CN108220888B - 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 - Google Patents
适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 Download PDFInfo
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- CN108220888B CN108220888B CN201711451137.9A CN201711451137A CN108220888B CN 108220888 B CN108220888 B CN 108220888B CN 201711451137 A CN201711451137 A CN 201711451137A CN 108220888 B CN108220888 B CN 108220888B
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- target
- heating
- coating
- pulse laser
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711451137.9A CN108220888B (zh) | 2017-12-27 | 2017-12-27 | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 |
Applications Claiming Priority (1)
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CN201711451137.9A CN108220888B (zh) | 2017-12-27 | 2017-12-27 | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 |
Publications (2)
Publication Number | Publication Date |
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CN108220888A CN108220888A (zh) | 2018-06-29 |
CN108220888B true CN108220888B (zh) | 2019-12-27 |
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CN201711451137.9A Active CN108220888B (zh) | 2017-12-27 | 2017-12-27 | 适用于脉冲激光镀膜的加热装置及其脉冲激光镀膜装置 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021204390A1 (en) * | 2020-04-09 | 2021-10-14 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Thermal laser evaporation system and method of providing a thermal laser beam at a source |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108977791B (zh) * | 2018-07-24 | 2020-03-27 | 电子科技大学 | 一种用于高温下卷绕沉积薄膜的通电加热装置 |
CN110055491B (zh) * | 2019-05-14 | 2021-07-06 | 淮安亮谷光电科技有限公司 | 全镀金的高反射红外线加热空心管的制备方法 |
CN118028745A (zh) * | 2023-07-27 | 2024-05-14 | 上海超导科技股份有限公司 | 用于离子束辅助沉积镀膜装置的走带*** |
CN116904956A (zh) * | 2023-07-27 | 2023-10-20 | 上海超导科技股份有限公司 | 卷对卷磁控溅射镀膜装置 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6066836A (en) * | 1996-09-23 | 2000-05-23 | Applied Materials, Inc. | High temperature resistive heater for a process chamber |
JP2009231712A (ja) * | 2008-03-25 | 2009-10-08 | Sumitomo Heavy Ind Ltd | レーザ加工方法及び半導体装置 |
CN201545909U (zh) * | 2009-09-30 | 2010-08-11 | 北京有色金属研究总院 | 连续的脉冲激光镀膜装置 |
EP1181707B1 (en) * | 1999-06-11 | 2010-09-01 | Applied Biosystems, LLC | Maldi ion source with a pulse of gas, apparatus and method for determining molecular weight of labile molecules |
CN101942642A (zh) * | 2006-04-17 | 2011-01-12 | Imra美国公司 | P型半导体氧化锌薄膜,其制备方法,和使用透明基片的脉冲激光沉积方法 |
CN102031491A (zh) * | 2009-09-30 | 2011-04-27 | 北京有色金属研究总院 | 一种连续的脉冲激光镀膜装置 |
CN102560378A (zh) * | 2010-12-21 | 2012-07-11 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
CN103276366A (zh) * | 2013-05-20 | 2013-09-04 | 上海超导科技股份有限公司 | 适合于卷对卷连续化带材制备工艺的箱式加热器 |
CN204618912U (zh) * | 2015-04-10 | 2015-09-09 | 天津宇林昊科技有限公司 | 一种有机肥杀菌处理装置 |
US9158008B2 (en) * | 2011-05-05 | 2015-10-13 | Ut-Battelle, Llc | High spatial resolution particle detectors |
CN106987808A (zh) * | 2017-05-15 | 2017-07-28 | 成都西沃克真空科技有限公司 | 一种镀膜机用基片加热装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050005846A1 (en) * | 2003-06-23 | 2005-01-13 | Venkat Selvamanickam | High throughput continuous pulsed laser deposition process and apparatus |
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2017
- 2017-12-27 CN CN201711451137.9A patent/CN108220888B/zh active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6066836A (en) * | 1996-09-23 | 2000-05-23 | Applied Materials, Inc. | High temperature resistive heater for a process chamber |
EP1181707B1 (en) * | 1999-06-11 | 2010-09-01 | Applied Biosystems, LLC | Maldi ion source with a pulse of gas, apparatus and method for determining molecular weight of labile molecules |
CN101942642A (zh) * | 2006-04-17 | 2011-01-12 | Imra美国公司 | P型半导体氧化锌薄膜,其制备方法,和使用透明基片的脉冲激光沉积方法 |
JP2009231712A (ja) * | 2008-03-25 | 2009-10-08 | Sumitomo Heavy Ind Ltd | レーザ加工方法及び半導体装置 |
CN201545909U (zh) * | 2009-09-30 | 2010-08-11 | 北京有色金属研究总院 | 连续的脉冲激光镀膜装置 |
CN102031491A (zh) * | 2009-09-30 | 2011-04-27 | 北京有色金属研究总院 | 一种连续的脉冲激光镀膜装置 |
CN102560378A (zh) * | 2010-12-21 | 2012-07-11 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
US9158008B2 (en) * | 2011-05-05 | 2015-10-13 | Ut-Battelle, Llc | High spatial resolution particle detectors |
CN103276366A (zh) * | 2013-05-20 | 2013-09-04 | 上海超导科技股份有限公司 | 适合于卷对卷连续化带材制备工艺的箱式加热器 |
CN204618912U (zh) * | 2015-04-10 | 2015-09-09 | 天津宇林昊科技有限公司 | 一种有机肥杀菌处理装置 |
CN106987808A (zh) * | 2017-05-15 | 2017-07-28 | 成都西沃克真空科技有限公司 | 一种镀膜机用基片加热装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021204390A1 (en) * | 2020-04-09 | 2021-10-14 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Thermal laser evaporation system and method of providing a thermal laser beam at a source |
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CN108220888A (zh) | 2018-06-29 |
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Inventor after: Zhu Jiamin Inventor after: Zhao Yue Inventor after: Chen Sikan Inventor after: Gao Zhonghe Inventor after: Chen Yongchun Inventor after: Chen Minghui Inventor after: Chang Tongxu Inventor after: Yao Linpeng Inventor before: Zhu Jiamin Inventor before: Zhao Yue Inventor before: Chen Sikan Inventor before: Gao Zhonghe Inventor before: Chen Yongchun Inventor before: Chen Minghui Inventor before: Chang Tongxu Inventor before: Yao Linpeng Inventor before: Wu Xiang |
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