CN108436746B - Device for controlling polishing of liquid metal polishing solution on blade by using rotating electric field - Google Patents
Device for controlling polishing of liquid metal polishing solution on blade by using rotating electric field Download PDFInfo
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- CN108436746B CN108436746B CN201810490556.1A CN201810490556A CN108436746B CN 108436746 B CN108436746 B CN 108436746B CN 201810490556 A CN201810490556 A CN 201810490556A CN 108436746 B CN108436746 B CN 108436746B
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- Prior art keywords
- polishing
- permanent magnet
- liquid metal
- positive electrode
- liquid
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- 238000005498 polishing Methods 0.000 title claims abstract description 126
- 229910001338 liquidmetal Inorganic materials 0.000 title claims abstract description 53
- 230000005684 electric field Effects 0.000 title claims abstract description 31
- 239000007788 liquid Substances 0.000 claims abstract description 33
- 239000002245 particle Substances 0.000 claims abstract description 21
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 6
- 230000005672 electromagnetic field Effects 0.000 claims abstract description 5
- -1 gallium ions Chemical class 0.000 claims description 6
- 229910052792 caesium Inorganic materials 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 230000001788 irregular Effects 0.000 claims description 3
- 229910001419 rubidium ion Inorganic materials 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 2
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000005111 flow chemistry technique Methods 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/003—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor whereby the workpieces are mounted on a holder and are immersed in the abrasive material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
- B24B31/14—Abrading-bodies specially designed for tumbling apparatus, e.g. abrading-balls
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a device for controlling polishing of a blade by using a rotating electric field to control liquid metal polishing liquid, which comprises an operation table, a fixing device, a blade, a first permanent magnet, a positive electrode, a second permanent magnet, a negative electrode, liquid metal polishing liquid, a polishing cavity, an operation table, a motor, a rotating mechanism, a polishing container, a support frame and a working platform; the polishing container is internally provided with a polishing cavity, the upper end and the lower end of the polishing cavity are respectively provided with a first permanent magnet and a second permanent magnet, and the motor drives the positive electrode and the negative electrode to rotate in the polishing container when rotating; according to the invention, a rotating mechanism is adopted to generate a rotating electric field in the polishing groove, so that a stable current field generated between the positive electrode and the negative electrode is changed into a rotating disordered current field, and metal ions in the polishing solution are driven to move without the action of the disordered current field and the electromagnetic field, so that abrasive particles are driven to move disordered, and the abrasive particles perform disordered impact on blades extending into the polishing solution, thereby improving the polishing effect of a polishing area.
Description
Technical Field
The invention relates to the technical field of liquid metal polishing, in particular to a device for controlling polishing of liquid metal polishing liquid on blades by using a rotating electric field.
Background
Liquid metal generally refers to alloy functional materials that are liquid at normal temperatures, such as metals and their alloys having melting points below 30 ℃, and also includes low melting point alloy materials that are liquid in the operating temperature range of 40 ℃ to 300 ℃. The liquid metal polishing solution polishing technology refers to that when the liquid metal polishing solution mixed with abrasive materials moves relative to the polishing surface of a workpiece under the action of a magnetic field, a flexible grinding head on a liquid metal polishing solution wire belt generates large cutting force on the polishing surface, so that the polishing surface of the workpiece is polished.
For complex curved surface processing, for example, processing a blade cannot be performed by using traditional polishing, so methods similar to abrasive particle flow processing and liquid metal processing are generated, however, simple liquid metal polishing or abrasive particle flow processing has lower efficiency, has certain limitation on processing quality, has strong dependence on the self skills of workers, has low production efficiency and long processing period, is easy to cause a damage layer and a deterioration layer on the surface, is difficult to ensure the processing quality, and has great influence on the processed surface.
Disclosure of Invention
The invention aims to solve the problems of low processing efficiency, strong technical dependence and long processing period caused by the prior art that abrasive particle flow is solely utilized for polishing or liquid metal is solely utilized for polishing, and provides a device for controlling liquid metal polishing liquid to polish blades by using a rotating electric field.
The invention realizes the above purpose through the following technical scheme: a device for controlling polishing of a blade by using a rotating electric field comprises an operation table, a fixing device, a blade, a first permanent magnet, a positive electrode, a second permanent magnet, a negative electrode, a liquid metal polishing liquid, a polishing cavity, an operation table, a motor, a rotating mechanism, a polishing container, a supporting frame and a working platform; the operating platform and the supporting frame are both arranged on the working platform, and the polishing container is fixed on the working platform through the supporting frame; the polishing container is internally provided with a polishing cavity for containing liquid metal polishing liquid, the upper end and the lower end of the polishing cavity are respectively provided with a first permanent magnet and a second permanent magnet, the first permanent magnet and the second permanent magnet are horizontally arranged in parallel, and the magnetic poles of the two surfaces of the first permanent magnet and the second permanent magnet, which are close to each other, are opposite; the upper ends of the blades are fixed on a fixing device, the fixing device is fixed on the bottom surface of the first permanent magnet at the upper end of the polishing cavity, and the whole blades are immersed in the liquid metal polishing liquid of the polishing cavity; the motor is fixed on the work platform of polishing container bottom, and rotary mechanism is connected to the head of motor, and rotary mechanism upwards extends two and stretches into the inside extension pole that symmetry set up of polishing container, and positive electrode and negative electrode are installed respectively on the top of two extension poles of rotary mechanism, and the motor rotates the time drive rotary mechanism and rotates, and then drives positive electrode and negative electrode and rotate in polishing container inside.
Further, the negative electrode and the positive electrode are connected with an operation console, and the operation console controls the on-off state, the voltage frequency, the current frequency, the voltage magnitude and the current magnitude of the negative electrode and the positive electrode.
Further, the operation panel changes the state in which an electric field is formed by the positive electrode and the negative electrode by changing the magnitude of the frequency of the current or the frequency of the voltage flowing through the positive electrode. The electric field in the liquid metal polishing solution is superposition of the electric fields of the positive electrode and the negative electrode, so that the liquid metal vibrates at high frequency at the edge position of the blade in the liquid metal polishing solution and at the bottom position of the liquid metal polishing solution. The high-frequency vibration of the liquid metal at the bottom can carry abrasive particles which rise and fall at the bottom of the liquid metal polishing liquid, and the high-frequency vibration of the edge of the blade can polish the polishing area with high efficiency.
Further, the sine wave electric field direction formed by the positive electrode and the negative electrode is perpendicular to the magnetic field direction formed by the first permanent magnet and the second permanent magnet.
Further, the liquid metal polishing liquid is a liquid metal polishing liquid containing abrasive particles.
Further, the liquid metal in the liquid metal polishing solution is one or more compounds selected from gallium ions, rubidium ions and cesium ions. The liquid metal is usually an alloy functional material which is liquid at normal temperature, such as metal with melting point below 30 ℃ and alloy material thereof, and also comprises a low-melting-point alloy material which is liquid in a working temperature range of 40-300 ℃ and is mixed with abrasive particles.
Further, the operation panel is connected with the motor and controls the rotating speed of the motor, and then the rotating speed of an electric field generated between the positive electrode and the negative electrode in the polishing container is changed, so that a stable electric current field generated by the positive electrode and the negative electrode is changed into an irregular disordered electric current field, metal ions in the polishing liquid are driven to move without moving by utilizing the simultaneous action of the disordered electric current field and the electromagnetic field, abrasive particles are driven to move disordered, and the abrasive particles perform disordered impact on blades extending into the polishing liquid, so that polishing is realized.
The invention has the beneficial effects that:
1. according to the invention, the workpiece is polished by metal ions in the polishing metal liquid, the metal polishing liquid can polish finer surfaces, and the obtained polishing precision is higher.
2. According to the invention, the blade is polished by the liquid metal polishing solution mixed with the abrasive particles, and the liquid metal ions move under the action of an electric field and a magnetic field, so that the abrasive particles in the liquid metal polishing solution are driven to move, and the surface of the blade is processed by the abrasive particles, so that the processing efficiency is improved.
3. According to the invention, a rotating mechanism is adopted to generate a rotating electric field in the polishing groove, so that a stable current field generated between the positive electrode and the negative electrode is changed into a rotating disordered current field, and metal ions in the polishing solution are driven to move without the action of the disordered current field and the electromagnetic field, so that abrasive particles are driven to move disordered, and the abrasive particles perform disordered impact on blades extending into the polishing solution, thereby improving the polishing effect of a polishing area.
4. The invention does not need specific machinery to polish the workpiece, but adopts the electric field and the magnetic field to directly control the liquid metal polishing liquid, and has simple control mode, simple integral structure and easy maintenance.
5. According to the invention, the positive electrode and the negative electrode form an electric field, the two electromagnets form a magnetic field, and the electric field and the magnetic field control are combined, so that the dead angle-free polishing of any angle of the curved surface can be realized.
Drawings
FIG. 1 is an isometric view of an apparatus for controlling the polishing of a blade with a liquid metal slurry using a rotating electric field in accordance with the present invention.
Fig. 2 is a schematic view showing a partial sectional structure of an apparatus for controlling polishing of a blade by a liquid metal polishing liquid using a rotating electric field according to the present invention.
In the figure, 1-positive electrode, 2-fixing device, 3-blade, 4-first permanent magnet, 5-polishing cavity, 6-negative electrode, 7-operation panel, 8-work platform, 9-second permanent magnet, 10-motor, 11-rotary mechanism, 12-support frame, 13-polishing container.
Detailed Description
The invention is further described below with reference to the accompanying drawings:
As shown in fig. 1 and 2, a device for controlling polishing of a blade by using a rotating electric field comprises an operation table 7, a fixing device 2, a blade 3, a first permanent magnet 4, a positive electrode 1, a second permanent magnet 9, a negative electrode 6, a liquid metal polishing liquid, a polishing cavity 5, an operation table 7, a motor 10, a rotating mechanism 11, a polishing container 13, a supporting frame 12 and a working platform 8; the operating platform 7 and the supporting frame 12 are both arranged on the working platform 8, and the polishing container 13 is fixed on the working platform 8 through the supporting frame 12; the polishing container 13 is internally provided with a polishing cavity 5 for containing liquid metal polishing liquid, the upper end and the lower end of the polishing cavity 5 are respectively provided with a first permanent magnet 4 and a second permanent magnet 9, the first permanent magnet 4 and the second permanent magnet 9 are horizontally arranged in parallel, and the magnetic poles of two surfaces, close to each other, of the first permanent magnet 4 and the second permanent magnet 9 are opposite; the upper ends of the blades 3 are fixed on the fixing device 2, the fixing device 2 is fixed on the bottom surface of the first permanent magnet 4 at the upper end of the polishing cavity 5, and the whole blades 3 are immersed in the liquid metal polishing liquid of the polishing cavity 5; the motor 10 is fixed on the working platform 8 at the bottom of the polishing container 13, the head of the motor 10 is connected with the rotating mechanism 11, the rotating mechanism 11 extends upwards to form two symmetrically arranged extension rods extending into the polishing container 13, the positive electrode 1 and the negative electrode 6 are respectively arranged at the top ends of the two extension rods of the rotating mechanism 11, and the rotating mechanism 11 is driven to rotate when the motor 10 rotates, so that the positive electrode 1 and the negative electrode 6 are driven to rotate in the polishing container 13.
The negative electrode 6 and the positive electrode 1 are connected with an operation console, and the operation console controls the on-off state, the voltage frequency, the current frequency, the voltage magnitude and the current magnitude of the negative electrode 6 and the positive electrode 1. The operation panel 7 changes the state in which an electric field is formed by the positive electrode 1 and the negative electrode 6 by changing the magnitude of the frequency of the current or the frequency of the voltage flowing through the positive electrode 1. The sine wave electric field direction formed by the positive electrode 1 and the negative electrode 6 is perpendicular to the magnetic field direction formed by the first permanent magnet 4 and the second permanent magnet 9.
The liquid metal polishing liquid is a liquid metal polishing liquid containing abrasive particles.
The liquid metal in the liquid metal polishing solution is one or more compounds selected from gallium ions, rubidium ions and cesium ions.
The operation table is connected with the motor 10 and controls the rotating speed of the motor 10, so that the rotating speed of an electric field generated between the positive electrode 1 and the negative electrode 6 in the polishing container 13 is changed, the stable current field generated by the positive electrode 1 and the negative electrode 6 is changed into an irregular disordered current field, metal ions in the polishing solution are driven to move without moving by utilizing the simultaneous action of the disordered current field and the electromagnetic field, abrasive particles are driven to move in disorder, and the abrasive particles impact the blades 3 extending into the polishing solution in disorder, so that polishing is realized.
The above embodiments are only preferred embodiments of the present invention, and are not limiting to the technical solutions of the present invention, and any technical solution that can be implemented on the basis of the above embodiments without inventive effort should be considered as falling within the scope of protection of the patent claims of the present invention.
Claims (5)
1. An apparatus for controlling polishing of a blade by a liquid metal polishing liquid using a rotating electric field, characterized in that: the device comprises an operation table (7), a fixing device (2), a blade (3), a first permanent magnet (4), a positive electrode (1), a second permanent magnet (9), a negative electrode (6), liquid metal polishing liquid, a polishing cavity (5), the operation table (7), a motor (10), a rotating mechanism (11), a polishing container (13), a supporting frame (12) and a working platform (8); the operating platform (7) and the supporting frame (12) are both arranged on the working platform (8), and the polishing container (13) is fixed on the working platform (8) through the supporting frame (12); a polishing cavity (5) for containing liquid metal polishing liquid is arranged in the polishing container (13), a first permanent magnet (4) and a second permanent magnet (9) are respectively arranged at the upper end and the lower end of the polishing cavity (5), the first permanent magnet (4) and the second permanent magnet (9) are horizontally arranged in parallel, and the magnetic poles of two surfaces, close to each other, of the first permanent magnet (4) and the second permanent magnet (9) are opposite; the upper ends of the blades (3) are fixed on the fixing device (2), the fixing device (2) is fixed on the bottom surface of the first permanent magnet (4) at the upper end of the polishing cavity (5), and the whole blades (3) are immersed in the liquid metal polishing liquid of the polishing cavity (5); the motor (10) is fixed on the working platform (8) at the bottom of the polishing container (13), the head of the motor (10) is connected with the rotating mechanism (11), the rotating mechanism (11) extends upwards to form two symmetrically arranged extension rods which extend into the polishing container (13), the positive electrode (1) and the negative electrode (6) are respectively arranged at the top ends of the two extension rods of the rotating mechanism (11), and the motor (10) drives the rotating mechanism (11) to rotate when rotating, so that the positive electrode (1) and the negative electrode (6) are driven to rotate in the polishing container (13);
The negative electrode (6) and the positive electrode (1) are connected with an operation desk, and the operation desk controls the on-off, voltage frequency, current frequency, voltage magnitude and current magnitude of the negative electrode (6) and the positive electrode (1);
the liquid metal polishing liquid is a liquid metal polishing liquid containing abrasive particles.
2. An apparatus for controlling polishing of a blade with a liquid metal polish using a rotating electric field as set forth in claim 1, wherein: the operation panel (7) changes the state in which an electric field is formed by the positive electrode (1) and the negative electrode (6) by changing the magnitude of the frequency of the current or the frequency of the voltage flowing through the positive electrode (1).
3. An apparatus for controlling polishing of a blade with a liquid metal polish using a rotating electric field as set forth in claim 1, wherein: the sine wave electric field direction formed by the positive electrode (1) and the negative electrode (6) is perpendicular to the magnetic field direction formed by the first permanent magnet (4) and the second permanent magnet (9).
4. An apparatus for controlling polishing of a blade with a liquid metal polish using a rotating electric field as set forth in claim 1, wherein: the liquid metal in the liquid metal polishing solution is one or more compounds selected from gallium ions, rubidium ions and cesium ions.
5. An apparatus for controlling polishing of a blade with a liquid metal polish using a rotating electric field as set forth in claim 1, wherein: the operation panel is connected with the motor (10) and controls the rotating speed of the motor (10), and then the rotating speed of an electric field generated between the positive electrode (1) and the negative electrode (6) in the polishing container (13) is changed, so that a stable current field generated by the positive electrode (1) and the negative electrode (6) is changed into an irregular disordered current field, metal ions in polishing liquid are driven to move without moving by utilizing the simultaneous action of the disordered current field and the electromagnetic field, abrasive particles are driven to move in disorder, and the abrasive particles impact disorder on blades (3) extending into the polishing liquid, so that polishing is realized.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810490556.1A CN108436746B (en) | 2018-05-21 | 2018-05-21 | Device for controlling polishing of liquid metal polishing solution on blade by using rotating electric field |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810490556.1A CN108436746B (en) | 2018-05-21 | 2018-05-21 | Device for controlling polishing of liquid metal polishing solution on blade by using rotating electric field |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108436746A CN108436746A (en) | 2018-08-24 |
| CN108436746B true CN108436746B (en) | 2024-05-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810490556.1A Active CN108436746B (en) | 2018-05-21 | 2018-05-21 | Device for controlling polishing of liquid metal polishing solution on blade by using rotating electric field |
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| Country | Link |
|---|---|
| CN (1) | CN108436746B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112872916B (en) * | 2020-12-28 | 2023-03-10 | 富联裕展科技(深圳)有限公司 | Polishing system and polishing method |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05305566A (en) * | 1992-05-01 | 1993-11-19 | Ohara:Kk | Polishing method and polishing device |
| JPH08257896A (en) * | 1995-03-28 | 1996-10-08 | Nikon Corp | Manufacture of polishing article and vibration magnetic polishing work device |
| JP2001198792A (en) * | 2000-01-18 | 2001-07-24 | Star Engineering Co Ltd | Electromagnetic barrel finishing device |
| JP2003165050A (en) * | 2001-11-29 | 2003-06-10 | Sony Corp | Cmp unit and polishing method using the same |
| JP2008030177A (en) * | 2006-07-31 | 2008-02-14 | Kyocera Kinseki Corp | Surface processing apparatus and surface processing method |
| CN101774151A (en) * | 2010-02-04 | 2010-07-14 | 北京理工大学 | Electromagnetic coupling field-induced rheological polishing tool |
| CN204935272U (en) * | 2015-08-17 | 2016-01-06 | 宇环数控机床股份有限公司 | A kind of magnetorheological finishing device |
| CN208375014U (en) * | 2018-05-21 | 2019-01-15 | 浙江工业大学 | The device that blade is polished using rotating electric field control liquid metal polishing fluid |
-
2018
- 2018-05-21 CN CN201810490556.1A patent/CN108436746B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05305566A (en) * | 1992-05-01 | 1993-11-19 | Ohara:Kk | Polishing method and polishing device |
| JPH08257896A (en) * | 1995-03-28 | 1996-10-08 | Nikon Corp | Manufacture of polishing article and vibration magnetic polishing work device |
| JP2001198792A (en) * | 2000-01-18 | 2001-07-24 | Star Engineering Co Ltd | Electromagnetic barrel finishing device |
| JP2003165050A (en) * | 2001-11-29 | 2003-06-10 | Sony Corp | Cmp unit and polishing method using the same |
| JP2008030177A (en) * | 2006-07-31 | 2008-02-14 | Kyocera Kinseki Corp | Surface processing apparatus and surface processing method |
| CN101774151A (en) * | 2010-02-04 | 2010-07-14 | 北京理工大学 | Electromagnetic coupling field-induced rheological polishing tool |
| CN204935272U (en) * | 2015-08-17 | 2016-01-06 | 宇环数控机床股份有限公司 | A kind of magnetorheological finishing device |
| CN208375014U (en) * | 2018-05-21 | 2019-01-15 | 浙江工业大学 | The device that blade is polished using rotating electric field control liquid metal polishing fluid |
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| Publication number | Publication date |
|---|---|
| CN108436746A (en) | 2018-08-24 |
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