CN108196733A - A kind of dry film type preparation method of capacitive touch screen - Google Patents
A kind of dry film type preparation method of capacitive touch screen Download PDFInfo
- Publication number
- CN108196733A CN108196733A CN201711442759.5A CN201711442759A CN108196733A CN 108196733 A CN108196733 A CN 108196733A CN 201711442759 A CN201711442759 A CN 201711442759A CN 108196733 A CN108196733 A CN 108196733A
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- China
- Prior art keywords
- dry film
- touch screen
- capacitive touch
- transparent
- type preparation
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Classifications
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The present invention relates to a kind of dry film type preparation methods of capacitive touch screen.A kind of dry film type preparation method of capacitive touch screen：First, touch screen frame is made；2nd, patch electrical-conductive nanometer dry film forms transparent conductive film layer；3rd, it carries out patterning and forms transparent touch electrode；4th, in coating transparent electrode insulating protective layer；5th, perimeter leads are coated with；6th, transparent protective layer is coated with, that is, completes the preparation of capacitive touch screen.The dry film type preparation method of a kind of capacitive touch screen of the present invention, due to the splendid electric conductivity of electrical-conductive nanometer dry film, better than the high transmittance characteristic of ito thin film material, black-out layer structure necessary to eliminating transparent conductive electrode and required vacuum sputtering equipment；Film coating process makes nano silver wire transparent conductive film can be applied on glass cover-plate；Simplify technique, reduce cost, improve yield, increase transmitance, be applicable in and be not limited to the isostructural touch screen preparation of OGS, TOL, OPS.
Description
Technical field
The present invention relates to field of touch screen manufacturing, more particularly to a kind of dry film type preparation method of capacitive touch screen.
Background technology
With the progress of modern touch technology, touch-screen applications range constantly expands, touch function in mobile phone, tablet computer
Almost become standard configuration；In laptop, super basis, all-in-one machine, the product for having touch function occupies the market share
Also constantly expand；From the point of view of touch screen industry, touch screen low cost, production are the directions of future development；And for general
Logical consumer, the frivolous property of touch screen, high-permeability then can more be paid close attention to；Traditional resistive touch screen is gradually by lighter
Thin, touch-control performance more preferably capacitance-type touch screen technology is replaced；In many capacitive touch screen structures, tied with OGS and TOL
The frivolous property of touch screen, the transmitance of structure are best；For having an OGS and TOL techniques, industry collapses bridge usually using individual layer ITO or ITO
Structure forms touch electrode structure, needs to deposit ito thin film using vacuum sputtering equipment in technique, then using yellow light processing procedure
Figure is formed, bridge structure need to also make transparent insulation layer material under the bridge that collapses for collapsing；Either which kind of structure, is required for costliness
Sputtering vacuum process deposition ITO nesa coating layer；In order to reduce cost, industry has begun transparent using metal nanometer line
Conductive film substitutes transparent conductive layer, but due to the adhesiveness of metal nanometer line ink and glass it is bad the problem of, lead to gold
Belong to nano wire ink to be only coated in PET film at present, reuse OCA film coating process and PET transparent conductive films are fitted in glass
On cover board, the capacitive touch screen structure of GFilm structures is formed, the yield issues that such processing procedure is not only due to fitting are added to
This, also as attach PET film and increase the thickness of touch screen, it is lightening and promote product transmitance to be unfavorable for product.
Invention content
The present invention provides a kind of dry film type preparation methods of capacitive touch screen, avoid the indium oxide that use cost is high
Vacuum coating equipment needed for tin (ITO) material and sputtering indium tin oxide transparent conductive layer；And since metal nanometer line is transparent
Better than the high transmittance characteristic of ito thin film material, it is necessary to eliminate transparent conductive electrode institute for the splendid electric conductivity of conductive film
Black-out layer structure and required vacuum sputtering equipment；Film coating process makes nano silver wire transparent conductive film can be applied to glass cover
On plate, simplify technique, reduce cost, improve yield, increase transmitance, be applicable in and be not limited to OGS, TOL, OPS and is isostructural
It is prepared by touch screen.
A kind of dry film type preparation method of capacitive touch screen, specifically carries out according to the following steps：First, in transparent cover plate
It is upper to make touch screen frame using printing technology；2nd, the upper table of cover board is attached to by film coating process using electrical-conductive nanometer dry film
Face forms transparent conductive film layer；3rd, transparent conductive film layer is patterned by yellow light processing procedure, in transparent conductive film layer
Surface forms transparent touch electrode；4th, it is coated with transparent electrode insulating protective layer in the top of transparent conductive film layer；5th, by low
Warm curing conductive silver paste is coated with perimeter leads；6th, transparent protective layer is coated in top side, that is, completes the system of capacitive touch screen
It is standby.
In step 2, the electrical-conductive nanometer dry film includes metal nanometer line dry film or carbon nanotube dry film；Wherein, metal is received
Metal nano wire material is received for nanowires of gold material, nano silver wire material, copper nano-wire material and aluminium used by rice noodles dry film
One kind in nanowire material or wherein several mixing nano-materials in any proportion；The metal nanometer line dry film includes gold
Belong to nano wire dry film substrate, metal nanometer line substrate, metal nanometer line transparency conducting layer and metal nanometer line upper protective film；It is described
Carbon nanotube dry film is included in carbon nanotube dry film substrate, carbon nanotube substrate, carbon nano tube transparent conductive layer and carbon nanotube
Protective film；Wherein, the thickness of substrate is all 3-50 μm in metal nanometer line dry film and carbon nanotube dry film；Metal nanometer line dry film
Metal nanometer line transparency conducting layer thickness be 40-120nm, sheet resistance value is 10-200ohm/sq；The carbon of carbon nanotube dry film
The thickness of nanotube transparency conducting layer is 20-120nm, sheet resistance value is 10-300ohm/sq.
Film coating process described in step 2 is：After taking dry film substrate off using laminator, it is directly attached to transparent cover plate
Upper surface, pad pasting temperature are 50-180 DEG C, then, tear upper protective film.
Transparent cover plate in step 1 is tempered glass, simple glass or transparent plastic substrate.
The thickness of touch screen frame in step 1 is 1-20 μm.
Yellow light processing procedure in step 3 can be replaced laser dry carving technology；Wherein, the parameter of laser dry carving technology is laser
Energy is 1-20W, and electrode spacing is 10-70 μm；Laser dry etching speed is 0.1-15m/sec.
The mode of transparent electrode insulating protective layer coating in step 4 is printing technology or yellow light processing procedure.
The thickness of transparent electrode insulating protective layer in step 4 is 2-30 μm.
The mode of perimeter leads coating in step 5 is printing technology or yellow light processing procedure.
The mode of transparent protective layer coating in step 6 is printing technology or yellow light processing procedure.
The thickness of transparent protective layer in step 6 is 2-30 μm.
Advantages of the present invention：A kind of dry film type preparation method of capacitive touch screen of the present invention, avoids use cost height
Vacuum coating equipment needed for high tin indium oxide (ITO) material and sputtering indium tin oxide transparent conductive layer；And due to metal
The splendid electric conductivity of nano wire transparent conductive film better than the high transmittance characteristic of ito thin film material, eliminates transparent conduction
Black-out layer structure necessary to electrode and required vacuum sputtering equipment；Film coating process allows nano silver wire transparent conductive film should
It uses on glass cover-plate；The present invention is a kind of simplified technique, reduces cost, improves yield, increases the touch screen system of transmitance
Method is made, be applicable in and is not limited to the isostructural touch screen preparation of OGS, TOL, OPS.
Description of the drawings
Fig. 1 is a kind of schematic diagram of the flow of the dry film type preparation method of capacitive touch screen of embodiment；
Fig. 2 is a kind of structure of the middle metal nanometer line dry film of the dry film type preparation method of capacitive touch screen of embodiment
Schematic diagram；
Fig. 3 is that a kind of structure of the middle carbon nanotube dry film of the dry film type preparation method of capacitive touch screen of embodiment is shown
It is intended to.
Specific embodiment
In order to deepen the understanding of the present invention, the present invention is done below in conjunction with drawings and examples and further retouched in detail
It states, which is only used for explaining the present invention, and protection scope of the present invention is not formed and is limited.
Embodiment
As shown in Figure 1, a kind of dry film type preparation method of capacitive touch screen is present embodiments provided, specifically by following
What step carried out：First, on transparent cover plate 201 touch screen frame 202 is made using printing technology；2nd, it is done using electrical-conductive nanometer
Film is attached to the upper surface of cover board 201 by film coating process, forms transparent conductive film layer 203；3rd, to transparent conductive film layer 203
It is patterned by yellow light processing procedure, transparent touch electrode 204 is formed on the surface of transparent conductive film layer 203；4th, it is led transparent
The top coating transparent electrode insulating protective layer 205 of electrolemma layer 203；5th, perimeter leads are coated with by low-temperature cured conductive silver paste
206；6th, transparent protective layer 207 is coated in top side, that is, completes the preparation of capacitive touch screen.
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, the transparent cover plate 201 in step 1 is
Tempered glass, simple glass or transparent plastic substrate.
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, the touch screen frame 202 in step 1
Thickness for 1-20 μm, optimal thickness is 4.5 μm.
As shown in Figures 2 and 3, in a kind of dry film type preparation method of capacitive touch screen of the present embodiment, in step 2
The electrical-conductive nanometer dry film includes metal nanometer line dry film or carbon nanotube dry film；Wherein, used by metal nanometer line dry film
Metal nano wire material is one kind in nanowires of gold material, nano silver wire material, copper nano-wire material and aluminium nano-material
Or wherein several mixing nano-materials in any proportion；The metal nanometer line dry film includes metal nanometer line dry film substrate
101st, metal nanometer line substrate 102, metal nanometer line transparency conducting layer 103 and metal nanometer line upper protective film 104；The carbon is received
Mitron dry film includes carbon nanotube dry film substrate 301, carbon nanotube substrate 302, carbon nano tube transparent conductive layer 303 and carbon nanometer
Pipe upper protective film 304；Wherein, the thickness of substrate is all 3-50 μm of (optimal value in metal nanometer line dry film and carbon nanotube dry film
It it is 15 μm)；The thickness of the metal nanometer line transparency conducting layer 103 of metal nanometer line dry film is that (optimal value is 40-120nm
75nm), sheet resistance value is 10-200ohm/sq (optimal value 50ohm/sq)；The carbon nano tube transparent conductive layer of carbon nanotube dry film
303 thickness is 20-120nm (optimal value 35nm), sheet resistance value is 10-300ohm/sq (optimal value 150ohm/sq).
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, film coating process described in step 2 is：
After taking dry film substrate off using laminator, be directly attached to the upper surface of transparent cover plate 201, pad pasting temperature for 50-180 DEG C (most
The figure of merit is 120 DEG C), then, tear upper protective film.
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, yellow light processing procedure described in step 3 can replace
It is changed to laser dry carving technology；Wherein, the parameter of laser dry carving technology is, laser energy is 1-20W (optimal value 4W), between electrode
Away from for 10-70 μm (optimal value is 25 μm)；Laser dry etching speed is 0.1-15m/sec (optimal value 1m/sec).
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, the transparent electrode insulation in step 4 is protected
The mode that sheath 205 is coated with is printing technology or yellow light processing procedure；The thickness of transparent electrode insulating protective layer 205 for 2-30 μm (most
The figure of merit is 10 μm).
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, the perimeter leads 206 in step 5 apply
The mode of cloth is printing technology or yellow light processing procedure.
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, the transparent protective layer 207 in step 6
The mode of coating is printing technology or yellow light processing procedure.
In a kind of dry film type preparation method of capacitive touch screen of the present embodiment, the transparent protective layer 207 in step 6
Thickness be 2-30 μm (optimal value is 10 μm).
A kind of dry film type preparation method of capacitive touch screen of the present embodiment, avoids the tin indium oxide that use cost is high
(ITO) material and sputtering indium tin oxide transparent conductive layer needed for vacuum coating equipment；And it is led since metal nanometer line is transparent
The splendid electric conductivity of electrolemma, better than the high transmittance characteristic of ito thin film material, necessary to eliminating transparent conductive electrode
Black-out layer structure and required vacuum sputtering equipment；Film coating process makes nano silver wire transparent conductive film can be applied to glass cover-plate
On；The present invention is a kind of simplified technique, reduce cost, improves yield, increases the touch screen manufacturing method of transmitance, be applicable in and
The isostructural touch screen of OGS, TOL, OPS is not limited to prepare.
It should be noted that the thickness of each layer structure is only signal in attached drawing, do not signify actual ratio.
Above-described embodiment should not in any way limit the present invention, all to be obtained by the way of equivalent replacement or equivalency transform
Technical solution all fall in protection scope of the present invention.
Claims (10)
1. a kind of dry film type preparation method of capacitive touch screen, it is characterised in that：Preparation method be specifically according to the following steps into
Capable：First, on transparent cover plate touch screen frame is made using printing technology；2nd, pad pasting work is passed through using electrical-conductive nanometer dry film
Skill is attached to the upper surface of cover board, forms transparent conductive film layer；3rd, pattern is carried out by yellow light processing procedure to transparent conductive film layer
Change, transparent touch electrode is formed on the surface of transparent conductive film layer；4th, in the top of transparent conductive film layer, coating transparent electrode is exhausted
Edge protective layer；5th, perimeter leads are coated with by low-temperature cured conductive silver paste；6th, transparent protective layer is coated in top side, that is, completed
The preparation of capacitive touch screen.
2. a kind of dry film type preparation method of capacitive touch screen according to claim 1, it is characterised in that：Step 2
In, the electrical-conductive nanometer dry film includes metal nanometer line dry film or carbon nanotube dry film；Wherein, metal nanometer line dry film is used
Metal nano wire material be one in nanowires of gold material, nano silver wire material, copper nano-wire material and aluminium nano-material
Kind or wherein several mixing nano-materials in any proportion；The metal nanometer line dry film includes metal nanometer line dry film base
Piece, metal nanometer line substrate, metal nanometer line transparency conducting layer and metal nanometer line upper protective film；The carbon nanotube dry film packet
Include carbon nanotube dry film substrate, carbon nanotube substrate, carbon nano tube transparent conductive layer and carbon nanotube upper protective film；Wherein, it is golden
The thickness for belonging to substrate in nano wire dry film and carbon nanotube dry film is all 3-50 μm；The metal nanometer line of metal nanometer line dry film is saturating
The thickness of bright conductive layer is 40-120nm, sheet resistance value is 10-200ohm/sq；The carbon nano tube transparent of carbon nanotube dry film is conductive
The thickness of layer is 20-120nm, sheet resistance value is 10-300ohm/sq.
3. a kind of dry film type preparation method of capacitive touch screen according to claim 2, it is characterised in that：In step 2
The film coating process is：After taking dry film substrate off using laminator, the upper surface of transparent cover plate is directly attached to, pad pasting temperature is
50-180 DEG C, then, tear upper protective film.
4. a kind of dry film type preparation method of capacitive touch screen according to claim 1, it is characterised in that：In step 1
Touch screen frame thickness be 1-20 μm.
5. a kind of dry film type preparation method of capacitive touch screen according to claim 1, it is characterised in that：In step 3
Yellow light processing procedure can be replaced laser dry carving technology；Wherein, the parameter of laser dry carving technology is laser energy 1-20W, electrode
Spacing is 10-70 μm；Laser dry etching speed is 0.1-15m/sec.
6. a kind of dry film type preparation method of capacitive touch screen according to claim 1, it is characterised in that：In step 4
Transparent electrode insulating protective layer coating mode be printing technology or yellow light processing procedure.
7. a kind of dry film type preparation method of capacitive touch screen according to claim 6, it is characterised in that：In step 4
Transparent electrode insulating protective layer thickness be 2-30 μm.
8. a kind of dry film type preparation method of capacitive touch screen according to claim 1, it is characterised in that：In step 5
Perimeter leads coating mode be printing technology or yellow light processing procedure.
9. a kind of dry film type preparation method of capacitive touch screen according to claim 1, it is characterised in that：In step 6
Transparent protective layer coating mode be printing technology or yellow light processing procedure.
10. a kind of dry film type preparation method of capacitive touch screen according to claim 9, it is characterised in that：Step 6
In transparent protective layer thickness be 2-30 μm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711442759.5A CN108196733A (en) | 2017-12-28 | 2017-12-28 | A kind of dry film type preparation method of capacitive touch screen |
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| CN201711442759.5A CN108196733A (en) | 2017-12-28 | 2017-12-28 | A kind of dry film type preparation method of capacitive touch screen |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108920004A (en) * | 2018-06-30 | 2018-11-30 | 云谷（固安）科技有限公司 | Preparation method, conductive laminate structure and the touch panel of conductive laminate structure |
| CN114020171A (en) * | 2021-11-05 | 2022-02-08 | 深圳市志凌伟业光电有限公司 | Manufacturing method of metal sensing electrode structure, touch display device and mobile terminal |
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| CN106126001A (en) * | 2016-06-29 | 2016-11-16 | 业成光电（深圳）有限公司 | Contact panel and manufacture method thereof |
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Application publication date: 20180622 |