or a wire spiral forming net 3a with a plurality of through holes (see fig. 3 a).
Example 3
As shown in fig. 7-8, this embodiment provides a metal ion source excited by arc current, including an outer cylinder 1 and a cathode metal arc target 2 disposed at one end in the outer cylinder, the other end of the outer cylinder 1 is an exit port 11, an air inlet 12 is disposed on the outer cylinder, working gas (such as argon) is introduced through the air inlet 12, an anode 3 corresponding to the cathode metal arc target is disposed in the exit port 11, a through hole 31 connecting the inner side and the outer side of the anode is disposed on the anode 3, a baffle 5 for blocking metal atomic groups emitted by the cathode metal arc target 2 and passing electrons, metal atoms and metal ions is disposed between the anode 3 and the cathode metal arc target 2 in the outer cylinder 1, the baffle 5 in this embodiment is a shutter type baffle, and the through hole of the shutter type baffle is designed to block the metal atomic groups and the electrons, metal atoms and metal ions can pass through.
The outer cylinder 1 in this embodiment forms a metal atom ionization enhancement region 13 relative to the region between the anode 3 and the baffle 5, and an outer magnet 4 is disposed on the outer wall of the outer cylinder 1 corresponding to the metal atom ionization enhancement region 13, where a magnetic field formed by the outer magnet 4 in the outer cylinder is one or a combination of an axial magnetic field parallel to the axis of the inner cavity of the outer cylinder (see fig. 4 a), a circular cutting closing magnetic field parallel to the inner cavity wall of the outer cylinder (see fig. 4 b), an axial closing magnetic field parallel to the inner cavity wall of the outer cylinder (see fig. 4 b), or a rotating parallel magnetic field parallel to the cross section of the inner cavity of the outer cylinder (see fig. 4 b).
The magnetic field of the outer magnet is a rotary parallel magnetic field parallel to the section of the inner cavity of the outer cylinder, the outer magnet is composed of a multi-pole iron core framework and an enameled wire winding coil, the enameled wire winding coil is wound by polyurethane enameled copper wires or aluminum wires, and the enameled wire winding coil is connected into symmetrical three-phase winding according to a dipolar magnetic field rule; the connection mode of the windings is single-layer, double-layer or single-layer and double-layer mixture, the wiring mode of the winding end adopts stacked or wave mode, and the shape of the winding end adopts chain, cross, concentric or stacked mode; the windings are excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently regulated, the intensity of the diode transverse rotating magnetic field is regulated by the voltage, and the rotating speed of the diode transverse rotating magnetic field is regulated by the current frequency. See, in particular, the inventor's prior invention patent CN102936718A.
The electrons in this embodiment ionize metal atoms in the metal atom ionization enhancement region 13 under the action of the magnetic field of the external magnet, and generate metal ions, the outer end of the outer cylinder 1 opposite to the outlet 11 is provided with an extraction grid 6, and the metal ions in the metal atom ionization enhancement region are extracted from the outlet by using the relative negative voltage of the extraction grid 6.
The anode 3 according to the present invention is a conductive ring 3b with a through hole 31 in the center (see fig. 3 b) or a wire spiral forming net 3a with a plurality of through holes (see fig. 3 a).
Example 4
This embodiment 4 provides an electron source excited by an arc current, and this embodiment 4 is different from embodiment 3 in that: the outer end of the outer cylinder 1 opposite to the outlet 11 is provided with an extraction grid 6, and electrons in the electron enhancement region are extracted from the outlet 11 by using the relative positive voltage of the extraction grid 6. The electron enhancement region is the position of the metal atom ionization enhancement region corresponding to example 3.
The foregoing disclosure is illustrative of the present invention and is not to be construed as limiting the scope of the invention, which is defined by the appended claims.
Claims (3)
1. The utility model provides a gaseous ion source that arc current arouses, includes outer barrel and sets up in the cathode metal arc target of the internal one end of urceolus, and the other end of outer barrel is the exit, is provided with air inlet, its characterized in that on the outer barrel: the outer cylinder body is provided with an outer magnet corresponding to the outer wall of the gas ionization enhancement zone, and a magnetic field formed by the outer magnet in the outer cylinder body is one or a combination of an axial magnetic field parallel to the axis of the inner cavity of the outer cylinder body, a circular cutting closed magnetic field parallel to the wall of the inner cavity of the outer cylinder body, an axial closed magnetic field parallel to the wall of the inner cavity of the outer cylinder body or a rotating parallel magnetic field parallel to the section of the inner cavity of the outer cylinder body; the electrons are treated with gas in the gas ionization enhancement zone under the action of the magnetic field of the external magnet, gas ions are generated, an extraction pole grid is arranged at the outer end of the external cylinder relative to the outlet, and the gas ions in the gas ionization enhancement zone are extracted from the outlet by utilizing the relative negative voltage of the extraction pole grid;
the anode is a conductive circular ring with a through hole in the center or a wire spiral forming net with a plurality of through holes;
the magnetic field of the outer magnet is a rotary parallel magnetic field parallel to the section of the inner cavity of the outer cylinder, the outer magnet consists of a multi-pole iron core framework and an enameled wire winding coil, the enameled wire winding coil is wound by polyurethane enameled copper wires or aluminum wires, and the enameled wire winding coil is connected into symmetrical three-phase winding according to a dipolar magnetic field rule; the connection mode of the windings is single-layer, double-layer or single-layer and double-layer mixture, the wiring mode of the winding end adopts stacked or wave mode, and the shape of the winding end adopts chain, cross, concentric or stacked mode; the windings are excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently regulated, the intensity of the diode transverse rotating magnetic field is regulated by the voltage, and the rotating speed of the diode transverse rotating magnetic field is regulated by the current frequency.
2. The utility model provides a metal ion source that arc current arouses, includes outer barrel and sets up in the cathode metal arc target of the internal one end of urceolus, and the other end of outer barrel is the exit, is provided with air inlet, its characterized in that on the outer barrel: an anode corresponding to the cathode metal arc target is arranged in the emission port, through holes for connecting the inner side and the outer side of the anode are formed in the anode, a baffle plate for blocking metal atomic groups emitted by the cathode metal arc target and passing electrons, metal atoms and metal ions is arranged between the anode and the cathode metal arc target in the outer cylinder, a metal atom ionization enhancement area is formed in the outer cylinder relative to the area between the anode and the baffle plate, an outer magnet is arranged on the outer wall of the outer cylinder corresponding to the metal atom ionization enhancement area, and a magnetic field formed by the outer magnet in the outer cylinder is one or a combination of an axial magnetic field parallel to the axis of the inner cavity of the outer cylinder, a circular cutting closed magnetic field parallel to the inner cavity wall of the outer cylinder, an axial closed magnetic field parallel to the inner cavity wall of the outer cylinder or a rotary parallel magnetic field parallel to the cross section of the inner cavity of the outer cylinder; the electrons ionize metal atoms in the metal atom ionization enhancement area under the action of the magnetic field of the outer magnet and generate metal ions, an extraction pole grid is arranged at the outer end of the outer barrel relative to the emission port, and the metal ions in the metal atom ionization enhancement area are extracted from the emission port by utilizing the relative negative voltage of the extraction pole grid;
the baffle is a shutter type baffle, and the design of the through holes of the shutter type baffle enables metal atomic groups to be blocked, and electrons, metal atoms and metal ions can pass through;
the anode is a conductive circular ring with a through hole in the center or a wire spiral forming net with a plurality of through holes.
3. The arc current activated metal ion source of claim 2, wherein: the magnetic field of the outer magnet is a rotary parallel magnetic field parallel to the section of the inner cavity of the outer cylinder, the outer magnet consists of a multi-pole iron core framework and an enameled wire winding coil, the enameled wire winding coil is wound by polyurethane enameled copper wires or aluminum wires, and the enameled wire winding coil is connected into symmetrical three-phase winding according to a dipolar magnetic field rule; the connection mode of the windings is single-layer, double-layer or single-layer and double-layer mixture, the wiring mode of the winding end adopts stacked or wave mode, and the shape of the winding end adopts chain, cross, concentric or stacked mode; the windings are excited by a three-phase variable-frequency sinusoidal alternating-current power supply with the phase difference of 120 degrees, the current frequency and the voltage are independently regulated, the intensity of the diode transverse rotating magnetic field is regulated by the voltage, and the rotating speed of the diode transverse rotating magnetic field is regulated by the current frequency.
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| CN201810162922.0A CN108441826B (en) | 2018-02-26 | 2018-02-26 | Enhanced arc source, and arc current excited gas ion source, metal ion source and electron source |
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| CN109671602B (en) * | 2018-11-15 | 2021-05-21 | 温州职业技术学院 | Composite electron source based on thermionic discharge |
| CN109600895B (en) * | 2018-11-15 | 2020-11-10 | 合肥聚能电物理高技术开发有限公司 | High density hot cathode plasma source |
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| US5279723A (en) * | 1992-07-30 | 1994-01-18 | As Represented By The United States Department Of Energy | Filtered cathodic arc source |
| US6413387B1 (en) * | 1997-10-24 | 2002-07-02 | Filplas Vacuum Technology Pte Ltd. | Cathode arc source for metallic and dielectric coatings |
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