CN108265271A - 一种物理气相沉积法在产品上制作蓝色膜的方法 - Google Patents
一种物理气相沉积法在产品上制作蓝色膜的方法 Download PDFInfo
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Abstract
本发明公开了一种物理气相沉积法在产品上制作蓝色膜的方法,其包括清洗除油步骤、底层制备步骤、缓冲层制备步骤、耐磨层制备步骤、颜色层制备步骤、出炉冷却步骤;其中,清洗除油步骤包括有三氯乙烯溶液浸泡清洗处理步骤、除蜡水超声波清洗步骤、丙酮溶液超声波清洗步骤、烘箱烘烤步骤;通过上述工艺步骤设计,本发明的物理气相沉积法在产品上制作蓝色膜的方法所制备而成的蓝色膜具有耐腐蚀性强、抗氧化性好的优点,且能很好满足产品日常使用并能够延长产品使用寿命。
Description
技术领域
本发明涉及PVD蓝色制作工艺技术领域,尤其涉及一种物理气相沉积法在产品上制作蓝色膜的方法。
背景技术
当前,各种电子产品高速发展,竞争激烈,消费者对产品的要求不仅仅是品质过硬,经久耐用,他们对外观要求高端时尚、色彩绚丽、夺人眼球的特性需求尤为强烈,而PVD技朮制作蓝色装饰膜能赋予产品表面金属质感和靓丽的色彩,满足消费者对产品的外观时尚和潮流的要求。
需进一步指出,传统的PVD蓝色制作工艺具有硬度低、抗腐蚀性差、不耐磨、工艺稳定性差的缺陷。故而,有必要对现有PVD蓝色制作工艺进行改进。
发明内容
本发明的目的在于针对现有技术的不足而提供一种物理气相沉积法在产品上制作蓝色膜的方法,该物理气相沉积法在产品上制作蓝色膜的方法所制备而成的蓝色膜具有耐腐蚀性强、抗氧化性好的优点,且能很好满足产品日常使用并能够延长产品使用寿命。
为达到上述目的,本发明通过以下技术方案来实现。
一种物理气相沉积法在产品上制作蓝色膜的方法,包括有以下工艺步骤,具体的:
a、清洗除油:
a1、将需要加工的产品先置于三氯乙烯溶液中进行浸泡清洗处理,浸泡清洗处理的时间为5分钟;
a2、再将经三氯乙烯溶液浸泡清洗处理后的产品置于除蜡水中进行超声波清洗,超声波清洗的时间为5分钟;
a3、将经除蜡水超声波清洗的产品置于丙酮溶液中进行超声波清洗,丙酮溶液超声波清洗的时间为3分钟;
a4、将经过丙酮溶液超声波清洗的产品置于烘箱中进行烘烤处理,烘烤处理的温度为150-180℃,烘烤处理的时间为30分钟;待产品烘烤处理完毕后,将产品移出烘箱并自然冷却至室温;
b、底层制备:
b1、将经过烘烤处理且冷却至室温的产品置于真空炉中,启动抽真空装置并进行抽真空处理,待真空炉内部的真空度达到0.1帕时开启真空炉的加热装置,待真空炉内部的温度到达180℃时开始计时恒温30分钟,待恒温时间到达之后关闭真空炉的加热装置并停止加热;
b2、继续启动真空炉的抽真空装置并直至真空炉内部的真空度达到0.8×10-3Pa,而后启动氩气流量控制器并往真空炉内部通入100-150SCCM氩气,待真空炉内部的真空度上升至0.15-0.20Pa后依次开启偏压电源、Cr弧靶电源,偏压电源的电压设定为-250--300V,Cr弧靶电源的电流设定为60-65A,在产品离子轰击5分钟后关闭Cr弧靶电源,此时产品上沉积Cr金属底层;
c、缓冲层制备:
c1、启动氩气流量控制器并往真空炉内部通入250SCCM氩气,以使得真空炉内部的真空度上升至0.3Pa;
c2、将偏压电源的电压设定为-800~-150V并开启Cr柱靶中频电源、TiAl柱靶中频电源,Cr柱靶中频电源的电流设定为25A,TiAl柱靶中频电源的电流设定为20A,在产品离子轰击6-18分钟后在Cr金属底层表面沉积Cr和TiAl混合沉积层,从而制备成缓冲层;
d、耐磨层制备:
d1、启动氩气流量控制器、氮气流量控制器,并往真空炉内部180-280SCCM氩气以及80-150SCCM氮气,以使得真空炉内部的真空度上升至0.41-0.8Pa;
d2、开启Cr靶、TiAl合金靶电源,Cr靶、TiAl合金靶电源的电流设定为20-25A,偏压电源的电压设定为-60--130V,产品转向TiAl靶时沉积TiAlN单层,产品转向Cr靶时沉积CrN单层,从而使TiAlN单层与CrN单层交替沉积形成耐磨层,沉积时间为25-55分钟;
e、颜色层制备:
e1、启动氩气流量控制器、氮气流量控制器、乙炔流量控制器,并往真空炉内部通入180-280SCCM氩气、80-150SCCM氮气以及80-150SCCM乙炔,以使得真空炉内部的真空度上升至0.2-0.6Pa;
e2、开启TiAl合金靶且通电电流为8-18A,并将偏压电源的电压设定为-80--150V,在产品离子轰击30-50分钟后在耐磨层上沉积TiAlCN层;
f、出炉冷却:将沉积TiAlCN层后的产品从真空炉内取出,并置于通风干燥处冷却。
其中,于所述步骤a1中,三氯乙烯溶液中三氯乙烯的质量浓度为2%-10%。
本发明的有益效果为:本发明所述的一种物理气相沉积法在产品上制作蓝色膜的方法,其包括清洗除油步骤、底层制备步骤、缓冲层制备步骤、耐磨层制备步骤、颜色层制备步骤、出炉冷却步骤;其中,清洗除油步骤包括有三氯乙烯溶液浸泡清洗处理步骤、除蜡水超声波清洗步骤、丙酮溶液超声波清洗步骤、烘箱烘烤步骤;通过上述工艺步骤设计,本发明的物理气相沉积法在产品上制作蓝色膜的方法所制备而成的蓝色膜具有耐腐蚀性强、抗氧化性好的优点,且能很好满足产品日常使用并能够延长产品使用寿命。
具体实施方式
下面结合具体的实施方式来对本发明进行说明。
一种物理气相沉积法在产品上制作蓝色膜的方法,包括有以下工艺步骤,具体的:
a、清洗除油:
a1、将需要加工的产品先置于三氯乙烯溶液中进行浸泡清洗处理,浸泡清洗处理的时间为5分钟;
a2、再将经三氯乙烯溶液浸泡清洗处理后的产品置于除蜡水中进行超声波清洗,超声波清洗的时间为5分钟;
a3、将经除蜡水超声波清洗的产品置于丙酮溶液中进行超声波清洗,丙酮溶液超声波清洗的时间为3分钟;
a4、将经过丙酮溶液超声波清洗的产品置于烘箱中进行烘烤处理,烘烤处理的温度为150-180℃,烘烤处理的时间为30分钟;待产品烘烤处理完毕后,将产品移出烘箱并自然冷却至室温;
b、底层制备:
b1、将经过烘烤处理且冷却至室温的产品置于真空炉中,启动抽真空装置并进行抽真空处理,待真空炉内部的真空度达到0.1帕时开启真空炉的加热装置,待真空炉内部的温度到达180℃时开始计时恒温30分钟,待恒温时间到达之后关闭真空炉的加热装置并停止加热;
b2、继续启动真空炉的抽真空装置并直至真空炉内部的真空度达到0.8×10-3Pa,而后启动氩气流量控制器并往真空炉内部通入100-150SCCM氩气,待真空炉内部的真空度上升至0.15-0.20Pa后依次开启偏压电源、Cr弧靶电源,偏压电源的电压设定为-250--300V,Cr弧靶电源的电流设定为60-65A,在产品离子轰击5分钟后关闭Cr弧靶电源,此时产品上沉积Cr金属底层;
c、缓冲层制备:
c1、启动氩气流量控制器并往真空炉内部通入250SCCM氩气,以使得真空炉内部的真空度上升至0.3Pa;
c2、将偏压电源的电压设定为-800~-150V并开启Cr柱靶中频电源、TiAl柱靶中频电源,Cr柱靶中频电源的电流设定为25A,TiAl柱靶中频电源的电流设定为20A,在产品离子轰击6-18分钟后在Cr金属底层表面沉积Cr和TiAl混合沉积层,从而制备成缓冲层;
d、耐磨层制备:
d1、启动氩气流量控制器、氮气流量控制器,并往真空炉内部180-280SCCM氩气以及80-150SCCM氮气,以使得真空炉内部的真空度上升至0.41-0.8Pa;
d2、开启Cr靶、TiAl合金靶电源,Cr靶、TiAl合金靶电源的电流设定为20-25A,偏压电源的电压设定为-60--130V,产品转向TiAl靶时沉积TiAlN单层,产品转向Cr靶时沉积CrN单层,从而使TiAlN单层与CrN单层交替沉积形成耐磨层,沉积时间为25-55分钟;
e、颜色层制备:
e1、启动氩气流量控制器、氮气流量控制器、乙炔流量控制器,并往真空炉内部通入180-280SCCM氩气、80-150SCCM氮气以及80-150SCCM乙炔,以使得真空炉内部的真空度上升至0.2-0.6Pa;
e2、开启TiAl合金靶且通电电流为8-18A,并将偏压电源的电压设定为-80--150V,在产品离子轰击30-50分钟后在耐磨层上沉积TiAlCN层;
f、出炉冷却:将沉积TiAlCN层后的产品从真空炉内取出,并置于通风干燥处冷却。
其中,于所述步骤a1中,三氯乙烯溶液中三氯乙烯的质量浓度为2%-10%。
需进一步指出,通过本发明的物理气相沉积法在产品上制作蓝色膜的方法所制备而成的复合涂层由里向外依次包括底层、缓冲层、耐磨层以及颜色层,其中底层为Cr金属层,缓冲层为TiAl和Cr混合层,耐磨层为CrN和TiAlN形成的复合层,颜色层为TiAlCN层。Cr金属层提高了复合涂层的韧性和硬度,缓冲层加强复合涂层内部的粘结强度;耐磨层CrN和TiAlN使缓冲层与耐磨层之间的应力波浪式传递,削弱外界压力对复合涂层的影响,另一方面能很好的和颜色层TiAlCN相结合,提高膜层的结合力,提高膜层整体的耐磨效果;颜色层TiAlCN膜层具有外观亮丽,抗酸性和抗碱性能力强,从而使复合涂层具高耐磨、耐腐蚀性的优点,同时也能达到外观时尚的要求。
综合上述情况可知,通过上述工艺步骤设计,本发明的物理气相沉积法在产品上制作蓝色膜的方法所制备而成的蓝色膜具有耐腐蚀性强、抗氧化性好的优点,且能很好满足产品日常使用并能够延长产品使用寿命。
以上内容仅为本发明的较佳实施例,对于本领域的普通技术人员,依据本发明的思想,在具体实施方式及应用范围上均会有改变之处,本说明书内容不应理解为对本发明的限制。
Claims (2)
1.一种物理气相沉积法在产品上制作蓝色膜的方法,其特征在于,包括有以下工艺步骤,具体的:
a、清洗除油:
a1、将需要加工的产品先置于三氯乙烯溶液中进行浸泡清洗处理,浸泡清洗处理的时间为5分钟;
a2、再将经三氯乙烯溶液浸泡清洗处理后的产品置于除蜡水中进行超声波清洗,超声波清洗的时间为5分钟;
a3、将经除蜡水超声波清洗的产品置于丙酮溶液中进行超声波清洗,丙酮溶液超声波清洗的时间为3分钟;
a4、将经过丙酮溶液超声波清洗的产品置于烘箱中进行烘烤处理,烘烤处理的温度为150-180℃,烘烤处理的时间为30分钟;待产品烘烤处理完毕后,将产品移出烘箱并自然冷却至室温;
b、底层制备:
b1、将经过烘烤处理且冷却至室温的产品置于真空炉中,启动抽真空装置并进行抽真空处理,待真空炉内部的真空度达到0.1帕时开启真空炉的加热装置,待真空炉内部的温度到达180℃时开始计时恒温30分钟,待恒温时间到达之后关闭真空炉的加热装置并停止加热;
b2、继续启动真空炉的抽真空装置并直至真空炉内部的真空度达到0.8×10-3Pa,而后启动氩气流量控制器并往真空炉内部通入100-150SCCM氩气,待真空炉内部的真空度上升至0.15-0.20Pa后依次开启偏压电源、Cr弧靶电源,偏压电源的电压设定为-250--300V,Cr弧靶电源的电流设定为60-65A,在产品离子轰击5分钟后关闭Cr弧靶电源,此时产品上沉积Cr金属底层;
c、缓冲层制备:
c1、启动氩气流量控制器并往真空炉内部通入250SCCM氩气,以使得真空炉内部的真空度上升至0.3Pa;
c2、将偏压电源的电压设定为-800~-150V并开启Cr柱靶中频电源、TiAl柱靶中频电源,Cr柱靶中频电源的电流设定为25A,TiAl柱靶中频电源的电流设定为20A,在产品离子轰击6-18分钟后在Cr金属底层表面沉积Cr和TiAl混合沉积层,从而制备成缓冲层;
d、耐磨层制备:
d1、启动氩气流量控制器、氮气流量控制器,并往真空炉内部180-280SCCM氩气以及80-150SCCM氮气,以使得真空炉内部的真空度上升至0.41-0.8Pa;
d2、开启Cr靶、TiAl合金靶电源,Cr靶、TiAl合金靶电源的电流设定为20-25A,偏压电源的电压设定为-60--130V,产品转向TiAl靶时沉积TiAlN单层,产品转向Cr靶时沉积CrN单层,从而使TiAlN单层与CrN单层交替沉积形成耐磨层,沉积时间为25-55分钟;
e、颜色层制备:
e1、启动氩气流量控制器、氮气流量控制器、乙炔流量控制器,并往真空炉内部通入180-280SCCM氩气、80-150SCCM氮气以及80-150SCCM乙炔,以使得真空炉内部的真空度上升至0.2-0.6Pa;
e2、开启TiAl合金靶且通电电流为8-18A,并将偏压电源的电压设定为-80--150V,在产品离子轰击30-50分钟后在耐磨层上沉积TiAlCN层;
f、出炉冷却:将沉积TiAlCN层后的产品从真空炉内取出,并置于通风干燥处冷却。
2.根据权利要求1所述的一种物理气相沉积法在产品上制作蓝色膜的方法,其特征在于:于所述步骤a1中,三氯乙烯溶液中三氯乙烯的质量浓度为2%-10%。
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