CN108249389A - A kind of micro-nano processing method for making mask using sugar - Google Patents
A kind of micro-nano processing method for making mask using sugar Download PDFInfo
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- CN108249389A CN108249389A CN201611245364.1A CN201611245364A CN108249389A CN 108249389 A CN108249389 A CN 108249389A CN 201611245364 A CN201611245364 A CN 201611245364A CN 108249389 A CN108249389 A CN 108249389A
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- mask
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00396—Mask characterised by its composition, e.g. multilayer masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00349—Creating layers of material on a substrate
- B81C1/00373—Selective deposition, e.g. printing or microcontact printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00404—Mask characterised by its size, orientation or shape
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0198—Manufacture or treatment of microstructural devices or systems in or on a substrate for making a masking layer
Abstract
The invention discloses a kind of micro-nano processing method for making mask using sugar, including step：S10, the sugar or sugar juice that molten condition is provided；S20, the sugar of molten condition or sugar juice are applied to sample surfaces to be processed, form mask pattern；S30, micro-nano technology is carried out to the sample after formation mask pattern；S40, the sample after micro-nano technology is put into sugared insoluble liquid, to remove the sugar of sample surfaces.The micro-nano processing method of the present invention can improve the precision and efficiency of micro-nano technology, reduce cost, while mitigate the adverse effect to environment and operating personnel's health of human body significantly.
Description
Technical field
The present invention relates to technical field of micro-nano manufacture, and in particular to a kind of micro-nano processing method for making mask using sugar.
Background technology
Mask as a kind of processing step common in micro-nano technology, be sample perform etching, deposit, being modified etc. techniques it
Preceding important process, but after the techniques such as etching, deposition, modified are completed, need to remove mask material.At present, it is common to cover
Mold materials includes metal material (such as Au, Ni, Al), metallic compound (such as SiO2、Si3N4, TiN etc.) and photoresist etc., these
Not only cost is higher for common mask material, but also needs to remove using special chemical reagent mostly, and these are chemical
There is the problems such as pollution environment, micro- malicious, harmful in reagent.In addition, it is also contemplated that when selecting chemical reagent to sample material
Whether material has an impact, and further increases the difficulty of mask material removal.
If for this purpose, can search out it is a kind of new be easily removed, mask material at low cost, particularly removal process is to ring
The all harmless mask material of border, human body then will all have important meaning in itself or even for micro-nano technology field for mask process
Justice.
Invention content
Based on above-mentioned present situation, make the micro-nano processing method of mask it is a primary object of the present invention to provide a kind of utilization sugar,
Its used mask material is sugar, and removal process is easy and harmless, and cost is very low.
Above-mentioned purpose is achieved through the following technical solutions：
A kind of micro-nano processing method for making mask using sugar, including step：
S10, the sugar or sugar juice that molten condition is provided；
S20, the sugar of molten condition or sugar juice are applied to sample surfaces to be processed, form mask pattern；
S30, micro-nano technology is carried out to the sample after formation mask pattern；
S40, the sample after micro-nano technology is put into sugared insoluble liquid, to remove the sugar of sample surfaces.
Preferably, the sugar includes the sugar of single kind, the mixture of sugar or containing sugar substance.
Preferably, in step S10, the sugar for providing molten condition includes sugar being heated to the fusing point that temperature is more than the sugar,
And keep constant temperature；Sugar juice is provided to include being configured to sugar juice after sugar is mixed with sugared insoluble liquid.
Preferably, in step S20, by the sugar of molten condition or sugar juice be applied to sample surfaces mode include printing,
It drips, get rid of, spraying, applying, point, penetrating, press, write, glue and/or deposit.
Preferably, in step S20, when using molten condition sugar when, by sample to be processed be heated to temperature approach or
Equal to or higher than the sugar fusing point and keep constant temperature, then apply sugar again, it is after application, sample to be processed is cold
But to room temperature, mask pattern is obtained.
Preferably, in step S20, when using sugar juice, sugar juice is applied to sample surfaces to be processed, Ran Houzheng
Hair falls the solvent in the sugar juice on sample surfaces, obtains mask pattern.
Preferably, the micro-nano technology includes etching, deposition, and/or is modified.
Preferably, in step S40, it is described sugar insoluble liquid be water, ethyl alcohol, methanol or acetic acid or be ethyl alcohol, methanol or
The aqueous solution of acetic acid.
Preferably, after step S40, step is further included：
S50, sample from sugared insoluble liquid is taken out, be dried.
Preferably, in step S50, the mode being dried includes sample being placed on heating unit drying.
The mask material that the micro-nano processing method of the present invention uses is sugar, on the one hand, sugar is in the molten state or in solution
Toughness under state can adhere to sample surfaces well, and cure at normal temperatures or then become solid-state after evaporation of the solvent,
Can ensure the integrality of mask pattern, on the other hand, sugar is readily available, cost it is very low and it is sugared be particularly easy to remove, only
It needs into the water or in the solution of other environmental sounds, thus cost is reduced using sugar as mask, hence it is evident that carry
High efficiency, and it is environmental-friendly.In addition, during sugar juice evaporates solvent, the mask pattern that sugar juice is formed can be received
Contracting, until solvent, all evaporation just stops shrinking, and is only left the mask pattern of sugar.The phenomenon that this contraction, can be further
The precision of mask pattern is improved, so as to improve the precision of micro-nano technology.
The micro-nano processing method of the present invention can improve the precision and efficiency of micro-nano technology, at the same mitigate significantly to environment and
The adverse effect of operating personnel's health of human body.
Description of the drawings
Hereinafter reference will be made to the drawings is described micro-nano processing method according to the present invention.In figure：
Fig. 1 is a kind of flow chart of the micro-nano processing method of preferred embodiment of the present invention.
Fig. 2 is the section signal placed on sample to be processed involved in micro-nano processing method of the invention after sugared mask
Figure.
Fig. 3 A are the schematic cross-section after sample shown in Fig. 2 is etched.
Fig. 3 B are schematic cross-section of the sample after the sugared mask of removal shown in Fig. 3 A.
Fig. 4 A are the schematic cross-section after sample shown in Fig. 2 is deposited.
Fig. 4 B are schematic cross-section of the sample after the sugared mask of removal shown in Fig. 4 A.
Fig. 5 A are the schematic cross-section after sample shown in Fig. 2 is modified.
Fig. 5 B are schematic cross-section of the sample after the sugared mask of removal shown in Fig. 5 A.
Figure label：1- sugar, 2- samples to be processed, 3,5,7- processing after sample, 4- deposition materials layers, 6- modified materials
Layer.
Specific embodiment
The problem of based on proposed in background technology part, the present invention is in order to more easily realize etching, deposition, modification etc.
Micro-nano technology technique, especially for the precision and the removal efficiency of raising mask material for improving micro-nano technology, it is proposed that a kind of
The micro-processing method that sugar makees mask is utilized.
Since the fusing point of sugar is relatively low, the fusing point of most of sugar at 200 DEG C hereinafter, for example, the fusing point of sucrose is 186 DEG C, wheat
The fusing point of bud sugar is 110 DEG C, and the fusing point of fructose is 103~105 DEG C, and the fusing point of glucose is 146 DEG C, etc., is being heated to melting
Or more (such as being heated to 200 DEG C) when, sugar is liquid (molten condition), and liquid can be relatively easily by beating
It prints, drip, getting rid of, spraying, applying, point, the various ways such as penetrating and cover the pattern that needs are formed on sample to be processed, and sugared toughness,
It can well be adhered to sample to be processed.After being cooled to room temperature, sugar can be solidified into solid-like well again, it can be ensured that
Pattern is completely covered on sample surfaces to be processed.
On the other hand, sugar belongs to ease of solubility substance, the solution of any concentration can be configured to the sugared insoluble liquid such as water, equally
Be conducive to print, drip, get rid of, spraying, applying, point, the realization for the techniques such as penetrating, and sugar juice equally has viscosity, can with it is to be processed
Sample adheres to well, and when the evaporation of the solvent in sugar juice or after vapor away, sugared ingredient will be kept on sample surfaces, so together
Sample can ensure that pattern is completely covered on sample surfaces to be processed.Particularly, during sugar juice evaporates solvent, sugar
The mask pattern that solution is formed can be shunk, and until solvent, all evaporation just stops shrinking, and is only left the mask pattern of sugar.This
The phenomenon that kind is shunk can improve the precision of mask pattern, so as to improve the precision of micro-nano technology.
Meanwhile sugar make mask sharpest edges be exactly sample processing after removal it is fairly simple, only sample need to be put into
A period of time in the liquid of the energy dissolved sugar such as water, it is possible to sugar is dissolved into liquid, is later taken out sample from liquid, is done
The sample without sugar can be obtained after dry.
There is above-mentioned every characteristic just because of sugar, present invention firstly provides mask material is made using sugar, to substitute now
There is the conventional masks material such as the metal being widely adopted in technology, metallic compound, photoresist, both enrich and improve mask work
Skill or even micro-nano technology technique, while also completely new application field is opened for this quotidian substance of sugar.
As shown in Figure 1, the micro-nano processing method for making mask using sugar of the preferred embodiment of the present invention, including step
Suddenly：
S10, the sugar or sugar juice that molten condition is provided；
S20, the sugar of molten condition or sugar juice are applied to sample surfaces to be processed, form mask pattern；
S30, micro-nano technology is carried out to the sample after formation mask pattern；
S40, the sample after micro-nano technology is put into sugared insoluble liquid, to remove the sugar of sample surfaces.
As it can be seen that make the micro-nano processing method of mask, the formation of mask and removal process all very simples using sugar, and whole
It is harmless.
Preferably, it is described sugar include but not limited to single kind sugar (such as sucrose, maltose, fructose, lactose, galactolipin,
The sugar of glucose, ribose or any other suitable single kind), sugared (sugar of such as aforementioned various single kinds) and other materials
The mixture of (such as dextrin) or other substances (such as honey) for containing sugar are also all feasible.It is it can be said that sharp in the present invention
It is low melting point, nontoxicity, liquid high viscosity, the general character soluble easily in water of sugar.
Preferably, in step S10, the sugar for providing molten condition includes the sugared temperature that is heated to equaling or exceeding the sugar
Fusing point, and keep constant temperature.For example, heating temperature can be controlled to reach 200 DEG C, it, can also root so as to be suitable for various sugar
According to the fusing point of specifically used sugar, heating temperature is finely controlled, such as reach more than 10 DEG C of fusing point or more, as long as can guarantee sugared steady
Surely it is in molten condition.It is then any including being configured to after the sugared insoluble liquid such as sugar and such as water is mixed to provide sugar juice
The sugar juice of suitable concentration, specific concentration, which is subject to, can keep suitable viscosity.
Preferably, in step S20, the sugar of molten condition or sugar juice is applied to sample surfaces and form mask pattern
Mode include printing, dripping, getting rid of, spraying, applying, point, penetrating, press, write, glue or deposit etc. or in aforementioned manner two kinds with
On combination.
Wherein, the specific embodiment of " printing " is injected into the sugar or sugar juice of such as syringe absorption molten condition
In the raw material box (print cartridge for being similar to inkjet printing) of printing device, sugar is printed into sample surfaces with printing head later and is formed
Required pattern.
The specific embodiment of " drop " is the liquid glucose of molten condition to be squeezed out with the syringe for example with heating function, and drip to sample
Product surface squeezes out sugar juice, and drip to sample surfaces with for example arbitrary syringe.During drop simultaneously mobile syringe so as to
Sample surfaces form required pattern.
The specific embodiment of " getting rid of " is that the sugar of molten condition or sugar juice are equably thrown to sample surfaces with photoresist spinner.
Part sugar is scratched in sample surfaces with the tools such as needle point, pocket knife later, so as to form required pattern in sample surfaces.
The specific embodiment of " spray " is that sugar is placed into the atomizer or sprayer with heating function, in heated condition
It is lower sugar is atomized into liquid little particle and is sprayed onto sample surfaces form required pattern；Or sugar juice is attached to atomizer or spraying
In device, sugar juice is atomized into liquid little particle at normal temperatures it is sprayed onto sample surfaces and form required pattern.
The specific embodiment of " painting " or " point " is that the sugar or sugar juice of molten condition, Ran Houyong are dipped with tip-like tool
Tip-like tool on sample surfaces applies or puts various patterns.Or the sugared shape with wire drawing for taking molten condition is stirred with tip-like tool
Formula pulls tapering sugared needle point, and needle point will cure at room temperature, then sugared needle point is touched the sample surfaces in heated condition
Apply or put various patterns.
The specific embodiment of " penetrating " be quickly squeezed out with syringe molten condition liquid glucose drop (may be used band heating function
Syringe) or with syringe quickly squeeze out sugar juice, and be mapped to sample surfaces.During penetrating while mobile syringe is so as in sample
Product surface forms required pattern.
The specific embodiment of " pressure " is with the PDMS (polydimethylsiloxane, that is, poly dimethyl silicon after processing
Oxygen alkane) or the substance with various relief patterns such as silicon as intermediate transfer object, intermediate transfer object be pressed into sugared surface glue and take
Sugar is pressed into sample surfaces with the intermediate transfer object for being stained with sugar later, forms various mask patterns.
The specific embodiment of " writing " is to dip sugar juice or the sugar of molten condition with such as pen or similar means, and fast
Speed writes various patterns in sample surfaces.
The specific embodiment of " viscous " is that sample to be processed is directly taken to adhere to the sugared surface of molten condition or sugar juice surface
And separate rapidly, sugar is adhered into sample surfaces.It can glue and take several times, obtain various required patterns.
The specific embodiment of " deposition " is that sugar is placed into the equipment of deposition after gasification to deposit to sample surfaces.It can be
In sample surfaces patterned mask material before deposition, remove the pattern that mask material is only left sugar formation after to be deposited.
It is above-described the specific embodiments such as to print, drip, getting rid of, spraying, applying, point, penetrating, press, write, glue or deposit only
It is to form some of way of realization in required patterning process to application sugar to sample surfaces to enumerate, protection scope of the present invention should
When the concrete form for being seen as limited by these embodiments and being stated, protection scope of the present invention should also include other suitable shapes
The printing of formula is dripped, is got rid of, spraying, applying, point, penetrating, press, writes, glues or deposit.
Preferably, in step S20, when using molten condition sugar when, by sample to be processed be heated to temperature approach or
Equal to or higher than sugared fusing point and constant temperature is kept, then applies sugar again.It is easily guaranteed that the bonding of sugar and sample surfaces in this way
Degree, prevents that the liquid glucose of heat is cracked when being applied to cold sample surfaces, phenomena such as coming off, and influences the integrality of mask pattern.
After application, by sample to be processed such as cooled to room temperature to get to mask pattern.The process of natural cooling
In, the sugar of molten condition can gradually cure, and be securely attached to sample surfaces, ensure the integrality of mask pattern.
Preferably, in step S20, when using sugar juice, sugar juice is applied to sample surfaces to be processed, Ran Houzheng
Hair falls the solvent (such as water) in the sugar juice on sample surfaces, and only remaining sugar is to get to mask pattern.It is evaporated in sugar juice
During solvent, the mask pattern that sugar juice is formed can be shunk, and until solvent, all evaporation just stops shrinking, and is only left
The mask pattern of sugar.The phenomenon that this contraction, can improve the precision of mask pattern, so as to improve the precision of micro-nano technology.Evaporation
When, such as the mode of heating evaporation or natural evaporation may be used, the specific embodiment of wherein heating evaporation is by sample
It is placed on warm table, heating platen temperature is heated to 100 DEG C or more, and point is formed when sugar juice is applied to sample surfaces to be processed
Or during the patterns such as line, only remaining sugar is used as mask after solvent (such as water) evaporation in sugar juice.
It is a discovery of the invention that by controlling the concentration of sugar juice and controlling evaporation rate (such as heating speed, heating temperature
Deng), it can realize that the shrinking percentage of mask pattern is controllable, so as to ensure the precision of mask pattern, and then ensure the essence of micro-nano technology
Degree.
Preferably, heretofore described micro-nano technology includes but not limited to etch, deposit, and/or be modified.
Preferably, in step S40, the sugar insoluble liquid is water, ethyl alcohol, methanol or acetic acid etc. or is ethyl alcohol, methanol
Or the aqueous solution of acetic acid etc..These liquid are still all harmless for human body, therefore can improve operation either to environment
The operating environment of personnel.Certainly, any other suitable sugared insoluble liquid can realize the main object of the present invention.
Preferably, as shown in Figure 1, after step S40, step can also be included：
S50, sample from sugared insoluble liquid is taken out, be dried, to remove moisture on sample etc..
Preferably, in step S50, the mode being dried includes sample being placed on heating unit drying.Example
Such as, it can be placed on warm table or in dryer, such as be heated to 100 DEG C, evaporate the water or make other component volatilizations.
Below in conjunction with the operating process of attached drawing and the specific example method that the present invention will be described in detail.
As shown in Fig. 2, being applied with sugar 1 on the surface of sample 2 to be processed, mask pattern is formed, in the protection of mask pattern
Under, can further treat processed sample 2 perform etching (Fig. 3 A, Fig. 3 B), deposition (Fig. 4 A, Fig. 4 B) or it is modified (Fig. 5 A,
Fig. 5 B) etc. micro-nano technologies, then the sample after processing is put into the sugared insoluble liquid such as water, after a period of time, sugar 1 will
It is dissolved into liquid, can finally respectively obtain the sample 3,5,7 after corresponding processing.
Embodiment 1：Mask is made on silicon chip with maltose and carries out reactive ion etching, referring to Fig. 3 A, Fig. 3 B.
Silicon chip and a small amount of solid-state maltose are placed on warm table first, warm table heating after constant temperature at 150 DEG C,
Maltose liquefies completely at this time, and silicon chip surface is put into after dipping maltose with tungsten filament needle point, in silicon chip in the form of applying, write, put etc.
The various mask patterns of surface rendering, silicon chip is removed be put into tweezers from warm table in glassware later, cold at room temperature
But curing maltose obtains stable mask pattern.Hereafter, the silicon chip after mask again by the various patterns of reactive ion etching (such as
Shown in Fig. 3 A), finally the silicon chip after etching is put into the glassware for filling with water, sugar will be molten to water after a period of time
In, it after silicon chip is taken out from water, then is heated to 100 DEG C or more on warm table and dries moisture, you can obtain without sugar
The silicon chip of various patterns, i.e. sample 3 after processing are carved with, as shown in Figure 3B.
Embodiment 2：Mask is made on flexiplast paper with sucrose and carries out physical vapour deposition (PVD), referring to Fig. 4 A, Fig. 4 B.
The sugar juice of suitable concentration is configured to sucrose and water first, then drawing sugar juice with syringe is injected into printing
In the raw material box of equipment, sugar is printed on preprepared flexiplast paper with printing device later, forms mask pattern.
Hereafter, the plastic paper after printing mask is dried in dryer, the plastic paper after drying by physical vapour deposition (PVD) gold, obtains again
To deposition materials layer 4 (as shown in Figure 4 A), finally the plastic paper for depositing gold is put into the glassware for filling with water, at one section
Between after sugar will be molten in water, moisture is dried in dryer again after plastic paper is taken out from water, you can obtain without sugar
And depositing has the plastic paper of gold, that is, the sample 5 after processing, as shown in Figure 4 B.
Embodiment 3：Mask is made in copper sheet with fructose and carries out ion implantation modification.
Copper piece clip is picked and placeed on warm table with tweezers first, the constant temperature after warm table heating is at 200 DEG C, by fructose
Be put into the syringe with heating function, 200 DEG C of heating temperature makes fructose liquefy, by the uniform velocity squeeze syringe by liquid sugar with
The various modes such as drip, spray, penetrating, writing in copper sheet surface rendering various mask patterns in homogeneous thickness, later with tweezers by copper sheet from
It is removed on warm table, cools and solidifies fructose at room temperature and obtain stable mask pattern.Hereafter, the copper sheet after mask again by from
Son injection nickel, obtains modifying material layer 6 (as shown in Figure 5A), is finally putting into the glassware for filling with water, after a period of time
Sugar will be molten in water, and heating 100 DEG C or more on warm table again after copper sheet is taken out from water dries moisture, you can obtains
Without sugar and by the modified copper sheet of nickel, that is, the sample 7 after processing, as shown in Figure 5 B.
To sum up, the mask material that micro-nano processing method of the invention uses is sugar, on the one hand, sugar has viscous in the molten state
Property, sample surfaces can be adhered to well, and it is then solidified into solid-state at normal temperatures, it can ensure the integrality of mask pattern, separately
On the one hand, sugar is readily available, and cost is very low and sugared is particularly easy to remove, it is only necessary into the water or other to environment without
In harmful solution, thus cost as mask reduced using sugar, efficiency significantly improves, and environmental-friendly.It is in addition, molten in sugar
During liquid evaporates solvent, the mask pattern that sugar juice is formed can be shunk, and until solvent, all evaporation just stops shrinking, and obtains
To the mask pattern for being only left sugar.The phenomenon that this contraction, can improve the precision of mask pattern, so as to improve micro-nano technology
Precision.
The micro-nano processing method of the present invention can improve the precision and efficiency of micro-nano technology, reduce cost, while subtract significantly
Gently to the adverse effect of environment and operating personnel.
For those skilled in the art it is easily understood that under the premise of not conflicting, above-mentioned each preferred embodiment can be free
Ground combination, superposition.
It should be appreciated that above-mentioned embodiment is only exemplary, and not restrictive, without departing from the basic of the present invention
In the case of principle, those skilled in the art can be directed to the various apparent or equivalent modification made of above-mentioned details or replace
It changes, is all included in scope of the presently claimed invention.
Claims (10)
1. a kind of micro-nano processing method for making mask using sugar, which is characterized in that including step：
S10, the sugar or sugar juice that molten condition is provided；
S20, the sugar of molten condition or sugar juice are applied to sample surfaces to be processed, form mask pattern；
S30, micro-nano technology is carried out to the sample after formation mask pattern；
S40, the sample after micro-nano technology is put into sugared insoluble liquid, to remove the sugar of sample surfaces.
2. the micro-nano processing method according to claim 1 for making mask using sugar, which is characterized in that the sugar includes single
The sugar of type, the mixture of sugar or containing sugar substance.
3. the micro-nano processing method according to claim 1 or 2 for making mask using sugar, which is characterized in that in step S10,
The sugar for providing molten condition includes sugar being heated to fusing point of the temperature more than the sugar, and keep constant temperature；Sugar juice is provided
Including being configured to sugar juice after sugar is mixed with sugared insoluble liquid.
4. the micro-nano processing method for making mask using sugar according to one of claim 1-3, which is characterized in that step S20
In, by the sugar of molten condition or sugar juice be applied to sample surfaces formed mask pattern mode include printing, drip, get rid of, spray,
Painting point, is penetrated, presses, writes, glues and/or is deposited.
5. the micro-nano processing method for making mask using sugar according to one of claim 1-4, which is characterized in that step S20
In, when using the sugar of molten condition, sample to be processed is heated to temperature and is close or equal to or fusing point higher than the sugar
And constant temperature is kept, then apply sugar again, after application, sample to be processed is cooled to room temperature, obtains mask pattern.
6. the micro-nano processing method for making mask using sugar according to one of claim 1-4, which is characterized in that step S20
In, when using sugar juice, sugar juice is applied to sample surfaces to be processed, then evaporates the sugar juice on sample surfaces
In solvent, obtain mask pattern.
7. the micro-nano processing method for making mask using sugar according to one of claim 1-6, which is characterized in that the micro-nano
Processing includes etching, deposition, and/or is modified.
8. the micro-nano processing method for making mask using sugar according to one of claim 1-7, which is characterized in that step S40
In, it is described sugar insoluble liquid be water, ethyl alcohol, methanol or acetic acid or be ethyl alcohol, methanol or acetic acid aqueous solution.
9. the micro-nano processing method for making mask using sugar according to one of claim 1-8, which is characterized in that step S40
Later, step is further included：
S50, sample from sugared insoluble liquid is taken out, be dried.
10. the micro-nano processing method according to claim 9 for making mask using sugar, which is characterized in that in step S50, into
The dry mode of row includes sample being placed on heating unit drying.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN111792622A (en) * | 2020-09-10 | 2020-10-20 | 西湖大学 | Water ice-based electron beam induced etching process |
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| CN109330590A (en) * | 2018-12-07 | 2019-02-15 | 南方科技大学 | A kind of epidermal electrode and its application for epidermis signal acquisition |
| CN111792622A (en) * | 2020-09-10 | 2020-10-20 | 西湖大学 | Water ice-based electron beam induced etching process |
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