CN108353489B - 极紫外光源中的目标扩展速率控制 - Google Patents

极紫外光源中的目标扩展速率控制 Download PDF

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Publication number: CN108353489B
Authority: CN; China
Prior art keywords: radiation; target material; target; energy; modified
Prior art date: 2015-08-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

CN201680047368.0A

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English (en)

Chinese (zh)

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CN108353489A (zh

Inventor

R·J·拉法克

D·J·里格斯

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

ASML Holding NV

Original Assignee

ASML Holding NV

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2015-08-12

Filing date

2016-08-10

Publication date

2021-11-19

2015-08-12 Priority claimed from US14/824,141 external-priority patent/US9820368B2/en

2015-08-12 Priority claimed from US14/824,147 external-priority patent/US9713240B2/en

2016-08-10 Application filed by ASML Holding NV filed Critical ASML Holding NV

2016-08-10 Priority to CN202111336436.4A priority Critical patent/CN113966061A/zh

2018-07-31 Publication of CN108353489A publication Critical patent/CN108353489A/zh

2021-11-19 Application granted granted Critical

2021-11-19 Publication of CN108353489B publication Critical patent/CN108353489B/zh

Status Active legal-status Critical Current

2036-08-10 Anticipated expiration legal-status Critical

Links

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Images

Classifications

- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

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Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
X-Ray Techniques (AREA)
Plasma Technology (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Lasers (AREA)

CN201680047368.0A 2015-08-12 2016-08-10 极紫外光源中的目标扩展速率控制 Active CN108353489B (zh)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
CN202111336436.4A CN113966061A (zh)	2015-08-12	2016-08-10	极紫外光源中的目标扩展速率控制

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
US14/824,141 US9820368B2 (en)	2015-08-12	2015-08-12	Target expansion rate control in an extreme ultraviolet light source
US14/824,141		2015-08-12
US14/824,147 US9713240B2 (en)	2015-08-12	2015-08-12	Stabilizing EUV light power in an extreme ultraviolet light source
US14/824,147		2015-08-12
PCT/US2016/046301 WO2017027566A1 (en)	2015-08-12	2016-08-10	Target expansion rate control in an extreme ultraviolet light source

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
CN202111336436.4A Division CN113966061A (zh)	2015-08-12	2016-08-10	极紫外光源中的目标扩展速率控制

Publications (2)

Publication Number	Publication Date
CN108353489A CN108353489A (zh)	2018-07-31
CN108353489B true CN108353489B (zh)	2021-11-19

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CN202111336436.4A Pending CN113966061A (zh)	2015-08-12	2016-08-10	极紫外光源中的目标扩展速率控制
CN201680047368.0A Active CN108353489B (zh)	2015-08-12	2016-08-10	极紫外光源中的目标扩展速率控制

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CN202111336436.4A Pending CN113966061A (zh)	2015-08-12	2016-08-10	极紫外光源中的目标扩展速率控制

Country Status (5)

Country	Link
JP (3)	JP6744397B2 (ja)
KR (2)	KR20240015174A (ja)
CN (2)	CN113966061A (ja)
TW (2)	TWI739755B (ja)
WO (1)	WO2017027566A1 (ja)

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TWI739755B (zh) *	2015-08-12	2021-09-21	荷蘭商Ａｓｍｌ荷蘭公司	極紫外線光源中之目標擴張率控制
US9820368B2 (en)	2015-08-12	2017-11-14	Asml Netherlands B.V.	Target expansion rate control in an extreme ultraviolet light source
CN111566563A (zh) *	2017-10-26	2020-08-21	Asml荷兰有限公司	用于监测等离子体的***
US10314154B1 (en) *	2017-11-29	2019-06-04	Taiwan Semiconductor Manufacturing Co., Ltd.	System and method for extreme ultraviolet source control
TWI821437B (zh) *	2018-10-26	2023-11-11	荷蘭商Ａｓｍｌ荷蘭公司	用於監控光發射之系統、ｅｕｖ光源、及控制ｅｕｖ光源之方法
US20210245436A1 (en) *	2018-10-30	2021-08-12	Hewlett-Packard Development Company, L.P.	Feedback control of microwave energy emitters
KR20210130901A (ko)	2020-04-22	2021-11-02	삼성디스플레이 주식회사	표시 장치의 제조 장치
CN111999989B (zh) *	2020-09-01	2023-07-14	广东省智能机器人研究院	激光等离子体极紫外光源和极紫外光产生方法

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2016
- 2016-08-09 TW TW105125348A patent/TWI739755B/zh active
- 2016-08-09 TW TW110133390A patent/TWI788998B/zh active
- 2016-08-10 KR KR1020247003169A patent/KR20240015174A/ko active Application Filing
- 2016-08-10 JP JP2018506293A patent/JP6744397B2/ja active Active
- 2016-08-10 KR KR1020187006976A patent/KR102631831B1/ko active IP Right Grant
- 2016-08-10 WO PCT/US2016/046301 patent/WO2017027566A1/en active Application Filing
- 2016-08-10 CN CN202111336436.4A patent/CN113966061A/zh active Pending
- 2016-08-10 CN CN201680047368.0A patent/CN108353489B/zh active Active
2020
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2021
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Also Published As

Publication number	Publication date
JP2018532138A (ja)	2018-11-01
KR20180038543A (ko)	2018-04-16
TWI788998B (zh)	2023-01-01
JP6952844B2 (ja)	2021-10-27
JP2020194178A (ja)	2020-12-03
KR102631831B1 (ko)	2024-01-30
JP2022008595A (ja)	2022-01-13
TW202210958A (zh)	2022-03-16
JP7241143B2 (ja)	2023-03-16
CN113966061A (zh)	2022-01-21
TW201729480A (zh)	2017-08-16
WO2017027566A1 (en)	2017-02-16
JP6744397B2 (ja)	2020-08-19
KR20240015174A (ko)	2024-02-02
CN108353489A (zh)	2018-07-31
TWI739755B (zh)	2021-09-21

Legal Events

Date	Code	Title
2018-07-31	PB01	Publication
2018-07-31	PB01	Publication
2018-09-07	SE01	Entry into force of request for substantive examination
2018-09-07	SE01	Entry into force of request for substantive examination
2021-11-19	GR01	Patent grant
2021-11-19	GR01	Patent grant

Publication	Publication Date	Title
CN108353489B (zh)	2021-11-19	极紫外光源中的目标扩展速率控制
US10674591B2 (en)	2020-06-02	Target expansion rate control in an extreme ultraviolet light source
US9713240B2 (en)	2017-07-18	Stabilizing EUV light power in an extreme ultraviolet light source
TWI654906B (zh)	2019-03-21	用於降低極紫外(euv)光系統中背向反射之方法、用於產生極紫外光之方法及極紫外光源
TWI636709B (zh)	2018-09-21	極紫外線(euv)光源及產生euv光之方法
US9241395B2 (en)	2016-01-19	System and method for controlling droplet timing in an LPP EUV light source
US8809823B1 (en)	2014-08-19	System and method for controlling droplet timing and steering in an LPP EUV light source
TWI612850B (zh)	2018-01-21	極紫外線光源及用於增強來自該極紫外線光源的功率之方法
US10681797B2 (en)	2020-06-09	Target trajectory metrology in an extreme ultraviolet light source
WO2016027346A1 (ja)	2016-02-25	極端紫外光生成システムおよび極端紫外光生成方法