CN108376698A - A kind of display base plate and preparation method thereof, display device - Google Patents
A kind of display base plate and preparation method thereof, display device Download PDFInfo
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- CN108376698A CN108376698A CN201810175599.0A CN201810175599A CN108376698A CN 108376698 A CN108376698 A CN 108376698A CN 201810175599 A CN201810175599 A CN 201810175599A CN 108376698 A CN108376698 A CN 108376698A
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- spacer material
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- groove
- base plate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/122—Pixel-defining structures or layers, e.g. banks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
Abstract
The present invention discloses a kind of display base plate and preparation method thereof, display device, it is related to display technology field, to solve to be formed in pixel defining layer in the prior art, the spacer material for being used to support mask plate makes the thickness of display device increase, and then the problem of cause the aperture opening ratio for being formed by display device and resolution ratio to be affected.The production method of the display base plate includes：Before preparing luminescence unit on substrate using mask plate, formed on substrate to support the spacer material of the mask plate；After preparing luminescence unit on substrate using the mask plate, reduce the height of the spacer material.The production method of display base plate provided by the invention is for making display base plate.
Description
Technical field
The present invention relates to display technology field more particularly to a kind of display base plate and preparation method thereof, display devices.
Background technology
With the continuous development of display technology, the type of display device is more and more, wherein Organic Light Emitting Diode (English
Text：Organic Light-Emitting Diode, hereinafter referred to as OLED) display device is ultra-thin with its self-luminous, high colour gamut,
The features such as flexibility is shown, receives the extensive concern of people.
Currently, the luminescent layer in OLED display device mainly uses evaporation process to prepare, i.e., it will be used to prepare luminescent layer
Organic material is heated to certain temperature under vacuum, so that it is ascended to heaven and forms luminescent layer to substrate surface.Actually preparing hair
During photosphere, occur the problems such as colour mixture and technique scratch between the luminescent layer of adjacent different colours in order to prevent, it is existing
Spacer material is set in the pixel defining layer in technology usually between the luminescent layer positioned at adjacent different colours, and by this every
Underbed is to high-precision mask plate (English：Fine Metal Mask, hereinafter referred to as FMM) it is supported, then utilize FMM in base
Luminescent layer is formed on plate, to realize while avoiding the above problem, ensures that the luminescent layer of different colours can be formed in base
Plate specifies region.But due to the presence of spacer material so that the thickness of the display device of formation increases, and causes to be formed by display
The aperture opening ratio and resolution ratio of device are affected.
Invention content
The purpose of the present invention is to provide a kind of display base plate and preparation method thereof, display devices, for solving existing skill
It is formed in pixel defining layer in art, the spacer material for being used to support mask plate makes the thickness of display device increase, and then causes
It is formed by the aperture opening ratio of display device and the problem of resolution ratio is affected.
To achieve the goals above, the present invention provides the following technical solutions：
The first aspect of the present invention provides a kind of production method of display base plate, including：
Before preparing luminescence unit on substrate using mask plate, formed on substrate to support the mask plate
Spacer material；
After preparing luminescence unit on substrate using the mask plate, reduce the height of the spacer material.
Further, it is formed on substrate before the spacer material to support the mask plate, the production method is also wrapped
It includes：
It forms pixel defining layer on the substrate, and is formed backwards to the surface of the substrate in the pixel defining layer recessed
Slot；
It is described to be specifically included the step of forming the spacer material to support the mask plate on substrate：
The first spacer material is formed in the groove, the height of first spacer material is more than the depth of the groove, and
First spacer material occupies the subregion of the bottom portion of groove；
The step of height for reducing the spacer material, specifically includes：
First spacer material is liquefied, levelling is in the groove after the first spacer material liquefaction；
Liquid material after levelling is cured, the second spacer material is formed, the height of second spacer material is less than institute
State the height of the first spacer material.
Further, described to form pixel defining layer on the substrate, and in the pixel defining layer backwards to the base
The step of surface formation groove of plate, specifically includes：
By a patterning processes, pixel defining layer is formed on the substrate, and carry on the back positioned at the pixel defining layer
To the groove on the surface of the substrate.
Further, described to form pixel defining layer on the substrate, and in the pixel defining layer backwards to the base
The step of surface formation groove of plate, specifically includes：
By patterning processes, pixel defining layer is formed on the substrate；
By way of laser burn, groove is formed backwards to the surface of the substrate in pixel defining layer.
Further, the depth of the groove is the 1/3-1/2 of the thickness of the pixel defining layer.
Further, the area in the opening face of the groove is less than the area of the bottom surface of the groove.
Further, described the step of forming the first spacer material in the groove, specifically includes：
Using photoisomerization material, first spacer material is formed in the groove by stamping process；
Described the step of first spacer material liquefies, specifically includes：
Using the first spacer material described in ultraviolet light, first spacer material is made to be converted into liquid material；
The step of liquid material to after levelling cures, the second spacer material of formation specifically includes：
Using the liquid material after radiation of visible light levelling, the liquid material is made to be converted into the second spacer material.
Further, the photoisomerization material is the photoisomerization organic material containing azobenzene molecule.
The technical solution of production method based on above-mentioned display base plate, the second aspect of the present invention provide a kind of display base
Plate, the display base plate include：
Pixel defining layer on substrate, the pixel defining layer are fluted backwards to the setting of the surface of the substrate；
The second spacer material in the groove, the height of second spacer material are less than or equal to the depth of the groove
Degree.
Based on the technical solution of above-mentioned display base plate, the third aspect of the present invention provides a kind of display device, including above-mentioned
Display base plate.
In technical solution provided by the invention, before preparing luminescence unit on substrate using mask plate, first in substrate
It is upper to be formed to support the spacer material of mask plate so that the luminescence unit formed using the mask plate can be located at the specified of substrate
Region prevents between the luminescence unit of adjacent different colours and colour mixture occurs and the problems such as technique scratches well；Moreover, this
It invents in the technical solution provided, after preparing luminescence unit on substrate using mask plate, also reduces the height of spacer material
Degree, to reduce the influence that spacer material generates display base plate thickness, ensure that the slimming of made display base plate, solve
It has determined since display base plate thickness caused by spacer material increases, the problem of aperture opening ratio and resolution ratio of display base plate are affected.
Further, since after preparing luminescence unit on substrate using mask plate, the height of spacer material is reduced so that in follow-up work
The cathode layer prepared in skill will not be influenced by spacer material, preferably ensure that the yield of made display base plate.
Description of the drawings
Attached drawing described herein is used to provide further understanding of the present invention, and constitutes the part of the present invention, this hair
Bright illustrative embodiments and their description are not constituted improper limitations of the present invention for explaining the present invention.In the accompanying drawings：
Fig. 1 is the vertical view of display base plate provided in an embodiment of the present invention；
Fig. 2 is the schematic diagram for forming groove in the embodiment of the present invention in pixel defining layer；
Fig. 3 is the schematic diagram for forming the first spacer material in the embodiment of the present invention in a groove；
Fig. 4 is the schematic cross-section along the directions A1-A2 in Fig. 1.
Reference numeral：
1- substrates, 2- luminescence units,
3- mask plates, the first spacer materials of 4-,
5- pixel defining layers, the second spacer materials of 6-,
7- grooves.
Specific implementation mode
Display base plate that embodiment provides in order to further illustrate the present invention and preparation method thereof, display device, are tied below
Figure of description is closed to be described in detail.
An embodiment of the present invention provides a kind of production method of display base plate, which includes：
Step S101 is formed on substrate and is covered to support before preparing luminescence unit on substrate using mask plate
The spacer material of diaphragm plate；
Specifically, by taking OLED display device as an example, the luminescence unit in OLED display device generally comprise hole injection layer,
Hole transmission layer, organic luminous layer, electron transfer layer and electron injecting layer etc..It is general to utilize vapor deposition when forming luminescence unit
Technology forms each functional layer in luminescence unit using corresponding mask plate.It is supported by forming spacer material on substrate
Mask plate can preferably prevent the problems such as colour mixture and technique scratch occur between the luminescence unit of adjacent different colours.
Step S102 reduces the height of spacer material after preparing luminescence unit on substrate using mask plate.
Specifically, after the preparation for completing luminescence unit using mask plate, mask plate is removed, then will be used to support and cover
The height of the spacer material of diaphragm plate reduces.After the height for reducing spacer material, the flood that can cover luminescence unit can be made again
Cathode layer.
According to the specific manufacturing process of above-mentioned display base plate it is found that the making side of display base plate provided in an embodiment of the present invention
In method, before preparing luminescence unit on substrate using mask plate, first formed on substrate to support the dottle pin of mask plate
Object so that using the mask plate formed luminescence unit can be located at substrate specified region, prevent well it is adjacent not
The problems such as with occurring colour mixture and technique scratch between the luminescence unit of color；Moreover, display base plate provided in an embodiment of the present invention
Production method in, after preparing luminescence unit on substrate using mask plate, the height of spacer material is also reduced, to subtract
The influence that small spacer material generates display base plate thickness, ensure that the slimming of made display base plate, solve due to
The problem of display base plate thickness caused by spacer material increases, and the aperture opening ratio and resolution ratio of display base plate are affected.Further, since
After preparing luminescence unit on substrate using mask plate, the height of spacer material is reduced so that prepare in the subsequent process
Cathode layer will not be influenced by spacer material, preferably ensure that the yield of made display base plate.
Further, as shown in Figs. 1-3, it is formed on substrate 1 before the spacer material for supporting mask plate 3, above-mentioned reality
The production method of display base plate for applying example offer further includes：
Step S100 forms pixel defining layer 5, and is formed backwards to the surface of substrate 1 in pixel defining layer 5 on substrate 1
Groove 7；
Specifically, aforesaid substrate 1 is chosen as being formed with the glass substrate of thin film transistor array layer and anode layer, can profit
Organic thin film layer is formed on substrate 1 with photosensitive type resinae organic material, and then organic thin film layer is exposed, is developed,
Form the pixel defining layer 7 being located on substrate 1.The thickness for being formed by pixel defining layer 7 is chosen as between 1 μm -5 μm, but not
It is only limitted to this.
Further, groove can be formed in pixel defining layer in several ways, two kinds of specific modes of illustrating below,
But it is not limited only to this.
First way forms pixel defining layer 5, Yi Jiwei on substrate 1 as shown in Fig. 2, by a patterning processes
In pixel defining layer 5 backwards to the groove 7 on the surface of substrate 1；In more detail, pixel defining layer film is first formed on substrate 1,
Then utilize corresponding mask plate, pixel defining layer film is exposed, then to the pixel defining layer film after exposure into
Row development, to be formed with fluted 7 pixel defining layer 5.Further, it is formed in the operation of groove 7, can be passed through in exposure
The mode of exposure intensity is gradually reduced to control the shape for being formed by groove 7；Such as：It can be by gradually reducing exposure intensity
Mode Formation cross-section is trapezoidal groove.
The second way forms pixel defining layer 5, then by swashing on substrate 1 as shown in Fig. 2, first passing through patterning processes
The mode that light is burnt forms groove 7 in pixel defining layer 5 backwards to the surface of substrate 1.In more detail, passing through patterning processes
After forming pixel defining layer 5, the region that groove 7 is used to form in laser irradiation pixel defining layer 5 can be utilized, it is recessed to be formed
Slot 7.
It is noted that no matter which kind of above-mentioned mode is used to form groove 7, it is formed by the equal energy of shape and size of groove 7
Enough meet actual demand.Preferably, the depth of the groove 7 of formation is the 1/3-1/2 of the thickness of pixel defining layer 5；What is formed is recessed
The area in the opening face of slot 7 is less than the area of the bottom surface of groove 7；The shape and size of the groove 7 of formation are meeting above-mentioned requirements
When, not only so that groove 7 has larger accommodation space, but also subsequently to liquefying to the first spacer material 4, forming liquid
When material, groove 7 can effectively prevent liquid material to overflow, and ensure that the making yield of display base plate.
In above-mentioned steps S101, formed to specifically include the step of supporting the spacer material of mask plate on substrate 1：
Step S1011, as shown in figure 3, forming the first spacer material 4 in groove 7, the height of the first spacer material 4 is more than recessed
The depth of slot 7, and the first spacer material 4 occupies the subregion of bottom portion of groove；
Specifically, the first spacer material 4 can be formed in groove 7 in several ways, such as：Using photoisomerization material
Material, forms the first spacer material 4 by stamping process in groove 7.In more detail, can sacrificial layer first be formed on a support plate,
Then photoisomerization material is utilized, the first spacer material 4 is formed on sacrificial layer, then will be formed with the load of the first spacer material 4
Plate and the substrate 1 for being formed with pixel defining layer 5 align, and the first spacer material 4 are impressed into corresponding groove 7, then by support plate
And the sacrificial layer being formed on support plate is detached with the first spacer material 4, to complete to make the first spacer material 4 in groove 7.
It is noted that the groove 7 formed in pixel defining layer 5 is chosen as strip groove, it is formed in strip groove
First spacer material 4 is chosen as cylindrical spacer, and one or more cylindrical spacers can be accommodated in same groove 7, such as Fig. 1 institutes
Show.In addition, the subregion that the first spacer material 4 only occupies bottom portion of groove can be met, subsequently the first spacer material 4 is being liquefied in this way
When, groove 7 can accommodate whole liquid materials that liquefaction is formed, and avoid liquid material from overflowing groove 7, influence the system of display base plate
Make yield.In addition, the height of part of first spacer material 4 beyond groove 7 is chosen as between 2 μm -5 μm, the cross of the first spacer material 4
The diameter in section is chosen as between 5 μm -20 μm.
In above-mentioned steps S102, the step of height for reducing spacer material, specifically comprises the following steps S1021 and step
S1022。
Step S1021 liquefies the first spacer material 4, and levelling is in groove after the liquefaction of the first spacer material 4；
Specifically, using the first spacer material of ultraviolet light cover 4, make the first spacer material 4 by solid state transformed for liquid
Material, liquid material after conversion can levelling in groove 7.It is noted that the wavelength of the ultraviolet light utilized is 350nm-
400nm。
Step S1022 cures the liquid material after levelling, forms the second spacer material 6, the height of the second spacer material
Less than the height of the first spacer material, as shown in Figure 4.
Specifically, using the liquid material after radiation of visible light levelling, liquid material is made to be converted into solid second dottle pin
Object 6, the height for being formed by solid second spacer material 6 are less than the height of the first spacer material 4, further, are formed by solid
The height of second spacer material 6 of state is less than or equal to the depth of groove 7.It is noted that the visible light wave utilized is a length of
500nm-550nm。
Further, the photoisomerization organic material selected by above-mentioned formation spacer material preferably divides to contain azobenzene
The photoisomerization organic material of son.
Specifically, the photoisomerization organic material containing azobenzene molecule is to have azobenzene group in molecular formula
Organic matter, azobenzene group be and meanwhile have meta-stable cis- state and thermodynamically stable trans- state isomers.
Under the irradiation of ultraviolet light, azobenzene group can be changed into cis- state from trans- state, that is, realize the organic material of photoisomerization
Material is converted to liquid by solid-state；Again since the azobenzene group of cis- state is unstable, under the radiation of visible light of specific wavelength,
Azobenzene group can be changed into trans- state from cis- state again, that is, realize that photoisomerization organic material is converted to by liquid
Solid-state.
For the production method of the clearer display base plate for illustrating above-described embodiment offer, a specific implementation is given below
Example, is described in detail with the manufacturing process to display base plate.
A substrate (thin film transistor array layer, flatness layer and anode layer are formed on the substrate) is provided, on substrate
5 μm of high pixel defining layers are made, it, can be simultaneously using gradually reducing light exposure during exposure forms pixel defining layer
Mode forms the strip groove of 2 μm of depths；Then photoisomerization material is used, forms 5 μ of height in groove using stamping process
M, the first spacer material of 10 μm of cross-sectional diameter；Then it utilizes cylindrical spacer to support FMM, and luminescence unit is made by FMM
In each organic function layer；Complete luminescence unit making after, using the first spacer material of ultraviolet light cover 4, make its by
Solid-state switchs to liquid, and cocurrent is average to be layered in groove；Then the photoisomerization material for recycling radiation of visible light liquid phase, makes it
It is solidified into the second spacer material；The materials such as metal Mg, Ag are finally used again, and the moon of covering luminescence unit is made by common mask plate
Pole layer, to complete the making of display base plate.
The embodiment of the present invention additionally provides a kind of display base plate, as shown in Figs 1-4, the display provided using above-described embodiment
The production method of substrate makes.The display base plate includes：
Pixel defining layer 5 on substrate 1, pixel defining layer 5 is backwards to the surface of substrate 1 setting fluted 7；
The second spacer material 6 in groove 7, the height of the second spacer material 6 are less than or equal to the depth of groove 7.
Above-mentioned display base plate further includes：Luminescence unit 2 in the pixel region that pixel defining layer 5 limits, and cover
Cover the flood cathode layer of each pixel unit 2.In addition, being formed with thin film transistor array layer, flatness layer and sun on aforesaid substrate
Pole layer.
Since display base plate provided in an embodiment of the present invention is that the production method provided using above-described embodiment is made, because
Included luminescence unit can be located at the specified region of display base plate in this display base plate provided in an embodiment of the present invention, very well
The luminescence unit for preventing different colours adjacent in display base plate between there is the problems such as colour mixture and technique scratch, improve
The yield of display base plate.And the height for the second spacer material for due to display base plate including is less than or equal to and is formed in pixel circle
The depth of groove in given layer has an impact the thickness of display base plate so as to avoid the second spacer material so that display base plate
Slimming demand is not only met, also there is higher aperture opening ratio and resolution ratio.
The embodiment of the present invention additionally provides a kind of display device, including the display base plate that above-described embodiment provides.Due to upper
The display base plate for stating embodiment offer has higher production yield and higher aperture opening ratio and resolution ratio, therefore, the present invention
Embodiment equally has the advantages that above-mentioned when including above-mentioned display base plate, and details are not described herein again.
It should be noted that the display device can be：TV, display, Digital Frame, mobile phone, tablet computer etc.
Any product or component with display function, wherein the display device further includes flexible PCB, printed circuit board and the back of the body
Plate etc..
Unless otherwise defined, the technical term or scientific terminology that the disclosure uses should be tool in fields of the present invention
There is the ordinary meaning that the personage of general technical ability is understood." first ", " second " and the similar word used in the disclosure is simultaneously
It does not indicate that any sequence, quantity or importance, and is used only to distinguish different component parts." comprising " or "comprising" etc.
Similar word means to occur the element before the word, and either object covers the element or object for appearing in the word presented hereinafter
And its it is equivalent, and it is not excluded for other elements or object.The similar word such as " connection " or " connected " is not limited to physics
Or mechanical connection, but may include electrical connection, either directly or indirectly."upper", "lower",
"left", "right" etc. is only used for indicating relative position relation, and after the absolute position for being described object changes, then the relative position is closed
System may also correspondingly change.
It is appreciated that ought such as layer, film, region or substrate etc element be referred to as positioned at another element " upper " or " under "
When, the element can with it is " direct " be located at another element " upper " or " under ", or there may be intermediary element.
In the description of the above embodiment, particular features, structures, materials, or characteristics can be at any one or more
It can be combined in any suitable manner in a embodiment or example.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (10)
1. a kind of production method of display base plate, which is characterized in that including：
Before preparing luminescence unit on substrate using mask plate, formed on substrate to support the dottle pin of the mask plate
Object；
After preparing luminescence unit on substrate using the mask plate, reduce the height of the spacer material.
2. the production method of display base plate according to claim 1, which is characterized in that
It is formed on substrate before the spacer material to support the mask plate, the production method further includes：
Pixel defining layer is formed on the substrate, and forms groove backwards to the surface of the substrate in the pixel defining layer；
It is described to be specifically included the step of forming the spacer material to support the mask plate on substrate：
The first spacer material is formed in the groove, the height of first spacer material is more than the depth of the groove, and described
First spacer material occupies the subregion of the bottom portion of groove；
The step of height for reducing the spacer material, specifically includes：
First spacer material is liquefied, levelling is in the groove after the first spacer material liquefaction；
Liquid material after levelling is cured, forms the second spacer material, the height of second spacer material is less than described the
The height of one spacer material.
3. the production method of display base plate according to claim 2, which is characterized in that described to form picture on the substrate
Element defines layer, and is specifically included the step of the pixel defining layer forms groove backwards to the surface of the substrate：
By a patterning processes, pixel defining layer is formed on the substrate, and positioned at the pixel defining layer backwards to institute
State the groove on the surface of substrate.
4. the production method of display base plate according to claim 2, which is characterized in that described to form picture on the substrate
Element defines layer, and is specifically included the step of the pixel defining layer forms groove backwards to the surface of the substrate：
By patterning processes, pixel defining layer is formed on the substrate；
By way of laser burn, groove is formed backwards to the surface of the substrate in pixel defining layer.
5. the production method of display base plate according to claim 3 or 4, which is characterized in that the depth of the groove is institute
State the 1/3-1/2 of the thickness of pixel defining layer.
6. the production method of display base plate according to claim 3 or 4, which is characterized in that the opening face of the groove
Area is less than the area of the bottom surface of the groove.
7. the production method of display base plate according to claim 2, which is characterized in that described to form in the groove
The step of one spacer material, specifically includes：
Using photoisomerization material, first spacer material is formed in the groove by stamping process；
Described the step of first spacer material liquefies, specifically includes：
Using the first spacer material described in ultraviolet light, first spacer material is made to be converted into liquid material；
The step of liquid material to after levelling cures, the second spacer material of formation specifically includes：
Using the liquid material after radiation of visible light levelling, the liquid material is made to be converted into the second spacer material.
8. the production method of display base plate according to claim 7, which is characterized in that the photoisomerization material be containing
There is the photoisomerization organic material of azobenzene molecule.
9. a kind of display base plate, which is characterized in that using the making side such as claim 2~8 any one of them display base plate
Method makes, and the display base plate includes：
Pixel defining layer on substrate, the pixel defining layer are fluted backwards to the setting of the surface of the substrate；
The second spacer material in the groove, the height of second spacer material are less than or equal to the depth of the groove.
10. a kind of display device, which is characterized in that including display base plate as claimed in claim 9.
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| CN110911466A (en) * | 2019-11-29 | 2020-03-24 | 京东方科技集团股份有限公司 | Substrate and preparation method thereof, preparation method of mother board, mask and evaporation device |
| WO2020056666A1 (en) * | 2018-09-20 | 2020-03-26 | 深圳市柔宇科技有限公司 | Organic light-emitting diode back plate and manufacturing method therefor |
| CN111224013A (en) * | 2019-11-28 | 2020-06-02 | 京东方科技集团股份有限公司 | Display panel packaging structure and preparation method thereof |
| CN111916578A (en) * | 2020-07-15 | 2020-11-10 | 京东方科技集团股份有限公司 | Array substrate, preparation method thereof and display device |
| CN112164705A (en) * | 2020-10-26 | 2021-01-01 | 厦门强力巨彩光电科技有限公司 | Micro-LED display panel and Micro-LED display device |
| CN112768475A (en) * | 2021-01-07 | 2021-05-07 | 武汉华星光电半导体显示技术有限公司 | OLED display panel and preparation method thereof |
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