CN108417411A - A kind of ultracapacitor and preparation method thereof - Google Patents

A kind of ultracapacitor and preparation method thereof Download PDF

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CN108417411A
CN108417411A CN201810169746.3A CN201810169746A CN108417411A CN 108417411 A CN108417411 A CN 108417411A CN 201810169746 A CN201810169746 A CN 201810169746A CN 108417411 A CN108417411 A CN 108417411A
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preparation
electrolytic solution
deposition
liquid
ultracapacitor
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CN108417411B (en
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徐建华
郭亚楠
何鑫
毛喜玲
周榆久
杨文耀
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University of Electronic Science and Technology of China
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/26Anodisation of refractory metals or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/24Electrodes characterised by structural features of the materials making up or comprised in the electrodes, e.g. form, surface area or porosity; characterised by the structural features of powders or particles used therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/26Electrodes characterised by their structure, e.g. multi-layered, porosity or surface features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/22Electrodes
    • H01G11/30Electrodes characterised by their material
    • H01G11/46Metal oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/54Electrolytes
    • H01G11/56Solid electrolytes, e.g. gels; Additives therein
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G11/00Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
    • H01G11/84Processes for the manufacture of hybrid or EDL capacitors, or components thereof
    • H01G11/86Processes for the manufacture of hybrid or EDL capacitors, or components thereof specially adapted for electrodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/13Energy storage using capacitors

Abstract

A kind of ultracapacitor of present invention offer and preparation method thereof, belongs to capacitor technology field.The preparation method of ultracapacitor, includes the following steps:Nano tube array of titanium dioxide is prepared in titanium sheet using anodizing.In the surface deposition solid electrolyte of Nano tube array of titanium dioxide.In solid electrolyte transition metal oxide is deposited far from the one side in Nano tube array of titanium dioxide.Above-mentioned preparation method is simple, and obtained ultracapacitor has high quality specific capacity, the advantage of high-energy density, while can work within the scope of extremely wide temperature.

Description

A kind of ultracapacitor and preparation method thereof
Technical field
The present invention relates to capacitor technology fields, in particular to a kind of ultracapacitor and preparation method thereof.
Background technology
In order to solve a series of crises such as traditional energy exhaustion, environmental degradation that 21 century is faced, researchers are always It is dedicated to novel, efficient, cleaning, the research and application of renewable energy source material and device.In the current various forms of energy, electricity It can be easiest to transmission and utilize.In order to efficiently use electric energy, it is always by cleaning, the conversion of reproducible approach, storage electric energy One important subject.
Ultracapacitor (Supercapacitor) is also referred to as electrochemical capacitor (Electrochemical Capacitor), double layer capacitor (Electrical Double-Layer Capacitor), gold capacitance, farad electricity Hold, is a kind of new type of energy storage device between traditional capacitor and battery.Its energy storage basic principle is:When to electrode charge When, the electrode surface charge in ideal polarized electrode state will attract the counter ions in surrounding electrolyte solution, make these Ion invests and forms electric double layer on electrode surface, constitutes electric double layer capacitance.Since the distance of two charge layers is very small (general 0.5mm or less), special electrode structure is used in addition, makes electrode surface area at ten thousand times of increase, to generate great capacitance Amount.Therefore ultracapacitor is not chemically reacted in the process of its energy storage, this storage come energy storage by polarized electrolytic matter Energy process is reversible, because of this, ultracapacitor can be hundreds thousand of times with repeated charge, and the long-life is its maximum Feature.In addition, another mechanism, is happened at the quick Faradaic processes on surface because having capacitive kinetic characteristics quilt Referred to as fake capacitance, this capacitance have higher specific capacity and are provided simultaneously with good multiplying power property and stability.
The specific discharge capacity and energy density of existing ultracapacitor have certain limitation, cannot reach the need of client It asks.There are three types of the capacitors for being directed to energy type application target currently on the market, and one is double layer capacitor, electrode material is Activated carbon, electrolyte are organic electrolyte solutions, and operating voltage 2.7V, energy density is by activated carbon working mechanism (specific capacity It 80F/g) is limited, is 3  ̄ 8Wh/kg, the service life 1,000,000 times, operating temperature is limited by organic solvent, about -45 DEG C of  ̄ 70 ℃;Another is Asymmetric Supercapacitor, an extremely activated carbon, in addition an extremely nickel hydroxide, using a pole electric double layer, The operation principle of one pole fake capacitance, since, as electrolyte solvent, voltage reaches 1.2V, and energy density is up to 10Wh/ using water Kg, working life are about 100,000 times;Finally one is lithium-ion capacitor, a pole uses activated carbon, and another pole is using pre- embedding The graphite of lithium, operation principle are electric double layer capacitance+lithium ion insertion/deintercalation, have high voltage (3.8V), high-energy density (15  ̄ 20Wh/kg), longer life (100,000 times) and operating temperature (- 20  ̄ 60 for being limited to lithium ion insertion/deintercalation process ℃)。
Invention content
The purpose of the present invention is to provide a kind of preparation methods of ultracapacitor, and above-mentioned preparation method is simple, are easy behaviour Make.
Another object of the present invention is to provide a kind of ultracapacitors that above-mentioned preparation method obtains, and have high quality ratio The advantage of capacity, high-energy density.
Realization that the present invention adopts the following technical solutions:
A kind of preparation method of ultracapacitor, includes the following steps:
(1), Nano tube array of titanium dioxide is prepared in titanium sheet using anodizing;
(2), in the surface deposition solid electrolyte of Nano tube array of titanium dioxide;
(3), in solid electrolyte transition metal oxide is deposited far from the one side in Nano tube array of titanium dioxide.
Further, it is anode with titanium sheet in above-mentioned steps (1), platinum is cathode in electricity in preferred embodiments of the present invention Solve and carry out anodic oxidation 1-5h in liquid, after anneal at a temperature of 450-550 DEG C 2.5-3.5h.
Further, in preferred embodiments of the present invention, above-mentioned electrolyte is that ammonium fluoride is dissolved in ethylene glycol and deionization It is made in the mixed solution of water.
Further, in preferred embodiments of the present invention, in above-mentioned steps (2), using Nano tube array of titanium dioxide as Work pole, and platinized platinum is used as to electrode, and Ag/AgCl carries out electrochemical deposition as reference electrode in depositing liquid.
Further, in preferred embodiments of the present invention, the preparation method of above-mentioned deposition liquid is:By sodium sulphate be dissolved in from Electrolytic solution is formed in sub- water, vulcanized sodium will be added and be dissolved in the first deposition of formation liquid in electrolytic solution, lithium sulfate is dissolved in electrolysis The second deposition liquid is formed in solution, and zinc sulfate is dissolved in electrolytic solution and forms third deposition liquid.
Further, in preferred embodiments of the present invention, it is above-mentioned successively first deposit liquid, in electrolytic solution, it is second heavy It is scanned in hydrops, electrolytic solution, the first deposition liquid, electrolytic solution, third deposition liquid and electrolytic solution.
Further, in preferred embodiments of the present invention, in above-mentioned steps (3), transition metal oxide is selected from five oxidations Any one in two vanadium, manganese dioxide and nickel oxide.
Further, in preferred embodiments of the present invention, the specific method of above-mentioned deposition transition metal oxide is:It utilizes Vanadium or manganese or nickel transition metal carry out magnetron sputtering deposition as target.
Further, in preferred embodiments of the present invention, the specific method of above-mentioned deposition vanadic anhydride is:With vanadium metal As sputtering target material, oxygen as working gas, argon gas as carrier gas, sputtering power is 180-250W, underlayer temperature is Sputtering sedimentation is carried out under conditions of 350-500 DEG C.
A kind of ultracapacitor that the preparation method of above-mentioned ultracapacitor is prepared.
The advantageous effect of preparation method for the ultracapacitor that presently preferred embodiments of the present invention provides is:Use anodic oxidation Method prepares Nano tube array of titanium dioxide in titanium sheet, forms the cathode of ultracapacitor, obtains Nano tube array of titanium dioxide, The capacitor that a large amount of independent cast super capacitors can be formed and be unified into, makes the ultracapacitor subsequently obtained have high quality Specific capacity, the advantage of high-energy density.In the surface deposition solid electrolyte of Nano tube array of titanium dioxide, solid can be limited For electrolyte in the growth on nano-tube array surface, it is nanometer scale to make growth thickness, makes all to be formed on each nanotube negative The miniature nanoscale Asymmetric Supercapacitor of pole/electrolyte/anode class nucleocapsid in this way, to lead on minimum area It crosses nano-tube array and forms high specific capacity and quick charging and discharging capabilities.In solid electrolyte far from titanium dioxide The one side of nano-tube array deposits transition metal oxide, forms the anode of ultracapacitor, makes the positive and negative anodes of ultracapacitor Between have high contact area, thickness of electrode is relatively thin, can metric density higher, electrode capacity bigger.
The ultracapacitor that the preparation method of ultracapacitor provided by the invention is prepared has the beneficial effect that:Have High quality specific capacity, the advantage of high-energy density can work within the scope of extremely wide temperature.
Description of the drawings
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below will be to needed in the embodiment attached Figure is briefly described, it should be understood that the following drawings illustrates only certain embodiments of the present invention, therefore is not construed as pair The restriction of range for those of ordinary skill in the art without creative efforts, can also be according to this A little attached drawings obtain other relevant attached drawings and also belong to protection scope of the present invention.
Fig. 1 is the process flow chart of the preparation method of ultracapacitor provided by the invention.
Specific implementation mode
It in order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below will be in the embodiment of the present invention Technical solution be clearly and completely described.The person that is not specified actual conditions in embodiment, builds according to normal condition or manufacturer The condition of view carries out.Reagents or instruments used without specified manufacturer is the conventional production that can be obtained by commercially available purchase Product.
The preparation method of ultracapacitor provided in an embodiment of the present invention is specifically described below.
Fig. 1 is the process flow chart of the preparation method of ultracapacitor provided by the invention.Referring to Fig. 1, super capacitor The preparation method of device, includes the following steps:
(1), Nano tube array of titanium dioxide is prepared in titanium sheet using anodizing, obtained titania nanotube Cathode of the array as ultracapacitor, obtains Nano tube array of titanium dioxide, can form a large amount of independent super electricity of cast The capacitor for holding and being unified into makes the ultracapacitor subsequently obtained have high quality specific capacity, the advantage of high-energy density.
Electrolyte is that ammonium fluoride is dissolved in ethylene glycol and the mixed solution of deionized water to be made.Wherein, in electrolyte, second The volume of glycol accounts for the 10%-30% of electrolyte volume.
First by titanium sheet pass through acetone, absolute ethyl alcohol and deionized water supersound washing, after with titanium sheet be anode, platinum is cathode Carry out anodic oxidation 1-5h in the electrolytic solution, after anneal at a temperature of 450-550 DEG C 2.5-3.5h, obtain titanium dioxide Nano-tube array.The caliber of titania nanotube is 50-100nm, and pipe range is 1-100 μm, the titanium dioxide under the conditions of this Nanotube has higher quality specific capacity, the energy density of bigger in the ultracapacitor finally obtained.
Preferably, when carrying out anodic oxidation, constant temperature stirring is carried out in electrolytic cell, temperature is 30-50 DEG C, profit Anodic oxidation is carried out with constant pressure source, wherein voltage 20-50v carries out anodic oxidation under this temperature condition, can be easily The caliber and pipe range for controlling titania nanotube, to make the ultracapacitor subsequently obtained that there is higher quality specific volume Amount, the energy density of bigger.
(2), in the surface deposition solid electrolyte of Nano tube array of titanium dioxide, in the table of Nano tube array of titanium dioxide Face deposition solid electrolyte can limit growth of the solid electrolyte on nano-tube array surface, and it is nanometer to make growth thickness Magnitude keeps the miniature nanoscale for all forming cathode/electrolyte/anode class nucleocapsid in this way on each nanotube asymmetric super Grade capacitor, to form high specific capacity and quick charge and discharge electric energy by nano-tube array on minimum area Power.
Deposition liquid preparation method be:Sodium sulphate is dissolved in deionized water and forms electrolytic solution, it is molten by vulcanized sodium is added The first deposition liquid is formed in electrolytic solution, and lithium sulfate is dissolved in electrolytic solution and forms the second deposition liquid, zinc sulfate is dissolved in Third is formed in electrolytic solution deposits liquid.
That is, first preparing blank cleaning solution, the first deposition liquid, the second deposition liquid and third deposition liquid respectively, wherein prepare empty The concrete mode of cleaning solution is in vain:Anhydrous sodium sulfate is dissolved in deionized water, the electricity of a concentration of 0.08-0.12mol/L is obtained Solution is solved, preferably:The electrolytic solution of 0.1mol/L.
Electrolytic solution is divided into four parts, portion is used as blank cleaning solution;Vulcanized sodium is dissolved in a electrolytic solution, is obtained The first deposition liquid of a concentration of 2.2-2.8mmol/L of vulcanized sodium, the first deposition liquid of preferably 2.5mmol/L.In a electricity Lithium sulfate is dissolved in solution solution, obtains the second deposition liquid of a concentration of 2.2-2.8mmol/L of lithium sulfate, preferably The second deposition liquid of 2.5mmol/L.Zinc sulfate is dissolved in a electrolytic solution, obtains a concentration of 2.2- of zinc sulfate The third of 2.8mmol/L deposits liquid, and the third of preferably 2.5mmol/L deposits liquid.
Titania nanotube is passed sequentially through to the supersound washing of acetone, absolute ethyl alcohol and deionized water.With titanium dioxide Nano-tube array is used as work pole, platinized platinum to electrode, and Ag/AgCl carries out electrochemistry as reference electrode in depositing liquid Deposition.In the surface deposition solid electrolyte of Nano tube array of titanium dioxide, solid electrolyte can be further limited in nanometer The growth of pipe array surface, it is nanometer scale to make growth thickness, also, its thickness is more uniform, obtained ultracapacitor Charging and discharging capabilities it is stronger.
Successively first deposit liquid, in electrolytic solution, the second deposition liquid, electrolytic solution, the first deposition liquid, electrolytic solution, Third, which deposits, carries out cyclic voltammetry voltage scanning in liquid and electrolytic solution.Cyclic voltammetry voltage scanning is carried out, keeps solid electric Matter stratified sedimentation is solved on the surface of Nano tube array of titanium dioxide, can preferably control the growth of solid electrolyte, thickness Control more uniform, the charging and discharging capabilities for the ultracapacitor that a further height obtains.
Preferably, it by electrochemical workstation, is deposited in three-electrode system:Nano tube array of titanium dioxide is as work Make pole, platinized platinum is used as to electrode, and Ag/AgCl is as reference electrode, and (- 0.4  ̄ 1V of potential window, sweep in the first deposition liquid successively Retouch rate 10mV/s), electrolytic solution (potential window -0.4  ̄ 1V, sweep speed 10mV/s), the second deposition liquid (electrochemical window - 0.2  ̄ 0.2V, sweep speed 10mV/s of mouth), electrolytic solution (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), the One deposition liquid (potential window -0.4  ̄ 1V, sweep speed 10mV/s), electrolytic solution (- 0.4  ̄ 1V of potential window, scanning speed Rate 10mV/s), third deposits liquid (potential window -0.4  ̄ 0.1V, sweep speed 10mV/s), electrolytic solution (potential window - 0.4  ̄ 0.1V, sweep speed 10mV/s) in deposited, generally select cycle 2 times.
It is sequentially depositing in above-mentioned different solution, the charging and discharging capabilities of obtained ultracapacitor are most strong, super Effective contact area bigger between the positive electrode and negative electrode of capacitor.
(3), transition metal oxide, shape are deposited far from the one side in Nano tube array of titanium dioxide in solid electrolyte At the anode of ultracapacitor, make that there is high contact area between the positive and negative anodes of ultracapacitor, thickness of electrode is relatively thin, makes Its energy density higher, electrode capacity bigger.
Preferably, any one of transition metal oxide in vanadic anhydride, manganese dioxide and nickel oxide.Deposition The specific method of transition metal oxide is:Using vanadium or manganese or nickel transition metal as target, magnetron sputtering deposition is carried out.
Deposition vanadic anhydride specific method be:Using vanadium metal as sputtering target material, oxygen as working gas, argon gas As carrier gas, sputtering sedimentation is carried out under conditions of sputtering power is 180-250W, underlayer temperature is 350-500 DEG C.
Specifically, V is prepared using magnetron sputtering coater on substrate2O5Film.Excitaton source using copper target (Cu, K α= 0.15406nm), sputtering target material is the vanadium metal of purity 99.99%, and the vacuum for controlling vacuum chamber is 2.0 × 10- 4Pa, work gas Pressure is 2.2Pa, target-substrate distance 5cm.When sputtering, it is passed through high-purity oxygen (99.99%) and is used as working gas, argon gas (99.99%) it is used as carrier gas.By changing substrate temperature, sputtering power and oxygen (O2) and argon gas (Ar) flow-rate ratio, V is prepared under different conditions2O5, film sample.Preferably, village bottom temperature is 350-500 DEG C, O2/ Ar intrinsic standoff ratios are 1%- 10%, sputtering power 180-250W.
Manganese dioxide is similar with the mode of the magnetron sputtering of nickel oxide.It is finally obtained by way of above-mentioned magnetron sputtering Each nanotube of ultracapacitor is respectively formed on the class nucleocapsid of cathode, solid electrolyte and anode, has higher Specific capacity, the ability of fast charging and discharging are better able to meet the needs of client.
It is close that the ultracapacitor that the preparation method of above-mentioned ultracapacitor is prepared has high quality specific capacity, high-energy The advantage of degree can work within the scope of extremely wide temperature, the ability with fast charging and discharging.
Embodiment 1
A kind of preparation method of ultracapacitor, includes the following steps:(1), it is prepared in titanium sheet using anodizing Nano tube array of titanium dioxide.(2), in the surface deposition solid electrolyte of Nano tube array of titanium dioxide.(3), in solid electricity Solve matter deposits transition metal oxide far from the one side in Nano tube array of titanium dioxide.
Embodiment 2
A kind of preparation method of ultracapacitor, includes the following steps:(1), ammonium fluoride is dissolved in ethylene glycol and deionization Electrolyte is made in the mixed solution of water, with titanium sheet be anode, platinum be cathode carry out anodic oxidation 3h in the electrolytic solution, after Anneal 3h at a temperature of 500 DEG C, obtains Nano tube array of titanium dioxide.
(2), sodium sulphate is dissolved in deionized water and forms electrolytic solution, addition vulcanized sodium is dissolved in electrolytic solution and is formed Lithium sulfate is dissolved in electrolytic solution and forms the second deposition liquid, zinc sulfate is dissolved in electrolytic solution and forms the by the first deposition liquid Three deposition liquid, using Nano tube array of titanium dioxide as work pole, platinized platinum as to electrode, Ag/AgCl as reference electrode, according to It is secondary first deposit liquid, in electrolytic solution, the second deposition liquid, electrolytic solution, the first deposition liquid, electrolytic solution, third deposit liquid Make the surface deposition solid electricity of Nano tube array of titanium dioxide with electrochemical deposition is carried out by cyclic voltammetry in electrolytic solution Xie Zhi.
(3), using vanadium metal as sputtering target material, oxygen as working gas, argon gas as carrier gas, it is in sputtering power Depositing far from the one side in Nano tube array of titanium dioxide in solid electrolyte under conditions of 200W, underlayer temperature are 400 DEG C Vanadic anhydride.
Embodiment 3
A kind of preparation method of ultracapacitor, includes the following steps:(1), ammonium fluoride is dissolved in ethylene glycol and deionization Electrolyte is made in the mixed solution of water, titanium sheet is passed through to the supersound washing of acetone, absolute ethyl alcohol and deionized water, is with titanium sheet Anode, platinum be cathode in the electrolytic solution in electrolytic cell with voltage be 20v under conditions of carry out constant temperature and be stirred to react 1h, after 450 Anneal 2.5h at a temperature of DEG C, obtains Nano tube array of titanium dioxide.
(2), anhydrous sodium sulfate is dissolved in deionized water, obtains the electrolytic solution of a concentration of 0.08mol/L, will be electrolysed molten Liquid is divided into four parts, and portion is used as blank cleaning solution;Vulcanized sodium is dissolved in a electrolytic solution, obtains a concentration of of vulcanized sodium The first deposition liquid of 2.2mmol/L, dissolves lithium sulfate in a electrolytic solution, obtains a concentration of 2.2mmol/L of lithium sulfate Second deposition liquid, dissolve zinc sulfate in a electrolytic solution, obtain a concentration of 2.2mmol/L of zinc sulfate third deposition Liquid.The supersound washing that titania nanotube is passed sequentially through to acetone, absolute ethyl alcohol and deionized water, passes through electrochemical operation It stands, using Nano tube array of titanium dioxide as work pole, platinized platinum is used as to electrode, and Ag/AgCl is as reference electrode, in three electrodes System is deposited, successively in the first deposition liquid (potential window -0.4  ̄ 1V, sweep speed 10mV/s), electrolytic solution (current potential Window -0.4  ̄ 1V, sweep speed 10mV/s), the second deposition liquid (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), Electrolytic solution (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), (- 0.4  ̄ 1V of potential window, sweep the first deposition liquid Retouch rate 10mV/s), electrolytic solution (potential window -0.4  ̄ 1V, sweep speed 10mV/s), third deposits liquid (electrochemical window Mouthful -0.4  ̄ 0.1V, sweep speed 10mV/s), in electrolytic solution (potential window -0.4  ̄ 0.1V, sweep speed 10mV/s) It is deposited, generally selects cycle 2 times.
(3), V is prepared using magnetron sputtering coater on substrate2O5Film.Excitaton source using copper target (Cu, K α= 0.15406nm), sputtering target material is the vanadium metal of purity 99.99%, and the vacuum for controlling vacuum chamber is 2.0 × 10- 4Pa, work gas Pressure is 2.2Pa, target-substrate distance 5cm.When sputtering, it is passed through high-purity oxygen (99.99%) and is used as working gas, argon gas (99.99%) it is used as carrier gas.Village bottom temperature is 350 DEG C, O2Solid under conditions of/Ar intrinsic standoff ratios are 1%, sputtering power is 180W Body electrolyte prepares V far from the one side in Nano tube array of titanium dioxide2O5Film sample.
Embodiment 4
A kind of preparation method of ultracapacitor, includes the following steps:(1), ammonium fluoride is dissolved in ethylene glycol and deionization Electrolyte is made in the mixed solution of water, titanium sheet is passed through to the supersound washing of acetone, absolute ethyl alcohol and deionized water, is with titanium sheet Anode, platinum be cathode in the electrolytic solution in electrolytic cell with voltage be 50v under conditions of carry out constant temperature and be stirred to react 5h, after 550 Anneal 3.5h at a temperature of DEG C, obtains Nano tube array of titanium dioxide.
(2), anhydrous sodium sulfate is dissolved in deionized water, obtains the electrolytic solution of a concentration of 0.12mol/L, will be electrolysed molten Liquid is divided into four parts, and portion is used as blank cleaning solution;Vulcanized sodium is dissolved in a electrolytic solution, obtains a concentration of of vulcanized sodium The first deposition liquid of 2.8mmol/L, dissolves lithium sulfate in a electrolytic solution, obtains a concentration of 2.8mmol/L of lithium sulfate Second deposition liquid, dissolve zinc sulfate in a electrolytic solution, obtain a concentration of 2.8mmol/L of zinc sulfate third deposition Liquid.The supersound washing that titania nanotube is passed sequentially through to acetone, absolute ethyl alcohol and deionized water, passes through electrochemical operation It stands, using Nano tube array of titanium dioxide as work pole, platinized platinum is used as to electrode, and Ag/AgCl is as reference electrode, in three electrodes System is deposited, successively in the first deposition liquid (potential window -0.4  ̄ 1V, sweep speed 10mV/s), electrolytic solution (current potential Window -0.4  ̄ 1V, sweep speed 10mV/s), the second deposition liquid (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), Electrolytic solution (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), (- 0.4  ̄ 1V of potential window, sweep the first deposition liquid Retouch rate 10mV/s), electrolytic solution (potential window -0.4  ̄ 1V, sweep speed 10mV/s), third deposits liquid (electrochemical window Mouthful -0.4  ̄ 0.1V, sweep speed 10mV/s), in electrolytic solution (potential window -0.4  ̄ 0.1V, sweep speed 10mV/s) It is deposited, generally selects cycle 2 times.
(3), manganese dioxide membrane is prepared using magnetron sputtering coater on substrate.Excitaton source using copper target (Cu, K α= 0.15406nm), sputtering target material is the manganese metal of purity 99.99%, and the vacuum for controlling vacuum chamber is 2.0 × 10- 4Pa, work gas Pressure is 2.2Pa, target-substrate distance 5cm.When sputtering, it is passed through high-purity oxygen (99.99%) and is used as working gas, argon gas (99.99%) it is used as carrier gas.Village bottom temperature is 500 DEG C, O2Under conditions of/Ar intrinsic standoff ratios are 10%, sputtering power is 250W Solid electrolyte prepares manganese dioxide membrane sample far from the one side in Nano tube array of titanium dioxide.
Embodiment 5
A kind of preparation method of ultracapacitor, includes the following steps:(1), ammonium fluoride is dissolved in ethylene glycol and deionization Electrolyte is made in the mixed solution of water, titanium sheet is passed through to the supersound washing of acetone, absolute ethyl alcohol and deionized water, is with titanium sheet Anode, platinum be cathode in the electrolytic solution in electrolytic cell with voltage be 40v under conditions of carry out constant temperature and be stirred to react 3h, after 520 Anneal 3h at a temperature of DEG C, obtains Nano tube array of titanium dioxide.
(2), anhydrous sodium sulfate is dissolved in deionized water, obtains the electrolytic solution of a concentration of 0.1mol/L, will be electrolysed molten Liquid is divided into four parts, and portion is used as blank cleaning solution;Vulcanized sodium is dissolved in a electrolytic solution, obtains a concentration of of vulcanized sodium The first deposition liquid of 2.5mmol/L, dissolves lithium sulfate in a electrolytic solution, obtains a concentration of 2.5mmol/L of lithium sulfate Second deposition liquid, dissolve zinc sulfate in a electrolytic solution, obtain a concentration of 2.5mmol/L of zinc sulfate third deposition Liquid.The supersound washing that titania nanotube is passed sequentially through to acetone, absolute ethyl alcohol and deionized water, passes through electrochemical operation It stands, using Nano tube array of titanium dioxide as work pole, platinized platinum is used as to electrode, and Ag/AgCl is as reference electrode, in three electrodes System is deposited, successively in the first deposition liquid (potential window -0.4  ̄ 1V, sweep speed 10mV/s), electrolytic solution (current potential Window -0.4  ̄ 1V, sweep speed 10mV/s), the second deposition liquid (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), Electrolytic solution (potential window -0.2  ̄ 0.2V, sweep speed 10mV/s), (- 0.4  ̄ 1V of potential window, sweep the first deposition liquid Retouch rate 10mV/s), electrolytic solution (potential window -0.4  ̄ 1V, sweep speed 10mV/s), third deposits liquid (electrochemical window Mouthful -0.4  ̄ 0.1V, sweep speed 10mV/s), in electrolytic solution (potential window -0.4  ̄ 0.1V, sweep speed 10mV/s) It is deposited, generally selects cycle 2 times.
(3), nickel oxide film is prepared using magnetron sputtering coater on substrate.Excitaton source using copper target (Cu, K α= 0.15406nm), sputtering target material is the metallic nickel of purity 99.99%, and the vacuum for controlling vacuum chamber is 2.0 × 10- 4Pa, work gas Pressure is 2.2Pa, target-substrate distance 5cm.When sputtering, it is passed through high-purity oxygen (99.99%) and is used as working gas, argon gas (99.99%) it is used as carrier gas.Village bottom temperature is 400 DEG C, O2Solid under conditions of/Ar intrinsic standoff ratios are 8%, sputtering power is 220W The separate of body electrolyte prepares nickel oxide film sample on one side in Nano tube array of titanium dioxide.
Experimental example
Ultracapacitor that the preparation method that detection embodiment 1-5 is provided respectively is prepared and super electricity on the market The various performance parameters of container as a comparison case obtain table 1:
The performance of 1 ultracapacitor of table
As it can be seen from table 1 the specific discharge capacity of ultracapacitor prepared by the present invention, energy density are all than in the market Ultracapacitor is high, and its stability is more preferable, and operating temperature range is wider, is better able to meet the needs of client.
Embodiments described above is a part of the embodiment of the present invention, instead of all the embodiments.The reality of the present invention The detailed description for applying example is not intended to limit the range of claimed invention, but is merely representative of the selected implementation of the present invention Example.Based on the embodiments of the present invention, those of ordinary skill in the art are obtained without creative efforts Every other embodiment, shall fall within the protection scope of the present invention.

Claims (10)

1. a kind of preparation method of ultracapacitor, which is characterized in that include the following steps:
(1), Nano tube array of titanium dioxide is prepared in titanium sheet using anodizing;
(2), in the surface deposition solid electrolyte of the Nano tube array of titanium dioxide;
(3), in the solid electrolyte transiting metal oxidation is deposited far from the one side in the Nano tube array of titanium dioxide Object.
2. preparation method according to claim 1, which is characterized in that be anode with titanium sheet in the step (1), platinum is Cathode carries out anodic oxidation 1-5h in the electrolytic solution, after anneal at a temperature of 450-550 DEG C 2.5-3.5h.
3. preparation method according to claim 2, which is characterized in that the electrolyte be by ammonium fluoride be dissolved in ethylene glycol with It is made in the mixed solution of deionized water.
4. preparation method according to claim 1, which is characterized in that in the step (2), with the nano titania Pipe array is used as work pole, platinized platinum to electrode, and Ag/AgCl carries out electrochemical deposition as reference electrode in depositing liquid.
5. preparation method according to claim 4, which is characterized in that it is described deposition liquid preparation method be:By sodium sulphate It is dissolved in deionized water and forms electrolytic solution, vulcanized sodium will be added and be dissolved in the first deposition of formation liquid in the electrolytic solution, by sulphur Sour lithium, which is dissolved in the electrolytic solution, forms the second deposition liquid, and zinc sulfate is dissolved in the electrolytic solution and forms third deposition Liquid.
6. preparation method according to claim 5, which is characterized in that molten in the first deposition liquid, the electrolysis successively In liquid, it is described second deposition liquid, the electrolytic solution, it is described first deposition liquid, the electrolytic solution, the third deposition liquid and It is scanned in the electrolytic solution.
7. preparation method according to claim 1, which is characterized in that in the step (3), the transition metal oxide Any one in vanadic anhydride, manganese dioxide and nickel oxide.
8. preparation method according to claim 7, which is characterized in that the specific method for depositing transition metal oxide is: Using vanadium or manganese or nickel transition metal as target, magnetron sputtering deposition is carried out.
9. preparation method according to claim 8, which is characterized in that the specific method for depositing the vanadic anhydride is: It is 180-250W, substrate in sputtering power using vanadium metal as sputtering target material, oxygen as working gas, argon gas as carrier gas Temperature carries out sputtering sedimentation under conditions of being 350-500 DEG C.
10. the super capacitor that a kind of preparation method such as claim 1-9 any one of them ultracapacitors is prepared Device.
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