CN108353489B - 极紫外光源中的目标扩展速率控制 - Google Patents
极紫外光源中的目标扩展速率控制 Download PDFInfo
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- CN108353489B CN108353489B CN201680047368.0A CN201680047368A CN108353489B CN 108353489 B CN108353489 B CN 108353489B CN 201680047368 A CN201680047368 A CN 201680047368A CN 108353489 B CN108353489 B CN 108353489B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202111336436.4A CN113966061A (zh) | 2015-08-12 | 2016-08-10 | 极紫外光源中的目标扩展速率控制 |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/824,141 US9820368B2 (en) | 2015-08-12 | 2015-08-12 | Target expansion rate control in an extreme ultraviolet light source |
US14/824,141 | 2015-08-12 | ||
US14/824,147 US9713240B2 (en) | 2015-08-12 | 2015-08-12 | Stabilizing EUV light power in an extreme ultraviolet light source |
US14/824,147 | 2015-08-12 | ||
PCT/US2016/046301 WO2017027566A1 (en) | 2015-08-12 | 2016-08-10 | Target expansion rate control in an extreme ultraviolet light source |
Related Child Applications (1)
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CN202111336436.4A Division CN113966061A (zh) | 2015-08-12 | 2016-08-10 | 极紫外光源中的目标扩展速率控制 |
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Publication Number | Publication Date |
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CN108353489A CN108353489A (zh) | 2018-07-31 |
CN108353489B true CN108353489B (zh) | 2021-11-19 |
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CN202111336436.4A Pending CN113966061A (zh) | 2015-08-12 | 2016-08-10 | 极紫外光源中的目标扩展速率控制 |
CN201680047368.0A Active CN108353489B (zh) | 2015-08-12 | 2016-08-10 | 极紫外光源中的目标扩展速率控制 |
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CN202111336436.4A Pending CN113966061A (zh) | 2015-08-12 | 2016-08-10 | 极紫外光源中的目标扩展速率控制 |
Country Status (5)
Country | Link |
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JP (3) | JP6744397B2 (ja) |
KR (2) | KR20240015174A (ja) |
CN (2) | CN113966061A (ja) |
TW (2) | TWI739755B (ja) |
WO (1) | WO2017027566A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI739755B (zh) * | 2015-08-12 | 2021-09-21 | 荷蘭商Asml荷蘭公司 | 極紫外線光源中之目標擴張率控制 |
US9820368B2 (en) | 2015-08-12 | 2017-11-14 | Asml Netherlands B.V. | Target expansion rate control in an extreme ultraviolet light source |
CN111566563A (zh) * | 2017-10-26 | 2020-08-21 | Asml荷兰有限公司 | 用于监测等离子体的*** |
US10314154B1 (en) * | 2017-11-29 | 2019-06-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for extreme ultraviolet source control |
TWI821437B (zh) * | 2018-10-26 | 2023-11-11 | 荷蘭商Asml荷蘭公司 | 用於監控光發射之系統、euv光源、及控制euv光源之方法 |
US20210245436A1 (en) * | 2018-10-30 | 2021-08-12 | Hewlett-Packard Development Company, L.P. | Feedback control of microwave energy emitters |
KR20210130901A (ko) | 2020-04-22 | 2021-11-02 | 삼성디스플레이 주식회사 | 표시 장치의 제조 장치 |
CN111999989B (zh) * | 2020-09-01 | 2023-07-14 | 广东省智能机器人研究院 | 激光等离子体极紫外光源和极紫外光产生方法 |
Citations (4)
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CN102971922A (zh) * | 2010-06-24 | 2013-03-13 | 西默股份有限公司 | 用于euv光源的具有预脉冲的主振荡器-功率放大器驱动激光器 |
CN103064260A (zh) * | 2012-12-10 | 2013-04-24 | 华中科技大学 | 一种用于极紫外光刻机光源的锡液滴靶产生装置 |
CN103748968A (zh) * | 2011-09-02 | 2014-04-23 | Asml荷兰有限公司 | 辐射源和光刻设备 |
WO2014143504A1 (en) * | 2013-03-14 | 2014-09-18 | Cymer, Llc | Target for laser produced plasma extreme ultraviolet light source |
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US5982800A (en) * | 1997-04-23 | 1999-11-09 | Cymer, Inc. | Narrow band excimer laser |
US8653437B2 (en) * | 2010-10-04 | 2014-02-18 | Cymer, Llc | EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods |
JP4917014B2 (ja) | 2004-03-10 | 2012-04-18 | サイマー インコーポレイテッド | Euv光源 |
US7529281B2 (en) * | 2006-07-11 | 2009-05-05 | Mobius Photonics, Inc. | Light source with precisely controlled wavelength-converted average power |
US7872245B2 (en) | 2008-03-17 | 2011-01-18 | Cymer, Inc. | Systems and methods for target material delivery in a laser produced plasma EUV light source |
JP5368261B2 (ja) * | 2008-11-06 | 2013-12-18 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置の制御方法 |
US8436328B2 (en) * | 2008-12-16 | 2013-05-07 | Gigaphoton Inc. | Extreme ultraviolet light source apparatus |
NL2004837A (en) * | 2009-07-09 | 2011-01-10 | Asml Netherlands Bv | Radiation system and lithographic apparatus. |
JP2013004258A (ja) * | 2011-06-15 | 2013-01-07 | Gigaphoton Inc | 極端紫外光生成装置及び極端紫外光の生成方法 |
JP5075951B2 (ja) * | 2010-07-16 | 2012-11-21 | ギガフォトン株式会社 | 極端紫外光源装置及びドライバレーザシステム |
US8810902B2 (en) * | 2010-12-29 | 2014-08-19 | Asml Netherlands B.V. | Multi-pass optical apparatus |
JP5881345B2 (ja) * | 2011-09-13 | 2016-03-09 | ギガフォトン株式会社 | 極端紫外光生成装置 |
JP5932306B2 (ja) * | 2011-11-16 | 2016-06-08 | ギガフォトン株式会社 | 極端紫外光生成装置 |
DE102011086949A1 (de) * | 2011-11-23 | 2013-05-23 | Carl Zeiss Smt Gmbh | Beleuchtungs- und Verlagerungsvorrichtung für eine Projektionsbelichtungsanlage |
JP2015528994A (ja) * | 2012-08-01 | 2015-10-01 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射を発生させるための方法及び装置 |
US9000403B2 (en) * | 2013-02-15 | 2015-04-07 | Asml Netherlands B.V. | System and method for adjusting seed laser pulse width to control EUV output energy |
WO2014149435A1 (en) * | 2013-03-15 | 2014-09-25 | Cymer, Llc | Beam position control for an extreme ultraviolet light source |
US8680495B1 (en) * | 2013-03-15 | 2014-03-25 | Cymer, Llc | Extreme ultraviolet light source |
JP6646576B2 (ja) * | 2013-11-15 | 2020-02-14 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源 |
US9232623B2 (en) * | 2014-01-22 | 2016-01-05 | Asml Netherlands B.V. | Extreme ultraviolet light source |
TWI739755B (zh) * | 2015-08-12 | 2021-09-21 | 荷蘭商Asml荷蘭公司 | 極紫外線光源中之目標擴張率控制 |
-
2016
- 2016-08-09 TW TW105125348A patent/TWI739755B/zh active
- 2016-08-09 TW TW110133390A patent/TWI788998B/zh active
- 2016-08-10 KR KR1020247003169A patent/KR20240015174A/ko active Application Filing
- 2016-08-10 JP JP2018506293A patent/JP6744397B2/ja active Active
- 2016-08-10 KR KR1020187006976A patent/KR102631831B1/ko active IP Right Grant
- 2016-08-10 WO PCT/US2016/046301 patent/WO2017027566A1/en active Application Filing
- 2016-08-10 CN CN202111336436.4A patent/CN113966061A/zh active Pending
- 2016-08-10 CN CN201680047368.0A patent/CN108353489B/zh active Active
-
2020
- 2020-07-30 JP JP2020129631A patent/JP6952844B2/ja active Active
-
2021
- 2021-09-28 JP JP2021157970A patent/JP7241143B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102971922A (zh) * | 2010-06-24 | 2013-03-13 | 西默股份有限公司 | 用于euv光源的具有预脉冲的主振荡器-功率放大器驱动激光器 |
CN103748968A (zh) * | 2011-09-02 | 2014-04-23 | Asml荷兰有限公司 | 辐射源和光刻设备 |
CN103064260A (zh) * | 2012-12-10 | 2013-04-24 | 华中科技大学 | 一种用于极紫外光刻机光源的锡液滴靶产生装置 |
WO2014143504A1 (en) * | 2013-03-14 | 2014-09-18 | Cymer, Llc | Target for laser produced plasma extreme ultraviolet light source |
Also Published As
Publication number | Publication date |
---|---|
JP2018532138A (ja) | 2018-11-01 |
KR20180038543A (ko) | 2018-04-16 |
TWI788998B (zh) | 2023-01-01 |
JP6952844B2 (ja) | 2021-10-27 |
JP2020194178A (ja) | 2020-12-03 |
KR102631831B1 (ko) | 2024-01-30 |
JP2022008595A (ja) | 2022-01-13 |
TW202210958A (zh) | 2022-03-16 |
JP7241143B2 (ja) | 2023-03-16 |
CN113966061A (zh) | 2022-01-21 |
TW201729480A (zh) | 2017-08-16 |
WO2017027566A1 (en) | 2017-02-16 |
JP6744397B2 (ja) | 2020-08-19 |
KR20240015174A (ko) | 2024-02-02 |
CN108353489A (zh) | 2018-07-31 |
TWI739755B (zh) | 2021-09-21 |
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